Semiconductor cleaning tank

Abstract

The utility model relates to the field of semiconductor cleaning, and discloses a semiconductor cleaning tank which comprises a cleaning box, a driving mechanism is arranged on the outer wall of the cleaning box through a support, a fixing block is fixedly connected to the outer wall of the driving mechanism, an extrusion plate is in contact with the outer wall of the fixing block, and a connecting frame is fixedly connected to the outer wall of the extrusion plate. A cleaning frame is fixedly connected to the bottom end of the connecting frame, round holes are formed in the outer wall of the cleaning frame, a guide plate is fixedly connected to the top end of the cleaning box, a circulating pipe is arranged on the side wall of the left end of the cleaning box, and a supporting plate is fixedly connected to the inner wall of the cleaning box. According to the semiconductor material cleaning device, the rotating disc drives the fixing block to rotate continuously, the fixing block is used for extruding the extruding plate to enable the extruding plate to drive the connecting frame and the cleaning frame to move left and right continuously, cleaning water penetrates through the round holes to impact semiconductor materials, impurities on the semiconductor materials are made to fall off from the semiconductor materials more easily, and the cleaning efficiency is improved to a certain degree.

Description

Technical Field

[0001] The utility model relates to the field of semiconductor cleaning, in particular to a semiconductor cleaning tank. Background Art

[0002] A semiconductor is a material whose electrical conductivity is between that of a conductor and an insulator. Semiconductors are widely used in electronics and optoelectronics, including integrated circuits, optoelectronic devices, solar cells, etc. During semiconductor processing, a cleaning device is required to help ensure the electrical performance, structural integrity and long-term stability of the device.

[0003] After searching, the Chinese patent announcement number: CN217369547U discloses a cleaning tank for cleaning semiconductors, including a water tank and a cleaning tank frame, the cleaning tank frame is fixedly connected to the middle position of the upper end of the water tank, the side wall of the water tank is fixedly connected to a circulating water pump, the circulating water pump is fixedly connected to a suction pipe and a drain pipe, the suction pipe is located at the bottom of the water tank at one end away from the circulating water pump, the drain pipe is fixedly connected to the side wall of the cleaning tank frame at one end away from the circulating water pump, and a cleaning mechanism is arranged in the cleaning tank frame. The beneficial effect achieved by the utility model is: the circulating water pump is used to make the water in the water tank flow continuously in the cleaning tank frame, and the cleaned precipitates will be collected in the collecting tank on the collecting plate, which not only ensures that the semiconductor can be cleaned, but also facilitates the cleaning of the cleaned precipitates.

[0004] In the prior art, although the device can clean the semiconductor by water flow, in the actual cleaning process, due to impurities adhering to the surface of the semiconductor, the efficiency of cleaning by water flow is low and the cleaning efficiency cannot be further improved. Therefore, a semiconductor cleaning tank is proposed to solve the above problems. Utility Model Content

[0005] In order to make up for the above shortcomings, the utility model provides a semiconductor cleaning tank, aiming to improve the problem that the efficiency of semiconductor cleaning cannot be further improved in the prior art.

[0006] In order to achieve the above-mentioned purpose, the utility model adopts the following technical scheme: a semiconductor cleaning tank, comprising a cleaning box, the outer wall of the cleaning box is provided with a driving mechanism through a bracket, the outer wall of the driving mechanism is fixedly connected with a fixed block, the outer wall of the fixed block contacts with an extrusion plate, the outer wall of the extrusion plate is fixedly connected with a connecting frame, the bottom end of the connecting frame is fixedly connected with a cleaning frame, the outer wall of the cleaning frame is provided with a circular hole, the top end of the cleaning box is fixedly connected with a guide plate, the left end side wall of the cleaning box is provided with a circulation pipe, and the inner wall of the cleaning box is fixedly connected with a support plate.

[0007] As a further description of the above technical solution:

[0008] The inner wall of the cleaning box is fixedly connected with a support frame, the inner wall of the support frame is plugged with a filter frame, the inner wall of the cleaning box is elastically connected with a stopper via a torsion spring, and the outer wall of the filter frame is provided with a rubber block.

[0009] As a further description of the above technical solution:

[0010] The inner wall of the cleaning box is fixedly connected to one end of the torsion spring, and the other end of the torsion spring is fixedly connected to the outer wall of the stopper.

[0011] As a further description of the above technical solution:

[0012] The stopper is rotatably connected to the inner wall of the cleaning box, and the inner side wall of the stopper contacts the side wall of the filter frame.

[0013] As a further description of the above technical solution:

[0014] The filter frame penetrates through and is plugged into the inner wall of the cleaning box.

