Electron beam evaporation device

Abstract

The utility model belongs to the technical field of vacuum chambers, and particularly relates to an electron beam evaporation device which comprises a vacuum chamber door and a vacuum cavity, the vacuum chamber door is fixedly installed in the vacuum cavity, an automatic uniformizing baffle is fixedly installed on the side face of the vacuum cavity, a rotary drive is arranged in the vacuum cavity, and a vacuum pump system is installed on the side face of one end of the vacuum cavity. According to the electron beam evaporation device, crucible cooling water and high-pressure cooling water are separated and independently supplied, water paths are not in the atmosphere, dew formation and high-pressure burning are not prone to being formed, the crucible and the electron beam generation device are arranged on the same body and are installed in an outer winding mode with the high-pressure generation device as the center, and therefore the relative distance is small, the crucible can occupy large space, and the heat exchange efficiency is improved. Due to the fact that the capacity of the crucible is large, the process application range is wide, the crucible is suitable for products with different thicknesses, especially products needing a large amount of abrasive materials, the capacity of the crucible can be adjusted at will, and the large crucible does not need to be installed or redesigned by changing the position of the crucible.

Description

Technical Field

[0001] The utility model relates to the technical field of vacuum chambers, in particular to an electron beam evaporation device. Background Art

[0002] Electron beam evaporation is a type of vacuum evaporation coating. It is a method that uses electron beams to directly heat the evaporation material under vacuum conditions, vaporizes the evaporation material and transports it to the substrate, and condenses on the substrate to form a thin film. In the electron beam heating device, the heated material is placed in a water-cooled crucible to prevent the evaporation material from reacting with the crucible wall to affect the quality of the film. Therefore, the electron beam evaporation deposition method can prepare high-purity thin films.

[0003] The main structures of the current electron beam generating devices include a long integrated structure and a split structure. The long integrated structure introduces the crucible and the electron beam generating device into the vacuum chamber through a hole. The high-voltage components, coils, and crucibles are water-cooled together, which can easily cause insufficient high-voltage cooling, leading to burnout, or condensation due to changes in ambient humidity and temperature, leading to burnout. When more abrasives are needed for coating, the crucible needs to be enlarged, which causes the entire electron gun structure to be enlarged and needs to be redesigned. The split type requires reselection of the location of the crucible or the electron beam generating device.

[0004] To this end, we proposed an electron beam evaporation device to solve the above problems. Utility Model Content

[0005] The purpose of the utility model is to provide an electron beam evaporation device to solve the problems raised in the above background technology.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: an electron beam evaporation device, comprising a vacuum chamber door and a vacuum cavity, wherein the vacuum chamber door is fixedly mounted on the vacuum cavity, an automatic uniform baffle is fixedly mounted on the side of the vacuum cavity, a rotary drive is arranged inside the vacuum cavity, a vacuum pump system is mounted on the side of one end of the vacuum cavity, an electron evaporation system and an ion assist system are arranged inside the vacuum pump system, a manual uniform baffle is mounted on the upper part of the vacuum cavity, a substrate working disk is mounted on the upper surface of the manual uniform baffle, a workpiece disk carrier is mounted above the substrate working disk, a correction plate is mounted on the bottom surface of the manual uniform baffle, a vacuum chamber bottom plate is fixedly mounted on the inner bottom surface of the electron evaporation system, and the vacuum chamber bottom plate A crucible is fixedly installed on the surface of the plate, a high-voltage electrode seat is installed at the height of the top surface of the crucible, a deflection coil is installed inside the high-voltage electrode seat, an electromagnet is fixedly installed on one end of the deflection coil, a driving wheel shield is fixedly installed on one side of the outer surface of the crucible, a transmission shaft is installed inside the driving wheel shield, a driving wheel is fixedly installed on the upper end of the transmission shaft, a connecting flange is fixedly installed on the bottom surface of the driving wheel shield, a bearing support flange is fixedly installed on the bottom surface of the connecting flange, a connecting bearing seat is fixedly installed on the bottom surface of the bearing support flange, an encoder is fixedly installed on the bottom surface of the connecting bearing seat, a coupling is fixedly installed on the bottom surface of the encoder, a motor is fixedly installed on the bottom surface of the coupling, and an electrode connecting shell is fixedly installed on the outer surface of the coupling.

