Gas mixing device and semiconductor equipment

Abstract

The utility model provides a gas mixing device and semiconductor equipment, including: a gas mixing pipe and at least one gas guide pipe, the gas guide pipe is arranged on the side wall of the gas mixing pipe and extends into the gas mixing pipe, the gas guide pipe located in the gas mixing pipe is provided with at least one gas outlet hole, and the orientation of the gas outlet hole is consistent with the flow direction of carrier gas in the gas mixing pipe. The gas mixing device is simple in structure, low in manufacturing cost and convenient for pipeline modification and maintenance. Besides, different process gases are respectively conveyed to the gas mixing pipe through the plurality of gas guide pipes, the process gases can be sprayed out along the flowing direction of the carrier gas so as to be more stably blended into the carrier gas, the process gases and the carrier gas are fully and uniformly mixed through the laminar flow distribution assembly, and the mixing pipe effectively reduces the pressure difference by increasing the through-flow sectional area and reducing the flow speed, so that the gas mixing efficiency is improved. And the carrier gas and the process special gas are stably and uniformly mixed.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor manufacturing, in particular to a gas mixing device and semiconductor equipment. Background Art

[0002] In semiconductor equipment, gas mixing devices usually play a vital role and have the characteristics of high precision and high stability. These devices are responsible for mixing a variety of special gases and carrier gases in precise proportions to meet specific needs in the semiconductor manufacturing process and ensure the normal progress of the process. Especially in the EPI (epitaxial layer) process, the gas purity, mixing ratio and flow form are extremely high. Any slight deviation may cause defects in the growth of single crystals on the wafer surface.

[0003] The gas mixing device generally adopts a multi-layer structure design, introduces different gases into the mixing chamber through multiple air flow channels, buffers and mixes them in the mixing chamber, and uses a special stirring device to achieve rapid and uniform gas delivery. The gas path design and gas mixing pipeline structure design with the above structure are usually sophisticated and complex, with high manufacturing cost and high maintenance cost.

[0004] In view of this, it is necessary to provide a gas mixing device and a semiconductor device to solve the above problems. Utility Model Content

[0005] The utility model aims to provide a gas mixing device and a semiconductor device, so as to improve the problems of the existing gas mixing device having a complicated structure design and a high manufacturing cost.

[0006] The utility model provides a gas mixing device, comprising: a gas mixing tube and at least one gas guide tube, wherein the gas guide tube is arranged on the side wall of the gas mixing tube and extends into the gas mixing tube, and the gas guide tube located inside the gas mixing tube is provided with at least one gas outlet hole, and the direction of the gas outlet hole is consistent with the flow direction of the carrier gas in the gas mixing tube.

[0007] In a possible embodiment, the air ducts are a group distributed in an array, and the air ducts can be arranged horizontally, vertically or obliquely; or,

[0008] The air guide tubes are at least two groups, and the air guide tubes in the same group are arranged in parallel, and the air guide tubes in different groups are arranged in a staggered manner, and the arrangement directions of the air guide tubes in different groups are different or the same; or,

[0009] The air guide tubes are at least one group, and each group of air guide tubes is distributed in a circular array.

[0010] In a possible embodiment, the air guide tubes are a group of air guide tubes arranged in parallel, the air outlet holes are arranged obliquely, and the inclination directions of the air outlet holes on two adjacent air guide tubes are opposite.

[0011] In a possible embodiment, the gas mixing device further includes a laminar flow distribution component disposed in the gas mixing pipe and located behind the gas guide pipe, and the laminar flow distribution component is provided with a plurality of flow diversion channels distributed at intervals.

[0012] In a possible embodiment, the laminar flow distribution assembly includes a plurality of splitter plates distributed at intervals, wherein the splitter plates are supported on the inner wall of the mixing pipe, and the splitter channel is formed between two adjacent splitter plates; and / or,

[0013] There are at least two laminar flow distribution components, and the arrangement directions of the diversion channels on different laminar flow distribution components are different.

