Liquid supply system

By introducing pressure sensors and automatic adjustment systems in the liquid supply system, the unstable problem of the outlet flow caused by nitrogen supply gas pressure fluctuations is solved, the stability of the cleaning liquid flow flow is achieved, and the quality of the wafer cleaning is improved.

CN222402540UActive Publication Date: 2025-01-28广东长信精密设备有限公司
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Patent Information

Application Number
CN202420986556.1
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-05-08
Publication Date
2025-01-28
Estimated Expiration
2034-05-08

AI Technical Summary

Technical Problem

In the existing liquid supply system, fluctuations in nitrogen supply air pressure cause fluctuations in the liquid reservoir, which in turn leads to unstable liquid flow of the cleaning liquid, reducing the cleaning quality of the wafer.

Method used

A solution system is designed, including the first storage tank, controller, detection mechanism, cleaning liquid input mechanism, cleaning solution output mechanism, nitrogen input mechanism and exhaust mechanism. Detecting the internal pressure of the storage tank through the first pressure sensor, the controller controls the exhaust valve and the pressure valve to ensure the stability of the flow of the liquid.

Benefits of technology

Through the internal pressure of the constant liquid storage tank, the outlet flow of the cleaning solution is stable, and the quality of the wafer cleaning is improved.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The utility model relates to the technical field of wafer cleaning, and discloses a liquid supply system, which comprises a first liquid storage tank, a controller, a detection mechanism, a cleaning liquid input mechanism, a cleaning liquid output mechanism, a nitrogen input mechanism and an exhaust mechanism, the detection mechanism comprises a first pressure sensor; the cleaning liquid input mechanism comprises a liquid inlet main pipe; the cleaning liquid output mechanism comprises a liquid outlet main pipe; the nitrogen input mechanism comprises a gas inlet main pipe, a first gas inlet branch pipe, a first pressurizing pump and a first pressurizing valve; the exhaust mechanism comprises an exhaust main pipe, a first exhaust branch pipe and a first exhaust valve; according to the liquid supply system provided by the utility model, through the controller, the first pressure sensor, the first exhaust valve, the pressurizing valve and the pressurizing pump, the internal pressure of the first liquid storage tank can be kept within a preset interval, so that the stability of the liquid outlet flow of the first liquid storage tank can be ensured, and the cleaning quality of wafers can be improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of wafer cleaning, in particular to a liquid supply system. Background Art

[0002] During the wafer production process, different cleaning liquids need to be used to clean the wafer surface; since many cleaning liquids are acidic or alkaline, the cleaning liquid cannot be supplied centrally like water, and wafer cleaning requires a large amount of cleaning liquid with a stable flow rate for cleaning, so it is necessary to provide a liquid supply system with a stable flow rate and uninterrupted supply of cleaning liquid; most of the current liquid supply systems use a gas pipe to connect the chemical liquid storage tank and the factory nitrogen main and input nitrogen into the liquid storage tank to achieve stable liquid discharge, but since the gas consumption in the factory is prone to small fluctuations and the gas supply pressure of the factory nitrogen main will fluctuate too much or too little, the nitrogen supply pressure fluctuation will cause the liquid outlet pressure in the liquid storage tank to fluctuate, and the liquid outlet pressure fluctuation will cause the liquid outlet flow rate of the cleaning liquid to fluctuate; therefore, the current liquid supply system has the problem of unstable liquid outlet flow, which reduces the cleaning quality of the wafer. Utility Model Content

[0003] Aiming to solve at least one of the technical problems existing in the prior art, the utility model provides a liquid supply system, which can ensure the stability of the liquid flow rate and help improve the cleaning quality of wafers.

