Positioning tool for flow sensor machining

Abstract

The utility model belongs to the technical field of machining tools, and particularly discloses a positioning tool for machining a flow sensor, which is used for solving the problems that the transfer is unstable in the wafer machining process and the concentric arrangement of wafers and a thinning table cannot be ensured after the transfer, so that the uniformity of contact surfaces between each wafer and a grinding wheel millstone cannot be determined, and the machining accuracy is poor. And finally, wafer finished products with uniform flatness cannot be formed. Comprising centering mechanisms symmetrically arranged on the two sides of a tray. According to the wafer centering device, the centering mechanisms symmetrically arranged on the two sides can be used for completing pre-centering and secondary centering operation on wafers, it can be guaranteed that the wafers are centered after being stably positioned and clamped in the thinning production process, therefore, the contact faces between the wafers and a grinding wheel grinding disc are unified, and finally wafer finished products with the unified flatness are formed; and a self-positioning structure in the moving process of the driving assembly can be used for achieving the same-direction rotation of the elastic supporting ring to complete positioning and centering, and the stability maintaining effect on the positioning and centering is achieved.

Description

Technical Field

[0001] The utility model relates to the technical field of processing tooling, in particular to a positioning tooling for processing a flow sensor. Background Art

[0002] A sensor is a device that converts the sensed or measured physical quantity into an electrical signal that can be processed by a digital circuit or an analog circuit. The production process of a sensor mainly includes sensor chip manufacturing, packaging, and assembly testing. Sensor chips are usually made of semiconductor materials, and their manufacturing process includes wafer manufacturing, lithography, diffusion, ion implantation, thin film deposition, etching, and etching. Packaging is another important part of the sensor production process. Sensor chips usually need to be packaged to protect their internal structure and ensure their stability and reliability. The main purpose of packaging is to connect the sensor chip to the leads and protect the chip with a shell.

[0003] In the prior art, a sensor positioning tooling with a publication number of CN220533983U can realize the positioning of sensors of different shapes. However, for the same production line, it is particularly important to ensure the stability of the wafer when it is transferred between adjacent processes and the accurate placement after the transfer. For example, after the cleaned wafer is moved to the thinning table during thinning production, it is impossible to ensure that the wafer and the thinning table are concentrically arranged, and thus it is impossible to ensure that the contact surface between each wafer and the grinding wheel is uniform, and ultimately a wafer product with uniform flatness cannot be formed, which affects the processing quality;

[0004] In view of the above technical defects, a solution is now proposed. Utility Model Content

[0005] The purpose of the utility model is to provide a positioning tool for flow sensor processing, so as to solve the problem that the transfer of wafers in the processing process is unstable and the concentric setting of the wafers and the thinning table cannot be ensured after the transfer, and further the contact surface between each wafer and the grinding wheel cannot be determined to be uniform, and finally a finished wafer with uniform flatness cannot be formed.

[0006] The purpose of the utility model can be achieved through the following technical solutions: a positioning tool for processing a flow sensor, comprising a centering mechanism symmetrically arranged on both sides of a tray, a flip frame connected to a mechanical arm is arranged above the tray, the centering mechanism comprises a centering seat 1 and a centering seat 2 arranged in sequence, an arc platform is provided on the concave side of the centering seat 1 and the centering seat 2, a bevel is provided on the inner ring side of the centering seat 1 and the centering seat 2 close to the arc platform, and an elastic support ring extending to the surface of the arc platform is embedded in the corresponding bevel of the centering seat 1 and the centering seat 2; an arc rail is installed on the outer side of the centering seat 1 and the centering seat 2, and a driving component for the deflection and displacement of the centering seat 1 and the centering seat 2 is installed on the arc rail.

[0007] Preferably, the driving assembly includes a guide block slidably disposed in the arc track, an electric push rod is installed outside the guide block, and a connecting frame fixedly connected to the outer sides of the centering seat 1 and the centering seat 2 is installed at the output end of the electric push rod.

[0008] Preferably, a steering seat 1 and a steering seat 2 are respectively installed at the middle position of the bottom of the centering seat 1 and the centering seat 2, a guide rail 1 matching the steering seat 1 is arranged below the centering seat 1, and a guide rail 2 matching the steering seat 2 is arranged below the centering seat 2.

