Special gas supply device and ion implantation equipment

Abstract

The utility model belongs to the technical field of semiconductors, and discloses a special gas supply device and ion implantation equipment. The special gas supply device comprises a gas supply pipe and a gas guide pipe. One end of the air supply pipe is connected with the ion source arc chamber; the air guide pipe is communicated with the other end of the air supply pipe, a plurality of connecting branch pipes are distributed on the air guide pipe at intervals, each connecting branch pipe is detachably connected with an air supply mechanism, and the air supply mechanism is a positive pressure air supply mechanism or a negative pressure air supply mechanism. The plurality of connecting branch pipes are detachably connected with the plurality of gas supply mechanisms, so that a specified number of positive pressure gas supply mechanisms and negative pressure gas supply mechanisms can be mounted according to the requirements of a semiconductor manufacturing process, and when the gas supply mechanisms need to be replaced, other structures do not need to be independently operated in the whole mounting and dismounting process, so that the cost is reduced. And the pipeline of the whole special gas supply device is slightly changed, so that the whole disassembly and assembly process is effectively simplified, the disassembly and assembly difficulty is reduced, and the disassembly and assembly convenience is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a special gas supply device and ion implantation equipment. Background Art

[0002] Ion implantation is a doping technology in semiconductor manufacturing that can change the electrical properties of a wafer by introducing different types of ions. Ions are produced by ionizing specific process gases (referred to as special gases), such as borane and phosphine.

[0003] In the prior art, a connecting pipeline is separately provided in the gas supply pipeline to connect with the bottle containing the special gas, and the connecting pipeline is further connected to the ion source arc chamber to inject the special gas into the ion source arc chamber for ionization to generate the required ions.

[0004] However, different special gases have different storage conditions. For example, nitrogen and hydrogen require positive pressure cylinders for storage, while borane, phosphine, etc. require negative pressure cylinders for storage. Different bottles need to be installed with separate pressure regulating structures and detection structures when connected to the connecting pipelines. Therefore, when changing the gas, the connection structure between the connecting pipe and the gas cylinder needs to be significantly modified, which makes the entire disassembly and assembly process complicated and difficult to disassemble. Utility Model Content

[0005] The purpose of the utility model is to provide a special gas supply device and an ion implantation device, which solves the problem in the prior art that when replacing special gases, due to the different storage conditions of different special gases, the connection structure between the bottle body storing the special gas and the pipeline is also different, resulting in the need to add or disassemble more structures in the entire disassembly process, making the disassembly process complicated and cumbersome, and the disassembly difficulty is relatively large.

[0006] To achieve this purpose, the utility model adopts the following technical solutions:

[0007] In a first aspect, a special gas supply device comprises:

[0008] A gas supply tube, one end of which is connected to the ion source arc chamber;

[0009] The air guide pipe is connected to the other end of the air supply pipe. The air guide pipe is provided with a plurality of connecting branches at intervals. Each connecting branch is detachably connected to an air supply mechanism, and the air supply mechanism is a positive pressure air supply mechanism or a negative pressure air supply mechanism.

[0010] Optionally, the plurality of air supply mechanisms are distributed in at least two rows vertically.

[0011] Optionally, the air duct has an exhaust interface and a purge interface, the exhaust interface is connected to the exhaust gas collection chamber, and the purge interface is connected to the purge equipment.

[0012] Optionally, the special gas supply device further comprises:

[0013] The gas supply cabinet, the air duct and the gas supply mechanism are arranged in the gas supply cabinet.

[0014] Optionally, the special gas supply device further comprises:

[0015] A baffle is arranged in the gas supply cabinet and is made of a transparent material. The baffle is located between the end of the gas supply mechanism and the side wall of the gas supply cabinet.

[0016] Optionally, the gas supply cabinet has a cabinet door, and the baffle includes a front baffle, which is arranged between the gas supply mechanism and the cabinet door, and the front baffle has a front inspection port at the position corresponding to each of the gas supply mechanisms, and each of the front inspection ports is rotatably connected to a front door panel that can close the front inspection port.

[0017] Optionally, the gas supply cabinet has a back panel arranged opposite to the cabinet door, and the baffle includes a rear baffle, which is arranged between the gas supply mechanism and the back panel, and the rear baffle has a rear inspection port at a position corresponding to the gas supply mechanism, and each of the rear inspection ports is rotatably connected to a rear door panel that can close the rear inspection port.

[0018] Optionally, the gas supply cabinet is provided with an exhaust mechanism.

[0019] Optionally, the special gas supply device further comprises:

[0020] A control valve is arranged on the air supply pipe.