[0004] In order to achieve the above-mentioned purpose, the utility model provides a liquid supply system, including a first liquid storage tank, a controller, a detection mechanism, a cleaning liquid input mechanism, a cleaning liquid output mechanism, a nitrogen input mechanism and an exhaust mechanism; the first liquid storage tank is used to store cleaning liquid; the detection mechanism includes a first pressure sensor, the first pressure sensor is installed in the first liquid storage tank and is used to detect the internal pressure of the first liquid storage tank, the first pressure sensor and the controller are electrically connected; the cleaning liquid input mechanism includes a liquid inlet main pipe, the liquid inlet main pipe is connected to the first liquid storage tank; the cleaning liquid output mechanism includes a liquid outlet main pipe, the liquid outlet main pipe is connected to the first liquid storage tank; a liquid storage tank; the nitrogen input mechanism includes an intake main pipe, a first intake branch pipe, a first pressure pump and a first pressure valve, the intake main pipe is connected to the first liquid storage tank through the first intake branch pipe, the first pressure pump is installed on the first intake branch pipe and is electrically connected to the controller, and the first pressure valve is installed on the first intake branch pipe and is electrically connected to the controller; the exhaust mechanism includes an exhaust main pipe, a first exhaust branch pipe and a first exhaust valve, the exhaust main pipe is connected to the first liquid storage tank through the first exhaust branch pipe, and the first exhaust valve is installed on the first exhaust branch pipe and is electrically connected to the controller.

[0005] In some embodiments, the exhaust mechanism further includes a first pressure relief pipe and a first pressure relief valve, the first pressure relief pipe having a first input end and a first output end, the first input end being connected to the first exhaust branch pipe and being located between the first exhaust valve and the first liquid storage tank, the first output end being connected to the exhaust main pipe, and the first pressure relief valve being installed on the first pressure relief pipe.

[0006] In some embodiments, the cleaning liquid input mechanism also includes a first liquid inlet branch and a first liquid inlet valve. The liquid inlet main pipe is connected to the first liquid storage tank through the first liquid inlet branch. The first liquid inlet valve is installed on the first liquid inlet branch and is electrically connected to the controller.

[0007] In some embodiments, the cleaning liquid output mechanism also includes a first liquid outlet branch and a first liquid outlet valve. The liquid outlet main pipe is connected to the first liquid storage tank through the first liquid outlet branch. The first liquid outlet valve is installed on the first liquid outlet branch and is electrically connected to the controller.

[0008] In some embodiments, the detection mechanism further includes a first liquid level sensor, which is mounted on the first liquid storage tank and is used to detect the level of the cleaning fluid in the first liquid storage tank, and the first liquid level sensor is electrically connected to the controller.

[0009] In some embodiments, a second liquid storage tank for storing cleaning liquid is further included; the cleaning liquid input mechanism also includes a second liquid inlet branch and a second liquid inlet valve, the liquid inlet main pipe is connected to the second liquid storage tank through the second liquid inlet branch, and the second liquid inlet valve is installed on the second liquid inlet branch and is electrically connected to the controller; the cleaning liquid output mechanism also includes a second liquid outlet branch and a second liquid outlet valve, the liquid outlet main pipe is connected to the second liquid storage tank through the second liquid outlet branch, and the second liquid outlet valve is installed on the second liquid outlet branch and is electrically connected to the controller.

[0010] In some embodiments, the detection mechanism includes a second pressure sensor, which is installed on the second liquid storage tank and is used to detect the internal pressure of the second liquid storage tank, and the second pressure sensor is electrically connected to the controller; the nitrogen input mechanism also includes a second intake branch, a second pressure pump and a second pressure valve, the two ends of the second intake branch are respectively connected to the second liquid storage tank and the intake main pipe, the second pressure pump is installed on the second intake branch and is electrically connected to the controller, and the second pressure valve is installed on the second intake branch and is electrically connected to the controller; the exhaust mechanism also includes a second exhaust branch and a second exhaust valve, the exhaust main pipe is connected to the second liquid storage tank through the second exhaust branch, and the second exhaust valve is installed on the second exhaust branch and is electrically connected to the controller.

