Crystalline silicon battery piece surface texturing device

Abstract

The utility model discloses a crystalline silicon battery piece surface texturing device which comprises a rack, a transmission roller and a limiting roller are rotatably connected in the rack, a driving motor for driving the transmission roller to rotate is installed on one side of the rack, a heat preservation and moisture preservation structure is arranged on the outer wall of the transmission roller, and the limiting roller is installed on the rack. Spraying frames for texturing and cleaning are fixed at the two ends of the rack through screws; according to the utility model, the crystal silicon wafer aligning mechanism is arranged between the two spraying frames, so that when the crystal silicon wafers are washed by different solutions before and after texturing, the crystal silicon wafers can be prevented from deviating from the driving roller more and more in a longer conveying process through the aligning mechanism, and the corners of the adjacent crystal silicon wafers are prevented from being overlapped; the ceramic cylinder and the flannelette are fixed on the outer wall of the transmission roller, so that the flannelette is immersed in the cleaning solution, the contact time of the cleaning solution and the crystal silicon wafer can be prolonged, and the acid loss of the prepared solution in the air is reduced by reducing the spraying speed and reducing the solution circulation times.

Description

Technical Field

[0001] The utility model relates to the technical field of crystalline silicon processing, in particular to a device for making texture on the surface of a crystalline silicon battery sheet. Background Art

[0002] Surface texturing of crystalline silicon wafers is a process of using chemical reagents to corrode the surface of silicon wafers to form a 1-3μm pyramid structure on the silicon surface, which can change the reflectivity of the surface of the crystalline silicon wafer. Surface texturing of crystalline silicon wafers mainly includes cleaning before texturing, two texturings, and alkaline washing, deionized water rinsing and hydrofluoric acid rinsing during texturing. Among them, hydrofluoric acid rinsing is divided into spray type and immersion type cleaning.

[0003] Chinese patent CN114686988A discloses a single crystal silicon wafer texturing device, including a workbench, on which are provided a feeding device for supplying crystalline silicon wafers, a liquid supply device for providing texturing crystalline silicon wafers, and a reaction device for texturing reaction. After the feeding device delivers the crystalline silicon wafer to the reaction device, the liquid supply device delivers the texturing liquid to the reaction device. After the texturing of the crystalline silicon wafer is completed, the reaction device pours out the crystalline silicon wafer and the texturing liquid for next use.

[0004] This device overcomes the differences in the etching degree of crystalline silicon wafers by making the device obtain the same concentration and the same height of texturing liquid each time. However, this device and the commonly used feeding equipment in the prior art both use transmission rollers to transmit crystalline silicon wafers. The outer wall structure of the transmission roller is simple and does not have the effect of heat preservation and moisture retention. When the heated liquid is used to rinse the crystalline silicon wafers, the contact time between the reaction liquid and the crystalline silicon wafers is short, and continuous rinsing is required. The rinse liquid after rinsing enters the cycle, causing the volatility or acidity of the rinse liquid in each rinse to be greatly lost during the circulation process; and during the transmission process, the transmission roller transports multiple silicon wafers side by side at one time. When the processing conveyor line is long, the crystalline silicon wafers are skewed and the corners are easily overlapped, affecting the cleaning effect. Utility Model Content

[0005] The purpose of the utility model is to provide a device for texturing the surface of a crystalline silicon cell, so as to solve the problems mentioned in the background technology that the flushing liquid circulates at a fast speed, resulting in large losses during the circulation process, and the crystalline silicon wafers are tilted and overlapped at the corners during transportation, which affects the cleaning effect.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a crystalline silicon cell surface texturing device, comprising a frame, a transmission roller and a limit roller are rotatably connected in the frame, a driving motor for driving the transmission roller to rotate is installed on one side of the frame, a heat preservation and moisture retention structure is provided on the outer wall of the transmission roller, a texturing cleaning spray rack is fixed to both ends of the frame by screws, a delivery pipeline for hydrofluoric acid is installed in the spray rack, a nozzle is connected to the outer wall of the delivery pipeline, and a crystalline silicon wafer alignment mechanism is provided on the top of the frame;

