Dresser for polishing pad

By setting a positioning part and an adjustment mechanism on the base grinding surface of the polishing pad dresser, the problems of abrasive parts installation error and surface uniformity are solved, and a more efficient polishing pad dressing effect and uniform surface are achieved.

CN222472115UActive Publication Date: 2025-02-14NINGBO CRYSDIAM INDUSTRIAL TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202420273722.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-02-04
Publication Date
2025-02-14
Estimated Expiration
2034-02-04

AI Technical Summary

Technical Problem

The existing polishing pad trimmer lacks positioning structure when installing abrasive parts, resulting in large installation errors and disorderly arrangement of abrasive parts, affecting the finishing effect of the polishing pad. In addition, the individual shapes of the abrasive parts and the complex surface state of the polishing pads make it difficult to form a uniform polishing pad surface.

Method used

A trimmer for polishing pads is designed, and a positioning part is provided on the polishing surface of the base body, and the abrasive parts are fixed to the positioning part by adhesive to ensure the accurate positioning of the abrasive parts. At the same time, the trimmer is equipped with an adjustment mechanism, which adapts to different abrasive shapes to ensure uniform surface surface of the polishing pad by adjusting the height difference of the reference surface of the abrasive part tip.

Benefits of technology

Through the design of the positioning part and the adjustment mechanism, the installation error of the abrasive parts is reduced, the order of the abrasive parts is improved, the trimming effect of the polishing pad is enhanced, and a uniform polishing pad surface can be formed.

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Abstract

The utility model relates to a dresser for a polishing pad, which can be attached to operation equipment, comprises a base body and a dressing unit, the dressing unit comprises at least two abrasive particle pieces, and is characterized in that a positioning part capable of positioning each abrasive particle piece is arranged on a polishing surface of the base body; each abrasive particle piece is kept on the corresponding positioning part through an adhesive, and an adjusting mechanism is arranged on the base body and can adjust the height difference between the datum planes where the tips of at least part of the abrasive particle pieces of the finishing unit are located relative to the grinding face. The grinding wheel has the advantages that the abrasive particle pieces are kept on the corresponding positioning parts through the adhesive, so that on one hand, the error of the mounting positions of the abrasive particle pieces can be reduced, and on the other hand, the abrasive particle pieces can be detached from the positioning parts; and the adjusting mechanism is arranged, even if the shapes of the tips of all the abrasive particle pieces have individual differences, the height difference of the tips of all the abrasive particle pieces can be adjusted to be within the allowable range through the adjusting mechanism, and therefore the uniform polishing pad surface can be formed easily.
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Description

Technical Field

[0001] The utility model relates to the technical field of polishing, in particular to a dresser for a polishing pad. Background Art

[0002] Chemical mechanical polishing, also known as CMP (Chemical Mechanical Planarization), is often required in the field of diamond processing, for example, wafers are polished by the CMP process. This process polishes the workpiece by a polishing pad, which can achieve high-quality surface processing in a short time. In order to ensure the quality of surface processing, it is usually necessary to use a dresser to regularly dress and maintain the polishing pad. The currently commonly used polishing pad dressers can refer to the dresser provided in the Chinese utility model "A brazed diamond dresser based on cluster units" with application number CN202122622002.2 (publication number CN216913433U).

[0003] Existing dressers usually include a base and a dressing unit for dressing the polishing pad. The dressing unit contains multiple abrasive pieces. Currently, each abrasive piece is usually fixed to the polishing surface of the base by brazing, electroplating, etc. Each abrasive piece is distributed on the base and partially protrudes from the surface of the base. The tip of the abrasive piece protruding from the surface of the base can dress the polishing pad.

[0004] However, the grinding surface of the base of the above-mentioned dresser is usually not provided with a structure for positioning the abrasive particles, and a large error may occur when attaching the abrasive particles to the grinding surface of the base, making the arrangement of the abrasive particles disordered, thereby affecting the dressing effect of the polishing pad. In addition, it is difficult to form a uniform polishing pad surface when the above-mentioned dresser is used to grind and dress the polishing pad, because: when using the dresser, it is impossible to avoid individual differences in the tip shape of the abrasive particles; further, the state of the polishing pad surface also needs to be adjusted according to the workpiece. Therefore, it is necessary to further improve the existing technology. Utility Model Content

[0005] The first technical problem to be solved by the utility model is to provide a dresser for a polishing pad capable of positioning an abrasive piece in view of the above-mentioned existing technical status.

