Vacuum chamber shell and vacuum assembly

Abstract

According to the present disclosure, a vacuum chamber housing (100) may comprise: a plurality of housing walls (110) forming a chamber interior (120) therebetween; a first mounting structure (141) for mounting a gas partition wall between a first region (121) and a second region (122) of the chamber interior (120); wherein each shell wall of a first pair of shell walls of the plurality of shell walls passes through a substrate transfer opening (112) along the transfer surface (130) to the first region (121) and has a second mounting structure (151) for mounting a gas separation structure between the transfer surface (130) and the second region (122) in the first region (121), more than one shell wall (110) of a first pair of shell walls in the plurality of shell walls penetrates through a suction port (114) to lead to the second area (122); a first pump connection (116) leading to the first region; and a second pump connection (117) leading to the second region.

Description

Technical Field

[0001] Various embodiments of the present disclosure relate to a vacuum chamber housing and a vacuum assembly. Background Art

[0002] In general, the workpiece or substrate may be treated, for example, machined, coated, heated, etched and / or modified. One method for coating a substrate is, for example, cathode sputtering (so-called sputtering). For example, one or several layers can be deposited on a substrate by sputtering (i.e. by a sputtering process). For this purpose, a gas forming a plasma can be ionized at the cathode, so that the material to be deposited on the cathode (the so-called target material) is atomized by the plasma formed in the process. The atomized target material can then be brought to the substrate and deposited on the substrate to form a layer. The target material can be a replaceable component or a part thereof, a so-called target.

[0003] For this purpose, the workpiece or substrate to be processed can be placed in a vacuum system and processed therein. Such a vacuum system is, for example, a so-called continuous system having several vacuum chambers arranged in succession. For example, a substrate can be transferred from one vacuum chamber to the next. The individual vacuum chambers through which the substrate is transferred can have different functions. For example, certain vacuum chambers (so-called processing chambers) can be configured to process substrates therein. Other vacuum chambers (also called intermediate chambers) can be arranged between several processing chambers and can be used to transfer substrates. These intermediate chambers can, for example, be configured to evacuate the gas in adjacent vacuum chambers (so-called pumping chambers), or to suppress the gas exchange between two consecutive processing chambers (so-called gas separation chambers).

[0004] According to various aspects, it has been found that the installation space for intermediate chambers can be reduced. The number of intermediate chambers arranged in succession between two process chambers significantly increases the length of the entire vacuum system. As the length of the vacuum system increases, the required material and the amount of gas to be pumped out of the vacuum system increase. This, for example, increases the pumping time, which shortens the effective service life of the vacuum system and thus increases costs. In addition, the pumping efficiency is reduced.

[0005] According to various aspects, it has been recognized that different functions of intermediate chambers (e.g. pumping chambers and gas traps) which are conventionally arranged one after the other can be accommodated in a smaller installation space, for example by combining these functions in one and the same vacuum chamber. This makes it possible, for example, to reduce the number of vacuum chambers in the vacuum system and thus the length of the vacuum system. This has a positive effect on the pumping capacity and / or reduces the material requirement, thereby reducing costs. Utility Model Content

[0006] In order to achieve the above-mentioned objectives, the utility model discloses a vacuum chamber shell, comprising: a plurality of shell walls, forming a chamber interior therebetween; a first mounting structure, used to install a gas separation wall between a first area and a second area inside the chamber; wherein each shell wall of a first pair of shell walls among the plurality of shell walls: has a substrate conveying port extending to the first area along a conveying surface; has a second mounting structure, used to install a gas separation structure between the conveying surface and the second area in the first area; has a third mounting structure, used to install an additional gas separation structure on a side of the conveying surface in the first area away from the second mounting structure; wherein at least one shell wall of the first pair of shell walls among the plurality of shell walls has a suction port extending to the second area; a first pump interface extending to the first area; and a second pump interface extending to the second area. BRIEF DESCRIPTION OF THE DRAWINGS

[0007] Figures 1A to 4A Schematic diagrams of various aspects of a vacuum chamber housing according to various embodiments are shown respectively;

[0008] Figure 4B Schematic diagrams showing various aspects of a channel structure according to various embodiments;

[0009] Figure 5A Schematic diagrams of various aspects of a vacuum chamber housing according to various embodiments are shown;

[0010] Figure 5B Schematic diagrams of various aspects of a shell wall according to various embodiments are shown;

[0011] FIG. 6A to FIG. 7B Schematic diagrams of various aspects of a vacuum chamber housing according to various embodiments are shown respectively;

[0012] Figures 8 to 9C Schematic diagrams of various aspects of a vacuum assembly (eg, a vacuum chamber assembly) are shown in detail according to various embodiments. DETAILED DESCRIPTION

[0013] In conjunction with the accompanying drawings, which form a part of this document, specific embodiments in which the present disclosure may be implemented are illustrated. In this regard, directional terms such as "upper", "lower", "front", "rear", "forward", "backward", etc. are used with reference to the orientation of the accompanying drawings. The components in each embodiment can be positioned in several different directions, so the directional terms are intended to be illustrative and not restrictive. It should be understood that other embodiments may be adopted and structural or logical changes may be made without departing from the concept of the present disclosure. It goes without saying that the features of the various exemplary embodiments described herein may be combined with each other unless otherwise specifically stated. Therefore, the specific content described below should not be understood in a restrictive sense, and the scope of protection of the present disclosure should be defined by the appended claims.

[0014] In the context of this specification, the term "between" refers to three objects, one of which is arranged between the other two objects, and is used to describe the spatial relationship between the objects, for example, there is a straight line running through all three objects (for example, running through the geometric center of gravity of the three objects). Specifically, one of the three objects is arranged between the other two objects and may overlap each other when viewed along the straight line. Optionally or additionally, the spacing between the object arranged between the other two objects and each of the other two objects may be less than the spacing between the other two objects or less than 75% (or 50%, 25% or 10%) of the spacing between the other two objects.

[0015] In the present specification, the terms "connect", "interfacing" and "coupling" are used to describe direct and indirect connections (e.g., resistive and / or conductive connections, such as conductive connections), direct or indirect interfacing, and direct or indirect coupling. In the drawings, identical or similar elements may be marked with the same reference numerals where appropriate.

[0016] According to various embodiments, the term "coupling" may be understood as, for example, a direct or indirect (e.g., mechanical, hydrostatic, thermal and / or electrical) connection and / or interaction. Multiple elements may be coupled to each other, for example, along an interaction chain, and may exchange interactions, such as fluids (also known as fluid conductive coupling) along the interaction chain. For example, two mutually coupled elements may exchange interactions, such as mechanical, hydrostatic, thermal and / or electrical interactions, with each other. The mutual coupling of multiple vacuum components (e.g., valves, pumps, chambers, etc.) may include the mutual fluid conductive coupling of these components. According to various embodiments, "coupling" may be understood as a mechanical (e.g., physical or physical) coupling, such as through direct physical contact. The coupling may be configured to transmit mechanical interactions (e.g., forces, torques, etc.).

[0017] As an exemplary embodiment, the present invention refers to a processing device for sputtering (also known as a sputtering device). The term "sputtering" (also known as a sputtering process) refers to the atomization of a material (also known as a coating material or a target material) by a plasma. This allows the atomized components of the target material to be separated from each other and can, for example, be deposited in other locations to form a layer. Sputtering can be accomplished by a so-called sputtering device, which may have a magnet system (hence also known as a magnetron). The target material can be provided by a so-called sputtering target, which can, for example, be in the form of a tube (hence also known as a tube target) or in the form of a plate (hence also known as a plate target). In order to generate a plasma, a voltage can be applied to the sputtering target (referred to as the target) so that the sputtering target works as a cathode. Even if the voltage is an alternating voltage, the term "cathode" is still retained.

