Cleaning bracket device

Abstract

The utility model relates to the technical field of semiconductor technology, in particular to a cleaning bracket device, which comprises a cleaning tank, the bracket tilting mechanism comprises a fixing frame, a fixing extension rod of the fixing frame is hinged to one end of a first pull rod, and the other end of the first pull rod extends into the cleaning tank and is hinged to one side of the support bottom plate; a movable extension rod of the lifting movable frame is hinged to one end of a second pull rod, and the other end of the second pull rod extends into the cleaning tank and is hinged to the other side of the support bottom plate; when the lifting movable frame moves up and down, the support bottom plate swings in the cleaning tank in an inclined mode. Inclined shaking of the support bottom plate facilitates moving and discharging of the bubbles in the inclined direction, adsorption of the bubbles to the surface of the wafer is reduced, and floating of the bubbles and removal of impurities are promoted.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor processes, in particular to a cleaning bracket device. Background Art

[0002] Wafer cleaning is a key step in the semiconductor manufacturing process. Since semiconductor manufacturing has extremely high requirements for the cleanliness of wafers, any tiny impurities may affect the performance and reliability of the device. During the wet cleaning process, tiny bubbles are generated when the chemical solution contacts the wafer surface. These bubbles may adhere to the wafer surface. If the bubbles cannot be effectively removed during the cleaning process, it may cause uneven cleaning of the wafer surface, affect the contact between the chemical solution and the impurities on the wafer surface, and thus reduce the cleaning effect.

[0003] Therefore, in order to solve the problem of uneven cleaning caused by low bubble discharge efficiency during wet cleaning, a cleaning bracket device needs to be designed. Utility Model Content

[0004] In order to solve the technical problems mentioned in the background technology, the utility model provides a cleaning bracket device, comprising:

[0005] cleaning tanks; and

[0006] A bracket tilting mechanism comprising:

[0007] A fixed frame, wherein a fixed extension rod is hinged to one end of a first pull rod, and the other end of the first pull rod extends into the cleaning tank and is hinged to one side of the bracket bottom plate;

[0008] A lifting movable frame, wherein a movable extension rod is hinged to one end of a second pull rod, and the other end of the second pull rod extends into the cleaning tank and is hinged to the other side of the bracket bottom plate;

[0009] When the lifting movable frame moves up and down, the support bottom plate generates an inclined movement in the cleaning tank.

[0010] Furthermore, the second pull rod is a multi-section pull rod hinged in sequence.

[0011] Furthermore, the length of the second pull rod is not less than that of the first pull rod.

[0012] Furthermore, the lifting movable frame includes: a transmission rod and a lifting mechanism;

[0013] The lifting mechanism drives the movable extension rod to rise and fall through the transmission rod.

[0014] Furthermore, the lifting mechanism comprises: a static support plate and a dynamic support plate, and a transmission assembly arranged therebetween; wherein

[0015] The dynamic support plate is used to connect the first driver and the bottom of the transmission rod;

[0016] The first driver cooperates with the static support plate through the transmission assembly to drive the dynamic support plate to support the transmission rod to move up and down.

[0017] Furthermore, the transmission assembly includes: a rack and a gear; wherein

[0018] The rack is mounted on the inner side of the static support plate and meshes with the gear;

[0019] The output end of the first driver is connected to a gear, and the gear rotates and meshes with the rack to drive the support plate to move up and down.

[0020] Furthermore, it also includes:

[0021] The shaking mechanism comprises: a supporting base and a lifting assembly; wherein

[0022] The lifting assembly is movably arranged on the support base, so that the fixed frame and the lifting movable frame can move up and down on the support base at the same time.

[0023] Furthermore, the lifting assembly includes:

[0024] A lifting plate, a second driver disposed on the lifting plate, a cam plate driven by the second driver, and a lifting guide rail disposed between the lifting plate and the supporting base; wherein

[0025] One side of the lifting plate is connected to a fixed frame, and the other side is connected to the lifting mechanism. When the cam disc rotates, the lifting plate is driven to move up and down along the lifting guide rail.