[0015] As a further description of the above technical solution:

[0016] The connecting frame penetrates through and is slidably connected to the inner wall of the guide plate.

[0017] As a further description of the above technical solution:

[0018] The driving mechanism comprises a motor, an output end of the motor is fixedly connected with a rotating disk, and an outer wall of the rotating disk is fixedly connected with the end of a fixing block.

[0019] As a further description of the above technical solution:

[0020] The cleaning frame contacts the top end of the supporting plate.

[0021] The utility model has the following beneficial effects:

[0022] 1. In the utility model, the rotating disk drives the fixed block to rotate continuously, and the fixed block is used to squeeze the extrusion plate so that the extrusion plate drives the connecting frame and the cleaning frame to move left and right continuously, so that the cleaning water passes through the circular hole to impact the semiconductor material, making it easier for impurities on the semiconductor material to fall off, thereby improving the cleaning efficiency to a certain extent.

[0023] 2. In the utility model, impurities are uniformly collected through the filter net on the filter frame, and the filter net on the entire filter frame can be quickly disassembled and cleaned by using a stopper that is in contact or not in contact with the filter frame. It is simple and convenient in actual operation and is convenient for subsequent continuous cleaning and processing. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 This is an overall three-dimensional schematic diagram of a cleaning box of a semiconductor cleaning tank proposed by the utility model;

[0025] Figure 2 This is a schematic diagram showing the overall structure of a cleaning frame of a semiconductor cleaning tank proposed by the utility model;

[0026] Figure 3 The utility model is a schematic overall cross-sectional view of a cleaning box of a semiconductor cleaning tank.

[0027] Legend:

[0028] 1. Cleaning box; 2. Motor; 3. Turntable; 4. Fixed block; 5. Extrusion plate; 6. Connecting frame; 7. Cleaning frame; 8. Round hole; 9. Guide plate; 10. Circulation pipe; 11. Support plate; 12. Support frame; 13. Filter frame; 14. Torsion spring; 15. Stopper; 16. Rubber block. DETAILED DESCRIPTION

[0029] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0030] Reference Figure 1-Figure 2 The utility model provides an embodiment: a semiconductor cleaning tank, comprising a cleaning box 1, the outer wall of the cleaning box 1 is provided with a driving mechanism through a bracket, the outer wall of the driving mechanism is fixedly connected with a fixing block 4, the outer wall of the fixing block 4 contacts with an extrusion plate 5, the middle part of the extrusion plate 5 is provided with a slot in which the fixing block 4 can slide, so that the fixing block 4 can produce an extrusion movement on the extrusion plate 5, the outer wall of the extrusion plate 5 is fixedly connected with a connecting frame 6, the bottom end of the connecting frame 6 is fixedly connected with a cleaning frame 7, the semiconductor material can be placed in the cleaning frame 7 for subsequent cleaning, and the outer wall of the cleaning frame 7 is provided with a circular hole 8. There are multiple circular holes 8, which can allow cleaning water to flow in and out from the circular holes 8. A guide plate 9 is fixedly connected to the top of the cleaning box 1. The guide plate 9 can allow the connecting frame 6 to move horizontally, and the moving trajectory will not be offset. A circulation pipe 10 is set on the left side wall of the cleaning box 1. The circulation pipe 10 can repeatedly transport the water filtered from the bottom of the cleaning box 1 to the upper part of the cleaning box 1 to re-clean the semiconductor material. A support plate 11 is fixedly connected to the inner wall of the cleaning box 1. The support plate 11 can allow the cleaning frame 7 to move horizontally along the support plate 11, and can support the cleaning frame 7 as a whole.

[0031] Reference Figure 3The inner wall of the cleaning box 1 is fixedly connected with a support frame 12, and a filter frame 13 is inserted on the inner wall of the support frame 12. There is a filter screen on the filter frame 13, and impurities are blocked and collected through the filter screen, which is convenient for subsequent unified processing. The inner wall of the cleaning box 1 is elastically connected with a stopper 15 through a torsion spring 14, and the outer wall of the filter frame 13 is provided with a rubber block 16. The rubber block 16 is made of rubber material and can produce a large deformation. The rubber block 16 contacts the inner wall of the cleaning box 1, so that the entire filter frame 13 and the cleaning box 1 are sealed. The cleaning water will not flow out of the filter frame 13 because of the effect. The inner wall of the cleaning box 1 is fixedly connected to one end of the torsion spring 14. At this time, the torsion spring 14 is in the initial state. When the stopper 15 rotates, the torsion spring 14 is compressed. When resetting, the stopper 15 is reset with the elastic force of the torsion spring 14. The other end of the torsion spring 14 is fixedly connected to the outer wall of the stopper 15. The stopper 15 is rotatably connected to the inner wall of the cleaning box 1. The inner side wall of the stopper 15 contacts the side wall of the filter frame 13. The filter frame 13 penetrates and is plugged into the inner wall of the cleaning box 1.

