Inclined plane film developing device

Abstract

The utility model relates to the technical field of semiconductor substrate material manufacturing, and particularly discloses an inclined plane film developing device which comprises a supporting seat and a flushing frame. The supporting seat is provided with an inclined surface which is inclined upwards in the normal direction, and a plurality of cleaning tanks are sequentially arranged in the inclined direction of the inclined surface from top to bottom; the cleaning tank is used for placing a substrate slice; the flushing frame is provided with a water outlet; and the water outlet faces the inclined plane. In the process of washing the substrate slices by the inclined plane slice washing device provided by the scheme, the washing liquid can flow from the upper substrate slice to the lower substrate slice along the inclined plane, so that the washing liquid can pass through a plurality of substrate slices in the process of flowing downwards, the utilization rate of the washing liquid can be improved, and the washing efficiency is improved. And therefore, the use amount of the flushing fluid is reduced, and the production cost is reduced.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor substrate material manufacturing, and in particular to a bevel washing device. Background Art

[0002] Indium phosphide substrates are widely used in the manufacture of high-frequency and high-power devices, optical fiber communications, wireless transmission, radio astronomy and other radio frequency devices. In the manufacturing process of indium phosphide substrates, it is necessary to go through the process of epitaxial growth on the substrate, and the cleanliness of the growth surface of the substrate affects the quality of the growing epitaxial layer, so it is necessary to use a cleaning solution to clean the substrate.

[0003] During the substrate cleaning process, various chemical reagents and organic solvents are needed to react chemically and dissolve the impurity particles and their own oxides adsorbed on the surface of the wafer, so that the impurities are desorbed from the surface of the cleaned substrate, and then rinsed with a large amount of rinsing liquid such as deionized water to obtain a surface that meets the cleanliness requirements.

[0004] In the existing cleaning process, in order to ensure the flushing effect, a large amount of flushing liquid is often required, which results in high cleaning costs. Utility Model Content

[0005] In view of this, the purpose of the present application is to provide a bevel washing device for reducing the amount of rinse liquid used in the substrate cleaning process.

[0006] In order to achieve the above technical purpose, the present application provides a sloped film washing device, comprising: a support seat and a flushing rack;

[0007] The support seat is provided with an inclined surface which is inclined upward in a normal direction, and a plurality of cleaning grooves are arranged in sequence from top to bottom along the inclined direction of the inclined surface;

[0008] The cleaning tank is used to place the substrate sheet;

[0009] The flushing frame is provided with a water outlet;

[0010] The water outlet faces the inclined surface.

[0011] Furthermore, the flushing rack is fixed on the supporting seat and is arranged above the inclined surface.

[0012] Furthermore, the water outlet is vertically downward.

[0013] Furthermore, the cleaning tank is arranged at an angle so that the substrate sheet on the cleaning tank is placed at an angle.

[0014] Furthermore, a mounting frame is provided on the support seat;

[0015] The cleaning tank is arranged on the mounting frame.

[0016] Furthermore, the mounting frame is detachably connected to the supporting seat.

[0017] Furthermore, the mounting frame is a frame structure.

[0018] Furthermore, the flushing rack is provided with a plurality of water outlets;

[0019] The plurality of water outlets cover each of the cleaning tanks in a horizontal direction.

[0020] It can be seen from the above technical scheme that the present application provides a sloped film washing device, comprising: a support seat and a flushing rack; the support seat is provided with a normal inclined surface inclined upward, and a plurality of cleaning tanks are arranged in sequence from top to bottom along the inclined direction of the inclined surface; the cleaning tank is used to place substrate sheets; the flushing rack is provided with a water outlet; the water outlet faces the slope.

[0021] In the process of washing substrate sheets in the inclined surface washing device provided by the present invention, the washing liquid can flow along the inclined surface from the substrate sheet located above to the substrate sheet located below, so that the washing liquid can pass through multiple substrate sheets in the process of flowing downward, thereby improving the utilization rate of the washing liquid, and further helping to reduce the use of the washing liquid and reduce production costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0023] Figure 1 A schematic diagram of the structure of a bevel film washing device provided in an embodiment of the present application;

[0024] In the figure: 10, support base; 11, inclined surface; 12, cleaning tank; 13, mounting frame; 20, flushing frame; 21, water outlet. DETAILED DESCRIPTION

[0025] The technical solutions of the embodiments of the present application will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the specification of the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection requested by the present application.

[0026] In the description of the embodiments of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, which are only for the convenience of describing the embodiments of the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the embodiments of the present application. In addition, the terms "first", "second", and "third" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.

[0027] In the description of the embodiments of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a replaceable connection, or an integral connection, it can be a mechanical connection, it can be an electrical connection, it can be a direct connection, it can be indirectly connected through an intermediate medium, and it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the embodiments of the present application can be understood according to specific circumstances.

[0028] See also Figure 1 A sloped film washing device provided in an embodiment of the present application includes: a support seat 10 and a flushing rack 20.

[0029] The support seat 10 is provided with a normal inclined surface 11 facing upward, and a plurality of cleaning tanks 12 are arranged in sequence from top to bottom along the inclined direction of the inclined surface 11; the cleaning tanks 12 are used to place the substrate sheet 30; the flushing rack 20 is provided with a water outlet 21; the water outlet 21 faces the inclined surface 11.

