Monolithic wafer cleaning device

By designing a single-chip wafer cleaning device, using lifting liquid collection plates and optimizing inclined structures and electric flip plates, the problems of crystallization and splashing of medicine liquids in traditional cleaning process are solved, the cleaning capacity is improved and the risk of wafer scrapping is reduced. .

CN222530382UActive Publication Date: 2025-02-25SHANGHAI JINGMENG SILICON CORP
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
CN202420426576.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-03-06
Publication Date
2025-02-25
Estimated Expiration
2034-03-06

AI Technical Summary

Technical Problem

During the traditional wafer cleaning process, acid and alkaline drug solution will crystallize, and the drug solution will easily splash back to the wafer surface, resulting in increased cleaning residues and particles, poor wafer cleaning capacity, and there is a certain risk of wafer scrapping.

Method used

A single-chip wafer cleaning device is designed, including a cleaning room, a load-bearing tray, a multiple liquid supply pipes and a lifting liquid collection tray. The acid and alkaline medicine liquid is distinguished by lifting and lowering the liquid collection plate, flowing into different liquid storage areas and discharged. By optimizing the working angle of the upper inclined structure of the fence and adding a new electric flip plate, the drug liquid is better distributed and Prevent splashing.

Benefits of technology

It effectively prevents crystallization after mixing the acid and alkaline medicine liquid, reduces the splashing of the medicine liquid, improves the cleaning capacity at one time, and reduces the risk of scrapping of wafers.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN222530382U_ABST
    Figure CN222530382U_ABST
Patent Text Reader

Abstract

The utility model discloses a monolithic wafer cleaning device, which comprises a cleaning chamber, a bearing disc arranged in the cleaning chamber and used for placing and driving a wafer to rotate, a plurality of liquid supply pipelines used for flushing different cleaning agents on the surface of the wafer, and a lifting liquid collection disc arranged below the bearing disc, the lifting liquid collecting disc is divided into a plurality of liquid storage areas through multiple layers of fences, the upper portion of each layer of fence is of an inclined structure inclining towards the bearing disc, each liquid storage area is connected with a liquid outlet pipeline, and different cleaning agents can be distributed into the different liquid storage areas and then discharged by adjusting the height of the lifting liquid collecting disc up and down. According to the utility model, acid-base liquid medicine can be distinguished in a lifting manner of the lifting liquid collecting tray during cleaning, flows into different liquid storage areas and is discharged respectively, so that the liquid medicine is prevented from being mixed and crystallized, the liquid medicine can be better distributed, the problem that the liquid medicine is splashed back in the cleaning process is solved, the one-time cleaning capability is improved, and the scrap of wafers is reduced.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The utility model relates to the technical field of wafer cleaning, in particular to a single-chip wafer cleaning device. Background Art

[0002] When the wafer cleaning machine is working, acid and alkali liquids need to be flushed onto the wafer surface to remove surface particles and organic matter. In the traditional cleaning process, the mixture of acid and alkali liquids will crystallize, and the liquids will easily splash back onto the wafer surface, causing cleaning residues and increased particles on the wafer surface. There is also a certain risk of wafer scrapping, and the wafer cleaning ability is poor. Utility Model Content

[0003] The technical problem to be solved by the utility model is to provide a single-chip wafer cleaning device, aiming to solve the technical problems existing in the prior art that the acid-base solution mixture will crystallize during the traditional cleaning process, the solution is easy to splash back to the wafer surface, and the wafer cleaning ability is poor.

[0004] The technical solution of the utility model is: a single-chip wafer cleaning device, including a cleaning chamber, a carrier plate arranged in the cleaning chamber for placing and driving the wafer to rotate, and a plurality of liquid supply pipes for flushing different cleaning agents onto the surface of the wafer. A lifting liquid collecting plate is arranged below the carrier plate, and the lifting liquid collecting plate is divided into a plurality of liquid storage areas by multiple layers of enclosures. The upper part of each layer of enclosure is an inclined structure inclined toward the carrier plate, and each liquid storage area is connected to a liquid outlet pipe. By adjusting the height of the lifting liquid collecting plate up and down, different cleaning agents can be respectively distributed to different liquid storage areas and then discharged.

[0005] Furthermore, the liquid supply pipeline described in the utility model includes an SC1 liquid medicine pipe, a first pure water pipe, a second pure water pipe, an ozone water pipe, and a DHF liquid medicine pipe, and each liquid supply pipeline is provided with a nozzle.

