Cleaning equipment for silicon wafer production

Abstract

The utility model relates to the technical field of silicon wafers, and discloses cleaning equipment for silicon wafer production, which comprises a cleaning bin, supporting legs and a cleaning bin. By arranging the cleaning bin, the supporting legs, the cleaning device, the drainage pipe and the lifting structure, firstly, water is injected into the cleaning bin, then a silicon wafer is installed in the cleaning frame, then the driving mechanism is turned on, the second motor starts to rotate, the second motor drives the lead screw to rotate, and the lead screw drives the movable frame to move through threaded connection; the movable frame drives the cleaning frame to move into the cleaning bin, then the water pumping mechanism is started, the first motor starts to rotate, the first motor drives the fan blades to rotate, the fan blades rotate in the water tank to generate suction force, water passes through a water outlet disc through a pipeline and is sprayed out of a spray head, and therefore silicon wafers are cleaned. However, manual cleaning is low in efficiency, and a large cleaning task cannot be met.

Description

Technical Field

[0001] The utility model belongs to the technical field of silicon wafers, and in particular relates to cleaning equipment for silicon wafer production. Background Art

[0002] Silicon wafers are the basic material for semiconductor manufacturing and are mainly used to manufacture integrated circuits (ICs) and other electronic components. Silicon wafers are usually made of high-purity single crystal silicon and have good electronic properties. They can be used to manufacture various electronic devices such as transistors, diodes, sensors, etc.

[0003] During the production and processing of silicon wafers, the surface of the silicon wafers will be contaminated with pollutants such as dust, oil and oxides. Before the silicon wafers are processed to the next step, they need to be cleaned. The problem with the above technology is that in the existing technology, manual cleaning is often used, but the efficiency of manual cleaning is low and cannot meet larger cleaning tasks. Utility Model Content

[0004] In view of the problems existing in the prior art, the utility model provides a cleaning device for silicon wafer production which can overcome the above problems or at least partially solve the above problems.

[0005] The utility model is implemented as follows: a cleaning device for silicon wafer production includes a cleaning chamber, legs and a cleaning frame, and is characterized in that: the bottom of the cleaning chamber is fixedly installed on the top of the legs, the cleaning frame is installed in the inner cavity of the cleaning chamber, a cleaning device is installed on the front side of the cleaning chamber, a drain pipe is installed on the left side of the cleaning chamber, and a lifting structure is installed on the right side of the cleaning chamber.

[0006] In order to improve the recycling of water, preferably, the cleaning device includes a filtering structure, a pumping mechanism, a pipeline, a water outlet tray and a nozzle, the filtering structure is installed on the front side of the cleaning bin, the pumping mechanism is installed on the front side of the cleaning bin, the front side of the cleaning bin is fixedly connected to the left side of the filtering structure through a pipeline, the left side of the pumping mechanism is fixedly connected to the right side of the filtering structure through a pipeline, the water outlet tray is installed in the inner cavity of the cleaning bin, the top of the nozzle is fixedly installed on the bottom of the water outlet tray, the right side of the pumping mechanism is fixedly connected to the top of the water outlet tray through a pipeline, and a mounting frame is installed at the bottom of the water outlet tray, which can be driven by the pumping mechanism. The pumping mechanism collects water to the filtering structure through the pipeline, and then sprays it out from the nozzle through the pipeline through the water outlet tray, thereby achieving water circulation.

[0007] In order to improve the installation of the cleaning frame, preferably, the lifting structure includes a supporting frame, a movable frame, a fixed block and a sliding rod, the left side of the supporting frame is fixedly installed on the right side of the cleaning bin, the front and rear sides of the movable frame are movably installed on the inner cavity of the supporting frame, the left side of the movable frame is fixedly installed on the right side of the cleaning frame, the left side of the fixed block is fixedly installed on the right side of the cleaning frame, one end of the sliding rod is fixedly installed on the bottom of the inner cavity of the cleaning bin, the other end of the sliding rod is fixedly installed on the top of the supporting frame, the middle part of the fixed block is movably installed on the surface of the sliding rod, the inner cavity of the supporting frame is installed with a driving mechanism, and the cleaning frame can be installed on the movable frame through the cleaning frame, the movable frame is installed on the supporting frame, and the supporting frame is installed on the cleaning bin, so as to install the cleaning frame.

