Rotatable and fine-adjustable vacuum tray lifting device

Abstract

The utility model discloses a rotatable and fine-adjustable vacuum tray lifting device, and relates to the technical field of coating vacuum equipment. The device comprises a center rod, wherein the top of the center rod extends into a vacuum cavity; the lifting supporting piece is mounted outside the vacuum cavity; the lifting mechanism is arranged on the lifting supporting piece; the fine adjustment mechanism comprises a fine adjustment supporting piece and a fine adjustment assembly installed on the fine adjustment supporting piece, and the fine adjustment assembly is connected with the center rod and used for adjusting the position of the center rod; the lifting mechanism is connected with the fine-adjustment supporting piece and used for driving the fine-adjustment supporting piece to move up and down and further driving the center rod to move up and down. The rotating mechanism is connected with the center rod and used for driving the center rod to rotate. According to the utility model, multi-dimensional and multi-direction motion selection can be provided for the wafer in the vacuum cavity, and the vacuum chamber is suitable for various process environment requirements; up-and-down lifting motion can be realized, and a wafer rotating function can also be provided; and the manufacturing efficiency and the film layer uniformity of different processes are improved.

Description

Technical Field

[0001] The utility model relates to the technical field of coating vacuum equipment, and more specifically, to a rotatable and fine-adjustable vacuum tray lifting device. Background Art

[0002] Wafer coating is a key technology in the semiconductor manufacturing process, which involves depositing thin films of different materials on the surface of the wafer. These films can be metal, dielectric or semiconductor materials.

[0003] Wafer coating is usually carried out in a high vacuum environment because the vacuum environment can reduce the collision of gas molecules, thereby avoiding the incorporation of gas impurities into the film and ensuring the quality and purity of the film.

[0004] The existing coating vacuum equipment has a single structure, which results in low efficiency of wafer coating and a long production cycle of a single wafer; and most of them have the problem of poor uniformity of wafer coating. Utility Model Content

[0005] In order to solve the above problems of the prior art, the utility model innovatively provides a rotatable and fine-tunable vacuum tray lifting device. The device provided by the utility model can be used in wafer vacuum coating process, which can improve the efficiency of the process and solve the uneven phenomenon in the gas deposition process.

[0006] In order to achieve the above technical objectives, the technical solution of the utility model is:

[0007] A rotatable and fine-adjustable vacuum tray lifting device, comprising:

[0008] A central rod, the top of which extends into the vacuum chamber;

[0009] A lifting support member is installed outside the vacuum chamber;

[0010] A lifting mechanism, arranged on the lifting support member;

[0011] The fine-tuning mechanism comprises a fine-tuning support and a fine-tuning assembly mounted on the fine-tuning support, wherein the fine-tuning assembly is connected to the center rod and is used to adjust the position of the center rod; the lifting mechanism is connected to the fine-tuning support and is used to drive the fine-tuning support to move up and down and then drive the center rod to move up and down;

[0012] The rotating mechanism is connected to the central rod and is used for driving the central rod to rotate.

[0013] Further, the fine-tuning assembly includes a fine-tuning assembly fixing plate, an X-axis movable base connected to the fine-tuning assembly fixing plate, a Y-axis movable base connected to the X-axis movable base, and a Z-axis movable base connected to the Y-axis movable base; the center rod is connected to the Z-axis movable base;

[0014] The fixing plate of the fine-tuning assembly is provided with an X-axis adjusting member for driving the X-axis movable base to move along the X-axis direction, thereby indirectly driving the center rod to move along the X-axis direction;

[0015] The Y-axis movable base is provided with a Y-axis adjusting member for driving the Z-axis movable base to move along the Y-axis direction, thereby driving the center rod to move along the Y-axis direction;

[0016] The Z-axis movable base is provided with a Z-axis adjusting member for adjusting the horizontality of the Z-axis movable base and further adjusting the horizontality of the center rod.

