CCD (Charge Coupled Device) adjusting mechanism system of rotating disc type photoetching machine
By designing a CCD adjustment mechanism system with a dual-guiding rail structure in a rotary lithography machine, the problem of cumbersome position adjustment in the prior art is solved, and rapid adjustment of CCD position and high-precision alignment are achieved.
Patent Information
- Application Number
- CN202421567556.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-04
- Publication Date
- 2025-04-22
- Estimated Expiration
- 2034-07-04
AI Technical Summary
The existing two sets of CCD position adjustment methods are prone to bias, affecting the alignment accuracy, and the locking process is cumbersome.
A CCD adjustment mechanism system for a rotary lithography machine is designed, and the guide rails are fixed in the X- and Y-directions of the dual-guiding rail structure are used to quickly adjust and lock the CCD components through the adjustment plate and spring mechanism.
It realizes rapid replacement and positioning of CCD positions, improves alignment accuracy and stability, simplifies the locking process, and is suitable for the production of 5-inch and 6-inch wafers.
Smart Images
Figure CN222784770U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of wafer manufacturing, and more specifically to a CCD adjustment mechanism system of a turntable type photolithography machine. Background Art
[0002] The wafer is manually placed on the exposure table, and the wafer and the lower mask are manually aligned according to the marks on the target points and the upper and lower masks on the wafer, guided by two sets of CCDs. When the requirements are met, the exposure table is rotated to the exposure position for exposure.
[0003] The existing two sets of CCD position adjustment are either through the XY fine adjustment platform with locking screws to lock the position, which is easy to cause deviation and affect the positioning accuracy. Or through the replacement and adjustment of specific parts to exchange and lock the position, which makes the locking complicated. Summary of the invention
[0004] The purpose of the utility model is to provide a CCD adjustment mechanism system for a turntable photolithography machine, so as to make wafer manufacturing more efficient and convenient, reduce customers' manufacturing costs, and improve customers' production efficiency to meet the increasingly rapid development of the market demand.
[0005] As a first aspect of the utility model, a CCD adjustment mechanism system of a turntable photolithography machine is provided, comprising a base plate, two groups of X-direction fixed guide rails are arranged on the base plate, two symmetrical CCD adjustment mechanisms are arranged on the X-direction fixed guide rails, each of the CCD adjustment mechanisms can realize X-direction adjustment and Y-direction adjustment of a CCD component, each of the CCD adjustment mechanisms comprises an X-direction fixed plate, the X-direction fixed plate is arranged on the X-direction fixed guide rail, two groups of Y-direction fixed guide rails are arranged on the X-direction fixed plate, the Y-direction fixed plate is arranged on the Y-direction fixed guide rail, and the Y-direction fixed plate is connected to a CCD to be adjusted through a camera connecting plate The CCD assembly to be adjusted is provided with a Y-direction adjustment fixing plate on the Y-direction fixing plate, and the Y-direction adjustment fixing plate can adjust the Y-direction fixing plate to move up and down along the Y-direction fixing rail to drive the CCD assembly to be adjusted to move in the Y direction; the X-direction fixing plate is provided with an X-direction adjustment fixing plate, and the X-direction adjustment fixing plate can adjust the X-direction fixing plate to move left and right along the X-direction fixing rail to drive the CCD assembly to be adjusted to move in the X direction; the adjustment pressure plate is arranged on the Y-direction adjustment fixing plate through a rotating shaft part, a spring is arranged on the upper front end of the adjustment pressure plate, and a damping part is arranged on the lower front end of the adjustment pressure plate.
[0006] Furthermore, the CCD component is a camera.
[0007] Furthermore, the two groups of X-direction fixed guide rails are fixed on the bottom plate by screws.
[0008] Furthermore, the two groups of the Y-direction fixed guide rails are fixed on the X-direction fixed plate by screws.
[0009] The CCD adjustment mechanism system of the turntable photolithography machine provided by the utility model has the following advantages:
[0010] (1) The CCD adjustment mechanism system can quickly change the CCD position;
[0011] (2) The CCD adjustment mechanism system can quickly position;
[0012] (3) The CCD adjustment mechanism has high system stability. The mechanism adopts double guide rails with high rigidity and no vibration, which will not affect the positioning accuracy.
[0013] (4) The two groups of CCD adjustment mechanism system have X and Y direction adjustments respectively;
[0014] (5) The CCD adjustment mechanism system has a large adjustment stroke, which can realize the production of 5-inch and 6-inch wafers. BRIEF DESCRIPTION OF THE DRAWINGS
[0015] The accompanying drawings are used to provide a further understanding of the present invention and constitute a part of the specification. Together with the following specific embodiments, they are used to explain the present invention, but do not constitute a limitation to the present invention.