[0021] In a second aspect, the present application provides an ion implantation device, comprising:

[0022] The special gas supply device as described in any one of the first aspects;

[0023] The ion source arc chamber is connected to the gas supply pipe of the special gas supply device.

[0024] Beneficial effects of the utility model:

[0025] On the one hand, by setting up multiple connecting branches to detachably connect with multiple gas supply mechanisms, not only can a specified number of positive pressure gas supply mechanisms and negative pressure gas supply mechanisms be installed according to the requirements of the semiconductor manufacturing process, but also when it is necessary to switch the special gas, it is only necessary to open the corresponding gas supply mechanism. Moreover, when it is necessary to replace the gas supply mechanism, since the gas supply mechanism is an integral module, it is only necessary to separate the gas supply mechanism from the connecting branch to complete the disassembly, and it is only necessary to connect the corresponding gas supply mechanism to the connecting branch during installation, so that other structures do not need to be operated separately during the entire installation and disassembly process, and the pipeline changes to the entire special gas supply device are relatively small, thereby effectively simplifying the entire disassembly and assembly process, reducing the difficulty of disassembly and assembly, and improving the convenience of disassembly and assembly.

[0026] Secondly, when the ion implantation equipment is in use, a specific number of gas supply mechanisms can be set according to actual usage requirements. When the gas supply mechanism needs to be replaced, it is only necessary to disassemble and install the entire gas supply mechanism. There is no need to add or disassemble other structures. This can effectively simplify the disassembly and assembly process, reduce the difficulty of disassembly and assembly, and thus improve the convenience of disassembly and assembly. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 This is a pipeline layout diagram of a special gas supply device in an embodiment of the utility model;

[0028] Figure 2 It is a structural schematic diagram of a special gas supply device in an embodiment of the utility model;

[0029] Figure 3 It is a structural schematic diagram of a baffle corresponding to the cabinet door in the special gas supply device in the embodiment of the utility model;

[0030] Figure 4 It is a structural schematic diagram of a baffle corresponding to a back plate in a special gas supply device in an embodiment of the utility model.

[0031] In the figure:

[0032] 1. Air supply pipe; 2. Air guide pipe; 21. Exhaust interface; 22. Purge interface; 3. Connecting branch pipe; 4. Positive pressure air supply mechanism; 5. Negative pressure air supply mechanism; 6. Air supply cabinet; 61. Cabinet door; 7. Baffle; 71. Front baffle; 711. Front inspection port; 712. Front door panel; 72. Rear baffle; 721. Rear door panel; 8. Control valve. DETAILED DESCRIPTION

[0033] The present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the present invention, rather than to limit the present invention. It should also be noted that, for ease of description, only the parts related to the present invention, rather than all structures, are shown in the accompanying drawings.

[0034] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected", and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0035] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0036] In the description of this embodiment, the terms "upper", "lower", "left", "right" and other directions or positional relationships are based on the directions or positional relationships shown in the drawings, and are only for the convenience of description and simplified operation, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation of the present invention. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.

[0037] The embodiments of the present application disclose a special gas supply device and ion implantation equipment.

[0038] Reference Figure 1 The special gas supply device comprises a gas supply pipe 1 and a gas guide pipe 2. One end of the gas supply pipe 1 is connected to the arc chamber of the ion source; the gas guide pipe 2 is connected to the other end of the gas supply pipe 1, and the gas guide pipe 2 is distributed with a plurality of connecting branches 3 at intervals, and each connecting branch 3 is detachably connected with a gas supply mechanism, and the gas supply mechanism is a positive pressure gas supply mechanism 4 or a negative pressure gas supply mechanism 5.

[0039] Specifically, the gas supply pipe 1 can extend according to the relative position of the gas guide pipe 2 and the ion source arc chamber to meet the corresponding installation space. A sealing structure can be provided at the connection between the gas supply pipe 1 and the ion source arc chamber to ensure the sealing performance of the connection. The gas supply pipe 1 and the gas guide pipe 2 can be of an integral structure or can be hermetically connected by screwing. The gas guide pipe 2 is provided with a plurality of connecting branch pipes 3 at intervals along its own axis direction, and each connecting branch pipe 3 correspondingly connects at least one gas supply mechanism. The gas supply mechanism can be a positive pressure gas supply mechanism 4 or a negative pressure gas supply mechanism 5, and the specific type can be selected according to the type of special gas.