[0011] In some embodiments, the exhaust mechanism further includes a second pressure relief pipe and a second pressure relief valve, the second pressure relief pipe having a second input end and a second output end, the second input end being connected to the second exhaust branch pipe and being located between the second exhaust valve and the second liquid storage tank, the second output end being connected to the exhaust main pipe, and the second pressure relief valve being installed on the second pressure relief pipe.

[0012] In some embodiments, the detection mechanism further includes a second liquid level sensor, which is mounted on the second liquid storage tank and is used to detect the level of the cleaning fluid in the second liquid storage tank, and the second liquid level sensor is electrically connected to the controller.

[0013] In some embodiments, the cleaning liquid input mechanism further includes a liquid adding pump, which is installed on the liquid inlet main pipe and electrically connected to the controller.

[0014] Compared with the prior art, the liquid supply system provided by the present invention has the following advantages: when the first pressure sensor detects that the internal pressure of the first liquid storage tank is higher than a set upper limit, the controller can control the opening of the first exhaust valve to exhaust the first liquid storage tank based on the detection signal of the first pressure sensor, thereby reducing the internal pressure of the first liquid storage tank and keeping the internal pressure of the first liquid storage tank constant within a preset range, thereby ensuring the stability of the liquid outflow rate of the first liquid storage tank; when the first pressure sensor detects that the internal pressure of the first liquid storage tank is lower than a set lower limit, the controller can control the adjustment of the pressurizing valve and the pressurizing pump based on the detection signal of the first pressure sensor to increase the air intake of the first liquid storage tank, thereby increasing the internal pressure of the first liquid storage tank and keeping the internal pressure of the first liquid storage tank constant within the preset range, thereby ensuring the stability of the liquid outflow rate of the first liquid storage tank; therefore, the liquid supply system provided by the present invention can maintain the internal pressure of the first liquid storage tank constant within the preset range through the controller, the first pressure sensor, the first exhaust valve, the pressurizing valve and the pressurizing pump, thereby ensuring the stability of the liquid outflow rate of the first liquid storage tank, thereby helping to improve the cleaning quality of wafers. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 This is a structural diagram of a liquid supply system provided by an embodiment of the present utility model;

[0016] Figure 2 This is a schematic diagram of the connection between the cleaning liquid input mechanism and the liquid storage tank provided in an embodiment of the present utility model;

[0017] Figure 3 This is a schematic diagram of the connection between the exhaust mechanism and the liquid storage tank provided in an embodiment of the present utility model;

[0018] Figure 4 This is a control connection structure provided by an embodiment of the utility model.

[0019] In the figure, 1, the first liquid storage tank;

[0020] 2. Controller;

[0021] 3. Detection mechanism; 31. First pressure sensor; 32. First liquid level sensor; 33. Second pressure sensor; 34. Second liquid level sensor;

[0022] 4. Cleaning liquid input mechanism; 41. Liquid inlet main pipe; 42. First liquid inlet branch pipe; 43. First liquid inlet valve; 44. Second liquid inlet branch pipe; 45. Second liquid inlet valve; 46. Liquid adding pump;

[0023] 5. Cleaning liquid output mechanism; 51. Liquid outlet main pipe; 52. First liquid outlet branch pipe; 53. First liquid outlet valve; 54. Second liquid outlet branch pipe; 55. Second liquid outlet valve;

[0024] 6. Nitrogen input mechanism; 61. Air intake main pipe; 62. First air intake branch pipe; 63. First pressure pump; 64. First pressure valve; 65. Second air intake branch pipe; 66. Second pressure pump; 67. Second pressure valve;

[0025] 7. Exhaust mechanism; 71. Exhaust main pipe; 72. First exhaust branch pipe; 73. First exhaust valve; 74. First pressure relief pipe; 75. First pressure relief valve; 76. Second exhaust branch pipe; 77. Second exhaust valve; 78. Second pressure relief pipe; 79. Second pressure relief valve; 741. First input port; 742. First output port; 781. Second input port; 782. Second output port;

[0026] 8. Second liquid storage tank. DETAILED DESCRIPTION

[0027] The following embodiments are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0028] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they should not be understood as limitations on the present invention.

