Epitaxial equipment

Abstract

The utility model provides extension equipment. The extension equipment comprises a main machine body, a base, a preheating ring and a distance measuring device, the main machine body comprises a cavity, and an air inlet and an air outlet are formed in the two opposite sides of the cavity correspondingly. The base is arranged in the cavity and rotationally connected relative to the cavity, and gas entering from the gas inlet flows above the base and then is discharged from the gas outlet; the preheating ring is fixedly arranged in the cavity and annularly arranged on the periphery of the base; in the circumferential direction of the preheating ring, a radial gap exists between the preheating ring and the periphery of the base; the distance measuring device is installed on the main machine body to measure the radial clearance. According to the utility model, the technical problems that the shutdown time is long and the production efficiency of the epitaxial equipment is reduced due to the fact that whether friction exists between the observation base and the preheating ring in the operation process of the epitaxial equipment can be solved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor equipment, and particularly relates to an epitaxial equipment. Background Art

[0002] Epitaxial equipment plays a crucial role in semiconductor manufacturing and is widely used in the growth process of crystal materials. In the inner cavity of the epitaxial equipment, since the gap between the base for carrying the wafer and the preheating ring arranged on its outer periphery is small, when the preheating ring expands at high temperature, or when the base deforms or moves during the epitaxial deposition process, it is easy to have the problem that the base contacts the preheating ring to generate friction. And the particulate matter generated during the friction process may contaminate the reaction gas and thus reduce the quality of the epitaxial wafer. Therefore, during the operation of the equipment, it is particularly important to confirm whether there is friction between the base and the preheating ring.

[0003] During the operation of the existing epitaxial equipment, if it is necessary to confirm whether there is friction between the base and the preheating ring, it is often necessary to stop the machine first. After the inner cavity of the epitaxial equipment cools down, the machine door is opened to observe the contact situation between the base and the preheating ring. This will not only significantly increase the downtime of the equipment and affect the production efficiency of the epitaxial equipment, but also cannot reduce the friction generated between the base and the preheating ring, which is not conducive to improving the quality of the epitaxial wafer. Summary of the Utility Model

[0004] The utility model provides an epitaxial equipment, which can improve the technical problem of long downtime caused by observing whether there is friction between the base and the preheating ring during the operation of the epitaxial equipment and reduce the production efficiency of the epitaxial equipment.

[0005] To achieve the above object and other related objects, the utility model provides an epitaxial equipment, including: a main body, a base, a preheating ring and a distance measuring device; the main body includes a cavity, and an air inlet and an air outlet are respectively arranged on two opposite sides of the cavity; the base is rotatably arranged in the cavity, and the gas entering from the air inlet flows through the upper part of the base and then is discharged from the air outlet; the preheating ring is fixedly arranged in the cavity and is arranged around the outer periphery of the base; in the circumferential direction of the preheating ring, there is a radial gap between the preheating ring and the peripheral edge of the base; the distance measuring device is installed on the main body to measure the radial gap.

[0006] In an example of the epitaxial equipment of the utility model, in the axial section passing through the air outlet and the air inlet, a first radial gap close to the air outlet side and a second radial gap close to the air inlet side are formed between the preheating ring and the peripheral edge of the base, and the distance measuring device measures the first radial gap and / or the second radial gap.

[0007] In an example of the epitaxial device of the present utility model, the epitaxial device further includes an alarm device, and the alarm device is electrically connected to the distance measuring device to give an alarm when the distance measuring device measures that the first radial clearance is less than the first set threshold value and / or the second radial clearance is greater than the second set threshold value.

[0008] In an example of the epitaxial device of the present utility model, the main body includes a upper dome, a support base and a lower dome arranged in sequence. The upper dome, the support base and the lower dome enclose to form a cavity, and the distance measuring device is installed on the lower dome.

[0009] In an example of the epitaxial device of the present utility model, the lower dome is made of quartz material, and the distance measuring device is arranged outside the lower dome.

[0010] In an example of the epitaxial device of the present utility model, the distance measuring device is a distance measuring camera.