[0018] It will be appreciated that the description with respect to a sputtering apparatus may be applicable to any other processing apparatus (eg, a coating apparatus) that is not necessarily configured for sputtering, such as a heating apparatus.

[0019] When sputtering is performed, the sputtering target can be arranged in a vacuum processing chamber (referred to as the vacuum chamber) so that sputtering can be performed under vacuum. To this end, the environmental conditions (process parameters, such as process pressure, temperature, gas composition, etc.) in the vacuum processing chamber can be set or adjusted during sputtering. For example, a working gas, i.e., a plasma-forming gas or a plasma-forming gas mixture, can be provided in the vacuum processing chamber. For example, the vacuum processing chamber can be configured to be airtight, dustproof and / or vacuum-tight, so that an atmosphere of a predetermined composition (also referred to as a working atmosphere) or an atmosphere of a predetermined pressure (also referred to as a working pressure or a process pressure) can be provided in the vacuum processing chamber (e.g., according to a rated value). The vacuum chamber can be configured to be vacuum inside (i.e., a pressure lower than 0.3 bar) and / or a pressure range of about 1 mbar to about 10 -3 mbar (in other words, medium vacuum) or lower pressures, for example, in the pressure range of about 10 -3 mbar to about 10 -7 mbar (in other words, high vacuum) or lower pressures, for example, pressures below high vacuum, such as below about 10 -7 mbar (in other words, ultra-high vacuum). The lowest pressure that can be achieved in a vacuum chamber is also called residual vacuum.

[0020] It is understood that the description of sputtering herein is analogously applicable to any other coating process, such as physical vapor deposition. In general, physical vapor deposition (such as sputtering) involves transferring the chemical components of the target material or the coating material into the layer to be formed.

[0021] According to various embodiments, a vacuum chamber may be provided by a chamber housing. The chamber housing (also referred to as a vacuum chamber housing) may have a plurality of shell walls (also referred to as vacuum shell walls, chamber walls or vacuum chamber walls) surrounding the interior of the chamber (also referred to as the interior of the vacuum chamber). For example, a negative pressure or vacuum may be provided inside the chamber. For example, a chamber housing (also referred to as a vacuum chamber housing) providing a negative pressure or vacuum may be coupled (e.g., gas conductively coupled) to a pump device, such as a vacuum pump device, and may be stably configured to withstand the effect of gas pressure in an evacuated state. The pump device (including at least one vacuum pump, such as a high vacuum pump, such as a turbomolecular pump) may pump out part of the gas from the interior of the processing chamber, such as from the processing space. Therefore, one or more vacuum chambers may be provided in the chamber housing. In other words, the chamber housing may be configured as a vacuum chamber housing, or the coating chamber may be configured as a vacuum chamber.

[0022] For example, the component-related term "mounting structure" herein refers to a mounting assembly (e.g., a chamber housing) as a whole (e.g., in a vacuum chamber), also known as a mounting assembly, for example, for mounting a component. The mounting structure described herein can be particularly configured for form-fitting mounting (e.g., mounting by form-fitting), and for this purpose, the mounting structure can have one or more form-fitting profiles configured for this purpose. Form-fitting mounting includes, for example, screwing, nailing, riveting, clamping. For example, the mounting structure can be configured to fasten and / or position one or more components in the interior of the chamber. The mounting assembly includes, for example, a frame, a bracket, a support, one or more openings (e.g., having threads or other form-fitting profiles on the inner edge thereof), one or more protrusions (e.g., having threads or other form-fitting profiles on the outer edge thereof). For example, the mounting structure can be integrated (e.g., embedded) into the wall of the vacuum chamber, for example, in the form of a recess and / or a threaded hole. For example, the mounting structure can be connected to the wall of the vacuum chamber (e.g., by screws, rivets, etc.; for example, by material-fitting connection, such as welding). For example, the mounting structure enables precise positioning and alignment of the component to be mounted. For example, the mounting structure is designed to not affect the vacuum within the vacuum chamber (eg, not outgas, seal leak, etc.) when it is fastened to or in the vacuum housing wall (also referred to as the housing wall).

[0023] Regarding installation, it can be understood that the installation does not necessarily take the form-fitting approach, but can be completed in a material-fitting approach (e.g., by welding, gluing, and / or brazing) instead or in addition. For example, the gas separation structure is not necessarily installed only through the mounting structure, but can be installed on, for example, the shell wall in a material-fitting approach instead or in addition. The installation described herein through the mounting structure can be understood by analogy as material-fitting installation, for example, omitting the mounting structure.

[0024] As used herein, the term "gas separation structure" refers to a device configured for gas separation, such as a gas separation assembly as a whole. Various processes in a vacuum may require gas separation (also known as gas separation), which inhibits gas exchange, such as gas exchange along a conveying path (along which a conveying surface runs). For example, a substrate may be conveyed through different vacuum chambers, and the process conditions provided in these vacuum chambers are different from each other, so gas separation is required to inhibit the mixing of different process conditions. Gas separation explicitly describes the difference in gas pressure and / or gas composition between regions (such as gas separation regions) that are interconnected by vacuum technology. Components that facilitate gas separation (such as components of a gas separation structure) can be configured so that the difference in gas pressure or gas composition between regions (such as gas separation regions) that are interconnected by vacuum technology can be maintained (e.g., stable). In other words, the gas exchange between regions that are interconnected and gas-separated from each other by vacuum technology can be reduced, for example, the more gas separation between regions, the less gas exchange.

[0025] On the one hand, gas separation can be based on suppressing the free diffusion of gas particles, such as mechanical diffusion (e.g., by scattering and / or reflecting particles) and / or by pumping away particles. The gas separation structure or at least its components, for example, include: a wall-like component (also known as a gas separation wall body), a channel-like component (also known as a gas separation channel), an opening (also known as a gas separation opening), etc. An exemplary embodiment of the gas separation structure includes a gas separation channel, the internal fluid of which connects two regions in a conductive manner. The longer the distance connecting the two regions through the gas separation channel, the greater the gas separation. The gas separation channel may have a plurality of channel walls (e.g., a gas separation wall body), wherein one or more of the channel walls are optionally penetrated by a gas separation opening or at least adjacent to the gas separation opening. The gas separation opening allows gas particles to pass through the inside of the gas separation channel, thereby suppressing the diffusion of gas particles through the gas separation channel. Alternatively or additionally, the gas separation opening may be coupled to a vacuum pump, which will suppress the bidirectional gas exchange through the gas separation opening from reaching an equilibrium state, for example, facilitating the pumping away of gas particles from the inside of the gas separation channel. Another exemplary embodiment of the gas separation structure includes a gas separation wall that mechanically separates two regions, thereby inhibiting gas exchange between the two regions. The more and / or larger the openings that penetrate the gas separation structure in one direction, the less gas separation the gas separation structure will have in this direction.

[0026] The embodiments described herein include "gas separation structures" and "gas separation walls", which are two different devices for providing gas separation. For example, the gas separation provided by the gas separation structure may be less than the gas separation provided by the gas separation wall (e.g., in a direction transverse to the conveying surface).

[0027] For example, the gas separation structure may be fastened, for example, to one or more walls of the vacuum chamber via one or more mounting structures within the vacuum chamber. For example, individual gas separation structures and / or individual gas separation walls may be fastened to each other.

[0028] Herein, a gas separation structure refers, for example, to a component in a vacuum system that is configured to separate gas components from each other. For example, a gas separation structure may divide a space (e.g., inside a chamber) into two regions. For example, the gas separation structure may be configured so that gas can be transferred between the two regions. For example, the gas separation structure may have one or more openings (also known as through holes), thereby allowing gas transfer. Alternatively or additionally, the gas separation structure and the chamber wall of the vacuum chamber may define two regions, but the chamber wall and the gas separation structure are arranged at a certain distance from each other, thereby forming an opening in this distance, thereby allowing gas exchange between the two regions.

