Waste gas treatment device

Abstract

The utility model relates to the technical field of waste gas treatment, and provides a waste gas treatment device which comprises a shell and a first channel arranged in the shell, and an air inlet is formed in the outer side of the first channel; the air inlet pipe is connected with the air inlet, and a primary heating mechanism is arranged on the outer side of the air inlet pipe in a coiled mode; the plasma flame generator is arranged in the first channel below the air inlet, and the plasma flame generator is used for generating plasma flames; the second channel communicates with the first channel, and a cooling mechanism is arranged in the second channel and used for cooling the waste gas; the tail gas treatment device comprises a first dust removal mechanism arranged at the end, away from the first channel, of the second channel. The waste gas is subjected to primary heating treatment through the primary heating mechanism on the gas inlet pipe, then the waste gas is subjected to high-temperature cracking treatment through the arranged plasma flame generator serving as a heat source, and through the combination mode, energy consumption of plasma combustion can be saved, deep purification treatment can be effectively conducted on the waste gas, and cost is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of waste gas treatment, in particular to a waste gas treatment device. Background Art

[0002] Semiconductor cleaning, photolithography, degumming, drying and other processes require the use of large amounts of acid, alkali, organic solvents and a variety of special gases, resulting in large amounts of waste and a wide variety of waste.

[0003] In the existing treatment method, the characteristic exhaust gas of each process section is first pre-treated by adsorption tail gas treatment equipment and then centrally treated by the central treatment system. Since the VOCs exhaust gas emitted by the semiconductor industry has the characteristics of large air volume and low concentration, the common treatment method of the central treatment system is mainly activated carbon adsorption and zeolite concentration wheel + incineration technology. Although the efficiency can reach no less than 95%, the large-scale treatment equipment used will increase operating costs, consume a lot of electricity and natural gas, and increase energy consumption and CO2 emissions. Utility Model Content

[0004] The utility model provides a waste gas treatment device, which is used to solve the defects of high energy consumption and high cost of waste gas treatment in the prior art.

[0005] The utility model provides an exhaust gas treatment device, comprising a shell and a first channel arranged in the shell, wherein an air inlet is arranged on the outer side of the first channel;

[0006] An air intake pipe, the air intake pipe is connected to the air intake port, and an outer disk of the air intake pipe is provided with a primary heating mechanism;

[0007] a plasma flame generator, disposed in the first passage below the air inlet, the plasma flame generator being used to generate a plasma flame;

[0008] a second channel, the second channel being in communication with the first channel, and a cooling mechanism being provided in the second channel for cooling the exhaust gas;

[0009] The exhaust gas treatment device comprises a first dust removal mechanism, and the first dust removal mechanism is arranged at an end of the second channel away from the first channel.

[0010] According to the exhaust gas treatment device provided by the utility model, a second dust removal mechanism is arranged at the top of the first channel, and the second dust removal mechanism includes a driving rod and a dust removal plug, the driving rod is axially movably arranged in the first channel and is located above the plasma flame generator, the dust removal plug is arranged at the free end of the driving rod, and the outer peripheral side of the dust removal plug is in sliding contact with the inner wall of the first channel.

[0011] According to the exhaust gas treatment device provided by the utility model, the exhaust gas treatment device also includes an air collecting chamber and a purification chamber, the first dust removal mechanism is arranged in the air collecting chamber, and the air collecting chamber is connected with the second channel, the purification chamber is located above the air collecting chamber and is connected with the air collecting chamber, the purification chamber is provided with an adsorption layer, and the top of the purification chamber is provided with an exhaust port.

[0012] According to the exhaust gas treatment device provided by the utility model, the second channel is provided with an air supply port, which is used to connect to the air storage device and to introduce air into the first channel and the second channel through the air supply port.

[0013] According to the exhaust gas treatment device provided by the utility model, a dust removal port is arranged at the tail of the second channel, and an electrostatic dust removal mechanism is arranged at the dust removal port.

[0014] According to the exhaust gas treatment device provided by the utility model, the air inlet and the air inlet pipe are both provided with multiple and the same number, the multiple air inlet pipes are evenly distributed around the first channel and connected to the first channel, and each of the air inlet pipes is provided with the primary heating mechanism.