[0008] In order to improve the filtration of water, preferably, the filtration structure includes a filter box, a maintenance door, a chute and a filter screen. The rear side of the filter box is fixedly installed on the rear side of the cleaning bin, the maintenance door is installed on the top of the filter box, the rear side of the chute on the rear side is fixedly installed on the rear side of the inner cavity of the filter box, and the front side of the chute on the front side is fixedly installed on the front side of the inner cavity of the filter box. The filter screen is movably installed in the inner cavity of the chute, and water can enter the filter box through it. The water is filtered through the filter screen, and impurities in the water are filtered in the filter box, thereby filtering the water.

[0009] In order to improve the extraction of water, preferably, the pumping mechanism includes a first motor, fan blades and a water tank, the fan blades are fixedly installed on the output end of the first motor, the rear side of the water tank is fixedly installed on the front side of the cleaning bin, the fan blades are installed in the inner cavity of the water tank, and the bottom of the first motor is fixedly installed on the front side of the cleaning bin. The first motor can be rotated, and the first motor drives the fan blades to rotate. The fan blades generate suction in the inner cavity of the water tank, thereby extracting water.

[0010] In order to improve the lifting and lowering movement of the mobile frame, preferably, the driving mechanism includes a second motor and a screw rod, one end of the screw rod is movably installed at the bottom of the inner cavity of the support frame, the surface of the screw rod is connected to the middle part of the mobile frame by a thread, and the other end of the screw rod is fixedly installed at the output end of the second motor, and the top of the second motor is fixedly installed at the top of the support frame, and can be rotated by the first motor, the first motor drives the screw rod to rotate, and the screw rod drives the mobile frame to move through the threaded connection.

[0011] In order to improve the installation of the water outlet tray, preferably, the front side of the mounting frame is fixedly mounted on the front side of the inner cavity of the cleaning bin, and the bottom of the water outlet tray is fixedly mounted on the top of the mounting frame. The mounting frame can be installed on the cleaning bin, and the water outlet tray is installed on the mounting frame, thereby fixing the water outlet tray.

[0012] Compared with the prior art, the beneficial effects of the utility model are as follows:

[0013] The utility model provides a cleaning bin, legs, a cleaning bin, a cleaning device, a drain pipe and a lifting structure. First, water is injected into the cleaning bin, and then the silicon wafer is installed in the cleaning frame. Then, the driving mechanism is turned on, and the second motor starts to rotate, and the second motor drives the screw rod to rotate. The screw rod drives the moving frame to move through the threaded connection. The moving frame drives the cleaning frame to move into the cleaning bin. Then, the pumping mechanism is turned on, and the first motor starts to rotate, and the first motor drives the fan blades to rotate. The fan blades rotate in the water tank to generate suction, and water is sprayed out from the nozzle through the pipeline and the water outlet tray, so that the silicon wafer is cleaned. This solves the problem that manual cleaning is often used in the prior art, but the efficiency of manual cleaning is low and cannot meet larger cleaning tasks. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a schematic diagram of the overall three-dimensional structure provided by an embodiment of the utility model;

[0015] Figure 2 It is a schematic diagram of the three-dimensional structure of the cleaning device provided by the embodiment of the utility model;

[0016] Figure 3 It is a schematic diagram of the three-dimensional structure of the filtering structure and the pumping mechanism provided by the embodiment of the utility model;

[0017] Figure 4 It is a three-dimensional structural schematic diagram of the lifting structure and driving mechanism provided by the embodiment of the utility model.