[0006] The second technical problem to be solved by the present invention is to provide a device capable of adjusting the height difference of the tip reference surface of an abrasive piece in response to the above-mentioned prior art status, which is particularly suitable for creating a uniform polishing pad surface even if the tip shapes of the abrasive pieces have individual differences.

[0007] The technical solution adopted by the utility model to solve the first technical problem is: the dresser for the polishing pad can be attached to the working equipment M, including:

[0008] A base body including a polishing surface for setting a dressing unit;

[0009] A dressing unit, used for dressing the polishing pad, comprising at least two abrasive particles arranged circumferentially on the polishing surface;

[0010] Features:

[0011] A positioning portion capable of positioning each of the abrasive grain pieces is disposed on the grinding surface of the base body, and each of the abrasive grain pieces is retained on its corresponding positioning portion by an adhesive.

[0012] In order to enable the positioning part to position the abrasive piece, preferably, the positioning part is a concave part formed by the base body being partially sunken downward on the grinding surface. In fact, the positioning part can also be a convex part of the base body protruding along the outer periphery of the abrasive piece on the grinding surface. The concave part is set to facilitate processing.

[0013] In order to solve the second technical problem, preferably, an adjustment mechanism is provided on the base body, which can adjust the height difference δ between the reference planes S1 and S2 where the tips of at least some of the abrasive particles of the dressing unit are located relative to the polishing surface. The reference plane refers to the plane where the tips are located and parallel to the polishing surface. With such a design, even if the tips of the abrasive particles have individual differences in shape, the height difference δ of the tips of the abrasive particles can be adjusted to within an allowable range through the adjustment mechanism, thereby facilitating the formation of a uniform polishing pad surface.

[0014] In order to enable the dresser to form a uniform polishing pad surface, preferably, the height difference δ is in the range of 0 to 20 um.

[0015] In order to enable the adjustment mechanism to adjust the height difference δ between the reference planes S1 and S2 where the tips of at least some of the abrasive pieces of the dressing unit are located relative to the grinding surface, preferably, the adjustment mechanism includes a base, and correspondingly, an opening is provided on the base for the base to be adjusted in an up-and-down manner, and the up-and-down movement is perpendicular to the plane direction where the grinding surface is located, and the positioning part is arranged on the upper surface of the base. Such a design can not only adjust the height difference δ of the tips of each abrasive piece to within the allowable range, but also disassemble the base from the opening to replace the abrasive piece, and the abrasive piece can be replaced with a corresponding matching abrasive piece when polishing pads of different surfaces need to be processed.

[0016] In order to enable the base to move up and down perpendicular to the polishing surface, preferably, the outer peripheral wall of the base is formed with an external thread, and correspondingly, the opening is a threaded hole. It should be noted that, according to actual needs, there may be other matching structures between the base and the opening, for example, the base is a slider that can slide in the opening, and is fixed by a fixing member after the base slides to a specified position; or the base is a magnetic member, and the inner wall of the opening is a ferromagnetic material, and the base can slide in the opening under the action of a sufficiently large external force, etc.; by providing an external thread on the outer peripheral wall of the base and an internal thread in the opening, it is because under this matching structure, it is only necessary to rotate the base in the opening to achieve the base moving up and down perpendicular to the polishing surface relatively simply and with relatively high precision.

[0017] In order to facilitate the rotation of the base in the opening, preferably, the opening is connected to the base, and a slot for inserting a tool is provided on the lower surface of the base. The slot is provided on the lower surface of the base to facilitate the operator or the instrument to easily rotate the base in the opening by using a tool matching the slot.

[0018] In order to enable the trimmer to be attached to the working equipment M, preferably, the base also includes a mounting surface located on the other side of the base relative to the grinding surface, and the mounting surface is provided with a mounting hole for mounting to the working equipment, and the mounting surface is also provided with at least two positioning holes for positioning the base.

