Ion beam polishing equipment

Abstract

The utility model relates to the technical field of polishing equipment, in particular to ion beam polishing equipment which comprises a vacuum bin and an ion source arranged on the top wall of the vacuum bin, a lifting cylinder is arranged in the vacuum bin in a lifting mode, the central axis of the lifting cylinder is vertically arranged, and a cooling bag ring is arranged at the bottom of the lifting cylinder. An ion beam emitted by the ion source sequentially penetrates through an inner hole of the lifting cylinder and an inner ring of the cooling bag ring to polish a workpiece below the lifting cylinder. The lifting assembly and the refrigerant circulating assembly are arranged on the vacuum bin, the lifting assembly is used for driving the lifting cylinder to ascend and descend, and the refrigerant circulating assembly is used for circularly conveying refrigerant media into the cooling capsule ring. The polishing device can prevent the situation that the machining quality of a workpiece is reduced due to the fact that the temperature of a polished part rises to a certain extent.

Description

Technical Field

[0001] The utility model relates to the technical field of polishing equipment, in particular to ion beam polishing equipment. Background Art

[0002] Ion beam polishing refers to accelerating and focusing the ion beam generated by the ion source under vacuum conditions and then hitting the workpiece surface to achieve removal processing. Electron beam processing relies on the conversion of kinetic energy into heat energy for processing, while ion beam processing relies on microscopic mechanical impact for processing.

[0003] Ion beam polishing equipment usually includes a vacuum chamber and an ion source. The workpiece to be processed is placed in the vacuum chamber, and the ion beam is emitted to the surface of the workpiece through the ion source to achieve ion beam polishing of the workpiece surface.

[0004] As an important processing technology, ion beam technology has been widely used in many fields. However, it also has some shortcomings, which we need to take seriously and find solutions to. For example: 1. The cost of ion beam processing is relatively high, and the cost is mainly reflected in the manufacturing, maintenance, and the large consumption of resources such as gas and electricity required; 2. The processing speed of ion beam processing is relatively slow. Since the ion beam needs to hit the surface of the workpiece one by one during the ion beam processing, the processing speed is slow; 3. The processing accuracy of ion beam processing has certain limitations; the processing accuracy of ion beam processing is mainly affected by the beam spot size and energy distribution of the ion beam; the smaller the beam spot, the higher the processing accuracy, but at the same time it will also reduce the processing efficiency; 4. The thermal effect and radiation effect generated during ion beam processing also need to be paid attention to; because during the ion beam processing, the ion beam collides with the workpiece surface, the energy generated will be converted into heat energy, resulting in an increase in the local temperature of the workpiece surface; this may cause thermal deformation and residual stress of the material, thereby affecting the processing quality. Utility Model Content

[0005] The utility model aims to provide an ion beam polishing device to solve the problem that the processing quality is easily reduced due to the increase of local temperature on the surface of the workpiece during the ion beam processing.

[0006] The utility model is realized by the following technical solutions:

[0007] An ion beam polishing equipment includes a vacuum chamber and an ion source arranged on the top wall of the vacuum chamber, a lifting cylinder is arranged inside the vacuum chamber for lifting, the central axis of the lifting cylinder is arranged vertically, and a cooling sac is arranged at the bottom of the lifting cylinder. The ion beam emitted by the ion source passes through the inner hole of the lifting cylinder and the inner circle of the cooling sac in turn to polish the workpiece under the lifting cylinder; it also includes a lifting component and a refrigerant circulation component arranged on the vacuum chamber, the lifting component is used to drive the lifting cylinder to lift, and the refrigerant circulation component is used to circulate the refrigerant medium into the cooling sac.

[0008] Furthermore, the cooling bag ring is made of elastic material.

[0009] Furthermore, an annular mounting groove is provided on the bottom end surface of the lifting cylinder of the outer ring of the cooling bag ring, and a plurality of springs are arranged in the mounting groove. Abutment cylinders are arranged at the lower ends of the plurality of springs, and the abutment cylinders coincide with the central axis of the lifting cylinder. The upper end of the abutment cylinder can extend into the mounting groove and slide in cooperation with the mounting groove.

