A raw wax separation system

Abstract

The present disclosure relates to a raw wax separation system, which includes a heat exchanger, a thin film evaporator, and a short-path distillation unit, wherein a first feed port is connected to a raw material tank area, the heat exchanger preheats the raw wax from the tank area, the thin film evaporator and the short-path distillation unit heat the introduced raw wax in turn, and separate different light phase wax products respectively, and the third heavy phase finally produced is led to the tank area. The raw wax separation system provided by the present disclosure has the beneficial effect of adding a short-path distillation unit to achieve the purpose of separating different product waxes from the raw wax, and the raw wax from the tank area is preheated by the heat exchanger, reducing the heat load of the thin film evaporator.

Description

Technical Field

[0001] The present disclosure relates to the field of raw wax separation, and more specifically, to a raw wax separation system. Background Art

[0002] In the process of separating the raw wax, thin film evaporator can reduce the residence time of the raw material and improve the distillation efficiency. Therefore, thin film evaporator is widely used in China and internationally to heat and separate the raw wax, so as to achieve the purpose of separating different product waxes.

[0003] However, in the prior art, since the temperature of the raw wax is quite different from the separation temperature of different product waxes, the heat load of the thin film evaporator is relatively large, and the raw wax contains a variety of product waxes to be separated. The thin film evaporator alone cannot effectively separate the different product waxes from the raw wax, and the temperature of the final product obtained after heating is relatively high. If the high-temperature product is directly passed into the product tank, the products in other product tanks will deteriorate and turn yellow. Utility Model Content

[0004] In view of this, an embodiment of the present disclosure provides a raw wax separation system to solve the technical defects existing in the prior art.

[0005] To achieve the above objectives, the present disclosure adopts the following technical solutions:

[0006] The present disclosure provides a raw wax separation system, comprising:

[0007] A heat exchanger, the heat exchanger having a first feed port and a first discharge port; the first feed port is connected to the raw material tank area, and the heat exchanger is configured to preheat the raw material wax from the tank area;

[0008] A thin film evaporator, wherein the second feed port of the thin film evaporator is connected to the first discharge port, and the thin film evaporator is configured to heat the raw wax entering the thin film evaporator; the thin film evaporator has a heavy phase outlet and a light phase outlet, and the heavy phase component separated from the raw wax is discharged through the heavy phase outlet, and the separated light phase component is configured to be discharged through the light phase outlet;

[0009] A short-path distillation unit is connected to the heavy phase outlet, and is configured to continue to heat the heavy phase component entering the short-path distillation unit so that the heavy phase and the light phase in the heavy phase component are discharged from corresponding outlets.

[0010] In one embodiment of the present disclosure, the short-path distillation unit includes a first short-path distiller, a third feed port of the first short-path distiller is connected to the heavy phase outlet, and the first short-path distiller is configured to heat the heavy phase component entering the first short-path distiller; the first heavy phase separated from the heavy phase component is discharged through a first heavy phase outlet provided on the first short-path distiller, and the separated first light phase is configured to be discharged through the first light phase outlet provided on the first short-path distiller.

[0011] In one embodiment of the present disclosure, the short-path distillation unit includes a second short-path distiller, a fourth feed port of the second short-path distiller is connected to the first heavy phase outlet, and the second short-path distiller is configured to heat the first heavy phase entering the second short-path distiller; the second heavy phase separated from the first heavy phase is discharged through a second heavy phase outlet provided on the second short-path distiller, and the separated second light phase is configured to be discharged through a second light phase outlet provided on the second short-path distiller.

[0012] In one embodiment of the present disclosure, the short-path distillation unit includes a third short-path distiller, a fifth feed port of the third short-path distiller is connected to the second heavy phase outlet, and the third short-path distiller is configured to heat the second heavy phase entering the third short-path distiller; the third heavy phase separated from the second heavy phase is discharged through a third heavy phase outlet provided on the third short-path distiller, and the separated third light phase is configured to be discharged through a third light phase outlet provided on the third short-path distiller.

[0013] In one embodiment of the present disclosure, a buffer tank and a production pump are provided between two adjacent short-path distillers; the heavy phase separated by the previous short-path distiller is configured to enter the next short-path distiller via the buffer tank and the production pump.

