Gas treatment device

Abstract

The utility model discloses a gas treatment device. The gas treatment device comprises a gas channel and a gas purification device, the middle section of the gas channel is larger than two end sections. The gas purification device is arranged at the middle section position in the gas channel, is in sealing fit with the inner wall in the circumferential direction of the inner wall of the gas channel, and is used for absorbing part of gas. When original gas enters the middle section position from one end of the gas channel, impurity gas in the original gas can be fully absorbed by the gas purification device. As the gas purification device is in sealing fit with the inner wall in the circumferential direction of the inner wall of the gas channel, the original gas can pass through the gas channel only after passing through the gas purification device, the gas leakage phenomenon does not exist, and impurity gas in the original gas is fully absorbed by the gas purification device.

Description

Technical Field

[0001] The present application relates to the technical field of chemical equipment, and in particular to a gas processing device. Background Art

[0002] Liquid phase chemical reduction is the main process for preparing silver powder. The principle of this process is: using silver nitrate as the main raw material, adding dispersants and reducing agents, reducing Ag+ in the solution to Ag, and then washing, filtering, drying, depolymerizing, and shaping the product to obtain the final silver powder. Therefore, silver powder drying is an important step in the production process of silver powder.

[0003] In the prior art, the product is generally washed with a washing liquid first, and then the washed silver powder wet material is dried. Since impurities in the product cannot be completely removed by washing, the silver powder wet material still contains organic substances, including reducing agents such as ascorbic acid, glucose or sodium citrate, dispersants such as polyvinyl pyrrolidone, polyvinyl alcohol or polyethylene glycol, and organic acids and other substances wrapped on the surface of the silver powder.

[0004] During the drying process of the silver powder wet material, the reducing agent and dispersant will be oxidized by heat to produce pungent gas, and the organic acid will also volatilize to produce pungent gas, which will cause the tail gas of the silver powder drying to have a distinct pungent smell. If the tail gas is discharged directly into the atmosphere, it will cause air pollution. Utility Model Content

[0005] The utility model discloses a gas processing device. When the gas processing device is used to process raw gas, impurity gas in the raw gas can be removed, thereby playing the role of purifying the raw gas.

[0006] In order to achieve the above-mentioned purpose, the utility model discloses a gas processing device, which includes: a gas channel and a gas purification device. The middle section of the gas channel is larger than the cross-section at both ends. The gas purification device is arranged in the middle section of the gas channel, and is sealed and attached to the inner wall along the circumference of the inner wall of the gas channel, and the gas purification device is used to absorb part of the gas.

[0007] Optionally, the gas purification device comprises a plurality of adsorption boxes, and the plurality of adsorption boxes are arranged at intervals along the axial direction of the gas channel.

[0008] Optionally, the adsorption box is filled with a gas adsorbent.

[0009] Optionally, the adsorption box is a plate-shaped box, and a plate surface of the plate-shaped box is perpendicular to the axial direction of the gas channel.

[0010] Optionally, the gas processing device further includes a gas drying device, and the gas drying device is connected to one end of the gas purification device.

[0011] Optionally, the gas drying device is connected to the inlet end of the gas purification device.

[0012] Optionally, the gas drying device includes a moisture absorption box and a cooling device, and the cooling device is buried in the moisture absorption box.

[0013] Optionally, the moisture absorption box is filled with dehumidifying filler.

[0014] Optionally, the cooling device includes a condenser and a cooling component, and the condenser is connected to the cooling component and buried in the moisture absorption box.

[0015] Optionally, the cooling component includes a refrigeration compressor.

[0016] Compared with the related art, the beneficial effects of the present application are at least:

[0017] Since the middle section of the gas channel is larger than the cross-sections at both ends, and the gas purification device is arranged in the middle section of the gas channel. When the original gas enters the middle section from one end of the gas channel, the flow rate of the original gas will decrease due to the increase in the cross-section, which is conducive to the impurity gas in the original gas being fully absorbed by the gas purification device. In addition, due to the increase in the cross-section, the surface area of ​​the gas purification device for absorbing impurity gas is also larger, so that the impurity gas in the original gas is fully absorbed by the gas purification device. Then, since the gas purification device is sealed with the inner wall along the circumference of the inner wall of the gas channel, there is no gap between the gas purification device and the inner wall of the gas channel, and the original gas must pass through the gas purification device to pass through the gas channel, so there is no leakage, so that the impurity gas in the original gas is fully absorbed by the gas purification device. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0019] Figure 1 is a structural schematic diagram of a gas processing device provided in an embodiment of the present application;

[0020] Figure 2 yes Figure 1 Schematic diagram of the structure of the cooling device.

