Roller brush cleaning mechanism

Abstract

The utility model discloses a roller brush cleaning mechanism which comprises a supporting side plate, a supporting bottom plate, an upper roller and a lower roller, a first adjusting hole is formed in the lower end of the supporting side plate in the vertical direction, a first locking hole is formed in the side edge of the supporting bottom plate, and the first adjusting hole and the first locking hole are connected in a locking mode through a first bolt. The two ends of the lower roller are in bearing connection with first installation blocks, the first installation blocks are fixed to the upper ends of the supporting side plates, the two sides of the upper roller are in bearing connection with second installation blocks, the second installation blocks move at the upper ends of the supporting side plates in the vertical direction, and the upper roller and the lower roller are each provided with a plurality of cleaning brushes. The roller brush cleaning mechanism is installed at the front end of the plate storage machine and used for cleaning the upper face and the lower face of a silicon wafer, the height of the supporting side plate can be adjusted according to the height of the rail, the distance between the upper roller and the lower roller can also be adjusted according to the thickness of the silicon wafer, the structure is compact and orderly, and convenience is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer production, in particular to a roller brush cleaning mechanism. Background Art

[0002] Photovoltaic solar silicon wafers (hereinafter referred to as silicon wafers) are the core part of the solar power generation system and also the most valuable part of the solar power generation system. The function of the silicon wafer is to convert solar energy into electrical energy, which is stored in batteries or directly used as a load.

[0003] Since the processing time of front and rear silicon wafers in production is not equal, a plate storage machine is needed to temporarily store the silicon wafers waiting for production. In order to ensure the cleanliness of the silicon wafers, a cleaning structure is added to the conveying track. Generally, upper and lower rollers are used to clean the upper and lower surfaces of the silicon wafers as they pass by. The conventional cleaning structure has a fixed position and cannot be adjusted. In order to adapt to the height of the conveying track, both the upper and lower rollers need to be adjustable in height, which makes adjustment in the production process difficult and complicates the entire cleaning structure. Utility Model Content

[0004] One purpose of the utility model is to provide a roller brush cleaning mechanism, which can change the height of the lower roller by changing the connection position between the supporting bottom plate and the supporting side plate to meet the transportation of silicon wafers of different heights, and adjust the height of the upper roller to meet the transportation of silicon wafers of different thicknesses. It has wide application and simple structure.

[0005] To achieve this purpose, the utility model adopts the following technical solutions:

[0006] A roller brush cleaning mechanism comprises a supporting side plate, a supporting bottom plate, an upper roller and a lower roller, the lower end of the supporting side plate is provided with a first adjustment hole along the vertical direction, the side edge of the supporting bottom plate is provided with a first locking hole, the first adjustment hole and the first locking hole are locked and connected by a first bolt, a connecting hole for fixing is installed on the supporting bottom plate, both ends of the lower roller are connected with a first mounting block with a bearing, the first mounting block is fixed to the upper end of the supporting side plate, both sides of the upper roller are connected with a second mounting block with a bearing, the second mounting block is movable along the vertical direction on the upper end of the supporting side plate, and a plurality of cleaning brushes are installed on the upper roller and the lower roller.

[0007] As a preferred technical solution, it includes a motor mounting plate and a driving motor, the supporting side plate is provided with a second adjustment hole along the vertical direction, the motor mounting plate is provided with a second locking hole, the second adjustment hole and the second locking hole are locked and connected by a second bolt, the driving motor is fixed on the motor mounting plate, and the driving motor drives the rotation of the upper roller and the lower roller.

[0008] As a preferred technical solution, a driving wheel is connected to the driving end of the driving motor, one end of the upper roller is connected to a first driven wheel, one end of the lower roller is connected to a second driven wheel, and a synchronous belt is connected between the driving wheel, the first driven wheel and the second driven wheel.

[0009] As a preferred technical solution, a guide seat is fixed to the front end of the supporting side plate, a guide rod is connected between the two guide seats, and a guide wheel is installed on the guide rod.

[0010] As a preferred technical solution, a coupling is locked on the guide rod, a guide block is connected to the coupling, and the guide wheel is rotatably connected to the guide block.

[0011] As a preferred technical solution, an adjusting screw is provided at the upper end of the supporting side plate, the adjusting screw passes through the top rear bearing of the supporting side plate and is connected to the second mounting block, and the middle part of the adjusting screw is threadedly connected to the supporting side plate.