[0014] In one embodiment of the present disclosure, the second heavy phase outlet on the second short-path distiller is configured to be set at a position higher than the fifth feed port; the second heavy phase outlet is constructed to be connected to the fifth feed port through a first pipe; the second heavy phase discharged from the second heavy phase outlet is configured to enter the third short-path distiller under the action of gravity.

[0015] In one embodiment of the present disclosure, a second heavy phase buffer tank and a second heavy phase production pump are provided between the second short-path distiller and the third short-path distiller; the second heavy phase outlet of the second short-path distiller is configured to be connected to the first pipeline via the second heavy phase buffer tank and the second heavy phase production pump.

[0016] In one embodiment of the present disclosure, the third heavy phase is configured to be connected to the tank area through a pipeline via the heat exchanger, so that the third heavy phase serves as a heat source for the heat exchanger when flowing through the heat exchanger.

[0017] In one embodiment of the present disclosure, the temperature of the first feed port is 100-120°C, the temperature of the first discharge port is 170-180°C, and the temperature of the third heavy phase is greater than 260°C.

[0018] In one embodiment of the present disclosure, the heating temperature of the thin film evaporator is 220-230°C; the heating temperature of the first short-path distiller is 230-240°C; the heating temperature of the second short-path distiller is 250-260°C; the heating temperature of the third short-path distiller is 270°C.

[0019] The raw wax separation system provided by the present disclosure combines a thin film evaporator and a short-path distillation unit, and achieves the purpose of separating different product waxes from the raw wax through the thin film evaporator and the short-path distillation unit, thereby reducing the residence time of the raw wax in each unit, reducing the heat load of the thin film evaporator, and preheating the raw wax from the tank area through a heat exchanger, further reducing the heat load of the thin film evaporator.

[0020] Other features and advantages of the present disclosure will become apparent from the following detailed description of exemplary embodiments of the present disclosure with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a structural schematic diagram of a raw wax separation system provided in one embodiment of the present disclosure.

[0022] Figure 1 The one-to-one correspondence between the component names and the reference numerals is as follows:

[0023] 1-heat exchanger; 2-thin film evaporator; 3-first short-path distiller; 4-second short-path distiller; 5-third short-path distiller; 6-thin film light phase buffer tank; 7-first light phase buffer tank; 8-first heavy phase buffer tank; 9-second light phase buffer tank; 10-second heavy phase buffer tank; 11-third light phase buffer tank; 12-third heavy phase buffer tank; 13-thin film light phase extraction pump; 14-first light phase extraction pump; 15-first heavy phase extraction pump; 16-second light phase extraction pump; 1 7-second heavy phase production pump; 18-third light phase production pump; 19-third heavy phase production pump; 20-first feed inlet; 21-first discharge port; 22-second feed inlet; 23-light phase outlet; 24-heavy phase outlet; 25-third feed inlet; 26-first light phase outlet; 27-first heavy phase outlet; 28-fourth feed inlet; 29-second light phase outlet; 30-second heavy phase outlet; 31-fifth feed inlet; 32-third light phase outlet; 33-third heavy phase outlet. DETAILED DESCRIPTION

[0024] Various exemplary embodiments of the present disclosure will now be described in detail with reference to the accompanying drawings. It should be noted that the relative arrangement of components and steps, numerical expressions and numerical values ​​set forth in these embodiments do not limit the scope of the present disclosure unless otherwise specifically stated.

[0025] The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the present disclosure, its application, or uses.

[0026] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered as part of the specification.

[0027] It should be noted that like reference numerals and letters refer to similar items in the following figures, and therefore, once an item is defined in one figure, it need not be further discussed in subsequent figures.

[0028] The specific embodiments of the present disclosure are described below in conjunction with the accompanying drawings.

[0029] In this document, “upper”, “lower”, “front”, “back”, “left”, “right”, etc. are only used to indicate the relative position relationship between related parts, rather than to limit the absolute positions of these related parts.

[0030] In this article, "first", "second", etc. are only used to distinguish each other, and do not indicate the importance and order, or the premise of each other's existence.

[0031] In this document, “equal”, “same”, etc. are not strictly limited in a mathematical and / or geometric sense, but also include errors that can be understood by those skilled in the art and are allowed in manufacturing or use.

[0032] In order to separate different product waxes from raw wax and reduce the heat load of the thin film evaporator, the present disclosure provides a raw wax separation system. Figure 1 , the specific structure and working principle of the raw wax separation system disclosed in the present invention are described in detail in combination with embodiments.