[0018] In the figure: 1. cleaning chamber; 2. supporting legs; 3. cleaning frame; 4. cleaning device; 401. filtering structure; 4011. filtering box; 4012. maintenance door; 4013. slide; 4014. filtering net; 402. pumping mechanism; 4021. first motor; 4022. fan blades; 4023. water tank; 403. pipeline; 404. water outlet tray; 405. nozzle; 5. drain pipe; 6. lifting structure; 601. supporting frame; 602. moving frame; 603. fixing block; 604. sliding rod; 7. mounting frame; 8. driving mechanism; 801. second motor; 802. screw rod. DETAILED DESCRIPTION

[0019] In order to further understand the content, features and effects of the present invention, the following embodiments are given as examples and described in detail with reference to the accompanying drawings.

[0020] The structure of the utility model is described in detail below in conjunction with the accompanying drawings.

[0021] like Figures 1 to 4As shown, a cleaning device for silicon wafer production provided by an embodiment of the utility model comprises a cleaning chamber 1, a leg 2 and a cleaning frame 3. The bottom of the cleaning chamber 1 is fixedly mounted on the top of the leg 2, the cleaning frame 3 is mounted in the inner cavity of the cleaning chamber 1, a cleaning device 4 is mounted on the front side of the cleaning chamber 1, a drain pipe 5 is mounted on the left side of the cleaning chamber 1, and a lifting structure 6 is mounted on the right side of the cleaning chamber 1. In order to improve the recycling of water, the cleaning device 4 comprises a filtering structure 401, a pumping mechanism 402, a pipeline 403, a water outlet tray 404 and a nozzle 405. The filtering structure 4 01 is installed on the front side of the cleaning chamber 1, the pumping mechanism 402 is installed on the front side of the cleaning chamber 1, the front side of the cleaning chamber 1 is fixedly connected to the left side of the filtering structure 401 through the pipe 403, the left side of the pumping mechanism 402 is fixedly connected to the right side of the filtering structure 401 through the pipe 403, the water outlet tray 404 is installed in the inner cavity of the cleaning chamber 1, the top of the nozzle 405 is fixedly installed on the bottom of the water outlet tray 404, the right side of the pumping mechanism 402 is fixedly connected to the top of the water outlet tray 404 through the pipe 403, and the bottom of the water outlet tray 404 is installed with a mounting frame 7 , can be driven by the pumping mechanism 402, the pumping mechanism 402 collects water to the filtering structure 401 through the pipe 403, and then passes through the pipe 403 and the water outlet tray 404 and is sprayed out from the nozzle 405 to achieve water circulation. In order to improve the installation of the cleaning frame 3, the lifting structure 6 includes a support frame 601, a mobile frame 602, a fixed block 603 and a sliding rod 604. The left side of the support frame 601 is fixedly installed on the right side of the cleaning bin 1, and the front and rear sides of the mobile frame 602 are movably installed in the inner cavity of the support frame 601. The left side of the mobile frame 602 is fixedly installed It is installed on the right side of the cleaning frame 3, the left side of the fixed block 603 is fixedly installed on the right side of the cleaning frame 3, one end of the slide bar 604 is fixedly installed on the bottom of the inner cavity of the cleaning chamber 1, and the other end of the slide bar 604 is fixedly installed on the top of the support frame 601. The middle part of the fixed block 603 is movably installed on the surface of the slide bar 604. The inner cavity of the support frame 601 is installed with a driving mechanism 8, which can be installed on the mobile frame 602 through the cleaning frame 3, the mobile frame 602 is installed on the support frame 601, and the support frame 601 is installed on the cleaning chamber 1, so that the cleaning frame 3 is installed.

