Magnetron sputtering cathode target of multi-station coating machine
By using an annular columnar target and an annular magnetic permeable sleeve on the magnetron sputtering target, the axial sliding of the magnetic ring forms an induction pole, the problem of uneven distribution of magnetic force lines is solved, the utilization rate of the target material and the deposition rate of sputtered electrons are improved, and the cost reduction and efficiency increase effect is achieved.
Patent Information
- Application Number
- CN202420774712.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-15
- Publication Date
- 2025-05-27
- Estimated Expiration
- 2034-04-15
AI Technical Summary
The magnetic lines of existing magnetron sputtering targets are unevenly distributed, resulting in concentrated magnetic lines of both ends of the target, the strongest plasma, and annular "V"-shaped channels are formed on the inner side of the target surface, which consumes the fastest, reducing the utilization rate of the target.
An annular columnar target and an annular magnetic permeability sleeve are used. Magnetic parts and magnetic rings are provided on the magnetic permeability sleeve. Induction magnetic poles at different positions are formed through the axial sliding of the magnetic permeability ring, uniformizing the magnetic field distribution and slowing down the consumption rate at both ends of the target.
By uniformizing the magnetic field distribution, the utilization rate of the target material and the deposition rate of sputtered electrons are improved, the production cost is reduced, and the efficiency of the coating is improved.
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Figure CN222908045U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of magnetron sputtering cathode targets, and specifically relates to a magnetron sputtering cathode target for a multi-station coating machine. Background Art
[0002] Magnetron sputtering coating is a coating technology that bombards a solid target with energy-charged particles, causing the target atoms to sputter out and deposit on the surface of the substrate to form a thin film. In the magnetron sputtering coating technology, a cylindrical magnetron sputtering target provides a magnetic field by placing a magnetic pole at the center of the target. The magnetic field fixes and rotates the target. By applying a negative high voltage to the target, with the target as the cathode and the substrate as the anode, an electric field is formed between the target and the substrate. Magnetron sputtering coating utilizes the interaction between the magnetic field and the electric field to make electrons spiral on the target surface and continuously collide with argon gas to generate ions. The generated ions collide with the target surface under the action of the electric field, sputtering out the target material and depositing it on the substrate to obtain the required conductive thin film layer.
[0003] According to the utility model patent with the publication number CN210481507U, the publication (announcement) date: May 8, 2020, a disclosed hollow cathode magnetron sputtering target includes a sealed tube and an insulating sleeve. The insulating sleeve is fixedly installed outside the sealed tube through an internal hexagonal bolt. A coating cavity is provided inside the sealed tube, and a water cooling cavity is provided inside the side wall of the sealed tube. A pipe joint is provided on the upper side wall of the target installation opening. Yokes are alternately and fixedly installed between the annular magnets. Adopting the hollow cathode method, the target material is in a cylindrical shape, and the material to be coated is installed in the central area of the cylinder. The coating material moves axially, and the target material realizes centripetal sputtering. Compared with the magnetron targets commonly used in the market, it has stable starting, no discharge, no arcing, can coat materials of various shapes, has good uniformity, and can achieve a more perfect vacuum coating. The hollow cathode is called the coating technology of the future. The existence of several major technical problems has hindered its widespread adoption, but this situation will gradually change.
[0004] In the prior art including the above-mentioned patent, when using a cylindrical target material, with the material to be coated installed in the central area of the cylinder and the coating material moving axially, when the target material realizes centripetal sputtering, due to the uneven distribution of the magnetic force lines generated by the annular magnet arranged outside the target material on the target surface, the magnetic force lines at both ends of the target material are concentrated, the plasma is the strongest, and a ring-shaped "V"-shaped channel is formed on the inner side of the corresponding target surface due to sputtering. The target material is consumed fastest here until the entire target can no longer be used, thereby reducing the utilization rate of the target material. Content of the Utility Model
[0005] The purpose of the utility model is to provide a magnetron sputtering cathode target for a multi-station coating machine to solve the above problems.