[0014] In a possible embodiment, the laminar flow distribution component is provided with a plurality of groups of flow holes distributed at intervals.

[0015] In a possible embodiment, the gas mixing pipe includes a main body section and expansion sections respectively provided at two ends of the main body section;

[0016] The expansion section includes a first end close to the main section and a second end away from the main section, the second end is used to connect to the carrier gas delivery pipeline, the flow cross-sectional area of ​​the second end is equal to the flow cross-sectional area of ​​the delivery pipeline, and the flow cross-sectional area of ​​the expansion section gradually increases from the second end to the first end.

[0017] In a possible embodiment, there are a plurality of air outlet holes, which are spaced apart along the length direction of the air duct.

[0018] In a possible embodiment, the air guide tube is in a straight line or a curved shape; wherein the orientation of a portion of the curved air guide tube having the air outlet hole is consistent with the flow direction of the carrier gas in the gas mixing tube.

[0019] In addition, the utility model further provides a semiconductor device, including: a gas mixing device as in any of the above embodiments.

[0020] The beneficial effect of the gas mixing device provided by the utility model is that by setting an air guide tube on the gas mixing tube, the process gas is introduced into the gas mixing tube through the air guide tube to achieve mixing of the process gas and the carrier gas in the gas guide tube. Compared with sophisticated and complex gas mixing devices, the gas mixing device of the utility model has the characteristics of simple structure, low manufacturing cost, and convenient pipeline modification and maintenance. In a further scheme, by setting a laminar flow distribution component, the carrier gas and the process gas are evenly mixed, so that the gas flow is stably and evenly transported. In a further scheme, by setting the mixing tube with a variable diameter, the carrier gas flow rate is slowed down and the pressure difference during fluid mixing is reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a three-dimensional diagram of the gas mixing device of the utility model in the first embodiment.

[0022] Figure 2 This is an exploded view of the gas mixing device of the utility model in the first embodiment.

[0023] Figure 3 It is a cross-sectional view of the gas mixing device of the utility model in the first embodiment.

[0024] Figure 4 It is a schematic diagram of the gas flow direction at the air guide pipe and the first laminar flow distribution component in the gas mixing device of the utility model.

[0025] Figure 5 This is an exploded view of the gas mixing device of the utility model in the second embodiment.

[0026] Figure 6 It is a cross-sectional view of the gas mixing device of the utility model in the second embodiment.

[0027] Figure 7 It is a three-dimensional diagram of the gas mixing device of the utility model in the third embodiment.

[0028] Figure 8 It is a cross-sectional view of the gas mixing device of the present utility model in the third embodiment.

[0029] Fig. 9 It is an exploded view of the gas mixing device of the utility model in the fourth embodiment.

[0030] Fig.10 It is a cross-sectional view of the gas mixing device of the utility model in the fourth embodiment.

[0031] Fig.11 It is a three-dimensional cross-sectional view of the gas mixing device of the utility model at the first laminar flow distribution component.

[0032] Fig.12 for Fig.11 Side intention from center right perspective.

[0033] Fig.13 It is a three-dimensional cross-sectional view of the gas mixing device of the utility model at the second laminar flow distribution component.

[0034] Fig.14 for Fig.13 Side intention from center right perspective.

[0035] Explanation of the reference numerals: mixing pipe 110; main section 111; expansion section 112; connecting section 113; air guide pipe 120; air outlet 121; extension portion 122; first pipe section 123; second pipe section 124; first laminar flow distribution component 130; first diverter plate 131; first diverter channel 132; second laminar flow distribution component 140; second diverter plate 141; second diverter channel 142. DETAILED DESCRIPTION

[0036] In order to make the purpose, technical solution and advantages of the embodiments of the utility model clearer, the technical solution in the embodiments of the utility model will be described clearly and completely below. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0037] Existing gas circuit mixing devices generally adopt a multi-layer structure design, and the gas circuit design and mixing pipeline structure design are sophisticated and complex, with high manufacturing costs and high maintenance costs.