[0016] Figure 1 This is a front view of the CCD adjustment mechanism system of the turntable photolithography machine provided by the utility model.
[0017] Figure 2 This is a top view of the CCD adjustment mechanism system of the turntable photolithography machine provided by the utility model.
[0018] Figure 3 This is a schematic diagram of the installation position of the adjusting pressure plate provided by the utility model.
[0019] In the figure: 1-CCD assembly; 2-Y direction adjustment fixing plate; 3-adjustment pressure plate; 4-X direction fixing plate; 5-Y direction fixing plate; 6-Y direction fixing rail; 7-camera connecting plate; 8-damping part; 9-spring; 10-X direction fixing rail; 11-bottom plate; 12-rotating shaft part; 13-X direction adjustment fixing plate. DETAILED DESCRIPTION
[0020] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined purpose of the utility model, the specific implementation method, structure, characteristics and effects of the CCD adjustment mechanism system of the turntable lithography machine proposed by the present invention are described in detail below in combination with the accompanying drawings and preferred embodiments. Obviously, the described embodiments are part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work belong to the protection scope of the present invention.
[0021] It should be noted that the terms "first", "second", etc. in the specification and claims of the utility model and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged where appropriate, so as to describe the embodiments of the utility model described here. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device that includes a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.
[0022] In the interpretation of the present invention, it should be noted that the terms "installed", "connected" and "connected" should be understood in a broad sense unless otherwise specified. For example, the connection can be a fixed connection, or it can be connected through a special interface, or it can be indirectly connected through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0023] In this embodiment, a CCD adjustment mechanism system of a rotating disk lithography machine is provided. Figure 1-3As shown, the CCD adjustment mechanism system of the turntable lithography machine includes a base plate 11, on which two groups of X-direction fixed guide rails 10 are arranged, and on which two symmetrical CCD adjustment mechanisms are arranged, each of which can realize X-direction adjustment and Y-direction adjustment of a CCD component, and each of which includes an X-direction fixed plate 4, which is arranged on the X-direction fixed guide rail 10, two groups of Y-direction fixed guide rails 6 are arranged on the X-direction fixed plate 4, and a Y-direction fixed plate 5 is arranged on the Y-direction fixed guide rail 6, and the Y-direction fixed plate 5 is connected to the CCD component 1 to be adjusted through a camera connecting plate 7, and the Y-direction fixed plate 5 is connected to the CCD component 1 to be adjusted through a camera connecting plate 7. A Y-direction adjustment fixing plate 2 is arranged on the fixed plate 5, and the Y-direction adjustment fixing plate 2 can adjust the Y-direction fixing plate 5 to move up and down along the Y-direction fixed guide rail 6, so as to drive the CCD assembly 1 to be adjusted to move in the Y direction; an X-direction adjustment fixing plate 13 is arranged on the X-direction fixing plate 4, and the X-direction adjustment fixing plate 13 can adjust the X-direction fixing plate 4 to move left and right along the X-direction fixed guide rail 10, so as to drive the CCD assembly 1 to be adjusted to move in the X direction; an adjustment pressure plate 3 is arranged on the Y-direction adjustment fixing plate 2 through a rotating shaft part 12, a spring 9 is arranged on the upper front end of the adjustment pressure plate 3, and a damping part 8 is arranged on the lower front end of the adjustment pressure plate 3.
[0024] Preferably, the CCD component 1 is a camera.
[0025] Preferably, the two groups of X-direction fixed guide rails 10 are fixed on the bottom plate 11 by screws.
[0026] Preferably, the two groups of the Y-direction fixed guide rails 6 are fixed on the X-direction fixed plate 4 by screws.
[0027] The CCD adjustment mechanism system of the turntable photolithography machine provided by the utility model has the following working principle:
[0028] Before wafer exposure, install the lower mask first. There are two sets of alignment marks on the lower mask so that the marks can be seen on the middle of the display of the whole machine for the symmetrical CCD components on both sides. The CCD adjustment mechanism on the left is used as an example to illustrate.
[0029] When adjusting the X direction of the CCD component 1, manually press the adjustment plate 3, rotate the compression spring 9 through the shaft part 12, and synchronously make the adjustment plate 3 separate from the bottom plate 11 by a certain gap, so that the X direction movement of the CCD component 1 can be realized. After completion, release the adjustment plate 3 to realize the X direction locking of the CCD component 1, that is, the X direction adjustment of the CCD component 1 is realized.
