Liquid supply system of chemical reaction tank

Abstract

The utility model discloses a liquid supply system for a chemical reaction tank, which comprises a liquid storage tank and at least one reaction tank group, each reaction tank group is provided with at least one reaction tank, the liquid storage tank is communicated with the reaction tank through a liquid inlet pipe, and the reaction tank is communicated with the liquid storage tank through a liquid outlet pipe; a turbulent flow spray head extending into the reaction tank is mounted on the liquid inlet pipe; the liquid inlet pipe is communicated with the liquid storage tank through a circulating pump; the number of the reaction tank groups is two, the liquid outlet pipe connected with each reaction tank is communicated with a collecting pipe, and the collecting pipe is communicated with the interior of the liquid storage tank; the nickel plating device can solve the problem that the nickel plating efficiency of the solar silicon wafers is low due to the fact that the traditional nickel plating device for the solar silicon wafers is difficult to carry out nickel plating on a large number of solar silicon wafers at a time.

Description

Technical Field

[0001] The utility model relates to the technical field of solar wafers, and particularly relates to a chemical reaction tank liquid supply system. Background Art

[0002] Photovoltaic is short for solar photovoltaic power generation system. It is a new type of power generation system that uses the photovoltaic effect of solar cell semiconductor materials to directly convert solar radiation energy into electrical energy, and has two operation modes: independent operation and grid-connected operation. The photovoltaic power generation industrial chain from upstream to downstream mainly includes polysilicon, wafers, solar cells and solar modules.

[0003] When producing solar wafers, electroless nickel plating needs to be carried out on the surface of the wafers. Electroless nickel plating uses divalent nickel ions to react with a reducing agent in an oxidation-reduction reaction, so that nickel is deposited on the surface of the wafer to form a nickel layer. Electroless nickel plating requires the use of an electroless nickel plating tank. However, traditional solar wafer nickel plating equipment is difficult to nickel plate a relatively large number of solar wafers at one time, which results in low nickel plating efficiency of solar wafers and is difficult to meet production requirements. Summary of the Utility Model

[0004] In order to overcome the above disadvantages, the purpose of the utility model is to provide a chemical reaction tank liquid supply system.

[0005] In order to achieve the above purpose, the technical solutions adopted by the utility model include:

[0006] A liquid storage tank and at least one group of reaction tank groups, each group of the reaction tank groups has at least one reaction tank, the liquid storage tank is connected to the reaction tank through a liquid inlet pipe, and the reaction tank is connected to the liquid storage tank through a liquid outlet pipe;

[0007] Wherein, a turbulence spray head extending into the reaction tank is installed on the liquid inlet pipe; the liquid inlet pipe is connected to the liquid storage tank through a circulation pump.

[0008] In the preferred technical solution of the above chemical reaction tank liquid supply system, a heating pipe for preheating chemical liquid is arranged in the liquid storage tank.

[0009] In the preferred technical solution of the above chemical reaction tank liquid supply system, a flow equalizing plate is arranged in the reaction tank, and the flow equalizing plate is located directly above the turbulence spray head.

[0010] In the preferred technical solution of the above chemical reaction tank liquid supply system, a solenoid valve is arranged between the liquid inlet pipe and the turbulence spray head.

[0011] In the preferred technical solution of the above chemical reaction tank liquid supply system, a drain pipe is arranged at the bottom of the liquid storage tank, and a switch valve is arranged on the drain pipe.

[0012] In the preferred technical solution of the above chemical reaction tank liquid supply system, a diaphragm valve and a flow meter are arranged on each liquid inlet pipe communicating with the reaction tank.

[0013] In the preferred technical solution of the above chemical reaction tank liquid supply system, a liquid level sensor is arranged on the liquid storage tank.

[0014] In the preferred technical solution of the above chemical reaction tank liquid supply system, there are two groups of reaction tank groups, and the liquid outlet pipes connected to each reaction tank are all communicated with a manifold, and the manifold is communicated with the inside of the liquid storage tank.

[0015] The beneficial effect of the present utility model is that the liquid in the liquid storage tank is divided into multiple paths and transported to a plurality of reaction tanks through a circulation pump, and then the liquid outlet pipes installed on each reaction tank are gathered to the manifold and then refluxed into the liquid storage tank to realize the simultaneous liquid supply to a plurality of reaction tanks and ensure the reaction efficiency of solar wafers. Description of the Drawings

[0016] Figure 1 is the front view of the present utility model;

[0017] Figure 2 is Figure 1 the partial enlarged view of

[0018] Figure 3 is the front view of the present utility model;

[0019] Figure 4 is the right view of the present utility model;

[0020] Figure 5 is the connection relationship diagram of the reaction tank, the liquid inlet pipe and the liquid outlet pipe;

[0021] Figure 6 is the structural schematic diagram of the manifold;

[0022] Figure 7 is the internal structural schematic diagram of the liquid storage tank;

[0023] In the figure: liquid storage tank 1, reaction tank group 2, reaction tank 21, liquid inlet pipe 3, liquid outlet pipe 4, turbulence spray head 5, circulation pump 6, heating pipe 7, flow equalizing plate 8, solenoid valve 9, drain pipe 10, switch valve 11, diaphragm valve 12, flow meter 13, manifold 14. Detailed Embodiments

[0024] The preferred embodiments of the present utility model will be described below with reference to the accompanying drawings. Those skilled in the art should understand that these embodiments are only used to explain the technical principle of the present utility model and are not intended to limit the protection scope of the present utility model.