[0011] In an example of the epitaxial device of the present utility model, the epitaxial device further includes a cooling device for cooling the distance measuring camera.

[0012] In an example of the epitaxial device of the present utility model, the cooling device includes a cover body, the distance measuring camera is installed in the cover body, and the cover body is provided with a cooling channel for the cooling medium to flow through.

[0013] In an example of the epitaxial device of the present utility model, the distance measuring camera includes a first distance measuring camera and a second distance measuring camera. The first distance measuring camera measures one of the first radial clearance and the second radial clearance, and the second distance measuring camera measures the other one of the first radial clearance and the second radial clearance.

[0014] In an example of the epitaxial device of the present utility model, the distance measuring camera includes a first distance measuring camera and a second distance measuring camera. The first distance measuring camera and the second distance measuring camera cooperate to measure the first radial clearance or the second radial clearance.

[0015] For the epitaxial device provided by the present utility model, by setting the distance measuring device and making the distance measuring device measure the radial clearance between the preheating ring and the base, the process is convenient and fast, the measurement accuracy is relatively high, and during the measurement of the radial clearance, it is not necessary to stop the equipment. Therefore, the downtime of the equipment can be effectively reduced, and thus the production efficiency of the epitaxial device can be improved. At the same time, by controlling the running time of the distance measuring device, the real-time monitoring of the change of the radial clearance within a continuous time period can also be realized, so that the friction generated between the preheating ring and the base can be detected in time, and the running time of the equipment under the condition of re-friction can be reduced, thereby effectively ensuring the quality of the epitaxial wafer. Description of the Drawings

[0016] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other embodiments can be obtained based on these drawings.

[0017] Figure 1 It is an axial sectional view of the epitaxial device of the present invention through the air inlet and the exhaust port in an embodiment.

[0018] Figure 2 It is a displacement schematic diagram of the support part relative to the preheating ring in an embodiment of the epitaxial device of the present invention.

[0019] Figure 3 It is a schematic diagram of the first radial clearance and the second radial clearance between the support part and the preheating ring in an embodiment of the epitaxial device of the present invention.

[0020] Figure 4 It is a schematic diagram of the installation position of the ranging camera in an embodiment of the epitaxial device of the present invention.

[0021] Figure 5 It is a schematic diagram of the installation position of the ranging camera in another embodiment of the epitaxial device of the present invention.

[0022] Figure 6 It is a schematic diagram of the circulation of the cooling medium in the cooling device in an embodiment of the epitaxial device of the present invention.

[0023] Element number description

[0024] 10. Epitaxial device; 11. Main body; 111. Cavity; 1111. Air inlet; 1112. Exhaust port; 1113. Upper chamber; 1114. Lower chamber; 112. Upper dome; 113. Support base; 114. Lower dome; 12. Base; 121. Support part; 122. Leg; 123. Connecting rod; 124. Rotating shaft; 13. Preheating ring; 14. Ranging device; 141. Ranging camera; 1411. First ranging camera; 1412. Second ranging camera; 15. Radial clearance; 151. First radial clearance; 152. Second radial clearance; 16. Cooling device; 161. Cover; 162. Cooling channel; 163. Channel inlet; 164. Channel outlet; 165. Cooling medium circulation pool; 20. Wafer. Detailed implementation manners

[0025] The following describes the implementation modes of the present utility model through specific examples. Those skilled in the art can easily understand other advantages and effects of the present utility model from the content disclosed in this specification. The present utility model can also be implemented or applied through other different specific implementation modes. Various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present utility model.

[0026] It should be noted that the diagrams provided in this embodiment only illustrate the basic concept of the present utility model in a schematic manner. Therefore, only the components related to the present utility model are shown in the diagrams, rather than being drawn according to the number, shape, and size of the components during actual implementation. The type, quantity, and ratio of each component during actual implementation can be arbitrarily changed, and the component layout type may also be more complex.