[0015] According to the exhaust gas treatment device provided by the utility model, a control valve is further provided on the air intake pipe near the free end.

[0016] According to the waste gas treatment device provided by the utility model, it also includes a circulation pump and a circulation pipe, the circulation pipe is provided with the circulation pump, the circulation pipe is provided with a fluid, and the circulation pipe is used to connect the primary heating mechanism with the cooling mechanism.

[0017] According to the waste gas treatment device provided by the utility model, the plasma flame generator includes a pair of plasma torch heads, the pair of plasma torch heads are relatively arranged on the inner wall of the first channel, and the plasma torch heads are inclined.

[0018] According to the exhaust gas treatment device provided by the utility model, the second channel is U-shaped, including a first vertical section, a horizontal section and a second vertical section, the first vertical section is connected to the first channel, the cooling mechanism is arranged in the first vertical section, the air supply port is arranged at the connection between the horizontal section and the first vertical section, and the electrostatic dust removal mechanism is arranged at the connection between the horizontal section and the second vertical section.

[0019] The utility model provides an exhaust gas treatment device, comprising a shell and a first channel, an air intake pipe, a plasma flame generator, a second channel and a first dust removal mechanism arranged in the shell. When working, the semiconductor process equipment is connected through the air intake pipe, the exhaust gas generated by the equipment is introduced into the first channel, the exhaust gas is preliminarily heated by the primary heating mechanism on the air intake pipe, and then the exhaust gas is subjected to high-temperature cracking treatment by using the arranged plasma flame generator as a heat source. This combination method can save the energy consumption of plasma combustion, effectively carry out deep purification treatment of the exhaust gas, and convert the harmful components in the exhaust gas into harmless substances or solid waste. Compared with the combustion of fossil energy such as natural gas, it is cleaner and has a wider treatment temperature range and lower cost. The exhaust gas can be cracked quickly and the treatment efficiency is more efficient. The exhaust gas is cooled and dusted by the second channel and the first dust removal mechanism to reduce the dust particles in the exhaust gas, which is conducive to meeting the emission standards. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions in the present invention or the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0021] Figure 1 It is a schematic diagram of the structure of the exhaust gas treatment device provided by the embodiment of the utility model;

[0022] Figure 2 It is a structural schematic diagram of a first channel and a second dust removal mechanism provided by an embodiment of the utility model.

[0023] Reference numerals:

[0024] 1. First channel; 11. Air intake pipe; 2. Primary heating mechanism;

[0025] 3. Second channel; 31. First vertical section; 32. Horizontal section; 33. Second vertical section; 34. Narrowing; 301. Cooling mechanism;

[0026] 4. First dust removal mechanism; 5. Second dust removal mechanism; 51. Driving rod; 52. Dust removal plug;

[0027] 6. Gas collecting chamber; 7. Adsorption layer; 8. Gas supply port; 9. Electrostatic dust removal mechanism; 10. Plasma torch head. DETAILED DESCRIPTION

[0028] In order to make the purpose, technical solution and advantages of the utility model clearer, the technical solution of the utility model will be described clearly and completely in conjunction with the drawings in the utility model. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0029] Combine the following Figure 1 to Figure 2 An exhaust gas treatment device provided in an embodiment of the utility model is described.

[0030] The present embodiment provides an exhaust gas treatment device, which includes a shell, a first channel 1, an air intake pipe 11, a plasma flame generator, a second channel 3 and an exhaust gas treatment device arranged in the shell.

[0031] Among them, an air inlet is arranged on the outside of the first channel 1, and an air inlet pipe 11 is connected to the air inlet. A primary heating mechanism 2 is arranged on the outer side of the air inlet pipe 11. The primary heating mechanism 2 can be a coil arranged on the air inlet pipe 11, or a hydrothermal sleeve arranged on the air inlet pipe 11; a plasma flame generator is arranged in the first channel 1 below the air inlet, and the plasma flame generator is used to generate a plasma flame; the second channel 3 is connected to the first channel 1, and a cooling mechanism 301 is arranged in the second channel 3 for cooling the exhaust gas; the exhaust gas treatment device includes a first dust removal mechanism 4, and the first dust removal mechanism 4 is arranged at one end of the second channel 3 away from the first channel 1.