[0007] Preferably, a driving wheel guard connecting screw is fixedly installed on the upper outer surface of the vacuum chamber bottom plate, a crucible cooling water inlet is fixedly installed on the upper outer surface of the crucible, an electron beam evaporation shell is fixedly installed on the upper surface of the crucible cooling water inlet, an electron beam evaporation shell connecting screw is fixedly installed on the outer surface of the electron beam evaporation shell, a cooling adapter plate is fixedly installed on the upper surface of the crucible, and the upper surface of the cooling adapter plate is fixedly connected to the bottom surface of the high-voltage electrode seat.

[0008] Preferably, an inner O-ring of the crucible is installed on the top of the crucible, an outer O-ring of the crucible is fixedly installed on the outer surface of the crucible, a crucible cooling water adapter plate is fixedly installed on the upper part of the outer surface of the crucible, a bearing is installed on the side of the electron beam evaporation shell, a first bearing outer retaining ring is fixedly installed above the bearing, and a first bearing inner retaining ring is installed on the outer surface of the bearing.

[0009] Preferably, a crucible support column is installed on the bottom surface of the vacuum chamber bottom plate, a crucible support O-ring is fixedly installed on the upper surface of the crucible support column, a bearing inner retaining ring is installed on the lower part of the outer surface of the crucible support column, a crucible cooling water outlet pipe is fixedly installed on one side of the crucible outer surface, a crucible support column X-ring is installed on the lower part of one end of the crucible cooling water outlet pipe, a driven wheel fixing plate is installed under the crucible support column X-ring, a driven wheel is installed on the bottom surface of the driven wheel fixing plate, the driven wheel is connected to the crucible support column by threaded engagement, and a support column O-ring is installed on one side of the bottom surface of the crucible.

[0010] Preferably, a second bearing outer retaining ring and a second bearing inner retaining ring are installed in sequence below the bearing, an electromagnetic wiring port is installed on the bottom surface of the crucible, a high-pressure cooling water inlet is opened on the bottom surface of the crucible, a high-pressure cooling water outlet is opened on the upper surface of the high-voltage electrode seat, a high-voltage line inlet is opened in the middle position of the upper surface of the high-voltage electrode seat, a cover plate connecting screws are installed on the upper surface of the high-voltage electrode seat, a high-voltage support ring is installed on the upper surface of the vacuum chamber bottom plate, and fixing screws are fixedly installed on the outer surface of the high-voltage electrode seat.

[0011] Preferably, the motor is connected to the electrode connecting shell by screws, the coupling output hole is connected to the transmission shaft, the outer surface of the transmission shaft is fixedly connected to the encoder, the transmission shaft passes through the connecting bearing seat and the bearing support flange, and the bearing support flange is fixed to the electrode connecting shell by screws.

[0012] Preferably, the electron beam evaporation housing is fixedly mounted on the upper surface of the vacuum chamber bottom plate by electron beam evaporation housing connecting screws.

[0013] Compared with the prior art, the beneficial effects of the utility model are:

[0014] 1. In the electron beam evaporation device, the crucible cooling water and the high-pressure cooling water are separated and supplied independently, and the water channels are not under the atmosphere, so it is not easy to form condensation and burn the high pressure. The crucible and the electron beam generating device are on the same body and are installed around the high-pressure generating device as the center. In this way, the relative distance is small, the crucible can occupy a large space, and the crucible capacity is large. Therefore, the process has a wide range of applications and is suitable for products of different thicknesses, especially products that require a large amount of abrasives. The capacity of the crucible can be adjusted arbitrarily without changing the position of the crucible to install a large crucible or redesigning it.

