Coating equipment

By designing a circumferentially rotatable coating head and a gradually widening coating slit, combined with vacuum adsorption and driving mechanism, the waste and uneven distribution problems of existing equipment when coating circular or annular substrates are solved, and efficient and uniform coating effect is achieved.

CN222901590UActive Publication Date: 2025-05-27DEHU COATING EQUIP (SUZHOU) CO LTD
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Patent Information

Application Number
CN202421783095.4
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-07-26
Publication Date
2025-05-27
Estimated Expiration
2034-07-26

AI Technical Summary

Technical Problem

When coating perovskite solar cell substrates, existing coating equipment cannot effectively utilize circular or annular substrates, resulting in waste and uneven distribution of coating liquid, increasing production costs and difficulty in handling waste liquids.

Method used

A coating device is designed, the coating head can rotate circumferentially relative to the carrier table, and the width of the coating slit gradually increases from the center to the edge of the substrate. Combined with the vacuum adsorption and driving mechanism, it ensures that the coating liquid is evenly distributed on the substrate.

Benefits of technology

It improves the efficiency of the coating liquid, reduces production costs and waste liquid treatment difficulty, and ensures the uniform distribution of the coating liquid on the substrate.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The utility model discloses coating equipment which comprises a bearing table and a coating assembly, and the bearing table is used for bearing a base material. The coating assembly comprises a coating head, the coating head is arranged above the bearing table, a coating slit is formed in the side, facing the base material, of the coating head, and the base material is coated with coating liquid in the coating head through the coating slit. Wherein the coating head can rotate in the circumferential direction relative to the bearing table, so that the coating head can coat the base material. The coating head can circumferentially rotate relative to the bearing table, so that the coating liquid in the coating head is coated on the base material through the coating slit, the coating liquid is reduced or prevented from being coated on the area outside the base material, the use efficiency of the coating liquid can be improved, the production cost is reduced, the quantity of generated waste liquid is reduced, and the production cost is reduced. The difficulty and cost of waste liquid treatment are reduced, meanwhile, uneven distribution of the coating liquid on the base material due to the fact that the coating liquid flows under the action of centrifugal force can be avoided, and it is ensured that the coating liquid on the base material is distributed more evenly.
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Description

Technical Field

[0001] The utility model relates to the technical field of coating equipment, in particular to a coating equipment. Background Art

[0002] Coating equipment is an important industrial mechanical equipment, which is used to uniformly coat various materials, such as coatings, inks, adhesives, films, etc. on the surface of a substrate to meet the production needs of different industries. With the rapid development of new energy, perovskite solar cells have the advantages of high photoelectric conversion efficiency, long service life, low preparation cost, etc., and perovskite solar cells have been widely used.

[0003] In the preparation process of perovskite solar cells, the coating head of the coating equipment moves linearly relative to the substrate, and the coating head coats the coating liquid on the substrate. This kind of coating equipment is only suitable for rectangular substrates. When the substrate is circular or annular, if the coating head moves linearly relative to the substrate, since some areas of the coating head will exceed the substrate, then some coating liquid will be coated on the area outside the substrate. The existing coating equipment results in relatively low material utilization rate, causing material waste, and the coating liquid coated outside the substrate will become waste liquid, resulting in an increase in the amount of waste liquid, and also increasing the difficulty of treating waste liquid. In particular, when coating precious materials, it will cause a significant increase in production costs.

[0004] Therefore, the existing coating equipment urgently needs to be improved. Summary of the Invention

[0005] The purpose of the utility model is to provide a coating equipment, which can not only improve the utilization efficiency of the coating liquid, reduce the production cost, but also reduce the amount of waste liquid generated, reduce the difficulty and cost of waste liquid treatment, and at the same time can avoid the coating liquid from flowing due to centrifugal force, resulting in uneven distribution of the coating liquid on the substrate.