[0038] In view of the problems existing in the prior art, the embodiment of the utility model provides a gas mixing device, which can be applied to the EPI machine and other equipment in semiconductor manufacturing, see Figure 1 The gas mixing device includes: a gas mixing tube 110 and at least one gas guide tube 120, the gas guide tube 120 is arranged on the side wall of the gas mixing tube 110 and extends into the gas mixing tube 110, and the gas guide tube 120 located inside the gas mixing tube 110 is provided with at least one gas outlet 121, and the direction of the gas outlet 121 is consistent with the flow direction of the carrier gas in the gas mixing tube 110. Specifically, the gas mixing device is made of quartz material or the like.

[0039] In this embodiment, an air guide tube 120 is provided on the gas mixing tube 110, and the direction of the gas outlet 121 on the air guide tube 120 is consistent with the flow direction of the carrier gas in the gas mixing tube 110. Process gas is introduced into the air guide tube 120, and the process gas will be ejected along the flow direction of the carrier gas in the gas mixing tube 110, so that the process gas is quickly integrated into the carrier gas, reducing the resistance in the mixing process, avoiding turbulence, and allowing the gas to reach a uniform mixing state more stably. Compared with a sophisticated and complex gas mixing device, the gas mixing device has a simple structure, low manufacturing cost, and is convenient for later pipeline modification and maintenance.

[0040] The gas mixture in a common EPI (epitaxial layer) machine is directly connected to the carrier gas pipeline through the special gas pipeline, and enters the process chamber after being distributed by the MFC (mass flow controller) and the FRC (flow ratio controller). When the flow difference between the carrier gas and the special gas is large, turbulence is likely to occur in the above-mentioned gas pipeline, resulting in uneven distribution of gas concentration flowing into the process chamber, which directly affects the growth of EPI. Among them, special gas, which is the abbreviation of special gas, refers to gases with special chemical and physical properties, which are gaseous at normal temperature and pressure. Special gases usually have the characteristics of being flammable, explosive, toxic, corrosive, and oxidizing. In view of the problem of turbulence that is easy to occur in gas pipelines in the prior art, the present application has made further improvements to the setting method of the air guide tube 120.

[0041] In the first embodiment, if Figure 2 , Figure 3 , Figure 4 As shown, the air guide tubes 120 are a group distributed in an array, and the air guide tubes 120 can be arranged horizontally, vertically or obliquely; or, the air guide tubes 120 are at least two groups, and the air guide tubes 120 in the same group are arranged in parallel, and the air guide tubes 120 in different groups are staggered. The arrangement directions of the air guide tubes 120 in different groups are different or the same, and two adjacent air guide tubes 120 are respectively air guide tubes 120 in different groups. In the second embodiment, as Figure 5 and Figure 6 As shown, the two groups of air guide tubes 120 are arranged in different directions. In the third embodiment, as shown in FIG. Figure 7 and Figure 8 As shown, the two groups of air guide tubes 120 are arranged in the same direction and are arranged in parallel; or, in the fourth embodiment, as shown in FIG. Fig. 9 and Fig.10 As shown, there is at least one group of air guide pipes 120, and each group of air guide pipes 120 is distributed in a circular array. The specific arrangement of the air guide pipes 120 in the mixing pipe 110 is not limited to the above arrangement, and can be reasonably optimized according to the specific pipeline arrangement of the machine.

[0042] Different process gases are introduced into the mixing tube 110 through different gas guide tubes 120, and mixed with the carrier gas along the flow direction of the carrier gas in the mixing tube 110. The gas guide tubes 120 of the same group are arranged in the same direction, and the gas guide tubes 120 of different groups are arranged in different directions. Figure 5 and Figure 6 As shown, two groups of air guide tubes 120 are arranged on the mixing tube 110, one group is inclined to the left, and the other group is inclined to the right. The two groups of air guide tubes 120 are arranged alternately, that is, two adjacent air guide tubes 120 are respectively from different groups of air guide tubes 120, which reduces the obstruction of the latter air guide tube 120 to the gas ejected from the former air guide tube 120, avoids the gas ejected from the former air guide tube 120 being sprayed onto the latter air guide tube 120 before being fully mixed with the carrier gas, ensures that the process gas is fully mixed with the carrier gas, avoids turbulence, ensures stable and uniform delivery of the airflow, and improves the gas mixing quality.

