Cold trap device and vapor deposition equipment

Abstract

The utility model discloses a cold trap device, which comprises a shell, an air inlet and an air outlet are arranged on the shell, and a cavity is formed between the air inlet and the air outlet; the filter disc structure is arranged in the cavity, and the filter disc structure is used for guiding gas to flow and / or enabling gas to crystallize on the surface of the filter disc structure; the net-shaped structure is arranged between the filter disc structure and the gas outlet, and the net-shaped structure is used for allowing gas to pass through and preventing solid from passing through. According to the cold trap device and the vapor deposition equipment provided by the utility model, the filter disc structure for guiding the gas to flow and / or crystallizing the gas on the surface of the filter disc structure is arranged in the cavity between the gas inlet and the gas outlet formed in the shell; and a net-shaped structure which only allows gas to pass through and prevents solid from passing through is arranged between the filter disc structure and the gas outlet, so that the quality of the deposited film and the stability of the manufacturing process are improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, and more particularly to a cold trap device and a vapor deposition device. Background Art

[0002] A cold trap is a trap that captures gases by condensation on a cooled surface. It is placed between a vacuum vessel and a pump and is used to adsorb gases or trap oil vapor. As a cooling device, a cold trap can condense and capture gas molecules whose condensation point temperature is higher than the temperature of the cold trap through a low-temperature surface, or capture specific gas molecules by setting the condensation temperature, that is, it can separate gases.

[0003] In the process of semiconductor manufacturing, vapor deposition technology is widely used to deposit thin film materials. In the process of chemical vapor deposition (CVD), the key equipment is a vapor deposition reactor, which usually includes various types of cold traps to capture and remove harmful gases and impurities generated to ensure the stability of the deposition process and the quality of the thin film. However, the traditional cold trap design has some limitations, such as being unable to effectively prevent the uneven flow of gases, being unable to completely capture all harmful gases and impurities, and having a short service life. These problems may lead to unstable quality of the deposited thin film and even affect the performance and reliability of the device. Summary of the Utility Model

[0004] A series of simplified concepts are introduced in the summary of the utility model, which will be further described in detail in the specific implementation section. The summary of the utility model does not mean to attempt to define the key features and essential technical features of the claimed technical solution, nor does it mean to attempt to determine the protection scope of the claimed technical solution.

[0005] The utility model provides a cold trap device, including:

[0006] A housing, on which an air inlet and an air outlet are provided, and a cavity is formed between the air inlet and the air outlet;

[0007] A filter structure, arranged in the cavity, and the filter structure is used to guide the gas flow and / or make the gas crystallize on the surface of the filter structure;

[0008] A mesh structure, arranged between the filter structure and the air outlet, and the mesh structure is used to allow the gas to pass through and prevent solids from passing through.

[0009] Exemplarily, the filter structure is composed of a plurality of filter sheets, and the plurality of filter sheets are arranged in a preset order.

[0010] Exemplarily, the arrangement of the plurality of filter sheets in a preset order includes: the extending directions of the plurality of filter sheets are parallel or intersecting.

[0011] Exemplarily, the arrangement of the plurality of filter sheets in a preset order includes: when the extending directions of the plurality of filter sheets are parallel, the plurality of filter sheets extend in a first direction, and the first direction is parallel or intersecting with the gas flow direction.

[0012] Exemplarily, the plurality of filter sheets are parallel or intersecting on a first plane, and the first plane is perpendicular to the gas flow direction; or, the plurality of filter sheets are parallel or intersecting on a second plane, and the second plane is perpendicular to the first direction.

[0013] Exemplarily, the plurality of filter sheets are uniformly arranged on the first plane or the second plane: the distance between adjacent filter sheets on the first plane or the second plane is equal; or, the included angle between adjacent filter sheets on the first plane or the second plane is equal.

[0014] Exemplarily, the mesh structure includes a planar structure or a curved surface structure.

[0015] Exemplarily, the convex surface of the curved surface structure is close to the filter sheet structure, and the concave surface of the curved surface structure is close to the air outlet.

[0016] Exemplarily, the cold trap device is used for chemical vapor deposition of thin film materials, and the filter sheet structure is used to form crystals of gas on the surface of the filter sheet structure.

[0017] The present utility model also provides a vapor deposition device, including the cold trap device described in any one of the above.

[0018] According to the cold trap device and the vapor deposition device provided by the present invention, by arranging a filter sheet structure for guiding gas flow and / or forming crystals of gas on its surface in the cavity between the air inlet and the air outlet formed in the housing, and arranging a mesh structure that only allows gas to pass through and prevents solids from passing between the filter sheet structure and the air outlet, the quality of the deposited thin film and the stability of the manufacturing process are improved. Description of the Drawings

[0019] The following drawings of the present utility model are used as a part of the present utility model to understand the present utility model. The embodiments and descriptions of the present utility model are shown in the drawings to explain the principle of the present utility model.