[0009] Preferably, the upper and lower ends of the arc track are respectively provided with slot hole 1 and slot hole 2 corresponding to the guide block, and the interiors of the steering seat 1 and the steering seat 2 are provided with self-driving wheels which are frictionally and rollingly connected with the guide rails 1 and 2.

[0010] Preferably, the flip frame is in a "U" shape and has suction cups for adsorbing wafers at both ends, and a rotating rod connected to the output end of the motor is installed in the middle of the lower bottom of the tray.

[0011] Preferably, the elastic support ring is an open waist-shaped structural spring piece, and the end of the elastic support ring extending above the arc platform is provided with a guide edge, and the guide edge has the same inclination angle as the hypotenuse.

[0012] Beneficial effects of the utility model:

[0013] (1) The utility model determines the size of the processed wafer and then selects the centering seat 1 or the centering seat 2 for centering. The centering sequence is as follows: start the electric push rods, and the two electric push rods drive the centering seat 1 or the centering seat 2 to move toward each other through the connecting frame until the bottom side of the elastic support ring contacts the wafer, and the uncentered wafer is subjected to a continuously corrected deflection effect, and the elastic support rings on both sides complete the corrective centering of the uncentered wafer on the tray; by setting the centering seat 1 or the centering seat 2 on both sides, the wafer is pre-centered immediately after transfer, and then assisted by the centering seat 1 or the centering seat 2 rotating in the same direction, the wafer to be thinned is completely centered. The entire positioning and centering process is continuous and suitable for wafers of various specifications to complete the entire thinning production process, and obtain a finished wafer with uniform flatness;

[0014] (2) The centering is completed by the same-direction rotation of two sets of elastic support rings. During the centering process, the arc-shaped guidance is completed by guide rail one or guide rail two, and the axial rotation and swing are carried out with the center of the circle of guide rail one or guide rail two as the vertical line. At this time, the electric push rod and the connecting frame are driven by the guide block to move in the arc track to ensure the stability of the centering operation, realize the same-direction rotation of the elastic support ring to complete the positioning and centering, and have a stabilizing effect on the above-mentioned positioning and centering. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The utility model is further described below in conjunction with the accompanying drawings;

[0016] Figure 1 It is a structural stereogram of the entire utility model;

[0017] Figure 2 It is a schematic diagram of the structure of the utility model when viewed from above;

[0018] Figure 3 It is a partial structural schematic diagram of the centering mechanism of the utility model;

[0019] Figure 4 It is a front view schematic diagram of a partial structure of the utility model;

[0020] Figure 5 It is a top view of the utility model.

[0021] Legend: 1. Tray; 2. Centering seat 1; 3. Centering seat 2; 4. Arc rail; 5. Slot hole 1; 6. Slot hole 2; 7. Turning frame; 8. Turning rod; 9. Guide rail 1; 10. Guide rail 2; 11. Steering seat 1; 12. Steering seat 2; 13. Connecting frame; 14. Electric push rod; 15. Bevel edge; 16. Elastic support ring; 17. Guide edge; 18. Arc table; 19. Guide block. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0023] Embodiment 1: This embodiment is used to solve the problem of unstable transfer during wafer processing and the inability to ensure that the wafer and the thinning table are set concentrically after transfer, and thus the inability to ensure that the contact surfaces between each wafer and the grinding wheel are uniform, ultimately failing to form finished wafers with uniform flatness.

[0024] See also Figure 1 - Figure 5As shown, this embodiment is a positioning tool for processing a flow sensor, including a centering mechanism symmetrically arranged on both sides of a tray 1, a flip frame 7 connected to a robot arm is arranged above the tray 1, and the centering mechanism includes a centering seat 1 2 and a centering seat 2 3 arranged in sequence, an arc platform 18 is provided on the inner concave side of the centering seat 1 2 and the centering seat 2 3, and a bevel 15 is provided on the inner ring side of the centering seat 1 2 and the centering seat 2 3 close to the arc platform 18, and an elastic support ring 16 extending toward the surface of the arc platform 18 is embedded in the centering seat 1 2 and the centering seat 2 3 corresponding to the bevel 15; an arc rail 4 is installed on the outer side of the centering seat 1 2 and the centering seat 2 3, and a driving component for the deflection displacement of the centering seat 1 2 and the centering seat 2 3 is installed on the arc rail 4;