[0006] The purpose of the utility model is realized by adopting the following technical solutions:

[0007] A coating equipment, comprising:

[0008] A carrier table, which is used to carry the substrate. A through hole and a groove are arranged on the surface of the carrier table facing the substrate. The groove communicates a plurality of the through holes. A joint communicating with the through hole is arranged on the surface of the carrier table facing away from the substrate. The through hole is connected to a vacuum pump through the joint, so that the substrate is adsorbed on the carrier table;

[0009] A coating assembly, which comprises a coating head. The coating head is arranged above the carrier table. A coating slit is arranged on the side of the coating head facing the substrate. The coating liquid in the coating head is coated on the substrate through the coating slit;

[0010] Wherein, the coating head is rotatable circumferentially relative to the carrier table so that the coating head coats the substrate.

[0011] Preferably, the substrate is circular or annular.

[0012] Preferably, it further includes a driving mechanism for driving the coating head to rotate circumferentially.

[0013] Preferably, the coating assembly further includes a bracket, a supporting assembly and a driving device. The bracket includes a movable bracket and side plates arranged at both ends of the movable bracket. The movable bracket is arranged on the side plates in a liftable manner. The movable bracket is used for mounting the coating head, and the driving device is used for driving the movable bracket to lift through the supporting assembly.

[0014] Preferably, a liquid supply assembly is arranged on the movable bracket. The liquid supply assembly is communicated with the coating head and supplies coating liquid to the coating head; and / or,

[0015] The coating assembly further includes a balancing device. The balancing device is connected to the movable bracket or the supporting assembly and is used for applying a force to the movable bracket or the supporting assembly in a direction opposite to the gravity direction.

[0016] Preferably, the coating slit has opposite first and second ends. The first end of the coating slit is arranged close to the center of the substrate, the second end of the coating slit is arranged close to the edge of the substrate, and the width of the first end of the coating slit is smaller than the width of the second end of the coating slit.

[0017] Preferably, the width of the coating slit gradually increases from the first end of the coating slit to the second end of the coating slit.

[0018] Preferably, the cross-sectional shape of the coating slit along the direction perpendicular to the height direction of the coating head is in a sector structure or a sector ring structure, and the central angle of the sector structure or the sector ring structure is 0 - 10°;

[0019] Wherein, the center of the sector structure is close to the first end of the coating slit, and the arc of the sector structure is close to the second end of the coating slit;

[0020] The inner arc of the sector ring structure is close to the first end of the coating slit, and the outer arc of the sector ring structure is close to the second end of the coating slit.

[0021] Preferably, the ratio of the inner arc diameter to the outer arc diameter of the sector ring structure is 1:(1.02 - 1.3).

[0022] Preferably, it further includes a lifting mechanism for controlling the lifting of the carrier table and the substrate; and / or,

[0023] It further includes a bearing base, the bearing platform is arranged on the bearing base, and support legs are arranged on one side of the bearing base facing away from the bearing platform. The support legs are used to make all points on the bearing surface of the bearing platform be on the same horizontal plane.

[0024] Compared with the prior art, the beneficial effects of the present utility model at least include:

[0025] For the coating equipment of the present utility model, since the coating head can rotate circumferentially relative to the bearing platform, the coating liquid in the coating head is coated on the substrate through the coating slit, reducing or avoiding the coating liquid being coated on areas outside the substrate. This not only improves the utilization efficiency of the coating liquid, reduces production costs, but also reduces the amount of waste liquid generated, reduces the difficulty and cost of waste liquid treatment. At the same time, it can also prevent the coating liquid from flowing due to centrifugal force, resulting in uneven distribution of the coating liquid on the substrate. Description of the Drawings

[0026] Figure 1 It is a schematic structural diagram of the coating equipment according to an embodiment of the present utility model.

[0027] Figure 2 It is a schematic structural diagram of the bearing platform in an embodiment of the present utility model.

[0028] Figure 3 It is Figure 2 A partial enlarged schematic diagram at position A in

[0029] Figure 4 It is a schematic structural diagram of the coating head in an embodiment of the present utility model.

[0030] Figure 5 It is a schematic structural diagram of a coating slit of the coating head in an embodiment of the present utility model.

[0031] Figure 6 It is a schematic structural diagram of another coating slit of the coating head in an embodiment of the present utility model.