[0025] It should be noted that in the description of the present utility model, the terms "upper", "lower", "left", "right", "front", "rear", etc., which indicate directions or positional relationships, are based on the directions or positional relationships shown in the drawings. This is only for the convenience of description and does not indicate or imply that the device or component must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation to the present utility model. In addition, the terms "first" and "second" are only used for descriptive purposes and cannot be construed as indicating or implying relative importance.

[0026] In addition, it should also be noted that in the description of the present utility model, unless otherwise clearly specified and defined, the terms "set", "connected", "connected to" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection. For those skilled in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0027] As Figures 1 to 7 shown, the chemical reaction tank liquid supply system of the present utility model includes: a liquid storage tank 1 and at least one group of reaction tank groups 2. Each group of reaction tank groups 2 has at least one reaction tank 21. The liquid storage tank 1 is connected to the reaction tank 21 through a liquid inlet pipe 3, and the reaction tank 21 is connected to the liquid storage tank 1 through a liquid outlet pipe 4. Among them, a turbulence spray head 5 extending into the reaction tank 21 is installed on the liquid inlet pipe 3. The liquid inlet pipe 3 is connected to the liquid storage tank 1 through a circulation pump 6.

[0028] See Figure 1 , each group of chemical reaction tank groups 2 has at least one reaction tank 21. In a specific embodiment, each group of chemical reaction tank groups 2 can have three, four or five reaction tanks 21, and the number of each group of chemical reaction tank groups 2 is not limited.

[0029] See Figure 1 , Figure 2 , the liquid storage tank 1 is used to store chemical liquid medicine, and the reaction tank 21 is used to hold chemical liquid medicine so that the solar silicon wafer can carry out nickel plating reaction in the reaction tank 21. The lower side of the liquid storage tank 1 is connected to the water inlet of the circulation pump 6 through a pipeline. The outlet of the circulation pump 6 is configured with a shunt pipe having multiple connection ports, and each connection port of the shunt pipe is connected to a liquid inlet pipe 3, and the other end of each liquid inlet pipe 3 is correspondingly connected to a reaction tank 21.

[0030] See Figure 1 , Figure 4, one end of the liquid inlet pipe 3 close to the reaction tank 21 can be configured with a three-way pipe or a four-way pipe. One of the interfaces of the three-way pipe or the four-way pipe is used to connect the turbulence spray head 5, and the other interfaces of the three-way pipe or the four-way pipe are connected into the reaction tank 21. Through this kind of setting, it can ensure the satisfaction of the liquid inlet volume requirement in the reaction tank 21. At the same time, the turbulence spray head 5 is used to disturb the chemical liquid in the reaction tank 21, so as to accelerate the ion movement rate in the chemical liquid and improve the efficiency of nickel plating on the solar silicon wafer, which has practicability.

[0031] In one or more embodiments, a heating pipe 7 for preheating the chemical liquid is arranged in the liquid storage tank 1. See Figure 7 , the heating pipe 7 is in a spiral structure. The spiral heating pipe 7 can increase the contact area with the chemical liquid in the liquid storage tank 1, and further improve the heating efficiency of the chemical liquid, which has practicability. In a specific embodiment, two spiral heating pipes 7 are arranged in the liquid storage tank 1 to further improve the preheating efficiency of the chemical liquid.

[0032] In one or more embodiments, a flow equalizing plate 8 is arranged in the reaction tank 21, and the flow equalizing plate 8 is located directly above the turbulence spray head 5.

[0033] See Figure 5 , the flow equalizing plate 8 is adapted to the reaction tank 21, and the flow equalizing plate 8 is a perforated plate. When the chemical liquid is sprayed out by the turbulence spray head 5 directly below the flow equalizing plate 8 in the reaction tank 21, the flow rate of the chemical liquid in the reaction tank 21 will increase. After being stabilized by the flow equalizing plate 8, the chemical liquid above the flow equalizing plate 8 flows smoothly. Then, while the ion flow rate inside the chemical liquid increases, it can stably contact the solar silicon wafer in the reaction tank 21, ensuring the stability and consistency of nickel plating of the solar silicon wafer in the reaction tank 21.