[0029] The terms "first" and "second" are used for descriptive purposes only and should not be understood to indicate or imply relative importance or implicitly specify the quantity of the technical features indicated. Therefore, a feature specified as "first" or "second" may explicitly or implicitly include one or more of the features.

[0030] In this utility model, unless otherwise specified or limited, the terms "installed," "connected," "connect," "fixed," etc. should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integration; mechanical connection, electrical connection; direct connection, indirect connection through an intermediate medium, internal communication between two components, or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on specific circumstances.

[0031] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Moreover, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly below or obliquely below the second feature, or may simply mean that the first feature is lower in level than the second feature.

[0032] like Figure 1-4 As shown, a preferred liquid supply system of an embodiment of the present utility model includes a first liquid storage tank 1, a controller 2, a detection mechanism 3, a cleaning liquid input mechanism 4, a cleaning liquid output mechanism 5, a nitrogen input mechanism 6 and an exhaust mechanism 7.

[0033] The first liquid storage tank 1 is used to store cleaning liquid; the detection mechanism 3 includes a first pressure sensor 31, which is installed on the first liquid storage tank 1 and is used to detect the internal pressure of the first liquid storage tank 1. The first pressure sensor 31 is electrically connected to the controller 2; the cleaning liquid input mechanism 4 includes a liquid inlet pipe 41, which is connected to the first liquid storage tank 1 and is used to input the cleaning liquid into the first liquid storage tank 1; the cleaning liquid output mechanism 5 includes a liquid outlet pipe 51, which is connected to the first liquid storage tank 1 and is used to output the cleaning liquid in the first liquid storage tank 1; the nitrogen input mechanism 6 includes an air inlet pipe 61 , a first air intake branch pipe 62, a first pressure pump 63 and a first pressure valve 64, the air intake main pipe 61 is connected to the first liquid storage tank 1 through the first air intake branch pipe 62, the first pressure pump 63 is installed on the first air intake branch pipe 62 and is electrically connected to the controller 2, the first pressure valve 64 is installed on the first air intake branch pipe 62 and is electrically connected to the controller 2; the exhaust mechanism 7 includes an exhaust main pipe 71, a first exhaust branch pipe 72 and a first exhaust valve 73, the exhaust main pipe 71 is connected to the first liquid storage tank 1 through the first exhaust branch pipe 72, the first exhaust valve 73 is installed on the first exhaust branch pipe 72 and is electrically connected to the controller 2.

[0034] Based on this technical solution, when the first pressure sensor 31 detects that the internal pressure of the first liquid storage tank 1 is higher than the set upper limit value, the controller 2 can control the opening of the first exhaust valve 73 to exhaust the first liquid storage tank 1 through the detection signal of the first pressure sensor 31, thereby reducing the internal pressure of the first liquid storage tank 1 and keeping the internal pressure of the first liquid storage tank 1 constant within the preset range, thereby ensuring the stability of the liquid outflow rate of the first liquid storage tank 1; when the first pressure sensor 31 detects that the internal pressure of the first liquid storage tank 1 is lower than the set lower limit value, the controller 2 can control the opening of the first exhaust valve 73 to exhaust the first liquid storage tank 1 through the detection signal of the first pressure sensor 31. The pressure-boosting valve and the pressure-boosting pump are controlled and adjusted to increase the air intake of the first liquid storage tank 1, thereby increasing the internal pressure of the first liquid storage tank 1 and keeping the internal pressure of the first liquid storage tank 1 constant within a preset range, thereby ensuring the stability of the liquid outlet flow rate of the first liquid storage tank 1; therefore, the liquid supply system provided by the present invention can keep the internal pressure of the first liquid storage tank 1 constant within a preset range through the controller 2, the first pressure sensor 31, the first exhaust valve 73, the first pressure-boosting pump 63 and the first pressure-boosting valve 64, thereby ensuring the stability of the liquid outlet flow rate of the first liquid storage tank 1, which helps to improve the cleaning quality of the wafer.