[0025] The upper and lower ends of the arc track 4 are respectively provided with a slot hole 15 and a slot hole 2 6 corresponding to the guide block 19. The interior of the steering seat 11 and the steering seat 2 12 is provided with a self-driving wheel that is frictionally and rollingly connected with the guide rail 1 9 and the guide rail 2 10. The guide rail 1 9 or the guide rail 2 10 is fixed to the external structure. When the self-driving wheel is started, it drives the centering seat 1 2 and the centering seat 2 3 to complete the swing.

[0026] The flip frame 7 is in a "U" shape and has suction cups for adsorbing wafers at both ends. A rotating rod 8 connected to the output end of the motor is installed in the middle of the bottom of the tray 1. The elastic support ring 16 is an open waist-shaped spring. The end of the elastic support ring 16 extending above the arc platform 18 is provided with a guide edge 17, and the guide edge 17 has the same inclination angle as the bevel edge 15.

[0027] See also Figure 1 and Figure 5 As shown, in order to ensure the uniformity of the contact surface between the wafer and the grinding wheel, it is necessary to first ensure the uniformity of the contact surface between the wafer and the tray 1. The wafer is adsorbed and transferred to the top of the tray 1 by driving the flip rack 7 by the manipulator in advance, and the wafer is loosened onto the tray 1 by degassing;

[0028] Basic principle: Determine the size of the processed wafer and select the centering seat 1 2 or the centering seat 2 3 for centering. The centering sequence is as follows: start the electric push rod 14, and the two electric push rods 14 drive the centering seat 1 2 or the centering seat 2 3 to move toward each other through the connecting frame 13 until the bottom side of the elastic support ring 16 contacts the wafer. At this time, the bilaterally symmetrical elastic support ring 16 can effectively complete the clamping and positioning of the wafer;

[0029] When the wafer is centered after clamping and positioning: the self-driving wheel embedded in the steering seat 11 or the steering seat 2 12 is started, and the self-driving wheel rotates and moves in the arc direction outside the guide rail 1 9 or the guide rail 2 10, and the self-driving wheels on both sides rotate in opposite directions, thereby realizing a dynamic trajectory in which the two sets of centering seats 1 2 or centering seats 2 3 rotate in the same direction, and the uncentered wafer is subjected to a deflection effect of continuous correction, and the elastic support rings 16 on both sides complete the correction and centering of the uncentered wafer on the tray 1;

[0030] Principles and advantages: In summary, for the thinning production of wafers, the centering seat 1 2 or the centering seat 2 3 arranged on both sides can enable the wafers to be pre-centered immediately after transfer, and then assisted by the centering seat 1 2 or the centering seat 2 3 rotating in the same direction, the wafers to be thinned can be completely centered. The entire positioning and centering process is continuous and suitable for wafers of various specifications to complete the entire thinning production process, and obtain finished wafers with uniform flatness.

[0031] Embodiment 2: This embodiment is used to solve the problem of how to ensure the self-positioning of the driving component in embodiment 1.

[0032] See also Figure 2 , Figure 4 - Figure 5 As shown, a positioning tool for processing a flow sensor in this embodiment includes a driving assembly including a guide block 19 slidably arranged in an arc track 4, an electric push rod 14 is installed outside the guide block 19, and a connecting frame 13 fixedly connected to the outer sides of the centering seat 1 2 and the centering seat 2 3 is installed at the output end of the electric push rod 14, and a steering seat 11 and a steering seat 2 12 are installed at the middle position of the bottom of the centering seat 1 2 and the centering seat 2 3, respectively, and a guide rail 1 9 matching the steering seat 11 is arranged below the centering seat 1 2, and a guide rail 2 10 matching the steering seat 2 12 is arranged below the centering seat 2 3;

[0033] See also Figure 2 - Figure 5 As shown, the guide rail 1 9 or the guide rail 2 10 is fixed to the external structure. When the internal self-driving wheel is started and rotated, it drives the centering seat 1 2 or the centering seat 2 3 to move along the guide rail 1 9 or the guide rail 2 10 respectively. Specifically, the centering is completed by the same-direction rotation of two sets of elastic support rings 16. During the centering process, the guide rail 1 9 or the guide rail 2 10 completes the arc guidance, and the guide rail 1 9 or the guide rail 2 10 is used as the vertical line for axial rotation and swinging. At this time, the electric push rod 14 and the connecting frame 13 are driven by the guide block 9 to move in the arc track 4, ensuring the stability of the centering operation.

