Cleaning device of gluing and developing machine table and gluing and developing machine table

Abstract

The utility model provides a cleaning device of a gluing and developing machine table and the gluing and developing machine table, comprising a base which is rotatably arranged on the gluing and developing machine table; the spraying pipe is mounted on the base, one end of the spraying pipe is a water inlet end, the other end of the spraying pipe is a water spraying end, and the water spraying end of the spraying pipe is opposite to a developing cover of the gluing developing machine; the sliding groove is formed in the base, the water inlet end of the spraying pipe is movably connected to the base, and the water spraying end of the spraying pipe slides in the sliding groove; the elastic telescopic piece is movably connected between the base and the spray pipe; wherein in the vertical direction, the heights of the two ends of the projection pattern of the sliding groove are different. The cleaning efficiency of the developing cover and the output rate of the machine table can be improved.

Description

Technical Field

[0001] The utility model relates to a semiconductor machine, in particular to a cleaning device of a glue coating and developing machine and the glue coating and developing machine. Background Art

[0002] During the development process of the glue coating and developing machine, the wafer is placed in the developing cover of the machine for glue coating and development. A large amount of reaction products will remain on the developing cover of the machine, which may easily cause abnormalities in subsequent processes. Therefore, cleaning the developing cover is a necessary operation to ensure the normal process. However, at present, when cleaning the developing cover of the glue coating and developing machine, it is necessary to stop the machine and disassemble the developing cover for cleaning, which has low operating efficiency and affects the output rate of the machine. Utility Model Content

[0003] In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide a cleaning device for a glue coating and developing machine and a glue coating and developing machine, which can improve the cleaning efficiency of the developing cover and the output rate of the machine.

[0004] In order to solve the above technical problems, the utility model is achieved through the following technical solutions:

[0005] As described above, the utility model provides a cleaning device for a glue coating and developing machine, comprising:

[0006] A base, rotatably disposed on the coating and developing machine platform;

[0007] A spray pipe is installed on the base, one end of which is a water inlet end and the other end is a water spray end, and the water spray end of the spray pipe is opposite to the developing cover of the glue coating and developing machine;

[0008] A chute is provided on the base, and the water inlet end of the nozzle is movably connected to the base, and the water spraying end of the nozzle slides in the chute; and

[0009] An elastic telescopic member, movably connected between the base and the nozzle;

[0010] Wherein, in the vertical direction, the two ends of the projection pattern of the slide groove have different heights.

[0011] In an embodiment of the present invention, the base is placed on a rotating suction cup of the glue coating and developing machine.

[0012] In an embodiment of the present invention, the height of the lowest point of the chute is equal to or lower than the height of the lowest point of the developing cover, and the height of the highest point of the chute is equal to or higher than the height of the highest point of the developing cover.

[0013] In an embodiment of the utility model, a plurality of the nozzles are provided, and the plurality of the nozzles are distributed in a ring shape along the center of the base.

[0014] In an embodiment of the present invention, the plurality of spray pipes are arranged at equal distances, and the distances between the water spraying ends of the plurality of spray pipes and the developing cover are equal.

[0015] In one embodiment of the utility model, the cleaning device further comprises:

[0016] A water delivery trough, disposed on the base, wherein cleaning liquid is delivered in the trough; and

[0017] A water inlet and a plurality of water outlets are arranged on the water delivery trough, and a water inlet end of each of the spray pipes is connected to at least one of the water outlets.

[0018] In one embodiment of the utility model, the cleaning device further comprises an elastic sealing ring installed at the water outlet of the water delivery trough, and the outer surface of the water inlet end of the nozzle is movably connected to the water outlet of the water delivery trough through the elastic sealing ring.

[0019] In an embodiment of the present invention, the diameter of the water spraying end of the nozzle is smaller than the diameter of the water inlet end of the nozzle.