[0007] The heat preservation and moisture retention structure comprises a ceramic cylinder and flannel, wherein the ceramic cylinder is fixed to the outer wall of the transmission roller, and the flannel is wrapped around the outer wall of the ceramic cylinder and is fixedly connected to the ceramic cylinder;

[0008] The silicon wafer alignment mechanism comprises an alignment bracket. Fixing frames are fixed on both sides of the frame. A flipping mechanism for driving the alignment bracket to rise, fall and flip is installed in the fixing frame.

[0009] Preferably, the alignment bracket is arranged in a rectangular shape, and a material trough for the crystal silicon wafer to enter is opened at one end of the alignment bracket, and a vacuum suction cup is installed in the material trough.

[0010] Preferably, the material troughs and vacuum suction cups are provided in several groups, partitions are fixed between adjacent material troughs, and guide cutouts are provided on the side walls of the two material troughs at both ends.

[0011] Preferably, the flipping mechanism comprises a lifting plate, which is slidably connected in a fixing frame, a cylinder is installed on one side of the fixing frame, and two telescopic ends of the cylinder are fixedly connected to two ends of the lifting plate respectively.

[0012] Preferably, the flipping mechanism also includes a flipping motor, the alignment bracket is rotatably connected to the middle part of the lifting plate, the output end of the flipping motor is fixedly connected to the rotating shaft of the alignment bracket through a rotating shaft, and the flipping motor is fixed above the lifting plate by screws.

[0013] Preferably, two spray racks are provided, and the alignment bracket is located between the two spray racks.

[0014] Preferably, a plurality of the delivery pipes and nozzles are provided, and the plurality of delivery pipes are arranged in a linear manner.

[0015] Compared with the prior art, the beneficial effects of the utility model are:

[0016] The utility model provides a crystalline silicon wafer alignment mechanism between two spray racks, so that when the crystalline silicon wafer is rinsed with different solutions before and after texturing, the crystalline silicon wafer can be prevented from increasingly deviating from the transmission roller during a long transmission process through the alignment mechanism, resulting in overlapping of the corners of adjacent crystalline silicon wafers; by fixing a ceramic cylinder and flannel cloth on the outer wall of the transmission roller and immersing the flannel cloth in the cleaning liquid, the contact time between the cleaning liquid and the crystalline silicon wafer can be prolonged, and by reducing the spraying speed and the number of solution circulations, the acid loss of the prepared solution in the air can be reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is an axonometric drawing of the utility model;

[0018] Figure 2It is a structural schematic diagram of the crystalline silicon wafer alignment mechanism of the utility model;

[0019] Figure 3 It is a structural schematic diagram of the spray rack of the utility model;

[0020] Figure 4 It is a structural schematic diagram of the heat preservation and moisture retention structure of the utility model.

[0021] In the figure: 1. frame; 2. transmission roller; 3. limiting roller; 4. driving motor; 5. heat preservation and moisture retention structure; 6. spray rack; 7. conveying pipeline; 8. nozzle; 9. wafer alignment mechanism; 501. ceramic cylinder; 502. flannel; 901. alignment bracket; 902. fixing frame; 903. material trough; 904. vacuum suction cup; 905. partition; 906. guide incision; 10. flipping mechanism; 1001. lifting plate; 1002. cylinder; 1003. flipping motor. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0023] See also Figure 1-4 The utility model provides a technical solution: a crystalline silicon cell surface texturing device, comprising a frame 1, a transmission roller 2 and a limit roller 3 are rotatably connected in the frame 1, a driving motor 4 for driving the transmission roller 2 to rotate is installed on one side of the frame 1, a heat preservation and moisture retention structure 5 is arranged on the outer wall of the transmission roller 2, a spray frame 6 for texturing and cleaning is fixed by screws at both ends of the frame 1, a delivery pipe 7 for hydrofluoric acid to pass into is installed in the spray frame 6, a nozzle 8 is connected to the outer wall of the delivery pipe 7, and a crystalline silicon wafer alignment mechanism 9 is arranged on the top of the frame 1;

[0024] The heat preservation and moisture retention structure 5 includes a ceramic cylinder 501 and a flannel 502. The ceramic cylinder 501 is fixed to the outer wall of the transmission roller 2. The flannel 502 is wrapped around the outer wall of the ceramic cylinder 501 and is fixedly connected to the ceramic cylinder 501.

