Vacuum processing system

Abstract

The utility model relates to the technical field of vacuum equipment, and discloses a vacuum treatment system. The vacuum treatment system comprises a vacuum transfer cavity, at least one vacuum treatment cavity and a vacuum sample transfer device. And the at least one vacuum processing cavity is communicated with the vacuum transfer cavity. The at least one vacuum treatment cavity comprises one or more of a sample feeding cavity, a sample discharging cavity, a cleavage cavity, a coating cavity, an overturning cavity and a hydrogen atom cleaning cavity. And the vacuum sample transferring device is used for transferring samples among the at least one vacuum processing cavity.

Description

Technical Field

[0001] The present disclosure relates to the technical field of vacuum equipment, and particularly to a vacuum processing system. Background Art

[0002] Currently, there are two main processing techniques for high-power semiconductor laser bars. One is substrate sample cleavage under ultra-high vacuum. After cleavage, the bars are sent to a coating chamber for passivation, and the whole process is carried out under ultra-high vacuum to avoid the formation of an oxide layer on the fresh cleavage surface. This method is called the E2-process, which can provide the highest quality bar chips. However, currently, there is only a single-station manual operation system on the market, and at most 10-15 bars can be processed in one batch. The procedure is cumbersome and the output is low, unable to meet industrial demands. The other is substrate sample cleavage under the atmosphere. After cleavage, the bars are loaded on an optical carrier and sent into a vacuum system. First, atomic hydrogen cleaning is carried out for oxide removal, and then it is sent to a passivation chamber for passivation film growth. This method can process bars in batches at one time, with a maximum of hundreds of bars that can be processed, but there is still a certain gap in the oxide removal effect compared with vacuum cleavage. The above two technical means each have their own advantages. Users choose the required process according to the performance requirements of the chip products, and the existing vacuum processing systems can only implement one of the bar processing techniques. Summary of the Utility Model

[0003] The present disclosure provides a vacuum processing system, including:

[0004] A vacuum transfer chamber;

[0005] At least one vacuum processing chamber, which is communicated with the vacuum transfer chamber, and at least one vacuum processing chamber includes one or more of: a sample loading chamber, a sample unloading chamber, a cleavage chamber, a coating chamber, a flipping chamber, and a hydrogen atom cleaning chamber; and

[0006] A vacuum sample transfer device for transferring samples between at least one vacuum processing chamber.

[0007] In some embodiments of the present disclosure, at least one vacuum processing chamber includes: a sample loading chamber, a sample unloading chamber, at least one cleavage chamber, at least one coating chamber, and at least one hydrogen atom cleaning chamber.

[0008] In some embodiments of the present disclosure, the vacuum processing system further includes:

[0009] An optical carrier tray for the hydrogen atom cleaning chamber;

[0010] A cleavage fixture tray for the cleavage chamber;

[0011] A wafer tray for the coating chamber;

[0012] The outer diameters of the optical carrier tray, the cleavage fixture tray, and the wafer tray are the same.

[0013] In some embodiments of the present disclosure, the cleavage fixture tray can carry a substrate sample for a cleavage process in a cleavage chamber and can carry the cleaved bar for a coating process in a coating chamber.

[0014] In some embodiments of the present disclosure, a vacuum sample transfer device includes:

[0015] A first main arm,

[0016] A first auxiliary arm rotatably connected to the first main arm;

[0017] A second main arm,

[0018] A second auxiliary arm rotatably connected to the second main arm;

[0019] A first gear set fixedly connected to the first auxiliary arm, the first gear set includes:

[0020] A first upper gear;

[0021] A first lower gear;

[0022] A second gear set fixedly connected to the second auxiliary arm, the second gear set includes:

[0023] A second upper gear in zero-backlash engagement with the first side of the first upper gear;

[0024] A second lower gear in zero-backlash engagement with the second side of the first lower gear; and

[0025] A sample transfer table rotatably connected to the first auxiliary arm and the second auxiliary arm, the first main arm and the second main arm are used to rotate to drive the first auxiliary arm and the second auxiliary arm to move, so as to move the sample transfer table.

