Photosensitive material substrate oxidation device

Abstract

The present invention relates to the technical field of photosensitive material plate production equipment, and is named as a photosensitive material substrate oxidation device, comprising a substrate oxidation device body, the substrate oxidation device body further comprising an oxidation tank, the substrate enters the oxidation tank from the inlet, passes through the side of the variable diameter roller, and exits from the outlet to form an oxidation route of the substrate, the oxidation tank is also provided with a running roller, the running roller is a roller that acts on the substrate to make it move forward; the oxidation tank is multiple, from back to front, it is the first oxidation tank, the second oxidation tank and the third oxidation tank, the multiple oxidation tanks are connected in sequence, that is, the oxidation routes of the first oxidation tank, the second oxidation tank and the third oxidation tank are connected in sequence. It has the advantage that the generated oxide film is more conducive to the firm bonding of the photosensitive material coating. The present invention also provides a photosensitive material substrate oxidation method.

Description

Technical Field

[0001] The present invention relates to the technical field of photosensitive material plate production equipment, and also to an oxidation method, in particular to a substrate oxidation device for photosensitive material plates and a substrate oxidation method for photosensitive material plates. Background Art

[0002] The photosensitive material plate includes a substrate below and a photosensitive material coating on the substrate. The substrate is an aluminum alloy thin plate. The photosensitive material coating is formed by condensation of photosensitive material liquid. In the production process of the photosensitive material plate, a thin film of aluminum oxide needs to be formed on the substrate first so that the photosensitive material coating can be better attached to the substrate. The thin film of aluminum oxide on the substrate is formed on a substrate oxidation device. The substrate oxidation device includes an oxidation tank. When in use, the oxidation tank contains an oxidation liquid, that is, an acid solution, such as a sulfuric acid solution or a hydrochloric acid solution. The oxidation tank has an inlet on the right and an outlet on the left. The oxidation tank also has a plurality of variable diameter rollers that guide the walking path of the substrate. The oxidation tank also has a running roller, which acts on the substrate to make the substrate move forward. During production, the substrate to be oxidized enters the oxidation tank from the inlet, passes through the action of the oxidation liquid, and comes out from the outlet through the action of the variable diameter roller, and forms an oxide film on the surface of the substrate.

[0003] In the prior art, the substrate oxidation device has only one oxidation tank, that is, the oxidation of the substrate is completed at one time. The produced oxide film is not conducive to the firm adhesion of the photosensitive material coating, which ultimately affects the quality of the photosensitive material plate, and this needs to be improved. Summary of the invention

[0004] The purpose of the present invention is to address the above-mentioned shortcomings and to provide a device and method for oxidizing a photosensitive material substrate in which the generated oxide film is more conducive to the firm adhesion of the photosensitive material coating.

[0005] The technical solution adopted by the photosensitive material substrate oxidation device of the present invention is as follows: the photosensitive material substrate oxidation device includes a substrate oxidation device body, and the substrate oxidation device body also includes an oxidation tank. When in use, the oxidation tank is filled with an oxidation liquid, that is, an acid liquid. The oxidation tank has an inlet on the right and an outlet on the left. There are also multiple variable-diameter rollers in the oxidation tank that guide the walking path of the substrate. The substrate enters the oxidation tank from the inlet, passes through the side of the variable-diameter roller, and exits from the outlet to form an oxidation route for the substrate. The oxidation tank also has a running roller, and the running roller is a roller that acts on the substrate to make it move forward; its characteristic is that there are multiple oxidation tanks, which are the first oxidation tank, the second oxidation tank and the third oxidation tank from back to front, and the multiple oxidation tanks are connected in sequence, that is, the oxidation routes of the first oxidation tank, the second oxidation tank and the third oxidation tank are connected in sequence.

[0006] Furthermore, a heating component is provided on the inner wall or around each oxidation trough, and the heating components of the first oxidation trough, the second oxidation trough and the third oxidation trough are respectively the first heating component, the second heating component and the third heating component. The first heating component can make the temperature inside the first oxidation trough reach 40-45°C, the second heating component can make the temperature inside the second oxidation trough reach 30-34°C, and the third heating component can make the temperature inside the third oxidation trough reach 37-40°C.

[0007] Furthermore, there are original acid holding tanks above the first oxidation tank, the second oxidation tank and the third oxidation tank, respectively. They are the first original acid holding tank, the second original acid holding tank and the third original acid holding tank. The original acid holding tanks have release pipes facing the respective oxidation tanks, and valves are installed on the release pipes. The first original acid holding tank contains sulfuric acid, the second original acid holding tank contains hydrochloric acid, and the third original acid holding tank contains phosphoric acid.