[0032] In the figure: 100, coating equipment; 1, bearing platform; 11, through hole; 12, groove; 2, coating assembly; 21, coating head; 211, coating slit; 2111, first end; 2112, second end; 212, fan-shaped structure; 213, fan-shaped ring structure; 2131, inner arc; 2132, outer arc; 22, support; 221, moving support; 222, side plate; 23, support assembly; 24, driving device; 25, liquid supply assembly; 26, balancing device; 3, driving mechanism; 4, bearing base; 5, support leg; 6, base; 200, substrate. Detailed Embodiments

[0033] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. However, the exemplary embodiments can be implemented in various forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this utility model will be more complete and comprehensive, and the concept of the exemplary embodiments will be fully conveyed to those skilled in the art. Like reference numerals in the figures denote like or similar structures, and thus their repetitive description will be omitted.

[0034] The words expressing positions and directions described in this utility model are all illustrated by taking the accompanying drawings as examples, but can be changed according to needs, and all such changes are included in the protection scope of this utility model.

[0035] Referring to Figures 1 to 6 , this utility model provides a coating device 100, including: a carrier table 1 and a coating assembly 2, and the coating assembly 2 is used for coating a substrate 200 placed on the carrier table 1.

[0036] Specifically, the carrier table 1 is used for carrying the substrate 200. The shape of the carrier table 1 can be circular, square or other shapes. As a preferred mode, the shape of the carrier table 1 is circular, and the substrate 200 is preferably circular or annular.

[0037] As a preferred mode, referring to Figure 2 , Figure 3 , a through hole 11 is provided on the surface of the carrier table 1 facing the substrate 200. The number of the through holes 11 is preferably multiple. A joint (not shown) communicating with the through hole 11 is provided on the surface of the carrier table 1 facing away from the substrate 200. The through hole 11 is connected to a vacuum pump through the joint, so that the substrate 200 is adsorbed on the carrier table 1. When the vacuum pump works, a vacuum is formed in the through hole 11, and the substrate 200 is adsorbed on the carrier table 1. On the one hand, it prevents the position of the substrate 200 from shifting, ensuring that the coating head 21 accurately coats the coating liquid on the substrate 200, and can also prevent the substrate 200 from vibrating or shaking, resulting in uneven distribution of the coating liquid. On the other hand, it can also prevent the substrate 200 from warping, making the surface of the substrate 200 flatter, thereby improving the uniformity of the coating liquid coated by the coating head 21 on the substrate 200. The coating liquid is, for example, a perovskite solution, and the substrate 200 is, for example, crystalline silicon, a substrate, a wafer, etc.

[0038] A plurality of through holes 11 can be arranged in a circular pattern, that is, the plurality of through holes 11 are distributed in a circular shape with the center of the carrier 1 as the center of the circle, and the through holes 11 in the circular distribution have multiple spaced layers, so that the substrate 200 can be subjected to uniform suction force to ensure that the substrate 200 is adsorbed on the carrier 1. A groove 12 is further provided on the surface of the carrier 1 facing the substrate 200, and the shape of the groove 12 is correspondingly arranged with the distribution of the through holes 11. The groove 12 can connect the plurality of through holes 11, further enabling the substrate 200 to receive a more uniform suction force. In this embodiment, the groove 12 can be circular as a whole.

[0039] Reference Figure 1 , Figure 4 , the coating assembly 2 can include a coating head 21. The coating head 21 is disposed above the carrier 1. A coating slit 211 is provided on the side of the coating head 21 facing the substrate 200. The coating slit 211 extends along the length direction of the coating head 21, and the discharge lip of the coating slit 211 is linear. The coating liquid in the coating head 21 is coated on the substrate 200 through the coating slit 211. Among them, the coating head 21 can rotate circumferentially relative to the carrier 1 to coat the substrate 200 with the coating head 21. That is to say, the carrier 1 does not rotate circumferentially, and the coating head 21 can rotate circumferentially to realize coating the substrate 200 with the coating head 21. In this way, when the coating liquid is coated on the substrate 200, the carrier 1 does not rotate circumferentially, and the substrate 200 does not rotate circumferentially either. The coating liquid on the substrate 200 will not flow due to centrifugal force, resulting in uneven distribution of the coating liquid on the substrate 200. In particular, when the coating liquid is a low-viscosity solution, the low-viscosity coating liquid is more easily affected by centrifugal force. The carrier 1 of the present application does not rotate circumferentially, ensuring that the coating liquid on the substrate 200 is more evenly distributed.