[0015] 2. The electron beam evaporation device adopts current-regulated primary electromagnet and deflection coil to implement a wider range of adjustment of the light spot, which is conducive to the optimization of the light spot of different products, saves the time of adjusting the light spot, and adopts a variable coil to achieve a wider range of adjustment of the deflection coil. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1This is a schematic diagram of the main structure of the utility model;

[0017] Figure 2 It is a front view cross-sectional structural schematic diagram of the utility model;

[0018] Figure 3 It is a schematic diagram of the overall oblique structure of the utility model;

[0019] Figure 4 This is a schematic diagram of the cooling water inlet and outlet structure of the utility model;

[0020] Figure 5 It is a schematic diagram of the internal cross-sectional structure of the evaporator of the utility model.

[0021] In the figure: 101, vacuum chamber door; 102, vacuum chamber; 103, automatic uniform baffle; 104, rotation drive; 105, vacuum pump system; 106, electron evaporation system; 107, ion auxiliary system; 108, manual uniform baffle; 109, substrate working disk; 110, workpiece disk carrier; 111, correction plate; 301, vacuum chamber bottom plate; 302, crucible; 303, motor; 304, coupling; 305, encoder; 306, connecting bearing seat; 307, bearing support flange; 308, connecting flange; 309, driving wheel shield; 310, transmission shaft; 311, driving wheel; 312, electrode connection shell; 314, driving wheel shield connecting screw; 315, crucible cooling water inlet pipe; 316, electron beam evaporation shell; 317, electron beam evaporation shell connecting screw; 318, cooling wheel Connecting plate; 319, high voltage electrode seat; 320, deflection coil; 321, electromagnet; 322, O-ring inside crucible; 323, O-ring outside crucible; 324, crucible cooling water adapter plate; 325, crucible support O-ring; 326, crucible support column; 328, bearing inner retaining ring; 329, crucible cooling water outlet pipe; 330, crucible support column X-ring; 331, driven wheel fixing plate; 332, driven wheel ; 333, first bearing outer retaining ring; 334, first bearing inner retaining ring; 335, bearing; 336, support column O-ring; 337, second bearing outer retaining ring; 338, second bearing inner retaining ring; 339, electromagnetic wiring port; 340, high-pressure cooling water inlet; 341, high-pressure cooling water outlet; 342, high-pressure line inlet; 343, cover plate connecting screws; 344, high-pressure support ring; 345, fixing screws. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the implementation cases described are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0023] See also Figure 1-Figure 4 , the utility model provides a technical solution:

[0024] An electron beam evaporation device comprises a vacuum chamber door 101 and a vacuum chamber 102, wherein the vacuum chamber door 101 is fixedly mounted on the surface of the vacuum chamber 102, an automatic uniform baffle 103 is fixedly mounted on the side of the vacuum chamber 102, a rotary drive 104 is arranged inside the vacuum chamber 102, a vacuum pump system 105 is arranged on the side of one end of the vacuum chamber 102, an electron evaporation system 106 and an ion assist system 107 are arranged inside the vacuum pump system 105, and a manual uniform baffle 108 is arranged on the upper part of the vacuum chamber 102. A substrate work disk 109 is mounted on the upper surface of the manual uniform baffle 108, a workpiece disk carrier 110 is mounted above the substrate work disk 109, a correction plate 111 is mounted on the bottom surface of the manual uniform baffle 108, a vacuum chamber bottom plate 301 is fixedly mounted on the inner bottom surface of the electron evaporation system 106, a crucible 302 is fixedly mounted on the surface of the vacuum chamber bottom plate 301, a high-voltage electrode seat 319 is mounted at the top surface of the crucible 302, a deflection coil 320 is mounted inside the high-voltage electrode seat 319, and one end of the deflection coil 320 is fixedly mounted Electromagnet 321, a driving wheel shield 309 is fixedly installed on one side of the outer surface of crucible 302, a transmission shaft 310 is installed inside the driving wheel shield 309, a driving wheel 311 is fixedly installed on the upper end of the transmission shaft 310, a connecting flange 308 is fixedly installed on the bottom surface of the driving wheel shield 309, a bearing support flange 307 is fixedly installed on the bottom surface of the connecting flange 308, a connecting bearing seat 306 is fixedly installed on the bottom surface of the bearing support flange 307, an encoder 305 is fixedly installed on the bottom surface of the connecting bearing seat 306, and an encoder 305 is fixedly installed on the bottom surface of the encoder 305 A coupling 304 is fixedly installed, a motor 303 is fixedly installed on the bottom surface of the coupling 304, an electrode connecting shell 312 is fixedly installed on the outer surface of the coupling 304, the motor 303 is connected to the electrode connecting shell 312 by screws, the output hole of the coupling 304 is connected to the transmission shaft 310, the outer surface of the transmission shaft 310 is fixedly connected to the encoder 305, the transmission shaft 310 passes through the connecting bearing seat 306 and the bearing support flange 307, and the bearing support flange 307 and the electrode connecting shell 312 are fixed by screws.