[0020] The utility model also provides a glue coating and developing machine, comprising:

[0021] Machine body;

[0022] A rotating suction cup is installed on the machine body;

[0023] A developing cover, surrounding the circumference of the rotating suction cup;

[0024] A cleaning device, placed on the rotating suction cup;

[0025] Wherein, the cleaning device comprises:

[0026] A base, rotatably disposed on the coating and developing machine platform;

[0027] A spray pipe is installed on the base, one end of which is a water inlet end and the other end is a water spray end, and the water spray end of the spray pipe is opposite to the developing cover;

[0028] A chute is provided on the base, and the water inlet end of the nozzle is movably connected to the base, and the water spraying end of the nozzle slides in the chute; and

[0029] An elastic telescopic member, movably connected between the base and the nozzle;

[0030] Wherein, in the vertical direction, the two ends of the projection pattern of the slide groove have different heights.

[0031] In one embodiment of the present invention, the coating and developing machine further comprises:

[0032] A support member is mounted on the machine body, the support member surrounds the circumference of the rotating suction cup, and the base is at least partially placed on the support member; and

[0033] The lifting device is installed on the machine body and drives the supporting member to rise or fall.

[0034] As described above, the utility model provides a cleaning device for a glue coating and developing machine and a glue coating and developing machine. Through the rotation cleaning of the cleaning device, the glue coating and developing machine can fully clean the surrounding developing cover without stopping the machine, thereby improving the output rate of the machine. The unexpected effect is that as the cleaning device rotates, the height of its water spray end changes accordingly, greatly improving the cleaning range and cleaning efficiency.

[0035] Of course, any product implementing the present invention does not necessarily need to achieve all of the advantages described above at the same time. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for describing the embodiments are briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0037] Figure 1 It is a structural diagram of a gluing and developing machine in one embodiment of the utility model.

[0038] Figure 2 This is a structural diagram of a cleaning device equipped with multiple nozzles in one embodiment of the utility model.

[0039] Figure 3 This is a structural diagram of a nozzle installed in a cleaning device in one embodiment of the utility model.

[0040] In the figure: 10, machine body; 20, rotating suction cup; 30, developing cover; 40, cleaning device; 50, supporting member; 51, lifting device; 41, base; 42, nozzle; 421, ultrapure water pipeline; 43, water trough; 431, water inlet; 432, water outlet; 321, elastic sealing ring; 44, elastic telescopic member; 45, slide groove. DETAILED DESCRIPTION

[0041] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0042] See also Figure 1 , Figure 1 A glue coating and developing machine is provided in the present application. The glue coating and developing machine may include a machine body 10 and a rotating suction cup 20 and a developing cover 30 on the machine body 10. When the glue coating and developing machine performs glue coating and developing operations, a robot arm configured with the machine body 10 may transport a wafer to the rotating suction cup 20, and the rotating suction cup 20 may adsorb and fix the wafer and drive the wafer to rotate for glue coating. The developing cover 30 may surround the circumference of the rotating suction cup 20 to play a protective role and prevent the photoresist or other reaction products from splashing out.

[0043] See also Figure 1 During the development operation, a large amount of reaction products will remain on the inner wall of the developing cover 30, which may easily cause abnormalities in subsequent processes. Therefore, a cleaning device 40 is also provided on the coating and developing machine, and the cleaning device 40 can spray cleaning liquid to clean the developing cover 30.

[0044] See also Figure 1 and Figure 3 Specifically, the water spray end of the cleaning device 40 can be arranged opposite to the inner wall of the developing cover 30 to spray the cleaning liquid to clean the developing cover 30. In addition, the cleaning device 40 can be rotatably arranged on the machine body 10, and its water spray end can be rotated to different positions relative to the developing cover 30 to ensure the cleaning range and cleaning efficiency. There is no need to stop the machine and disassemble the developing cover 30 for cleaning, thereby improving the output rate of the machine.