[0020] In the drawings:

[0021] Figure 1 is a schematic structural diagram of a cold trap device according to an embodiment of the present utility model.

[0022] Reference Signs

[0023] 1. Housing 2. Intake port

[0024] 3. Outlet port 4. Filter structure

[0025] 5. Mesh structure Detailed implementation mode

[0026] In the following description, a large number of specific details are given to provide a more thorough understanding of the present utility model. However, it is obvious to those skilled in the art that the present utility model can be implemented without one or more of these details. In other examples, in order to avoid confusion with the present utility model, some well-known technical features in the art are not described.

[0027] In order to thoroughly understand the present utility model, a detailed description will be presented in the following description to illustrate the cold trap device and the vapor deposition equipment of the present utility model. Obviously, the implementation of the present utility model is not limited to the special details familiar to those skilled in the semiconductor technology field. The preferred embodiments of the present utility model are described in detail below. However, in addition to these detailed descriptions, the present utility model can also have other implementation manners.

[0028] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present utility model. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should also be understood that when the terms "comprise" and / or "include" are used in this specification, they indicate the presence of the described features, wholes, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, wholes, steps, operations, elements, components, and / or their combinations.

[0029] Now, the exemplary embodiments according to the present utility model will be described in more detail with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many different forms and should not be construed as being limited only to the embodiments described herein. It should be understood that these embodiments are provided to make the disclosure of the present utility model thorough and complete, and to fully convey the concept of these exemplary embodiments to those of ordinary skill in the art. In the drawings, for clarity, the thickness of the layers and regions is exaggerated, and the same reference numerals are used to denote the same elements, and thus their description will be omitted.

[0030] The present utility model provides a cold trap device, as Figure 1 shown, comprising:

[0031] A housing 1, on which an intake port 2 and an outlet port 3 are provided, and a cavity is formed between the intake port and the outlet port;

[0032] A filter structure 4 is disposed within the cavity, and the filter structure is configured to guide the gas flow and / or cause the gas to crystallize on the surface of the filter structure;

[0033] A mesh structure 5 is disposed between the filter structure and the air outlet, and the mesh structure is configured to allow the gas to pass through while preventing solids from passing through.

[0034] In one embodiment, the air inlet 2 and the air outlet 3 are respectively disposed on two opposite surfaces of the housing 1. In Figure 1 the illustrated embodiment, the air inlet 2 and the air outlet 3 are respectively disposed on the upper surface and the lower surface of the housing. In this case, the gas flow direction from the air inlet 2 to the air outlet 3 is approximately a vertical direction from top to bottom. Additionally, the air inlet 2 and the air outlet 3 can also be respectively disposed on the front surface and the rear surface of the housing 1, or respectively disposed on the left surface and the right surface of the housing 1. In this case, the gas flow direction from the air inlet 2 to the air outlet 3 is approximately a horizontal direction.

[0035] In one embodiment, the air inlet 2 and the air outlet 3 are respectively disposed on two adjacent surfaces of the housing 1. For example, the air inlet 2 is disposed on any one of the front surface, the rear surface, the left surface, and the right surface of the housing 1, and the air outlet 3 is disposed on the lower surface of the housing 1. In this case, the gas flow direction from the air inlet 2 to the air outlet 3 is approximately a horizontal direction first and then a vertical direction. It should be noted that the air inlet 2 and the air outlet 3 can be arranged on the same or different surfaces of the housing 1 according to needs, and the gas flow direction also changes accordingly with the arrangement of the air inlet 2 and the air outlet 3. This application does not limit this.

[0036] Exemplarily, a filter structure 4 is disposed within the cavity formed by the housing 1. The filter structure is composed of a plurality of filters, and the plurality of filters are arranged in a preset order such that the filter structure 4 is configured to guide the air flow and / or promote the crystallization of the gas on the surface of the filter structure 4. Exemplarily, the filters do not include a microporous structure so that the air flow will not be dispersed by the microporous structure and flows in a relatively controllable direction, facilitating more accurate guidance of the air flow and changing the direction of the air flow.

[0037] In one embodiment, the extending directions of the plurality of filters are parallel or intersecting. When the extending directions of the plurality of filters are parallel, the filter structure formed thereby is generally configured to change the direction of the air flow but not the speed of the air flow. When the extending directions of the plurality of filters intersect, the filter structure formed thereby is, for example, in a trumpet shape, and can not only change the direction of the air flow but also change the speed of the air flow. For example, when the opening of the trumpet-shaped filter structure faces the air inlet 2, the speed of the air flow increases, and when the opening of the trumpet-shaped filter structure faces the air outlet 3, the speed of the air flow decreases.