[0019] Compared with the prior art, the advantages of the utility model are:

[0020] 1. By providing a positioning portion on the polishing surface of the substrate and holding the abrasive piece on the corresponding positioning portion through an adhesive, the error of the installation position of the abrasive piece can be reduced on the one hand, and the abrasive piece can be removed from the positioning portion on the other hand, so that the abrasive piece can be replaced as needed;

[0021] 2. By providing an adjustment mechanism, even if the tip shapes of each abrasive particle are individually different, the height difference of the tip of each abrasive particle can be adjusted to within an allowable range through the adjustment mechanism, thereby facilitating the formation of a uniform polishing pad surface. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a structural schematic diagram of a trimmer in an embodiment of the utility model;

[0023] Figure 2 This is a schematic diagram of the exploded structure of the trimmer in the embodiment of the utility model;

[0024] Figure 3 It is a structural schematic diagram of another angle of the trimmer in the embodiment of the utility model;

[0025] Figure 4It is a structural schematic diagram of the base of the adjustment mechanism in the embodiment of the utility model;

[0026] Figure 5 It is a structural schematic diagram of another angle of the base of the adjustment mechanism in the embodiment of the utility model;

[0027] Figure 6 It is a schematic diagram of the state of the trimmer in the embodiment of the utility model in the state to be adjusted;

[0028] Figure 7 It is a schematic diagram of the trimmer in an adjusted state in an embodiment of the utility model. DETAILED DESCRIPTION

[0029] The present invention is further described in detail below in conjunction with specific embodiments.

[0030] like Figures 1 to 5 As shown, it is a preferred embodiment of the utility model. The dresser for the polishing pad in this embodiment can be attached to the working equipment M, and the dresser includes a base 11, and the base 11 includes a grinding surface 11 for setting the dressing unit 2. Since the working equipment M is, for example, a commonly used CMP-related equipment, it will not be described and marked too much, and the base 1 in this embodiment also includes a mounting surface 14 located on the other side of the base 1 relative to the grinding surface 11, and the mounting surface 14 is provided with a mounting hole 15 for mounting to the working equipment M and two positioning holes 16 for positioning the base 1, and the outer diameter of the positioning hole 16 is slightly larger than the outer diameter of the mounting hole 15. Further, a dressing unit 2 for dressing the polishing pad is provided on the grinding surface 11, and the dressing unit 2 includes at least two abrasive pieces 21 arranged circumferentially on the grinding surface 11. In order to position the abrasive particles 21, a positioning portion 12 capable of positioning each abrasive particle 21 is provided on the grinding surface 11 of the base 1, and each abrasive particle 21 is retained on its corresponding positioning portion 12 by an adhesive. In order to facilitate processing as much as possible while satisfying the function of the positioning portion 12, the positioning portion 12 in this embodiment is a concave portion formed by partially concavely downwardly concave the grinding surface 11 of the base 1.

[0031] See also Figure 1In this embodiment, the base 1 is provided with an adjustment mechanism 3, which can adjust the height difference δ between the reference planes S1 and S2 where the tips 22 of at least some of the abrasive particles 21 of the dressing unit 2 are located relative to the polishing surface 11. The reference plane represents the plane where the tips 22 are located and parallel to the polishing surface 11. With such a design, even if the shapes of the tips 22 of each abrasive particle 21 are individually different, the height difference δ of the tips of each abrasive particle 21 can be adjusted to within an allowable range through the adjustment mechanism 3, thereby facilitating the formation of a uniform polishing pad surface. In order to enable the dresser to form a uniform polishing pad surface, the range of the height difference δ in this embodiment is 0 to 20 um. In order to enable the adjustment mechanism 3 to adjust the height difference δ between the reference planes S1 and S2 where the tips 22 of at least some of the abrasive pieces 21 of the dressing unit 2 are located relative to the grinding surface 11, the adjustment mechanism 3 in this embodiment includes a base 31. Correspondingly, an opening 13 is provided on the base body 1 for the base 31 to be adjusted in an up and down movement manner, i.e., the up and down movement manner is perpendicular to the plane direction where the grinding surface 11 is located, and the positioning portion 12 is arranged on the upper surface of the base 31. With such a design, not only can the height difference δ of the tips 22 of each abrasive piece 21 be adjusted to within the allowable range, but the base 31 can also be disassembled from the opening 13 to replace the abrasive piece 21, and the abrasive piece 21 can be replaced with a corresponding matching abrasive piece 21 when polishing pads of different surfaces need to be processed. See. Figure 2 In this embodiment, the outer peripheral wall of the base 31 is formed with an external thread 32, and correspondingly, the opening 13 is a threaded hole. In order to facilitate the rotation of the base 31 in the opening 13, the opening 13 in this embodiment is connected with the base 1, and a slot 33 for inserting a tool is provided on the lower surface of the base 31. The slot 33 is provided on the lower surface of the base 31, so that the operator or the instrument can easily rotate the base 31 in the opening 13 through the tool matching the slot 33.