[0017] Further, the X-axis adjustment member includes a first mounting seat arranged on one side of the fine-tuning component fixing plate, a first adjustment slot is opened on the fine-tuning component fixing plate, a first connecting seat connected to the Y-axis movable base is arranged in the first adjustment slot, a first screw is passed through the first mounting seat, one end of the first screw extends into the first adjustment slot and is connected to the first connecting seat, and the other end is connected to a first knob, a first fixing plate is also arranged on the first mounting seat, and a first fixing screw is arranged on the first fixing plate.

[0018] Furthermore, the Y-axis adjustment member includes a second mounting seat arranged on one side of the Y-axis movable base, a second adjustment groove is opened on the Y-axis movable base, a second connecting seat connected to the X-axis movable base is arranged in the second adjustment groove, a second screw rod is passed through the second mounting seat, one end of the second screw rod extends into the second adjustment groove and is connected to the second connecting seat, and the other end is connected to a second knob, a second fixing plate is also arranged on the second mounting seat, and a second fixing screw is arranged on the second fixing plate.

[0019] Furthermore, the Z-axis adjustment member is an adjustment screw, and there are four adjustment screws, which are respectively located at the four corners of the Z-axis movable base, and are used to adjust the distance between the Z-axis movable base and the Y-axis movable base, thereby adjusting the horizontality of the Z-axis movable base.

[0020] Furthermore, the lifting mechanism includes a slide rail arranged on the lifting support member, a slider is slidably connected to the slide rail, the slider is transmission-connected to a lifting drive member, the fine-tuning support member is fixedly connected to the slider, and the lifting drive member is used to drive the slider to move up and down along the slide rail, thereby driving the fine-tuning support member to move up and down.

[0021] Furthermore, the rotating mechanism includes a rotating motor and a motor mounting plate, the motor mounting plate is connected to the fine-tuning assembly, the rotating motor is mounted on the motor mounting plate, and an output end thereof is connected to the bottom of the center rod.

[0022] Furthermore, a magnetic fluid is also arranged on the center rod between the rotating motor and the fine-tuning assembly.

[0023] Furthermore, a vacuum bellows is provided on the center rod between the vacuum chamber and the fine-tuning assembly.

[0024] The beneficial effects of the utility model are:

[0025] The rotatable and fine-tunable vacuum tray lifting device of the utility model can provide the wafer with multi-dimensional and multi-directional movement options in the vacuum chamber, and is suitable for various process environment requirements; it can realize up and down lifting movement, and can also provide wafer rotation function; it improves the production efficiency and film uniformity of different processes; it optimizes the transmission method of the wafer in the process, improves the effect of the entire wafer coating process, and greatly improves production efficiency; the position of the center rod can be adjusted through the fine-tuning mechanism so that the center rod is in the center position, thereby further ensuring the uniformity of the wafer coating. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a schematic diagram of the overall structure of the utility model.

[0027] Figure 2 It is a partial cross-sectional structural schematic diagram of the utility model.

[0028] Figure 3 It is a structural schematic diagram of the fine adjustment mechanism in the utility model.

[0029] Figure 4 This is a schematic diagram of the structure in which some parts are omitted in the fine adjustment mechanism of the utility model. Figure 1 .

[0030] Figure 5 This is a schematic diagram of the structure in which some parts are omitted in the fine adjustment mechanism of the utility model. Figure 2 .

[0031] In the figure,

[0032] 1. Vacuum chamber; 2. Tray; 3. Center rod; 4. Lifting support; 5. Lifting mechanism; 5a. Slide rail; 5b. Sliding block; 5c. Lifting drive; 6. Vacuum bellows; 7. Fine-tuning support; 8. Fine-tuning assembly fixing plate; 8a. First adjustment slot; 9. X-axis moving base; 10. Y-axis moving base; 10a. Second adjustment slot; 11. Z-axis moving base; 12. Motor mounting plate; 13. Magnetic fluid; 14. Coupling; 15. Rotating motor; 16. X-axis adjusting member; 16a. First mounting seat; 16b. First connecting seat; 16c. First screw; 16d. First knob; 16e. First fixing plate; 16f. First fixing screw;

[0033] 17, Y-axis adjustment member; 17a, second mounting seat; 17b, second connecting seat; 17c, second screw rod; 17d, second knob; 17e, second fixing plate; 17f, second fixing screw;

[0034] 18. Z-axis adjustment part. DETAILED DESCRIPTION

[0035] The solution provided by the utility model is explained and illustrated in detail below in conjunction with the accompanying drawings of the specification.