[0022] In order to improve the filtration of water, the filtration structure 401 includes a filter box 4011, a maintenance door 4012, a chute 4013 and a filter screen 4014. The rear side of the filter box 4011 is fixedly installed on the rear side of the cleaning chamber 1, the maintenance door 4012 is installed on the top of the filter box 4011, the rear side of the rear chute 4013 is fixedly installed on the rear side of the inner cavity of the filter box 4011, the front side of the front chute 4013 is fixedly installed on the front side of the inner cavity of the filter box 4011, and the filter screen 4014 is movably installed in the inner cavity of the chute 4013, so that water can enter Filter box 4011, water is filtered through filter net 4014, impurities in the water are filtered in filter box 4011, thereby filtering the water. In order to improve the extraction of water, the pumping mechanism 402 includes a first motor 4021, fan blades 4022 and a water tank 4023. The fan blades 4022 are fixedly installed at the output end of the first motor 4021, the rear side of the water tank 4023 is fixedly installed at the front side of the cleaning bin 1, the fan blades 4022 are installed in the inner cavity of the water tank 4023, and the bottom of the first motor 4021 is fixedly installed at the front side of the cleaning bin 1. The first motor 4021 is rotated, and the first motor 4021 drives the fan blade 4022 to rotate. The fan blade 4022 generates suction in the inner cavity of the water tank 4023, thereby extracting water. In order to improve the lifting and lowering movement of the mobile frame 602, the driving mechanism 8 includes a second motor 801 and a screw rod 802. One end of the screw rod 802 is movably installed at the bottom of the inner cavity of the support frame 601. The surface of the screw rod 802 is connected to the middle of the mobile frame 602 through a thread. The other end of the screw rod 802 is fixedly installed at the output end of the second motor 801. The second motor 8 The top of 01 is fixedly installed on the top of the support frame 601, and can be rotated by the first motor 4021. The first motor 4021 drives the screw rod 802 to rotate, and the screw rod 802 drives the movable frame 602 to move through the threaded connection. In order to improve the installation of the water outlet tray 404, the front side of the mounting frame 7 is fixedly installed on the front side of the inner cavity of the cleaning bin 1, and the bottom of the water outlet tray 404 is fixedly installed on the top of the mounting frame 7. It can be installed on the cleaning bin 1 through the mounting frame 7, and the water outlet tray 404 is installed on the mounting frame 7, so that the water outlet tray 404 is fixedly installed.

[0023] The working principle of this utility model:

[0024] When in use, firstly, water is injected into the cleaning chamber 1, and then the silicon wafer to be cleaned is placed in the cleaning frame 3, and then the driving mechanism 8 is turned on, the second motor 801 rotates, the second motor 801 drives the screw rod 802 to rotate, the screw rod 802 drives the moving frame 602 to move through the threaded connection, the moving frame 602 drives the cleaning frame 3 to move, and the cleaning frame 3 moves into the cleaning chamber 1, and then the pumping mechanism 402 is turned on, the first motor 4021 rotates, the first motor 4021 drives the fan blade 4022 to rotate, the fan blade 4022 rotates in the water tank 4023 to generate suction, so that water is drawn from the pipe Water 403 first enters the filter box 4011, and the water is filtered through the filter screen 4014. The water then passes through the pipe 403 and enters the water outlet tray 404, and then is sprayed out from the nozzle 405. The water is sprayed out quickly from the nozzle 405, and then the water forms a water flow in the cleaning chamber 1, so that the water flow cleans the silicon wafer. After cleaning, the cleaning frame 3 is raised by the driving mechanism 8, and then the silicon wafer is taken out, and the maintenance door 4012 is opened regularly to clean the inner cavity of the filter box 4011 and the filter screen 4014 to prevent dust and impurities from clogging the filter screen 4014, and finally the water can be discharged through the drain pipe 5.

[0025] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0026] The above description is only a preferred embodiment of the present invention, and does not constitute any form of limitation to the present invention. Although the present invention has been disclosed as a preferred embodiment as above, it is not intended to limit the present invention. Any technician familiar with this patent will not depart from the scope of the technical solution of the present invention.

Claims

1. A cleaning device for silicon wafer production, comprising a cleaning chamber (1), legs (2) and a cleaning frame (3), characterized in that: The bottom of the cleaning chamber (1) is fixedly mounted on the top of the supporting leg (2), the cleaning frame (3) is mounted in the inner cavity of the cleaning chamber (1), a cleaning device (4) is mounted on the front side of the cleaning chamber (1), a drainage pipe (5) is mounted on the left side of the cleaning chamber (1), and a lifting structure (6) is mounted on the right side of the cleaning chamber (1).

