Dry etching machine for chip production

Abstract

The utility model discloses a dry etching machine for chip production, which comprises a reaction bin, an exhaust mechanism is arranged on the outer side of the reaction bin and used for treating toxic gas in the reaction bin, and the exhaust mechanism comprises an air inducing assembly arranged on the right side of the reaction bin and used for improving the efficiency of absorbing the toxic gas; the air draft assembly is arranged on the front side of the reaction bin and is used for removing toxic gas in the reaction bin; and the filtering assembly is arranged on the front side of the reaction bin and is used for filtering and purifying the toxic gas. According to the dry etching machine for chip production, the filter frame can be conveniently disassembled and cleaned through the arranged clamping plate, during use, a handle is pulled to move towards the opposite side, then the handle drives the clamping plate to be pulled out of the interior of a clamping groove, then the handle is lifted up, the filter frame can be taken out of the interior of the filter box, then an HEPA filter screen and an activated carbon filter screen can be cleaned, and the chip production efficiency is improved. Cleaning is convenient, and practicability is good.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a dry etching machine for chip production. Background Art

[0002] A dry etcher is a device that uses high-energy ion beams or plasma to physically or chemically etch semiconductor materials. In chip production, a dry etcher is a key device that is mainly used to perform precise etching operations during chip manufacturing. The main etching gas in the dry etching process is boron trichloride, which is a colorless, toxic and harmful gas. Boron trichloride is heated to change from liquid to gas and then introduced into the cavity. It undergoes a chemical or physical reaction with the product through plasma to achieve a process of etching the product. The equipment needs to be maintained after a certain number of days of use. Because boron trichloride gas is introduced into the dry etching process, a large amount of toxic and pungent chlorinated substances will remain in the chamber. Therefore, a purge action is required before maintenance to clean the chamber through reaction to reduce the odor in the chamber and ensure personnel safety.

[0003] The existing dry etcher for chip production still has the following problems. The existing devices generally use suction to clean and reduce the odor in the chamber. A dry etcher for chip production disclosed in a patent application with reference to publication number CN217933732U uses air replacement to remove chlorides in the reaction chamber, thereby greatly improving the cleaning efficiency and solving the technical problem of low efficiency caused by using gas purge to remove toxic gases in the reaction chamber of the etcher in the prior art.

[0004] However, the above-mentioned technology directly removes the toxic gas in the reaction chamber of the etcher through the suction mechanism, while the existing device needs to be equipped with an external filtering device to filter and purify the toxic gas before discharging it, which requires additional space for installation and maintenance, is inconvenient to use, and the cleaning filter device needs to be cleaned or replaced regularly, and the disassembly and cleaning of the external equipment is also inconvenient, and the practicality is general. Utility Model Content

[0005] In view of the deficiencies in the prior art, the utility model provides a dry etcher for chip production, which solves the problem that the existing dry etcher for chip production needs to be equipped with an external filtering device to filter toxic gases, is inconvenient to use, and is inconvenient to disassemble and clean the filtering device, and has general practicality.

[0006] To achieve the above purpose, the utility model is implemented by the following technical scheme: A dry etching machine for chip production, including a reaction chamber, an exhaust mechanism is arranged outside the reaction chamber for treating the toxic gas in the reaction chamber, and the exhaust mechanism includes:

[0007] The air induction component is arranged on the right side of the reaction chamber to improve the efficiency of absorbing toxic gases;

[0008] An exhaust assembly is arranged at the front side of the reaction chamber to remove the toxic gas inside the reaction chamber;

[0009] A filter assembly is arranged at the front side of the reaction chamber for filtering and purifying toxic gases. The filter assembly includes a filter box fixedly installed on the front side of the reaction chamber, a filter frame is movably installed inside the filter box, an air outlet pipe is fixedly installed on the left side of the filter box, a HEPA filter and two activated carbon filters are fixedly installed inside the filter frame, and a limiting assembly is arranged on the top surface of the filter frame.

[0010] Preferably, the limiting assembly includes two movable grooves opened on the top surface of the filter frame, two springs are fixedly installed on the opposite sides of the two movable grooves, a clamping plate is slidably installed inside the two movable grooves, a handle is fixedly installed on the top surface of the clamping plate, and clamping grooves are opened on the front and rear sides of the inner cavity of the filter box, and the top surface of the filter frame is movable through the interior of the filter box and extends to the top surface of the filter box.