[0026] In some embodiments of the present disclosure, the tooth clearance surfaces of the first upper gear and the first lower gear of the first gear set are staggered; the tooth clearance surfaces of the second upper gear and the second lower gear of the second gear set are staggered.

[0027] In some embodiments of the present disclosure, the first upper gear and the first lower gear of the first gear set are fixedly connected; the second upper gear and the second lower gear of the second gear set are fixedly connected.

[0028] In some embodiments of the present disclosure, the vacuum sample transfer device further includes a third arm, the first auxiliary arm and the second auxiliary arm are rotatably arranged at the proximal end of the third arm, and the distal end of the third arm is fixedly connected to the sample transfer table.

[0029] In some embodiments of the present disclosure, the vacuum sample transfer device further includes a connecting member, the first auxiliary arm and the second auxiliary arm are rotatably arranged at the proximal end of the connecting member, and the distal end of the connecting member is fixedly connected to the proximal end of the third arm.

[0030] In some embodiments of the present disclosure, the vacuum sample transfer device further includes a driving device, including:

[0031] A first driving shaft for driving the first main arm; and

[0032] A second driving shaft for driving the second main arm.

[0033] In some embodiments of the present disclosure, the vacuum processing system further includes:

[0034] An image sensor installed in the vacuum transfer cavity for collecting images and generating image signals; and

[0035] A control module for receiving the image signals of the image sensor.

[0036] In some embodiments of the present disclosure, the vacuum processing system further includes a calibration plate disposed on the first main arm, the first auxiliary arm, the second main arm, the second auxiliary arm or the third arm. The control module controls the vacuum sample transfer device to automatically return to zero based on the image signals when the calibration plate pattern is collected by the image sensor.

[0037] The vacuum processing system according to some embodiments of the present disclosure can bring beneficial technical effects. For example, the vacuum processing system according to some embodiments of the present disclosure can be compatible with multiple main processing processes of the bar and can easily achieve process switching to produce different products, thereby improving production efficiency. Also, for example, the vacuum processing system according to some embodiments of the present disclosure adopts a double-layer gear set meshing method, which can increase the load and will not loosen, thereby effectively increasing the stability during the sample transfer process. Again, for example, the vacuum processing system according to some embodiments of the present disclosure is designed with a third arm. At the same sample transfer distance, the third arm can shorten the lengths of the first auxiliary arm and the second auxiliary arm, thereby extending the service lives of the first auxiliary arm and the second auxiliary arm and improving the sample transfer accuracy. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] In order to more clearly illustrate the technical solutions in the embodiments of the present disclosure or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only one embodiment of the present disclosure. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0039] Figure 1 A schematic structural diagram of a vacuum processing system according to some embodiments of the present disclosure is shown.

[0040] Figure 2 A schematic structural diagram of a cleavage jig tray according to some embodiments of the present disclosure is shown.

[0041] Figure 3 Schematic structural diagram of a vacuum sample transfer device according to some embodiments of the present disclosure.

[0042] Figure 4 Shown according to some embodiments of the present disclosure Figure 3 Enlarged schematic diagram of part A.

[0043] Figure 5 Schematic structural diagram of a vacuum sample transfer device with a driving device according to some embodiments of the present disclosure.