2. A cleaning device for silicon wafer production as claimed in claim 1, characterized in that: The cleaning device (4) comprises a filtering structure (401), a pumping mechanism (402), a pipeline (403), a water outlet tray (404) and a nozzle (405); the filtering structure (401) is mounted on the front side of the cleaning chamber (1); the pumping mechanism (402) is mounted on the front side of the cleaning chamber (1); the front side of the cleaning chamber (1) is fixedly connected to the left side of the filtering structure (401) via a pipeline (403); the left side of the pumping mechanism (402) is fixedly connected to the right side of the filtering structure (401) via a pipeline (403); the water outlet tray (404) is mounted in the inner cavity of the cleaning chamber (1); the top of the nozzle (405) is fixedly mounted on the bottom of the water outlet tray (404); the right side of the pumping mechanism (402) is fixedly connected to the top of the water outlet tray (404) via a pipeline (403); and a mounting frame (7) is mounted on the bottom of the water outlet tray (404).

3. A cleaning device for silicon wafer production as claimed in claim 1, characterized in that: The lifting structure (6) comprises a support frame (601), a movable frame (602), a fixed block (603) and a sliding rod (604); the left side of the support frame (601) is fixedly mounted on the right side of the cleaning chamber (1); the front and rear sides of the movable frame (602) are movably mounted on the inner cavity of the support frame (601); the left side of the movable frame (602) is fixedly mounted on the right side of the cleaning frame (3); the left side of the fixed block (603) is fixedly mounted on the right side of the cleaning frame (3); one end of the sliding rod (604) is fixedly mounted on the bottom of the inner cavity of the cleaning chamber (1); the other end of the sliding rod (604) is fixedly mounted on the top of the support frame (601); the middle part of the fixed block (603) is movably mounted on the surface of the sliding rod (604); and the inner cavity of the support frame (601) is installed with a driving mechanism (8).

4. A cleaning device for silicon wafer production as claimed in claim 2, characterized in that: The filtering structure (401) comprises a filter box (4011), a maintenance door (4012), a chute (4013) and a filter screen (4014); the rear side of the filter box (4011) is fixedly mounted on the rear side of the cleaning chamber (1); the maintenance door (4012) is mounted on the top of the filter box (4011); the rear side of the chute (4013) on the rear side is fixedly mounted on the rear side of the inner cavity of the filter box (4011); the front side of the chute (4013) on the front side is fixedly mounted on the front side of the inner cavity of the filter box (4011); and the filter screen (4014) is movably mounted on the inner cavity of the chute (4013).

5. A cleaning device for silicon wafer production as claimed in claim 2, characterized in that: The pumping mechanism (402) comprises a first motor (4021), a fan blade (4022) and a water tank (4023), wherein the fan blade (4022) is fixedly mounted on the output end of the first motor (4021), the rear side of the water tank (4023) is fixedly mounted on the front side of the cleaning bin (1), the fan blade (4022) is mounted in the inner cavity of the water tank (4023), and the bottom of the first motor (4021) is fixedly mounted on the front side of the cleaning bin (1).

6. A cleaning device for silicon wafer production as claimed in claim 3, characterized in that: The driving mechanism (8) comprises a second motor (801) and a screw rod (802), one end of the screw rod (802) is movably mounted on the bottom of the inner cavity of the support frame (601), the surface of the screw rod (802) is connected to the middle of the movable frame (602) by a thread, the other end of the screw rod (802) is fixedly mounted on the output end of the second motor (801), and the top of the second motor (801) is fixedly mounted on the top of the support frame (601).

7. A cleaning device for silicon wafer production as claimed in claim 2, characterized in that: The front side of the mounting frame (7) is fixedly mounted on the front side of the inner cavity of the cleaning chamber (1), and the bottom of the water outlet tray (404) is fixedly mounted on the top of the mounting frame (7).

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