[0006] Furthermore, the angle between the inclined structure and the horizontal plane in the utility model is 10° to 15°.

[0007] Furthermore, the utility model has three liquid storage areas, which are, from the inside to the outside, an inner liquid storage area for collecting SC1 liquid, a middle liquid storage area for collecting DHF liquid, and an outer liquid storage area for collecting pure water and ozone water.

[0008] Furthermore, the liquid outlet pipe in the utility model includes an inner hose connected to the liquid storage area and an outer connecting pipe connected to the inner hose, and a valve is provided on the outer connecting pipe.

[0009] Furthermore, an electric flip plate is provided on the inclined structure of the inner liquid storage area enclosure in the utility model, and the electric flip plate is used to adjust the rotation angle according to different liquid medicines to achieve better distribution.

[0010] Furthermore, the lifting liquid collecting tray in the utility model is driven to lift by a cylinder.

[0011] Compared with the prior art, the utility model has the following advantages: the single-chip wafer cleaning device of the utility model places the wafer on a carrier plate, and the carrier plate rotates during the cleaning process, and acid and alkali liquids are flushed on the surface of the wafer through different nozzles to remove surface particles and organic matter. In order to prevent crystallization after the acid and alkali liquids are mixed, the acid and alkali liquids are separated by raising and lowering the liquid collection plate during cleaning, and flow into different liquid storage areas for discharge respectively; in addition, by optimizing the working angle of the upper inclined structure of the enclosure and adding a matching electric flip plate, not only can the liquid be better distributed, but also the problem of liquid splashing back during the cleaning process can be solved, thereby improving the one-time cleaning capacity and reducing the scrapping of wafers. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 The figure is a schematic diagram of the overall structure of the utility model (the electric flip plate is not shown);

[0013] Figure 2 This is a simplified diagram of the utility model using an electric flip plate to export SC1 liquid;

[0014] Figure 3 This is a simplified diagram of the utility model using an electric flip plate to export DHF liquid medicine.

[0015] Wherein: 1. Cleaning chamber; 2. Carrying plate; 3. SC1 liquid pipe; 4. First pure water pipe; 5. Second pure water pipe; 6. Ozone water pipe; 7. DHF liquid pipe; 8. Lifting liquid collection plate; 8a. Inner liquid storage area; 8b. Middle liquid storage area; 8c. Outer liquid storage area; 9. Enclosure; 9a. Inclined structure; 10. Inner hose; 11. External connecting pipe; 12. Valve; 13. Electric flip plate; a. Wafer. DETAILED DESCRIPTION

[0016] The specific implementation of the utility model is described in detail below with reference to the accompanying drawings.

[0017] Example:

[0018] The accompanying drawings show a specific implementation of a single-chip wafer cleaning device of the present invention. Figure 1 , which mainly includes a cleaning chamber 1, a carrier plate 2 arranged in the cleaning chamber 1 for placing and driving the wafer a to rotate, and multiple liquid supply pipes for flushing different cleaning agents on the surface of the wafer a. In this embodiment, the liquid supply pipe includes an SC1 liquid pipe 3, a first pure water pipe 4, a second pure water pipe 5, an ozone water pipe 6, and a DHF liquid pipe 7. Each liquid supply pipe is provided with a nozzle, and the nozzle flushes the cleaning agent on the surface of the wafer.

[0019] A lifting liquid collecting tray 8 is provided below the carrier plate 2. The lifting liquid collecting tray 8 is separated into three liquid storage areas by multi-layer enclosures 9, which are, from the inside to the outside, an inner liquid storage area 8a for collecting SC1 liquid, a middle liquid storage area 8b for collecting DHF liquid, and an outer liquid storage area 8c for collecting pure water and ozone water. The upper part of each layer of enclosure 9 is an inclined structure 9a inclined toward the carrier plate 2. In this embodiment, the angle between the inclined structure 9a and the horizontal plane is 10° to 15°, which can well avoid the problem of liquid splashing back during the cleaning process.

[0020] Each liquid storage area is connected to a liquid outlet pipeline, which includes an inner hose 10 connected to the liquid storage area and an outer connecting pipe 11 connected to the inner hose 10 . A valve 12 is provided on the outer connecting pipe 11 .

[0021] In this embodiment, not shown in the figure, the lifting liquid collecting tray 8 is driven by a cylinder to lift and lower, and different cleaning agents can be distributed to different liquid storage areas and then discharged by adjusting the height of the lifting liquid collecting tray 8 up and down.