[0025] By providing a heat-insulating and moisture-retaining structure 5, when the heated texturing cleaning liquid or pure water is used to rinse the silicon wafer, part of the cleaning liquid can be immersed in the flannel cloth 502, thereby increasing the residence time of the cleaning liquid. The heat of the cleaning liquid is exchanged in the ceramic tube 501, so that the silicon wafer moving on the transmission roller 2 can slow down the heat loss rate, which is beneficial to the reaction between the cleaning liquid and the silicon wafer surface. This method can reduce the loss of heat or the pH value of the cleaning liquid.

[0026] The wafer alignment mechanism 9 comprises an alignment bracket 901 , and fixing frames 902 are fixed on both sides of the frame 1 . A flipping mechanism 10 for driving the alignment bracket 901 to rise, fall and flip is installed in the fixing frames 902 .

[0027] The alignment bracket 901 is arranged in a rectangular shape. A material slot 903 for the crystal silicon wafer to enter is opened at one end of the alignment bracket 901 . A vacuum suction cup 904 is installed in the material slot 903 .

[0028] By providing a vacuum suction cup 904, the crystalline silicon wafer entering the material tank 903 is adsorbed and fixed, so that it is easy to be turned over.

[0029] Several groups of material troughs 903 and vacuum suction cups 904 are provided, partitions 905 are fixed between adjacent material troughs 903, and guide cutouts 906 are provided on the side walls of the two material troughs 903 at both ends.

[0030] By providing the guide cutout 906 , when the deflection of the crystalline silicon wafer is small, it is convenient for the crystalline silicon wafer to enter the material trough 903 .

[0031] The flip mechanism 10 includes a lifting plate 1001, which is slidably connected in the fixing frame 902. A cylinder 1002 is installed on one side of the fixing frame 902. The telescopic ends of the two cylinders 1002 are respectively fixedly connected to the two ends of the lifting plate 1001. The height of the alignment bracket 901 is adjusted by setting the lifting plate 1001.

[0032] The flip mechanism 10 also includes a flip motor 1003. The alignment bracket 901 is rotatably connected to the middle of the lifting plate 1001. The output end of the flip motor 1003 is fixedly connected to the rotating shaft of the alignment bracket 901 through a rotating shaft. The flip motor 1003 is fixed to the upper part of the lifting plate 1001 through screws. When the flip motor 1003 is started, the alignment bracket 901 is deflected and then flipped, and the silicon wafer on the driving roller 2 is picked up, flipped, and then released.

[0033] Two spray racks 6 are provided, and the alignment bracket 901 is located between the two spray racks 6 .

[0034] There are a plurality of delivery pipes 7 and nozzles 8, and the plurality of delivery pipes 7 are arranged in a linear manner.

[0035] When in use, the crystal silicon wafer is placed on the transmission roller 2. The driving transmission mode of the transmission roller 2 is the same as that of the transmission roller of the existing equipment. When the transmission roller 2 rotates, the crystal silicon wafer is located between the transmission roller 2 and the limiting roller 3 and moves. The conveying pipe 7 is connected to the liquid inlet system, so that the cleaning liquid enters the conveying pipe 7 and is sprayed out by the nozzle 8 to wash the surface of the crystal silicon wafer. When the crystal silicon wafer moves close to the alignment bracket 901, the flip motor 1003 is started, and the alignment bracket 901 is deflected. The alignment bracket 901 picks up the crystal silicon wafer on the transmission roller 2: under the transmission of the transmission roller 2, the crystal silicon wafer enters the inclined alignment bracket 901. At this time, the flip motor 1003 is used to tilt the alignment bracket 901 in the opposite direction, so that the crystal silicon wafer is in a tilted state. One side of the crystal silicon wafer is close to the material trough 903, and the vacuum suction cup 904 is started to suck tightly. At this time, the crystal silicon wafer will not tilt in each material trough 903, so as to avoid overlapping of the edges and corners of adjacent crystal silicon wafers and affect the washing;