[0008] Furthermore, under the action of the running roller, the time for the substrate to pass through the first oxidation groove, the second oxidation groove and the third oxidation groove is 30-35 seconds, 20-25 seconds and 25-30 seconds respectively.

[0009] Furthermore, a pair of rolling rollers are installed in the oxidation tank, and the area between the pair of rolling rollers is where the substrate passes. The length of the rolling rollers exceeds the two sides of the base, and the substrate is subjected to interference pressure when passing between the pair of rolling rollers.

[0010] The technical solution adopted by the photosensitive material substrate oxidation method of the present invention is as follows: the photosensitive material substrate oxidation method uses acid solution to oxidize the surface of the substrate, and is characterized in that: hydrochloric acid solution, sulfuric acid solution and phosphoric acid solution are used to oxidize the surface of the substrate respectively, and the surface of the substrate is oxidized by using hydrochloric acid as the first oxidation stage, the surface of the substrate is oxidized by using sulfuric acid as the second oxidation stage, and the surface of the substrate is oxidized by using phosphoric acid as the third oxidation stage.

[0011] Furthermore, in the first oxidation stage, the temperature of the oxidizing liquid is 40-45°C; in the second oxidation stage, the temperature of the oxidizing liquid is 30-34°C; in the third oxidation stage, the temperature of the oxidizing liquid is 37-40°C.

[0012] Furthermore, the time used in the first oxidation stage is 30-35 seconds, the time used in the second oxidation stage is 20-25 seconds, and the time used in the third oxidation stage is 25-30 seconds.

[0013] Furthermore, the pH of the oxidizing liquid used in the first oxidation stage is 0.5-1; the pH of the oxidizing liquid used in the second oxidation stage is 0.7-1; and the pH of the oxidizing liquid used in the third oxidation stage is 0.5-1.

[0014] Furthermore, during the oxidation process of the substrate, the surface of the substrate is also subjected to pressure.

[0015] The beneficial effect of the present invention is that the oxide film produced by such a photosensitive material substrate oxidation device and a photosensitive material substrate oxidation method is more conducive to the advantage of firm adhesion of the photosensitive material coating, thereby improving the quality of the subsequent photosensitive material plate. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a side structural schematic diagram of the photosensitive material substrate oxidation device of the present invention.

[0017] Among them: 11, inlet 12, outlet 13, variable diameter roller 14, oxidation route 15, running roller 2, substrate 3, first oxidation trough 31, first heating component 32, first raw acid tank 4, second oxidation trough 41, second heating component 42, second raw acid tank 5, third oxidation trough 51, third heating component 52, third raw acid tank 6, rolling roller. DETAILED DESCRIPTION

[0018] The present invention will be further described below in conjunction with the accompanying drawings.

[0019] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0020] like Figure 1As shown, a photosensitive material substrate oxidation device comprises a substrate oxidation device body, and the substrate oxidation device body further comprises an oxidation tank. When in use, the oxidation tank contains an oxidation liquid, i.e., an acid liquid. The oxidation tank has an inlet 11 on the right and an outlet 12 on the left. The oxidation tank also has a plurality of variable-diameter rollers 13 that guide the walking path of the substrate 2. The substrate enters the oxidation tank from the inlet, passes through the side of the variable-diameter roller, and exits from the outlet to form an oxidation route 14 for the substrate. The oxidation tank also has a running roller 15, and the running roller is a roller that acts on the substrate to make it move forward. The characteristic is that there are multiple oxidation tanks, which are the first oxidation tank 3, the second oxidation tank 4, and the third oxidation tank 5 from back to front, and the multiple oxidation tanks are connected in sequence, i.e., the oxidation routes of the first oxidation tank, the second oxidation tank, and the third oxidation tank are connected in sequence.

[0021] The device is configured in this way to realize multiple oxidations of the substrate. When in use, different oxidation tanks are filled with different oxidation liquids, and the resulting oxidation layer is more conducive to the adhesion of the photosensitive material, thereby achieving the purpose of the present invention.

[0022] Furthermore, a heating component is provided on the inner wall or around each oxidation trough. The heating components of the first oxidation trough, the second oxidation trough and the third oxidation trough are respectively the first heating component 31, the second heating component 41 and the third heating component 51. The first heating component can make the temperature inside the first oxidation trough reach 40-45°C, the second heating component can make the temperature inside the second oxidation trough reach 30-34°C, and the third heating component can make the temperature inside the third oxidation trough reach 37-40°C.