[0040] In the present application, the coating head 21 can rotate circumferentially relative to the carrier 1, so that the coating liquid in the coating head 21 is coated on the substrate 200 through the coating slit 211, reducing or avoiding the coating liquid being coated on the area outside the substrate 200. This can not only improve the utilization efficiency of the coating liquid, reduce production costs, but also reduce the amount of waste liquid generated, lower the difficulty and cost of waste liquid treatment. At the same time, since the substrate 200 does not rotate circumferentially, it can also avoid the coating liquid flowing due to centrifugal force, resulting in uneven distribution of the coating liquid on the substrate 200, ensuring that the coating liquid on the substrate 200 is more evenly distributed. In addition, compared with the spin coating process, it can also be applicable to coating liquids with different viscosities, improving the versatility of the equipment.

[0041] Reference Figure 1, the coating device 100 may further include a driving mechanism 3, and the driving mechanism 3 can be used to drive the coating head 21 to rotate circumferentially. The driving mechanism 3 can not only realize the automatic operation of the coating device 100, but also the rotation speed of the driving mechanism 3 is more uniform, which can improve the uniformity of coating. The driving mechanism 3 can be a motor respectively. The coating head 21 is connected to a rotating shaft or the coating head 21 itself has a rotating shaft. The motor is connected to the rotating shaft through a speed reducer and a gear transmission mechanism, and then drives the coating head 21 to rotate. Other known solutions can also be adopted for the motor to drive the coating head 21 to rotate, which will not be elaborated here.

[0042] In a specific embodiment, referring to Figure 1 , Figure 4 , the coating slit 211 has opposite first end 2111 and second end 2112. The first end 2111 of the coating slit 211 is arranged close to the center of the substrate 200, and the second end 2112 of the coating slit 211 is arranged close to the edge of the substrate 200, avoiding uncoated areas at local positions of the substrate 200. Since the coating is applied from the center of the substrate 200 to the edge of the substrate 200, the area of the substrate 200 that needs to be coated gradually increases. If the coating head 21 takes the same time to coat different positions, and the width of the coating slit 211 is the same, it will result in a greater thickness of the coating liquid at the center position of the substrate 200 than that at the edge position of the substrate 200. Therefore, in the present application, the width of the first end 2111 of the coating slit 211 is smaller than the width of the second end 2112 of the coating slit 211, that is, less coating liquid flows out from the first end 2111 of the coating slit 211, and more coating liquid flows out from the second end 2112 of the coating slit 211, so that the thickness of the coating liquid on the substrate 200 can be more uniform.

[0043] As a preferred method, since the coating is applied from the center of the substrate 200 to the edge of the substrate 200, the area of the substrate 200 that needs to be coated gradually increases, and the width of the coating slit 211 gradually increases from the first end 2111 of the coating slit 211 to the second end 2112 of the coating slit 211, that is, the coating liquid flowing out from the coating slit 211 gradually increases from the first end 2111 of the coating slit 211 to the second end 2112 of the coating slit 211, which can further improve the uniformity of the thickness of the coating liquid on the substrate 200.

[0044] Referring to Figure 5 , Figure 6 , the cross-sectional shape of the coating slit 211 in the direction perpendicular to the height direction of the coating head 21 can be a fan-shaped structure 212, a fan-shaped ring structure 213, a triangular structure, a trapezoidal structure, etc. In this embodiment, the cross-sectional shape of the coating slit 211 in the direction perpendicular to the height direction of the coating head 21 is a fan-shaped structure 212 or a fan-shaped ring structure 213, and the central angle of the fan-shaped structure 212 or the fan-shaped ring structure 213 is 0-10°.