[0032] It can be seen from the above scheme that when the utility model is used, the semiconductor process equipment is connected through the air intake pipe 11, the generated exhaust gas is introduced into the first channel 1, the exhaust gas is preliminarily heated by the primary heating mechanism 2 on the air intake pipe 11, and then the exhaust gas is subjected to high-temperature cracking treatment by the provided plasma flame generator as a heat source, so that the harmful components in the exhaust gas are converted into harmless substances or solid waste. Compared with the combustion of fossil energy such as natural gas, it is cleaner and has a wider processing temperature range and lower cost. The exhaust gas can be cracked quickly, and the processing efficiency is more efficient. In addition, the exhaust gas is preheated by the primary heating mechanism 2, which can save the energy consumption of plasma combustion and improve the processing efficiency and purification effect of the exhaust gas.

[0033] Reference Figure 2Further, a second dust removal mechanism 5 is provided at the top of the first channel 1, and the second dust removal mechanism 5 includes a driving rod 51 and a dust removal plug 52. The driving rod 51 is movably arranged in the first channel 1 along the axial direction and is located above the plasma flame generator. The dust removal plug 52 is arranged at the free end of the driving rod 51, and the outer peripheral side of the dust removal plug 52 is in sliding contact with the inner wall of the first channel 1; for example, the second dust removal mechanism 5 can be a cylinder, which is arranged at the top of the first channel 1, and the driving rod 51 is telescopically arranged in the first channel 1. The free end of the driving rod 51 is sleeved with the dust removal plug 52, and the outer side of the dust removal plug 52 is tightly fitted with the inner wall of the first channel 1. The dust removal plug 52 is driven by the cylinder to move along the axial direction to achieve the cleaning of the inner wall of the first channel 1.

[0034] In this arrangement, the driving rod 51 is used to drive the dust removal plug 52 to move axially in the first channel 1, so that the dust removal plug 52 slides and contacts the inner wall of the first channel 1, thereby cleaning up impurities such as dust particles attached to the inner wall, ensuring the cleanliness of the first channel 1, reducing maintenance cycles and costs, and allowing impurities to enter the lower part and be cracked by the high-temperature flame generated by the plasma flame generator, thereby improving the exhaust gas treatment effect.

[0035] In this embodiment, the exhaust gas treatment device also includes an air collecting chamber 6 and a purification chamber. The first dust removal mechanism 4 is arranged in the air collecting chamber 6, and the air collecting chamber 6 is connected to the second channel 3. The first dust removal mechanism 4 may include multiple dust removal screens. The multiple dust removal screens can be arranged in the air collecting chamber 6 at intervals along the height direction. The purification chamber is located above the air collecting chamber 6 and is connected to the air collecting chamber 6. The purification chamber is provided with an adsorption layer 7. The material of the adsorption layer 7 can be activated carbon. An exhaust port is provided on the top of the purification chamber.

[0036] With such arrangement, the exhaust gas is subjected to dry adsorption treatment through the purification chamber. The gas enters from the bottom of the gas collecting chamber 6, is filtered through layers of dust removal screens, and is buffered so that the gas can pass through the adsorption layer in the purification chamber above evenly and slowly, thereby improving the gas treatment effect and meeting the emission requirements. Finally, the gas is directly discharged through the exhaust port.

[0037] Preferably, the exhaust port is connected to a variable frequency fan through a pipeline, and the fan can accelerate the exhaust rate of the gas and accelerate the flow of the gas in the first channel 1 and the second channel 3.

[0038] In some embodiments, a constriction 34 structure is provided in the second channel 3 to help increase the flow rate of the gas.

[0039] In a further embodiment, the second channel 3 is provided with an air supply port 8 , and the air supply port 8 is used to connect to an air storage device and to introduce air into the first channel 1 and the second channel 3 through the air supply port 8 .

[0040] In this way, air is introduced into the second channel 3 by setting the air supply port 8. Since the first channel 1 is connected to the second channel 3, the air can blow on the cooled gas to speed up the gas flow speed, thereby speeding up the gas cooling rate, and can also play a combustion-supporting role for the plasma flame generator in the first channel 1.