[0029] For example, a gas partition wall refers to a component that can separate gas between two areas (not necessarily vacuum-tight). For example, a gas partition wall can isolate different areas in a vacuum chamber or vacuum system from each other with respect to gas exchange (also known as "gas-tight mutual separation"). The gas partition wall can, for example, form (e.g. become) a barrier between two areas, thereby inhibiting (e.g. preventing) (direct) gas exchange between the two areas.

[0030] According to various aspects, the vacuum chamber can be configured to be coupled to a vacuum pump, such as a high vacuum pump. Advantageously, for example, the vacuum pump is directly attached to the vacuum chamber (e.g., from the outside). This allows, for example, a better suction effect to be achieved. For example, the vacuum chamber can have a pump interface to which the vacuum pump is attached, and the vacuum pump can pump the interior space of the vacuum chamber via the pump interface. For example, a pipeline can be installed at the pump interface to connect to the vacuum pump. This allows, for example, multiple vacuum chambers to be pumped by the vacuum pump. For example, the pump interface can have (e.g., be) a flange and / or be flange-shaped.

[0031] Various aspects of the present invention relate to conveying a substrate. For example, the direction of movement of the conveying substrate may be referred to as the conveying direction. For example, the plane along which the substrate is conveyed in the conveying direction may be referred to as the conveying surface. For example, the conveying surface may extend through multiple vacuum chambers and / or be provided by multiple conveying rollers, for example, adjacent to the conveying surface. This allows, for example, conveying the substrate through multiple chambers. This is, for example, advantageous for performing continuous processing.

[0032] Figure 1A and Figure 1B Schematic diagrams of various aspects of the vacuum chamber housing 100 according to various embodiments are shown respectively.

[0033] The vacuum chamber housing 100 may include a plurality of housing walls 110 , and a chamber interior 120 is formed between the housing walls 110 .

[0034] According to various aspects, the chamber interior 120 can be divided into a first region 121 and a second region 122. For example, these regions can be separated by a gas partition wall 140 (see Figure 1B ) are separated from each other (e.g., separated in an airtight manner). For example, the gas partition wall 140 can be configured to inhibit (e.g., completely prevent) gas exchange between the first region 121 and the second region 122 (e.g., separate these regions from each other in a liquid-tight manner). For example, the gas partition wall 140 can be positioned (e.g., installed) inside the chamber interior 120. For example, the gas partition wall 140 can achieve functional separation of the first region 121 and the second region 122. For example, the first region 121 can be used for gas separation and substrate transfer, while the second region 122 can be used to pump adjacent vacuum chambers.

[0035] For example, the gas partition wall 140 can be mounted in the chamber interior 120 via a first mounting structure 141. For example, the first mounting structure 141 can be fastened (e.g., integrated) to / on the plurality of shell walls 110 (at least one of the shell walls). For example, the first mounting structure 141 can be positioned between the first region and the second region. For example, Figure 1A It is shown that no gas partition wall 140 is attached to the first mounting structure 141 in the vacuum chamber housing 100 .

[0036] For example, the substrate can be conveyed through the vacuum chamber housing 100 along a conveying surface 130 extending within the first region. For example, the substrate can be conveyed in a conveying direction along the conveying surface 130. For example, the conveying surface 130 can represent a conveying path of the substrate through the vacuum chamber housing 100. For example, the conveying surface 130 can feature conveying rollers (not shown) that can be used to convey the substrate.

[0037] According to various aspects, the plurality of housing walls 110 may include a first pair of housing walls 110a. Each of the housing walls in the first pair of housing walls 110a may have a substrate transfer opening 112 extending through the transfer surface 130. For example, the substrate transfer opening 112 may lead to the first area 121.

[0038] According to various aspects, the gas separation structure 150 can be arranged between the conveying surface 130 and the second area 121 (see Figure 1B ). For example, the gas separation structure 150 can inhibit gas exchange between the first vacuum chamber (also known as the front vacuum chamber, located before the vacuum chamber housing 100 with respect to the conveying direction) and the second vacuum chamber (also known as the rear vacuum chamber, located after the vacuum chamber housing 100 with respect to the conveying direction). For example, the gas separation structure 150 can restrict the conveying surface 130 so that particles (e.g., (gas) molecules, atoms, ions) accompanying the substrate entering the vacuum chamber housing 100 from the front vacuum chamber or the rear vacuum chamber remain in the first region 121 of the vacuum chamber housing 100, such as extracting the particles therefrom. For example, the gas separation structure 150 can inhibit gas from flowing from the first region 121 into the rear vacuum chamber.

[0039] For example, the gas partition structure 150 can be positioned (e.g., mounted) within the first region 121. For example, the gas partition structure 150 can be mounted within the chamber interior 120 via a second mounting structure 151. For example, the second mounting structure 151 can be fastened (e.g., integrated) into / on the plurality of walls 110 (at least one of the walls). For example, the second mounting structure 151 can be positioned between the conveying surface 130 and the second region 122, such as between the conveying surface 130 and the gas partition 140 and / or the first mounting structure 141. For example, Figure 1A The vacuum chamber housing 100 is shown without any gas separation structure 150 attached to the second mounting structure 151 .

[0040] According to various aspects, at least one of the plurality of walls 110 can be penetrated by a suction port 114. For example, the suction port 114 can lead to the second region 122. For example, the suction port 114 can extend into a vacuum chamber adjacent to the vacuum chamber housing 100, such as into a post-vacuum chamber. For example, the suction port 114 can fluidly connect the chamber interior 120 of the vacuum chamber 114 to the chamber interior of the post-vacuum chamber. This allows gas exchange between the vacuum chamber housing 100, and in particular the second region 122, and the chamber interior of the post-vacuum chamber. This allows, for example, the chamber interior of the post-vacuum chamber to be pumped through the second region 122 via the suction port 114.

[0041] According to various aspects, the vacuum chamber housing 100 can include a plurality of pump interfaces. The plurality of pump interfaces can, for example, lead into the chamber interior 120. For example, the pump interface can be formed as a flange to which the vacuum pump can be fastened. Alternatively or additionally, the plurality of housing walls with pump interfaces can have flanges to which the vacuum pump can be fastened. For example, one or more of the plurality of housing walls can each have one or more of the plurality of pump interfaces.

[0042] For example, the second pair of shell walls 110b may each have a pump interface. For example, the first shell wall (e.g., referred to as the lower shell wall) of the second pair of shell walls 110b adjacent to the first region 121 may have a first pump interface 116. For example, the first pump interface 116 may lead to the first region 121. In this way, the interior 120 of the chamber, for example, the first region 121, can be pumped, for example, via the first pump interface 116. For example, the second shell wall (e.g., referred to as the upper shell wall) of the second pair of shell walls 110b adjacent to the second region 122 may have a second pump interface 117. For example, the second pump interface 117 may lead to the second region 122. In this way, the interior 120 of the chamber, for example, the second region 122, can be pumped, for example, via the second pump interface 117.

[0043] For example, Figure 1B The gas separation wall 140 is installed in / on the first installation structure 141 , and the gas separation structure 150 is installed in / on the second installation structure 151 .

[0044] Figure 2A and Figure 2B Schematic diagrams of various aspects of the vacuum chamber housing 100 according to various embodiments are shown. For example, the vacuum chamber housing 100 may have an additional gas separation structure 153 (see Figure 2B ). For example, the additional gas separation structure 153 allows for improved gas separation between the front vacuum chamber and the rear vacuum chamber.

[0045] For the convenience of description, the gas separation structure 150 is also referred to as an upper gas separation structure 150, and the additional gas separation structure is also referred to as a lower gas separation structure 153. For example, the side of the conveying surface 130 on which the lower gas separation structure 153 is arranged may be opposite to the side of the conveying surface 130 on which the upper gas separation structure 150 is arranged. For example, the lower gas separation structure 153 may be arranged on the side of the conveying surface 130 away from the second area 122. For example, the upper gas separation structure 150 may be arranged above the conveying surface 130, and the lower gas separation structure 153 may be arranged below the conveying surface 130.