[0045] Reference Figure 5 , when the coating liquid can achieve laminar flow in the coating slit 211, that is, the velocity distribution of the coating liquid in the coating slit 211 is uniform, ignoring the boundary of the coating slit 211, that is, ignoring the influence of the inner wall surface roughness of the coating slit 211, at this time the inner wall of the coating slit 211 is smooth, and the flow velocities at different positions are basically the same. The thickness of the coating liquid on the substrate 200 is related to the velocity of the coating liquid flowing out of the coating slit 211, the width of the coating slit 211, that is, the central angle of the coating slit 211, and the angular velocity of the circumferential relative rotation between the carrier table 1 and the coating head 21. Only by keeping the velocity of the coating liquid flowing out of the coating slit 211, the width of the coating slit 211, that is, the central angle of the coating slit 211, and the angular velocity of the circumferential relative rotation between the carrier table 1 and the coating head 21 unchanged, can the uniformity of the thickness of the coating liquid on the substrate 200 be ensured. That is to say, the coating liquid flowing out of the coating slit 211 increases uniformly from the first end 2111 to the second end 2112 of the coating slit 211. At this time, the cross-sectional shape of the coating slit 211 in the direction perpendicular to the height of the coating head 21 is preferably a fan-shaped structure 212. When the cross-sectional shape of the coating slit 211 in the direction perpendicular to the height of the coating head 21 is a fan-shaped structure 212, the center of the fan-shaped structure 212 is close to the first end 2111 of the coating slit 211, and the arc of the fan-shaped structure 212 is close to the second end 2112 of the coating slit 211.

[0046] Reference Figure 6, even when the coating liquid can achieve laminar flow in the coating slit 211, that is, the velocity distribution of the coating liquid in the coating slit 211 is uniform, due to the influence of the inner wall surface roughness of the coating slit 211, the inner wall surface roughness of the coating slit 211 generates resistance to the flow of the coating liquid, resulting in a decrease in the flow velocity of the coating liquid near the inner wall surface of the coating slit 211. Therefore, the flow velocity of the coating liquid near the center of the coating slit 211 closer to the substrate 200 is smaller, and the flow velocity farther away from the center of the substrate 200 is larger, resulting in a smaller thickness of the coating liquid near the center of the substrate 200. That is, the inner wall surface roughness of the coating slit 211 has a greater influence on the flow velocity of the coating slit 211 near the center of the substrate 200. At this time, the cross-sectional shape of the coating slit 211 in the height direction perpendicular to the coating head 21 is preferably in the shape of a sector ring structure 213. When the cross-sectional shape of the coating slit 211 in the height direction perpendicular to the coating head 21 is in the shape of a sector ring structure 213, the inner arc 2131 of the sector ring structure 213 is close to the first end 2111 of the coating slit 211, and the outer arc 2132 of the sector ring structure 213 is close to the second end 2112 of the coating slit 211. Thus, the increase in the flow velocity in the area closer to the center of the substrate 200 is greater, while the increase in the flow velocity in the area farther away from the center of the substrate 200 is smaller, thereby reducing the influence brought by the wall resistance of the coating slit 211. When the flow velocity in the area closer to the center of the substrate 200 increases to completely eliminate the influence brought by the wall resistance of the coating slit 211, the uniformity of the thickness of the coating liquid on the substrate 200 can be ensured.

[0047] The ratio of the diameter of the inner arc 2131 of the sector ring structure 213 to the diameter of the outer arc 2132 of the sector ring structure 213 is 1:(1.02 - 1.3). By controlling the ratio of the diameter of the inner arc 2131 of the sector ring structure 213 to the diameter of the outer arc 2132 of the sector ring structure 213, the increase in the flow velocity in the area closer to the center of the substrate 200 can be greater, while the increase in the flow velocity in the area farther away from the center of the substrate 200 can be smaller, thereby reducing the influence brought by the wall resistance of the coating slit 211 and improving the uniformity of the thickness of the coating liquid on the substrate 200.