[0033] See also Figure 1 In one embodiment, a raw wax separation system disclosed herein comprises: a heat exchanger 1, a thin film evaporator 2 and a short-path distillation unit.

[0034] The heat exchanger 1 has a first feed port 20 and a first discharge port 21. The first feed port 20 of the heat exchanger 1 is connected to the raw material tank area, so that the raw wax in the raw material tank area can enter the heat exchanger 1 through the corresponding pipeline. The heat exchanger 1 is configured to preheat the raw wax from the tank area so that the raw wax is preheated in advance before entering the thin film evaporator 2.

[0035] In one embodiment of the present disclosure, the heat exchanger 1 is a surface heat exchanger, which allows the raw wax and high-temperature heavy phase wax of different temperatures to flow in a space separated by a wall, and heat is exchanged between the two fluids through the heat conduction of the wall and the convection of the fluid on the wall surface, so that the temperature of the raw wax is finally increased from the initial temperature to the preset temperature of the heat exchanger 1 after heat exchange by the heat exchanger 1. The surface heat exchanger has the advantages of compact equipment, small machine room footprint, closed circulation of cold and heat sources without pollution, and convenient operation and management. Similarly, the heat exchanger 1 can select a suitable type according to actual conditions, such as a heat storage heat exchanger, a fluid-connected indirect heat exchanger, etc.

[0036] The second feed port 22 of the thin film evaporator 2 is connected to the first discharge port 21, and the thin film evaporator 2 is constructed to heat the raw wax entering the thin film evaporator 2; the thin film evaporator 2 has a heavy phase outlet 24 and a light phase outlet 23, and the heavy phase component separated from the raw wax is discharged through the heavy phase outlet 24, and the separated light phase component is configured to be discharged through the light phase outlet 23.

[0037] Specifically, in one embodiment of the present disclosure, the second feed port 22 of the thin film evaporator 2 is connected to the first discharge port 21, so that the raw wax preheated by the heat exchanger 1 can enter the thin film evaporator 2 through the corresponding pipeline to be heated again, and the light and heavy phases are separated at a suitable temperature to obtain light phase components and heavy phase components. The first discharge port 21 flows out the raw wax whose temperature reaches the preset temperature of the heat exchanger 1. The thin film evaporator 2 heats the raw wax, wherein the heating temperature is set to a temperature required to separate the first product wax from the raw wax. The thin film evaporator 2 has a heavy phase outlet 24 and a light phase outlet 23. The heavy phase component separated from the raw wax is discharged through the heavy phase outlet 24, and the separated light phase component is discharged through the light phase outlet 23.

[0038] The short-path distillation unit is connected to the heavy phase outlet 24, so that the heavy phase component separated in the thin film evaporator 2 can enter the short-path distillation unit. The short-path distillation unit is constructed to continue to heat the heavy phase component entering the short-path distillation unit so that the heavy phase and light phase in the heavy phase component are discharged from the corresponding outlets.

[0039] In the short-path distillation unit disclosed in the present invention, a molecular short-path distiller can be selected. Molecular distillation is a special liquid-liquid separation technology. It is different from the principle of separation based on boiling point difference in traditional distillation, but it achieves separation based on the difference in the mean free path of the molecular motion of different substances. When the liquid mixture flows along the heating plate and is heated, the light and heavy molecules will escape from the liquid surface and enter the gas phase. Since the free paths of the light and heavy molecules are different, the molecules of different substances move different distances after escaping from the liquid surface. If a condensation plate can be properly set, the light molecules will reach the condensation plate and be condensed and discharged, while the heavy molecules will not reach the condensation plate and be discharged along the mixed liquid, thus achieving the purpose of material separation.

[0040] In the raw wax separation system disclosed in the present invention, the raw wax is preheated by the heat exchanger 1 and then input into the thin film evaporator 2 for temperature increase, which can reduce the heat load of the thin film evaporator 2. The thin film evaporator 2 heats the raw wax to a predetermined temperature and the separated light phase component is recovered, and the heavy phase component is input into the short-path distillation unit for further temperature increase and separation.

[0041] The raw wax separation system disclosed in the present invention combines the thin film evaporator 2 and the short-path distillation unit, and achieves the purpose of separating different product waxes from the raw wax through the thin film evaporator 2 and the short-path distillation unit. In the raw wax separation system disclosed in the present invention, each product is separated in the thin film evaporator and the short-path distillation unit, thereby reducing the residence time of the raw wax in each unit and reducing the heat load of the thin film evaporator.