[0027] In the present utility model, it should be noted that when terms such as "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. appear, the orientation or positional relationship indicated is based on the orientation or positional relationship shown in the drawings. This is only for the convenience of describing this application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation to this application. In addition, when terms such as "first" and "second" appear, they are only used for descriptive and distinguishing purposes, and cannot be understood as indicating or implying relative importance.

[0028] Please refer to Figures 1 to 6 , for the epitaxial device 10 provided by the present utility model, a distance measuring device 14 for measuring the radial gap 15 between the measurement base 12 and the preheating ring 13 is provided on the main body 11. Thus, the size of the radial gap 15 between the preheating ring 13 and the base 12 can be directly obtained through the distance measuring device 14 to determine whether there is friction between the two. This process does not require the epitaxial device 10 to be shut down, which is convenient and fast. Therefore, the production efficiency of the epitaxial device 10 can be improved.

[0029] Please refer to Figure 1 , the epitaxial device 10 provided by the present utility model includes: a main body 11, a base 12, a preheating ring 13, and a distance measuring device 14.

[0030] The main body 11 includes a cavity 111, and the cavity 111 can be any shape that meets the process usage requirements, such as a cylindrical shape, a conical shape, etc. The main body 11 can be a cavity 111 structure formed integrally, or a structure formed by buckling the upper and lower or left and right halves. In this embodiment, the main body 11 includes a upper dome 112, a support base 113, and a lower dome 114 arranged in sequence from top to bottom. The support base 113 is a ring structure, and the upper dome 112 and the lower dome 114 are respectively connected to the upper and lower parts of the support base 113. The upper dome 112, the support base 113, and the lower dome 114 enclose to form the above-mentioned cavity 111. The cavity 111 is provided with an air inlet 1111 and an air outlet 1112. The air inlet 1111 is used to transport process gas into the cavity 111, and the air outlet 1112 is used to discharge the process gas in the cavity 111 out of the cavity 111. The air inlet 1111 is arranged on one side of the cavity 111, and the air outlet 1112 is arranged on the other side of the cavity 111 opposite to the air inlet 1111, that is, the air outlet 1112 and the air inlet 1111 are respectively arranged on the two opposite sides of the cavity 111 along the circumferential direction. In this embodiment, the air inlet 1111 and the air outlet 1112 are respectively arranged on the two opposite sides in the circumferential direction of the support base 113.

[0031] The base 12 is rotatably arranged in the cavity 111 and rotates relative to the cavity 111. The rotation mode of the base 12 in the cavity 111 is not limited. It can be that the base 12 is directly driven by a motor to rotate relative to the cavity 111, or it can be that the motor and other transmission components cooperate to drive the base 12 to rotate relative to the cavity 111. The upper part of the base 12 has a support part 121 for carrying the wafer 20, and the lower part of the base 12 is provided with a plurality of legs 122 arranged along the circumferential direction of the base 12 to form a support at the bottom of the support part 121. A rotary shaft 124 is arranged at the central position of the base 12. The upper end of the rotary shaft 124 is connected to the legs 122 through a connecting rod 123, and the lower end of the rotary shaft 124 penetrates through the lower dome 114 and is in transmission connection with an external rotary drive assembly. The support part 121 can be coaxially arranged with the cavity 111, or can be non-coaxially arranged. Preferably, in this embodiment, the cavity 111 is an approximately conical structure, the support part 121 is a disc-shaped structure, and the support part 121 is coaxially arranged with the cavity 111.

[0032] Please refer to Figure 1, along the height direction of the cavity 111, the support portion 121 divides the cavity 111 into an upper chamber 1113 and a lower chamber 1114. The wafer 20 is located on the upper surface of the support portion 121, that is, in the upper chamber 1113. The gas inlet 1111 and the gas outlet 1112 are both in communication with the upper chamber 1113. That is, the process gas entering from the gas inlet 1111 flows through the upper chamber 1113 and then is discharged from the gas outlet 1112. Since the process gas will contact the surface of the support portion 121 or the wafer 20 on the support portion 121 when flowing through the upper chamber 1113, during the flow of the process gas, an air flow thrust in the radial direction of the support portion 121 will be generated towards the direction of the gas outlet 1112.