[0043] In a specific embodiment, the air guide tubes 120 are arranged in parallel, and the air outlet holes 121 are arranged at an angle, and the air outlet holes 121 on two adjacent air guide tubes 120 are arranged at opposite angles. The air outlet holes 121 are arranged at an angle to avoid the latter air guide tube 120 blocking the gas ejected from the previous air guide tube 120. For example, Figure 3 and Figure 4 As shown, a group of air ducts 120 are arranged in parallel in the horizontal direction, and the air outlet 121 of one of the two adjacent air ducts 120 is arranged obliquely upward, and the air outlet 121 of the other air duct 120 is arranged obliquely downward, so that the gases ejected from the two adjacent air ducts 120 will not intersect, ensuring that the process gas and the carrier gas are fully mixed, avoiding the turbulence problem caused by excessive concentration of regional airflow, ensuring stable and uniform delivery of the airflow, and improving the mixing quality.

[0044] In one embodiment, if Figure 1 and Figure 2 As shown, there are a plurality of air outlet holes 121 which are spaced apart along the length direction of the air guide tube 120 so that the air from the air guide tube 120 can be more evenly diffused into the mixing tube, thereby achieving more even and stable mixing of the gas.

[0045] In some embodiments, the air guide tube 120 is in a straight or curved shape, wherein the direction of the portion of the curved air guide tube 120 having the air outlet 121 is consistent with the flow direction of the carrier gas in the gas mixing tube 110. For example, an L shape. Figure 1 and Figure 2 As shown, a plurality of air outlet holes 121 are provided on the linear air guide tube 120. Figure 7 and Fig. 9As shown, the air guide pipe 120 is L-shaped and includes a first pipe section 123 and a second pipe section 124 that are perpendicular to each other. The first pipe section 123 is arranged on the side wall of the gas mixing pipe 110. The arrangement direction of the first pipe section 123 is perpendicular to the flow direction of the carrier gas. The arrangement direction of the second pipe section 124 is consistent with the flow direction of the carrier gas. The end of the second pipe section 124 has an air outlet 121, as shown in FIG. Figure 7 As shown, another air outlet 121 is further provided on the first pipe section 123 .

[0046] Specifically, Figure 1 As shown, the gas guide pipe 120 partially extends out of the gas mixing pipe 110 to form an extension portion 122 . The extension portion 122 is used to connect to a pipeline of a gas supply device so as to introduce process gas into the gas guide pipe 120 .

[0047] In a preferred embodiment, Figure 1 and Figure 2 As shown, the gas mixing device also includes a laminar flow distribution component disposed in the gas mixing tube 110 and located behind the gas guide tube 120. The laminar flow distribution component is provided with a plurality of flow diversion channels distributed at intervals. Different process gases are introduced into the gas mixing tube 110 through different gas guide tubes 120. After the process gas is initially mixed with the carrier gas, the process gas and the carrier gas are passed through a plurality of flow diversion channels of the laminar flow distribution component to make the process gas and the carrier gas more evenly and fully mixed, so as to form a stable fluid form, and then transported to the process chamber.

[0048] In some possible embodiments, Figure 1 As shown, the laminar flow distribution assembly includes a plurality of splitter plates distributed at intervals, the splitter plates are supported and arranged on the inner wall of the mixing pipe 110, and a splitter channel is formed between two adjacent splitter plates; and / or, as Figure 6 As shown, there are at least two laminar flow distribution components, and the direction of the flow distribution channels on different laminar flow distribution components is different. The flow distribution plates can be arranged horizontally, vertically or inclined, and the number, spacing and inclination angle of the flow distribution plates can be optimized according to different requirements for the stable state of the fluid.

