Etching liquid filtering and impurity removing device

By designing recyclable filtering and adjustment components, the filter plate of the etching liquid filtering and removal device is automatically replaced and cleaned, solving the problem of harmful gas leakage during cleaning of existing devices, and improving safety and service life.

CN222900461UActive Publication Date: 2025-05-27CHANGZHOU HAIHONG ELECTRONICS CO LTD

Patent Information

Application Number
CN202422001853.9
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-08-19
Publication Date
2025-05-27
Estimated Expiration
2034-08-19

AI Technical Summary

Technical Problem

The existing etchant filtering and debris removal device needs to open the overall device when cleaning the filter plate, which may lead to harmful gas leakage and poor safety.

Method used

An etching liquid filter removal device is designed, and the recyclable filter components and adjustment components are used. Through the cooperation of the rotating shaft and rubber block, the filter plate is automatically replaced and cleaned, avoiding the need to open the device for cleaning.

Benefits of technology

It improves the safety of the device, avoids the leakage of harmful gases, realizes efficient cleaning and replacement of the filter plate, and extends the service life of the device.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the field of impurity removal devices, and discloses an etching liquid filtering and impurity removal device which comprises a barrel body, a liquid inlet is formed in the top end of the barrel body, a ventilation opening is formed in the left end of the barrel body, a liquid outlet is formed in the bottom end of the barrel body, and a filtering assembly is arranged on the inner wall of the barrel body and comprises a rotating shaft. The rotating shaft penetrates through and slides at the top end of the barrel body, an adjusting assembly is arranged at the top end of the barrel body and comprises a positioning ring, the bottom end of the positioning ring is fixedly connected to the top end of the barrel body, the filtering assembly further comprises a baffle, the baffle is fixedly connected to the inner wall of the barrel body, and a filtering plate is slidably connected to the outer wall of the rotating shaft. According to the utility model, by arranging the filter assembly which can be recycled, when one group of filter plates is blocked, the other group of filter plates can be used for filtering by adjusting the rotating shaft, and meanwhile, the blocked filter plates can be cleaned, so that the device does not need to be opened for cleaning.
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Description

Technical Field

[0001] The utility model relates to the field of impurity removal devices, in particular to an etching solution filtering and impurity removal device. Background Art

[0002] Etching solution is a common chemical reagent, and its main function is to remove the unnecessary parts on the surface of materials through chemical reactions, so as to achieve precise processing and patterning of materials. In order to improve the utilization rate of etching solution, the used etching solution usually undergoes secondary recycling. In order to remove the excess impurities therein, an etching solution impurity removal device is required.

[0003] After retrieval, Chinese Patent Publication No.: CN219630711U discloses an etching solution filtering and impurity removal device, which relates to the field of etching solution. The etching solution filtering and impurity removal device includes a box body. A discharge hole communicating with the inside of the box body is opened at the bottom of the box body. A support ring is fixedly connected to the inner wall of the box body. A fixing ring is lapped on the upper surface of the support ring. A filter screen is fixedly connected to the inner wall of the fixing ring. A connecting groove is opened on the upper surface of the support ring. Through the mutual cooperation among the box body, the support ring, the fixing ring, the filter screen, the movable hole, the spring, the fixing block, the blocking rod, the through hole, the slot, the connecting groove and the connecting rod, the used etching solution can be filtered to remove the impurities therein. Through the cooperation among the discharge hole, the conduit and the valve, it is convenient to recycle the filtered etching solution, and the problem that the etching solution cannot be reused due to more impurities doped inside during the current etching solution recycling is solved.

[0004] When this device is in use, a filter plate is used to filter the etching solution, and the residual impurities in the etching solution can be removed. However, the etching solution itself emits harmful gases, so it needs to be processed in a sealed environment. When cleaning the filter plate of this device, the whole device needs to be opened for cleaning, which may cause the leakage of the internal gas of the device, and the safety of the whole device is poor. Therefore, an etching solution filtering and impurity removal device is proposed to solve the above problems. Summary of the Utility Model

[0005] In order to make up for the above deficiencies, the utility model provides an etching solution filtering and impurity removal device, aiming to improve the problem that "opening the device to clean the filter plate therein may cause the leakage of harmful gases inside the device, which may cause personal injury" in the prior art.