[0034] During the pre-centering process, the starting extension and retraction direction of the electric push rod 14 is perpendicular to the slot 1 5 or the slot 2 6 in the arc track 4, so no deflection will occur.

[0035] In combination with Example 1 and Example 2, the centering mechanism symmetrically arranged on both sides can be used to complete the pre-centering and secondary centering operations on the wafer, and the wafer can be ensured to be centered after completing stable positioning and clamping during thinning production, so that the contact surface between each wafer and the grinding wheel is unified, and finally a wafer product with uniform flatness is formed; and the self-positioning structure during the movement of the driving component can be used to realize the same-direction rotation of the elastic support ring 16 to complete positioning and centering, which has a stabilizing effect on the above-mentioned positioning and centering.

[0036] The above contents are merely examples and explanations of the structure of the present invention. The technicians in this technical field may make various modifications or additions to the specific embodiments described or replace them in a similar manner. As long as they do not deviate from the structure of the invention or exceed the scope defined by the claims, they should all fall within the protection scope of the present invention.

Claims

1. A positioning tool for processing a flow sensor, comprising a centering mechanism symmetrically arranged on both sides of a tray (1), a turning frame (7) connected to a mechanical arm being arranged above the tray (1), characterized in that: The centering mechanism comprises a centering seat 1 (2) and a centering seat 2 (3) which are arranged in sequence; an arc platform (18) is provided on the inner concave side of the centering seat 1 (2) and the centering seat 2 (3); an oblique edge (15) is provided on the inner ring side of the centering seat 1 (2) and the centering seat 2 (3) close to the arc platform (18); and an elastic support ring (16) extending toward the surface of the arc platform (18) is embedded in the centering seat 1 (2) and the centering seat 2 (3) corresponding to the oblique edge (15); an arc track (4) is installed on the outer side of the centering seat 1 (2) and the centering seat 2 (3); and a driving component for deflecting and displacing the centering seat 1 (2) and the centering seat 2 (3) is installed on the arc track (4).

2. A positioning tool for processing a flow sensor according to claim 1, characterized in that: The driving assembly comprises a guide block (19) slidably arranged in the arc track (4), an electric push rod (14) is mounted outside the guide block (19), and a connecting frame (13) is mounted at the output end of the electric push rod (14) and is fixedly connected to the outer sides of the first centering seat (2) and the second centering seat (3), respectively.

3. A positioning tool for processing a flow sensor according to claim 2, characterized in that: A steering seat 1 (11) and a steering seat 2 (12) are respectively installed at the middle positions of the bottoms of the centering seat 1 (2) and the centering seat 2 (3); a guide rail 1 (9) matching the steering seat 1 (11) is arranged below the centering seat 1 (2); and a guide rail 2 (10) matching the steering seat 2 (12) is arranged below the centering seat 2 (3).

4. A positioning tool for processing a flow sensor according to claim 3, characterized in that: The arc track (4) is provided with a slot hole 1 (5) and a slot hole 2 (6) corresponding to the guide block (19) at the upper and lower ends thereof, respectively. The steering seat 1 (11) and the steering seat 2 (12) are provided with self-driving wheels frictionally and rollingly connected to the guide rail 1 (9) and the guide rail 2 (10) respectively.

5. A positioning tool for processing a flow sensor according to claim 1, characterized in that: The flip frame (7) is in a "U" shape and has suction cups for adsorbing wafers at both ends. A rotating rod (8) connected to the output end of a motor is installed in the middle of the bottom of the tray (1).

6. A positioning tool for processing a flow sensor according to claim 1, characterized in that: The elastic support ring (16) is an open waist-shaped spring piece, and the end of the elastic support ring (16) extending above the arc platform (18) is provided with a guide edge (17), and the guide edge (17) has the same inclination angle as the bevel edge (15).

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