[0025] The upper part of the outer surface of the vacuum chamber bottom plate 301 is fixedly installed with a driving wheel shield connecting screw 314, the upper part of the outer surface of the crucible 302 is fixedly installed with a crucible cooling water inlet pipe 315, the upper surface of the crucible cooling water inlet pipe 315 is fixedly installed with an electron beam evaporation shell 316, the outer surface of the electron beam evaporation shell 316 is fixedly installed with an electron beam evaporation shell connecting screw 317, the electron beam evaporation shell 316 is fixedly installed on the upper surface of the vacuum chamber bottom plate 301 through the electron beam evaporation shell connecting screw 317, the upper surface of the crucible 302 is fixedly installed with a cooling adapter plate 318, and the cooling The upper surface of the adapter plate 318 is fixedly connected to the bottom surface of the high-voltage electrode seat 319, an inner O-ring 322 of the crucible is installed on the top of the crucible 302, an outer O-ring 323 of the crucible is fixedly installed on the outer surface of the crucible 302, a crucible cooling water adapter plate 324 is fixedly installed on the upper part of the outer surface of the crucible 302, a bearing 335 is installed on the side of the electron beam evaporation housing 316, a first bearing outer retaining ring 333 is fixedly installed above the bearing 335, a first bearing inner retaining ring 334 is installed on the outer surface of the bearing 335, and a second bearing outer retaining ring 337 and a second bearing outer retaining ring 338 are installed in sequence below the bearing 335. The second bearing inner retaining ring 338, an electromagnetic connection port 339 is installed on the bottom surface of the crucible 302, a high-pressure cooling water inlet 340 is opened on the bottom surface of the crucible 302, a high-pressure cooling water outlet 341 is opened on the upper surface of the high-voltage electrode seat 319, a high-voltage line inlet 342 is opened in the middle position of the upper surface of the high-voltage electrode seat 319, a cover plate connecting screw 343 is installed on the upper surface of the high-voltage electrode seat 319, a high-voltage support ring 344 is installed on the upper surface of the vacuum chamber bottom plate 301, and a fixing screw 345 is fixedly installed on the outer surface of the high-voltage electrode seat 319. The cooling water of the crucible 302 is connected to the high-pressure cooling water outlet 341. The cooling water is separated and the water supply is independent. The water channels are not under the atmosphere, so it is not easy to form condensation and burn the high voltage. The crucible 302 and the electron beam generator are on the same body, and are installed around the high voltage generator as the center. In this way, the relative distance is small, and the crucible can occupy a large space, so that the capacity of the crucible 302 is large, so the process application range is wide, and it is suitable for products of different thicknesses, especially products that require a large amount of abrasives. The capacity of the crucible 302 can be adjusted arbitrarily, without changing the position of the crucible 302 to achieve the installation of a large crucible 302 or redesigning it.