[0044] In the above drawings, each reference numeral represents:

[0045] 1000 - Vacuum processing system

[0046] 100 - Vacuum sample transfer device

[0047] 101 - First main arm

[0048] 102 - First auxiliary arm

[0049] 103 - Second main arm

[0050] 104 - Second auxiliary arm

[0051] 105 - First gear set

[0052] 1051 - First upper gear

[0053] 1052 - First lower gear

[0054] 106 - Second gear set

[0055] 1061 - Second upper gear

[0056] 1062 - Second lower gear

[0057] 107 - Sample transfer table

[0058] 108 - Third arm

[0059] 109 - Connecting piece

[0060] 110 - Driving device

[0061] 200 - Vacuum transfer chamber

[0062] 300 - Vacuum processing chamber

[0063] 301 - Sampling chamber

[0064] 302 - Sample output chamber

[0065] 303 - Cleavage chamber

[0066] 304 - Coating chamber

[0067] 305 - Flip Chamber

[0068] 306 - Hydrogen Atom Cleaning Chamber

[0069] 400 - Optical Carrier Tray

[0070] 500 - Cleavage Fixture Tray

[0071] 501 - Tray

[0072] 502 - Elastic Clip

[0073] 503 - Station Card Slot

[0074] 504 - Substrate Sample Carrier

[0075] 505 - Substrate Sample Positioner

[0076] 600 - Calibration Plate Detailed Implementation Modes

[0077] Some embodiments of the present disclosure will be described below with reference to the accompanying drawings. Obviously, the described embodiments are only exemplary embodiments of the present disclosure, rather than all embodiments.

[0078] In the description of the present disclosure, it should be noted that the orientation or positional relationship indicated by the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", "top", "bottom", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present disclosure and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present disclosure. In addition, the terms "first" and "second" are only used for descriptive purposes, and cannot be construed as indicating or implying relative importance. In the description of the present disclosure, it should be noted that unless otherwise clearly defined and limited, the terms "installed", "connected", "coupled" should be understood in a broad sense. For example, it can be a fixed connection or a detachable connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be the communication inside two elements. In the description of the present disclosure, the distal end or the far side refers to the end or side that extends deep into the vacuum environment (for example, the vacuum chamber), and the proximal end or the near side is the end or side opposite to the distal end or the far side (for example, the end or side away from the vacuum chamber, or the end or side near the vacuum chamber wall inside the vacuum chamber, etc.). Or, the end or side close to the driving device is the proximal end or the near side, and the end or side away from the driving device is the distal end or the far side. For those of ordinary skill in the art, the specific meanings of the above terms in the present disclosure can be understood according to specific circumstances.

[0079] Figure 1 Schematic structural diagram of a vacuum processing system 1000 according to some embodiments of the present disclosure is shown.

[0080] As Figure 1 shown, in some embodiments of the present disclosure, the vacuum processing system 1000 may include a vacuum transfer chamber 200, at least one vacuum processing chamber 300, and a vacuum sample transfer device 100 according to any one of the embodiments of the present disclosure (e.g., Figure 3 and Figure 5 the vacuum sample transfer device 100 shown). At least one vacuum processing chamber 300 is in communication with the vacuum transfer chamber 200. The vacuum sample transfer device 100 is used for transferring samples between at least one vacuum processing chamber 300.

[0081] As Figure 1 shown, in some embodiments of the present disclosure, at least one vacuum processing chamber 300 may include one or more of a sample loading chamber 301, a sample unloading chamber 302, a cleavage chamber 303, a coating chamber 304, a flipping chamber 305, and a hydrogen atom cleaning chamber 306. Those skilled in the art can select a combination of one or more according to actual needs. For example, in some embodiments, at least one vacuum processing chamber 300 may include a cleavage chamber 303 and a hydrogen atom cleaning chamber 306.

[0082] As Figure 1 shown, in some embodiments of the present disclosure, at least one vacuum processing chamber 300 may include a sample loading chamber 301, a sample unloading chamber 302, at least one cleavage chamber 303, at least one coating chamber 304, and at least one hydrogen atom cleaning chamber 306. In some embodiments of the present disclosure, by using the vacuum transfer chamber 200 to dock the sample loading chamber 301, the sample unloading chamber 302, the cleavage chamber 303, the coating chamber 304, and the hydrogen atom cleaning chamber 306, compatibility of two bar processing processes can be achieved, and users can flexibly select bar processing processes according to product requirements.