[0036] The alignment bracket 901 is flipped 180° by the flipping motor 1003, and the vacuum suction cup 904 is released to shorten the telescopic end of the cylinder 1002 and lower the lifting plate 1001. After flipping and release, the silicon wafer is adjusted in position and then continues to enter another spray rack 6 for texturing and washing.

[0037] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A device for texturing the surface of a crystalline silicon cell, characterized in that: The invention comprises a frame (1), wherein a transmission roller (2) and a limit roller (3) are rotatably connected in the frame (1), a driving motor (4) for driving the transmission roller (2) to rotate is installed on one side of the frame (1), a heat preservation and moisture retention structure (5) is provided on the outer wall of the transmission roller (2), a spray frame (6) for velvet cleaning is fixed to both ends of the frame (1) by screws, a delivery pipe (7) for hydrofluoric acid to pass through is installed in the spray frame (6), a nozzle (8) is connected to the outer wall of the delivery pipe (7), and a silicon wafer alignment mechanism (9) is provided on the top of the frame (1); The heat preservation and moisture retention structure (5) comprises a ceramic cylinder (501) and a flannel (502), wherein the ceramic cylinder (501) is fixed to the outer wall of the transmission roller (2), and the flannel (502) is wrapped around the outer wall of the ceramic cylinder (501) and is fixedly connected to the ceramic cylinder (501); The silicon wafer alignment mechanism (9) comprises an alignment bracket (901), fixed frames (902) are fixed on both sides of the frame (1), and a flipping mechanism (10) for driving the alignment bracket (901) to rise, fall and flip is installed in the fixed frame (902).

2. The device for texturing the surface of a crystalline silicon cell according to claim 1, characterized in that: The alignment bracket (901) is arranged in a rectangular shape, and a material trough (903) for the crystal silicon wafer to enter is opened at one end of the alignment bracket (901), and a vacuum suction cup (904) is installed in the material trough (903).

3. The device for texturing the surface of a crystalline silicon cell according to claim 2, characterized in that: The material troughs (903) and vacuum suction cups (904) are provided in several groups, partitions (905) are fixed between adjacent material troughs (903), and guide cutouts (906) are provided on the side walls of the two material troughs (903) at both ends.

4. The device for texturing the surface of a crystalline silicon cell according to claim 3, characterized in that: The turning mechanism (10) comprises a lifting plate (1001), wherein the lifting plate (1001) is slidably connected in a fixing frame (902), a cylinder (1002) is installed on one side of the fixing frame (902), and the telescopic ends of the two cylinders (1002) are respectively fixedly connected to the two ends of the lifting plate (1001).

5. The device for texturing the surface of a crystalline silicon cell according to claim 4, characterized in that: The flipping mechanism (10) further comprises a flipping motor (1003); the alignment bracket (901) is rotatably connected to the middle part of the lifting plate (1001); the output end of the flipping motor (1003) is fixedly connected to the rotating shaft of the alignment bracket (901) via a rotating shaft; and the flipping motor (1003) is fixed above the lifting plate (1001) via screws.

6. The device for texturing the surface of a crystalline silicon cell according to claim 5, characterized in that: Two spray racks (6) are provided, and the alignment bracket (901) is located between the two spray racks (6).

7. The device for texturing the surface of a crystalline silicon cell according to claim 1, characterized in that: A plurality of the delivery pipes (7) and nozzles (8) are provided, and the plurality of delivery pipes (7) are arranged in a linear manner.

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