[0042] See also Figure 1 In one embodiment of the present disclosure, the short-path distillation unit includes a first short-path distiller 3, and a third feed port 25 of the first short-path distiller 3 is connected to a heavy phase outlet 24, so that the heavy phase component separated in the thin film evaporator 2 can enter the first short-path distiller 3 through the heavy phase outlet 24, and the first short-path distiller 3 is configured to heat the heavy phase component entering the first short-path distiller 3; the first heavy phase separated from the heavy phase component is discharged through a first heavy phase outlet 27 provided on the first short-path distiller 3, and the separated first light phase is configured to be discharged through a first light phase outlet 26 provided on the first short-path distiller 3.

[0043] Specifically, the short-path distiller included in the short-path distillation unit is a molecular short-path distiller, because in ordinary distillation, high-boiling-point components tend to decompose or produce side reactions, thereby reducing the separation efficiency. The molecular short-path distiller can avoid these problems by reducing the pressure and path length, so that the high-boiling-point components can be effectively purified. Further, the third feed port 25 is connected to the heavy phase outlet 24, and the first short-path distiller 3 heats the heavy phase component entering the first short-path distiller 3, wherein the temperature of the first short-path distiller 3 is set to a temperature that can separate the second product wax from the raw wax, and the first heavy phase separated from the heavy phase component is discharged through the first heavy phase outlet 27 set on the first short-path distiller 3, and the separated first light phase is configured to be discharged through the first light phase outlet 26 set on the first short-path distiller 3.

[0044] See also Figure 1 In one embodiment of the present disclosure, the short-path distillation unit includes a second short-path distiller 4, a fourth feed port 28 of the second short-path distiller 4 is connected to the first heavy phase outlet 27, and the second short-path distiller 4 is configured to heat the first heavy phase entering the second short-path distiller 4; the second heavy phase separated from the first heavy phase is discharged through a second heavy phase outlet 30 provided on the second short-path distiller 4, and the separated second light phase is configured to be discharged through a second light phase outlet 29 provided on the second short-path distiller 4.

[0045] Specifically, the fourth feed port 28 is connected to the first heavy phase outlet 27, and the second short-path distiller 4 heats the heavy phase component entering the second short-path distiller 4, wherein the temperature of the second short-path distiller 4 is set to a temperature that can separate the third product wax from the raw wax; the second heavy phase separated from the first heavy phase is discharged through the second heavy phase outlet 30 provided on the second short-path distiller 4, and the separated second light phase is configured to be discharged through the second light phase outlet 29 provided on the second short-path distiller 4.

[0046] See also Figure 1 In one embodiment of the present disclosure, the short-path distillation unit includes a third short-path distiller 5, a fifth feed port 31 of the third short-path distiller 5 is connected to the second heavy phase outlet 30, and the third short-path distiller 5 is configured to heat the second heavy phase entering the third short-path distiller 5; the third heavy phase separated from the second heavy phase is discharged through a third heavy phase outlet 33 provided on the third short-path distiller 5, and the separated third light phase is configured to be discharged through a third light phase outlet 32 ​​provided on the third short-path distiller 5.

[0047] Specifically, the fourth feed port 28 is connected to the first heavy phase outlet 27, and the second short-path distiller 4 heats the heavy phase component entering the second short-path distiller 4, wherein the temperature of the second short-path distiller 4 is set to a temperature capable of separating the fourth product wax from the raw wax; the third heavy phase separated from the second heavy phase is discharged through the third heavy phase outlet 33 provided on the third short-path distiller 5, and the separated third light phase is configured to be discharged through the third light phase outlet 32 ​​provided on the third short-path distiller 5.

[0048] In the embodiments of the present disclosure, at least two short-path distiller are provided, so that each short-path distiller can be set in its own temperature range according to product requirements, thereby further separating the heavy phase components entering therein.

[0049] See also Figure 1 In one embodiment of the present disclosure, a buffer tank and a production pump are provided between two adjacent short-path distillers; the heavy phase separated by the upper-stage short-path distiller is configured to enter the lower-stage short-path distiller through the buffer tank and the production pump.