[0048] In a specific embodiment, refer to Figure 1, the coating assembly 2 may further include a bracket 22, a support assembly 23 and a driving device 24. The bracket 22 includes a movable bracket 221 and side plates 222 disposed at both ends of the movable bracket 221. The movable bracket 221 is vertically movably disposed on the side plates 222. The movable bracket 221 is used to mount the coating head 21. The driving device 24 is used to drive the movable bracket 221 to move up and down through the support assembly 23. Specifically, the driving device 24 may be disposed on the side plates 222. One end of the support assembly 23 is connected to the movable bracket 221, and the other end of the support assembly 23 is connected to the driving device 24. The driving device 24 can drive the support assembly 23 to move up and down. The support assembly 23 drives the movable bracket 221 to move up and down. The movable bracket 221 can drive the coating head 21 to move up and down, thereby adjusting the distance between the coating head 21 and the substrate 200. The number of the driving devices 24 may be one or more. In this embodiment, the number of the driving devices 24 is two. The two driving devices 24 are respectively disposed on the side plates 222 at both ends of the movable bracket 221. The driving device 24 may be a servo module. Of course, it may also be other types of driving components. As an example, the driving device 24 includes a motor and a guide rail. The driving end of the motor moves up and down or expands and contracts along the guide rail. The support assembly 23 is connected to the driving end of the motor.

[0049] A liquid supply assembly 25 may be disposed on the movable bracket 221. The liquid supply assembly 25 is communicated with the coating head 21 and supplies coating liquid to the coating head 21. This can shorten the distance between the liquid supply assembly 25 and the coating head 21, making the supply of the coating liquid more stable. The driving mechanism 3 may also be disposed on the movable bracket 221.

[0050] The coating assembly 2 may further include a balancing device 26. The balancing device 26 may be directly connected to the movable bracket 221, or the balancing device 26 may be directly connected to the support assembly 23. The support assembly 23 is connected to the movable bracket 221. The balancing device 26 is used to apply a force to the movable bracket 221 or the support assembly 23 in a direction opposite to the direction of gravity. That is to say, the balancing device 26 can directly apply a force to the movable bracket 221 in a direction opposite to the direction of gravity. The force may be a pulling force or a supporting force in a direction opposite to the direction of gravity. The number of the balancing devices 26 may be one or more. In this embodiment, the number of the balancing devices 26 is two. The two balancing devices 26 are respectively disposed on the side plates 222 at both ends of the movable bracket 221.

[0051] The balancing device 26 can be a cylinder module, and of course it can also be other types of balancing components. As an example, the balancing device 26 includes a cylinder and a push rod. The cylinder drives the push rod to lift or extend and retract. The cylinder can also keep the push rod stationary and maintain a certain pulling force or thrust, that is, the balancing device 26 can apply a certain pulling force or thrust to the moving bracket 221. The balancing device 26 can at least share part of the load of the driving device 24, so as to reduce the load of the driving device 24. Especially before and after the coating head 21 is installed on the moving bracket 221, if the balancing device 26 is not provided, the load of the driving device 24 will change significantly, which is likely to cause a decrease in the positioning accuracy of the driving device 24. After the balancing device 26 is provided, after the coating head 21 is installed on the moving bracket 221, the acting force of the balancing device 26 on the moving bracket 221 can be increased to reduce the load of the driving device 24, or the load of the driving device 24 can be kept within a preset range all the time, thereby improving the repeat positioning accuracy of the driving device 24 or keeping the driving device 24 with high repeat positioning accuracy all the time. At the same time, by adopting the above-mentioned balancing device 26, each position of the coating slit 211 of the coating head 21 can be kept at the same distance from the substrate 200 all the time, so as to obtain a liquid film with a uniform thickness, improve the product quality, extend the service life of the driving device 24, reduce the replacement frequency of the driving device 24, improve the equipment use efficiency, and reduce the equipment use cost and maintenance cost. The load mainly refers to the gravity of the moving bracket 221 or the gravity of the coating head 21, or can also refer to the gravity of the moving bracket 221 and the gravity of the coating head 21.

[0052] The coating equipment 100 may further include a lifting mechanism (not shown). The lifting mechanism can be a lifting cylinder or an oil cylinder. The lifting mechanism can be arranged on the side of the carrier table 1 facing away from the substrate 200. The lifting mechanism is used to control the lifting of the carrier table 1 and the substrate 200, and can adjust the distance between the substrate 200 and the coating head 21.