[0036] refer to Figures 1 to 5 As shown, this embodiment provides a rotatable and fine-adjustable vacuum tray lifting device, comprising:

[0037] A central rod 3, the top of which extends into the vacuum chamber 1;

[0038] A lifting support member 4 is installed outside the vacuum chamber 1;

[0039] A lifting mechanism 5 is arranged on the lifting support 4;

[0040] The fine-tuning mechanism includes a fine-tuning support 7 and a fine-tuning assembly mounted on the fine-tuning support 7, the fine-tuning assembly is connected to the center rod 3, and is used to adjust the position of the center rod 3; the lifting mechanism 5 is connected to the fine-tuning support 7, and is used to drive the fine-tuning support 7 to move up and down, thereby driving the center rod 3 to move up and down;

[0041] The rotating mechanism is connected to the central rod 3 and is used for driving the central rod 3 to rotate.

[0042] A tray 2 for placing products such as wafers is disposed on the top of the central rod 3 , thereby facilitating vacuum coating in the vacuum chamber 1 .

[0043] The lifting support 4 is used to install the lifting mechanism 5, and the lifting mechanism 5 is used to drive the fine-tuning mechanism to move up and down as a whole, thereby driving the center rod 3 connected to the fine-tuning component to move up and down, thereby facilitating the realization of automated operation, and the wafer can be directly placed and taken in a vacuum environment, thereby improving the efficiency of vacuum coating.

[0044] The fine adjustment component can be used to adjust the position of the center rod 3, and then adjust the position of the tray 2, so that the tray 2 can always be located at the center of the vacuum chamber 1 to ensure the uniformity of the coating. The setting of the rotating mechanism can also solve the problem of uniformity of wafer coating; it can effectively solve the uneven phenomenon in the gas deposition process.

[0045] Continue to refer Figures 1 to 3 In this embodiment, the fine-tuning assembly includes a fine-tuning assembly fixing plate 8, an X-axis moving base 9 connected to the fine-tuning assembly fixing plate 8, a Y-axis moving base 10 connected to the X-axis moving base 9, and a Z-axis moving base 11 connected to the Y-axis moving base 10; the center rod 3 is connected to the Z-axis moving base 11, that is, the center rod 11 is fixedly sleeved in the Z-axis moving base 11 and can move with the movement of the Z-axis moving base 11;

[0046] An X-axis adjusting member 16 is provided on the fine-tuning assembly fixing plate 8, which is used to drive the X-axis moving base 9 to move along the X-axis direction, thereby indirectly driving the center rod 3 to move along the X-axis direction;

[0047] The Y-axis moving base 10 is provided with a Y-axis adjusting member 17 for driving the Z-axis moving base 11 to move along the Y-axis direction, thereby driving the center rod 3 to move along the Y-axis direction;

[0048] The Z-axis movable base 11 is provided with a Z-axis adjusting member 18 for adjusting the levelness of the Z-axis movable base 11 and further adjusting the levelness of the center rod 3 .