[0050] Specifically, considering that in the process of molecular continuous distillation of the raw wax, in order to ensure the stable output of the product wax, a buffer tank and a production pump are added to the outlet pipeline of each distiller, wherein the corresponding buffer tank corresponds to the production pump one-to-one. When the product content inside the buffer tank reaches 30%, the production pump connected to the corresponding buffer tank is controlled by the PID to pump out the product inside the buffer tank. The number of buffer tanks is set to be equal to the number of production pumps, and the buffer tanks correspond to the production pumps one-to-one. As mentioned above, for example, 7 buffer tanks are set, and 7 production pumps are also set accordingly. The PID monitors the product content inside the buffer tank and controls the production or shutdown of the production pump.

[0051] See also Figure 1 In one embodiment of the present disclosure, the second heavy phase outlet 30 on the second short-path distiller 4 is configured to be set at a position higher than the fifth feed port 31; the second heavy phase outlet 30 is constructed to be connected to the fifth feed port 31 of the third short-path distiller 5 through a first pipe; the second heavy phase discharged from the second heavy phase outlet 30 is configured to enter the third short-path distiller 5 under the action of gravity.

[0052] Specifically, during the operation of the raw wax separation system of the present invention, the second heavy phase outlet 30 on the second short-path distiller 4 is arranged at a position higher than the fifth feed port 31 of the third short-path distiller 5, so as to enable the second heavy phase to flow into the third short-path distiller 5 under the action of gravity.

[0053] See also Figure 1In one embodiment of the present disclosure, a second heavy phase buffer tank 10 and a second heavy phase production pump 17 are provided between the second short-path distiller 4 and the third short-path distiller 5; the second heavy phase outlet 30 of the second short-path distiller 4 is configured to be connected to the first pipeline via the second heavy phase buffer tank 10 and the second heavy phase production pump 17.

[0054] Specifically, during the operation of the raw wax separation system disclosed in the present invention, the thin film light phase buffer tank 6 and the thin film light phase extraction pump 13 are connected to the light phase outlet 23 of the thin film evaporator 2, the first light phase buffer tank 7 and the first light phase extraction pump 14 are connected to the first light phase outlet 26 of the first short-path distiller 3, the first heavy phase buffer tank 8 and the first heavy phase extraction pump 15 are connected to the first heavy phase outlet 27 of the first short-path distiller 3, the second light phase buffer tank 9 and the second light phase extraction pump 16 are connected to the second light phase outlet 29 of the second short-path distiller 4, and the second heavy phase outlet 30 of the second short-path distiller 4 is connected to the second light phase buffer tank 9 and the second light phase extraction pump 16. The second heavy phase buffer tank 10 and the second heavy phase extraction pump 17 are connected, and the second heavy phase outlet 30 of the second short-path distiller 4 is configured to be connected to the first pipeline through the second heavy phase buffer tank 10 and the second heavy phase extraction pump 17, the purpose of which is to prevent the second heavy phase in the second short-path distiller 4 from failing to stably flow into the third short-path distiller 5 under the action of gravity. The third light phase buffer tank 11 and the third light phase extraction pump 18 are connected to the third light phase outlet 32 ​​of the third short-path distiller 5, and the third heavy phase buffer tank 12 and the third heavy phase extraction pump 19 are connected to the third heavy phase outlet 33 of the third short-path distiller 5.

[0055] See also Figure 1 In one embodiment of the present disclosure, the third heavy phase is configured to be connected to the tank area through the heat exchanger 1 via a pipeline, so that the third heavy phase serves as a heat source for the heat exchanger 1 when flowing through the heat exchanger 1 .

[0056] Specifically, during the operation of the raw wax separation system disclosed in the present invention, the third heavy phase is a heavy phase product obtained after heating and separation in the third short-path distiller 5, wherein the third heavy phase is connected to the tank area via a pipeline through the heat exchanger 1, so that the third heavy phase serves as a heat source for the heat exchanger 1 when flowing through the heat exchanger 1. The purpose is to preheat the raw wax through the heat exchanger 1 and to cool the third heavy phase, thereby increasing the temperature of the raw wax and reducing the load of the thin film evaporator 2, and also preventing the third heavy phase from deteriorating due to high temperature and causing other products in the tank area to deteriorate after entering the tank area.

