X-ray wavefront phase detection device and system

Abstract

The utility model discloses an X-ray wavefront phase detection device and system, the X-ray wavefront phase detection device comprises a first substrate and grating structure units, the grating structure units are arranged on the first substrate in an array, and the grating structure units are used for detecting an X-ray wavefront phase and an X-ray spectrum. According to the X-ray wavefront phase detection device, the grating structure unit is integrated on the first substrate, and the grating structure unit can detect the X-ray wavefront phase and the X-ray spectrum, so that the spectrum resolution function of the X-ray wavefront phase detection device can be realized.

Description

Technical Field

[0001] The utility model relates to the technical field of optics, in particular to an X-ray wavefront phase detection device and system. Background Art

[0002] X-ray wavefront phase detection technology has a wide range of applications in microscopic imaging, lensless coherent diffraction imaging, X-ray optical phase detection, and semiconductor device nondestructive testing. However, existing X-ray wavefront phase detection devices generally do not have spectral resolution capabilities.

[0003] Therefore, the prior art still needs to be improved and developed. Utility Model Content

[0004] In view of the above-mentioned deficiencies in the prior art, an object of the present invention is to provide an X-ray wavefront phase detection device and system to solve the problem that the existing X-ray wavefront phase detection device does not have a spectral resolution function.

[0005] The technical solution of the utility model is as follows:

[0006] An X-ray wavefront phase detection device comprises a first substrate and a grating structure unit, wherein the grating structure unit array is arranged on the first substrate, and the grating structure unit is used to detect the X-ray wavefront phase and the X-ray spectrum.

[0007] According to a further configuration of the present invention, the grating structure unit includes a second substrate and a grating structure spaced apart and arranged on the second substrate.

[0008] According to a further configuration of the present invention, the second substrate is a square structure; the grating structure is distributed in the plane of the first substrate and along the vertical direction of the X-axis.

[0009] According to a further configuration of the utility model, the array period between the grating structure units is 50-200 mm.

[0010] According to a further configuration of the utility model, the grating structure unit includes a plurality of grating structures, and the grating structures are arranged at intervals on the first substrate.

[0011] According to a further configuration of the utility model, the height of the grating structure is 30-100 microns; the thickness of the grating structure is 2-10 microns; the spacing between the same edges of two adjacent grating structures is 4-20 microns; and the array period between two adjacent grating structure units is 100-300 microns.

[0012] According to a further configuration of the utility model, the grating structure unit includes a plurality of through holes arranged at intervals on the first substrate.

[0013] According to a further configuration of the utility model, the diameter of the through hole is 2-10 microns; the spacing between the same edges of two adjacent through holes is 4-20 microns; and the array period between two adjacent grating structure units is 100-300 microns.

[0014] An X-ray wavefront phase detection system based on the above-mentioned X-ray wavefront phase detection device comprises an X-ray detector and the above-mentioned X-ray wavefront phase detection device, wherein the X-ray detector is arranged opposite to the X-ray wavefront phase detection device.

[0015] An X-ray wavefront phase detection system based on the above-mentioned X-ray wavefront phase detection device comprises a vacuum cavity, an X-ray blocking window, an X-ray detector and the X-ray wavefront phase detection device as described above; the X-ray detector and the X-ray wavefront phase detection device are both located in the vacuum cavity, and the X-ray detector and the X-ray wavefront phase detection device are arranged opposite to each other; the X-ray blocking window is arranged on one side of the vacuum cavity and opposite to the X-ray wavefront phase detection device.

[0016] The utility model provides an X-ray wavefront phase detection device and system, an X-ray wavefront phase detection device, which includes a first substrate and a grating structure unit, wherein the grating structure unit array is arranged on the first substrate, and the grating structure unit is used to detect the X-ray wavefront phase and the X-ray spectrum. The utility model integrates the grating structure unit on the first substrate, and the grating structure unit can detect the X-ray wavefront phase and the X-ray spectrum, thereby realizing the spectral resolution function of the X-ray wavefront phase detection device. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary personnel in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.

[0018] Figure 1 It is a schematic structural diagram of an X-ray wavefront phase detection device in one embodiment of the utility model.

[0019] Figure 2 yes Figure 1 A partial enlarged view of point A in the middle.