[0038] In one embodiment, when the extending directions of multiple filter sheets are parallel, the multiple filter sheets forming the filter structure extend along a first direction, where the first direction is parallel to the gas flow direction. At this time, a first plane perpendicular to the air flow direction and a second plane perpendicular to the first direction are parallel. In Figure 1 the illustrated example, when the first direction is the vertical direction, both the first plane and the second plane are in the horizontal direction. When the filter structure extends along the gas flow direction, the multiple filter sheets forming the filter structure can be parallel, intersecting, or perpendicular on the first plane and / or the second plane, and can be coaxial, co-point, or non-contact. The present application does not limit this. When the filter structure extends along the gas flow direction, although it cannot significantly change the gas flow direction, it can still play a role in dispersing and guiding the air flow to a certain extent, and can promote the crystallization of gas on the surface of the filter sheet by setting the filter structure.

[0039] In one embodiment, when the extending directions of multiple filter sheets are parallel, the multiple filter sheets forming the filter structure extend along a first direction, where the first direction intersects the gas flow direction. Specifically, the included angle range between the first direction and the gas flow direction includes 30° to 45°. The second plane is perpendicular to the first direction. The multiple filter sheets forming the filter structure can be parallel, intersecting, or perpendicular on the second plane, and can be coaxial, co-point, or non-contact. The present application does not limit this. When the extending direction of the filter structure intersects the gas flow direction, it can not only change the gas flow direction, but also promote the crystallization of gas on the surface of the filter sheet by setting the filter structure.

[0040] In one embodiment, the filter structure includes, but is not limited to, a grid type structure, a coaxial type structure, a spiral type structure, etc. Among them, the grids of the grid type structure include, but are not limited to, squares, rectangles, or parallelograms. The coaxial type structure includes, but is not limited to, a "cross" type structure, a "rice" type structure, etc. The spiral type structure includes that the included angles between the first directions of multiple filter sheets and the gas flow direction are equal and the extension lines of the multiple filter sheets on the second plane intersect at the same point (hereinafter referred to as the "center point").

[0041] In one embodiment, the filter structure is composed of multiple identical filter sheets, and the multiple filter sheets forming the filter structure are evenly arranged on the first plane or the second plane. For example, the distance between adjacent filter sheets on the first plane or the second plane is equal; and / or, the included angle between adjacent filter sheets on the first plane or the second plane is equal. For example, for a grid type filter structure, the row spacing of the grid is consistent and the column spacing of the grid is consistent. For a coaxial type filter structure, the included angle between adjacent filter sheets is consistent. The adjacent included angle of the "cross" type structure is 90°, and the adjacent included angle of the "rice" type structure is 60°. For a spiral type structure, the distances from the filter sheets to the center point are all equal, and when the number of filter sheets is N, the included angle between adjacent filter sheets is 360° / N.

[0042] In one embodiment, when the filter structure includes six filters, the six filters are arranged in a spiral pattern with no contact between them. The angle between the extension direction of the filters (i.e., the first direction) and the gas flow direction is 37.5°, and the angle between adjacent filters in the second plane is 60°.

[0043] By arranging the filter structure in the cavity of the cold trap device, the gas flow direction and velocity can be optimized, achieving uniform gas flow, effectively capturing harmful gases and impurities, improving the efficiency and quality of the deposited thin film, and thereby enhancing the performance and reliability of semiconductor devices.

[0044] Exemplarily, a mesh structure 5 is further provided in the cavity formed by the housing 1. The mesh structure 5 is disposed between the filter structure 4 and the air outlet 3. A plurality of ventilation holes are provided on the mesh structure 5 for allowing gas to pass through and preventing solids from passing through.

[0045] In one embodiment, the size of the ventilation holes on the mesh structure 5 can be set as needed. For example, the ventilation holes on the mesh structure 5 are all less than 1 mm; different sizes of ventilation holes can also be set in different regions, and the present application does not limit this. Ventilation holes can be provided throughout the entire mesh structure 5, or only in some regions.

[0046] In one embodiment, the mesh structure 5 includes a planar structure or a curved surface structure. When the mesh structure adopts a planar structure, the size and direction of the air flow are generally not changed. When the planar mesh structure is blocked by solids such as crystals falling from the filter structure 4, the air flow will significantly decrease.