[0049] In the illustrated embodiment, the centers of the fine-tuning support member 7, the adjustment component fixing plate 8, the X-axis movable base 9 and the Y-axis movable base 10 are all provided with openings for the upper part of the Z-axis movable base 11 to pass through and to be able to reciprocate a certain distance along the X-axis and the Y-axis. By adjusting the X-axis adjusting member 16, the X-axis movable base 9, the Y-axis movable base 10 and the Z-axis movable base 11 can be driven to move along the X-axis direction, thereby adjusting the position of the center rod 11 in the X-axis direction; by adjusting the Y-axis adjusting member 17, the Z-axis movable base 11 can also be driven to move along the Y-axis direction, thereby adjusting the position of the center rod 11 in the Y-axis direction.

[0050] Continue to refer Figures 3 to 5As shown, in some embodiments, the X-axis adjustment member 16 includes a first mounting seat 16a arranged on one side of the fine-tuning component fixing plate 8, the first mounting seat 16a can be integrally formed with the fine-tuning component fixing plate 8, the fine-tuning component fixing plate 8 is provided with a first adjustment groove 8a, the first adjustment groove 8a is provided with a first connecting seat 16b fixedly connected to the Y-axis moving base 10, a first screw 16c is passed through the first mounting seat 16a, one end of the first screw 16c extends into the first adjustment groove 8a and is connected to the first connecting seat 16b, and the other end is connected to the first knob 16d, a first fixing plate 16e is also provided on the first mounting seat 16a, and a first fixing screw 16f is provided on the first fixing plate 16e.

[0051] When it is necessary to adjust the position of the center rod 3 in the X-axis direction, the first fixing screw 16f can be loosened first, and then the first knob 16d can be turned to drive the first connecting seat 16b to move in the first adjustment slot 8a along the X-axis direction. Since the first connecting seat 16b is fixedly connected to the X-axis moving base 9, the first connecting seat 16b can drive the X-axis moving base 10 to move in the X-axis direction, and then the Y-axis moving base 10, the Z-axis moving base 11 and the center rod 3 can be driven to move in the X-axis direction in turn, thereby achieving fine-tuning in the X-axis direction.

[0052] Furthermore, the Y-axis adjustment member 17 includes a second mounting seat 17a arranged on one side of the Y-axis moving base 10. The second mounting seat 17a can also be integrally formed with the Y-axis moving base 10. A second adjustment groove 10a is opened on the Y-axis moving base 10. A second connecting seat 17b fixedly connected to the X-axis moving base 9 is arranged in the second adjustment groove 10a. A second screw 17c is passed through the second mounting seat 17a. One end of the second screw 17c extends into the second adjustment groove 10a and is connected to the second connecting seat 17b, and the other end is connected to a second knob 17d. A second fixing plate 17e is also arranged on the second mounting seat 17a, and a second fixing screw 17f is arranged on the second fixing plate 17e.

[0053] Similarly, when it is necessary to adjust the position of the center rod 3 in the Y-axis direction, the second fixing screw 17f can be loosened first, and then the second knob 17d can be turned. At this time, since the second connecting seat 17b is connected and fixed to the X-axis movable base 9, the second screw rod 17c can rotate relative to the second connecting seat 17b, but will not drive the second connecting seat 17b to move, so that the second mounting seat 17a can move relative to the second screw rod 17c, and the Y-axis movable base 10 can be moved relative to the second screw rod 17c, that is, in the Y-axis direction; thereby driving the Z-axis movable base 11 and the center rod 3 to move in the Y-axis direction in turn, and realizing fine-tuning in the Y-axis direction.

[0054] In some other embodiments, the second connecting seat 17b can also be directly connected to the Z-axis movable base 11. At this time, the second screw 17c can be threadedly matched with the second connecting seat 17b, and the second screw 17c and the second connecting seat 17b can be driven to move in the Y-axis direction by rotating the second knob 17d, thereby also driving the Z-axis movable base 11 and the center rod 3 to move in the Y-axis direction.

[0055] Continue to refer Figure 3 As shown, the Z-axis adjustment member 18 is an adjustment screw. There are four adjustment screws, which are respectively located at the four corners of the Z-axis moving base 11. They are used to adjust the distance between the Z-axis moving base 11 and the Y-axis moving base 10, thereby adjusting the horizontality of the Z-axis moving base 11, and the horizontality of the center rod 3 and the tray 2 on the top of the center rod 3 can be adjusted to achieve fine-tuning in the Z-axis direction.