[0020] Figure 3 It is a structural schematic diagram of an X-ray wavefront phase detection device in another embodiment of the utility model.

[0021] Figure 4 It is a structural schematic diagram of an X-ray wavefront phase detection device in yet another embodiment of the utility model.

[0022] Figure 5 It is a structural principle diagram of an X-ray wavefront phase detection system in one embodiment of the utility model.

[0023] Figure 6 It is a result principle diagram of an X-ray wavefront phase detection system in another embodiment of the utility model.

[0024] The marks in the accompanying drawings are: 10, X-ray wavefront phase detection device; 101, first substrate; 102, grating structure unit; 1021, second substrate; 1022, grating structure; 1023, through hole; 20, X-ray detector; 30, vacuum chamber; 40, X-ray blocking window. DETAILED DESCRIPTION

[0025] The utility model provides an X-ray wavefront phase detection device and system. In order to make the purpose, technical solution and effect of the utility model clearer and more specific, the utility model is further described in detail with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described here are only used to explain the utility model and are not used to limit the utility model.

[0026] In the embodiments and patent claims, unless the article is specifically limited in the text, "a", "an", "said" and "the" may also include plural forms. If there are descriptions involving "first", "second", etc. in the embodiments of the utility model, the descriptions of "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" or "second" may explicitly or implicitly include at least one of the features.

[0027] It should be further understood that the term "comprising" used in the specification of the utility model refers to the presence of the features, integers, steps, operations, elements and / or components, but does not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components and / or their groups. It should be understood that when an element is said to be "connected" or "coupled" to another element, it can be directly connected or coupled to the other element, or there can also be an intermediate element. In addition, the "connection" or "coupling" used here can include wireless connection or wireless coupling. The term "and / or" used here includes all or any unit and all combinations of one or more associated listed items.

[0028] Those skilled in the art will understand that, unless otherwise defined, all terms (including technical terms and scientific terms) used herein have the same meaning as the general understanding of ordinary technicians in the field to which the utility model belongs. It should also be understood that terms such as those defined in general dictionaries should be understood to have the same meaning as the meaning in the context of the prior art, and will not be interpreted with idealized or overly formal meanings unless specifically defined as here.

[0029] In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the fact that ordinary technicians in the field can implement it. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such combination of technical solutions does not exist and is not within the scope of protection required by the present utility model.

[0030] Please also see Figures 1 to 4 The utility model provides a preferred embodiment of an X-ray wavefront phase detection device.

[0031] like Figure 1 As shown, the utility model provides an X-ray wavefront phase detection device 10, which includes a first substrate 101 and a grating structure unit 102, wherein the grating structure unit 102 is arrayed on the first substrate 101, and the grating structure unit 102 is used to detect the X-ray wavefront phase and the X-ray spectrum.

[0032] In this embodiment, the grating structure units 102 are distributed in an array on the first substrate 101 . The grating structure units 102 can detect X-ray wavefront phase and X-ray spectrum, thereby realizing the spectral resolution function of the X-ray wavefront phase detection device 10 .

[0033] In some embodiments, Figure 2 As shown, the grating structure unit 102 includes a second substrate 1021 and a grating structure 1022 spaced apart from each other on the second substrate 1021 .

[0034] In this embodiment, the second substrate 1021 is disposed on the first substrate 101, and the second substrate 1021 is made of the same material as the first substrate 101, wherein the substrate material may be, but is not limited to, single crystal silicon, silicon nitride, nickel, tantalum, diamond, etc. The grating structure 1022 is in a long strip shape and is made of an X-ray absorbing material, for example, the X-ray absorbing material may be, but is not limited to, gold, lead, bismuth, tungsten, etc., and may block X-rays.

[0035] The arrangement direction of the grating structure 1022 is distributed along the vertical direction of the X-axis, that is, the angle between the setting direction of the grating structure 1022 and the X-axis direction is 90°, where the X-axis refers to the X-axis of the two-dimensional coordinate system.

[0036] In this embodiment, the second substrate 1021 is a square structure, and the side length d1 of the second substrate 1021 is 20-40 microns, for example, 20 microns, 30 microns or 40 microns. The array period between the grating structure units 102 refers to the distance between the midpoints of two adjacent grating structure units 102 along the X-axis direction and the Y-axis direction, such as Figure 2 The pitches P1 and P2 shown in the figure, wherein the array periods of the grating structure unit 102 along the X-axis direction and the Y-axis direction are equal, and the array period is 50-200 mm, for example, 50 mm, 100 mm or 200 mm.