[0006] To achieve the above object, the present utility model adopts the following technical solutions: An etching solution filtering and impurity removing device, including a barrel body, an inlet is installed at the top end of the barrel body, a ventilation port is installed at the left end of the barrel body, an outlet is installed at the bottom end of the barrel body, and a filtering component is arranged on the inner wall of the barrel body. The filtering component includes a rotating shaft, the rotating shaft penetrates and slides on the top end of the barrel body, and an adjusting component is arranged at the top end of the barrel body. The adjusting component includes a positioning ring, and the bottom end of the positioning ring is fixedly connected to the top end of the barrel body.

[0007] As a further description of the above technical solution:

[0008] The filtering component further includes a baffle, the baffle is fixedly connected to the inner wall of the barrel body, a filter plate is slidably connected to the outer wall of the rotating shaft, a partition plate is fixedly connected to the left end of the filter plate, and another group of filter plates is fixedly connected to the partition plate.

[0009] As a further description of the above technical solution:

[0010] A drainage plate is fixedly connected to the left end of the baffle near the top end of the filter plate, and a protective plate is arranged on the inner wall of the barrel body near the top end of the ventilation port.

[0011] As a further description of the above technical solution:

[0012] The bottom end of the rotating shaft is rotatably connected to a rubber block, the rubber block is adapted to the filter plate, the bottom end of the rubber block is fixedly connected to an elastic telescopic rod, and the bottom end of the elastic telescopic rod is fixedly connected to the bottom end of the inner wall of the barrel body.

[0013] As a further description of the above technical solution:

[0014] A water inlet is arranged at the front end of the barrel body, a drain port is arranged at the right end of the barrel body, and the rubber block slides on the right end of the baffle.

[0015] As a further description of the above technical solution:

[0016] The adjusting component further includes a handle, the bottom end of the handle is rotatably connected to a rotating ring, and the bottom end of the handle is fixedly connected to the top end of the rotating shaft.

[0017] As a further description of the above technical solution:

[0018] A slider is fixedly connected to the inner wall of the handle, a chute is arranged on the outer wall of the positioning ring, a positioning groove is arranged at the top end of the chute, and the slider slides on the inner wall of the chute.

[0019] As a further description of the above technical solution:

[0020] The bottom end of the rotating ring is fixedly connected with a support spring, and the bottom end of the support spring is fixedly connected to the top end of the positioning ring.

[0021] The utility model has the following beneficial effects:

[0022] 1. In the utility model, by setting a recyclable filtering component, when a group of filter plates is blocked, the rotating shaft can be adjusted to use another group of filter plates for filtering, and at the same time, the blocked filter plates can be cleaned. In this way, it is not necessary to open the device for cleaning, and the overall device has good safety.

[0023] 2. In the utility model, by setting an adjusting component, when it is necessary to adjust the positions of the two groups of filter plates, the grip needs to be pressed first before the grip can be rotated, so as to drive the rotating shaft to rotate. At the same time, a positioning groove for positioning is also arranged on the outer wall of the positioning ring, and the overall device has good stability during use. Description of the Drawings

[0024] Figure 1 It is a three-dimensional structural schematic diagram of the overall device in the utility model;

[0025] Figure 2 It is a sectional three-dimensional structural schematic diagram of the overall device in the utility model;

[0026] Figure 3 It is a three-dimensional structural schematic diagram of the filtering component in the utility model;

[0027] Figure 4 It is a three-dimensional structural schematic diagram of the rotating shaft and the rubber block in the utility model;

[0028] Figure 5 It is a disassembled three-dimensional structural schematic diagram of the adjusting component in the utility model.

[0029] Legend Explanation:

[0030] 1. Barrel body; 2. Liquid inlet; 3. Ventilation port; 4. Filtering component; 41. Water inlet; 42. Filter plate; 43. Partition board; 44. Baffle plate; 45. Drainage plate; 46. Drainage port; 47. Rubber block; 48. Elastic telescopic rod; 49. Rotating shaft; 5. Adjusting component; 51. Positioning ring; 52. Rotating ring; 53. Support spring; 54. Grip; 55. Slide block; 56. Slide groove; 57. Positioning groove; 6. Protection plate; 7. Liquid outlet. Detailed Implementation Modes