[0040] The detachable connection between the gas supply mechanism and the connecting branch pipe 3 can be realized by providing a connection valve at the opening of the connecting branch pipe 3, or by providing a threaded sleeve to replace the connection valve, or directly by the plug-in fit between the connecting branch pipe 3 and the gas outlet end of the gas supply mechanism. The present application does not limit the specific form of the detachable connection, as long as it can meet the detachable connection and ensure good airtightness at the connection. The gas supply mechanism is taken as a whole module, which includes a cylinder for storing special gas and a gas path communicated with the cylinder. The gas path is connected to the connecting branch pipe 3, and corresponding structures such as a pressure regulating structure and a gas pressure detection structure are provided on the gas path and the cylinder according to the type of the stored special gas. In this embodiment, each connecting branch pipe 3 correspondingly connects to a gas supply mechanism, and only one set of positive pressure gas supply mechanism 4 and one set of negative pressure gas supply mechanism 5 are provided, and the remaining connecting branch pipes 3 are reserved branches.

[0041] By providing a plurality of connecting branch pipes 3 to be detachably connected to a plurality of gas supply mechanisms, not only can the specified number of positive pressure gas supply mechanisms 4 and negative pressure gas supply mechanisms 5 be installed according to the requirements of the semiconductor manufacturing process, but when it is necessary to switch the special gas, only the corresponding gas supply mechanism needs to be opened. Moreover, when it is necessary to replace the gas supply mechanism, since the gas supply mechanism is taken as a whole module, only the gas supply mechanism needs to be separated from the connecting branch pipe 3 to complete the disassembly. During installation, only the corresponding gas supply mechanism needs to be communicated with the connecting branch pipe 3, so that no other structures need to be operated separately during the whole installation and disassembly process, and the pipeline of the whole special gas supply device is less modified, thus effectively simplifying the whole disassembly and assembly process, reducing the disassembly and assembly difficulty, and improving the convenience of disassembly and assembly.

[0042] Optionally, the plurality of gas supply mechanisms are at least divided into two rows and distributed vertically.

[0043] Specifically, the gas guide pipe 2 can be bent into a "匚" shape or can be bent into an "E" shape, so that the plurality of connecting branch pipes 3 can be distributed in multiple rows vertically, and further the gas supply mechanisms are also distributed in multiple rows. In this embodiment, the gas supply mechanisms are arranged in two rows, and three are arranged in each row.

[0044] By dividing the air supply mechanisms into two rows, multiple air supply mechanisms can be stacked to reduce the space occupied by the multiple air supply mechanisms, thereby improving the utilization rate of the space.

[0045] Optionally, the air duct 2 has an exhaust port 21 and a purge port 22 , wherein the exhaust port 21 is in communication with the exhaust gas collection chamber, and the purge port 22 is in communication with a purge device.

[0046] Specifically, both ends of the air duct 2 are open, one end is open as an exhaust interface 21, the exhaust interface 21 is connected to the exhaust gas collection chamber, and the other end is open as a purge interface 22, the purge interface 22 is connected to the purge equipment, and the purge equipment can blow nitrogen into the air duct 2, or it can be other gases that can replace nitrogen to achieve the purge effect.

[0047] When the gas supply is stopped, some special gas will remain in the air duct 2, and the remaining special gas will be blown out of the air duct 2 by the purge device to be stored in the exhaust gas collection chamber. A valve body structure such as a solenoid valve can be set in the air duct 2 and the exhaust gas collection chamber to control the connection and disconnection between the air duct 2 and the exhaust gas collection chamber.

[0048] Reference Figures 2 to 4 Optionally, the special gas supply device further includes a gas supply cabinet 6. The air guide pipe 2 and the gas supply mechanism are arranged in the gas supply cabinet 6.

[0049] Specifically, the types of special gases supplied in the gas supply mechanism may be nitrogen, hydrogen, borane, phosphine, arsine, etc. Many types of special gases are toxic in themselves. When the special gases leak, even a slight leak of special gases may cause a safety accident. Therefore, a gas supply cabinet 6 is provided. The gas supply cabinet 6 can be formed by enclosing a plurality of metal plate-like structures, and a closed space is formed inside thereof. The gas supply mechanism and the air duct 2 are both fixed in the closed space, and the gas supply duct 1 passes through the gas supply cabinet 6 at one end to be connected to the air duct 2, and the other end is located outside the gas supply cabinet 6 to be connected to the ion source arc chamber. The formation and size of the specific gas supply cabinet 6 can be designed according to the number and layout of the actual gas supply mechanism, and the present application does not limit this.