[0021] Description of reference numerals:

[0022] 1- Gas channel;

[0023] 2-gas purification device; 21-adsorption box; 211-gas adsorbent;

[0024] 3-gas drying device; 31-humidity absorption box; 311-dehumidification filler; 312-drain outlet; 32-cooling device; 321-condensing pipe; 322-refrigeration component; 3221-refrigeration compressor;

[0025] 100-Gas processing unit. DETAILED DESCRIPTION

[0026] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0027] In the present application, the terms "upper", "lower", "left", "right", "front", "back", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation.

[0028] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to specific circumstances.

[0029] In addition, the terms "installed", "set", "provided with", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection, or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, elements, or components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0030] In addition, the terms "first", "second", etc. are mainly used to distinguish different devices, elements or components (the specific types and structures may be the same or different), and are not used to indicate or imply the relative importance and quantity of the indicated devices, elements or components. Unless otherwise specified, "plurality" means two or more.

[0031] The technical solution of the present application will be further described below in conjunction with specific embodiments and drawings.

[0032] Figure 1 is a structural schematic diagram of a gas processing device 100 provided in an embodiment of the present application. Figure 2 yes Figure 1 Schematic diagram of the structure of the cooling device 32.

[0033] See also Figure 1 and Figure 2 The gas processing device 100 includes: a gas channel 1 and a gas purification device 2. The middle section of the gas channel 1 is larger than the two end sections. The gas purification device 2 is arranged in the middle section of the gas channel 1 and is sealed and attached to the inner wall along the circumference of the inner wall of the gas channel 1. The gas purification device 2 is used to absorb part of the gas.

[0034] In this embodiment, since the middle section of the gas channel 1 is larger than the cross-sections at both ends, and the gas purification device 2 is arranged in the middle section of the gas channel 1. When the original gas enters the middle section from one end of the gas channel 1, the flow rate of the original gas will decrease due to the increase in the cross-section, which is conducive to the impurity gas in the original gas being fully absorbed by the gas purification device 2. In addition, due to the increase in the cross-section, the surface area of ​​the gas purification device 2 for absorbing impurity gas is also larger, so that the impurity gas in the original gas is fully absorbed by the gas purification device 2. Then, since the gas purification device 2 is sealed with the inner wall along the circumference of the inner wall of the gas channel 1, there is no gap between the gas purification device 2 and the inner wall of the gas channel 1, and the original gas must pass through the gas purification device 2 before passing through the gas channel 1, so there is no leakage, so that the impurity gas in the original gas is fully absorbed by the gas purification device 2.

[0035] It should be noted that the gas channel 1 may be a metal channel, a plastic channel or a glass channel, or a channel made of other materials, which is not limited in the embodiment of the present application.

[0036] It should also be noted that the above-mentioned sealing method can be sealing bonding or bonding using a sealing ring, or other sealing methods, which is not limited in the embodiments of the present application.

[0037] It should also be noted that the above-mentioned raw gas refers to the gas to be processed entering the gas processing device 100, which can be exhaust gas, process product gas or chemical raw material gas, and the embodiment of the present application does not limit this.

[0038] It should also be noted that the above-mentioned impurity gas refers to part of the gas in the above-mentioned original gas that needs to be removed.

[0039] It should also be noted that the gas purification device 2 can be a chemical purification device or a physical purification device, which is not limited in the present embodiment. When it is a chemical purification device, the gas purification device 2 includes a substance that can react chemically with the impurity gas.

[0040] In some embodiments, see Figure 1 and Figure 2 The gas purification device 2 includes a plurality of adsorption boxes 21, and the plurality of adsorption boxes 21 are arranged at intervals along the axial direction of the gas channel 1. After the original gas flows into the gas channel 1, it needs to pass through the adsorption action of the plurality of adsorption boxes 21 before it can flow out, so that the impurity gas in the original gas can be fully absorbed by the gas purification device 2, so that the original gas is purified more thoroughly. Then, since the plurality of adsorption boxes 21 are arranged at intervals along the axial direction of the gas channel 1, the plurality of adsorption boxes 21 can remain independent of each other along the flow direction of the gas, so that even if some of the adsorption boxes 21 fail, the other adsorption boxes 21 can absorb the impurity gas normally, thereby reducing the failure rate of the gas treatment device 100, and also making the original gas be purified more thoroughly.