[0011] Preferably, the top surface of the handle passes through the interior of the two movable grooves and extends to the top surface of the two movable grooves, one side of the card plate passes through the interior of the two movable grooves and extends to the interior of the card slot, and one end of the two springs is fixedly mounted on one side of the card plate.

[0012] Preferably, the air induced assembly includes a plurality of air induced ports and slot frames opened on the right side of the reaction bin, mounting plates are fixedly installed on the front and rear sides of the reaction bin, an electric telescopic rod is fixedly installed on the right side of the mounting plate, a side panel is fixedly installed on the output end of the electric telescopic rod, and a sealing frame is fixedly installed on the left side of the side panel.

[0013] Preferably, the left side of the sealing frame is closely attached to the inside of the groove frame.

[0014] Preferably, a valve tube and an exhaust fan are fixedly installed on the front side of the reaction chamber, an exhaust pipe is fixedly installed on the front end of the valve tube, a gas detector is fixedly installed on the top surface of the exhaust pipe, the output end of the gas detector passes through the top surface of the exhaust pipe and extends to the interior of the exhaust pipe, the left end of the exhaust pipe is fixedly installed on the input end of the exhaust fan, and the output end of the exhaust fan passes through the right side of the filter box and extends to the interior of the filter box.

[0015] Beneficial Effects

[0016] The utility model provides a dry etching machine for chip production. Compared with the prior art, it has the following beneficial effects:

[0017] (1) The dry etching machine used for chip production facilitates the disassembly and cleaning of the filter frame by means of a card plate. When in use, the handle is pulled to the opposite side, and then the handle drives the card plate to be pulled out of the card slot. Then, the handle is lifted to take the filter frame out of the filter box, and then the HEPA filter and the activated carbon filter can be cleaned. It is easy to clean and has good practicality.

[0018] (2) The dry etching machine used in chip production can filter toxic gases through the HEPA filter and activated carbon filter. When in use, the valve pipe is opened to start the exhaust fan to suck the toxic gases in the reaction chamber into the interior of the filter box through the valve pipe and the exhaust pipe. Then the HEPA filter and activated carbon filter will filter and purify the toxic gases entering the filter box, and then discharge them through the outlet pipe, which takes up less space and is convenient to use. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a three-dimensional appearance schematic diagram of the utility model;

[0020] Figure 2 This is a schematic diagram of the cross-sectional three-dimensional appearance of the air induction component of the utility model;

[0021] Figure 3 This is a three-dimensional schematic diagram of the exhaust assembly of the utility model;

[0022] Figure 4 This is a three-dimensional appearance diagram of the filter assembly of the utility model;

[0023] Figure 5 This is a front cross-sectional three-dimensional appearance schematic diagram of the filter assembly of the utility model;

[0024] Figure 6 It is a schematic diagram of the side cross-sectional three-dimensional appearance of the filter assembly of the present invention.

[0025] In the figure: 1-reaction chamber, 2-exhaust mechanism, 21-air induction component, 211-electric telescopic rod, 212-side panel, 213-air inlet, 214-slot frame, 215-sealing frame, 216-mounting plate, 22-exhaust component, 221-valve pipe, 222-exhaust pipe, 223-gas detector, 224-exhaust fan, 23-filter component, 231-filter box, 232-air outlet pipe, 233-filter frame, 234-handle, 235-movable slot, 236-cage, 237-spring, 238-HEPA filter, 239-activated carbon filter, 2310-cage. DETAILED DESCRIPTION

[0026] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0027] The utility model provides two technical solutions:

[0028] Figure 1-Figure 6 The first embodiment is shown: a dry etching machine for chip production, comprising a reaction chamber 1, an exhaust mechanism 2 is arranged outside the reaction chamber 1 for treating the toxic gas in the reaction chamber 1, and the exhaust mechanism 2 comprises:

[0029] The air induction component 21 is arranged on the right side of the reaction chamber 1 to improve the efficiency of absorbing toxic gases;

[0030] The exhaust assembly 22 is arranged at the front side of the reaction chamber 1 and is used to remove the toxic gas inside the reaction chamber 1;