[0045] See also Figure 1 and Figure 3 In order to reduce the space occupied by the cleaning device 40 and reduce the cost of the cleaning device 40, during cleaning, the rotating suction cup 20 on the machine body 10 can be directly used as a rotating driving component of the cleaning device 40. During cleaning, the robot arm configured on the coating and developing machine can carry the cleaning device 40 to the rotating suction cup 20 of the coating and developing machine, so that it is adsorbed on the rotating suction cup 20 and rotates with the rotation of the rotating suction cup 20, so that the cleaning device 40 can be rotated to different positions relative to the developing cover 30 for cleaning.

[0046] Furthermore, the coating and developing machine can pre-set the machine program. When the set cleaning time is reached and the developing cover 30 needs to be cleaned, the robot arm can place the cleaning device 40 on the rotating suction cup 20 so that the cleaning device 40 is adsorbed and fixed by the rotating suction cup 20 to start cleaning.

[0047] See also Figure 1 Specifically, the above-mentioned coating and developing machine can also include a support member 50 and a lifting device 51 on the machine body 10 to cooperate with the robot arm to carry the wafer or the cleaning device 40. The robot arm can carry the wafer or the cleaning device 40 to a predetermined position, and at the same time, the lifting device 51 can drive the support member 50 to rise below the robot arm to receive the wafer or the cleaning device 40 released by the robot arm. Further, the lifting device 51 can drive the support member 50 to descend to be parallel to the rotating suction cup 20, so that the wafer or the cleaning device 40 on the support member 50 can be placed on the rotating suction cup 20.

[0048] See also Figure 1 It should be noted that the shape of the support member 50 is not limited, and the number of the support members 50 is not limited, as long as the support member 50 can be used with the robot arm to carry the wafer or the cleaning device 40. For example, the support member 50 can be configured as a plurality of support pins surrounding the circumference of the rotating suction cup 20. When the support pins support the wafer or the cleaning device 40, the plurality of support pins can be stably supported at the outer ring position of the wafer or the cleaning device 40.

[0049] See also Figure 1 When the support member 50 is configured as a plurality of support pins, the lifting device 51 can be configured as an electric telescopic rod to match it. Each support pin can be connected to an electric telescopic rod to achieve its own lifting. Of course, the lifting device 51 is not limited to the above structure and can also be other lifting structures.

[0050] See also Figure 3 Specifically, the cleaning device 40 of the coating and developing machine provided in the present application may include a base 41 and a cleaning component on the base 41. Specifically, the base 41 can serve as an integral substrate of the cleaning device 40, which can be rotatably mounted on the coating and developing machine, so that the cleaning component can be rotated to different positions relative to the developing cover 30 for cleaning, thereby improving the cleaning effect.

[0051] See also Figure 1 and Figure 3It should be noted that the rotating suction cup 20 on the machine body 10 can be directly used as the rotating driving component of the base 41 to reduce the space occupied by the cleaning device 40. When the base 41 is directly placed on the rotating suction cup 20, it can be fixed by the rotating suction cup 20 and rotate with the rotation of the rotating suction cup 20, so that the cleaning component on the base 41 can be rotated to different positions relative to the developing cover 30 for cleaning. Of course, the rotating driving component of the base 41 is not limited to the above structure, and can also be other rotating driving structures.

[0052] See also Figure 2 and Figure 3 When the base 41 is directly placed on the rotating suction cup 20, the base 41 can be disc-shaped to adapt to the rotating suction cup 20. Of course, the shape of the base 41 can be set based on actual needs and is not limited to the above situation.

[0053] See also Figure 2 and Figure 3 The cleaning assembly on the base 41 may include a spray pipe 42. The two ends of the spray pipe 42 may be a water spray end and a water inlet end, respectively, and the water inlet end may be input with cleaning liquid. The water spray end may be arranged opposite to the developing cover 30 to clean the developing cover 30. In order to improve the cleaning effect of the spray pipe 42, the diameter of the water spray end of the spray pipe 42 may be set to be smaller than the diameter of the water inlet end of the spray pipe 42, so that the water pressure increases when the cleaning liquid is sprayed out, and the cleaning effect is better.