[0033] Please refer to Figures 1 to 2 , the preheating ring 13 is fixedly arranged in the cavity 111 and is arranged around the outer periphery of the base 12. The preheating ring 13 can be fixed on any part such as the support seat 113, the upper dome 112 or the lower dome 114, etc., as long as the preheating ring 13 can be fixedly arranged in the cavity 111. In the circumferential direction of the preheating ring 13, there is a radial gap 15 between the preheating ring 13 and the peripheral edge of the base 12. The preheating ring 13 can be coaxially arranged with the base 12 or non-coaxially arranged. Preferably, in this embodiment, the preheating ring 13 and the base 12 are coaxially arranged. It should be noted that when the preheating ring 13 and the base 12 are coaxially arranged, theoretically, the radial gap 15 between the preheating ring 13 and the outer peripheral edge of the support portion 121 on the base 12 is the same in the circumferential direction. However, during the long-term operation process, due to the action of the air flow thrust generated by the flow of the process gas on the support portion 121, the support portion 121 will generate a displacement towards the side of the gas outlet 1112. As a result, the radial gap 15 on the side towards the gas outlet 1112 will become smaller, while the radial gap 15 on the side towards the gas inlet 1111 will become larger. When the radial gap 15 is less than zero, friction will occur between the base 12 and the preheating ring 13 at the position close to the gas outlet 1112.

[0034] The distance measuring device 14 is installed on the main body 11 to measure the radial clearance 15. The distance measuring device 14 can measure the radial clearance 15 in real time, at regular intervals, or at any set time. The distance measuring device 14 can measure the radial clearance 15 of the support part 121 in the entire circumferential direction, or can measure the radial clearances 15 corresponding to several specific angles, specifically based on the actual displacement change requirements between the support part 121 and the preheating ring 13. The distance measuring device 14 can be arranged inside the cavity 111 or outside the cavity 111. Preferably, the distance measuring device 14 is arranged outside the cavity 111, so as to reduce the influence of the high temperature of the cavity 111 on the distance measuring device 14. The distance measuring device 14 can be installed on any component such as the upper dome 112, the support base 113 or the lower dome 114. The distance measuring device 14 can be an ultrasonic distance measuring sensor, a laser distance measuring sensor or a camera distance measuring device 14, etc., any device that can measure the radial clearance 15 between the base 12 and the preheating ring 13.

[0035] By setting the distance measuring device 14, the size of the radial clearance 15 between the preheating ring 13 and the base 12 can be known by operating the distance measuring device 14. This process is convenient and fast, with relatively high measurement accuracy. And during the process of measuring the radial clearance 15, there is no need to stop the equipment, so the downtime of the equipment can be effectively reduced, thereby improving the production efficiency of the epitaxial equipment 10. At the same time, by controlling the running time of the distance measuring device 14, real-time monitoring of the change of the radial clearance 15 within a continuous time period can also be achieved, so that the friction generated between the preheating ring 13 and the base 12 can be detected in time, and the running time of the equipment under the condition of friction can be reduced, thereby effectively ensuring the growth quality of the epitaxial wafer.

[0036] Although the distance measuring device 14 can detect the radial clearance 15 within any angular range in the circumferential direction between the support part 121 and the preheating ring 13, preferably, please refer to Figure 1 and Figure 3, in an example of the epitaxial device 10 of the present utility model, on the axial section passing through the exhaust port 1112 and the intake port 1111, a first radial gap 151 is formed between the preheating ring 13 and the periphery of the support portion 121 on the side close to the exhaust port 1112, marked as L1. The distance measuring device 14 measures the first radial gap 151. Due to the airflow thrust acting on the support portion 121 caused by the process gas flow, the support portion 121 will generate a displacement toward the exhaust port 1112 side. Therefore, during the long-term operation of the epitaxial device 10, the change of the first radial gap 151 is relatively large, and the base 12 and the preheating ring 13 are most likely to generate friction at this position. Therefore, by measuring the first radial gap 151, the measurement pertinence of the distance measuring device 14 can be improved, whether there is friction between the base 12 and the preheating ring 13 can be detected in time, unnecessary measurement data can be reduced at the same time, the reading speed can be increased, and the structural complexity of the distance measuring device 14 can be simplified.