[0035] In this embodiment, the first pressurizing valve 64 is located between the first pressurizing pump 63 and the first liquid storage tank 1 .

[0036] The liquid supply system provided in the embodiment of the present invention further includes a second liquid storage tank 8 for storing cleaning liquid.

[0037] See Figure 1 、 Figure 2 and Figure 4 The cleaning liquid input mechanism 4 provided in this embodiment of the utility model further includes a first liquid inlet branch pipe 42 and a first liquid inlet valve 43. The liquid inlet main pipe 41 is connected to the first liquid storage tank 1 via the first liquid inlet branch pipe 42. The first liquid inlet valve 43 is mounted on the first liquid inlet branch pipe 42 and is electrically connected to the controller 2. The controller 2 can control the opening of the first liquid inlet valve 43 to input the cleaning liquid into the first liquid storage tank 1, or can control the closing of the first liquid inlet valve 43 to stop the input of the cleaning liquid into the first liquid storage tank 1. The controller 2 can also adjust the opening of the first liquid inlet valve 43 to adjust the liquid flow rate of the first liquid storage tank 1.

[0038] The cleaning liquid input mechanism 4 also includes a second liquid inlet branch pipe 44 and a second liquid inlet valve 45. The liquid inlet main pipe 41 is connected to the second liquid storage tank 8 through the second liquid inlet branch pipe 44. The second liquid inlet valve 45 is installed on the second liquid inlet branch pipe 44 and is electrically connected to the controller 2.

[0039] The cleaning liquid input mechanism 4 also includes a liquid adding pump 46, which is installed on the liquid inlet main pipe 41 and is electrically connected to the controller 2. The end of the liquid inlet main pipe 41 away from the liquid storage tank can be connected to the cleaning liquid container, and then the liquid adding pump 46 can be turned on to input the external liquid into the liquid storage tank to replenish the cleaning liquid in the liquid storage tank. Therefore, the use of the liquid adding pump 46 can eliminate the need for external cleaning liquid to provide liquid inlet pressure, and realize barreled liquid inlet, which facilitates the replenishment of cleaning liquid into the liquid storage tank.

[0040] See Figure 1 and Figure 4 The cleaning liquid output mechanism 5 provided in the embodiment of the present invention further includes a first liquid outlet branch pipe 52 and a first liquid outlet valve 53. The liquid outlet main pipe 51 is connected to the first liquid storage tank 1 via the first liquid outlet branch pipe 52. The first liquid outlet valve 53 is mounted on the first liquid outlet branch pipe 52 and is electrically connected to the controller 2. The controller 2 can control the opening of the first liquid outlet valve 53 to output the cleaning liquid in the first liquid storage tank 1 to the liquid outlet main pipe 51, or can control the closing of the first liquid outlet valve 53 to stop outputting the cleaning liquid in the first liquid storage tank 1 to the liquid outlet main pipe 51. The controller 2 can also adjust the opening of the first liquid outlet valve 53 to adjust the liquid outflow rate of the first liquid storage tank 1.

[0041] The cleaning liquid output mechanism 5 also includes a second liquid outlet branch pipe 54 and a second liquid outlet valve 55. The liquid outlet main pipe 51 is connected to the second liquid storage tank 8 through the second liquid outlet branch pipe 54. The second liquid outlet valve 55 is installed on the second liquid outlet branch pipe 54 and is electrically connected to the controller 2. By using the first liquid storage tank 1 and the second liquid storage tank 8, when one of the liquid storage tanks is in use, the other liquid storage tank can complete the cleaning liquid replenishment and is in a liquid discharge state at any time. When the cleaning liquid in one of the liquid storage tanks is insufficient or an abnormal condition occurs, it can be switched to the other liquid storage tank for liquid discharge. Therefore, by using two liquid storage tanks, the present invention can only stop the operation of one of the liquid storage tanks and repair or replace it when an abnormal problem occurs, while the liquid discharge work is carried out through the other liquid storage tank without stopping the entire liquid supply system, thereby achieving seamless switching of liquid discharge and improving the cleaning efficiency of the wafer.