[0010] Furthermore, the lifting assembly includes a cylinder and a guide rod, and the cylinder and the guide rod are both vertically arranged on the top wall of the vacuum chamber. A lifting plate is arranged on the outer wall of the lifting cylinder. The lower end of the cylinder is connected to the lifting plate, and the lower end of the guide rod passes through the lifting plate and slides with the lifting plate.

[0011] Furthermore, the refrigerant circulation component includes a refrigerant box and a circulation pump, both of which are arranged on the vacuum chamber, the refrigerant box is connected to the pump inlet end of the circulation pump through a pipeline, the pump outlet end of the circulation pump is connected to the cooling bag ring through a pipeline, and the cooling bag ring and the refrigerant box are connected through a pipeline.

[0012] Compared with the prior art, the utility model has the following advantages and beneficial effects:

[0013] In the utility model, the workpiece is placed in a vacuum chamber, and the ion beam emitted by the ion source passes through the inner hole of the lifting cylinder and the inner circle of the cooling sac ring in turn to perform ion beam polishing on the workpiece below. In the process of the ion beam hitting the workpiece, it is easy to cause the temperature of the polished part of the workpiece surface to rise. When the local temperature of the workpiece is too high, thermal deformation is likely to occur. At this time, the polishing can be suspended, and the lifting cylinder is driven down by the lifting component to make the cooling sac ring directly contact with the workpiece surface. The refrigerant medium is circulated to the inside of the cooling sac ring through the refrigerant circulation component, so that the surface temperature of the cooling sac ring is reduced, and the cooling sac ring and the workpiece surface are heat exchanged, thereby cooling the workpiece surface, which is beneficial to reducing the temperature of the workpiece surface and can reduce the situation where the processing quality of the workpiece surface is reduced due to the local high temperature. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] The drawings described herein are used to provide a further understanding of the embodiments of the present utility model, constitute a part of this application, and do not constitute a limitation of the embodiments of the present utility model.

[0015] In the attached picture:

[0016] Figure 1 It is a schematic diagram of the structure of the utility model;

[0017] Figure 2 For the utility model Figure 1 Enlarged view of part A in the middle.

[0018] Marks and corresponding parts names in the attached drawings:

[0019] 1. Vacuum chamber; 2. Ion source; 3. Lifting cylinder; 4. Cooling bag ring; 5. Mounting groove; 6. Spring; 7. Abutment cylinder; 8. Cylinder; 9. Guide rod; 10. Lifting plate; 11. Refrigerant box; 12. Circulation pump; 13. Workpiece. DETAILED DESCRIPTION

[0020] In order to make the purpose, technical solution and advantages of the utility model more clear, the utility model is further described in detail below in combination with the embodiments and drawings. The schematic implementation mode and description of the utility model are only used to explain the utility model and are not intended to limit the utility model. It should be noted that the utility model is already in the actual development and use stage.

[0021] Example 1

[0022] An ion beam polishing device, referring to Figure 1 , Figure 2 , including a vacuum chamber 1 and an ion source 2 arranged on the top wall of the vacuum chamber 1, a lifting cylinder 3 is arranged inside the vacuum chamber 1 for lifting, the central axis of the lifting cylinder 3 is arranged vertically, and a cooling sac 4 is arranged at the bottom of the lifting cylinder 3. The ion beam emitted by the ion source 2 passes through the inner hole of the lifting cylinder 3 and the inner circle of the cooling sac 4 in turn to polish the workpiece 13 below the lifting cylinder 3; it also includes a lifting component and a refrigerant circulation component arranged on the vacuum chamber 1, the lifting component is used to drive the lifting cylinder 3 to lift, and the refrigerant circulation component is used to circulate and transport the refrigerant medium into the cooling sac 4. Among them, the cooling sac 4 is made of elastic material, such as elastic rubber material such as silicone.