[0037] In another embodiment, on the axial section passing through the exhaust port 1112 and the intake port 1111, a second radial gap 152 is further formed between the preheating ring 13 and the periphery of the base 12 on the side close to the intake port 1111, marked as L2. The second radial gap 152 is arranged opposite to the first radial gap 151, and the distance measuring device 14 measures the second radial gap 152. Since the second radial gap 152 is arranged opposite to the first radial gap 151, when the change of the first radial gap 151 is relatively large, similarly, the change of the second radial gap 152 is also relatively large. Therefore, in this embodiment, by measuring the second radial gap 152, the beneficial effects in the previous embodiment can also be obtained. In other embodiments, it can also be that the distance measuring device 14 measures the first radial gap 151 and the second radial gap 152 simultaneously, so that when one of the first radial gap 151 and the second radial gap 152 has a large error or the distance measurement fails, the change of the radial gap 15 between the support portion 121 and the preheating ring 13 can also be judged in time, thereby relatively improving the operation reliability of the distance measuring device 14.

[0038] In an example of the epitaxial device 10 of the present utility model, the epitaxial device 10 further includes an alarm device (not shown in the figure), and the alarm device is electrically connected to the distance measuring device 14 to give an alarm when the distance measuring device 14 monitors that the first radial gap 151 is less than the first set threshold. The alarm device can be installed on the main body 11 or can be set at a position near the outer periphery of the main body 11, etc. The first set threshold is the gap between the support portion 121 and the preheating ring 13 when the support portion 121 and the preheating ring 13 generate friction. In this embodiment, the first set threshold is zero, that is, when the first radial gap 151 is less than zero, it means that friction will be generated between the support portion 121 and the preheating ring 13. By setting the alarm device, the operator can be timely reminded to take predetermined measures when friction is generated between the support portion 121 and the preheating ring 13, and the operation time of the device in the presence of friction can be reduced, thereby effectively ensuring the growth quality of the epitaxial wafer. At the same time, since there is no need to pay attention to the change of the first radial gap 151 in real time, the friction generated between the base 12 and the preheating ring 13 can be timely detected through the alarm device, so the observation workload of the operator can be reduced and the manual labor intensity can be lowered.

[0039] In another embodiment, please refer to Figure 2 and Figure 3 , the alarm device can also give an alarm when the distance measuring device 14 monitors that the second radial gap 152 is greater than the second set threshold. Since the second radial gap 152 is oppositely arranged to the first radial gap 151, that is, when the first radial gap 151 is smaller, the second radial gap 152 will be larger. Therefore, the second set threshold is the value of the second gap corresponding to when the first radial gap 151 is zero, that is, when the second radial gap 152 is greater than the second set threshold, friction will be generated between the base 12 and the preheating ring 13 on the side of the first radial gap 151. Such a setting can also achieve the beneficial effects in the previous embodiment. In other embodiments, the alarm device can also give an alarm when the first radial gap 151 is less than the first set threshold and when the second radial gap 152 is greater than the second set threshold. Such a setting can accurately alarm through the ranging result of the other one when measurement error occurs in one of the first radial gap 151 and the second radial gap 152, thereby reducing the misoperation of the alarm and improving the operation reliability of the alarm device.

[0040] On the premise of meeting the measurement requirements for the radial gap 15, the specific installation position of the distance measuring device 14 in the present utility model is not limited. Preferably, in an example of the epitaxial device 10 of the present utility model, please refer to Figure 1, the distance measuring device 14 is installed on the lower dome 114. The distance measuring device 14 can be installed at the edge position of the lower dome 114 or at the center position of the lower dome 114, specifically at a position that meets the measurement requirements of the radial clearance 15. The distance measuring device 14 can be movably installed on the lower dome 114. For example, in order to meet the measurement requirements, it is rotationally connected around the axis of the lower dome 114, or it can be fixedly connected to the lower dome 114, or any connection method that can meet the measurement requirements of the radial clearance 15. Installing the distance measuring device 14 on the lower dome 114 can facilitate the installation of the distance measuring device 14. At the same time, since the distance measuring device 14 does not need to pass through the upper chamber 1113 when measuring the radial clearance 15, the influence of the process gas flow on the measurement accuracy can be reduced, and the accuracy of the measurement result can be further ensured.