[0042] See Figure 1 and Figure 4The detection mechanism 3 provided in the embodiment of the present invention further includes a first liquid level sensor 32, which is mounted on the first liquid storage tank 1 and is used to detect the level of the cleaning liquid in the first liquid storage tank 1. The first liquid level sensor 32 is electrically connected to the controller 2. When the first liquid level sensor 32 detects that the liquid level in the first liquid storage tank 1 is lower than a set low value, the controller 2 can control the opening of the first liquid inlet valve 43 through the detection signal of the first liquid level sensor 32 to replenish the cleaning liquid into the first liquid storage tank 1, and at this time the second liquid storage tank 8 can be in a liquid discharge condition; when the first liquid level sensor 32 detects that the liquid level in the first liquid storage tank 1 is higher than a set high value, the controller 2 can control the closing of the first liquid inlet valve 43 through the detection signal of the first liquid level sensor 32 to stop the liquid from entering the first liquid storage tank 1, so that the first liquid storage tank 1 remains in a state where liquid can be discharged at any time.

[0043] The detection mechanism 3 includes a second pressure sensor 33 . The second pressure sensor 33 is installed on the second liquid storage tank 8 and is used to detect the internal pressure of the second liquid storage tank 8 . The second pressure sensor 33 is electrically connected to the controller 2 .

[0044] The detection mechanism 3 also includes a second liquid level sensor 34, which is installed on the second liquid storage tank 8 and is used to detect the level of the cleaning liquid in the second liquid storage tank 8. The second liquid level sensor 34 is electrically connected to the controller 2. When the second liquid level sensor 34 detects that the liquid level in the second liquid storage tank 8 is lower than a set low value, the controller 2 can control the opening of the second liquid inlet valve 45 through the detection signal of the second liquid level sensor 34 to replenish the cleaning liquid into the second liquid storage tank 8. At this time, the first liquid storage tank 1 can be in a liquid discharge condition; when the second liquid level sensor 34 detects that the liquid level in the second liquid storage tank 8 is higher than a set high value, the controller 2 can control the closing of the second liquid inlet valve 45 through the detection signal of the second liquid level sensor 34 to stop the liquid from entering the second liquid storage tank 8, so that the second liquid storage tank 8 remains in a state where liquid can be discharged at any time.

[0045] See Figure 1 and Figure 4The nitrogen input mechanism 6 provided in the embodiment of the present invention further includes a second intake branch pipe 65, a second pressure pump 66, and a second pressure valve 67. The two ends of the second intake branch pipe 65 are connected to the second liquid storage tank 8 and the intake main pipe 61, respectively. The second pressure pump 66 is installed on the second intake branch pipe 65 and is electrically connected to the controller 2. The second pressure valve 67 is installed on the second intake branch pipe 65 and is electrically connected to the controller 2. The exhaust mechanism 7 further includes a second exhaust branch pipe 76 and a second exhaust valve 77. The exhaust main pipe 71 is connected to the second liquid storage tank 8 through the second exhaust branch pipe 76. The second exhaust valve 77 is installed on the second exhaust branch pipe 76 and is electrically connected to the controller 2. The second pressure sensor 33, the second intake branch pipe 65, the second pressure pump 66, the second pressure pump 66, the second exhaust branch pipe 76, and the second exhaust valve 77 can be used to adjust the internal pressure of the second liquid storage tank 8 and keep the internal pressure of the second liquid storage tank 8 constant within a preset range, thereby ensuring a stable liquid outflow rate from the second liquid storage tank 8.