[0046] For example, the lower gas partition structure 153 can be positioned (e.g., mounted) in the first region. For example, the lower gas partition structure 153 can be mounted in the chamber interior 120 via the third mounting structure 152. For example, the third mounting structure 152 can be fastened (e.g., integrated) to / on the plurality of walls 110 (at least one of the walls 110). For example, the third mounting structure 152 can be positioned on a side of the conveying surface 130 facing away from the second region 122. For example, Figure 2A The vacuum chamber housing 100 is shown without any lower gas separation structure 153 attached to the third mounting structure 152 .

[0047] For example, Figure 2A In the embodiment, the second mounting structure 151 and the third mounting structure 152 are individually positioned in / on different shell walls among the plurality of shell walls 110. However, it should be understood that the above positioning is not limited to this. For example, the second mounting structure 151 and the third mounting structure 152 can be positioned in the same shell wall. Alternatively or additionally, the second mounting structure 151 and / or the third mounting structure 152 can be in a multi-piece configuration so that they can be positioned in / on several shell walls among the plurality of shell walls 110.

[0048] For example, Figure 2B In the embodiment, the gas separation wall 140 is installed in the first installation structure 141 , the upper gas separation structure 150 is installed in the second installation structure 151 , and the lower gas separation structure 153 is installed in the third installation structure 152 .

[0049] Figure 3A and Figure 3B Schematic diagrams of various aspects of the vacuum chamber housing 100 according to various embodiments are shown respectively. Figure 3A The view in is along Figure 3B Schematic cross-sectional view of the center line AA, Figure 3B The view in is along Figure 3A Schematic cross-sectional view along line BB.

[0050] For example, the gas separation wall 140 , the upper gas separation structure 150 , and the lower gas separation structure 153 may be arranged in the chamber interior 120 , as described above, for example, by associated mounting elements or by materially fitting connections.

[0051] For example, the first substrate transfer port 112 can connect the first region 121 to the chamber interior of the front vacuum chamber in a fluid conductive manner, so it is called the front substrate transfer port 112. For example, the shell wall penetrated by the front substrate transfer port 112 can be called the front shell wall. In addition, the second substrate transfer port 112 can connect the first region 121 to the chamber interior of the rear vacuum chamber in a fluid conductive manner, so it is called the rear substrate transfer port 112. For example, the shell wall penetrated by the rear substrate transfer port 112 can be called the rear shell wall.

[0052] For example, both the upper gas separation structure 150 and the lower gas separation structure 153 may extend from the front shell wall to the rear shell wall. This may, for example, form a transfer channel along which the transfer surface extends. The transfer channel may extend through the first region 121. For example, the transfer channel may be open (e.g., open volume), e.g., one side of the transfer channel may be defined by the upper gas separation structure 150 and the lower gas separation structure 153, but may have (at least one) open side from which particles may move out of the transfer channel. For example, the transfer channel may be open at least laterally.

[0053] For example, Figure 3B The view shows the conveying surface 130 protruding into the paper plane, ie the vacuum chamber housing 100 is shown in the conveying direction.

[0054] For example, both the upper gas separation structure 150 and the lower gas separation structure 153 may be spaced apart from the side shell wall 110c of the plurality of shell walls 110 by a certain distance d. With this distance, for example, particles entering the first region 121 through the front substrate transfer port 112 may reach a portion of the first region 121 separated from the transfer surface by the gas separation structure. For example, the particles may be removed from this portion. For example, the particles may enter the region above the upper gas separation structure 150 or below the lower gas separation structure 153. In this way, the gas separation structure may prevent gas from escaping from the first region through the rear substrate transfer port 112 into the rear vacuum chamber.

[0055] According to various aspects, the upper gas separation structure 150 and / or the lower gas separation structure 153 can each be penetrated by one or more through holes 160. For example, particles can move through the passage openings 160. In this way, the particles can, for example, move away from the conveying surface 130 through the gas separation structure into the first region 121. This can, for example, promote gas separation.

[0056] Figure 4A Schematic diagrams of various aspects of a vacuum chamber housing 100 according to various embodiments are shown, wherein an upper gas separation structure 150 is penetrated by a plurality of through holes 160 .

[0057] Figure 4BSchematic diagrams of various aspects of a gas separation structure 150 according to various embodiments are shown, wherein the gas separation structure 150 is penetrated by a plurality of through holes 160 (hence also referred to as a through structure 150 ).

[0058] For example, a plurality of through holes 160 may be arranged in a row. Figure 4A Two through holes 160 are shown in FIG. Figure 4B Two rows of through holes are shown in FIG.

[0059] For example, the first row of the two rows may be spaced apart from a certain shell wall of the plurality of shell walls (e.g., the front shell wall) by a first spacing 161. For example, the second row of the two rows may be spaced apart from the first row of the two rows by a second spacing 162. For example, the second row of the two rows may be spaced apart from another shell wall of the plurality of shell walls (e.g., the rear shell wall) by a third spacing. In this way, for example, three gas separation channels may be formed, each of which has a width associated with, for example, equal to, the first spacing 161, the second spacing 162, or the third spacing 163. For example, the width of the gas separation channel or the three spacings may correspond to the free path length of the particles inside the chamber, respectively. For example, the through holes 160 (e.g., the through hole arrangement) may be spaced apart from each other so that the spacing is less than the free path length of the particles. In this way, for example, a particle that has already moved through one of the through holes (e.g., away from the conveying surface) cannot move through one of the through holes again (e.g., toward the conveying surface).

[0060] Figure 5A Schematic diagrams of various aspects of a vacuum chamber housing 100 along a conveying direction are shown according to various embodiments, the vacuum chamber housing also having one or two lateral gas separation structures 155a, 155b.

[0061] For example, both lateral gas separation structures 155a, 155b may extend from the upper gas separation structure to the lower gas separation structure. For example, the two lateral gas separation structures 155a, 155b may each have one or more through holes 160. For example, the upper gas separation structure 150 may define the conveying surface 130 (e.g., upward) and / or extend along the conveying direction and / or along the conveying surface. For example, the lower gas separation structure 153 may define the conveying surface 130 (e.g., downward) and / or extend along the conveying direction and / or along the conveying surface. For example, the first gas separation structure (e.g., the left gas separation structure) 155a of the two lateral gas separation structures 155a, 155b may define the conveying surface 130 (e.g., the side, e.g., the left side of the conveying surface) and / or extend along the conveying direction and / or along the conveying surface. For example, the second gas partitioning structure (eg, right gas partitioning structure) 155b of the two lateral gas partitioning structures 155a, 155b may define the conveying surface 130 (eg, a side surface, eg, right side of the conveying surface) and / or extend along the conveying direction and / or along the conveying surface.

[0062] Thus, for example, the gas separation structure can provide a gas separation transfer channel (also referred to as a gas separation channel) surrounding the transfer surface. Particles transferred from the fore-vacuum chamber via the substrate transfer port into the vacuum chamber housing can, for example, move in the transfer channel into the chamber interior 120. For example, the particles can leave the transfer channel through the through hole 160 (in the gas separation structure). Then, the particles can be pumped out, for example, by a vacuum pump via the first pump interface 116.

[0063] For example, two lateral gas separation structures 155a, 155b can be positioned (e.g., mounted) within the first region. For example, two lateral gas separation structures 155a, 155b can each be mounted within the chamber interior 120 via a respective fourth mounting structure 154. For example, the respective fourth mounting structure 154 can be fastened (e.g., integrated) into / on the plurality of walls 110 (at least one of the walls). For example, the respective fourth mounting structure 154 can be positioned between the second mounting structure 151 and the third mounting structure 152, such as between the upper gas separation structure 150 and the lower gas separation structure 153.