[0006] To achieve the above object, the present utility model provides the following technical solution: A magnetron sputtering cathode target for a multi-station coating machine, comprising a target material in the shape of an annular column and a magnetic conductive sleeve annularly coated outside the target material, and the magnetic conductive sleeve is provided with:
[0007] A magnetic member, which is annular, and the magnetic member is arranged on the mounting ring portion of the magnetic conductive sleeve to be coaxially arranged with the target material;
[0008] A magnetic conductive ring, which is axially slidably sleeved on the magnetic conductive sleeve, and the magnetic conductive ring is located between the mounting ring portions. Fitting grooves are respectively formed on the mounting ring portions. Fitting portions are respectively arranged at both ends of the magnetic conductive ring. The magnetic conductive ring is driven to axially slide so that any one of the fitting portions is fitted into the fitting groove, and the other fitting portion of the magnetic conductive ring is located between the mounting ring portions to form an induced magnetic pole.
[0009] Preferably, first heat dissipation tubes and second heat dissipation tubes in a spiral shape are arranged in a circumferential array on the inner circumference of the magnetic conductive sleeve, and both ends of the first heat dissipation tubes and the second heat dissipation tubes extend out of the outside of the magnetic conductive sleeve.
[0010] Preferably, a magnetic conductive partition is slidably arranged in the radial direction of the magnetic conductive ring in the middle of the magnetic conductive ring. In the default state, the magnetic conductive partition is fitted and contacted with the middle of the magnetic conductive ring. The magnetic conductive partition is driven to slide radially away from the magnetic conductive sleeve so that a secondary induced magnetic pole is formed in the middle of the magnetic conductive ring.
[0011] Preferably, a first driving member for driving the magnetic conductive partition to slide in the radial direction of the magnetic conductive ring is arranged on the magnetic conductive ring, and a movable groove is formed on the magnetic conductive sleeve. Second driving members for driving the magnetic conductive ring to axially move are symmetrically arranged in the movable groove.
[0012] Preferably, communication grooves communicating with the spiral portions of the first heat dissipation tubes and the second heat dissipation tubes are linearly arranged in an array in the movable groove. The magnetic conductive partition is driven to slide radially along the magnetic conductive ring and abuts against the first heat dissipation tube or the second heat dissipation tube through the communication groove.
[0013] In the above technical solution, a magnetron sputtering cathode target for a multi-station coating machine provided by the present utility model has the following beneficial effects: By axially sliding the magnetic conductive ring so that the fitting portion is fitted into the fitting groove, one fitting portion of the magnetic conductive ring moves close to the magnetic member so that the magnetic conductive ring forms an induced magnetic pole through magnetic induction, and the magnetic conductive ring can be axially slid to form induced magnetic poles at different positions. During the process of magnetron sputtering coating, different positions of induced magnetic poles can be formed in the middle of the target material by controlling the magnetic conductive ring, improving the uniformity of magnetic field formation, thereby alleviating the consumption rate at the alignment positions of the two ends of the target material with the magnetic member, further improving the utilization rate of the target material and the deposition rate of sputtered electrons, and reducing costs and increasing efficiency. Description of the Drawings
[0014] To more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required for use in the embodiments. Obviously, the drawings described below are only some embodiments described in the present utility model. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings.
[0015] Figure 1 It is a schematic cross-sectional view of the overall structure provided by the embodiment of the present utility model;
[0016] Figure 2 It is a partial cross-sectional view of the overall structure provided by the embodiment of the present utility model;
[0017] Figure 3 Provided by the embodiment of the present utility model Figure 2 The partial enlarged schematic view at position A in
[0018] Explanation of reference numerals:
[0019] 1. Target; 2. Magnetic conductive sleeve; 21. Installation ring part; 22. Fitting groove; 23. Movable groove; 24. Communication groove; 3. Magnetic part; 4. Magnetic conductive ring; 41. Fitting part; 51. First heat dissipation pipe; 52. Second heat dissipation pipe; 6. Magnetic conductive partition; 71. First driving part; 72. Second driving part. Detailed implementation manners
[0020] In order to make the purpose, technical solutions and advantages of the embodiments of the present disclosure clearer, the following will clearly and completely describe the technical solutions of the embodiments of the present disclosure in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of protection of the present disclosure.