[0032] The use process of the trimmer provided in this embodiment is as follows:

[0033] See also Figure 6 The dresser has an abrasive piece 21 with a relatively high tip 22. For the sake of distinction, the other abrasive pieces 21 with the same shape may be referred to as the first abrasive piece 21a, and the abrasive piece 21 with a special shape may be referred to as the second abrasive piece 21b. At the same time, the tip 22 of the first abrasive piece 21a may be referred to as the first tip 22a, and the first tip 22a may correspond to the first reference surface S1. Similarly, the tip of the second abrasive piece 21b may be referred to as the second tip 22b, and the second tip 22b may correspond to the second reference surface S2. At this time, the height difference δ between the first reference surface S1 and the second reference surface S2 relative to the grinding surface 11 exceeds the allowable range, so the dresser is in a state to be adjusted; see Figure 7By moving the base 31 corresponding to the second abrasive member 21b downward, the height difference δ between the first reference surface S1 and the second reference surface S2 relative to the grinding surface 11 is reduced to an allowable range, so that the dresser enters an adjusted state, at which time the dresser can make the polishing pad form a uniform surface.

Claims

1. A dresser for a polishing pad, capable of being attached to a working device (M), comprising: A base (1) comprising a polishing surface (11) for arranging a trimming unit (2); A dressing unit (2) for dressing the polishing pad, comprising at least two abrasive particles (21) arranged circumferentially on the polishing surface (11); Features: A positioning portion (12) capable of positioning each of the abrasive grain pieces (21) is provided on the grinding surface (11) of the base (1), and each of the abrasive grain pieces (21) is retained on its corresponding positioning portion (12) by means of an adhesive.

2. The trimmer according to claim 1, characterized in that: The positioning portion (12) is a concave portion formed by partially concavely moving the polished surface (11) of the base body (1) downward.

3. The trimmer according to claim 1 or 2, characterized in that: The base (1) is provided with an adjustment mechanism (3) capable of adjusting the height difference (δ) between the reference plane S1 and the reference plane S2 where the tip (22) of at least part of the abrasive piece (21) of the dressing unit (2) is located relative to the grinding surface (11).

4. The trimmer according to claim 3, characterized in that: The height difference (δ) ranges from 0 to 20 um.

5. The trimmer according to claim 4, characterized in that: The adjustment mechanism (3) comprises a base (31), and correspondingly, the base body (1) is provided with an opening (13) for adjusting the base (31) in an up-and-down movement manner, wherein the up-and-down movement manner is perpendicular to the plane direction where the polishing surface (11) is located, and the positioning portion (12) is arranged on the upper surface of the base (31).

6. The trimmer according to claim 5, characterized in that: An outer peripheral wall of the base (31) is formed with an external thread (32), and correspondingly, the opening (13) is a threaded hole.

7. The trimmer according to claim 6, characterized in that: The opening (13) is connected to the base (1), and a slot (33) for inserting a tool is provided on the lower surface of the base (31).

8. The trimmer according to claim 7, characterized in that: The base (1) further comprises a mounting surface (14) located on the other side of the base (1) relative to the polishing surface (11); the mounting surface (14) is provided with a mounting hole (15) for mounting to the working equipment (M); the mounting surface (14) is also provided with at least two positioning holes (16) for positioning the base (1).

Citation Information

Patent Citations

  • Brazed diamond dresser based on cluster-shaped units

    CN216913433U