[0030] When adjusting the Y direction of the CCD component 1, manually press the adjustment plate 3, rotate the compression spring 9 through the shaft part 12, and synchronously make the adjustment plate 3 disengage from the X-direction fixed plate 4 by a certain gap, so that the Y direction movement of the CCD component 1 can be achieved. After completion, release the adjustment plate 3 to achieve the Y direction locking of the CCD component 1, that is, the Y direction adjustment of the CCD component 1 is achieved.
[0031] It should be noted that the Y-direction fixed guide rail 6 and the X-direction fixed guide rail 10 of the CCD component 1 both adopt a double-guide rail structure to ensure that the CCD component 1 captures the alignment mark image without vibration and offset, thereby ensuring the plate making accuracy.
[0032] It should be understood that the CCD adjustment mechanism system of the turntable lithography machine provided by the present invention captures the alignment of the mask and the wafer target through two groups of CCD components to complete the entire wafer exposure process.
[0033] The CCD adjustment mechanism system of the turntable photolithography machine provided by the utility model has the following advantages: (1) the CCD adjustment mechanism system can quickly change the position of the CCD; (2) the CCD adjustment mechanism system can quickly locate; (3) the CCD adjustment mechanism system has high stability, and the mechanism adopts double guide rails with high rigidity and no vibration, which will not affect the positioning accuracy; (4) the two groups of mechanisms of the CCD adjustment mechanism system are respectively adjustable in the X and Y directions; (5) the CCD adjustment mechanism system has a large adjustment stroke, and can realize the production of 5-inch and 6-inch wafers.
[0034] The above description is only a preferred embodiment of the present invention, and does not constitute any form of limitation to the present invention. Although the present invention has been disclosed as a preferred embodiment as above, it is not intended to limit the present invention. Any technician familiar with the profession can make some changes or modifications to equivalent embodiments of equivalent changes using the technical contents disclosed above without departing from the scope of the technical solution of the present invention. However, any simple modification, equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solution of the present invention are still within the scope of the technical solution of the present invention.
Claims
1. A CCD adjustment mechanism system for a turntable lithography machine, characterized in that: The invention comprises a bottom plate (11), wherein two groups of X-direction fixed guide rails (10) are arranged on the bottom plate (11), and two symmetrical CCD adjustment mechanisms are arranged on the X-direction fixed guide rails (10), and each of the CCD adjustment mechanisms can realize X-direction adjustment and Y-direction adjustment of a CCD component, and each of the CCD adjustment mechanisms comprises an X-direction fixed plate (4), wherein the X-direction fixed plate (4) is arranged on the X-direction fixed guide rail (10), two groups of Y-direction fixed guide rails (6) are arranged on the X-direction fixed plate (4), and a Y-direction fixed plate (5) is arranged on the Y-direction fixed guide rail (6), wherein the Y-direction fixed plate (5) is connected to the CCD component (1) to be adjusted via a camera connecting plate (7), and the Y-direction fixed plate (5) is provided with a Y-direction adjustment mechanism. The fixed plate (2) is capable of adjusting the Y-direction fixing plate (2) to move the Y-direction fixing plate (5) up and down along the Y-direction fixing rail (6) to drive the CCD assembly (1) to be adjusted to move in the Y-direction; the X-direction fixing plate (4) is provided with an X-direction adjusting fixing plate (13) to adjust the X-direction fixing plate (4) to move left and right along the X-direction fixing rail (10) to drive the CCD assembly (1) to be adjusted to move in the X-direction; the adjusting pressure plate (3) is arranged on the Y-direction adjusting fixing plate (2) via a rotating shaft part (12); a spring (9) is arranged on the upper front end of the adjusting pressure plate (3); and a damping part (8) is arranged on the lower front end of the adjusting pressure plate (3).
2. The CCD adjustment mechanism system of a rotating disk lithography machine according to claim 1, characterized in that: The CCD component (1) is a camera.
3. The CCD adjustment mechanism system of a rotating disk lithography machine according to claim 1, characterized in that: The two sets of X-direction fixed guide rails (10) are fixed on the bottom plate (11) by means of screws.
4. The CCD adjustment mechanism system of a rotating disk lithography machine according to claim 1, characterized in that: The two sets of Y-direction fixed guide rails (6) are fixed on the X-direction fixed plate (4) by means of screws.