[0056] By setting up the fine-tuning components, the overall fine-tuning of the X, Y, and Z axes can be achieved, which can provide the wafer with multi-dimensional and multi-directional movement options in the vacuum chamber to ensure the uniformity of coating.

[0057] Continue to refer Figure 1 As shown, the lifting mechanism 5 includes a slide rail 5a arranged on the lifting support member 4, a slider 5b is slidably connected to the slide rail 5a, and the slider 5b is transmission-connected to the lifting drive member 5c. The fine-tuning support member 7 is fixedly connected to the slider 5b, and the lifting drive member 5c is used to drive the slider 5b to move up and down along the slide rail 5a, thereby driving the fine-tuning support member 7 to move up and down; thereby driving the fine-tuning component, the center rod 3 and the tray 2 to move up and down; so that the wafer can be directly placed on the tray 2 under a vacuum environment, thereby increasing the efficiency of the process; the lifting drive member 5c can be a lifting motor combined with a transmission member and a screw rod, or directly an electric push rod or other structures, as long as it can realize driving the slider 5b to move up and down along the slide rail 5a.

[0058] In some embodiments, the rotating mechanism includes a rotating motor 15 and a motor mounting plate 12. The motor mounting plate 12 is connected to the fine-tuning assembly, and can be directly connected to the Z-axis moving base 11. The rotating motor 15 is installed on the motor mounting plate 12, and its output end is connected to the bottom of the center rod 3, and can be specifically connected through a coupling 14; in some other embodiments, the rotating motor 15 can also transmit the center rod 3 by means of a transmission belt or gears.

[0059] In some preferred embodiments, a magnetic fluid 13 is also provided on the center rod 3 between the rotating motor 15 and the fine-tuning assembly, so as to improve the sealing and ensure the vacuum degree in the vacuum chamber 1; of course, in some other embodiments, the magnetic fluid 13 can also be provided above the fine-tuning assembly, that is, on the center rod 3 above the fine-tuning support.

[0060] In the illustrated embodiment, a vacuum bellows 6 is further provided on the central rod 3 between the vacuum chamber 1 and the fine-tuning assembly, which is also used to improve the sealing performance and ensure the vacuum degree in the vacuum chamber 1 .

[0061] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0062] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0063] In the description of this specification, the description with reference to the terms "this embodiment", "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the utility model. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in a suitable manner in any at least one embodiment or example. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0064] In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of the present utility model, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0065] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modification, equivalent replacement and simple improvement made to the essential content of the present invention shall be included in the protection scope of the present invention.

Claims

1. A rotatable and fine-tunable vacuum tray lifting device, characterized in that: include: A central rod (3), the top of which extends into the vacuum chamber (1); A lifting support member (4) is installed outside the vacuum chamber (1); A lifting mechanism (5) is arranged on the lifting support member (4); The fine-tuning mechanism comprises a fine-tuning support (7) and a fine-tuning assembly mounted on the fine-tuning support (7), wherein the fine-tuning assembly is connected to the central rod (3) and is used to adjust the position of the central rod (3); the lifting mechanism (5) is connected to the fine-tuning support (7) and is used to drive the fine-tuning support (7) to move up and down, thereby driving the central rod (3) to move up and down; A rotating mechanism is connected to the central rod (3) and is used to drive the central rod (3) to rotate.