[0064] Figure 5B Schematic diagrams of various aspects of the housing wall 110 along the conveying direction according to various embodiments are shown. For example, the housing wall 110 may have a substrate conveying port 112 .

[0065] For example, the housing wall 110 may have a first mounting structure 141 for mounting the gas partition wall body 140. The first mounting structure 141 may, for example, be mounted on the housing wall 110, connected to the housing wall 110 in a material-fitting manner, and / or integrated into (e.g., embedded in) the housing wall 110. Alternatively or additionally, the housing wall 110 may have a second mounting structure 151 for mounting a gas partition structure (e.g., an upper gas partition structure) 150. The second mounting structure 151 may, for example, be mounted on the housing wall 110, connected to the housing wall 110 in a material-fitting manner, and / or integrated into (e.g., embedded in) the housing wall 110. Alternatively or additionally, the housing wall 110 may have a third mounting structure 152 for mounting an additional gas partition structure (e.g., a lower gas partition structure) 153. The third mounting structure 141 may, for example, be mounted on the housing wall 110, connected to the housing wall 110 in a material-fitting manner, and / or integrated into (e.g., embedded in) the housing wall 110.

[0066] For example, the housing wall 110 may have a plurality of (e.g., two) fourth mounting structures 154 for mounting lateral gas partition structures (e.g., left gas partition structure and right gas partition structure) 155a, 155b. The fourth mounting structure 141 may be, for example, mounted on the housing wall 110, connected to the housing wall 110 in a material-fitting manner, and / or integrated into (e.g., embedded in) the housing wall 110.

[0067] Fig. 6A and Figure 6BSchematic diagrams of various aspects of the vacuum chamber housing 100 according to various embodiments are shown. For example, the vacuum chamber housing 100 may further include a central partition wall 170 .

[0068] For example, the central partition wall can be an additional gas partition wall or other additional gas partition structure. For example, the central partition wall 170 can be positioned (e.g., installed) in the first area 121. For example, the central partition wall can divide the first area 121 into a first part 121a and a second part 121b. This can, for example, enhance the gas separation in the first area. For example, the probability of particles leaving the transfer channel re-entering the transfer channel can be reduced, thereby improving the gas separation. For example, the transfer surface 130 and, for example, the transfer channel can pass through the opening of the central partition wall 170.

[0069] Alternatively or additionally, the central partition wall 170 can divide the first pump connection 116 into a first partial connection 116a and a second partial connection 116b. For example, the first partial connection 116a can lead to the first portion 121a. For example, the first portion 121a can be pumped via the first partial connection 116a. For example, the second partial connection 116b can lead to the second portion 121b. For example, the second portion 121b can be pumped via the second partial connection 116b. In this way, for example, the pumping power from the vacuum pump can be distributed to two parts of the first region 121.

[0070] For example, the central partition wall 170 may be mounted in the chamber interior 120 via a fifth mounting structure 171. For example, the fifth mounting structure 171 may be fastened (e.g., integrated) to / on the plurality of shell walls 110 (at least one of the shell walls 110). Alternatively or additionally, the fifth mounting structure 171 may be fastened (e.g., integrated) to / on one or more (at least one) of the lower gas partition structure, the upper gas partition structure, the lateral gas partition structure, and the gas partition wall body.

[0071] For example, the second mounting structure 151 may be positioned between the conveying surface 130 and the second region 122, such as between the conveying surface 130 and the gas partition 140 and / or the first mounting structure 141. Figure 6B The vacuum chamber housing 100 is shown with the fifth mounting structure 171 without any central bulkhead 170 attached thereto.

[0072] Fig. 7ASchematic diagrams of various aspects of a vacuum chamber housing 100 according to various embodiments are shown. As described herein, the vacuum chamber housing 100 may have a suction port 114 through which the chamber interior of an adjacent vacuum chamber can be pumped. According to various aspects, the vacuum chamber housing 100 may also include a suction port closure 115, which is configured to close (e.g., liquid-tightly close) the suction port. This allows, for example, the processing chamber or the second area 122 to be ventilated, while other areas do not need to be ventilated. For example, the suction port closure 115 can be movably arranged. This allows, for example, the suction port closure 115 to be moved in front of the suction port 114 to close it and away from the suction port 114 to open it. For example, the suction port closure 115 can be moved by a motor. For example, the suction port closure 115 can be coupled to a control device, which is configured to move the suction port closure 115 (so as to, for example, close and / or open the suction port 114). It goes without saying that for this configuration, the gas partition wall 140 must be designed to be sufficiently stable so as to withstand the pressure difference that may exist between the first region 121 and the second region 122. This can be achieved, for example, by appropriately selecting materials and / or a sufficiently thick gas partition wall 140 (e.g., between the first region 121 and the second region 122). It should also be understood that the thickness and / or material selection can be adjusted according to the specific use of the vacuum chamber.

[0073] Figure 7B Schematic diagrams of various aspects of a vacuum chamber housing 100 according to various embodiments are shown. As described herein, the vacuum chamber housing 100 may include a first pump interface 116 in a lower wall of the second pair of walls 110b and a second pump interface 117 in an upper wall of the second pair of walls 110b.

[0074] For example, the vacuum chamber housing 100 can be fluidically coupled to the first vacuum pump 181. For example, the first vacuum pump can be directly coupled to the lower housing wall so as to establish a fluid-conductive connection from the chamber interior 120 to the first vacuum pump 181. For example, the lower housing wall can have a flange connection and / or the first pump interface 116 can be designed as a flange connection so that the first vacuum pump 181 can be directly mounted thereon. For example, the first vacuum pump 181 can be fluidically coupled to the first pump interface 116 via a line (not shown) such as a pipe, a hose, etc. In this way, the first vacuum pump 181 can pump the first region 121 of the chamber interior 120, the first portion 121a of the first region 121, and / or the second portion 121b of the first region 121.

[0075] For example, the vacuum chamber housing 100 can be fluidically coupled to the second vacuum pump 182. For example, the second vacuum pump can be directly coupled to the upper housing wall so as to establish a fluid-conductive connection from the chamber interior 120 to the second vacuum pump 182. For example, the upper housing wall can have a flange connection and / or the second pump interface 117 can be designed as a flange connection so that the second vacuum pump 182 can be directly mounted thereon. For example, the second vacuum pump 182 can be fluidically coupled to the second pump interface 117 via a line (not shown) such as a pipe, a hose, etc. In this way, the second vacuum pump can couple the second region 122 to the chamber interior of an adjacent vacuum chamber, which is fluidically coupled to the second region 122 via the suction port 114.

[0076] Figure 8 Schematic diagrams of various aspects of the vacuum assembly 10 according to various embodiments are shown. As described herein, according to various embodiments, the post-vacuum chamber 200 can be arranged adjacent to the vacuum chamber housing 100 (referred to as the combined vacuum chamber housing 100). For example, the post-vacuum chamber 200 can be a processing chamber having, for example, a processing device 280 (e.g., a sputtering device such as a magnetron).

[0077] For example, the transfer surface 130 may extend through the combined vacuum chamber housing 100 and the post-vacuum chamber 200. This allows a substrate to be transferred from the combined vacuum chamber 114 to the post-vacuum chamber 200 via the substrate transfer port 112. At the same time, this also allows particles from the post-vacuum chamber 200 to enter the first region 121 of the combined vacuum chamber via the substrate transfer port 112. However, due to the gas separation structure, the particles can be prevented from entering the fore-vacuum chamber (not shown) arranged before the combined vacuum chamber with respect to the transfer direction.

[0078] For example, the chamber interior 120 of the post vacuum chamber 200 may be fluidly connected to the second region 122 of the chamber interior 120 of the combined vacuum chamber housing 100, for example, via the suction port 114. The chamber interior of the post vacuum chamber 200 may be pumped via the suction port 114.