[0046] In this embodiment, the second pressurizing valve 67 is located between the second pressurizing pump 66 and the second liquid storage tank 8 .

[0047] See Figure 1 、 Figure 3 and Figure 4 The exhaust mechanism 7 provided in the embodiment of the present invention further includes a first pressure relief pipe 74 and a first pressure relief valve 75. The first pressure relief pipe 74 has a first input end 741 and a first output end 742. The first input end 741 is connected to the first exhaust branch pipe 72 and is located between the first exhaust valve 73 and the first liquid storage tank 1. The first output end 742 is connected to the exhaust main pipe 71. The first pressure relief valve 75 is mounted on the first pressure relief pipe 74. By using the first pressure relief pipe 74 and the first pressure relief valve 75, when a problem occurs with the first exhaust valve 73 and the first liquid storage tank 1 and the pressure cannot be relieved, the pressure in the first liquid storage tank 1 can be relieved through the first pressure relief pipe 74 by opening the first pressure relief valve 75, thereby improving the safety of the first liquid storage tank 1.

[0048] In this embodiment, the first pressure relief valve 75 is a first mechanical pressure relief valve.

[0049] In some other embodiments, the first pressure relief valve 75 may also be a first electric pressure relief valve, and the first electric pressure relief valve is electrically connected to the controller 2 .

[0050] The exhaust mechanism 7 further includes a second pressure relief pipe 78 and a second pressure relief valve 79. The second pressure relief pipe 78 has a second input end 781 and a second output end 782. The second input end 781 is connected to the second exhaust branch pipe 76 and is located between the second exhaust valve 77 and the second liquid storage tank 8. The second output end 782 is connected to the exhaust main pipe 71. The second pressure relief valve 79 is mounted on the second pressure relief pipe 78. By using the second pressure relief pipe 78 and the second pressure relief valve 79, if a problem occurs with the second exhaust valve 77 and the second liquid storage tank 8 cannot be relieved, the pressure of the first liquid storage tank 1 can be relieved through the second pressure relief pipe 78 by opening the second pressure relief valve 79, thereby improving the safety of the second liquid storage tank 8.

[0051] In this embodiment, the second pressure relief valve 79 is a second mechanical pressure relief valve.

[0052] In some other embodiments, the second pressure relief valve 79 may also be a second electric pressure relief valve, and the first electric pressure relief valve is electrically connected to the controller 2 .

[0053] The above is only a preferred embodiment of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and replacements can be made without departing from the technical principles of the present invention. These improvements and replacements should also be regarded as the scope of protection of the present invention.

Claims

1. A liquid supply system, characterized in that: include: A first liquid storage tank, the first liquid storage tank is used to store cleaning liquid; Controller; A detection mechanism, the detection mechanism comprising a first pressure sensor, the first pressure sensor is installed on the first liquid storage tank and is used to detect the internal pressure of the first liquid storage tank, and the first pressure sensor is electrically connected to the controller; A cleaning liquid input mechanism, the cleaning liquid input mechanism comprising a liquid inlet main pipe, the liquid inlet main pipe is connected to the first liquid storage tank; A cleaning liquid output mechanism, the cleaning liquid output mechanism comprising a liquid outlet main pipe, the liquid outlet main pipe is connected to the first liquid storage tank; A nitrogen input mechanism, the nitrogen input mechanism comprising an intake main pipe, a first intake branch pipe, a first pressure pump and a first pressure valve, the intake main pipe is connected to the first liquid storage tank through the first intake branch pipe, the first pressure pump is installed on the first intake branch pipe and is electrically connected to the controller, and the first pressure valve is installed on the first intake branch pipe and is electrically connected to the controller; The exhaust mechanism includes an exhaust main pipe, a first exhaust branch pipe and a first exhaust valve. The exhaust main pipe is connected to the first liquid storage tank through the first exhaust branch pipe. The first exhaust valve is installed on the first exhaust branch pipe and is electrically connected to the controller.