[0022] In addition, in this embodiment, an electric flip plate 13 is provided on the inclined structure 9a of the enclosure 9 of the inner liquid storage area 8a. The electric flip plate 13 is used to adjust the rotation angle according to different liquid medicines to achieve better distribution.

[0023] When the single-chip wafer cleaning device of the utility model is working, the robot takes out the wafer a from the loading box and places it on the carrier plate 2 of the cleaning chamber 1. During the cleaning process, the carrier plate 2 rotates, and the acid and alkali liquids are flushed on the surface of the wafer through different nozzles to remove surface particles and organic matter. In order to prevent crystallization after the acid and alkali liquids are mixed, the acid and alkali liquids are separated by lifting the liquid collection plate 8 during cleaning, and flow into different liquid storage areas for separate discharge. Specifically, when the SC1 liquid tube 3 flushes the SC1 liquid on the surface of the wafer, the lifting liquid collection plate 8 rises to a high position, and the inner liquid storage area 8a is used to collect the liquid. At this time, the electric flip plate 13 tends to rotate in the vertical direction to prevent the liquid from entering the middle liquid storage area 8b. Figure 2 When the DHF liquid pipe 7 flushes the DHF liquid on the wafer surface, the liquid collecting plate 8 is raised and lowered to the middle position, and the liquid is collected in the middle liquid storage area 8b. At this time, the electric flip plate 13 tends to rotate horizontally to prevent the liquid from entering the inner liquid storage area 8a. Figure 3 Not shown, when the pure water pipe or the ozone water pipe 6 is flushed, the lifting liquid collection tray 8 is lowered to a low position, and the outer layer liquid storage area 8c is used to collect the pure water and the ozone water.

[0024] In addition, it should be noted that when switching different liquid storage areas, the electric flip plate 13 can be first adjusted to the same angle as the inclined structure 9a of the inner liquid storage area 8a enclosure 9, and then a secondary angle adjustment can be performed to reduce the problem of liquid splashing back.

[0025] Of course, the above embodiments are only for illustrating the technical concept and features of the utility model, and their purpose is to enable people familiar with the technology to understand the content of the utility model and implement it accordingly, and they cannot be used to limit the protection scope of the utility model. Any modifications made according to the spirit of the main technical solution of the utility model should be included in the protection scope of the utility model.

Claims

1. A single-wafer cleaning device, characterized in that: The invention comprises a cleaning chamber (1), a carrier plate (2) arranged in the cleaning chamber (1) for placing and driving a wafer (a) to rotate, and a plurality of liquid supply pipes for flushing different cleaning agents onto the surface of the wafer (a); a lifting liquid collecting plate (8) is arranged below the carrier plate (2); the lifting liquid collecting plate (8) is divided into a plurality of liquid storage areas by multiple layers of enclosures (9); the upper part of each layer of enclosures (9) is an inclined structure (9a) inclined toward the carrier plate (2); each liquid storage area is connected to a liquid outlet pipe; and different cleaning agents can be respectively distributed to different liquid storage areas and then discharged by adjusting the height of the lifting liquid collecting plate (8) up and down.

2. The single-wafer cleaning device according to claim 1, characterized in that: The liquid supply pipeline comprises an SC1 liquid medicine pipe (3), a first pure water pipe (4), a second pure water pipe (5), an ozone water pipe (6), and a DHF liquid medicine pipe (7), and each liquid supply pipeline is provided with a nozzle.

3. The single-wafer cleaning device according to claim 1, characterized in that: The angle between the inclined structure (9a) and the horizontal plane is 10° to 15°.

4. The single-wafer cleaning device according to claim 2, characterized in that: The liquid storage area has three parts, which are, from the inside to the outside, an inner liquid storage area (8a) for collecting SC1 liquid, a middle liquid storage area (8b) for collecting DHF liquid, and an outer liquid storage area (8c) for collecting pure water and ozone water.

5. The single-wafer cleaning device according to claim 1, characterized in that: The liquid outlet pipeline comprises an inner hose (10) connected to the liquid storage area and an outer connecting pipe (11) connected to the inner hose (10), wherein a valve (12) is provided on the outer connecting pipe (11).

6. The single-wafer cleaning device according to claim 4, characterized in that: An electric flip plate (13) is provided on the inclined structure (9a) of the enclosure (9) of the inner liquid storage area (8a), and the electric flip plate (13) is used to adjust the rotation angle according to different liquid medicines to achieve better distribution.

7. The single-wafer cleaning device according to claim 1, characterized in that: The lifting liquid collecting tray (8) is driven to lift by a cylinder.