[0057] After passing through the thin film evaporator 2, the temperature of the raw wax rises to the separation temperature of the first product wax, and the first product wax is separated from the raw wax; after passing through the first short-path distiller 3, the temperature of the raw wax rises to the separation temperature of the second product wax, and the second product wax is separated from the raw wax; after passing through the second short-path distiller 4, the temperature of the raw wax rises to the separation temperature of the third product wax, and the third product wax is separated from the raw wax; after passing through the third short-path distiller 5, the temperature of the raw wax rises to the separation temperature of the fourth product wax, and the fourth product wax is separated from the raw wax. After the raw wax passes through the thin film evaporator 2 and the three short-path distillers, the system achieves the purpose of separating different varieties of product wax from the raw wax.

[0058] In a specific embodiment of the present disclosure, the raw wax may be, for example, No. 85 wax, see Figure 1 In this embodiment, the temperature of the raw material at the first feed port 20 of the heat exchanger 1 is 100-120°C, the temperature of the first discharge port 21 of the heat exchanger 1 is 170-180°C, and the temperature of the third heavy phase is greater than 260°C.

[0059] Specifically, during the operation of the raw wax separation system disclosed in the present invention, the temperature of the first feed port 20 of the heat exchanger 1 is 100-120°C, the temperature of the first discharge port 21 of the heat exchanger 1 is 170-180°C, and the temperature of the third heavy phase is greater than 260°C, wherein the discharge temperature of the heat exchanger 1 can be set manually in order to ensure the product quality of the third heavy phase product, and different discharge temperatures of the heat exchanger 1 can be set according to the separation requirements of different products.

[0060] See also Figure 1 In a specific embodiment of the present disclosure, the heating temperature of the thin film evaporator 2 is 220-230°C; the heating temperature of the first short-path distiller 3 is 230-240°C; the heating temperature of the second short-path distiller 4 is 250-260°C; and the heating temperature of the third short-path distiller 5 is 270°C.

[0061] Specifically, during the operation of the raw wax separation system disclosed in the present invention, the heating temperature of the thin film evaporator 2 is 220-230°C; the heating temperature of the first short-path distiller 3 is 230-240°C; the heating temperature of the second short-path distiller 4 is 250-260°C; the heating temperature of the third short-path distiller 5 is 270°C, wherein the heating temperature of the thin film evaporator 2 is intended to separate the first product wax, i.e., the light phase 33# wax, the heating temperature of the first short-path distiller 3 is intended to separate the second product wax, i.e., the light phase 52# wax, the heating temperature of the second short-path distiller 4 is intended to separate the third product wax, i.e., the light phase 60# wax, the heating temperature of the third short-path distiller 5 is intended to separate the fourth product wax, i.e., the light phase 70# wax and obtain the third heavy phase 95# wax, and the heating temperatures of the thin film evaporator 2 and the short-path distillation unit can be adjusted according to actual conditions.

[0062] The raw wax separation system provided by the present disclosure is added with a short-path distillation unit, and the third feed port 25 of the short-path distillation unit is connected with the heavy phase outlet 24. The short-path distillation unit continues to heat the heavy phase component entering the short-path distillation unit so that the heavy phase and the light phase in the heavy phase component are discharged from the corresponding outlets, thereby achieving the purpose of separating different product waxes from the raw wax, and preheating the raw wax from the tank area through the heat exchanger 1, reducing the heat load of the thin film evaporator 2.

[0063] It should be noted that, for the above-mentioned method embodiments, for the sake of simplicity of description, they are all expressed as a series of action combinations, but those skilled in the art should know that the present disclosure is not limited by the described action sequence, because according to the present disclosure, certain steps can be performed in other sequences or simultaneously. Secondly, those skilled in the art should also know that the embodiments described in the specification are all preferred embodiments, and the actions and modules involved are not necessarily required by the present disclosure.

[0064] In the above embodiments, the description of each embodiment has its own emphasis. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

[0065] The preferred embodiments of the present disclosure disclosed above are only used to help explain the present disclosure. The optional embodiments do not describe all the details in detail, nor do they limit the invention to only the specific implementation methods described. Obviously, many modifications and changes can be made according to the content of the present disclosure. The present disclosure selects and specifically describes these embodiments in order to better explain the principles and practical applications of the present disclosure, so that those skilled in the art can well understand and use the present disclosure. The present disclosure is limited only by the claims and their full scope and equivalents.