[0026] Furthermore, a limiting member is provided on the bottom plate of the support to limit the wafer basket.

[0027] Furthermore, a cover plate is provided above the cleaning tank.

[0028] The beneficial effect of the utility model is that by arranging a bracket tilting mechanism in the cleaning tank, the first pull rod and the second pull rod on both sides of the bracket tilting mechanism are respectively connected to the fixed frame and the lifting movable frame, and the up and down movement of the lifting movable frame causes the second pull rod to drive the bracket bottom plate of the bracket tilting mechanism to tilt and shake, thereby helping the bubbles to move and be discharged along the tilt direction, reducing the adsorption of bubbles on the wafer surface, so as to promote the floating of bubbles and the removal of impurities.

[0029] Other features and advantages of the utility model will be described in the following description, and partly become apparent from the description, or understood by practicing the utility model. The purpose and other advantages of the utility model are realized and obtained by the structures particularly pointed out in the description and the drawings.

[0030] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, preferred embodiments are given below and described in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the specific implementation methods of the utility model or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0032] Figure 1 A schematic structural diagram of a cleaning bracket device according to some embodiments is shown;

[0033] Figure 2 A schematic diagram showing a tilted state of a cleaning bracket device according to some embodiments is shown;

[0034] Figure 3 A side view of a cleaning bracket device according to some embodiments is shown;

[0035] Figure 4 A rear view of a cleaning bracket device according to some embodiments is shown;

[0036] Figure 5 A schematic diagram showing a cleaning bracket device according to some embodiments;

[0037] In the figure:

[0038] 101 cleaning tank, 106 cover plate, 200 bracket tilting mechanism, 220 bracket bottom plate, 205 limiter;

[0039] 210 fixed frame, 211 fixed extension rod, 212 first pull rod, 230 lifting movable frame, 231 movable extension rod, 232 second pull rod;

[0040] 300 lifting mechanism, 301 transmission rod, 302 first driver, 303 static support plate, 304 dynamic support plate, 305 transmission assembly, 315 rack, 325 gear;

[0041] 400 shaking mechanism, 401 supporting base, 402 lifting assembly, 412 second driver, 413 cam plate, 414 lifting guide rail, 415 lifting plate. DETAILED DESCRIPTION

[0042] In order to make the purpose, technical solution and advantages of the embodiments of the utility model clearer, the technical solution of the utility model will be clearly and completely described below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0043] like Figure 1 and Figure 2 As shown, at least one embodiment provides a cleaning bracket device, including a cleaning tank 101; and a bracket tilting mechanism 200, the bracket tilting mechanism 200 includes: a fixed frame 210, a fixed extension rod 211 of which is hinged to one end of a first pull rod 212, the other end of the first pull rod 212 extends into the cleaning tank and is hinged to one side of a bracket bottom plate 220; a lifting movable frame 230, a movable extension rod 231 of which is hinged to one end of a second pull rod 232, the other end of the second pull rod 232 extends into the cleaning tank and is hinged to the other side of the bracket bottom plate 220; when the lifting movable frame 230 moves up and down, the bracket bottom plate 220 generates a tilting movement in the cleaning tank 101.

[0044] In some embodiments, the basket for cleaning wafers is transported to the cleaning tank and placed in the bracket tilting mechanism 200. The lifting and lowering movable frame 230 is moved up and down, and the height of the movable extension rod 231 is adjusted to tilt the support bottom plate 220 toward the second pull rod 232. When the lifting and lowering movable frame 230 moves downward, the movable extension rod 231 drives the second pull rod 232 to descend, the angle at which the support bottom plate 220 and the second pull rod 232 cooperate is reduced, and the angle at which the support bottom plate 220 and the first pull rod 212 cooperate is expanded, so as to achieve the tilting of the basket. By precisely controlling the tilting angle, the tilting motion promotes the bubbles formed on the surface of the wafer during the cleaning process to move to the edge and be discharged more easily, so as to reduce the influence of bubbles on the cleaning effect.

[0045] In some embodiments, the second pull rod 232 is a multi-section pull rod that is hinged in sequence, and the multiple pull rods are connected in a hinged manner. The length of the second pull rod 232 is not less than that of the first pull rod 212.