[0049] In this embodiment, there are two laminar flow distribution components, such as Fig.11 and Fig.12 As shown, the first flow distribution plate 131 of the first laminar flow distribution component 130 is horizontally arranged, and the first flow distribution channel 132 is also horizontally arranged; Fig.13 and Fig.14As shown, the second flow distribution plate 141 of the second laminar flow distribution component 140 is vertically arranged, and the second flow distribution channel 142 is also vertically arranged. The gas first passes through the first laminar flow distribution component 130 to divide and mix the gas in the vertical direction, and then passes through the second laminar flow distribution component 140 to divide and mix the gas in the horizontal direction. After two times of diversion and mixing in different directions, the gas can be more fully contacted and mixed during the mixing process, making the gas mixing more uniform, avoiding the problem of local uneven mixing areas.

[0050] In one embodiment, the laminar flow distribution component is provided with a plurality of groups of shunt holes (not shown in the figure) distributed at intervals. A group of shunt holes is provided on each shunt plate from front to back. By providing shunt holes on the shunt plates, the gas can not only flow through the shunt channels between the shunt plates, but also flow through the shunt holes in the shunt plates, thereby reducing the blocking effect of the shunt plates on the gas, promoting the diffusion of the gas through multi-path circulation, and the gas components can be better mixed with each other, thereby improving the uniformity and effect of the mixing.

[0051] In a specific embodiment, Figure 1 and Figure 3 As shown, the mixing tube 110 includes a main section 111 and an expansion section 112 respectively arranged at both ends of the main section 111, the expansion section 112 includes a first end close to the main section 111 and a second end away from the main section 111, the second end is used to connect with the carrier gas delivery pipeline, the flow cross-sectional area of ​​the second end is equal to the flow cross-sectional area of ​​the delivery pipeline, the flow cross-sectional area of ​​the expansion section 112 gradually increases from the second end to the first end, and the flow cross-sectional area on the main section 111 remains unchanged and is equal to the flow cross-sectional area of ​​the first end. In this embodiment, the flow cross-sectional area of ​​the mixing tube 110 is appropriately expanded according to the flow cross-sectional area of ​​the actual carrier gas pipeline, the gas flow rate is inversely proportional to the flow cross-sectional area, and by increasing the flow cross-sectional area of ​​the mixing tube 110, the flow speed of the gas can be effectively slowed down, the pressure difference during gas mixing can be reduced, and turbulence can be avoided during gas mixing, so that the mixing process is smoother, the gas flow is ensured to be stably and evenly delivered, and the gas mixing quality is improved.

[0052] Further, such as Figure 1 and Figure 3 As shown, the gas mixing device further includes a connecting section 113 disposed at one end of the expansion section 112 away from the main section 111, and the end of the connecting section 113 away from the expansion section 112 is connected to the delivery pipeline, and the flow cross-sectional area of ​​the connecting section 113 remains unchanged and is equal to the flow cross-sectional area of ​​the carrier gas pipeline. The main section 111, the expansion section 112, and the connecting section 113 can be integrally formed or connected in sections.

[0053] In addition, the utility model further provides a semiconductor device, including: a gas mixing device as in any of the above embodiments.

[0054] The technical effects of the gas mixing device of the present utility model are described in detail below in combination with the prior art.

[0055] Compared with the sophisticated and complex structural design of the gas mixing device in the prior art, the gas mixing device in this embodiment adopts an air guide pipe 120, a laminar flow distribution component, and a mixing pipe variable diameter. There is no need to set up a special stirring device and a complex pipeline structure. It has the characteristics of simple structure, low manufacturing cost, and easy pipeline modification and maintenance.