[0023] In this scheme, the workpiece 13 is placed in the vacuum chamber 1, and the ion beam emitted by the ion source 2 passes through the inner hole of the lifting cylinder 3 and the inner circle of the cooling sac ring 4 in turn to perform ion beam polishing on the workpiece 13 below. The ion beam hitting the workpiece 13 is likely to cause the temperature of the polished part of the surface of the workpiece 13 to rise. When the local temperature of the workpiece 13 is too high, thermal deformation is likely to occur. At this time, the polishing can be suspended, and the lifting cylinder 3 is driven down by the lifting assembly to make the cooling sac ring 4 directly contact with the surface of the workpiece 13. The refrigerant medium is circulated to the inside of the cooling sac ring 4 through the refrigerant circulation assembly, so that the surface temperature of the cooling sac ring 4 is reduced, and the cooling sac ring 4 and the surface of the workpiece 13 are heat exchanged, thereby cooling the surface of the workpiece 13, which is beneficial to reducing the temperature of the surface of the workpiece 13 and reducing the situation where the processing quality of the workpiece 13 is reduced due to the local high temperature. Furthermore, since the cooling capsule 4 is elastic, when the lifting cylinder 3 and the workpiece 13 squeeze the cooling capsule 4, the inner circle of the cooling capsule 4 will become smaller, that is, the contact area between the cooling capsule 4 and the workpiece 13 will increase, which facilitates the cooling capsule 4 to further approach the center position of the polished surface of the workpiece 13, which is beneficial to improve the cooling effect on the surface of the workpiece 13. Under the condition that the ion beam can pass through the cooling capsule 4, the ion beam polishing can also be continued, that is, the workpiece 13 can be ion-beam polished while the surface of the workpiece 13 is cooled by the cooling capsule 4.

[0024] Example 2

[0025] Based on Example 1, in this example, reference Figure 1 , Figure 2 A ring-shaped mounting groove 5 is provided on the bottom end surface of the lifting cylinder 3 of the outer ring of the cooling bag ring 4, and a plurality of springs 6 are arranged in the mounting groove 5. An abutment cylinder 7 is provided at the lower end of the plurality of springs 6. The abutment cylinder 7 coincides with the central axis of the lifting cylinder 3, and the upper end of the abutment cylinder 7 can extend into the mounting groove 5 and slide in cooperation with the mounting groove 5.

[0026] When the abutment tube 7 abuts against the workpiece 13, the upper end of the abutment tube 7 extends into the mounting groove 5. As the abutment tube 7 rises, the cooling bag ring 4 is always confined inside the abutment tube 7 by the abutment tube 7. After the cooling bag ring 4 is squeezed and deformed, the cooling bag ring 4 will deform toward its inner circle, which is beneficial to reduce the distance from the contact part between the cooling bag ring 4 and the workpiece 13 to the center of the polishing part, and is beneficial to increase the basic area between the cooling bag ring 4 and the workpiece 13, thereby helping to improve the cooling efficiency of the surface of the workpiece 13.

[0027] Example 3

[0028] Based on Example 1, in this example, reference Figure 1 , Figure 2The lifting assembly includes a cylinder 8 and a guide rod 9. The cylinder 8 and the guide rod 9 are both vertically arranged on the top wall of the vacuum chamber 1. The cylinder 8 and the guide rod 9 are parallel to each other. A lifting plate 10 is arranged on the outer wall of the lifting tube 3. The lower end of the cylinder 8 is connected to the lifting plate 10. The lower end of the guide rod 9 passes through the lifting plate 10 and slides with the lifting plate 10. After the ion source 2 polishes the surface of the workpiece 13 for a period of time, the surface temperature of the workpiece 13 may increase. At this time, the lifting plate 10 can be driven down by the cylinder 8. The lifting plate 10 descends along the guide rod 9, which facilitates the cooling bag ring 4 to be squeezed on the surface of the workpiece 13 and then cools the workpiece 13. It should be noted that the heating speed of the workpiece 13 made of different materials is different during the ion beam polishing process. For the workpiece 13 made of different materials, different time points can be selected to cool the workpiece 13.