[0079] In this way, the combined vacuum chamber can provide both pumping function for the adjacent vacuum chamber and gas separation function during substrate transfer.

[0080] 9A to 9C Schematic diagrams of various aspects of the vacuum assembly 10 according to various embodiments are shown. For example, Fig. 9AThe vacuum assembly 10 is shown to have a front vacuum chamber 300a, a first rear vacuum chamber 200, and a second rear vacuum chamber 300b, wherein the front vacuum chamber 300a is arranged before the combined vacuum chamber in terms of the conveying direction, the first rear vacuum chamber 200 is arranged after the combined vacuum chamber in terms of the conveying direction, and the second rear vacuum chamber 300b is arranged after the first rear vacuum chamber 200 in terms of the conveying direction. For example, the front vacuum chamber 300a and the second rear vacuum chamber 300b may adopt the same design. For example, the first rear vacuum chamber 200 may be designed as a processing chamber 200. For example, Fig. 9B and Fig. 9C They are shown respectively Fig. 9A A schematic cross-sectional view of a vacuum assembly shown in FIG. Fig. 9B The combined vacuum chamber is shown in FIG. Fig. 9B A second post-vacuum chamber is shown in FIG.

[0081] According to various aspects of the knowledge, in conventional vacuum systems, a vacuum pump is attached to only one side of a vacuum chamber (e.g., configured as a compartment). It is also recognized that a vacuum pump is either used only for gas separation or only for pumping the compartment. For example, a division between gas separation and pumping can be performed along the substrate transport direction, but the pumping capacity and / or gas separation distance will decrease proportionally.

[0082] According to various aspects, an apparatus capable of providing a vacuum for a sputtering process is described herein. The apparatus can also provide gas separation within a system compartment. This allows for a reduction in system size, for example, by reducing the number of vacuum chambers or compartments, without losing the original functionality. For this purpose, for example, the gas separation and pumping speed of multiple vacuum chambers or compartments can be combined into a vacuum chamber or compartment. This can, for example, provide the same process pumping speed and gas separation factor as a purely pumped compartment (e.g., a pumping chamber) or a gas separation compartment (e.g., a barrier chamber).

[0083] According to various aspects, the vacuum system described herein has a plurality of vacuum chambers, so-called compartments. A plurality of pumps may be attached to opposite sides (e.g., upper and lower sides and / or front and rear sides) of one of the plurality of vacuum chambers. In addition, the vacuum chamber may have an intermediate layer, also known as a gas separation wall, which extends transversely to the conveying direction, so that the interior of the vacuum chamber is divided into two independent vacuum regions (e.g., a first region and a second region, e.g., an upper region and a lower region, etc.).

[0084] This allows, for example, gas separation and substrate transfer in a first (eg lower) of two independent vacuum regions, while pumping, for example from an adjacent vacuum chamber, is performed in a second (eg upper) of the two independent vacuum regions.

[0085] The intermediate layer thus makes it possible to combine the functions of several vacuum chambers into one vacuum chamber. This makes it possible, for example, to reduce the number of vacuum chambers in the vacuum system. Since the number of required vacuum chambers is reduced, the system length can be shortened, thereby, for example, also reducing the extraction volume and thus the overall energy consumption of the vacuum system. Furthermore, since less steel structure is required to provide the vacuum chamber, the material costs can also be reduced.

[0086] According to various aspects, the vacuum chamber may also have a central partition wall, for example in the second of the two independent vacuum regions. For example, the central partition wall may divide the second vacuum region into a left region and a right region, and in turn divide the pumping speed of the vacuum pump into the left region process and the right region process. The specific design of the vacuum chamber described herein depends on the respective system configuration and whether the processes carried out therein should / must be pumped symmetrically.

[0087] The following description relates to various examples described above and depicted in the accompanying drawings.

[0088] Example 1. A vacuum chamber housing may include: a plurality of shell walls, forming a chamber interior therebetween; a first mounting structure for mounting a gas separation wall between a first region and a second region inside the chamber; wherein each shell wall of a first pair of shell walls among the plurality of shell walls: has a substrate conveying port extending along a conveying surface to the first region; a second mounting structure for mounting a gas separation structure (such as a gas separation channel or at least a channel wall) between the conveying surface in the first region and the second region; wherein more than one shell wall among the plurality of shell walls (such as the first pair of shell walls) has a suction port extending to the second region; wherein the vacuum chamber housing further includes: a first pump interface extending to the first region; and a second pump interface extending to the second region.

[0089] Example 2. The vacuum chamber shell according to Example 1 optionally also includes: a gas separation wall body installed on a first mounting structure between the first area and the second area; and / or a gas separation structure (such as a gas separation channel or at least a channel wall) installed on a second mounting structure between the conveying surface in the first area and the second area.

[0090] For example, the gas separation provided by the gas separation structure (e.g., the gas separation channel or at least the channel wall) (e.g., along the conveying direction of the conveyable substrate through the vacuum chamber housing) may be less than the gas separation provided by the gas separation wall. For example, the gas separation may be normalized to a distance length.

[0091] Example 3. A vacuum chamber shell may include: a plurality of shell walls, forming a chamber interior therebetween; wherein each shell wall among the plurality of shell walls (e.g., a first pair of shell walls) is penetrated along a conveying surface by a substrate conveying port leading to a first region inside the chamber; a gas separation wall body installed between the first region and the second region; a gas separation structure (e.g., a gas separation channel or at least a gas separation wall) installed between the second region and the conveying surface in the first region, for example, the gas separation provided by the gas separation structure (e.g., along the conveying direction of the conveyable substrate through the vacuum chamber shell) is less than the gas separation provided by the gas separation wall body; a first pump interface leading to the first region; and a second pump interface leading to the second region; wherein at least one shell wall among the plurality of shell walls (e.g., a first pair of shell walls) is penetrated by a suction port leading to the second region.

[0092] Example 4. A vacuum chamber shell may include: a plurality of shell walls forming a chamber interior therebetween, each of the plurality of shell walls (e.g., a first pair of shell walls) having a substrate transfer port extending along a transfer surface to the chamber interior, wherein at least one of the plurality of shell walls (e.g., the first pair of shell walls) having a suction port extending to the chamber interior; a gas separation wall for separating the chamber interior into a first region and a second region; a gas separation structure (e.g., a gas separation channel or at least a channel wall) for providing gas separation along the transfer surface, the gas separation provided by the gas separation structure being less than the gas separation provided by the gas separation wall (e.g., along the transfer direction); a first pump interface (e.g., leading to the first region) and a second pump interface (e.g., leading to the second region), both of which, for example, lead to the chamber interior.

[0093] Example 5. A vacuum chamber shell according to any one of Examples 1 to 4, wherein each shell wall among the multiple shell walls (e.g., a first pair of shell walls) is penetrated by a corresponding substrate transfer port along the transfer surface, and for example, a third mounting structure is provided for mounting an additional gas separation structure (e.g., a channel wall) on a side of the transfer surface in the first region away from the second mounting structure.

[0094] Example 6. The vacuum chamber housing according to Example 5 may optionally further include: an additional gas separation structure mounted on the third mounting structure, for example, extending in the same direction as the gas separation structure (for example, parallel to the gas separation structure).

[0095] Example 7. The vacuum chamber shell according to any one of Examples 1 to 6 may optionally further include: an additional gas separation structure installed on the side of the conveying surface opposite to the gas separation structure in the first region (for example, on a third mounting structure), for example, the additional gas separation structure provides less gas separation than the gas separation provided by the gas separation wall (for example, along the conveying direction of the conveyable substrate through the vacuum chamber shell).

[0096] Example 8. The vacuum chamber housing according to any one of Examples 1 to 7, wherein the gas separation structure has more than one through hole passing through it.