[0041] In an example of the epitaxial device 10 of the present utility model, please refer to Figure 1 , the lower dome 114 is made of quartz, and the distance measuring device 14 is arranged outside the lower dome 114. Quartz has the advantages of good heat resistance and stable heat resistance performance, which can reduce the occurrence of the situation that the lower dome 114 reacts and decomposes in the high-temperature environment of the cavity 111 to conduct heat and pollute the wafer 20. At the same time, quartz also has better light transmittance. Outside the cavity 111, the operator can observe the internal operation of the cavity 111 through the lower dome 114. Installing the distance measuring device 14 outside the lower dome 114 can keep the distance measuring device 14 away from the heat source inside the cavity 111 and reduce the influence of high temperature on the distance measuring device 14. It should be noted that when the distance measuring device 14 is installed outside the lower dome 114, the distance measuring device 14 is a device that can measure the radial clearance 15 inside the cavity 111 through the quartz material. Those skilled in the art can understand that although most distance measuring devices 14 will be affected to a certain extent when penetrating the quartz material for measurement, in actual use, the distance measuring error can meet the use requirements within a certain measurement accuracy by selecting a suitable distance measuring technology and calibration method, and considering the material and thickness of the quartz.

[0042] Please refer to Figure 1 , Figure 4 and Figure 5, in an example of the epitaxial device 10 of the present utility model, the distance measuring device 14 is a distance measuring camera 141. The distance measuring camera 141 can be a single distance measuring camera, a binocular distance measuring camera, etc. One or more distance measuring cameras 141 can be provided, which is specifically determined by the measurement requirements of the radial gap 15 between the support part 121 and the preheating ring 13. Since the distance measurement requirements of the distance measuring camera 141 do not depend on the lighting conditions, the applicable range of light is relatively wide. At the same time, the measurement distance range of the distance measuring camera 141 is relatively large, which is more convenient for the selection of the installation position of the distance measuring device 14. In addition, using the distance measuring camera 141 can also monitor the operation conditions inside the cavity 111, so that the inside of the cavity 111 in the scanning area can be viewed while measuring the distance. Therefore, it is convenient for the operator to more comprehensively understand the operation status inside the cavity 111 and timely discover other operation failures, etc.

[0043] In an example of the epitaxial device 10 of the present utility model, please refer to Figure 1 and Figure 6 , the epitaxial device 10 further includes a cooling device 16 for cooling the distance measuring camera 141. The cooling device 16 can be a cooling fan, an air conditioning system arranged on one side of the camera, or a cooling channel 162 close to the body of the distance measuring camera 141, etc. Since the working temperature of the cavity 111 is relatively high, during the long-term use of the distance measuring camera 141 arranged at the lower dome 114 position, it will also be affected by the heat conduction inside the cavity 111 and cause a certain temperature rise, which affects the service performance and service life of the distance measuring camera 141. In this embodiment, by providing the cooling device 16, the distance measuring camera 141 can be cooled during use, the temperature rise speed of the distance measuring camera 141 can be reduced, and thus the service life of the distance measuring camera 141 can be extended and the measurement accuracy can be guaranteed.