[0050] By setting up the gas supply cabinet 6, the entire gas supply mechanism and the air duct 2 can be built into a closed space, which can not only further improve the integrity of the multiple gas supply mechanisms, but also when the gas supply mechanism and the air duct 2 leak, the leaked gas can be sealed in the gas supply cabinet 6, thereby reducing the possibility of the leaked gas flowing to the external space, so as to improve the safety of the entire special gas supply device.

[0051] Optionally, the special gas supply device further comprises a baffle 7. The baffle 7 is arranged in the gas supply cabinet 6 and is made of a transparent material, and the baffle 7 is located between the end of the gas supply mechanism and the side wall of the gas supply cabinet 6.

[0052] Specifically, the shape of the baffle 7 can be set according to the layout of multiple gas supply mechanisms. Multiple baffles 7 can be arranged in a circle to form a smaller closed space in the gas supply cabinet 6, and the gas supply mechanism is installed in the space. Only a few baffles 7 can also be set to block the leaked gas, thereby limiting the flow direction of the gas. The baffle 7 made of transparent material allows the operator to observe the operating status of the gas supply mechanism when opening the electrical cabinet, without the need to disassemble the baffle 7.

[0053] By setting the baffle 7, not only can the flow range of the gas leaking from the gas supply mechanism be further limited, but the baffle 7 made of transparent material also allows the operator to directly observe the operation of the gas supply mechanism after the electrical cabinet is opened, thereby effectively reducing the possibility of safety accidents caused by the operator coming into contact with special gases.

[0054] Optionally, the gas supply cabinet 6 has a cabinet door 61; the baffle 7 includes a front baffle 71. The front baffle 71 is arranged between the gas supply mechanism and the cabinet door 61, and the front baffle 71 has a front inspection port 711 at a position corresponding to each gas supply mechanism, and each front inspection port 711 is rotatably connected to a front door plate 712 capable of closing the front inspection port 711.

[0055] Optionally, the gas supply cabinet 6 has a back panel arranged opposite to the cabinet door 61, and the baffle 7 includes a rear baffle 72, which is arranged between the gas supply mechanism and the back panel. The rear baffle 72 has a rear inspection port at a position corresponding to the gas supply mechanism, and each rear inspection port is rotatably connected to a rear door panel 721 that can close the rear inspection port.

[0056] Specifically, the cabinet door 61 is hinged on the front of the gas supply cabinet 6, and the back plate is detachably connected to the back of the gas supply cabinet 6. Considering the overall size and spatial layout of the gas supply cabinet 6, a front baffle 71 and a rear baffle 72 can be respectively provided on the front and rear sides of the gas supply mechanism, wherein the front baffle 71 is directly opposite to the cabinet door 61 of the gas supply cabinet 6, and the rear baffle 72 is directly opposite to the back plate of the gas supply cabinet 6. When the operator opens the cabinet door 61 or the back plate, the operator can directly see the baffle 7 to avoid the situation where the leaked gas directly rushes to the operator when the gas supply mechanism leaks, thereby further improving the overall safety of the special gas supply device.

[0057] A plurality of front inspection openings 711 are formed through the front baffle 71, and each front inspection opening 711 is hinged to a corresponding front door panel 712. The front door panel 712 may also be provided with a buckle or other structure, so that the front door panel 712 can close the front inspection opening 711 and keep the front inspection opening 711 airtight when closing the front inspection opening 711. Each front inspection opening 711 corresponds to a set of air supply mechanisms.

[0058] A rear inspection port is provided on the rear baffle 72, and a rear door panel 721 is hingedly connected to the rear inspection port. The number of rear inspection ports provided on the rear baffle 72 can be designed according to the actual application scenario. In this embodiment, six front inspection ports 711 are provided to correspond to six air supply mechanisms, and only one rear inspection port is provided.

[0059] By setting up the front inspection port 711 and the rear inspection port, when part of the structure of the gas supply mechanism needs to be inspected and replaced, it can be completed through the front inspection port 711 and the rear inspection port. After the inspection is completed, the front inspection port 711 and the rear inspection port are closed to ensure that the baffle 7 can block the flow direction of the special gas when a special gas leak occurs.

[0060] Optionally, the gas supply cabinet 6 is provided with an exhaust mechanism.

[0061] Specifically, an exhaust mechanism can be provided on the top wall of the gas supply cabinet 6, and the exhaust mechanism can be an exhaust fan and an exhaust pipe, and the exhaust pipe is connected to the exhaust gas collection chamber. An opening and closing valve is also built into the exhaust pipe to keep the exhaust pipe closed when the exhaust fan is not started.

