Water vapor separation device for tail gas treatment equipment

Abstract

The utility model provides a water vapor separation device for tail gas treatment equipment. The water vapor separation device comprises a first separation cavity and a second separation cavity which are communicated from bottom to top, tail gas flows upwards along a first circulation channel after entering the first separation cavity, then enters the first barrel and flows downwards along a second circulation channel, enters the second barrel and flows upwards along a third circulation channel, and finally enters the second separation cavity; and a vortex condensation assembly is arranged in the second separation cavity. Thus, the multi-stage water-vapor separation structure is arranged, tail gas passes through a plurality of circulation channels and is subjected to turning circulation, the condensation process of the tail gas is increased, the contact area of the tail gas and the condensation cavity is increased, the water-vapor separation effect is improved, meanwhile, the vortex condensation assembly is arranged, the tail gas forms vortexes in the circulation process, and the tail gas is condensed. The water vapor is thrown out under the action of centrifugal force, and the water vapor separation effect is further improved.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor tail gas treatment equipment, and in particular to a water vapor separation device for tail gas treatment equipment. Background Art

[0002] With the development of science and technology, the demand for chips is increasing. In the production process of chips, many processes will produce various acidic waste gases, alkaline waste gases or organic waste gases, such as chemical vapor deposition, dry etching, wet etching and various cleaning links. With the continuous improvement of environmental protection requirements, the emission requirements of industrial waste gases are also increasing. Therefore, the requirements for semiconductor tail gas treatment equipment are also getting higher and higher.

[0003] The tail gas treatment equipment in the semiconductor industry usually includes local treatment links and central treatment links at the factory end. Among them, the local treatment link usually uses semiconductor tail gas treatment equipment to treat the tail gas. Semiconductor tail gas treatment equipment usually undergoes high-temperature combustion decomposition and then water washing. The tail gas after water washing contains a large amount of water vapor. Therefore, the water vapor in the tail gas after water washing needs to be separated and then enters the central treatment system at the factory end for the next round of treatment.

[0004] The water vapor separator in the prior art usually has an unsatisfactory water vapor separation effect, resulting in a large water vapor content in the exhaust gas. Therefore, based on the above problems, the prior art needs to be further improved. Utility Model Content

[0005] In order to solve the above-mentioned technical problems, the present application provides a water vapor separation device for exhaust gas treatment equipment, including a first separation chamber and a second separation chamber connected from bottom to top; a first cylinder and a second cylinder are arranged in the first separation chamber, the top of the first cylinder is open and the bottom is provided with a drain valve, a first flow channel is formed between the first separation chamber and the first cylinder, the second cylinder is sleeved in the first cylinder, the top and bottom of the second cylinder are open, a second flow channel is formed between the first cylinder and the second cylinder, and a third flow channel is formed inside the second cylinder, after the exhaust gas enters the first separation chamber, it flows upward along the first flow channel, then enters the first cylinder and flows downward along the second flow channel, enters the second cylinder and flows upward along the third flow channel, and finally enters the second separation chamber; a vortex condensation assembly is arranged in the second separation chamber.

[0006] In some embodiments of the present application, a plurality of venturi tubes are provided in the first circulation channel, and the exhaust gas enters the venturi tubes after entering the first separation chamber and flows upward.

[0007] In some embodiments of the present application, a condensation plate spiraling upward is provided in the second cylinder.

[0008] In some embodiments of the present application, the vortex condensation assembly includes vortex condensation units that are relatively staggered, and porous fiber plates are provided on the top and bottom of the vortex condensation units. A fourth flow channel for exhaust gas to pass through is formed between each of the vortex condensation units.

[0009] In some embodiments of the present application, the fourth flow channel includes a vortex inlet, a vortex outlet and a vortex chamber. The exhaust gas enters the vortex chamber from the vortex inlet, forms a vortex airflow in the vortex chamber, and finally flows out from the vortex outlet.

[0010] In some embodiments of the present application, the vortex condensation assembly is arranged at a preset tilt angle.

[0011] In some embodiments of the present application, the vortex condensing unit includes an inner wall and an outer wall, and an inner cavity for cooling liquid to pass through is formed between the outer wall and the inner wall.

[0012] In some embodiments of the present application, a first partition and a second partition are arranged in the second separation chamber, and the first partition and the second partition divide the second separation chamber into a first cooling liquid chamber, a second cooling liquid chamber and a vortex condensation chamber. The vortex condensation assembly is arranged in the vortex condensation chamber, and the inner cavity of the condensation unit is connected to the first cooling liquid chamber and the second cooling liquid chamber respectively.