[0083] Those skilled in the art can understand that although Figure 4 the numbers of the sample loading chamber 301, the sample unloading chamber 302, the cleavage chamber 303, the coating chamber 304, and the hydrogen atom cleaning chamber 306 shown are all one, the numbers of the sample loading chamber 301, the sample unloading chamber 302, the cleavage chamber 303, the coating chamber 304, and the hydrogen atom cleaning chamber 306 can also be greater than one. For example, by setting multiple cleavage chambers 303, multiple coating chambers 304, etc., overall arrangement can be made among multiple different types of chambers to achieve coordinated operation between chambers and improve production efficiency.

[0084] As Figure 1As shown, in some embodiments of the present disclosure, at least one vacuum processing chamber 300 may further include a flipping chamber 305 to achieve double-sided coating. After single-sided coating is completed, the vacuum sample transfer device transfers the sample to the flipping chamber 305 for flipping and then sends it into the coating chamber 304 for reverse coating.

[0085] In some embodiments of the present disclosure, the cavity of the coating chamber 304 may include a plurality of flange ports to expand various types of furnace sources, including thermal evaporation sources, electron beam evaporation sources, and plasma sources, etc., which can be used for depositing passivation films or optical films (anti-reflection films, high-reflection films, etc.). The coating chamber 304 may also include a film thickness measuring instrument (QCM), a beam current detector such as a beam current gauge (BFM), etc., to optimize the coating parameters. In addition, the coating chamber 304 may further include a reflection high energy electron diffraction instrument (RHEED) for real-time monitoring of the coating process. The coating chamber 304 may also include an ellipsometer for in-situ measurement of the coating thickness, optical constants, and material microstructure.

[0086] Figure 2 The structural schematic diagram of the cleavage fixture tray 500 according to some embodiments of the present disclosure is shown.

[0087] In some embodiments of the present disclosure, the vacuum processing system 1000 may further include an optical carrier tray 400 (such as Figure 5 the optical carrier tray 400 shown in Figure 2 ), a cleavage fixture tray 500 (such as Figure 5 the optical carrier tray 500 shown in Figure 2 ), and a wafer tray (not shown in the figure). The optical carrier tray 400 can be used for the hydrogen atom cleaning chamber 306. The cleavage fixture tray 500 can be used for the cleavage chamber 303. The wafer tray can be used for the coating chamber 304. The outer diameters of the optical carrier tray 400, the cleavage fixture tray 500, and the wafer tray are the same, so that the sample transfer table 107 of the vacuum sample transfer device 100 can be compatible with the optical carrier tray 400 (such as

[0088] the optical carrier tray 400 shown in

[0089] In some embodiments, the parking platform of the flipping chamber 305 can be compatible with the optical carrier tray 400 and the cleavage fixture tray 500. In some embodiments, after the cleaved bar is coated on one side in the coating chamber 304, without replacing the optical carrier tray 400 or the cleavage fixture tray 500, it is directly transferred to the flipping chamber 305 through the vacuum sample transfer device 100 for flipping and then sent into the coating chamber 304 for coating on the other side.

[0090] As Figure 2 shown, in some embodiments of the present disclosure, the cleavage fixture tray 500 of the cleavage chamber 303 can carry a substrate sample for performing a cleavage process in the cleavage chamber 303 (such as Figure 1 the cleavage chamber 303 shown) and can carry the cleaved bar for performing a coating process in the coating chamber 304 (such as Figure 1 the coating chamber 304 shown).