[0012] The beneficial effects of the utility model are: providing a roller brush cleaning mechanism, which is installed at the front end of a plate storage machine and is used to clean the upper and lower surfaces of silicon wafers. The height of the supporting side plates can be adjusted according to the height of the track, and the distance between the upper and lower rollers can be adjusted according to the thickness of the silicon wafer. The structure is compact and orderly, and the convenience is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] The utility model is further described in detail below based on the drawings and embodiments.

[0014] Figure 1 It is a first structural schematic diagram of a roller brush cleaning mechanism according to an embodiment;

[0015] Figure 2 A second structural schematic diagram of a roller brush cleaning mechanism according to an embodiment;

[0016] Figure 3 This is a third structural schematic diagram of a roller brush cleaning mechanism described in an embodiment.

[0017] Figures 1 to 3 middle:

[0018] 1. Support side plate; 2. Support bottom plate; 3. Upper roller; 4. Lower roller; 5. First adjustment hole; 6. Connecting hole; 7. First mounting block; 8. Second mounting block; 9. Cleaning brush; 10. Motor mounting plate; 11. Driving motor; 12. Second adjustment hole; 13. Second locking hole; 14. Driving wheel; 15. First driven wheel; 16. Second driven wheel; 17. Synchronous belt; 18. Guide seat; 19. Guide rod; 20. Guide wheel; 21. Coupling; 22. Guide block. DETAILED DESCRIPTION

[0019] The technical solution of the utility model is further explained below with reference to the accompanying drawings and through specific implementation methods.

[0020] like Figures 1 to 3 As shown, in this embodiment, a roller brush cleaning mechanism includes a supporting side plate 1, a supporting bottom plate 2, an upper roller 3 and a lower roller 4. A first adjusting hole 5 is provided at the lower end of the supporting side plate 1 along the vertical direction, and a first locking hole is provided at the side of the supporting bottom plate 2. The first adjusting hole 5 and the first locking hole are locked and connected by a first bolt. A connecting hole 6 for fixing is installed on the supporting bottom plate 2. First mounting blocks 7 are connected to the lower roller 4 on both sides by bearings, and the first mounting blocks 7 are fixed to the upper ends of the supporting side plates 1. Second mounting blocks 8 are connected to the upper ends of the supporting side plates 1 on both sides of the upper roller 3 by bearings, and the second mounting blocks 8 are movable at the upper ends of the supporting side plates 1 along the vertical direction. A plurality of cleaning brushes 9 are installed on the upper roller 3 and the lower roller 4.

[0021] Among them, the cleaning brush 9 is made of anti-static nylon, and the supporting base plate 2 is installed between the two sections of the track in front of the board storage machine, and is fixed in the middle of the track by using the connecting hole 6 on the supporting base plate 2. At the connection between the first locking hole and the first adjusting hole 5, it can be locked at different heights by the first bolt, so that the height of the supporting side plate 1 changes, and then the lower roller 4 whose height is fixed relative to the supporting side plate 1 corresponds to the lower surface height of the silicon wafer conveyed. After the first mounting block 7 is installed at the end of the lower roller 4, the first mounting block 7 is installed on the supporting side plate 1 to form an assembly of the lower roller 4. According to the requirements of different silicon wafer thicknesses, the position of the second mounting block 8 on the supporting side plate 1 is changed, so that the distance between the upper roller 3 and the lower roller 4 can be changed, and the cleaning brush 9 on the upper roller 3 and the lower roller 4 cleans the passing silicon wafers.

[0022] The roller brush cleaning mechanism also includes a motor mounting plate 10 and a driving motor 11. A second adjusting hole 12 is arranged on the supporting side plate 1 along the vertical direction. A second locking hole 13 is arranged on the motor mounting plate 10. The second adjusting hole 12 and the second locking hole 13 are locked and connected by a second bolt. The driving motor 11 is fixed on the motor mounting plate 10. The driving motor 11 drives the rotation of the upper roller 3 and the lower roller 4. In addition, a driving wheel 14 is connected to the driving end of the driving motor 11, a first driven wheel 15 is connected to one end of the upper roller 3, and a second driven wheel 16 is connected to one end of the lower roller 4. A synchronous belt 17 is connected between the driving wheel 14, the first driven wheel 15 and the second driven wheel 16.