[0097] Example 9. The vacuum chamber housing according to any one of Examples 1 to 8, wherein the additional gas separation structure penetrates through more than one through hole.

[0098] Example 10. A vacuum chamber shell according to Example 9, wherein a first through hole among the one or more through holes is arranged between a first shell wall and a second shell wall among a plurality of shell walls, and the second shell wall is, for example, opposite to the first shell wall to form a first gas separation channel extending from the first shell wall toward the first through hole and a second gas separation channel extending from the first through hole toward the second shell wall, for example, both the first shell wall and the second shell wall are penetrated by a substrate transfer port.

[0099] Example 11. A vacuum chamber shell according to Example 10, wherein a plurality of through holes are arranged between a first shell wall and a second shell wall among a plurality of shell walls, and the second shell wall is opposite to the first shell wall, so that, for example, a first gas separation channel is formed between a first through hole among the plurality of through holes and the first shell wall, a second gas separation channel is formed between the first through hole and the second through hole, and a third gas separation channel is formed between the second through hole and the second shell wall.

[0100] For example, optionally, the first shell wall and the second shell wall may be penetrated by corresponding substrate transfer openings.

[0101] Example 12. A vacuum chamber housing according to any one of Examples 9 to 11, wherein the plurality of through holes comprises more than one row of through holes arranged in sequence along a conveying direction, and / or, for example, multiple rows of through holes juxtaposed transversely to the conveying direction.

[0102] Example 13. The vacuum chamber housing according to any one of Examples 9 to 12, wherein the spacing between adjacent through holes in the plurality of through holes deviates from a predetermined value by less than 20%.

[0103] Example 14. A vacuum chamber housing according to one of Examples 1 to 13, wherein each of the multiple shell walls having a corresponding substrate transfer port passing through the transfer surface has a fourth mounting structure for mounting one or more lateral gas separation structures extending away from the second area in the first area.

[0104] For example, the first lateral gas partitioning structure and the second lateral gas partitioning structure may be arranged on opposite sides of the conveying surface.

[0105] Example 15. The vacuum chamber housing according to Example 14 may further include: a first lateral gas separation structure and / or a second lateral gas separation structure mounted on a fourth mounting structure, for example, the first lateral gas separation structure is opposite to the second lateral gas separation structure.

[0106] Example 16. A vacuum chamber housing according to any one of Examples 1 to 15, wherein the plurality of shell walls have a second pair of shell walls, each shell wall in the second pair of shell walls is adjacent to each shell wall in the first pair of shell walls, and has a first pump interface or a second pump interface.

[0107] Example 17. A vacuum chamber housing according to any one of Examples 1 to 16, wherein the plurality of shell walls include a third pair of shell walls, each shell wall of the third pair of shell walls is adjacent to each shell wall of the first pair of shell walls and adjacent to the first region and the second region.

[0108] Example 18. A vacuum chamber shell according to Example 17, wherein the gas separation structure and / or the additional gas separation structure is separated from each shell wall in the third pair of shell walls by a certain distance; and the first lateral gas separation structure and / or the second lateral gas separation structure is separated from each shell wall in the third pair of shell walls by a certain distance.

[0109] Example 19. The vacuum chamber housing of any one of examples 1 to 18, wherein the first lateral gas partitioning structure extends, for example, from the gas partitioning structure to the additional gas partitioning structure.

[0110] Example 20. The vacuum chamber housing of any one of examples 1 to 19, wherein the second lateral gas partitioning structure extends, for example, from the gas partitioning structure to the additional gas partitioning structure.

[0111] Example 21. A vacuum chamber shell according to any one of Examples 1 to 20, wherein the gas separation provided by the gas separation wall between the second region and the first region is greater than the gas separation provided by the gas separation structure between the two parts of the first region, and a gas separation structure and / or a mounting structure is arranged between the two parts of the first region.

[0112] Example 22. The vacuum chamber housing according to any one of examples 1 to 21, wherein the gas separation structure and / or the additional gas separation structure is configured as a channel wall of the transfer channel. For example, the transfer channel may extend along the transfer surface, such as between two substrate transfer ports.

[0113] Example 23. The vacuum chamber housing according to any one of Examples 1 to 22, wherein the first lateral gas partition structure and / or the second lateral gas partition structure are both configured as channel walls of the transfer channel.

[0114] Example 24. The vacuum chamber housing according to any one of Examples 1 to 23 may further include a fifth mounting structure for mounting an additional gas separation wall extending toward the transfer surface and / or the first pump interface in the first region.

[0115] Example 25. The vacuum chamber housing of Example 24, wherein the fifth mounting structure has two parts, and the first pump interface and / or the first area are arranged between the two parts.

[0116] Example 26. The vacuum chamber housing of Example 24 or 25, wherein the housing wall having the first pump interface includes a fifth mounting structure.

[0117] Example 27. The vacuum chamber shell according to any one of Examples 1 to 26 may also include an additional gas partition wall (for example, installed on the fifth mounting structure), which separates the first area into a first part a and a second part b (for example, arranged in sequence with respect to the conveying direction).

[0118] Example 28. The vacuum chamber housing of Example 27, wherein the first portion is fluidically coupled to the second portion via (eg, adjacent to) a first pump interface.

[0119] Example 29. A vacuum chamber housing according to any one of Examples 1 to 28, wherein the gas separation structure and / or the additional gas separation structure and / or the first lateral gas separation structure and / or the second lateral gas separation structure are in the shape of a plate.

[0120] Example 30. In the vacuum chamber shell according to any one of Examples 1 to 29, one or more shell walls may optionally further include a sixth mounting structure at least partially surrounding the suction port, for mounting a suction port closure, wherein the suction port closure is configured to at least partially (e.g., completely liquid-tightly) close the suction port; wherein the vacuum chamber shell may, for example, include a suction port closure mounted via the sixth mounting structure (e.g., within the second region on the shell wall).

[0121] Example 31. The vacuum chamber housing of any one of Examples 1 to 30, wherein the vacuum chamber housing is coupled (e.g., fluidically coupled) to a first vacuum pump that is docked to a first pump interface of the vacuum chamber housing. For example, the first vacuum pump can be configured to pump a first region of the vacuum chamber housing.

[0122] Example 32. The vacuum chamber housing of any one of Examples 1 to 31, wherein the vacuum chamber housing is coupled (e.g., fluidically coupled) to a second vacuum pump that is docked to a second pump interface of the vacuum chamber housing. For example, the second vacuum pump can be configured to pump a second region of the vacuum chamber housing.

[0123] Example 33. A vacuum component (e.g., a vacuum chamber component) may include a vacuum chamber housing according to any one of Examples 1 to 32 and a vacuum chamber (e.g., a vacuum chamber provided by the vacuum chamber housing), the vacuum chamber being adjacent to a suction port and a substrate transfer port of the vacuum chamber housing; for example, a processing device, arranged in the vacuum chamber.

[0124] Example 34. The vacuum assembly according to Example 33 may also include: a mounting structure for mounting a processing device (such as a magnetron) in the vacuum chamber.

Claims

1. A vacuum chamber housing (100), comprising: A plurality of shell walls (110) forming a chamber interior (120) therebetween; A first installation structure (141) is used to install a gas separation wall between a first area (121) and a second area (122) inside the chamber (120); Wherein, each shell wall of the first pair of shell walls in the plurality of shell walls: A substrate conveying port (112) is provided along the conveying surface (130) and leads to the first area (121); A second mounting structure (151) is provided for the conveying surface in the first area (121). (130) installing a gas separation structure between the second region (122); A third mounting structure (152) is provided for mounting an additional gas separation structure on a side of the conveying surface in the first region facing away from the second mounting structure; and wherein at least one shell wall (110) of the first pair of shell walls among the plurality of shell walls is penetrated by a suction port (114) leading to the second area (122); a first pump port (116) leading to the first region; and The second pump interface (117) leads to the second area.