[0044] In an example of the epitaxial device 10 of the present utility model, please refer to Figure 6, the cooling device 16 includes a housing 161, the distance measuring camera 141 is installed inside the housing 161, and the housing 161 is provided with a cooling channel 162 for the circulation of the cooling medium. The housing 161 is of a cylindrical structure, and the body of the distance measuring camera 141 is clamped inside the housing 161. One end of the housing 161 has an opening, and the probe position of the distance measuring camera 141 is exposed at the opening. The cooling channel 162 is provided on the side wall of the housing 161. The cooling channel 162 can be an annular cavity structure provided on the side wall of the housing 161, or a structure of multiple interconnected cooling pipe segments provided on the side wall of the housing 161, etc. The cooling channel 162 has a channel inlet 163 and a channel outlet 164 provided on the side wall of the housing 161. The cooling medium flowing in the cooling channel 162 can be a coolant, a cooling gas, etc. Preferably, in this embodiment, the cooling medium is a coolant, such as water, an aqueous solution of ethylene glycol, an aqueous solution of propylene glycol, etc. A cooling medium circulation pool 165 for accommodating the cooling medium can be provided outside the cooling channel 162. The cooling medium in the cooling medium circulation pool 165 enters from the channel inlet 163, flows through the side wall of the housing 161, and then is discharged from the channel outlet 164 and enters the cooling medium circulation pool 165 again. This cycle is repeated to achieve the cooling of the body of the distance measuring camera 141 inside the housing 161. Inside the housing 161, the cooling channel 162 can be in contact with the body of the distance measuring camera 141 or not. Preferably, in this embodiment, the cooling channel 162 is at least partially in contact with the body of the distance measuring camera 141, which can improve the heat exchange effect between the cooling medium and the body of the distance measuring camera 141 and enable the distance measuring camera 141 to have a better cooling effect.

[0045] In an example of the epitaxial device 10 of the present utility model, please refer to Figure 4, the ranging camera 141 includes a first ranging camera 1411 and a second ranging camera 1412. The first ranging camera 1411 measures the first radial clearance 151, and the second ranging camera 1412 measures the second radial clearance 152. The first ranging camera 1411 and the second ranging camera 1412 may have the same or different specifications and models. The installation positions of the first ranging camera 1411 and the second ranging camera 1412 on the lower dome 114 are not limited, as long as the ranging requirements are met. Preferably, in this embodiment, the first ranging camera 1411 and the second ranging camera 1412 are symmetrically installed on both sides of the center of the rotation axis 124 of the lower dome 114. The first ranging camera 1411 is installed near the position of the first radial clearance 151, and the second ranging camera 1412 is installed near the position of the second radial clearance 152. Such a setting can facilitate the positioning and installation between the first ranging camera 1411 and the second ranging camera 1412 and reduce the installation error. By setting the first ranging camera 1411 and the second ranging camera 1412, and enabling the first ranging camera 1411 to measure the first radial clearance 151 and the second ranging camera 1412 to measure the second radial clearance 152, this setting allows the other ranging camera 141 to continue working when one ranging camera 141 fails, thereby improving the reliability and fault tolerance of the ranging device 14. At the same time, the two ranging cameras 141 can cover a wider monitoring area, and thus can more comprehensively feedback the operating conditions in the inner cavity. It should be noted that in another embodiment, it may also be that the first ranging camera 1411 measures the second radial clearance 152 and the second ranging camera 1412 measures the first radial clearance 151.

[0046] Considering the measurement error of a single ranging camera 141, preferably, in an example of the extension device 10 of the present utility model, the ranging camera 141 includes a first ranging camera 1411 and a second ranging camera 1412. The first ranging camera 1411 and the second ranging camera 1412 cooperate to measure the first radial clearance 151. The cooperation between the first ranging camera 1411 and the second ranging camera 1412 may mean that the two ranging cameras 141 work together for cross-verification and data calibration, so as to calculate the distance at the corresponding measurement position. The first ranging camera 1411 and the second ranging camera 1412 may be ranging cameras 141 installed separately according to the set positions and relative distances, or may be a binocular ranging camera 141 integrating the first ranging camera 1411 and the second ranging camera 1412. Preferably, please refer to Figure 5, in this embodiment, the ranging camera 141 is a binocular ranging camera integrating the first ranging camera 1411 and the second ranging camera 1412. The binocular ranging camera can directly calculate the depth information of the target through the parallax of the two cameras, without additional sensors or complex algorithms. The integration degree of the device is relatively high and the requirement for installation accuracy is relatively low. It should be noted that the ranging principle of the binocular camera can refer to the introduction of the ranging principle of the relevant binocular cameras in the prior art, which will not be elaborated here.