[0023] The present invention is configured in this way to meet the requirements of using different temperatures in different stages to meet the requirements of the oxidation process, so that the produced oxide film is more conducive to the adhesion of the photosensitive material.

[0024] Furthermore, there are original acid holding tanks on the first oxidation tank, the second oxidation tank and the third oxidation tank, which are the first original acid holding tank 32, the second original acid holding tank 42 and the third original acid holding tank 52 respectively. The original acid holding tanks have release pipes facing the respective oxidation tanks, and valves are installed on the release pipes. The first original acid holding tank contains sulfuric acid, the second original acid holding tank contains hydrochloric acid, and the third original acid holding tank contains phosphoric acid.

[0025] The present invention is configured in this way to meet the requirements of using different oxidation solutions in different stages to meet the requirements of the oxidation process, so that the produced oxide film is more conducive to the adhesion of the photosensitive material.

[0026] Furthermore, under the action of the running roller, the time for the substrate to pass through the first oxidation groove, the second oxidation groove and the third oxidation groove is 30-35 seconds, 20-25 seconds and 25-30 seconds respectively.

[0027] The present invention is configured in this way to satisfy the requirement of having different oxidation thicknesses at different stages to meet the requirements of the oxidation process, so that the produced oxide film is more conducive to the adhesion of the photosensitive material.

[0028] Furthermore, a pair of rolling rollers 6 are installed in the oxidation tank. The area between the pair of rolling rollers is where the substrate passes. The length of the rolling rollers exceeds both sides of the substrate. The substrate is subjected to interference pressure when passing between the pair of rolling rollers.

[0029] The present invention is configured in this way so that during the oxidation process, the oxide film is subjected to pressure, thereby making the oxide film more solid and making the photosensitive material more firmly connected to the oxide film.

[0030] In one technical solution, the rolling roller is made of ceramic.

[0031] The present invention is configured in this way, so that the produced oxide film can be smoother.

[0032] The technical solution adopted by the photosensitive material substrate oxidation method of the present invention is as follows: the photosensitive material substrate oxidation method uses acid solution to oxidize the surface of the substrate, and is characterized in that: hydrochloric acid solution, sulfuric acid solution and phosphoric acid solution are used to oxidize the surface of the substrate respectively, and the surface of the substrate is oxidized by using hydrochloric acid as the first oxidation stage, the surface of the substrate is oxidized by using sulfuric acid as the second oxidation stage, and the surface of the substrate is oxidized by using phosphoric acid as the third oxidation stage.

[0033] Example 1

[0034] Under similar conditions and parameters, such as substantially the same pH value, time and temperature of the oxidizing solution, a single acid, such as only hydrochloric acid or only sulfuric acid, is used to oxidize the photosensitive material plate to obtain a first substrate.

[0035] Example 2

[0036] Under similar conditions and parameters, such as the pH value, time and temperature of the oxidizing solution, the photosensitive material plate is oxidized successively with hydrochloric acid solution, sulfuric acid solution and phosphoric acid solution to obtain a second substrate.

[0037] The first substrate and the second substrate are used to produce a photosensitive material plate, respectively obtaining a first photosensitive material plate and a second photosensitive material plate. After testing, the photosensitive material coating of the second photosensitive material plate is more durable, and the durability times are increased by 5-12%.

[0038] Furthermore, in the first oxidation stage, the temperature of the oxidizing liquid is 40-45°C; in the second oxidation stage, the temperature of the oxidizing liquid is 30-34°C; in the third oxidation stage, the temperature of the oxidizing liquid is 37-40°C.

[0039] Example 3

[0040] During the oxidation process, in the first oxidation stage, the temperature of the oxidation liquid is 40°C; in the second oxidation stage, the temperature of the oxidation liquid is 30°C; in the third oxidation stage, the temperature of the oxidation liquid is 37°C, and a third substrate is obtained.

[0041] Example 4

[0042] During the oxidation process, in the first oxidation stage, the temperature of the oxidation liquid is 45°C; in the second oxidation stage, the temperature of the oxidation liquid is 34°C; in the third oxidation stage, the temperature of the oxidation liquid is 40°C, and a fourth substrate is obtained.

[0043] The third and fourth substrates are used to produce photosensitive material plates, namely the third photosensitive material plates and the fourth photosensitive material plates. After testing, the third and fourth photosensitive material plates are more durable than the first photosensitive material plates, and the durability times are increased by 9-12%.