[0037] In some embodiments, Figure 1 and Figure 3 As shown, the grating structure unit 102 includes a plurality of grating structures 1022 , and the grating structures 1022 are arranged at intervals on the first substrate 101 .

[0038] In this embodiment, the grating structure 1022 may be made of, but not limited to, gold, lead, bismuth, tungsten, and other materials. The height h1 of the grating structure 1022 is 30-100 microns, for example, 30 microns, 50 microns, or 100 microns. The thickness t1 of the grating structure 1022 is 2-10 microns, for example, 2 microns, 5 microns, or 10 microns. The spacing t2 (t2>t1) between the same edges of two adjacent grating structures 1022 is 4-20 microns, for example, 4 microns, 10 microns, or 20 microns. The array period t3 between two adjacent grating structure units 102 is 100-300 microns, for example, 100 microns, 200 microns, or 300 microns. The first substrate 101 may be made of single crystal silicon, silicon nitride, nickel, tantalum, diamond, and other materials, and the height h2 of the first substrate 101 material is 100 microns-200 microns, for example, 100 microns, 150 microns, or 200 microns.

[0039] In some embodiments, Figure 1 and Figure 4 The grating structure unit 102 includes a plurality of through holes 1023 spaced apart on the first substrate 101 .

[0040] In this embodiment, the grating structure 1022 of the grating structure unit 102 is a through hole 1023, and the through holes 1023 have a plurality of them and penetrate the first substrate 101 and are arranged at intervals in the first substrate 101. The diameter t1 of the through hole 1023 is 2-10 microns, for example, 2 microns, 5 microns or 10 microns. The spacing between the same edges of two adjacent through holes 1023 (i.e., the through hole 1023 period) t2 (t2>t1) is 4-20 microns, for example, 4 microns, 10 microns or 20 microns. The array period t3 between two adjacent grating structure units 102 is 100-300 microns, for example, 100 microns, 150 microns or 300 microns. The first substrate 101 can be made of materials such as single crystal silicon, silicon nitride, nickel, tantalum, diamond, etc., and the height h2 of the first substrate 101 material is 100 microns-200 microns, for example, 100 microns, 150 microns or 200 microns.

[0041] In some embodiments, Figure 5 As shown, the utility model also provides an X-ray wavefront phase detection system based on the above-mentioned X-ray wavefront phase detection device 10, which includes an X-ray detector 20 and an X-ray wavefront phase detection device 10, and the X-ray detector 20 is arranged opposite to the X-ray wavefront phase detection device 10.

[0042] Specifically, the X-ray detector 20 is arranged opposite to the X-ray wavefront phase detection device 10, and the X-ray detector 20 can detect the spectrum generated by the X-ray wavefront phase detection device 10. There is a gap d between the X-ray detector 20 and the X-ray wavefront phase detection device 10. To meet the detection conditions of the X-ray detector 20, the gap d needs to satisfy the following formula:

[0043]

[0044] Or, the following equations are satisfied at the same time:

[0045]

[0046] Wherein, t2 represents the period of the grating structure unit, t3 represents the period of the array composed of different grating structure units, N represents an integer, N=0, 1, 2, 3..., N1 / N2 represents an irreducible fraction, and λ represents the wavelength of X-rays.

[0047] In some embodiments, Figure 6As shown, the utility model also provides an X-ray wavefront phase detection system based on the above-mentioned X-ray wavefront phase detection device 10, which includes a vacuum cavity 30, an X-ray blocking window 40, an X-ray detector 20 and the X-ray wavefront phase detection device 10 as described above; the X-ray detector 20 and the X-ray wavefront phase detection device 10 are both located in the vacuum cavity 30, and the X-ray detector 20 is arranged opposite to the X-ray wavefront phase detection device 10; the X-ray blocking window 40 is arranged on one side of the vacuum cavity 30 and is arranged opposite to the X-ray wavefront phase detection device 10.