2. The liquid supply system according to claim 1, characterized in that: The exhaust mechanism also includes a first pressure relief pipe and a first pressure relief valve, the first pressure relief pipe has a first input end and a first output end, the first input end is connected to the first exhaust branch pipe and is located between the first exhaust valve and the first liquid storage tank, the first output end is connected to the exhaust main pipe, and the first pressure relief valve is installed on the first pressure relief pipe.

3. The liquid supply system according to claim 1, characterized in that: The cleaning liquid input mechanism also includes a first liquid inlet branch pipe and a first liquid inlet valve. The liquid inlet main pipe is connected to the first liquid storage tank through the first liquid inlet branch pipe. The first liquid inlet valve is installed on the first liquid inlet branch pipe and is electrically connected to the controller.

4. The liquid supply system according to claim 3, characterized in that: The cleaning liquid output mechanism also includes a first liquid outlet branch pipe and a first liquid outlet valve. The liquid outlet main pipe is connected to the first liquid storage tank through the first liquid outlet branch pipe. The first liquid outlet valve is installed on the first liquid outlet branch pipe and is electrically connected to the controller.

5. The liquid supply system according to claim 4, characterized in that: The detection mechanism also includes a first liquid level sensor, which is installed on the first liquid storage tank and is used to detect the liquid level of the cleaning liquid in the first liquid storage tank. The first liquid level sensor is electrically connected to the controller.

6. The liquid supply system according to claim 4, characterized in that: Also included is a second liquid storage tank for storing cleaning fluid; The cleaning liquid input mechanism further includes a second liquid inlet branch pipe and a second liquid inlet valve, the liquid inlet main pipe is connected to the second liquid storage tank through the second liquid inlet branch pipe, and the second liquid inlet valve is installed on the second liquid inlet branch pipe and is electrically connected to the controller; The cleaning liquid output mechanism also includes a second liquid outlet branch pipe and a second liquid outlet valve. The liquid outlet main pipe is connected to the second liquid storage tank through the second liquid outlet branch pipe. The second liquid outlet valve is installed on the second liquid outlet branch pipe and is electrically connected to the controller.

7. The liquid supply system according to claim 6, characterized in that: The detection mechanism includes a second pressure sensor, which is installed on the second liquid storage tank and is used to detect the internal pressure of the second liquid storage tank, and the second pressure sensor is electrically connected to the controller; The nitrogen input mechanism further includes a second intake branch pipe, a second pressure pump and a second pressure valve, the two ends of the second intake branch pipe are respectively connected to the second liquid storage tank and the intake main pipe, the second pressure pump is installed on the second intake branch pipe and is electrically connected to the controller, and the second pressure valve is installed on the second intake branch pipe and is electrically connected to the controller; The exhaust mechanism further includes a second exhaust branch pipe and a second exhaust valve. The exhaust main pipe is connected to the second liquid storage tank through the second exhaust branch pipe. The second exhaust valve is installed on the second exhaust branch pipe and is electrically connected to the controller.

8. The liquid supply system according to claim 7, characterized in that: The exhaust mechanism also includes a second pressure relief pipe and a second pressure relief valve, the second pressure relief pipe has a second input end and a second output end, the second input end is connected to the second exhaust branch pipe and is located between the second exhaust valve and the second liquid storage tank, the second output end is connected to the exhaust main pipe, and the second pressure relief valve is installed on the second pressure relief pipe.

9. The liquid supply system according to claim 6, characterized in that: The detection mechanism also includes a second liquid level sensor, which is installed on the second liquid storage tank and is used to detect the liquid level of the cleaning liquid in the second liquid storage tank. The second liquid level sensor is electrically connected to the controller.

10. The liquid supply system according to any one of claims 1 to 9, characterized in that: The cleaning liquid input mechanism also includes a liquid adding pump, which is installed on the liquid inlet main pipe and is electrically connected to the controller.

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