[0031] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0032] Referring to Figure 1 - Figure 3 , an embodiment provided by the present invention: an etching solution filtering and impurity removing device, including a barrel body 1 for supporting and accommodating the whole device. An inlet 2 for conveying the etching solution into the barrel body 1 is installed at the top end of the barrel body 1. A ventilation port 3 for connecting a ventilation component is installed at the left end of the barrel body 1. By using the ventilation component, the harmful gases inside the device can be extracted, so as to prevent the harmful gases from accumulating in large quantities inside the device. An outlet 7 for discharging the filtered solution is installed at the bottom end of the barrel body 1. A filtering component 4 for filtering the etching solution is arranged on the inner wall of the barrel body 1. The filtering component 4 includes a rotating shaft 49 for driving the filter plate 42 to move in the etching solution. The rotating shaft 49 penetrates and slides on the top end of the barrel body 1. An adjusting component 5 for adjusting the rotation of the rotating shaft 49 is arranged at the top end of the barrel body 1. The adjusting component 5 includes a positioning ring 51 for fixing a grip 54. The bottom end of the positioning ring 51 is fixedly connected to the top end of the barrel body 1.

[0033] Referring to Figure 2 - Figure 4 , the filtering component 4 further includes a baffle 44 for dividing the internal space of the barrel body 1. The baffle 44 is fixedly connected to the inner wall of the barrel body 1. A filter plate 42 for filtering the etching solution is slidably connected to the outer wall of the rotating shaft 49. A partition plate 43 for separating two groups of filter plates 42 is fixedly connected to the left end of the filter plate 42. Another group of filter plates 42 is fixedly connected to the partition plate 43. A diversion plate 45 for guiding the flow of the etching solution is fixedly connected to the left end of the baffle 44 near the top end of the filter plate 42. A protection plate 6 for protecting the ventilation port 3 is arranged on the inner wall of the barrel body 1 near the top end of the ventilation port 3. A rubber block 47 for blocking the opening at the bottom end of the filter plate 42 is rotatably connected to the bottom end of the rotating shaft 49. The rubber block 47 is adapted to the filter plate 42. By using the rubber block 47 to block the bottom end of the filter plate 42, the filter plate 42 can be closed. An elastic telescopic rod 48 for pushing the filter plate 42 is fixedly connected to the bottom end of the rubber block 47. The bottom end of the elastic telescopic rod 48 is fixedly connected to the bottom end of the inner wall of the barrel body 1. The elastic telescopic rod 48 will always push the rubber block 47 upward to make it closely fit the bottom end of the filter plate 42.

[0034] Referring to Figure 1 、 Figure 2 、 Figure 5The front end of the barrel body 1 is provided with a water inlet 41 for conveying cleaning agent into the barrel body 1, and the right end of the barrel body 1 is provided with a drain port 46 for discharging sewage. The rubber block 47 slides on the right end of the baffle 44. The adjustment component 5 also includes a handle 54 for driving the rotating shaft 49 to rotate. The bottom end of the handle 54 is rotatably connected to a rotating ring 52 for pushing the handle 54. The bottom end of the handle 54 is fixedly connected to the top of the rotating shaft 49. The rotating shaft 49 can be driven to rotate by rotating the handle 54. The inner wall of the handle 54 is fixedly connected to a slider 55 for fixing the handle 54. The outer wall of the positioning ring 51 is provided with a A slide groove 56 is provided for the slider 55 to slide, and a positioning groove 57 is provided at the top of the slide groove 56 for raising the slider 55. The slider 55 slides on the inner wall of the slide groove 56. When the slider 55 is inside the slide groove 56, the slider 55 can slide. When the slider 55 enters the positioning groove 57, the slider 55 will be restricted to slide up and down. The bottom end of the rotating ring 52 is fixedly connected to a support spring 53 for supporting the rotating ring 52. The bottom end of the support spring 53 is fixedly connected to the top of the positioning ring 51. The support spring 53 will always push the handle 54 upward to drive it to move upward and reset.