[0041] It should be noted that the number of the adsorption boxes 21 can be adjusted according to the flow rate of the original gas and the content of the impurity gas.

[0042] In some embodiments, see Figure 1 and Figure 2 The adsorption box 21 is filled with a gas adsorbent 211. The gas adsorbent 211 is a physical adsorbent. When the impurity gas in the original gas flows through the gas adsorbent 211, it will be adsorbed by the gas adsorbent 211 and remain in the adsorption box 21, and no new substances will be generated. Therefore, it is more environmentally friendly and safer than chemical adsorbents.

[0043] It should be noted that the above-mentioned physical adsorbent can be porous activated carbon or molecular sieve, or other substances with the same adsorption function, which is not limited in the embodiments of the present application.

[0044] In order to allow the impurity gas in the original gas to be fully absorbed by the adsorption box 21, in some embodiments, see Figure 1 and Figure 2The adsorption box 21 is a plate-shaped box, and the plate surface of the plate-shaped box is perpendicular to the axial direction of the gas channel 1. When the original gas flows through the adsorption box 21, it can fully enter the adsorption box 21, so that the impurity gas is fully absorbed.

[0045] In actual industrial production, the raw gas generally carries water vapor. In order to obtain a dry gas product, in some embodiments, see Figure 1 and Figure 2 The gas processing device 100 further includes a gas drying device 3, which is connected to one end of the gas purification device 2. When the raw gas flows through the gas processing device 100, water vapor in the raw gas will be absorbed by the gas drying device 3, and a dry gas product can be obtained.

[0046] It should be noted that the gas drying device 3 may be a physical drying device or a chemical drying device, which is not limited in the embodiment of the present application.

[0047] In some embodiments, see Figure 1 and Figure 2 The gas drying device 3 is connected to the inlet end of the gas purification device 2. After the raw gas enters the gas processing device 100, the water vapor inside is firstly absorbed by the gas drying device 3 to obtain dry raw gas, and then the dry raw gas enters the gas purification device 2 for purification, which can avoid the influence of water vapor on the purification process, so that the raw gas is purified more thoroughly.

[0048] In some embodiments, see Figure 1 and Figure 2 The gas drying device 3 includes a moisture absorption box 31 and a cooling device 32, and the cooling device 32 is buried in the moisture absorption box 31. The cooling device 32 can absorb the heat of water vapor to liquefy the water vapor to form liquid water, and the moisture absorption box 31 can absorb the liquid water. When the original gas enters the moisture absorption box 31 of the gas drying device 3, the cooling device 32 can cool the water vapor into liquid water, and then the liquid water is absorbed by the moisture absorption box 31, which plays a role in drying the original gas.

[0049] In some embodiments, see Figure 1 and Figure 2 The moisture absorption box 31 is filled with a dehumidification filler 311. The dehumidification filler 311 can absorb liquid water, and the liquid water formed by cooling can be absorbed by the dehumidification filler 311, so that the drying effect is better.

[0050] The dehumidifying filler 311 may be a physical water absorbing material or a chemical water absorbing material, which is not limited in the present embodiment. When it is a physical water absorbing material, a drain port 312 is provided at the bottom of the moisture absorbing box 31. When a large amount of liquid water is absorbed by the moisture absorbing box 31, it can be discharged through the drain port 312, thereby improving the drying effect.

[0051] It should be noted that the physical water absorbing material can be a stainless steel ball ring filler. The stainless steel ball ring filler is made of high-quality stainless steel material, has excellent anti-oxidation, wear resistance and corrosion resistance, and can resist the erosion of various chemical media, including acid, alkali, salt, etc. Even if the original gas contains various corrosive gases, it will not cause damage to the moisture absorption box 31, thereby extending the service life of the moisture absorption box 31.

[0052] In some embodiments, see Figure 1 and Figure 2 The cooling device 32 includes a condenser 321 and a cooling member 322. The condenser 321 is connected to the cooling member 322 and buried in the moisture absorption box 31. The condenser 321 is a curved tube, which can increase the heat absorption area and absorb more heat, thereby making the condensation effect of water vapor better. Since the condenser 321 is connected to the cooling member 322, the heat absorbed by the condenser 321 can be discharged through the cooling member 322, thereby improving the condensation effect of water vapor.