[0044] After testing, it was found that when the above temperature parameters exceed the above values, for example, when the temperature of the oxidizing liquid in the first oxidation stage is not 40-45°C..., the durability of the photosensitive material plate produced by the obtained substrate is reduced, that is, the effect of increasing the durability by 9-12% cannot be achieved.

[0045] Furthermore, the time used in the first oxidation stage is 30-35 seconds, the time used in the second oxidation stage is 20-25 seconds, and the time used in the third oxidation stage is 25-30 seconds.

[0046] Example 5

[0047] During the oxidation process, in the first oxidation stage, the oxidation time is 30 seconds; in the second oxidation stage, the oxidation time is 20 seconds; in the third oxidation stage, the oxidation time is 25°C, and a fifth substrate is obtained.

[0048] Example 6

[0049] During the oxidation process, in the first oxidation stage, the oxidation time is 35 seconds; in the second oxidation stage, the oxidation time is 25 seconds; in the third oxidation stage, the oxidation time is 30°C, and the sixth substrate is obtained.

[0050] The fifth and sixth substrates are used to produce photosensitive material plates, namely the fifth and sixth photosensitive material plates. After testing, the fifth and sixth photosensitive material plates are more durable than the first photosensitive material plate, and the durability times are increased by 10-12%.

[0051] After testing, it was found that when the above time parameters exceed the above values, for example, when the temperature of the oxidizing liquid in the first oxidation stage is not 30-35 seconds..., the durability of the photosensitive material plate produced by the obtained substrate is reduced.

[0052] Furthermore, the pH of the oxidizing liquid used in the first oxidation stage is 0.5-1; the pH of the oxidizing liquid used in the second oxidation stage is 0.7-1; and the pH of the oxidizing liquid used in the third oxidation stage is 0.5-1.

[0053] Example 7

[0054] The pH of the oxidizing liquid used in the first oxidation stage is 0.5-1; the pH of the oxidizing liquid used in the second oxidation stage is 0.7-1; the pH of the oxidizing liquid used in the third oxidation stage is 0.5-1 to obtain the seventh substrate, and the seventh photosensitive material plate is produced using the seventh substrate to obtain the seventh photosensitive material plate. After testing, the durability of the seventh photosensitive material plate is increased by 8-12% compared with the durability of the first photosensitive material plate.

[0055] Furthermore, during the oxidation process of the substrate, the surface of the substrate is also subjected to pressure.

[0056] Example 8

[0057] During the oxidation process of the base, the side of the substrate is also rolled to obtain an eighth substrate, and the eighth substrate is used to produce an eighth photosensitive material plate. After testing, the photosensitive material plate obtained by rolling the substrate during the oxidation process has improved durability.

[0058] It is to be noted that the positive effects and functions of the photosensitive material substrate oxidation device of the above-mentioned embodiment can help explain the photosensitive material substrate oxidation method, and the above-mentioned photosensitive material substrate oxidation method can also help understand the photosensitive material substrate oxidation device; technical personnel in this field can understand each other based on the above-mentioned photosensitive material substrate oxidation device and photosensitive material substrate oxidation method.

[0059] In the description of the present invention, it should be noted that the terms "front", "rear", "left", "right", "vertical", "horizontal", "inside", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third", "fourth", and "fifth" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.

Claims

1. A photosensitive material substrate oxidation device, comprising a substrate oxidation device body, the substrate oxidation device body further comprising an oxidation tank, wherein the oxidation tank contains an oxidation liquid, i.e., an acid liquid, and the oxidation tank has an inlet on the right and an outlet on the left, and the oxidation tank also has a plurality of variable diameter rollers that guide the substrate's travel path, the substrate enters the oxidation tank from the inlet, passes through the side of the variable diameter roller, and exits from the outlet to form an oxidation route for the substrate, the oxidation tank also has a running roller, and the running roller is a roller that acts on the substrate to make it move forward; the characteristics are: There are multiple oxidation troughs, which are the first oxidation trough, the second oxidation trough and the third oxidation trough from back to front. The multiple oxidation troughs are connected in sequence, that is, the oxidation routes of the first oxidation trough, the second oxidation trough and the third oxidation trough are connected in sequence.

2. The photosensitive material substrate oxidation device according to claim 1, characterized in that: A heating component is provided on the inner wall or around each oxidation trough. The heating components of the first oxidation trough, the second oxidation trough and the third oxidation trough are respectively the first heating component, the second heating component and the third heating component. The first heating component can make the temperature inside the first oxidation trough reach 40-45°C, the second heating component can make the temperature inside the second oxidation trough reach 30-34°C, and the third heating component can make the temperature inside the third oxidation trough reach 37-40°C.

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