[0053] Reference Figure 1 , the coating equipment 100 may further include a carrier base 4. The carrier table 1 is arranged on the carrier base 4. Support legs 5 are arranged on the side of the carrier base 4 facing away from the carrier table 1. There can be multiple support legs 5, for example, three. The three support legs 5 are arranged at intervals below the carrier table 1. The support legs 5 are used to make each point on the bearing surface of the carrier table 1 in the same horizontal plane.

[0054] The coating equipment 100 may further include a base 6. The base 6 is integrally rectangular. The side plate 222, the support legs 5 and the carrier base 4 are all arranged on the base 6. The base 6 can provide a flat bearing surface.

[0055] Although the embodiments of the present utility model have been shown and described above, it can be understood that the above embodiments are exemplary and should not be construed as limiting the present utility model. Without departing from the principle and purpose of the present utility model, those of ordinary skill in the art can make changes, modifications, substitutions, and variations to the above embodiments within the scope of the utility model, and all such changes should fall within the protection scope of the claims of the present utility model.

Claims

1. A coating device, characterized in that: include: A carrier platform, the carrier platform is used to carry a substrate, a through hole and a groove are arranged on a surface of the carrier platform facing the substrate, the groove connects a plurality of the through holes, a joint connected to the through holes is arranged on a surface of the carrier platform facing away from the substrate, the through holes are connected to a vacuum pump through the joint, so that the substrate is adsorbed on the carrier platform; A coating assembly, wherein the coating assembly comprises a coating head, the coating head is arranged above the carrying platform, a coating slit is arranged on a side of the coating head facing the substrate, and a coating liquid in the coating head is coated on the substrate through the coating slit; Wherein, the coating head can rotate circumferentially relative to the supporting platform so that the coating head can coat the substrate.

2. The coating device according to claim 1, characterized in that: The substrate is circular or ring-shaped.

3. The coating device according to claim 1, characterized in that: It also includes a driving mechanism, which is used to drive the coating head to rotate in a circumferential direction.

4. The coating device according to claim 1, characterized in that: The coating assembly also includes a bracket, a supporting assembly and a driving device. The bracket includes a movable bracket and side panels arranged at both ends of the movable bracket. The movable bracket can be raised and lowered on the side panels. The movable bracket is used to install the coating head. The driving device is used to drive the movable bracket to rise and fall through the supporting assembly.

5. The coating device according to claim 4, characterized in that: The movable bracket is provided with a liquid supply component, the liquid supply component is communicated with the coating head and provides coating liquid to the coating head; and / or, The coating assembly further comprises a balancing device, wherein the balancing device is connected to the movable bracket or the supporting assembly, and the balancing device is used to apply a force acting in a direction opposite to the direction of gravity to the movable bracket or the supporting assembly.

6. The coating device according to claim 1, characterized in that: The coating slit has a first end and a second end opposite to each other. The first end of the coating slit is arranged near the center of the substrate, and the second end of the coating slit is arranged near the edge of the substrate. The width of the first end of the coating slit is smaller than the width of the second end of the coating slit.

7. The coating device according to claim 6, characterized in that: The width of the coating slit gradually increases from the first end of the coating slit to the second end of the coating slit.

8. The coating device according to claim 7, characterized in that: The cross-sectional shape of the coating slit along the direction perpendicular to the height of the coating head is a fan-shaped structure or a fan-ring structure, and the central angle of the fan-shaped structure or the fan-ring structure is 0-10°; Wherein, the center of the fan-shaped structure is close to the first end of the coating slit, and the arc of the fan-shaped structure is close to the second end of the coating slit; The inner arc of the fan ring structure is close to the first end of the coating slit, and the outer arc of the fan ring structure is close to the second end of the coating slit.

9. The coating device according to claim 8, characterized in that: The ratio of the inner arc diameter of the fan ring structure to the outer arc diameter of the fan ring structure is 1:(1.02-1.3).

10. The coating device according to claim 1, characterized in that: It also includes a lifting mechanism, the lifting mechanism is used to control the lifting of the carrier platform and the substrate; and / or, It also includes a bearing base, the bearing platform is arranged on the bearing base, and a supporting leg is arranged on the side of the bearing base facing away from the bearing platform, and the supporting leg is used to make each point on the bearing surface of the bearing platform be on the same horizontal plane.