[0021] As Figures 1-3 shown, a magnetron sputtering cathode target of a multi-station coating machine includes a target 1 in the shape of a ring column and a magnetic conductive sleeve 2 annularly coated on the outside of the target 1. The magnetic conductive sleeve 2 is provided with:
[0022] A magnetic part 3, which is annular, and the magnetic part 3 is arranged on the installation ring part 21 of the magnetic conductive sleeve 2 to be coaxially arranged with the target 1;
[0023] A magnetic conductive ring 4, which is axially slidably sleeved on the magnetic conductive sleeve 2, and the magnetic conductive ring 4 is located between the installation ring parts 21. Fitting grooves 22 are respectively opened on the installation ring parts 21. Fitting parts 41 are respectively arranged at both ends of the magnetic conductive ring 4. The magnetic conductive ring 4 is axially slid driven so that any one of the fitting parts 41 is fitted into the fitting groove 22, and the other fitting part 41 of the magnetic conductive ring 4 is located between the installation ring parts 21 to form an induced magnetic pole.
[0024] Specifically, as Figure 1 shown, the magnetic conductive sleeve 2 is arranged in a ring shape to cover the outside of the target 1, and the material to be plated is installed in the central area of the target 1. The coating material moves axially, and the target 1 realizes centripetal sputtering for coating. Installation ring parts 21 are arranged at both axial ends of the magnetic conductive sleeve 2, and annular magnetic parts 3 are arranged on the installation ring parts 21 so as to form a magnetic field inside the target 1, thereby confining sputtering electrons and consuming their energy, thereby improving the deposition rate and reducing the substrate temperature. Secondly, a fitting groove 22 is formed in the installation ring part 21, and fitting parts 41 are respectively arranged at both ends of the magnetic conductive ring 4. When sputtering coating is carried out, the magnetic conductive ring 4 can axially slide so that the fitting part 41 at one end of it is fitted into the fitting groove 22, as Figure 2 shown. If the magnetic conductive ring 4 axially slides and slides to the left, the fitting part 41 at the left end of the magnetic conductive ring 4 is fitted into the fitting groove 22 of the left installation ring part 21, and the right end of the magnetic conductive ring 4 approaches the middle of the target 1 due to the movement. And because the fitting part 41 at the left end of the magnetic conductive ring 4 moves closer to the magnetic part 3, the magnetic conductive ring 4 forms an induced magnetic pole through magnetic induction. That is, at this time, the magnetic property of the induced magnetic pole at the left end of the magnetic conductive ring 4 is opposite to the magnetic pole at the lower end of the magnetic part 3 on the left side, and the magnetic property of the induced magnetic pole at the right end of the magnetic conductive ring 4 is the same as the magnetic pole at the lower end of the magnetic part 3 on the left side. Similarly, the magnetic conductive ring 4 can also be axially slid to the right to form induced magnetic poles at different positions. Therefore, during the magnetron sputtering coating process, the middle part of the target 1 can form induced magnetic poles at different positions by controlling the magnetic conductive ring 4, improving the uniformity of magnetic field formation, thereby alleviating the consumption rate at the alignment of the magnetic part 3 at both ends of the target 1, further improving the utilization rate of the target 1 and the deposition rate of sputtering electrons, reducing costs and increasing efficiency.
[0025] In the above technical solution, by axially sliding the magnetic conductive ring 4 so that the fitting part 41 is fitted into the fitting groove 22, and one fitting part 41 of the magnetic conductive ring 4 moves closer to the magnetic part 3 so that the magnetic conductive ring 4 forms an induced magnetic pole through magnetic induction, the magnetic conductive ring 4 can be axially slid to form induced magnetic poles at different positions. During the magnetron sputtering coating process, the middle part of the target 1 can form induced magnetic poles at different positions by controlling the magnetic conductive ring 4, improving the uniformity of magnetic field formation, thereby alleviating the consumption rate at the alignment of the magnetic part 3 at both ends of the target 1, further improving the utilization rate of the target 1 and the deposition rate of sputtering electrons, reducing costs and increasing efficiency.
[0026] As a further embodiment provided by the present utility model, spiral first heat dissipation tubes 51 and second heat dissipation tubes 52 are arranged in a circumferential array inside the magnetic conductive sleeve 2, and both ends of the first heat dissipation tubes 51 and the second heat dissipation tubes 52 extend out of the outside of the magnetic conductive sleeve 2.