[0034] In one or more embodiments, a solenoid valve 9 is arranged between the liquid inlet pipe 3 and the turbulence spray head 5. See Figure 5 , the solenoid valve 9 is used to control the liquid in the liquid inlet pipe 3 not to flow through the turbulence spray head 5 to ensure the chemical liquid in the reaction tank 21 is in a stable state. In addition, by controlling the liquid flow rate flowing out of the liquid inlet pipe 3 through the solenoid valve 9, the pressure of the chemical liquid sprayed out by the turbulence spray head 5 can be controlled to meet the use requirements in different situations, which has practicability.

[0035] In one or more embodiments, a drain pipe 10 is arranged at the bottom of the liquid storage tank 1, and a switch valve 11 is arranged on the drain pipe 10. See Figure 1 , when it is necessary to drain the chemical liquid inside the liquid storage tank 1, open the manual switch valve 11, and the chemical liquid inside the liquid storage tank 1 will be automatically drained. The structure is simple and the operation is convenient, which has practicability.

[0036] In one or more embodiments, a diaphragm valve 12 and a flowmeter 13 are arranged on each liquid inlet pipe 3 communicating with the reaction tank 21.

[0037] See Figure 1 , Figure 3 , the diaphragm valve 12 can cut off or control the flow of the chemical liquid medicine in the liquid inlet pipe 3; by arranging a diaphragm valve 12 and a flowmeter 13 on each liquid inlet pipe 3 communicating with the reaction tank 21, the flow of the chemical liquid medicine entering the reaction tank 21 can be controlled, and the refinement degree of the nickel plating reaction of the solar silicon wafer in each reaction tank 21 can be improved.

[0038] In one or more embodiments, a liquid level sensor is arranged on the liquid storage tank 1.

[0039] See Figure 1 , Figure 2 , a switch door is arranged on the top of the liquid storage tank 1. When the liquid level sensor detects that the liquid level of the chemical liquid medicine in the liquid storage tank 1 is lower than the threshold value, the inside of the liquid storage tank 1 can be dosed through the switch door to ensure the amount of the chemical liquid medicine introduced into each reaction tank 21.

[0040] In one or more embodiments, there are two groups of reaction tank groups 2, and the liquid outlet pipes 4 connected to each reaction tank 21 are all communicated with the manifold 14, and the manifold 14 is communicated with the inside of the liquid storage tank 1.

[0041] See Figure 1 , Figure 4 , there are two groups of reaction tank groups 2, namely the first reaction tank group 2 and the second reaction tank group 2. The reaction tanks 21 in the first reaction tank group 2 and the second reaction tank group 2 are connected to the liquid storage tank 1 in the same way. The liquid outlet pipes 4 communicated with the reaction tanks 21 in the first reaction tank group 2 and the second reaction tank group 2 all converge into the manifold 14, and then are connected to the liquid storage tank 1 through the manifold 14; through this setting, the number of the liquid outlet pipes 4 connected to the liquid storage tank 1 can be reduced, which is convenient for the layout and maintenance of the liquid outlet pipe 4 pipeline.

[0042] The above embodiments are only used to illustrate the technical concept and characteristics of the present invention, and the purpose is to enable those who are familiar with this technology to understand the content of the present invention and implement it. It cannot be used to limit the protection scope of the present invention. Any equivalent changes or modifications made according to the spirit of the present invention should be covered within the protection scope of the present invention.

Claims

1. A liquid supply system for a chemical reaction pool, characterized in that: include: A liquid storage tank and at least one group of reaction pools, each group of the reaction pools having at least one reaction pool, the liquid storage tank being connected to the reaction pools via a liquid inlet pipe, and the reaction pools being connected to the liquid storage tank via a liquid outlet pipe; Wherein, a turbulent nozzle extending into the reaction tank is installed on the liquid inlet pipe; and the liquid inlet pipe is connected to the liquid storage tank through a circulation pump.

2. The liquid supply system for a chemical reaction pool according to claim 1, characterized in that: The liquid storage tank is provided with a heating pipe for preheating the chemical liquid.

3. The liquid supply system for a chemical reaction pool according to claim 1, characterized in that: A flow balancing plate is arranged in the reaction pool, and the flow balancing plate is located directly above the flow-disturbing nozzle.

4. The liquid supply system for a chemical reaction pool according to claim 1, characterized in that: A solenoid valve is arranged between the liquid inlet pipe and the flow-disturbing nozzle.

5. The liquid supply system for a chemical reaction pool according to claim 1, characterized in that: A liquid discharge pipe is arranged at the bottom of the liquid storage tank, and a switch valve is arranged on the liquid discharge pipe.

6. The liquid supply system for a chemical reaction pool according to claim 1, characterized in that: Each liquid inlet pipe connected to the reaction tank is equipped with a diaphragm valve and a flow meter.

7. The liquid supply system for a chemical reaction pool according to claim 1, characterized in that: The liquid storage tank is provided with a liquid level sensor.

8. The liquid supply system for a chemical reaction pool according to any one of claims 1 to 7, characterized in that: The reaction pool groups include two groups, and the liquid outlet pipes connected to each reaction pool are communicated with a collecting pipe, and the collecting pipe is communicated with the interior of the liquid storage tank.

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