[0026] A crucible support column 326 is installed on the bottom surface of the vacuum chamber bottom plate 301, a crucible support O-ring 325 is fixedly installed on the upper surface of the crucible support column 326, a bearing inner retaining ring 328 is installed on the lower part of the outer surface of the crucible support column 326, a crucible cooling water outlet pipe 329 is fixedly installed on one side of the outer surface of the crucible 302, a crucible support column X-ring 330 is installed on the lower part of one end of the crucible cooling water outlet pipe 329, a driven wheel fixing plate 331 is installed below the crucible support column X-ring 330, a driven wheel 332 is installed on the bottom surface of the driven wheel fixing plate 331, and the driven wheel 332 is connected to the crucible support column 326 through threaded engagement, and a support column O-ring 336 is installed on one side of the bottom surface of the crucible 302. The current regulating primary electromagnet 321 and the deflection coil 320 are adopted to realize the adjustment of the light spot in a wider range, which is conducive to the optimization of the light spot of different products and saves the time of adjusting the light spot. The variable coil is adopted to realize the adjustment of the deflection coil 320 in a wider range.

[0027] The electrons are heated by the filament (not shown) on the high-voltage electrode holder 319 through the small DC voltage and high current input from the high-voltage inlet 342, generating electrons. At the same time, the high voltage input from the high-voltage inlet 342 energizes the electrons to form high-energy electrons. The electrons that come out are accumulated in a large range and move under the action of the electromagnet 321. The electromagnet can adjust the initial confinement range of the electrons according to the size of the current input from the electromagnetic connection port 339, so as to make the adjustment range wider and more flexible; at the same time, the deflection coil 320, with a slight adjustment in the X / Y direction, realizes a precise electron trajectory, thereby forming the light spot we need on the crucible. The size, quantity and energy of the light spot can all be adjusted by current input. Different processes require different amounts of abrasives, and the size of the crucible is also different. We need to adjust the center position of the light spot, so we need to adjust the current of the electromagnet 321 to roughly give the range of the electrons, and then adjust the deflection coil 320 slightly on the X / Y axis.

[0028] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the statement "comprise a ..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.

Claims

1. An electron beam evaporation device, comprising a vacuum chamber door (101) and a vacuum chamber (102), wherein the vacuum chamber door (101) is fixedly mounted on the vacuum chamber (102), an automatic uniform baffle (103) is fixedly mounted on the side of the vacuum chamber (102), a rotary drive (104) is arranged inside the vacuum chamber (102), and a vacuum pump system (105) is mounted on the side of one end of the vacuum chamber (102); The vacuum pump system (105) is provided with an electron evaporation system (106) and an ion assist system (107) inside, a manual uniform baffle (108) is installed on the upper part of the vacuum chamber (102), a substrate working disk (109) is installed on the upper surface of the manual uniform baffle (108), a workpiece disk carrier (110) is installed above the substrate working disk (109), and a correction plate (111) is installed on the bottom surface of the manual uniform baffle (108), characterized in that: A vacuum chamber bottom plate (301) is fixedly mounted on the inner bottom surface of the electron evaporation system (106); a crucible (302) is fixedly mounted on the surface of the vacuum chamber bottom plate (301); a high-voltage electrode seat (319) is mounted at the top surface of the crucible (302); a deflection coil (320) is mounted inside the high-voltage electrode seat (319); an electromagnet (321) is fixedly mounted on one end of the deflection coil (320); a driving wheel shield (309) is fixedly mounted on one side of the outer surface of the crucible (302); a transmission shaft (310) is mounted inside the driving wheel shield (309); and the upper end of the transmission shaft (310) is fixedly mounted on the inner side of the driving wheel shield (309). A driving wheel (311) is fixedly installed, a connecting flange (308) is fixedly installed on the bottom surface of the driving wheel shield (309), a bearing support flange (307) is fixedly installed on the bottom surface of the connecting flange (308), a connecting bearing seat (306) is fixedly installed on the bottom surface of the bearing support flange (307), an encoder (305) is fixedly installed on the bottom surface of the connecting bearing seat (306), a coupling (304) is fixedly installed on the bottom surface of the encoder (305), a motor (303) is fixedly installed on the bottom surface of the coupling (304), and an electrode connecting shell (312) is fixedly installed on the outer surface of the coupling (304).