[0030] As an implementation manner, a plurality of inclined surfaces 11 may be provided on the support seat 10 . For example, the support seat 10 may be a tetrahedral pyramid, a trihedral pyramid or the like, so as to increase the substrate sheet mounting capacity of the support seat 10 .

[0031] As an embodiment, a plurality of cleaning tank groups may be provided on the support seat 10; each cleaning tank group includes a plurality of cleaning tanks 12 arranged at intervals in a straight line; the plurality of cleaning tank groups are arranged at intervals in the horizontal direction, so that the plurality of cleaning tanks 12 are distributed in a rectangular array on the inclined surface 11. Correspondingly, in this embodiment, a flushing rack 20 is provided above each cleaning tank group.

[0032] In the process of washing the substrate sheet by the inclined surface washing device provided in the present solution, the washing liquid flushed out from the water outlet 21 will fall on the substrate sheet 30 and the inclined surface 11, and then flow along the inclined surface 11 and the substrate sheet 30 from the upper substrate sheet 30 to the lower substrate sheet 30, and finally flow out from the bottom of the support seat 10. The utilization rate of the washing liquid can be effectively improved during the washing process, and the amount of washing liquid used can be reduced while ensuring the washing effect, thereby reducing the production cost.

[0033] In one embodiment, the flushing frame 20 is fixed on the supporting base 10 and disposed above the inclined surface 11 .

[0034] Specifically, the flushing frame 20 can be integrated with the supporting base 10 .

[0035] As a further improvement, the water outlet 21 is vertically downward, that is, the water flow direction of the water outlet 21 forms an angle with the inclined surface 11 and the substrate sheet 30, which can ensure the flushing effect while preventing the flushing liquid from vertically impacting the substrate sheet 30 and damaging the substrate sheet 30.

[0036] In one embodiment, the cleaning tank 12 is tilted so that the substrate sheet 30 on the cleaning tank 12 is placed tilted.

[0037] Specifically, the tilted substrate sheet 30 can prolong the residence time of the rinse liquid and help the rinse liquid flowing through the upper substrate sheet 30 to further flow through the lower substrate sheet, thereby improving the utilization rate of the rinse liquid.

[0038] In another embodiment, a mounting frame 13 is disposed on the support base 10 ; and the cleaning tank 12 is disposed on the mounting frame 13 .

[0039] Specifically, the mounting bracket 13 can be detachably connected to the support base 10, so that the mounting bracket 13 can be replaced when necessary.

[0040] Furthermore, the mounting frame 13 is a frame structure, which helps to reduce the contact area between the mounting frame 13 and the substrate sheet 30 and ensure the flushing effect of the substrate sheet 30.

[0041] In one embodiment, a plurality of water outlets 21 are disposed on the flushing rack 20 ; the plurality of water outlets 21 cover each cleaning tank 12 in a horizontal direction.

[0042] like Figure 1 As shown, during the washing process of the inclined surface washing device provided in this embodiment, the washing liquid flushed out from the multiple water outlets 21 will be respectively flushed to the multiple cleaning tanks 12, which can improve the washing efficiency while ensuring that the substrate sheet 30 located on the cleaning tank 12 below can also be directly washed by the washing liquid flushed out from the water outlet 21 to ensure the cleaning effect of the substrate sheet 30 located below.

[0043] The above are only preferred embodiments of the present application and are not intended to limit the present utility model. Although the present application has been described in detail with reference to the examples, those skilled in the art can still modify the technical solutions recorded in the aforementioned examples or make equivalent substitutions for some of the technical features therein. However, any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims

1. A bevel film processing device, characterized in that: include: A support seat (10) and a flushing frame (20); The support seat (10) is provided with an inclined surface (11) which is inclined normally upward, and a plurality of cleaning grooves (12) are arranged in sequence from top to bottom along the inclined direction of the inclined surface (11); The cleaning tank (12) is used for placing the substrate sheet (30); The flushing frame (20) is provided with a water outlet (21); The water outlet (21) faces the inclined surface (11).

2. The inclined surface film processing device according to claim 1, characterized in that: The flushing frame (20) is fixed on the supporting seat (10) and is arranged above the inclined surface (11).

3. The inclined surface film processing device according to claim 2, characterized in that: The water outlet (21) faces vertically downward.

4. The inclined surface film processing device according to claim 1, characterized in that: The cleaning tank (12) is arranged at an angle so that the substrate sheet (30) on the cleaning tank (12) is placed at an angle.

5. The inclined surface film processing device according to claim 1 or 4, characterized in that: The support seat (10) is provided with a mounting frame (13); The cleaning tank (12) is arranged on the mounting frame (13).

6. The inclined surface film processing device according to claim 5, characterized in that: The mounting frame (13) is detachably connected to the support seat (10).

7. The inclined surface processing device according to claim 5, characterized in that: The mounting frame (13) is a frame structure.

8. The inclined surface processing device according to claim 1, characterized in that: The flushing frame (20) is provided with a plurality of water outlets (21); The plurality of water outlets (21) cover each of the cleaning tanks (12) in the horizontal direction.

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