2. The rotatable and fine-adjustable vacuum tray lifting device according to claim 1, characterized in that: The fine-tuning assembly comprises a fine-tuning assembly fixing plate (8), an X-axis movable base (9) connected to the fine-tuning assembly fixing plate (8), a Y-axis movable base (10) connected to the X-axis movable base (9), and a Z-axis movable base (11) connected to the Y-axis movable base (10); the central rod (3) is connected to the Z-axis movable base (11); The fine-tuning assembly fixing plate (8) is provided with an X-axis adjusting member (16) for driving the X-axis movable base (9) to move along the X-axis direction, thereby indirectly driving the center rod (3) to move along the X-axis direction; The Y-axis movable base (10) is provided with a Y-axis adjusting member (17) for driving the Z-axis movable base (11) to move along the Y-axis direction, thereby driving the central rod (3) to move along the Y-axis direction; The Z-axis movable base (11) is provided with a Z-axis adjusting member (18) for adjusting the horizontality of the Z-axis movable base (11) and further adjusting the horizontality of the center rod (3).

3. The rotatable and fine-adjustable vacuum tray lifting device according to claim 2, characterized in that: The X-axis adjustment member (16) comprises a first mounting seat (16a) arranged on one side of the fine-tuning component fixing plate (8); a first adjustment slot (8a) is provided on the fine-tuning component fixing plate (8); a first connecting seat (16b) connected to the Y-axis movable base (10) is provided in the first adjustment slot (8a); a first screw rod (16c) is passed through the first mounting seat (16a); one end of the first screw rod (16c) extends into the first adjustment slot (8a) and is connected to the first connecting seat (16b); the other end of the first screw rod (16c) is connected to a first knob (16d); a first fixing plate (16e) is also provided on the first mounting seat (16a); and a first fixing screw (16f) is provided on the first fixing plate (16e).

4. The rotatable and fine-adjustable vacuum tray lifting device according to claim 2, characterized in that: The Y-axis adjustment member (17) comprises a second mounting seat (17a) arranged on one side of the Y-axis movable base (10); a second adjustment groove (10a) is provided on the Y-axis movable base (10); a second connecting seat (17b) connected to the X-axis movable base (9) is provided in the second adjustment groove (10a); a second screw rod (17c) is passed through the second mounting seat (17a); one end of the second screw rod (17c) extends into the second adjustment groove (10a) and is connected to the second connecting seat (17b); the other end of the second screw rod (17c) is connected to a second knob (17d); a second fixing plate (17e) is also provided on the second mounting seat (17a); and a second fixing screw (17f) is provided on the second fixing plate (17e).

5. The rotatable and fine-adjustable vacuum tray lifting device according to claim 2, characterized in that: The Z-axis adjusting member (18) is an adjusting screw, and there are four adjusting screws, which are respectively located at the four corners of the Z-axis movable base (11) and are used to adjust the distance between the Z-axis movable base (11) and the Y-axis movable base (10), thereby adjusting the horizontality of the Z-axis movable base (11).

6. The rotatable and fine-adjustable vacuum tray lifting device according to claim 1, characterized in that: The lifting mechanism (5) comprises a slide rail (5a) arranged on the lifting support member (4); a slider (5b) is slidably connected to the slide rail (5a); the slider (5b) is transmission-connected to a lifting drive member (5c); the fine-tuning support member (7) is fixedly connected to the slider (5b); the lifting drive member (5c) is used to drive the slider (5b) to move up and down along the slide rail (5a), thereby driving the fine-tuning support member (7) to move up and down.

7. The rotatable and fine-adjustable vacuum tray lifting device according to claim 1, characterized in that: The rotating mechanism comprises a rotating motor (15) and a motor mounting plate (12), wherein the motor mounting plate (12) is connected to the fine-tuning assembly, the rotating motor (15) is mounted on the motor mounting plate (12), and an output end thereof is connected to the bottom of the center rod (3).

8. The rotatable and fine-adjustable vacuum tray lifting device according to claim 7, characterized in that: A magnetic fluid (13) is also provided on the central rod (3) between the rotating motor (15) and the fine adjustment assembly.

9. The rotatable and fine-adjustable vacuum tray lifting device according to claim 1, characterized in that: A vacuum bellows (6) is also provided on the central rod (3) between the vacuum chamber (1) and the fine-tuning assembly.

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