[0054] See also Figure 1 and Figure 2 , multiple nozzles 42 can be provided, and the multiple nozzles 42 can be distributed in a ring along the center of the base 41, so that the cleaning range of the water spraying ends of the multiple nozzles 42 is larger, and the area to be cleaned of the developer cover 30 can be covered, thereby improving the cleaning efficiency. Further, the multiple annularly distributed nozzles 42 can be arranged at equal distances, so that the distribution of the cleaning range is more uniform and the cleaning effect is better. Similarly, the distance between the water spraying ends of the multiple nozzles 42 and the developer cover 30 can be set to be equal distances. The same cleaning distance can ensure uniform cleaning force and better cleaning effect.

[0055] See also Figure 1 and Figure 2 In order to facilitate the input of cleaning liquid into the nozzle 42, the ultrapure water supply pipeline of the coating and developing machine can be directly used to input ultrapure water as cleaning liquid into the water inlet of the nozzle 42. Further, when multiple annularly distributed nozzles 42 are provided, in order to facilitate the delivery of cleaning liquid to multiple nozzles 42, a water delivery trough 43 can be provided on the base 41, and the cleaning liquid is delivered in the trough, so that the cleaning liquid can be delivered to each nozzle 42.

[0056] See also Figure 2Specifically, a water inlet 431 and a plurality of water outlets 432 may be provided on the water delivery tank 43. The water inlet 431 may be used to input cleaning liquid. When ultrapure water from an ultrapure water supply pipeline is used as the cleaning liquid, the water inlet 431 may be opposite to the ultrapure water supply pipeline to input ultrapure water. After ultrapure water enters from the water inlet 431, it may flow out from the plurality of water outlets 432. The water inlet end of each nozzle 42 may be connected to at least one water outlet 432, so that the plurality of nozzles 42 may be cleaned together, thereby improving the cleaning efficiency.

[0057] See also Figure 2 When the base 41 is disc-shaped, the water delivery trough 43 may be a disc-shaped trough, which may be designed in the middle of the base 41, so that the water in the water delivery trough 43 may flow evenly from the plurality of water outlets 432 around the circumference to each nozzle 42. Of course, the water delivery trough 43 may also be in other shapes, which are not limited here.

[0058] See also Figure 2 In order to improve the cleaning efficiency, the water inlet 431 of the water delivery tank 43 can be set in the middle of the base 41, so that when the ultrapure water supply pipeline provides ultrapure water, the robot arm can drive the ultrapure water pipeline to move above the water inlet 431 and spray the ultrapure water. This water supply method does not need to connect the ultrapure water supply pipeline with the water inlet 431, and the ultrapure water supply pipeline is not affected by the rotation of the base 41, which is faster and more convenient.

[0059] See also Figure 2 and Figure 3 The cleaning component on the base 41 may also include a position adjustment component for the nozzle 42. The position adjustment component can drive the water spray end of the cleaning component to move to different height positions as the base 41 rotates, thereby being able to more comprehensively clean different height positions of the developing cover 30 and improving the cleaning effect.

[0060] See also Figure 2 and Figure 3 Specifically, the position adjustment component may include an elastic telescopic member 44. The nozzle 42 may be movably connected to the base 41 via the elastic telescopic member 44. It should be explained that when the base 41 rotates, different centrifugal forces are generated at different rotation speeds, and the lengths of the elastic telescopic member 44 are different, which in turn drives the nozzle 42 to move to different positions.

[0061] See also Figure 2 and Figure 3 Furthermore, the position adjustment assembly may further include a slide groove 45, which may be disposed on the base 41 to provide a sliding path limit for the water spraying end of the nozzle 42. In the vertical direction, the two ends of the projection image of the slide groove 45 are at different heights, and the water spraying end of the nozzle 42 may slide to different heights in the slide groove 45, so that different height positions of the developing cover 30 can be cleaned.