[0031] The filter assembly 23 is arranged at the front side of the reaction chamber 1 for filtering and purifying the toxic gas. The filter assembly 23 includes a filter box 231 fixedly installed at the front side of the reaction chamber 1. A filter frame 233 is movably installed inside the filter box 231, and a sealing strip is installed on the top surface of the outer side of the filter frame 233 to improve the sealing performance of the filter box 231. An air outlet pipe 232 is fixedly installed on the left side of the filter box 231. A HEPA filter 238 and two activated carbon filters 239 are fixedly installed inside the filter frame 233. , and the HEPA filter 238 is located between the two activated carbon filters 239, a limit assembly is provided on the top surface of the filter frame 233, the air induction assembly 21 includes a plurality of air inlets 213 and a slot frame 214 opened on the right side of the reaction chamber 1, and the plurality of air inlets 213 are linearly and evenly distributed on the right side of the reaction chamber 1, and mounting plates 216 are fixedly installed on both the front and rear sides of the reaction chamber 1, and an electric telescopic rod 211 is fixedly installed on the right side of the mounting plate 216, and a side plate is fixedly installed on the output end of the electric telescopic rod 211 212, a sealing frame 215 is fixedly installed on the left side of the side plate 212, and the left side of the sealing frame 215 is closely attached to the inside of the slot frame 214, and the electric telescopic rod 211 can be started to drive the side plate 212 to insert the sealing frame 215 into the inside of the slot frame 214 to block a plurality of air inlets 213 to prevent the leakage of harmful gases, and a valve pipe 221 and an exhaust fan 224 are fixedly installed on the front side of the reaction chamber 1, and an exhaust pipe 222 is fixedly installed on the front end of the valve pipe 221, and a gas detection device is fixedly installed on the top surface of the exhaust pipe 222. The output end of the gas detector 223 passes through the top surface of the exhaust pipe 222 and extends to the interior of the exhaust pipe 222, and the concentration of harmful gases can be detected by the gas detector 223. The left end of the exhaust pipe 222 is fixedly installed on the input end of the exhaust fan 224. The output end of the exhaust fan 224 passes through the right side of the filter box 231 and extends to the interior of the filter box 231. By opening the valve pipe 221 and turning on the exhaust fan 224, the toxic gas can be sucked into the filter component 23 for filtering and purification.

[0032] Toxic gases can be filtered through the HEPA filter 238 and the activated carbon filter 239. When in use, the valve pipe 221 is opened to start the exhaust fan 224 to suck the toxic gases in the reaction chamber 1 into the interior of the filter box 231 through the valve pipe 221 and the exhaust pipe 222. Then the HEPA filter 238 and the activated carbon filter 239 will filter and purify the toxic gases entering the filter box 231, and then discharge them through the outlet pipe 232, which takes up less space and is convenient to use.

[0033] Figure 1 and Figure 3-Figure 6The second embodiment is shown, which is mainly different from the first embodiment in that: the limiting assembly includes two movable grooves 235 opened on the top surface of the filter frame 233, two springs 237 are fixedly installed on the opposite sides of the two movable grooves 235, and a clamping plate 236 is slidably installed inside the two movable grooves 235. A handle 234 is fixedly installed on the top surface of the clamping plate 236. The front and rear sides of the inner cavity of the filter box 231 are provided with a clamping groove 2310. The top surface of the filter frame 233 movably penetrates the interior of the filter box 231 and extends to the filter box 231. The top surface of the handle 234 passes through the interior of the two movable grooves 235 and extends to the top surface of the two movable grooves 235, and pulling the handle 234 facilitates the card plate 236 to be pulled out from the interior of the card slot 2310. One side of the card plate 236 passes through the interior of the two movable grooves 235 and extends to the interior of the card slot 2310. One end of the two springs 237 is fixedly installed on one side of the card plate 236, and the elastic force of the two springs 237 can drive the card plate 236 to be inserted into the interior of the card slot 2310 to fix the filter frame 233.

[0034] The provided card plate 236 facilitates the disassembly and cleaning of the filter frame 233. When in use, the handle 234 is pulled to move to the opposite side, and then the handle 234 will drive the card plate 236 to be pulled out of the inside of the card slot 2310. Then, the handle 234 can be lifted to take the filter frame 233 out of the inside of the filter box 231, and then the HEPA filter 238 and the activated carbon filter 239 can be cleaned, which is easy to clean and has good practicality.

[0035] Meanwhile, the contents not described in detail in this specification belong to the prior art known to those skilled in the art, and the model parameters of each electrical appliance are not specifically limited, and conventional equipment can be used.