[0023] When controlling the rotation of the upper roller 3 and the lower roller 4, the driving motor 11 drives the first driven wheel 15 and the second driven wheel 16 to rotate relative to each other through the synchronous belt 17 through the rotation of the driving wheel 14, so as to clean the upper and lower surfaces of the silicon wafer. In order to adapt to different thicknesses, the height of the upper roller 3 is changed. When using the same synchronous belt 17, the driving motor 11 is driven by the motor mounting plate 10 to adjust the upper and lower positions. The second bolt passes through the second locking hole 13 and is locked in the second adjusting hole 12 to fix the current position, thereby realizing the position change of the driving wheel 14, and no longer needs the participation of the tension wheel in the adjustment.

[0024] Moreover, an adjusting screw is provided at the upper end of the supporting side plate 1, which passes through the top rear bearing of the supporting side plate 1 and is connected to the second mounting block 8. The middle part of the adjusting screw is threadedly connected to the supporting side plate 1. When adjusting the upper roller 3, the adjusting screw can be manually rotated to make the second mounting block 8 move up and down.

[0025] A guide seat 18 is fixed to the front end of the supporting side plate 1, and a guide rod 19 is connected between the two guide seats 18. A guide wheel 20 is installed on the guide rod 19, and a coupling 21 is locked on the guide rod 19. A guide block 22 is connected to the coupling 21, and the guide wheel 20 is rotatably connected to the guide block 22. The silicon wafer in front is transported over. In order to ensure that the silicon wafer smoothly enters the position between the upper roller 3 and the lower roller 4, the guide wheel 20 on the guide rod 19 is used to press the silicon wafer to the position of the lower roller 4, and smoothly pass under the upper roller 3. The conventional guide block 22 is installed by clamping two semicircles on the guide rod 19 to fix the position of the guide wheel 20, while the coupling 21 one-way bolt is used to lock it in this design.

[0026] It should be stated that the above-mentioned specific implementation methods are only preferred embodiments of the present utility model and the technical principles used. Within the technical scope disclosed by the present utility model, any changes or substitutions that can be easily thought of by technicians familiar with this technical field should be included in the protection scope of the present utility model.

Claims

1. A roller brush cleaning mechanism, characterized in that: The invention comprises a supporting side plate, a supporting bottom plate, an upper roller and a lower roller, wherein the lower end of the supporting side plate is provided with a first adjusting hole along the vertical direction, the side edge of the supporting bottom plate is provided with a first locking hole, the first adjusting hole and the first locking hole are locked and connected by a first bolt, a connecting hole for fixing is installed on the supporting bottom plate, both ends of the lower roller are connected with a first mounting block with a bearing, the first mounting block is fixed to the upper end of the supporting side plate, both sides of the upper roller are connected with a second mounting block with a bearing, the second mounting block is movable along the vertical direction on the upper end of the supporting side plate, and a plurality of cleaning brushes are installed on the upper roller and the lower roller.

2. A roller brush cleaning mechanism according to claim 1, characterized in that: It includes a motor mounting plate and a driving motor, the supporting side plate is provided with a second adjustment hole along the vertical direction, the motor mounting plate is provided with a second locking hole, the second adjustment hole and the second locking hole are locked and connected by a second bolt, the driving motor is fixed on the motor mounting plate, and the driving motor drives the rotation of the upper roller and the lower roller.

3. A roller brush cleaning mechanism according to claim 2, characterized in that: A driving wheel is connected to the driving end of the driving motor, one end of the upper roller is connected to a first driven wheel, one end of the lower roller is connected to a second driven wheel, and a synchronous belt is connected between the driving wheel, the first driven wheel and the second driven wheel.

4. A roller brush cleaning mechanism according to claim 1, characterized in that: A guide seat is fixed to the front end of the supporting side plate, a guide rod is connected between the two guide seats, and a guide wheel is installed on the guide rod.

5. A roller brush cleaning mechanism according to claim 4, characterized in that: A coupling is locked on the guide rod, a guide block is connected to the coupling, and the guide wheel is rotatably connected to the guide block.

6. A roller brush cleaning mechanism according to claim 1, characterized in that: An adjusting screw is arranged at the upper end of the supporting side plate. The adjusting screw passes through the top rear bearing of the supporting side plate and is connected to the second mounting block. The middle part of the adjusting screw is threadedly connected to the supporting side plate.

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