[0027] Specifically, as Figure 1As shown, the water inlets and outlets of the first heat dissipation pipe 51 and the second heat dissipation pipe 52 extend to the outside of the magnetic conduction sleeve 2. The first heat dissipation pipe 51 and the second heat dissipation pipe 52 can be used to cool and dissipate heat from the magnetic conduction sleeve 2, and the spiral parts of the first heat dissipation pipe 51 and the second heat dissipation pipe 52 located inside the magnetic conduction sleeve 2 can further increase the contact area between the first heat dissipation pipe 51 and the second heat dissipation pipe 52 and the magnetic conduction sleeve 2 to improve the heat dissipation efficiency of the magnetic conduction sleeve 2.
[0028] As a further embodiment provided by the present utility model, a magnetic conduction partition 6 is slidably arranged along the radial direction of the middle part of the magnetic conduction ring 4. In the default state, the magnetic conduction partition 6 is in interference contact with the middle part of the magnetic conduction ring 4. The magnetic conduction partition 6 is driven to slide radially away from the magnetic conduction sleeve 2 so that a secondary induction magnetic pole is formed in the middle part of the magnetic conduction ring 4.
[0029] Specifically, as Figure 1 shown, the magnetic conduction partition 6 is slidably arranged on the magnetic conduction ring 4 along the radial direction of the magnetic conduction ring 4. In the default state, as Figure 2 shown, the sides of the magnetic conduction partition 6 are all in contact with the magnetic conduction ring 4, so that the magnetic conduction partition 6 fills the middle part of the magnetic conduction ring 4, improving the magnetic field intensity of the induction magnetic poles formed by the fitting parts 41 at both ends of the magnetic conduction ring 4, ensuring the deposition efficiency of sputtered electrons. And if the consumption degree at the positions where the two ends of the target 1 are aligned with the magnetic poles of the magnetic part 3 is much greater than the consumption degree in the middle part of the target 1, the fitting part 41 of the magnetic conduction ring 4 can be fitted into the fitting groove 22 so that induction magnetic poles are formed at both ends of the magnetic conduction ring 4. Subsequently, the magnetic conduction partition 6 is driven to slide away from the axis of the magnetic conduction ring 4. At this time, a secondary induction electrode is formed in the middle part of the magnetic conduction ring 4 due to the existence of the through groove. By using the sliding of the magnetic conduction partition 6, the middle part of the magnetic conduction ring 4 can have a secondary induction electrode to further increase the magnetic field intensity in the middle part of the target 1, thereby balancing the magnetic field balance degree between the middle part and the two ends of the target 1 and improving the service life of the target 1.
[0030] As a further embodiment provided by the present utility model, a first driving member 71 for driving the magnetic conduction partition 6 to slide along the radial direction of the magnetic conduction ring 4 is arranged on the magnetic conduction ring 4, and a movable groove 23 is opened on the magnetic conduction sleeve 2, and second driving members 72 for driving the magnetic conduction ring 4 to move axially are symmetrically arranged in the movable groove 23.
[0031] Specifically, as Figure 2 shown, the first driving member 71 is used to drive the magnetic conduction partition 6 to slide along the radial direction of the magnetic conduction ring 4, and the second driving members 72 are arranged in the movable groove 23 to drive the magnetic conduction ring 4 to move axially on the magnetic conduction sleeve 2. During the coating operation, the inner side of the magnetic conduction sleeve 2 and the target 1 are in a vacuum working environment, while the outside of the magnetic conduction sleeve 2 can be in a normal working environment. Therefore, the first driving member 71 and the second driving members 72 can be replaced by other driving sources well known to those skilled in the art, such as cylinders, air bags, hydraulic cylinders, etc.
[0032] As a further embodiment provided by the present utility model, communication grooves 24 are linearly and arrayedly formed in the movable groove 23 and are communicated with the spiral portions of the first heat dissipation pipe 51 and the second heat dissipation pipe 52. The magnetic conduction partition plate 6 is driven to slide radially along the magnetic conduction ring 4 and abuts against the first heat dissipation pipe 51 or the second heat dissipation pipe 52 through the communication groove 24.