[0036] When in use, the user opens the valve tube 221 and starts the exhaust fan 224 to suck the toxic gas in the reaction chamber 1 into the interior of the filter box 231 through the valve tube 221 and the exhaust pipe 222, and at the same time starts the mounting plate 216 to drive the side plate 212 to pull the sealing frame 215 out of the interior of the slot frame 214. At this time, the suction force of the exhaust fan 224 can make fresh air pour into the interior of the reaction chamber 1 from the air inlet 213, and then the HEPA filter 238 and the activated carbon filter 239 will filter and purify the toxic gas entering the interior of the filter box 231. When the HEPA filter 238 and the activated carbon filter 239 need to be cleaned, the HEPA filter 238 and the activated carbon filter 239 will be cleaned. When cleaning the filter 239, pull the handle 234 to move to the opposite side, and then the handle 234 will drive the card plate 236 to pull out the inside of the card slot 2310, and then lift the handle 234 to take the filter frame 233 out of the filter box 231, and then the HEPA filter 238 and the activated carbon filter 239 can be cleaned. After cleaning, put the filter frame 233 into the filter box 231, and then release the handle 234. The elastic force of the spring 237 will drive the card plate 236 to insert into the inside of the card slot 2310 to fix the position of the filter frame 233, and then it can continue to be used.

[0037] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include"-"comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process-method-article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process-method-article or device.

[0038] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A dry etching machine for chip production, comprising a reaction chamber (1), characterized in that: An exhaust mechanism (2) is arranged outside the reaction chamber (1) for treating toxic gases in the reaction chamber (1), and the exhaust mechanism (2) comprises: An air induction component (21) is arranged on the right side of the reaction chamber (1) and is used to improve the efficiency of absorbing toxic gases; An exhaust assembly (22) is arranged at the front side of the reaction chamber (1) and is used to remove toxic gases inside the reaction chamber (1); A filter assembly (23) is arranged at the front side of the reaction chamber (1) and is used for filtering and purifying toxic gases. The filter assembly (23) comprises a filter box (231) fixedly mounted at the front side of the reaction chamber (1), a filter frame (233) is movably mounted inside the filter box (231), an air outlet pipe (232) is fixedly mounted on the left side of the filter box (231), a HEPA filter (238) and two activated carbon filters (239) are fixedly mounted inside the filter frame (233), and a limit assembly is arranged on the top surface of the filter frame (233).

2. A dry etching machine for chip production according to claim 1, characterized in that: The limiting assembly comprises two movable grooves (235) formed on the top surface of the filter frame (233); two springs (237) are fixedly mounted on opposite sides of the two movable grooves (235); a clamping plate (236) is slidably mounted inside the two movable grooves (235); a handle (234) is fixedly mounted on the top surface of the clamping plate (236); clamping grooves (2310) are formed on both the front and rear sides of the inner cavity of the filter box (231); and the top surface of the filter frame (233) movably penetrates the interior of the filter box (231) and extends to the top surface of the filter box (231).

3. A dry etching machine for chip production according to claim 2, characterized in that: The top surface of the handle (234) passes through the interior of the two movable grooves (235) and extends to the top surface of the two movable grooves (235), one side of the clamping plate (236) movably passes through the interior of the two movable grooves (235) and extends to the interior of the clamping groove (2310), and one end of the two springs (237) is fixedly mounted on one side of the clamping plate (236).

4. The dry etching machine for chip production according to claim 1, characterized in that: The air induction assembly (21) comprises a plurality of air induction ports (213) and a slot frame (214) which are arranged on the right side of the reaction chamber (1); a mounting plate (216) is fixedly mounted on both the front and rear sides of the reaction chamber (1); an electric telescopic rod (211) is fixedly mounted on the right side of the mounting plate (216); a side plate (212) is fixedly mounted on the output end of the electric telescopic rod (211); and a sealing frame (215) is fixedly mounted on the left side of the side plate (212).

5. A dry etching machine for chip production according to claim 4, characterized in that: The left side of the sealing frame (215) is closely attached to the inside of the groove frame (214).

6. The dry etching machine for chip production according to claim 1, characterized in that: A valve tube (221) and an exhaust fan (224) are fixedly mounted on the front side of the reaction chamber (1); an exhaust pipe (222) is fixedly mounted on the front end of the valve tube (221); a gas detector (223) is fixedly mounted on the top surface of the exhaust pipe (222); an output end of the gas detector (223) passes through the top surface of the exhaust pipe (222) and extends to the interior of the exhaust pipe (222); a left end of the exhaust pipe (222) is fixedly mounted on the input end of the exhaust fan (224); and an output end of the exhaust fan (224) passes through the right side of the filter box (231) and extends to the interior of the filter box (231).

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