2. The vacuum chamber housing according to claim 1, characterized in that Also includes: a gas partition wall (140), mounted on the first mounting structure (141) between the first region (121) and the second region (122); and / or a gas separation structure (150) mounted on the second mounting structure (151) between the conveying surface (130) in the first area (121) and the second area (122); an additional gas separation structure (153), mounted on the third mounting structure (152) in the first area and extending parallel to the gas separation structure (150); The gas separation provided by the gas separation structure (150) is less than the gas separation provided by the gas separation wall (140).

3. The vacuum chamber housing according to claim 2, wherein: The gas separation structure (150) and the additional gas separation structure (153) are both configured as channel walls of a conveying channel.

4. The vacuum chamber housing according to claim 3, wherein: The substrate conveying port (112) leads to the conveying channel.

5. The vacuum chamber housing according to claim 2, wherein: The additional gas separation structure (153) provides less gas separation than the gas separation provided by the gas separation wall (140).

6. The vacuum chamber housing according to claim 1, characterized in that Also includes: One or more through holes (160), wherein each through hole (160) passes through the gas separation structure (150) or the additional gas separation structure; and / or Wherein, the gas separation structure and / or the additional gas separation structure is in a plate shape.

7. The vacuum chamber housing according to claim 6, in, The first through hole (160a) of the one or more through holes is arranged between a first shell wall (110a) and a second shell wall (110b) of a pair of shell walls, and the second shell wall (110b) is opposite to the first shell wall (110a), thereby forming: a first gas separation channel (161) extending from the first shell wall (110a) to the first through hole (160a), and a second gas separation channel extending from the first through hole (160a) to the second shell wall (110b), Wherein, the first shell wall and the second shell wall are both penetrated by a substrate conveying port.

8. The vacuum chamber housing according to claim 1, in, Each shell wall of the first pair of shell walls has: A fourth mounting structure (154) is used to mount one or more lateral gas separation structures extending from the second region in the first region, Two lateral gas separation structures are arranged on opposite sides of the conveying surface.

9. The vacuum chamber housing according to claim 8, in, A first lateral gas separation structure (155a) of the two lateral gas separation structures extends from the gas separation structure (150) to the additional gas separation structure (153); and / or Among the two lateral gas separation structures, the second lateral gas separation structure (155a) extends from the gas separation structure (150) to the additional gas separation structure (153).

10. The vacuum chamber housing according to claim 1, in, The plurality of shell walls include a second pair of shell walls, each shell wall of the second pair of shell walls is adjacent to each shell wall of the first pair of shell walls and has a first pump interface or a second pump interface; and / or The plurality of shell walls include a third pair of shell walls, each shell wall of the third pair of shell walls is adjacent to each shell wall of the first pair of shell walls, and is adjacent to the first region and the second region.

11. The vacuum chamber housing according to claim 1, wherein: The gas separation wall between the second region and the first region provides more gas separation than a gas separation structure between two parts of the first region, the gas separation structure and / or the mounting structure being arranged between the two parts of the first region.

12. The vacuum chamber housing according to claim 1, in, The one or more shell walls (110) further include: a sixth mounting structure at least partially surrounding the suction port, for mounting a suction port sealing member (115), wherein the suction port sealing member (115) is configured to at least partially seal the suction port (114), The vacuum chamber housing has a suction port closure (115) mounted via the sixth mounting structure.

13. The vacuum chamber housing according to claim 1, wherein Also includes: a first vacuum pump (181) mounted on a first pump interface (116) of the vacuum chamber housing; and / or A second vacuum pump (182) is installed on the second pump interface (117) of the vacuum chamber housing.

14. A vacuum chamber housing (100), comprising: A plurality of shell walls (110) forming a chamber interior (120) therebetween; Each shell wall of the first pair of shell walls among the plurality of shell walls is penetrated by a substrate transfer port (112) along the transfer surface (130) and leads to the interior (120) of the chamber; and wherein at least one of the first pair of shell walls among the plurality of shell walls is penetrated by a suction port (114) leading to the interior (120) of the chamber; A gas partition wall (140) for partitioning the inner part of the chamber into a first area (121) and a second area (122); A gas separation structure (150) for providing gas separation along the conveying surface (130), wherein the gas separation provided by the gas separation structure (150) is less than the gas separation provided by the gas separation wall (140); an additional gas separation structure (153) mounted on a side of the conveying surface (130) opposite to the gas separation structure (150) in the first area; a first pump port (116) leading to the first region; and The second pump interface (117) leads to the second area.

15. The vacuum chamber housing of claim 14, wherein: The gas separation structure (150) and the additional gas separation structure (153) are both configured as channel walls of a conveying channel.

16. The vacuum chamber housing of claim 15, wherein: The substrate conveying port (112) leads to the conveying channel.

17. The vacuum chamber housing of claim 14, wherein: The additional gas separation structure (153) provides less gas separation than the gas separation provided by the gas separation wall (140).

18. The vacuum chamber housing according to claim 14, wherein Also includes: One or more through holes (160), wherein each through hole (160) passes through the gas separation structure (150) or the additional gas separation structure; and / or Wherein, the gas separation structure and / or the additional gas separation structure is in a plate shape.

19. The vacuum chamber housing according to claim 18, in, The first through hole (160a) of the one or more through holes is arranged between a first shell wall (110a) and a second shell wall (110b) of a pair of shell walls, and the second shell wall (110b) is opposite to the first shell wall (110a), thereby forming: a first gas separation channel (161) extending from the first shell wall (110a) to the first through hole (160a), and a second gas separation channel extending from the first through hole (160a) to the second shell wall (110b), Wherein, the first shell wall and the second shell wall are both penetrated by a substrate conveying port.

20. The vacuum chamber housing according to claim 14, in, Each shell wall of the first pair of shell walls has: A fourth mounting structure (154) is used to mount one or more lateral gas separation structures extending from the second region in the first region, Two lateral gas separation structures are arranged on opposite sides of the conveying surface.

21. The vacuum chamber housing according to claim 20, in, A first lateral gas separation structure (155a) of the two lateral gas separation structures extends from the gas separation structure (150) to the additional gas separation structure (153); and / or Among the two lateral gas separation structures, the second lateral gas separation structure (155a) extends from the gas separation structure (150) to the additional gas separation structure (153).

22. The vacuum chamber housing according to claim 14, in, The plurality of shell walls include a second pair of shell walls, each shell wall of the second pair of shell walls is adjacent to each shell wall of the first pair of shell walls and has a first pump interface or a second pump interface; and / or The plurality of shell walls include a third pair of shell walls, each shell wall of the third pair of shell walls is adjacent to each shell wall of the first pair of shell walls, and is adjacent to the first region and the second region.

23. The vacuum chamber housing of claim 14, wherein: The gas separation wall between the second region and the first region provides more gas separation than a gas separation structure between two parts of the first region, the gas separation structure and / or the mounting structure being arranged between the two parts of the first region.

24. The vacuum chamber housing according to claim 14, in, The one or more shell walls (110) further include: a sixth mounting structure at least partially surrounding the suction port, for mounting a suction port sealing member (115), wherein the suction port sealing member (115) is configured to at least partially seal the suction port (114), The vacuum chamber housing has a suction port closure (115) mounted via the sixth mounting structure.

25. The vacuum chamber housing according to claim 14, wherein Also includes: a first vacuum pump (181) mounted on a first pump interface (116) of the vacuum chamber housing; and / or A second vacuum pump (182) is installed on the second pump interface (117) of the vacuum chamber housing.

26. A vacuum assembly (10), comprising: The vacuum chamber housing according to any one of claims 1 or 14, A vacuum chamber is arranged beside the chamber interior and adjacent to the suction port and substrate transfer port of the vacuum chamber housing; A processing device is arranged in the vacuum chamber.

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