[0062] See also Figure 2 and Figure 3 In order to control the height of the water spraying end of the nozzle 42, based on the relationship between the centrifugal force, the length of the elastic telescopic part 44 and the rotation speed, the rotation speed set in the machine program of the coating and developing machine can be adjusted to adjust the size of the centrifugal force, thereby changing the length of the elastic telescopic part 44 and the height of the water spraying end of the nozzle 42.

[0063] See also Figure 2 and Figure 3 , the water inlet end of the nozzle 42 can be movably connected to the base 41, and the water spraying end of the nozzle 42 can slide in the slide 45, so that the water spraying end of the nozzle 42 can slide to different heights in the slide 45. Specifically, an elastic sealing ring 321 can be installed at the water outlet 432 of the water delivery trough 43, and the outer surface of the water inlet end of the nozzle 42 can be movably connected to the water outlet 432 of the water delivery trough 43 through the elastic sealing ring 321, so that the water inlet end of the nozzle 42 can be movably connected to the base 41. Of course, the connection method between the water inlet end of the nozzle 42 and the water outlet 432 of the water delivery trough 43 is not limited to the above structure, and can also be other connection methods that have both sealing and mobility.

[0064] See also Figure 2 and Figure 3 One end of the elastic telescopic member 44 is movably connected to the base 41, and the other end is movably connected to the outer surface of the nozzle 42. When the elastic telescopic member 44 is extended or retracted, the connection can be adaptively movable. It should be noted that the elastic telescopic member 44 can be a coil spring or other retractable elastic material, as long as it can be extended or retracted as the base 41 rotates.

[0065] See also Figure 2 and Figure 3 The chute 45 may be in a strip, arc or other shape, which may be specifically set according to the sliding path of the spray pipe 42. It should be noted that the height of the lowest point of the chute 45 may be equal to or lower than the height of the lowest point of the developing cover 30, so that the sliding path of the spray pipe in the chute 45 may cover the lowest point of the developing cover 30. At the same time, the height of the highest point of the chute 45 may be equal to or higher than the height of the highest point of the developing cover 30, so that the sliding path of the spray pipe in the chute 45 may cover the highest point of the developing cover 30. Finally, a better cleaning effect can be achieved.

[0066] See also Figure 2When the cleaning device 40 is provided with a plurality of nozzles 42 for cleaning, the machine program of the coating and developing machine can be pre-set first. When the set cleaning time is reached and the developing cover 30 needs to be cleaned, the robot grabs the cleaning device 40 to the top of the support 50, and the support 50 rises to the bottom of the robot to receive the cleaning device 40 released by the robot, so that the base 41 is at least partially placed on the support 50. Then, the support 50 is lowered to be parallel to the rotating suction cup 20, so that the cleaning device 40 is placed on the rotating suction cup 20. After the base 41 of the cleaning device 40 is adsorbed and fixed by the rotating suction cup 20, the cleaning operation can be started.

[0067] During the cleaning operation, the robot arm can drive the ultrapure water pipeline to move above the water delivery tank 43, and spray ultrapure water toward the water delivery tank 43, so that the ultrapure water can enter the multiple nozzles 42 and be sprayed toward the developing cover 30 for cleaning. At the same time, when the rotary suction cup 20 rotates at different speeds, the nozzle 42 rotates to different height positions relative to the developing cover 30 to achieve comprehensive cleaning.

[0068] After the cleaning operation is completed, the support member 50 drives the cleaning device 40 to rise to the bottom of the robot arm, and the robot arm moves to the top of the support member 50 so that the robot arm can grab the cleaning device 40 and place it in other storage areas.