[0035] Working principle: During filtering, when the filter plate 42 has too many impurities on its surface due to filtering too much etching liquid, you can first press the handle 54 downward to drive the shaft 49 to move downward, and at the same time, the slider 55 will move downward to leave the interior of the positioning groove 57 and enter the interior of the slide groove 56, then you can rotate the handle 54 to drive the shaft 49 to rotate, and the rotation of the shaft 49 will drive the two groups of filter plates 42 to rotate synchronously. When the handle 54 rotates half a circle, you can release the handle 54, and the support spring 53 will push the rotating ring 52 to move upward, and the rotating ring 52 will push the handle 54 upward to move upward. The upward movement of the handle 54 will drive the slider 55 to re-enter the interior of the positioning groove 57. At this time, the shaft 49 will be re-fixed, and the positions of the two groups of filter plates 42 are also exchanged.

[0036] When the filter plate 42 is replaced and the rotating shaft 49 is reset, the elastic telescopic rod 48 will push the rubber block 47 to make it fit tightly against the bottom end of the filter plate 42. Then, the water inlet 41 can be used to deliver the cleaning agent to clean the filter plate 42. The sewage generated by the cleaning will be discharged through the drain port 46. In this way, the filter plate 42 can be cleaned and can be prepared for the next use after cleaning.

[0037] Finally, it should be noted that the above are only the preferred embodiments of the present utility model and are not used to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements on some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present utility model shall be included within the protection scope of the present utility model.

Claims

1. An etching liquid filtering and impurity removal device, comprising a barrel (1), characterized in that: The top end of the barrel body (1) is provided with a liquid inlet (2), the left end of the barrel body (1) is provided with a vent (3), the bottom end of the barrel body (1) is provided with a liquid outlet (7), the inner wall of the barrel body (1) is provided with a filter assembly (4), the filter assembly (4) comprises a rotating shaft (49), the rotating shaft (49) penetrates through and slides on the top end of the barrel body (1), the top end of the barrel body (1) is provided with an adjustment assembly (5), the adjustment assembly (5) comprises a positioning ring (51), the bottom end of the positioning ring (51) is fixedly connected to the top end of the barrel body (1).

2. The etching liquid filtering and impurity removal device according to claim 1, characterized in that: The filter assembly (4) further comprises a baffle (44), wherein the baffle (44) is fixedly connected to the inner wall of the barrel body (1), the outer wall of the rotating shaft (49) is slidably connected to a filter plate (42), the left end of the filter plate (42) is fixedly connected to a partition plate (43), and the partition plate (43) is fixedly connected to another group of filter plates (42).

3. The etching liquid filtering and impurity removal device according to claim 2, characterized in that: A guide plate (45) is fixedly connected to the left end of the baffle (44) near the top of the filter plate (42), and a protective plate (6) is provided on the inner wall of the barrel (1) near the top of the vent (3).

4. The etching liquid filtering and impurity removal device according to claim 2, characterized in that: The bottom end of the rotating shaft (49) is rotatably connected to a rubber block (47), the rubber block (47) and the filter plate (42) are matched, the bottom end of the rubber block (47) is fixedly connected to an elastic telescopic rod (48), and the bottom end of the elastic telescopic rod (48) is fixedly connected to the bottom end of the inner wall of the barrel body (1).

5. The etching liquid filtering and impurity removal device according to claim 4, characterized in that: The front end of the barrel body (1) is provided with a water inlet (41), the right end of the barrel body (1) is provided with a water outlet (46), and the rubber block (47) slides on the right end of the baffle (44).

6. The etching liquid filtering and impurity removal device according to claim 1, characterized in that: The adjustment assembly (5) further comprises a handle (54), the bottom end of the handle (54) being rotatably connected to a rotating ring (52), and the bottom end of the handle (54) being fixedly connected to the top end of the rotating shaft (49).

7. The etching liquid filtering and impurity removal device according to claim 6, characterized in that: The inner wall of the handle (54) is fixedly connected with a slider (55), the outer wall of the positioning ring (51) is provided with a slide groove (56), the top of the slide groove (56) is provided with a positioning groove (57), and the slider (55) slides on the inner wall of the slide groove (56).

8. The etching liquid filtering and impurity removal device according to claim 7, characterized in that: The bottom end of the rotating ring (52) is fixedly connected to a support spring (53), and the bottom end of the support spring (53) is fixedly connected to the top end of the positioning ring (51).

Citation Information

Patent Citations

  • Etching liquid filtering and impurity removing device

    CN219630711U

Cited By

  • Etching liquid filtering and impurity removing device

    CN224573365U