[0047] In one embodiment, when the mesh structure adopts a curved surface structure, usually the convex surface is close to the filter structure 4 and the concave surface is close to the air outlet 3. The curved surface structure generally has ventilation holes not only at the position directly facing the filter structure 4 but also on the side surface of the curved surface structure. In Figure 1 the example shown, the mesh structure 5 is barrel-shaped, and ventilation holes are provided on both its bottom surface and side wall. In this way, when the bottom surface of the barrel-shaped mesh structure is blocked by solids such as crystals falling, the ventilation holes on the side wall can still ensure that the gas flows out of the cold trap device.

[0048] By providing a mesh structure in the cavity of the cold trap device, crystals or other objects are prevented from falling into the cold trap, avoiding adverse effects on the thin film deposition process.

[0049] In one embodiment, the above-mentioned cold trap device can be used in various chemical vapor deposition processes, specifically for chemical vapor deposition of thin film materials. The filter structure is used to cause the gas to form crystals on the surface of the filter structure. For example, in the chemical vapor deposition of silicon nitride, the filter structure is used to cause gases such as NH4CL or other by-product gases and impurities generated during the chemical vapor deposition process of silicon nitride to form crystals on the surface of the filter structure, thereby facilitating the capture of harmful gases and impurities, improving the quality of the deposited thin film and the stability of the manufacturing process. Moreover, due to the arrangement of the filter structure, the capture of harmful gases and impurities by the cold trap device can also be enhanced, and the service life of the cold trap device can be extended. The filter structure can also be replaced regularly to ensure its capture ability for harmful gases and impurities.

[0050] The present utility model also provides a chemical vapor deposition device, including the above-mentioned cold trap device.

[0051] According to the cold trap device and the chemical vapor deposition device provided by the present invention, by arranging a filter structure for guiding the gas flow and / or causing the gas to form crystals on its surface in the cavity between the air inlet and the air outlet formed in the housing, and arranging a mesh structure that only allows the gas to pass through and prevents solids from passing between the filter structure and the air outlet, the quality of the deposited thin film and the stability of the manufacturing process are improved.

[0052] The present utility model has been illustrated by the above embodiments. However, it should be understood that the above embodiments are only for the purpose of exemplification and illustration, and are not intended to limit the present utility model within the scope of the described embodiments. In addition, those skilled in the art can understand that the present utility model is not limited to the above embodiments, and more variations and modifications can be made according to the teachings of the present utility model, and these variations and modifications all fall within the scope claimed by the present utility model. The protection scope of the present utility model is defined by the appended claims and their equivalent scope.

Claims

1. A cold trap device, characterized in that: include: A shell, wherein an air inlet and an air outlet are provided on the shell, and a cavity is formed between the air inlet and the air outlet; A filter structure is disposed in the cavity, and the filter structure is used to guide the gas flow and / or make the gas crystallize on the surface of the filter structure; A mesh structure is arranged between the filter structure and the gas outlet, and the mesh structure is used to allow gas to pass through and prevent solids from passing through.

2. The cold trap device according to claim 1, characterized in that The filter disc structure is composed of a plurality of filter discs, and the plurality of filter discs are arranged in a preset order.

3. The cold trap device according to claim 2, characterized in that The plurality of filters are arranged in a preset order, including: extension directions of the plurality of filters are parallel or intersecting.

4. The cold trap device according to claim 3, characterized in that The plurality of filter discs are arranged in a preset order, comprising: when the extension directions of the plurality of filter discs are parallel, the plurality of filter discs extend along a first direction, and the first direction is parallel to or intersects with a gas flow direction.

5. The cold trap device according to claim 4, characterized in that: The plurality of filters are parallel or intersecting on a first plane, and the first plane is perpendicular to the gas flow direction; or The plurality of filters are parallel or intersecting on a second plane, and the second plane is perpendicular to the first direction.

6. The cold trap device according to claim 5, characterized in that: The plurality of filters are evenly arranged on the first plane or the second plane: The distances between adjacent filters on the first plane or the second plane are equal; or, The included angles of adjacent filter plates on the first plane or the second plane are equal.

7. The cold trap device according to claim 1, characterized in that: The mesh structure includes a planar structure or a curved structure.

8. The cold trap device according to claim 7, characterized in that The convex surface of the curved surface structure is close to the filter structure, and the concave surface of the curved surface structure is close to the air outlet.

9. The cold trap device according to claim 1, characterized in that: The cold trap device is used for chemical vapor deposition of thin film materials, and the filter structure is used for causing gas to form crystals on the surface of the filter structure.

10. A vapor deposition device, characterized in that: The invention comprises the cold trap device according to any one of claims 1 to 9.

Images