2. An electron beam evaporation device according to claim 1, characterized in that: A driving wheel guard connecting screw (314) is fixedly installed on the upper outer surface of the vacuum chamber bottom plate (301); a crucible cooling water inlet pipe (315) is fixedly installed on the upper outer surface of the crucible (302); an electron beam evaporation shell (316) is fixedly installed on the upper surface of the crucible cooling water inlet pipe (315); an electron beam evaporation shell connecting screw (317) is fixedly installed on the outer surface of the electron beam evaporation shell (316); a cooling adapter plate (318) is fixedly installed on the upper surface of the crucible (302); and the upper surface of the cooling adapter plate (318) is fixedly connected to the bottom surface of the high-voltage electrode seat (319).

3. An electron beam evaporation device according to claim 2, characterized in that: A crucible inner O-ring (322) is installed at the top of the crucible (302), a crucible outer O-ring (323) is fixedly installed on the outer surface of the crucible (302), a crucible cooling water adapter plate (324) is fixedly installed on the upper part of the outer surface of the crucible (302), a bearing (335) is installed on the side of the electron beam evaporation housing (316), a first bearing outer retaining ring (333) is fixedly installed above the bearing (335), and a first bearing inner retaining ring (334) is installed on the outer surface of the bearing (335).

4. The electron beam evaporation device according to claim 1, characterized in that: A crucible support column (326) is installed on the bottom surface of the vacuum chamber bottom plate (301), a crucible support O-ring (325) is fixedly installed on the upper surface of the crucible support column (326), a bearing inner retaining ring (328) is installed on the lower part of the outer surface of the crucible support column (326), a crucible cooling water outlet pipe (329) is fixedly installed on one side of the outer surface of the crucible (302), a crucible support column X-ring (330) is installed at the lower part of one end of the crucible cooling water outlet pipe (329), a driven wheel fixing plate (331) is installed below the crucible support column X-ring (330), a driven wheel (332) is installed on the bottom surface of the driven wheel fixing plate (331), and the driven wheel (332) is connected to the crucible support column (326) through threaded engagement, and a support column O-ring (336) is installed on one side of the bottom surface of the crucible (302).

5. The electron beam evaporation device according to claim 3, characterized in that: A second bearing outer retaining ring (337) and a second bearing inner retaining ring (338) are sequentially installed below the bearing (335); an electromagnetic connection port (339) is installed on the bottom surface of the crucible (302); a high-pressure cooling water inlet (340) is provided on the bottom surface of the crucible (302); a high-pressure cooling water outlet (341) is provided on the upper surface of the high-voltage electrode seat (319); a high-voltage line inlet (342) is provided in the middle position of the upper surface of the high-voltage electrode seat (319); a cover plate connecting screw (343) is installed on the upper surface of the high-voltage electrode seat (319); a high-voltage support ring (344) is installed on the upper surface of the vacuum chamber bottom plate (301); and fixing screws (345) are fixedly installed on the outer surface of the high-voltage electrode seat (319).

6. The electron beam evaporation device according to claim 1, characterized in that: The motor (303) is connected to the electrode connection housing (312) by screws, the output hole of the coupling (304) is connected to the transmission shaft (310), the outer surface of the transmission shaft (310) is fixedly connected to the encoder (305), the transmission shaft (310) passes through the connecting bearing seat (306) and the bearing support flange (307), and the bearing support flange (307) and the electrode connection housing (312) are fixed by screws.

7. The electron beam evaporation device according to claim 2, characterized in that: The electron beam evaporation housing (316) is fixedly mounted on the upper surface of the vacuum chamber bottom plate (301) via electron beam evaporation housing connecting screws (317).

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