[0046] The movable extension rod 231 drives the second rod 232 to rise and fall, and the use of multiple rods articulated allows a certain degree of bending and rotation between each rod, so that the entire second rod 232 can adapt to forces and movements in different directions. The second rod 232 is longer than the first rod 212. Since the longer second rod 232 provides a larger force arm, it can generate a larger torque, which helps to achieve a larger angle tilt or a smoother movement of the bracket bottom plate 220.

[0047] In some embodiments, further, the lifting movable frame 230 includes: a transmission rod 301 and a lifting mechanism 300; the lifting mechanism 300 drives the movable extension rod 231 to move up and down through the transmission rod 301. The lifting mechanism 300 includes: a static support plate 303 and a dynamic support plate 304, and a transmission assembly 305 arranged therebetween; wherein the dynamic support plate 304 is used to connect the first driver 302 and the bottom of the transmission rod 301; the first driver 302 cooperates with the static support plate 303 through the transmission assembly 305 to drive the dynamic support plate 304 to support the transmission rod 301 to move up and down. The transmission assembly 305 includes: a rack 315 and a gear 325; wherein the rack 315 is installed on the inner side of the static support plate 303 and meshes with the gear 325; the output end of the first driver 302 is connected to the gear 325, and the gear 325 rotates and meshes with the rack 315 to drive the dynamic support plate to move up and down.

[0048] Specifically, the first driver 302 is started. The first driver 302 can be an electric motor, a hydraulic motor or a pneumatic motor, etc. The first driver 302 drives the gear and the rack to rotate. The rotation of the gear 325 causes the rack 315 to move along its length. The movable support plate 304 will move up and down along the rack 315, causing the transmission rod 301 to move up and down on the support plate 303. The transmission rod 301 drives the movable extension rod 231 to move, causing the bracket tilting mechanism 200 to move, so that the bracket base plate 220 tilts.

[0049] like Figure 3 and Figure 4 As shown, in some embodiments, the cleaning bracket device further includes: a shaking mechanism 400, which includes: a support base 401 and a lifting assembly 402; wherein the lifting assembly 402 is movably arranged on the support base 401, so that the fixed frame 210 and the lifting movable frame 230 move up and down on the support base 401 at the same time. The lifting assembly 402 includes: a lifting plate 415, a second driver 412 arranged on the lifting plate 415, a cam plate 413 driven by the second driver 412, and a lifting guide rail 414 arranged between the lifting plate 415 and the support base 401; wherein one side of the lifting plate 415 is connected to the fixed frame 210, and the other side is connected to the lifting mechanism 300, and when the cam plate 413 rotates, the lifting plate 415 is driven to move up and down along the lifting guide rail 414. The lifting plate 415 moves on the support base 401, so that the bracket tilting mechanism 200 is shaken or vibrated, which helps the cleaning liquid to contact the wafer more evenly and improve the cleaning effect.

[0050] In some embodiments, a limiting member 205 is disposed on the support bottom plate 220 to limit the wafer basket.

[0051] In some embodiments, a cover plate 106 is disposed above the cleaning tank and is opened between the first pull rod 212 and the second pull rod 232. When the equipment starts cleaning, the cover plate 106 is closed and the cleaning tank is sealed to prevent cross contamination between different batches or different types of cleaning solutions.

[0052] like Figure 5 As shown, in some embodiments, the first pull rod 212 and the second pull rod 232 of the bracket tilting mechanism 200 are of the same length, and the first driver 302 of the lifting movable frame 230 drives the transmission rod 301 to move upward, so that the movable extension rod 231 drives the second pull rod 232 upward, and the angle at which the bracket base plate 220 and the second pull rod 232 cooperate is enlarged, and the angle at which the bracket base plate 220 and the first pull rod 212 cooperate is reduced, thereby realizing another tilting method of the flower basket.