[0056] In conventional special gas pipelines, the process gas is directly connected to the carrier gas pipeline for mixing through MFC control. When the carrier gas flow rate is much larger than the process gas, turbulence is easily formed at the pipeline connection, resulting in a difference between the actual amount of gas flowing out of the carrier gas pipeline and the MFC reading, and thus causing the concentration of the special gas flowing into the chamber to deviate from the set value. In this embodiment, the gas mixing device transports different process gases to the mixing tube 110 through multiple gas guide tubes 120 respectively. The process gas will be ejected along the flow direction of the carrier gas to more smoothly blend into the carrier gas. The laminar flow distribution component allows the process gas and the carrier gas to be fully and evenly mixed. The mixing tube increases the flow cross-sectional area and reduces the flow rate to effectively reduce the pressure difference, so that the carrier gas and the process special gas are smoothly and evenly mixed.

[0057] Although the embodiments of the utility model are described in detail above, it is obvious to those skilled in the art that various modifications and changes can be made to these embodiments. However, it should be understood that such modifications and changes are within the scope and spirit of the utility model described in the claims. Moreover, the utility model described herein may have other embodiments and may be implemented or realized in a variety of ways. Unless otherwise defined, the technical terms or scientific terms used herein should be understood by people with ordinary skills in the field to which the utility model belongs. The words "including" and the like used herein mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

Claims

1. A gas mixing device, characterized in that: include: A gas mixing tube and at least one gas guide tube, wherein the gas guide tube is arranged on the side wall of the gas mixing tube and extends into the gas mixing tube, and the gas guide tube located inside the gas mixing tube is provided with at least one gas outlet hole, and the direction of the gas outlet hole is consistent with the flow direction of the carrier gas in the gas mixing tube.

2. The gas mixing device according to claim 1, characterized in that: The air ducts are arranged in a group in an array, and the air ducts can be arranged horizontally, vertically or obliquely; or, The air guide tubes are at least two groups, and the air guide tubes in the same group are arranged in parallel, and the air guide tubes in different groups are arranged in a staggered manner, and the arrangement directions of the air guide tubes in different groups are different or the same; or, The air guide tubes are at least one group, and each group of air guide tubes is distributed in a circular array.

3. The gas mixing device according to claim 1, characterized in that: The air guide tubes are arranged in parallel as a group, the air outlet holes are arranged obliquely, and the inclination directions of the air outlet holes on two adjacent air guide tubes are opposite.

4. The gas mixing device according to claim 1, characterized in that: It also includes a laminar flow distribution component which is arranged in the gas mixing pipe and located behind the gas guide pipe. The laminar flow distribution component is provided with a plurality of flow diversion channels which are distributed at intervals.

5. The gas mixing device according to claim 4, characterized in that: The laminar flow distribution assembly comprises a plurality of splitter plates distributed at intervals, wherein the splitter plates are supported on the inner wall of the gas mixing pipe, and the splitter channel is formed between two adjacent splitter plates; and / or, There are at least two laminar flow distribution components, and the arrangement directions of the diversion channels on different laminar flow distribution components are different.

6. The gas mixing device according to claim 4, characterized in that: The laminar flow distribution component is provided with a plurality of groups of flow holes which are distributed at intervals.

7. The gas mixing device according to claim 1, characterized in that: The gas mixing pipe includes a main body section and expansion sections respectively arranged at two ends of the main body section; The expansion section includes a first end close to the main section and a second end away from the main section, the second end is used to connect to the carrier gas delivery pipeline, the flow cross-sectional area of ​​the second end is equal to the flow cross-sectional area of ​​the delivery pipeline, and the flow cross-sectional area of ​​the expansion section gradually increases from the second end to the first end.

8. The gas mixing device according to any one of claims 1 to 7, characterized in that: There are a plurality of air outlet holes which are arranged at intervals along the length direction of the air guide tube.

9. The gas mixing device according to any one of claims 1 to 7, characterized in that: The air guide tube is in a straight line or a curved shape; wherein the orientation of a portion of the curved air guide tube having the air outlet hole is consistent with the flow direction of the carrier gas in the gas mixing tube.

10. A semiconductor device, characterized in that: include: A gas mixing device as claimed in any one of claims 1 to 9.

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