[0062] A detection sensor can be set in the gas supply cabinet 6 to detect whether there is a special gas leakage. A display screen and an alarm structure can be set on the gas supply cabinet 6. The display screen can display the data detected by the detection sensor in real time, and the alarm structure generates a sound or light alarm according to the detection result of the detection sensor. The specific control logic of the detection sensor, the display screen and the alarm structure can refer to the existing technology, and this application will not go into details here.

[0063] By setting up an exhaust mechanism, when the special gas leaks, the special gas can be quickly extracted through the exhaust mechanism and sent to the waste gas collection chamber to ensure the overall safety of the gas supply cabinet 6.

[0064] Reference Figure 1 Optionally, the special gas supply device further comprises a control valve 8. The control valve 8 is arranged on the gas supply pipe 1.

[0065] Specifically, the control valve 8 can be a diaphragm valve, which is arranged on the gas supply pipe 1. When the gas supply is stopped, the gas supply pipe 1 is closed by the control valve 8 so that the gas blown out by the purge equipment will not enter the ion source arc chamber, further improving the safety of the equipment.

[0066] The ion implantation equipment comprises an ion source arc chamber and the above-mentioned special gas supply device. The ion source arc chamber is connected with a gas supply pipe 1 of the special gas supply device.

[0067] When the ion implantation device is in use, a specific number of gas supply mechanisms can be set according to actual usage requirements. When the gas supply mechanism needs to be replaced, it is only necessary to disassemble and install the entire gas supply mechanism without adding or disassembling other structures. This can effectively simplify the disassembly and assembly process, reduce the difficulty of disassembly and assembly, and thus improve the convenience of disassembly and assembly.

[0068] Obviously, the above embodiments of the present invention are merely examples for the purpose of clearly illustrating the present invention, and are not intended to limit the implementation methods of the present invention. For those skilled in the art, various obvious changes, readjustments and substitutions can be made without departing from the scope of protection of the present invention. It is not necessary and impossible to list all implementation methods here. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention shall be included in the scope of protection of the claims of the present invention.

Claims

1. Special gas supply device, characterized in that: include: A gas supply pipe (1), one end of which is connected to the ion source arc chamber; The air guide pipe (2) is connected to the other end of the air supply pipe (1); the air guide pipe (2) is provided with a plurality of connecting branch pipes (3) spaced apart from each other; each connecting branch pipe (3) is detachably connected to an air supply mechanism; the air supply mechanism is a positive pressure air supply mechanism (4) or a negative pressure air supply mechanism (5).

2. The special gas supply device according to claim 1, characterized in that: The plurality of air supply mechanisms are distributed in at least two rows vertically.

3. The special gas supply device according to claim 1, characterized in that: The air guide pipe (2) has an exhaust interface (21) and a purge interface (22), the exhaust interface (21) is in communication with the exhaust gas collection chamber, and the purge interface (22) is in communication with the purge equipment.

4. The special gas supply device according to any one of claims 1 to 3, characterized in that: The special gas supply device also includes: An air supply cabinet (6), wherein the air guide pipe (2) and the air supply mechanism are arranged in the air supply cabinet (6).

5. The special gas supply device according to claim 4, characterized in that: The special gas supply device also includes: A baffle (7) is arranged on the gas supply cabinet (6) and is made of a transparent material. The baffle (7) is located between the end of the gas supply mechanism and the side wall of the gas supply cabinet (6).

6. The special gas supply device according to claim 5, characterized in that: The gas supply cabinet (6) has a cabinet door (61), and the baffle (7) includes a front baffle (71), wherein the front baffle (71) is arranged between the gas supply mechanism and the cabinet door (61), and the front baffle (71) has a front inspection port (711) at a position corresponding to each of the gas supply mechanisms, and each of the front inspection ports (711) is rotatably connected to a front door plate (712) capable of closing the front inspection port (711).

7. The special gas supply device according to claim 6, characterized in that: The gas supply cabinet (6) has a back plate arranged opposite to the cabinet door (61), and the baffle (7) includes a rear baffle (72), which is arranged between the gas supply mechanism and the back plate, and the rear baffle (72) has a rear inspection port at a position corresponding to the gas supply mechanism, and each of the rear inspection ports is rotatably connected to a rear door plate (721) capable of closing the rear inspection port.

8. The special gas supply device according to claim 4, characterized in that: The gas supply cabinet (6) is provided with an exhaust mechanism.

9. The special gas supply device according to any one of claims 1 to 3, characterized in that: The special gas supply device also includes: A control valve (8) is arranged on the air supply pipe (1).

10. Ion implantation equipment, characterized in that include: The special gas supply device according to any one of claims 1 to 9; The ion source arc chamber is connected to the gas supply pipe (1) of the special gas supply device.

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