[0041] Preferably, an electrostatic precipitator mechanism 9 is provided at the tail of the second channel 3, and the electrostatic precipitator mechanism 9 may be a common type such as a plate-type electrostatic precipitator or a dry-type electrostatic precipitator. For example, a dust removal port is provided at the tail of the second channel 3, and the electrostatic precipitator mechanism 9 is provided at the dust removal port, and the accumulated dust can be regularly processed through the dust removal port.

[0042] In this way, by adding an electrostatic dust removal mechanism 9 before entering the first dust removal mechanism 4, particulate matter in the gas, such as smoke, dust, etc., can be effectively filtered out to prevent pollutants from being discharged into the atmosphere, thereby improving the cleaning effect of particulate pollutants in the gas and ensuring that the waste can meet the emission standards.

[0043] like Figure 1 As shown, in some embodiments, the second channel 3 is U-shaped, including a first vertical section 31, a horizontal section 32 and a second vertical section 33. The first vertical section 31 is connected to the first channel 1, and the cooling mechanism 301 is arranged in the first vertical section 31. An air supply port 8 is arranged at the connection between the horizontal section 32 and the first vertical section 31, and an electrostatic dust removal mechanism 9 is arranged at the connection between the horizontal section 32 and the second vertical section 33.

[0044] In some embodiments, the gas collecting chamber 6 is connected to the end of the second channel 3, for example, the gas collecting chamber 6 is connected to the top of the second vertical section 33, and multiple dust removal screens have different apertures, which can filter out dust particles in the gas step by step from large to small, thereby improving the cleanliness of the gas.

[0045] In this embodiment, a circulation pump and a circulation pipe are also included. The circulation pipe is provided with a circulation pump, and a fluid is provided in the circulation pipe. The circulation pipe is used to connect the primary heating mechanism 2 with the cooling mechanism 301. That is to say, the circulation pump and the fluid in the circulation pipe are used to realize the recycling of heat. For example, the primary heating mechanism 2 is a coil arranged on the intake pipe 11, and the cooling mechanism 301 can be a tubular water cooling mechanism, including a spiral tube type or a fin tube type cooler. This part is the prior art and will not be repeated again. The fluid in the coil transfers heat to the exhaust gas by heat conduction, thereby increasing its temperature. After that, the cooled fluid returns to the cooling mechanism 301 through the circulation pipe. When the high-temperature exhaust gas passes through the cooling mechanism 301, the fluid contacts the high-temperature exhaust gas. During the contact process, the fluid absorbs heat from the high-temperature exhaust gas, causing the temperature of the high-temperature exhaust gas to drop. The heated fluid is provided to the primary heating mechanism 2 through the circulation pipe to continue heating the exhaust gas. In this way, a closed circulation system is formed. The circulation pump is responsible for driving the fluid to flow in the circulation pipe to ensure that the fluid can continuously exchange heat with the exhaust gas. During operation, the operating speed and flow rate of the circulation pump can be adjusted to achieve precise control of the gas temperature.

[0046] In this embodiment, multiple air inlets and air inlet pipes 11 are provided and the number is the same. The multiple air inlet pipes 11 are evenly distributed around the first channel 1 and connected to the first channel 1. Each air inlet pipe 11 is provided with a primary heating mechanism 2.

[0047] In this way, by setting up multiple air inlet pipes 11 and air inlets, the exhaust gas treatment device can be used in conjunction with multiple semiconductor process equipment at the same time, so that the exhaust gas generated by multiple semiconductor process equipment can be introduced into the exhaust gas treatment device at the same time, thereby improving the exhaust gas treatment efficiency and making the exhaust gas treatment work more centralized and convenient, avoiding the use of multiple exhaust gas treatment equipment, realizing centralized treatment of exhaust gas, and reducing the equipment footprint and energy consumption.

[0048] In this embodiment, a control valve is also provided on the air intake pipe 11 near the free end, and the control valve can be electrically connected to the control center to realize automatic control of the on and off of the air intake pipe 11, and the type of control valve can also be set to realize the monitoring of gas flow rate and temperature.

[0049] Furthermore, the plasma flame generator includes at least one pair of plasma torch heads 10, which are evenly distributed on the inner wall of the first channel 1 along the circumferential direction, and the plasma torch heads 10 are inclined. For example, a pair of plasma torch heads 10 are deflected downward in a clockwise direction, so that the exhaust gas passing through here is heated by the injected flame to form a rotating airflow. Compared with the axially flowing gas, the gas stays under the plasma flame generator for a longer time, thereby improving the cracking effect.