[0033] Specifically, as Figure 3 shown, the communication grooves 24 linearly and arrayedly formed in the movable groove 23 are all communicated with the spiral portions of the first heat dissipation pipe 51 or the second heat dissipation pipe 52. When performing the coating operation, since the water inlets and outlets of the first heat dissipation pipe 51 and the second heat dissipation pipe 52 are respectively located at both ends of the magnetic conduction sleeve 2, more heat accumulates in the middle of the magnetic conduction sleeve 2 under heat conduction. Therefore, during the coating process, if the consumption degrees at both ends and in the middle of the target 1 are balanced, the magnetic conduction ring 4 can be slid to align the lower end of the magnetic conduction partition plate 6 with the communication groove 24. At this time, the fitting portion 41 of the magnetic conduction ring 4 does not contact the fitting groove 22. The first driving member 71 drives the magnetic conduction partition plate 6 to slide so that the lower end of the magnetic conduction partition plate 6 enters the communication groove 24 and abuts against the first heat dissipation pipe 51 or the second heat dissipation pipe 52. Furthermore, the upper end of the heat dissipation pipe directly contacted by the lower end of the magnetic conduction partition plate 6 extends out of the magnetic conduction sleeve 2 to further dissipate heat from the middle of the magnetic conduction sleeve 2 and improve the heat dissipation efficiency.
[0034] Only some exemplary embodiments of the present utility model have been described by way of illustration above. Undoubtedly, for those of ordinary skill in the art, the described embodiments can be modified in various different ways without departing from the spirit and scope of the present utility model. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the protection scope of the claims of the present utility model.
Claims
1. A magnetron sputtering cathode target for a multi-station coating machine, characterized in that: The invention comprises a target material (1) in the shape of a ring column and a magnetic conductive sleeve (2) which is annularly wrapped around the outside of the target material (1), wherein the magnetic conductive sleeve (2) is provided with: The magnetic member (3) is annular and is arranged on the mounting ring portion (21) of the magnetic sleeve (2) so as to be coaxially arranged with the target material (1); A magnetic conductive ring (4) is axially slidably sleeved on the magnetic conductive sleeve (2), and the magnetic conductive ring (4) is located between the mounting ring parts (21). The mounting ring parts (21) are each provided with an engaging groove (22). Both ends of the magnetic conductive ring (4) are respectively provided with engaging parts (41). The magnetic conductive ring (4) is driven to slide axially so that any engaging part (41) is engaged in the engaging groove (22), and the other engaging part (41) of the magnetic conductive ring (4) is located between the mounting ring parts (21) to form an induction magnetic pole.
2. The magnetron sputtering cathode target of a multi-station coating machine according to claim 1, characterized in that: The inner circumference array of the magnetic conductive sleeve (2) is provided with a first heat dissipation tube (51) and a second heat dissipation tube (52) in a spiral shape, and both ends of the first heat dissipation tube (51) and the second heat dissipation tube (52) extend out of the outer side of the magnetic conductive sleeve (2).
3. The magnetron sputtering cathode target of a multi-station coating machine according to claim 2, characterized in that: A magnetic baffle (6) is provided in the middle of the magnetic ring (4) so as to slide radially along the magnetic ring (4); the magnetic baffle (6) is in contact with the middle of the magnetic ring (4) in a default state; the magnetic baffle (6) is driven to slide radially away from the magnetic sleeve (2) so that a secondary induction magnetic pole is formed in the middle of the magnetic ring (4).
4. The magnetron sputtering cathode target of a multi-station coating machine according to claim 3, characterized in that: The magnetic conductive ring (4) is provided with a first driving member (71) for driving the magnetic conductive partition plate (6) to slide radially along the magnetic conductive ring (4), and the magnetic conductive sleeve (2) is provided with a movable groove (23), and a second driving member (72) for driving the magnetic conductive ring (4) to move axially is symmetrically arranged in the movable groove (23).
5. The magnetron sputtering cathode target of a multi-station coating machine according to claim 4, characterized in that: A connecting groove (24) connected to the spiral parts of the first heat dissipation tube (51) and the second heat dissipation tube (52) is provided in a linear array in the movable groove (23); the magnetically conductive partition plate (6) is driven to slide radially along the magnetically conductive ring (4) through the connecting groove (24) and abut against the first heat dissipation tube (51) or the second heat dissipation tube (52).
Citation Information
Patent Citations
Hollow cathode magnetron sputtering target
CN210481507U