[0053] In order to improve the cooling effect of the cooling element 322, in some embodiments, see Figure 1 and Figure 2 The cooling element 322 includes a refrigeration compressor 3221. Since the refrigeration compressor 3221 has a good refrigeration effect, and its operation is stable and the technology is mature, the condensation effect of water vapor can be further improved, and the operation of the gas drying device 3 is also more stable.

[0054] Among them, the power of the refrigeration compressor 3221 can be adjusted according to the gas flow, gas temperature and water vapor content of the original gas, and then the refrigeration capacity of the refrigeration compressor 3221 can be adjusted, which can make the condensation effect of the water vapor in the original gas better and the drying effect of the original gas better.

[0055] See also Figure 1 and Figure 2A specific gas processing device 100 includes a gas drying device 3, a gas channel 1 and a gas purification device 2. Among them, the gas drying device 3 is connected to the inlet end of the gas purification device 2. The gas drying device 3 includes a moisture absorption box 31 and a cooling device 32, and the cooling device 32 is buried in the moisture absorption box 31. The moisture absorption box 31 is filled with stainless steel ball ring filler. The cooling device 32 includes a condenser 321 and a refrigeration compressor 3221, and the condenser 321 is connected to the refrigeration compressor 3221 and buried in the stainless steel ball ring filler. The gas purification device 2 includes a plurality of plate-shaped adsorption boxes 21, and the plurality of plate-shaped adsorption boxes 21 are arranged at intervals along the axial direction of the gas channel 1. The plurality of plate-shaped adsorption boxes 21 are all filled with porous activated carbon.

[0056] When the above-mentioned gas treatment device 100 is used to treat the tail gas for preparing silver powder, the tail gas contains water vapor and organic VOC. The tail gas first enters the gas drying device 3, and by adjusting the power of the refrigeration compressor 3221, the temperature of the tail gas is reduced to condense the water vapor into liquid water. The liquid water is absorbed by the stainless steel ball ring packing in the moisture absorption box 31 and discharged through the drain port 312. Then, the dry tail gas enters the gas channel 1 and passes through the multiple plate-shaped adsorption boxes 21 of the gas purification device 2. At this time, the organic VOC in the tail gas is effectively adsorbed and intercepted by the porous activated carbon. After purification, the tail gas is discharged from the outlet end of the gas channel 1. At this time, the content of organic VOC in the tail gas is greatly reduced, so no pungent smell will be generated, which is green and environmentally friendly.

[0057] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit it. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A gas processing device, characterized in that: include: A gas channel (1), wherein a middle section of the gas channel (1) is larger than a cross section at both ends; A gas purification device (2), the gas purification device (2) being arranged in the middle of the gas channel (1) and sealingly attached to the inner wall along the circumference of the inner wall of the gas channel (1), and the gas purification device (2) being used to absorb part of the gas; The gas processing device further comprises a gas drying device (3), wherein the gas drying device (3) is connected to one end of the gas purification device (2); The gas drying device (3) comprises a moisture absorption box (31) and a cooling device (32), wherein the cooling device (32) is embedded in the moisture absorption box (31).

2. The gas processing device according to claim 1, characterized in that: The gas purification device (2) comprises a plurality of adsorption boxes (21), wherein the plurality of adsorption boxes (21) are arranged at intervals along the axial direction of the gas channel (1).

3. The gas processing device according to claim 2, characterized in that: The adsorption box (21) is filled with a gas adsorbent (211).

4. The gas processing device according to claim 2, characterized in that: The adsorption box (21) is a plate-shaped box, and the plate surface of the plate-shaped box is perpendicular to the axial direction of the gas channel (1).

5. The gas processing device according to claim 1, characterized in that: The gas drying device (3) is connected to the inlet end of the gas purification device (2).

6. The gas processing device according to claim 1, characterized in that: The moisture absorption box (31) is filled with a dehumidification filler (311).

7. The gas processing device according to claim 1, characterized in that: The cooling device (32) comprises a condensing pipe (321) and a cooling component (322); the condensing pipe (321) is connected to the cooling component (322) and is buried in the moisture absorption box (31).

8. The gas processing device according to claim 7, characterized in that: The cooling component (322) includes a refrigeration compressor (3221).

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