[0050] By setting the plasma torch head 10 at an angle, the exhaust gas is processed at high temperature here to form a rotating airflow. On the one hand, it can clean the wall dust attached to the inner wall of the first channel 1, and on the other hand, the rotating airflow increases the residence time of the exhaust gas, so that the high-temperature cracking is sufficient.

[0051] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the utility model, rather than to limit it. Although the utility model has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the various embodiments of the utility model.

Claims

1. An exhaust gas treatment device, characterized in that: The invention comprises a housing and: A first channel (1), an air inlet being arranged on the outer side of the first channel (1); An air intake pipe (11), the air intake pipe (11) being connected to the air intake port, and an outer disk of the air intake pipe (11) being provided with a primary heating mechanism (2); a plasma flame generator, arranged in the first channel (1) below the air inlet, the plasma flame generator being used to generate a plasma flame; A second channel (3), the second channel (3) being in communication with the first channel (1), and a cooling mechanism (301) being provided in the second channel (3) for cooling the exhaust gas; An exhaust gas treatment device comprises a first dust removal mechanism (4), wherein the first dust removal mechanism (4) is arranged at an end of the second channel (3) away from the first channel (1).

2. The exhaust gas treatment device according to claim 1, characterized in that: A second dust removal mechanism (5) is arranged at the top of the first channel (1), and the second dust removal mechanism (5) comprises a driving rod (51) and a dust removal plug (52), wherein the driving rod (51) is movably arranged in the first channel (1) along the axial direction and is located above the plasma flame generator, and the dust removal plug (52) is arranged at the free end of the driving rod (51), and the outer peripheral side of the dust removal plug (52) is in sliding contact with the inner wall of the first channel (1).

3. The exhaust gas treatment device according to claim 1, characterized in that: The exhaust gas treatment device further comprises an air collecting chamber (6) and a purification chamber, wherein the first dust removal mechanism (4) is arranged in the air collecting chamber (6), and the air collecting chamber (6) is connected to the second channel (3), the purification chamber is located above the air collecting chamber (6) and is connected to the air collecting chamber (6), the purification chamber is provided with an adsorption layer (7), and an exhaust port is provided at the top of the purification chamber.

4. The exhaust gas treatment device according to claim 1, characterized in that: The second channel (3) is provided with an air supply port (8), and the air supply port (8) is used to connect to an air storage device and to introduce air into the first channel (1) and the second channel (3) through the air supply port (8).

5. The exhaust gas treatment device according to claim 4, characterized in that: A dust removal port is provided at the tail end of the second channel (3), and an electrostatic dust removal mechanism (9) is provided at the dust removal port.

6. The exhaust gas treatment device according to claim 1, characterized in that: The air inlet and the air inlet pipe (11) are both provided in a plurality and in the same number; the plurality of air inlet pipes (11) are evenly distributed around the first channel (1) and are in communication with the first channel (1); and each of the air inlet pipes (11) is provided with the primary heating mechanism (2).

7. The exhaust gas treatment device according to claim 6, characterized in that: A control valve is also provided on the air inlet pipe (11) near the free end.

8. The exhaust gas treatment device according to claim 1, characterized in that: It also includes a circulation pump and a circulation pipe, wherein the circulation pipe is provided with the circulation pump, a fluid is provided in the circulation pipe, and the circulation pipe is used to connect the primary heating mechanism (2) with the cooling mechanism (301).

9. The exhaust gas treatment device according to claim 1, characterized in that: The plasma flame generator comprises a pair of plasma torch heads (10), the pair of plasma torch heads (10) are arranged oppositely on the inner wall of the first channel (1), and the plasma torch heads (10) are arranged obliquely.

10. The exhaust gas treatment device according to claim 5, characterized in that: The second channel (3) is in a U-shaped structure, comprising a first vertical section (31), a horizontal section (32) and a second vertical section (33); the first vertical section (31) is connected to the first channel (1); the cooling mechanism (301) is arranged in the first vertical section (31); the air supply port (8) is arranged at the connection between the horizontal section (32) and the first vertical section (31); and the electrostatic dust removal mechanism (9) is arranged at the connection between the horizontal section (32) and the second vertical section (33).

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