[0053] In summary, the utility model arranges a bracket tilting mechanism in the cleaning tank, and the two sides of the bracket tilting mechanism are respectively connected to a fixed frame and a lifting movable frame through a first pull rod and a second pull rod. The up and down movement of the lifting movable frame 230 enables the second pull rod to drive the tilting and shaking of the bracket bottom plate of the bracket tilting mechanism. By controlling the tilting and shaking of the bracket bottom plate, it helps the bubbles to move and be discharged along the tilting direction, reducing the adsorption of bubbles on the wafer surface, so as to promote the floating of bubbles and the removal of impurities.

[0054] In the description of the embodiments of the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0055] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.

[0056] In the several embodiments provided in this application, it should be understood that the disclosed systems, devices and methods can be implemented in other ways. The device embodiments described above are merely schematic. For example, the division of the units is only a logical function division. There may be other division methods in actual implementation. For example, multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. With the above-mentioned ideal embodiments of the utility model as inspiration, through the above-mentioned description, relevant staff can make various changes and modifications without departing from the scope of the technical idea of ​​the utility model. The technical scope of the utility model is not limited to the contents of the specification, and its technical scope must be determined according to the scope of the claims.

Claims

1. A cleaning bracket device, characterized in that: include: cleaning tank (101); and The bracket tilting mechanism (200) comprises: A fixed frame (210), wherein a fixed extension rod (211) is hinged to one end of a first pull rod (212), and the other end of the first pull rod (212) extends into the cleaning tank and is hinged to one side of a support bottom plate (220); A lifting movable frame (230), wherein a movable extension rod (231) is hinged to one end of a second pull rod (232), and the other end of the second pull rod (232) extends into the cleaning tank and is hinged to the other side of the bracket bottom plate (220); When the lifting movable frame (230) moves up and down, the support bottom plate (220) generates a tilting movement in the cleaning tank (101).

2. The cleaning bracket device according to claim 1, characterized in that: The second pull rod (232) is a multi-section pull rod that is hinged in sequence.

3. The cleaning bracket device according to claim 1, characterized in that: The second pull rod (232) is no shorter than the first pull rod (212).

4. The cleaning bracket device according to claim 1, characterized in that: The lifting movable frame (230) comprises: a transmission rod (301) and a lifting mechanism (300); The lifting mechanism (300) drives the movable extension rod (231) to rise and fall via the transmission rod (301).

5. The cleaning bracket device according to claim 4, characterized in that: The lifting mechanism (300) comprises: a static support plate (303) and a dynamic support plate (304), and a transmission assembly (305) arranged therebetween; wherein The movable support plate (304) is used to connect the first driver (302) and the bottom of the transmission rod (301); The first driver (302) cooperates with the static support plate (303) through the transmission assembly (305) to drive the dynamic support plate (304) to support the transmission rod (301) to move up and down.

6. The cleaning bracket device according to claim 5, characterized in that: The transmission assembly (305) comprises: a rack (315) and a gear (325); wherein The rack (315) is mounted on the inner side of the static support plate (303) and meshes with the gear (325); The output end of the first driver (302) is connected to the gear (325), and the gear (325) rotates and meshes with the rack (315), thereby driving the support plate (304) to move up and down.

7. The cleaning bracket device according to claim 5, characterized in that: Also includes: A shaking mechanism (400) comprising: a supporting base (401) and a lifting assembly (402); in The lifting component (402) is movably arranged on the support base (401) so that the fixed frame (210) and the lifting movable frame (230) can move up and down on the support base (401) at the same time.

8. The cleaning bracket device according to claim 7, characterized in that: The lifting assembly (402) comprises: A lifting plate (415), a second driver (412) disposed on the lifting plate (415), a cam plate (413) driven by the second driver (412), and a lifting guide rail (414) disposed between the lifting plate (415) and a support base (401); wherein One side of the lifting plate (415) is connected to the fixed frame (210), and the other side is connected to the lifting mechanism (300). When the cam plate (413) rotates, the lifting plate (415) is driven to move up and down along the lifting guide rail (414).

9. The cleaning bracket device according to claim 1, characterized in that: A limiting member (205) is provided on the support bottom plate (220) to limit the position of the wafer basket.

10. The cleaning bracket device according to claim 1, characterized in that: A cover plate (106) is provided above the cleaning tank.

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