[0069] In summary, the utility model provides a cleaning device for a glue coating and developing machine and a glue coating and developing machine. The developing cover can be fully cleaned by the rotation of the cleaning device. The glue coating and developing machine can be cleaned without stopping the machine to disassemble the developing cover, thereby improving the output rate of the machine. The unexpected effect is that as the cleaning device rotates, the height of its water spray end changes accordingly, greatly improving the cleaning range and cleaning efficiency.

[0070] The embodiments of the utility model disclosed above are only used to help illustrate the utility model. The embodiments do not describe all the details in detail, nor do they limit the utility model to the specific implementation methods described. Obviously, many modifications and changes can be made according to the content of this specification. This specification selects and specifically describes these embodiments in order to better explain the principles and practical applications of the utility model, so that technicians in the relevant technical field can well understand and use the utility model. The utility model is limited only by the claims and their full scope and equivalents.

Claims

1. A cleaning device for a coating and developing machine, characterized in that: include: A base, rotatably disposed on the coating and developing machine platform; A spray pipe is installed on the base, one end of which is a water inlet end and the other end is a water spray end, and the water spray end of the spray pipe is opposite to the developing cover of the glue coating and developing machine; A chute is provided on the base, and the water inlet end of the nozzle is movably connected to the base, and the water spraying end of the nozzle slides in the chute; and An elastic telescopic member, movably connected between the base and the nozzle; Wherein, in the vertical direction, the two ends of the projection pattern of the slide groove have different heights.

2. The cleaning device for a coating and developing machine according to claim 1, characterized in that: The base is placed on the rotating suction cup of the glue coating and developing machine.

3. The cleaning device of a coating and developing machine according to claim 1, characterized in that: The height of the lowest point of the chute is equal to or lower than the height of the lowest point of the developing cover, and the height of the highest point of the chute is equal to or higher than the height of the highest point of the developing cover.

4. The cleaning device for a coating and developing machine according to claim 1, characterized in that: There are a plurality of nozzles, and the plurality of nozzles are distributed in a ring shape along the center of the base.

5. The cleaning device for a coating and developing machine according to claim 4, characterized in that: The plurality of spray pipes are arranged at equal intervals, and the distances between the water spraying ends of the plurality of spray pipes and the developing cover are equal.

6. The cleaning device for a coating and developing machine according to claim 4, characterized in that: Also includes: A water delivery trough, arranged on the base, in which cleaning liquid is delivered; as well as A water inlet and a plurality of water outlets are arranged on the water delivery trough, and a water inlet end of each of the spray pipes is connected to at least one of the water outlets.

7. The cleaning device for a coating and developing machine according to claim 6, characterized in that: It also includes an elastic sealing ring installed at the water outlet of the water delivery trough, and the outer surface of the water inlet end of the nozzle is movably connected to the water outlet of the water delivery trough through the elastic sealing ring.

8. The cleaning device for a coating and developing machine according to claim 1, characterized in that: The diameter of the water spraying end of the nozzle is smaller than the diameter of the water inlet end of the nozzle.

9. A glue coating and developing machine, characterized in that: include: Machine body; A rotating suction cup is installed on the machine body; A developing cover, surrounding the circumference of the rotating suction cup; A cleaning device, placed on the rotating suction cup; Wherein, the cleaning device comprises: A base, rotatably disposed on the coating and developing machine platform; A spray pipe is installed on the base, one end of which is a water inlet end and the other end is a water spray end, and the water spray end of the spray pipe is opposite to the developing cover; A chute is provided on the base, and the water inlet end of the nozzle is movably connected to the base, and the water spraying end of the nozzle slides in the chute; and An elastic telescopic member, movably connected between the base and the nozzle; Wherein, in the vertical direction, the two ends of the projection pattern of the slide groove have different heights.

10. The glue coating and developing machine according to claim 9, characterized in that: Also includes: A support member is mounted on the machine body, the support member surrounds the circumference of the rotating suction cup, and the base is at least partially placed on the support member; as well as The lifting device is installed on the machine body and drives the supporting member to rise or fall.

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