[0091] As Figure 2 shown, in some embodiments of the present disclosure, the cleavage fixture tray 500 may include a tray 501 and a plurality of elastic clips 502. The tray 501 may include at least one process surface and a plurality of cleavage components. The process surface is provided with a plurality of station slots 503 for accommodating multiple samples. The plurality of elastic clips 502 are located on the process surface of the tray 501 and correspond to the plurality of station slots 503 one by one. The elastic clips 502 are fixed on one side of the corresponding station slots 503 for fixing multiple samples. A plurality of cleavage components are also provided on the tray 501 and correspond to the plurality of station slots 503. The cleavage components may include a substrate sample carrier 504 and a substrate sample positioner 505. In the present disclosure, the substrate sample refers to the wafer before being cleaved into bars. The substrate sample carrier 504 is located on the side of the station slot 503 away from the center of the tray. The substrate sample positioner 505 is on the side of the station slot 503 close to the center of the tray. For the case where the cleavage fixture tray 500 is applied in the cleavage chamber 303, the substrate sample is a long strip-shaped structure. During actual use, one short side of the substrate sample abuts against the substrate sample positioner 505, and the long strip-shaped substrate sample extends along the radial direction and is supported by the substrate sample carrier 504 on the side away from the center of the tray, so that the substrate sample is suspended above the station slot 503, and thus the cleaved bar can be conveniently placed in the station slot 503 for application in the coating chamber 304 (such as Figure 1 the coating chamber 304 shown).

[0092] In some embodiments of the present disclosure, the cleavage fixture tray 500 adopts a multi-station design to achieve batch processing of multiple groups of bars at one time, which can improve production capacity.

[0093] According to some embodiments of the present disclosure, both of the two bar processing processes are integrated into a vacuum processing system. The vacuum sample transfer device 100 needs to transfer the optical carrier tray 400 (such as Figure 5 the optical carrier tray 400 shown in

[0094] Figure 3 and the cleavage fixture tray 500. Therefore, the vacuum sample transfer device 100 needs to have good load capacity and accurate sample transfer ability. Figure 4 shows a schematic structural diagram of a vacuum sample transfer device 100 according to some embodiments of the present disclosure. Figure 3 shows an enlarged schematic view of part A of

[0095] As shown in Figure 3 and Figure 4 , in some embodiments of the present disclosure, the vacuum sample transfer device 100 may include a first main arm 101, a first auxiliary arm 102, a second main arm 103, a second auxiliary arm 104, a first gear set 105, a second gear set 106, and a sample transfer table 107. The first auxiliary arm 102 is rotatably connected to the first main arm 101. The second auxiliary arm 104 is rotatably connected to the second main arm 103. The first gear set 105 is fixedly connected to the first auxiliary arm 102. The first gear set 105 may include a first upper gear 1051 and a first lower gear 1052. The second gear set 106 is fixedly connected to the second auxiliary arm 104. The second gear set 106 may include a second upper gear 1061 and a second lower gear 1062. The second upper gear 1061 is in zero-backlash engagement with the first side of the first upper gear 1051. The second lower gear 1062 is in zero-backlash engagement with the second side of the first lower gear 1052. The first side and the second side are opposite. For example, the first side is the left side of the tooth, and the second side is the right side of the tooth. The second upper gear 1061 being in zero-backlash engagement with the first side of the first upper gear 1051 means that the teeth of the second upper gear 1061 and the teeth of the first upper gear 1051 are in zero-backlash engagement at the first side (for example, the left side) of the teeth of the first upper gear 1051. The second lower gear 1062 being in zero-backlash engagement with the second side of the first lower gear 1052 means that the teeth of the second lower gear 1062 and the teeth of the first lower gear 1052 are in zero-backlash engagement at the second side (for example, the right side) of the teeth of the first lower gear 1052. The sample transfer table 107 is rotatably connected to the first auxiliary arm 102 and the second auxiliary arm 104. The first main arm 101 and the second main arm 103 are used for rotation to drive the first auxiliary arm 102 and the second auxiliary arm 104 to move, so as to move the sample transfer table 107.

[0096] In some embodiments, the first auxiliary arm 102 and the first main arm 101 may be rotatably connected through a bearing. The second auxiliary arm 104 and the second main arm 103 may also be rotatably connected through a bearing.