[0013] In some embodiments of the present application, a coolant outlet pipe and a coolant inlet pipe are respectively provided on the second separation chamber, and the coolant inlet pipe is higher than the coolant outlet pipe.

[0014] In some embodiments of the present application, reflux grooves are provided on both the upper surface and the lower surface of the condensation plate.

[0015] Compared with the prior art, the utility model has the following advantages and beneficial effects: the exhaust gas treatment equipment of the present application is provided with a first separation chamber and a second separation chamber in the water vapor separation device, the first separation chamber is provided with a first flow channel, a second flow channel, and a third flow channel for the exhaust gas to circulate, and a vortex condensation component is provided in the second separation chamber for condensation promotion. After the exhaust gas enters the first separation chamber, it flows upward along the first flow channel, then enters the first cylinder and flows downward along the second flow channel, then enters the second cylinder and flows upward along the third flow channel, and then enters the second separation chamber. In this way, a multi-stage water vapor separation structure is provided, and the exhaust gas passes through multiple flow channels and changes direction, which increases the condensation process of the exhaust gas, increases the contact area between the exhaust gas and the condensation chamber, and improves the water vapor separation effect. At the same time, a vortex condensation component is provided to form a vortex in the exhaust gas during the circulation process, so that the water vapor is thrown out under the action of centrifugal force, further improving the water vapor separation effect.

[0016] It is to be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The accompanying drawings constituting a part of this document are used to provide a further understanding of this document. The exemplary embodiments and descriptions of this document are used to explain this document and do not constitute an improper limitation on this document. In the accompanying drawings:

[0018] Figure 1 is a structural schematic diagram of a water vapor separation device provided by an exemplary embodiment of the present application;

[0019] Figure 2 is a cross-sectional view of a water vapor separation device provided by an exemplary embodiment of the present application;

[0020] Figure 3 yes Figure 2 Sectional view at the middle BB;

[0021] Figure 4 It is a schematic diagram of the structure of a vortex condensing assembly provided by an exemplary embodiment of the present application.

[0022] In the figure:

[0023] 91, first separation chamber; 901, first circulation channel; 902, second circulation channel; 903, third circulation channel;

[0024] 92, second separation chamber; 921, coolant outlet pipe; 922, coolant inlet pipe;

[0025] 93. First cylinder; 931. Drain valve; 94. Second cylinder; 95. Vortex condensation assembly; 951. Vortex condensation unit; 9511. Vortex inlet; 9512. Vortex outlet; 9513. Vortex chamber; 952. Porous fiberboard; 96. Condensation plate; 97. Venturi tube. DETAILED DESCRIPTION

[0026] In order to make the purpose, technical scheme and advantages of the embodiments of the present application clearer, the technical scheme in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present application. It should be noted that, in the absence of conflict, the embodiments in the present application and the features in the embodiments can be combined with each other arbitrarily.

[0027] With the development of science and technology, the demand for chips is increasing. In the production process of chips, many processes will produce various acidic waste gases, alkaline waste gases or organic waste gases, such as chemical vapor deposition, dry etching, wet etching and various cleaning links. With the continuous improvement of environmental protection requirements, the emission requirements of industrial waste gases are also increasing. Therefore, the requirements for semiconductor tail gas treatment equipment are also getting higher and higher.

[0028] The tail gas treatment equipment in the semiconductor industry usually includes local treatment links and central treatment links at the factory end. Among them, the local treatment link usually uses semiconductor tail gas treatment equipment to treat the tail gas. Semiconductor tail gas treatment equipment usually undergoes high-temperature combustion decomposition and then water washing. The tail gas after water washing contains a large amount of water vapor. Therefore, the water vapor in the tail gas after water washing needs to be separated and then enters the central treatment system at the factory end for the next round of treatment.

[0029] The water vapor separator in the prior art usually has an unsatisfactory water vapor separation effect, resulting in a large water vapor content in the exhaust gas. Therefore, based on the above problems, the prior art needs to be further improved.