[0047] In another embodiment, it may also be that the first ranging camera 1411 and the second ranging camera 1412 cooperate to measure the second radial clearance 152. In other embodiments, it may also be that the first ranging camera 1411 and the second ranging camera 1412 cooperate to simultaneously measure the first radial clearance 151 and the second radial clearance 152.

[0048] By providing the ranging device, the present utility model can know the size of the radial clearance between the preheating ring and the base by operating the ranging device. This process is convenient and fast, with relatively high measurement accuracy. Moreover, during the measurement of the radial clearance, it is not necessary to stop the equipment, so the downtime of the equipment can be effectively reduced, thereby improving the production efficiency of the epitaxial equipment. At the same time, by controlling the running time of the ranging device, real-time monitoring of the change of the radial clearance within a continuous time period can also be achieved, so that the friction generated between the preheating ring and the base can be detected in time, and the running time of the equipment under the condition of re-friction can be reduced, thereby effectively ensuring the quality of the epitaxial wafer.

[0049] In summary, the present utility model effectively overcomes some practical problems in the prior art, so it has high utilization value and practical significance. The above embodiments are only illustrative of the principle and its effects of the present utility model, rather than limiting the present utility model. Any person familiar with this technology can modify or change the above embodiments without departing from the spirit and scope of the present utility model. Therefore, all equivalent modifications or changes completed by those with ordinary knowledge in the technical field without departing from the spirit and technical idea disclosed by the present utility model should still be covered by the claims of the present utility model.

Claims

1. An epitaxial device, characterized in that: include: A main body, the main body comprising a cavity, and an air inlet and an air outlet are respectively arranged on two opposite sides of the cavity; A base is rotatably disposed in the cavity, and the gas entering from the air inlet flows through the top of the base and then is discharged from the exhaust port; A preheating ring is fixedly disposed in the cavity and is arranged around the outer periphery of the base; in the circumferential direction of the preheating ring, a radial gap exists between the preheating ring and the periphery of the base; A distance measuring device is installed on the main body to measure the radial gap.

2. The epitaxial device according to claim 1, characterized in that: On the axial section passing through the exhaust port and the inlet port, a first radial gap close to the inlet port side and a second radial gap close to the exhaust port side are formed between the preheating ring and the periphery of the base, and the distance measuring device measures the first radial gap and / or the second radial gap.

3. The epitaxial device according to claim 2, characterized in that: The epitaxial device further comprises an alarm device, which is electrically connected to the distance measuring device, so as to alarm when the distance measuring device measures that the first radial gap is smaller than a first set threshold value and / or the second radial gap is larger than a second set threshold value.

4. The epitaxial device according to claim 2, characterized in that: The main body comprises an upper dome, a support seat and a lower dome which are arranged in sequence. The upper dome, the support seat and the lower dome are arranged to surround and form the cavity. The distance measuring device is installed on the lower dome.

5. The epitaxial device according to claim 4, characterized in that: The lower dome is made of quartz material, and the distance measuring device is arranged outside the lower dome.

6. The epitaxial device according to claim 5, characterized in that: The distance measuring device is a distance measuring camera.

7. The epitaxial device according to claim 6, characterized in that: The epitaxial device also includes a cooling device for cooling the ranging camera.

8. The epitaxial device according to claim 7, characterized in that: The cooling device comprises a cover body, the ranging camera is installed in the cover body, and the cover body is provided with a cooling channel for the circulation of cooling medium.

9. The epitaxial device according to claim 6, characterized in that: The ranging camera includes a first ranging camera and a second ranging camera, the first ranging camera measures the first radial gap, and the second ranging camera measures the second radial gap.

10. The epitaxial device according to claim 6, characterized in that: The ranging camera includes a first ranging camera and a second ranging camera, and the first ranging camera and the second ranging camera cooperate to achieve measurement of the first radial gap or the second radial gap.

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