[0048] Specifically, the vacuum degree of the vacuum chamber 30 is 10 －6 mbar-10 －8 mbar. The X-ray blocking window 40 can be a beryllium window or an aluminum window, for example, it can be an aluminum window. The X-ray blocking window 40 is located on one side of the vacuum chamber 30, and is arranged opposite to one side of the X-ray wavefront phase detection device 10. The X-ray detector 20 is arranged opposite to the other end of the X-ray wavefront phase detector 10. In this way, the X-ray wavefront phase detection system composed of the vacuum chamber 30, the X-ray blocking window 40, the X-ray detector 20 and the X-ray wavefront phase detection device 10 can be used to realize the detection of soft X-ray bands with longer wavelengths. Among them, the X-ray detector 20 and the X-ray wavefront phase detection device 10 have a spacing d. In order to meet the detection conditions of the X-ray detector 20, the spacing d needs to satisfy the following formula:

[0049]

[0050] Or, the following equations are satisfied at the same time:

[0051]

[0052] Wherein, t2 represents the period of the grating structure unit, t3 represents the period of the array composed of different grating structure units, N represents an integer, N=0, 1, 2, 3..., N1 / N2 represents an irreducible fraction, and λ represents the wavelength of X-rays.

[0053] In summary, the utility model provides an X-ray wavefront phase detection device and system, an X-ray wavefront phase detection device, which includes a first substrate and a grating structure unit, wherein the grating structure unit array is arranged on the first substrate, and the grating structure unit is used to detect the X-ray wavefront phase and the X-ray spectrum. The utility model integrates the grating structure unit on the first substrate, and the grating structure unit can detect the X-ray wavefront phase and the X-ray spectrum, thereby realizing the spectral resolution function of the X-ray wavefront phase detection device.

[0054] It should be understood that the application of the present invention is not limited to the above examples. For ordinary technicians in this field, improvements or changes can be made according to the above description. All these improvements and changes should fall within the scope of protection of the claims attached to the present invention.

Claims

1. An X-ray wavefront phase detection device, characterized in that: It comprises a first substrate and a grating structure unit, wherein the grating structure unit array is arranged on the first substrate, and the grating structure unit is used to detect the X-ray wavefront phase and the X-ray spectrum.

2. The X-ray wavefront phase detection device according to claim 1, characterized in that: The grating structure unit includes a second substrate and a grating structure arranged on the second substrate at intervals.

3. The X-ray wavefront phase detection device according to claim 2, characterized in that: The second substrate is a square structure; the grating structure is distributed in the plane of the first substrate and along the vertical direction of the X-axis.

4. The X-ray wavefront phase detection device according to claim 3, characterized in that: The array period between the grating structure units is 50-200 mm.

5. The X-ray wavefront phase detection device according to claim 1, characterized in that: The grating structure unit includes a plurality of grating structures, and the grating structures are arranged at intervals on the first substrate.

6. The X-ray wavefront phase detection device according to claim 5, characterized in that: The height of the grating structure is 30-100 microns; the thickness of the grating structure is 2-10 microns; the spacing between the same edges of two adjacent grating structures is 4-20 microns; and the array period between two adjacent grating structure units is 100-300 microns.

7. The X-ray wavefront phase detection device according to claim 1, characterized in that: The grating structure unit includes a plurality of through holes spaced apart on the first substrate.

8. The X-ray wavefront phase detection device according to claim 7, characterized in that: The diameter of the through hole is 2-10 microns; the spacing between the same edges of two adjacent through holes is 4-20 microns; and the array period between two adjacent grating structure units is 100-300 microns.

9. An X-ray wavefront phase detection system based on the X-ray wavefront phase detection device according to any one of claims 1 to 8, characterized in that: It comprises an X-ray detector and an X-ray wavefront phase detection device as claimed in any one of claims 1 to 8, wherein the X-ray detector is arranged opposite to the X-ray wavefront phase detection device.

10. An X-ray wavefront phase detection system based on the X-ray wavefront phase detection device according to any one of claims 1 to 8, characterized in that: It comprises a vacuum cavity, an X-ray blocking window, an X-ray detector and an X-ray wavefront phase detection device as described in any one of claims 1 to 8; the X-ray detector and the X-ray wavefront phase detection device are both located in the vacuum cavity, and the X-ray detector and the X-ray wavefront phase detection device are arranged opposite to each other; the X-ray blocking window is arranged on one side of the vacuum cavity and opposite to the X-ray wavefront phase detection device.

Images