[0030] Based on this, an exemplary embodiment of the present application provides a water vapor separation device for exhaust gas treatment equipment, wherein a first separation chamber and a second separation chamber are provided in the water vapor separation device, and a first flow channel, a second flow channel and a third flow channel for exhaust gas circulation are provided in the first separation chamber, and a vortex condensation component is provided in the second separation chamber for condensation promotion. After the exhaust gas enters the first separation chamber, it flows upward along the first flow channel, then enters the first cylinder and flows downward along the second flow channel, enters the second cylinder and flows upward along the third flow channel, and finally enters the second separation chamber. In this way, a multi-stage water vapor separation structure is provided, and the exhaust gas passes through multiple flow channels and changes direction, which increases the condensation process of the exhaust gas, increases the contact area between the exhaust gas and the condensation chamber, and improves the water vapor separation effect. At the same time, a vortex condensation component is provided to form a vortex in the exhaust gas during the circulation process, so that the water vapor is thrown out under the action of centrifugal force, further improving the water vapor separation effect.

[0031] An exemplary embodiment of the present application provides a tail gas treatment equipment with a water vapor separation device, such as Figure 1 and 2As shown, the water vapor separation device includes a first separation chamber 91 and a second separation chamber 92 connected from bottom to top; a sealing unit can be set between the first separation chamber 91 and the second separation chamber 92 for sealing. The outlet of the first separation chamber 91 is connected to the inlet of the second separation chamber 92, and the tail gas enters the first separation chamber 91 from the inlet of the first separation chamber 91 in sequence, and then enters the inlet of the second separation chamber 92 from the outlet of the first separation chamber 91. A first cylinder 93 and a second cylinder 94 are arranged in the first separation chamber 91. The height of the first cylinder 93 is less than the height of the first separation chamber 91. The top of the first cylinder 93 is open and a drain valve 931 is arranged at the bottom. Preferably, the drain valve 931 is a one-way valve, which is convenient for discharging the condensed water at the bottom of the first cylinder 93. At this time, the water discharged through the drain valve 931 can enter the water washing device and be reused for water washing to save water. In this way, a first flow channel 901 is formed between the first separation chamber 91 and the first cylinder 93. The second cylinder 94 is sleeved in the first cylinder 93. The height of the second cylinder 94 is smaller than that of the first cylinder. The top and bottom of the second cylinder 94 are open. The top of the second cylinder 94 is fixedly connected to the top of the first separation chamber 91. In this way, a second circulation channel 902 is formed between the first cylinder 93 and the second cylinder 94, and a third circulation channel 903 is formed inside the second cylinder 94.

[0032] After the tail gas enters the first separation chamber 91, it flows upward along the first circulation channel 901, then enters the first cylinder 93 and flows downward along the second circulation channel 902, then enters the second cylinder 94 and flows upward along the third circulation channel 903, and finally enters the second separation chamber 92; a multi-stage water vapor separation structure is set in this water vapor separation device, and the tail gas passes through multiple circulation channels and changes direction, which increases the condensation process of the tail gas, increases the contact area between the tail gas and the condensation chamber, and improves the water vapor separation effect. A vortex condensation component 95 is set in the second separation chamber 92. The vortex condensation component 95 can make the tail gas form a vortex during the circulation process, so that the water vapor is thrown out under the action of centrifugal force, further improving the water vapor separation effect. In one embodiment, a multi-layer vortex condensation component 95 can be set to further remove water vapor in the tail gas.

[0033] In one embodiment, in order to increase the flow velocity of the exhaust gas in the first separation chamber 91, a plurality of venturi tubes 97 are provided in the first flow channel 901, such as Figure 3As shown, a plurality of venturi tubes 97 are arranged between the first separation chamber 91 and the first cylinder 93, and baffles are arranged between adjacent venturi tubes 97, so that the exhaust gas cannot pass through. After the exhaust gas enters the first separation chamber 91, it enters the venturi tube 97 and flows upward. A plurality of venturi tubes 97 can also be arranged between the first cylinder 93 and the second cylinder 94 to increase the flow rate of the exhaust gas in the first separation chamber 91. At the same time, since the inner diameter of the venturi tube 97 changes, first from large to small, and then from small to large, when the exhaust gas flows through the venturi tube 97, the contact surface between the water vapor and the inner wall of the venturi tube 97 will also increase, so that the water vapor condenses into water droplets on the inner wall of the venturi tube 97 and slides down along the inner wall of the venturi tube 97.