[0097] The vacuum sample transfer device 100 according to some embodiments of the present disclosure adopts a double-layer meshing method in which the first upper gear 1051 and the second upper gear 1061 of the first gear set 105 are meshed, and the first lower gear 1052 and the second lower gear 1062 are meshed, so that the gear meshing is not prone to looseness, and there is no jitter during the sample transfer process, which can effectively increase the stability and accuracy during the sample transfer process, and increase the load-bearing capacity of the vacuum sample transfer device 100.

[0098] As Figure 3 and Figure 4 shown, in some embodiments of the present disclosure, the tooth gap surfaces of the first upper gear 1051 and the first lower gear 1052 of the first gear set 105 are staggered. The tooth gap surfaces of the second upper gear 1061 and the second lower gear 1062 of the second gear set 106 are staggered. Moreover, the second upper gear 1061 is meshed with zero backlash on the first side of the first upper gear 1051, and the second lower gear 1062 is meshed with zero backlash on the second side of the first lower gear 1052, so that the stability, reliability and effectiveness of the double-layer meshing method are further improved.

[0099] In some embodiments of the present disclosure, the first auxiliary arm 102 and the second auxiliary arm 104 of the vacuum sample transfer device 100 can couple the rotation of the first auxiliary arm 102 and the second auxiliary arm 104 through the meshing of the first gear set 105 and the second gear set 106, so as to drive the sample transfer table 107 to perform a linear motion for transferring samples. Therefore, when the first gear set 105 and the second gear set 106 are meshed, both forward rotation and reverse rotation are required. Through the design of staggering the tooth gap surfaces, when the first gear set 105 and the second gear set 106 rotate forward or reverse, they do not affect each other, and zero-backlash meshing can be achieved, thereby improving the sample transfer accuracy.

[0100] As Figure 3 and Figure 4 shown, in some embodiments of the present disclosure, the first upper gear 1051 and the first lower gear 1052 of the first gear set 105 are fixedly connected. The second upper gear 1061 and the second lower gear 1062 of the second gear set 106 are fixedly connected.

[0101] In some embodiments, the first upper gear 1051 of the first gear set 105 may include an integrally formed hollow gear shaft. The first lower gear 1052 of the first gear set 105 may be sleeved on the hollow gear shaft, and then the first upper gear 1051 and the first lower gear 1052 are fixed by, for example, screws and nuts. Those skilled in the art can understand that the fixing manner of the first upper gear 1051 and the first lower gear 1052 is only exemplary, and the first upper gear 1051 and the first lower gear 1052 may also be fixed by, for example, clamping, bonding, etc. Similarly, the fact that the first upper gear 1051 includes an integrally formed hollow gear shaft is only exemplary, and the first upper gear 1051 and the hollow gear shaft may also be separately formed and then assembled.

[0102] Those skilled in the art can understand that the second gear set 106 may adopt the same structure as the first gear set 105, which will not be elaborated herein.

[0103] As Figure 3 and Figure 4 shown, in some embodiments of the present disclosure, the vacuum sample transfer device 100 may further include a third arm 108. The first auxiliary arm 102 and the second auxiliary arm 104 may be rotatably arranged at the proximal end of the third arm 108, and the distal end of the third arm 108 is fixedly connected to the sample transfer table 107.

[0104] As Figure 3 and Figure 4 shown, in some embodiments, at the same sample transfer distance, the setting of the third arm 108 can shorten the lengths of the first auxiliary arm 102 and the second auxiliary arm 104, so that whether the vacuum sample transfer device 100 is in the dynamic process of transferring samples or in a stationary state, the stress and wear borne by the connecting bearings between the first auxiliary arm 102 and the first main arm 101 and between the second auxiliary arm 104 and the second main arm 103 will be reduced, thereby the service life of the bearings can be extended and the sample transfer accuracy of the vacuum sample transfer device 100 can be improved.