[0032] Reference Figure 1-Figure 2 The connecting frame 6 passes through and is slidably connected to the inner wall of the guide plate 9. The driving mechanism includes a motor 2. The output end of the motor 2 is fixedly connected to the turntable 3. The motor 2 is used to rotate the turntable 3, so that the fixed block 4 continuously squeezes the squeezing plate 5 to move during rotation. The outer wall of the turntable 3 is fixedly connected to the end of the fixed block 4, and the cleaning frame 7 is in contact with the top of the support plate 11.

[0033] Working principle: First, when cleaning the semiconductor material, just pour the semiconductor material into the cleaning frame 7, then start the motor 2 to let the output end of the motor 2 drive the turntable 3 to rotate, let the turntable 3 drive the fixed block 4 to continuously rotate and squeeze the inner wall of the extrusion plate 5, let the extrusion plate 5 drive the connecting frame 6 and the cleaning frame 7 to move left and right along the top of the support plate 11, and the cleaning water passes through the circular hole 8 to continuously flush the semiconductor material in the cleaning frame 7, so that the impurities on the semiconductor flow out from the circular hole 8, and let the impurities fall on the filter net of the filter frame 13. During the cleaning process, the filtered cleaning water is reused through the circulation pipe 10 to improve the overall cleaning efficiency. When the semiconductor material needs to be cleaned and taken out, it is only necessary to discharge the cleaning water in the cleaning box 1 through the existing technology, and then take out the semiconductor material from the cleaning frame 7.

[0034] When it is necessary to clean the impurities on the filter screen of the filter frame 13, it is only necessary to rotate the stopper 15 and compress the torsion spring 14 so that the stopper 15 no longer blocks the filter frame 13, and then the filter frame 13 can be pulled out from the inner wall of the support frame 12 and the cleaning box 1 for cleaning. When it is necessary to reinstall the filter frame 13, it is only necessary to insert the filter frame 13 from the inner wall of the support frame 12 and the cleaning box 1. After it is fully inserted, release the stopper 15 and use the reverse elastic force of the torsion spring 14 to flip and reset the stopper 15, so that the stopper 15 blocks the side wall of the filter frame 13 and cannot be moved out.

[0035] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A semiconductor cleaning tank, comprising a cleaning box (1), characterized in that: The outer wall of the cleaning box (1) is provided with a driving mechanism through a bracket, the outer wall of the driving mechanism is fixedly connected to a fixing block (4), the outer wall of the fixing block (4) contacts an extrusion plate (5), the outer wall of the extrusion plate (5) is fixedly connected to a connecting frame (6), the bottom end of the connecting frame (6) is fixedly connected to a cleaning frame (7), the outer wall of the cleaning frame (7) is provided with a circular hole (8), the top end of the cleaning box (1) is fixedly connected to a guide plate (9), the left end side wall of the cleaning box (1) is provided with a circulation pipe (10), and the inner wall of the cleaning box (1) is fixedly connected to a support plate (11).

2. A semiconductor cleaning tank according to claim 1, characterized in that: The inner wall of the cleaning box (1) is fixedly connected to a support frame (12), the inner wall of the support frame (12) is plugged with a filter frame (13), the inner wall of the cleaning box (1) is elastically connected to a stopper (15) via a torsion spring (14), and the outer wall of the filter frame (13) is provided with a rubber block (16).

3. A semiconductor cleaning tank according to claim 2, characterized in that: The inner wall of the cleaning box (1) is fixedly connected to one end of a torsion spring (14), and the other end of the torsion spring (14) is fixedly connected to the outer wall of the stopper (15).

4. A semiconductor cleaning tank according to claim 2, characterized in that: The stopper (15) is rotatably connected to the inner wall of the cleaning box (1), and the inner side wall of the stopper (15) is in contact with the side wall of the filter frame (13).

5. A semiconductor cleaning tank according to claim 2, characterized in that: The filter frame (13) penetrates through and is plugged into the inner wall of the cleaning box (1).

6. A semiconductor cleaning tank according to claim 1, characterized in that: The connecting frame (6) penetrates through and is slidably connected to the inner wall of the guide plate (9).

7. A semiconductor cleaning tank according to claim 1, characterized in that: The driving mechanism comprises a motor (2), the output end of the motor (2) is fixedly connected to a rotating disk (3), and the outer wall of the rotating disk (3) is fixedly connected to the end of a fixed block (4).

8. A semiconductor cleaning tank according to claim 1, characterized in that: The cleaning frame (7) is in contact with the top end of the support plate (11).

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