[0034] In one embodiment, if Figure 2 As shown, a spiral upward condensation plate 96 is provided in the second cylinder 94. The spiral upward condensation plate 96 can not only block the flow of exhaust gas so that the exhaust gas enters the second cylinder 94 from the bottom of the second cylinder 94 to form a spiral upward cyclone, but also increase the contact area between water vapor and the condensation plate 96, so that water vapor condenses on the condensation plate 96. The upper and lower surfaces of the condensation plate 96 are provided with reflux grooves. The reflux grooves arranged side by side can facilitate the condensed water droplets on the condensation plate 96 to flow into the reflux grooves and finally flow back to the bottom of the first cylinder 93. When the water at the bottom of the first cylinder 93 gathers to a certain amount, the drain valve 931 is triggered to discharge the water.

[0035] like Figure 4 As shown, the vortex condensation assembly 95 includes relatively staggered vortex condensation units 951, and porous fiber plates 952 are provided on the top and bottom of the vortex condensation unit 951. Preferably, the porous fiber plates 952 can be made of staggered carbon fiber mesh or metal mesh. The droplets condensed from water vapor are captured due to surface tension and adhesion after contacting the porous fiber plate 952 mesh, and drip after accumulating to a certain extent, which can further enhance the effect of water vapor separation.

[0036] The vortex condensation unit 951 includes a semicircular second section, the two ends of which are respectively connected to the arc-shaped first section and the third section, and a fourth flow channel for the exhaust gas to pass through is formed between the staggered vortex condensation units 951. The fourth flow channel includes a vortex inlet 9511, a vortex outlet 9512 and a vortex chamber 9513. Figure 4 As shown, the exhaust gas enters the vortex chamber 9513 from the vortex inlet 9511, forms a vortex airflow in the vortex chamber 9513, and finally flows out from the vortex outlet 9512. The formation of the vortex airflow can cause the water vapor and impurity particles in the exhaust gas to be thrown out and collide with the inner wall of the vortex condensation unit 951 under the action of centrifugal force, so that the impurity particles in the exhaust gas can be further removed while separating the water vapor, and the exhaust gas can be further purified.

[0037] In order to allow the condensed water droplets to flow downward from the vortex condensation unit 951, a dripping hole for the water droplets to pass through can be set on the vortex condensation unit 951 of the lower layer, and the dripping hole and the inner cavity of the vortex condensation unit 951 are isolated from each other and not connected to each other. When the condensed water droplets pass through the dripping hole, a water film will be formed at the dripping hole, preventing the exhaust gas from flowing upward through the dripping hole. In one embodiment, in order to facilitate the condensed water droplets to flow downward, the vortex condensation component 95 can be set at a preset inclination angle. At this time, the condensed water droplets will converge to one end that is set obliquely downward. A dripping hole can be set on the lower condensation unit at the downwardly inclined end, and the condensation unit at the upwardly inclined end may not be set with a dripping hole.

[0038] In one embodiment, the second separation chamber 92 is separated by a first partition and a second partition, and the first partition and the second partition divide the second separation chamber 92 into a first cooling liquid chamber, a second cooling liquid chamber and a vortex condensation chamber. The vortex condensation unit 951 includes an inner wall and an outer wall, and an inner cavity for cooling liquid to pass through is formed between the outer wall and the inner wall. The vortex condensation assembly 95 is arranged in the vortex condensation chamber and extends to the first cooling liquid chamber and the second cooling liquid chamber, so that the inner cavity of the condensation unit is connected to the first cooling liquid chamber and the second cooling liquid chamber respectively.

[0039] like Figure 1 As shown, a coolant outlet pipe 921 and a coolant inlet pipe 922 are respectively provided on the second separation chamber 92. Specifically, the coolant outlet pipe 921 is connected to the first coolant chamber, and the coolant inlet pipe 922 is connected to the second coolant chamber. The coolant inlet pipe 922 is higher than the coolant outlet pipe 921. The coolant outlet pipe 921 and the coolant inlet pipe 922 are respectively connected to an external compressor (not shown in the figure) and a heat exchanger (not shown in the figure) to form a heat exchange circuit. At this time, the refrigerant circulating in the inner cavity of the vortex condensing unit 951 absorbs heat in the exhaust gas while condensing the exhaust gas, and the temperature rises. Then, it flows back to the compressor and the heat exchanger for refrigeration, and then flows back to the inner cavity of the vortex condensing unit 951, ensuring that the refrigerant in the inner cavity of the vortex condensing unit 951 is in a low temperature state, so that more water vapor is condensed, and the water vapor separation effect is further improved.