[0105] As Figure 3 and Figure 4 shown, in some embodiments of the present disclosure, the vacuum sample transfer device 100 may further include a connecting member 109. The first auxiliary arm 102 and the second auxiliary arm 104 are rotatably arranged at the proximal end of the connecting member 109, and the distal end of the connecting member 109 is fixedly connected to the proximal end of the third arm 108.

[0106] As Figure 3 and Figure 4 shown, in some embodiments, both the first auxiliary arm 102 and the second auxiliary arm 104 may be rotatably arranged at the proximal end of the connecting member 109 through bearings.

[0107] In some embodiments of the present disclosure, the first main arm 101, the second main arm 103, the first auxiliary arm 102, the second auxiliary arm 104, and the sample transfer table 107 of the vacuum sample transfer device 100 are disposed within the vacuum rotation chamber 200 for sample transfer between at least one vacuum processing chamber 300.

[0108] Figure 5 FIG. shows a schematic structural diagram of a vacuum sample transfer device 100 including a driving device 110 according to some embodiments of the present disclosure.

[0109] As Figure 5 shown, in some embodiments of the present disclosure, the vacuum sample transfer device 100 may further include a driving device 110. The driving device 110 may include a first driving shaft and a second driving shaft (not shown in the figure). The first driving shaft is used to drive the first main arm 101. The second driving shaft is used to drive the second main arm 103.

[0110] In some embodiments of the present disclosure, the first driving shaft and the second driving shaft may be coaxially disposed. The first driving shaft is fixedly connected to the inner end of the first main arm 101 and can be used to drive the first main arm 101 to rotate. The second driving shaft is fixedly connected to the inner end of the second main arm 103 and can be used to drive the second main arm 103 to rotate. The first driving shaft and the second driving shaft of the driving device 110 respectively drive the first main arm 101 and the second main arm 103 to rotate, and the first main arm 101 and the second main arm 103 respectively drive the first auxiliary arm 102 and the second auxiliary arm 104 to rotate, thereby driving the sample transfer table 107 to move away from or close to the driving center. In addition, the first driving shaft and the second driving shaft of the driving device 110 may also respectively drive the first main arm 101 and the second main arm 103 to rotate integrally, thereby driving the first auxiliary arm 102 and the second auxiliary arm 104 and driving the sample transfer table 107 to rotate integrally.

[0111] In some embodiments of the present disclosure, the vacuum processing system 1000 may further include an image sensor (not shown in the figure) and a control module (not shown in the figure). The image sensor may be installed within the vacuum rotation chamber 200. For example, it may be installed above the vacuum rotation chamber 200 for collecting images and generating image signals. The control module may be used to receive the image signals of the image sensor.

[0112] In some embodiments of the present disclosure, the control module can also be used to control the vacuum sample transfer device 100 to transfer samples between at least one vacuum processing chamber 300. For example, in some embodiments of the present disclosure, the control module can control the vacuum sample transfer device to sample and transfer from, for example, Figure 1 the shown sample injection chamber 301 to the cleavage chamber 303 or the hydrogen atom cleaning chamber 306, sample and transfer from the cleavage chamber 303 or the hydrogen atom cleaning chamber 306 to the coating chamber 304, sample and transfer from the coating chamber 304 to the flipping chamber 305 or the sample output chamber 302, etc.

[0113] As Figure 1 shown, in some embodiments of the present disclosure, the vacuum processing system 1000 may further include a calibration plate 600. The calibration plate 600 may be disposed on the first main arm 101, the first auxiliary arm 102, the second main arm 103, the second auxiliary arm 104, or the third arm 108. In some embodiments of the present disclosure, during equipment maintenance, the motor may be removed, and it is necessary to zero the vacuum sample transfer device 100. The control module may control the vacuum sample transfer device 100 to automatically zero based on the image signal when the calibration plate 600 pattern is collected by the image sensor.

[0114] Those skilled in the art can understand that each component in the vacuum processing system 1000 can be connected to the control module and controlled by the control module, but can also be independently controlled and function on its own.