Claims

1. A raw wax separation system, characterized in that: include: A heat exchanger (1), the heat exchanger (1) having a first feed inlet (20) and a first discharge inlet (21); the first feed inlet (20) is connected to a raw material tank area, and the heat exchanger (1) is configured to preheat the raw material wax from the tank area; A thin film evaporator (2), wherein the second feed port (22) of the thin film evaporator (2) is connected to the first discharge port (21), and the thin film evaporator (2) is configured to heat the raw wax entering the thin film evaporator (2); the thin film evaporator (2) has a heavy phase outlet (24) and a light phase outlet (23), and the heavy phase component separated from the raw wax is discharged through the heavy phase outlet (24), and the separated light phase component is configured to be discharged through the light phase outlet (23); The short-path distillation unit is connected to the heavy phase outlet (24), and is configured to continue to heat the heavy phase component entering the short-path distillation unit so that the heavy phase and the light phase in the heavy phase component are discharged from corresponding outlets.

2. The raw wax separation system according to claim 1, characterized in that: The short-path distillation unit comprises a first short-path distiller (3), a third feed port (25) of the first short-path distiller (3) being connected to the heavy phase outlet (24), and the first short-path distiller (3) being configured to heat the heavy phase component entering the first short-path distiller (3); a first heavy phase separated from the heavy phase component is discharged through a first heavy phase outlet (27) provided on the first short-path distiller (3), and a first light phase separated is configured to be discharged through a first light phase outlet (26) provided on the first short-path distiller (3).

3. The raw wax separation system according to claim 2, characterized in that: The short-path distillation unit comprises a second short-path distiller (4), a fourth feed port (28) of the second short-path distiller (4) being connected to the first heavy phase outlet (27), and the second short-path distiller (4) being configured to heat the first heavy phase entering the second short-path distiller (4); the second heavy phase separated from the first heavy phase is discharged through a second heavy phase outlet (30) provided on the second short-path distiller (4), and the separated second light phase is configured to be discharged through a second light phase outlet (29) provided on the second short-path distiller (4).

4. The raw wax separation system according to claim 3, characterized in that: The short-path distillation unit comprises a third short-path distiller (5), a fifth feed port (31) of the third short-path distiller (5) being connected to the second heavy phase outlet (30), and the third short-path distiller (5) being configured to heat the second heavy phase entering the third short-path distiller (5); the third heavy phase separated from the second heavy phase is discharged through a third heavy phase outlet (33) provided on the third short-path distiller (5), and the separated third light phase is configured to be discharged through a third light phase outlet (32) provided on the third short-path distiller (5).

5. The raw wax separation system according to claim 4, characterized in that: A buffer tank and a production pump are arranged between two adjacent short-path distillers; the heavy phase separated by the upper short-path distiller is configured to enter the lower short-path distiller through the buffer tank and the production pump.

6. The raw wax separation system according to claim 4, characterized in that: The second heavy phase outlet (30) on the second short-path distiller (4) is configured to be arranged at a position higher than the fifth feed port (31); the second heavy phase outlet (30) is constructed to be connected to the fifth feed port (31) through a first pipe; the second heavy phase discharged from the second heavy phase outlet (30) is configured to enter the third short-path distiller (5) under the action of gravity.

7. The raw wax separation system according to claim 6, characterized in that: A second heavy phase buffer tank (10) and a second heavy phase extraction pump (17) are provided between the second short-path distiller (4) and the third short-path distiller (5); the second heavy phase outlet (30) of the second short-path distiller (4) is configured to be connected to the first pipeline via the second heavy phase buffer tank (10) and the second heavy phase extraction pump (17).

8. The raw wax separation system according to claim 4, characterized in that: The third heavy phase is configured to be connected to the tank area via a pipeline through the heat exchanger (1), so that the third heavy phase serves as a heat source for the heat exchanger (1) when flowing through the heat exchanger (1).

9. The raw wax separation system according to claim 8, characterized in that: The temperature of the first feed port (20) is 100-120°C, the temperature of the first discharge port (21) is 170-180°C, and the temperature of the third heavy phase is greater than 260°C.

10. The raw wax separation system according to claim 4, characterized in that: The heating temperature of the thin film evaporator (2) is 220-230°C; the heating temperature of the first short-path distiller (3) is 230-240°C; the heating temperature of the second short-path distiller (4) is 250-260°C; and the heating temperature of the third short-path distiller (5) is 270°C.

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