[0029] Example 4

[0030] Based on Example 1, in this example, reference Figure 1 , Figure 2 The refrigerant circulation assembly includes a refrigerant box 11 and a circulation pump 12. The refrigerant box 11 and the circulation pump 12 are both arranged on the vacuum chamber 1. The refrigerant box 11 is connected to the pump inlet of the circulation pump 12 through a pipeline, and the pump outlet of the circulation pump 12 is connected to the cooling sac 4 through a pipeline. The cooling sac 4 and the refrigerant box 11 are connected through a pipeline. When the cooling sac 4 contacts the surface of the workpiece 13, the refrigerant in the refrigerant box 11 is transported into the cooling sac 4 through the circulation pump 12, and the refrigerant circulates between the refrigerant box 11, the circulation pump 12 and the cooling sac 4, so as to improve the heat exchange efficiency between the cooling sac 4 and the workpiece 13, thereby improving the cooling efficiency of the workpiece 13. Among them, the refrigerant in the refrigerant box 11 can be cold water close to zero degrees, and ice cubes can be placed in the refrigerant box 11 to keep the temperature of the refrigerant low.

[0031] The specific implementation methods described above further illustrate the purpose, technical solutions and beneficial effects of the utility model in detail. It should be understood that the above description is only the specific implementation method of the utility model and is not used to limit the protection scope of the utility model. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the utility model should be included in the protection scope of the utility model.

Claims

1. An ion beam polishing device, comprising a vacuum chamber (1) and an ion source (2) arranged on the top wall of the vacuum chamber (1), characterized in that: The vacuum chamber (1) is provided with a lifting cylinder (3) for lifting inside, the central axis of the lifting cylinder (3) is arranged vertically, and a cooling sac (4) is arranged at the bottom of the lifting cylinder (3). The ion beam emitted by the ion source (2) passes through the inner hole of the lifting cylinder (3) and the inner ring of the cooling sac (4) in turn, and then polishes the workpiece (13) below the lifting cylinder (3); it also includes a lifting component and a refrigerant circulation component arranged on the vacuum chamber (1), the lifting component is used to drive the lifting cylinder (3) to lift and lower, and the refrigerant circulation component is used to circulate and transport refrigerant medium into the cooling sac (4).

2. An ion beam polishing equipment according to claim 1, characterized in that: The cooling bag ring (4) is made of elastic material.

3. An ion beam polishing equipment according to claim 2, characterized in that: The bottom end surface of the lifting cylinder (3) of the outer ring of the cooling bag ring (4) is provided with an annular installation groove (5), and a plurality of springs (6) are arranged in the installation groove (5). The lower ends of the plurality of springs (6) are provided with abutment cylinders (7), and the abutment cylinders (7) coincide with the central axis of the lifting cylinder (3). The upper end of the abutment cylinder (7) can extend into the installation groove (5) and slide in cooperation with the installation groove (5).

4. The ion beam polishing equipment according to claim 1, characterized in that: The lifting assembly comprises a cylinder (8) and a guide rod (9), wherein the cylinder (8) and the guide rod (9) are both vertically arranged on the inner top wall of the vacuum chamber (1), and a lifting plate (10) is arranged on the outer wall of the lifting cylinder (3), wherein the lower end of the cylinder (8) is connected to the lifting plate (10), and the lower end of the guide rod (9) passes through the lifting plate (10) and then slides with the lifting plate (10).

5. The ion beam polishing equipment according to claim 1, characterized in that: The refrigerant circulation component includes a refrigerant box (11) and a circulation pump (12), and the refrigerant box (11) and the circulation pump (12) are both arranged on the vacuum chamber (1), the refrigerant box (11) and the pump inlet end of the circulation pump (12) are connected through a pipeline, the pump outlet end of the circulation pump (12) is connected to the cooling bag ring (4) through a pipeline, and the cooling bag ring (4) and the refrigerant box (11) are connected through a pipeline.

Images