[0040] The water vapor separation device of the present application is provided with a multi-stage water vapor separation structure. The exhaust gas passes through multiple flow channels and changes direction, which increases the condensation process of the exhaust gas, increases the contact area between the exhaust gas and the condensation chamber, and improves the water vapor separation effect. At the same time, a vortex condensation component 95 is provided to form a vortex in the exhaust gas during the circulation process, so that the water vapor is thrown out under the action of centrifugal force, further improving the water vapor separation effect. The continuously flowing coolant in the vortex condensation component 95 keeps the vortex condensation component 95 at a low temperature, further increasing the effect of water vapor condensation and improving the water vapor separation effect.

[0041] In this application, the terms "comprises", "comprising" or any other variations thereof are intended to cover non-exclusive inclusion, so that an article or device comprising a series of elements includes not only those elements, but also other elements not explicitly listed, or elements inherent to such article or device. In the absence of more restrictions, the elements defined by the sentence "comprising..." do not exclude the presence of other identical elements in the article or device comprising the elements.

[0042] Although the preferred embodiments of the present application have been described, those skilled in the art may make other changes and modifications to these embodiments once they have learned the basic creative concept. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications falling within the scope of the present application.

[0043] Obviously, those skilled in the art can make various changes and modifications to the present application without departing from the spirit and scope of the present application. Thus, if these modifications and variations of the present application fall within the scope of the claims of the present application and their equivalents, the intention of the present application also includes these modifications and variations.

Claims

1. A water vapor separation device for tail gas treatment equipment, characterized in that: It includes a first separation chamber and a second separation chamber which are connected from bottom to top; a first cylinder and a second cylinder are arranged in the first separation chamber, the top of the first cylinder is open and the bottom is provided with a drain valve, a first circulation channel is formed between the first separation chamber and the first cylinder, the second cylinder is sleeved in the first cylinder, the top and the bottom of the second cylinder are open, a second circulation channel is formed between the first cylinder and the second cylinder, and a third circulation channel is formed inside the second cylinder; after the exhaust gas enters the first separation chamber, it flows upward along the first circulation channel, then enters the first cylinder and flows downward along the second circulation channel, enters the second cylinder and flows upward along the third circulation channel, and finally enters the second separation chamber; a vortex condensation component is arranged in the second separation chamber.

2. The water vapor separation device for tail gas treatment equipment according to claim 1, characterized in that: A plurality of venturi tubes are arranged in the first circulation channel. After the exhaust gas enters the first separation cavity, it enters the venturi tubes and flows upward.

3. The water vapor separation device for tail gas treatment equipment according to claim 1, characterized in that: A condensation plate spiraling upward is arranged in the second cylinder.

4. The water vapor separation device for tail gas treatment equipment according to claim 1, characterized in that: The vortex condensation assembly includes vortex condensation units that are relatively staggered, and the top and bottom of the vortex condensation units are both provided with porous fiber plates, and a fourth flow channel for the exhaust gas to pass through is formed between each of the vortex condensation units.

5. The water vapor separation device for tail gas treatment equipment according to claim 4, characterized in that: The fourth flow channel includes a vortex inlet, a vortex outlet and a vortex chamber. The exhaust gas enters the vortex chamber from the vortex inlet, forms a vortex airflow in the vortex chamber, and finally flows out from the vortex outlet.

6. The water vapor separation device for tail gas treatment equipment according to claim 1, characterized in that: The vortex condensation component is arranged at a preset inclination angle.

7. The water vapor separation device for tail gas treatment equipment according to claim 4, characterized in that: The vortex condensing unit comprises an inner wall and an outer wall, and an inner cavity for cooling liquid to pass through is formed between the outer wall and the inner wall.

8. The water vapor separation device for tail gas treatment equipment according to claim 7, characterized in that: The second separation chamber is provided with a first partition and a second partition, the first partition and the second partition divide the second separation chamber into a first cooling liquid chamber, a second cooling liquid chamber and a vortex condensation chamber, the vortex condensation assembly is arranged in the vortex condensation chamber, and the inner cavity of the condensation unit is connected to the first cooling liquid chamber and the second cooling liquid chamber respectively.

9. The water vapor separation device for tail gas treatment equipment according to claim 8, characterized in that: The second separation chamber is provided with a coolant outlet pipe and a coolant inlet pipe, respectively, and the coolant inlet pipe is higher than the coolant outlet pipe.

10. The water vapor separation device for tail gas treatment equipment according to claim 3, characterized in that: Reflux grooves are arranged on the upper surface and the lower surface of the condensation plate.

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