[0115] It should be noted that the above are only exemplary embodiments of the present disclosure and are not intended to limit the present disclosure. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present disclosure shall be included within the protection scope of the present disclosure.

Claims

1. A vacuum processing system, characterized in that: include: Vacuum transfer chamber; At least one vacuum processing chamber is connected to the vacuum transfer chamber, and the at least one vacuum processing chamber includes: one or more of a sample inlet chamber, a sample outlet chamber, a cleavage chamber, a coating chamber, a flip chamber, and a hydrogen atom cleaning chamber; as well as The vacuum sample transfer device is used for transferring samples between the at least one vacuum processing chamber.

2. The vacuum processing system according to claim 1, characterized in that: The at least one vacuum processing chamber comprises: a sample inlet chamber, a sample outlet chamber, at least one cleavage chamber, at least one film coating chamber and at least one hydrogen atom cleaning chamber.

3. The vacuum processing system according to claim 1, characterized in that: Also includes: An optical carrier tray for the hydrogen atom cleaning chamber; A cleavage fixture tray, used for the cleavage chamber; A wafer tray, used in the coating chamber; The optical carrier tray, the cleavage fixture tray, and the wafer tray have the same outer diameter.

4. The vacuum processing system according to claim 3, characterized in that: The cleavage fixture tray can carry substrate samples for performing a cleavage process in the cleavage chamber, and can carry cleaved bars for performing a coating process in the coating chamber.

5. The vacuum processing system according to claim 1, characterized in that: The vacuum sample transfer device comprises: The first main arm, a first auxiliary arm, rotatably connected to the first main arm; Second main arm, a second auxiliary arm, rotatably connected to the second main arm; A first gear set is fixedly connected to the first auxiliary arm, and the first gear set includes: First upper gear; First lower gear; A second gear set is fixedly connected to the second auxiliary arm, and the second gear set includes: a second upper gear meshing with the first side of the first upper gear with zero backlash; a second lower gear, meshing with the second side of the first lower gear with zero backlash; and a sample transfer platform, rotatably connected to the first auxiliary arm and the second auxiliary arm, the first main arm and the second main arm are used to rotate to drive the first auxiliary arm and the second auxiliary arm to move, thereby moving the sample transfer platform.

6. The vacuum processing system according to claim 5, characterized in that: The tooth gap surfaces of the first upper gear and the first lower gear of the first gear set are staggered; The tooth gap surfaces of the second upper gear and the second lower gear of the second gear set are staggered.

7. The vacuum processing system according to claim 5, characterized in that: The first upper gear and the first lower gear of the first gear set are fixedly connected; The second upper gear and the second lower gear of the second gear set are fixedly connected.

8. The vacuum processing system according to claim 5, characterized in that: The vacuum sample transfer device further comprises a third arm, the first auxiliary arm and the second auxiliary arm are rotatably arranged at the proximal end of the third arm, and the distal end of the third arm is fixedly connected to the sample transfer platform.

9. The vacuum processing system according to claim 8, characterized in that: The vacuum sample transfer device further comprises a connecting member, the first auxiliary arm and the second auxiliary arm are rotatably arranged at the proximal end of the connecting member, and the distal end of the connecting member is fixedly connected to the proximal end of the third arm.

10. The vacuum processing system according to claim 5, characterized in that: The vacuum sample transfer device further comprises a driving device, including: a first driving shaft, configured to drive the first main arm; and The second driving shaft is used to drive the second main arm.

11. The vacuum processing system according to claim 8, characterized in that: Also includes: An image sensor is installed in the vacuum transfer chamber and is used to collect images and generate image signals; as well as The control module is used to receive the image signal from the image sensor.

12. The vacuum processing system according to claim 11, characterized in that: It also includes a calibration plate, which is arranged on the first main arm, the first auxiliary arm, the second main arm, the second auxiliary arm or the third arm. The control module controls the vacuum sample transfer device to automatically return to zero based on the image signal when the image sensor captures the pattern of the calibration plate.

Images