Porcelain dish band piece cleaning equipment

Abstract

The utility model relates to porcelain dish band piece cleaning equipment which comprises a feeding frame, a receiving frame, a cleaning mechanism and a transferring mechanical arm, and the transferring mechanical arm is used for transferring porcelain dishes among the feeding frame, the cleaning mechanism and the receiving frame. The cleaning mechanism comprises a positioning unit, a brushing unit and a flushing unit; the positioning unit comprises a supporting part supported on the bottom surface of the porcelain plate and a clamping part capable of clamping or loosening the porcelain plate in the radial direction of the porcelain plate; the brushing unit comprises an upper brush body, a lower brush body and a side brush body; the flushing unit comprises an upper nozzle and a lower nozzle. On one hand, the upper brush body, the lower brush body, the upper nozzle and the lower nozzle are matched to brush the surface of a porcelain dish and wash the surface of the porcelain dish with inclined fluid, the removal rate of impurities on the surface of the porcelain dish is greatly improved, and the cleaning effect is effectively improved; and on the other hand, the porcelain plate is in rolling contact with the bottom support and the radial clamping, cleaning dead angles can be effectively eliminated during rotation of the porcelain plate, and it is ensured that the surface of the porcelain plate is comprehensively cleaned.

Description

Technical Field

[0001] The utility model belongs to the technical field of semiconductor processing, and particularly relates to a ceramic disk with wafer cleaning device. Background Art

[0002] A wafer is a silicon wafer used in the fabrication of semiconductor chips and integrated circuits. Since its shape is circular, it is also called a wafer. By fabricating various circuit structures on the surface of the wafer, it can be made into an electronic component with specific electrical functions. In the production and processing process of wafers, it usually needs to go through process steps such as slicing, grinding, polishing, and cleaning. Currently, in the processes such as grinding and polishing, a ceramic disk is usually used as the carrier or substrate of the wafer, that is, the wafer is attached to the surface of the ceramic disk for processing operations. The ceramic disk has a high surface flatness and can provide a reference plane for the grinding and polishing of the wafer.

[0003] In the prior art, after attaching the wafer to the surface of the ceramic disk and performing the grinding and polishing processes, it is necessary to clean the ceramic disk to remove residues, impurities, etc. on the surfaces of the ceramic disk and the wafer. For example, a Chinese patent with the publication number CN213887259U discloses a ceramic disk cleaning mechanism, which includes a cleaning table, a cylindrical fixed table installed at the center of the cleaning table to support and drive the rotation of the ceramic disk, a manipulator installed on one side of the cleaning table, and a cleaning brush assembly. The manipulator includes a column and a swing arm. An adsorbent is installed on the cylindrical fixed table. A driving motor and a water spraying pipeline are arranged inside the column. The cleaning brush assembly includes an upper layer brush, a lower layer brush, and a vertical edge brush. The upper layer brush is connected to the swing arm. The upper layer brush includes a plurality of circular brush heads. A water spraying port is arranged in the middle of the circular brush head. The water spraying pipeline is connected to the water spraying port. The vertical edge brush is located at the circular edge of the ceramic disk on the cleaning table. A lower layer brush is arranged between the vertical edge brush and the cylindrical fixed table on the cleaning table. A buffer is arranged between the swing arm and the upper layer brush.

[0004] However, in the actual cleaning process of the ceramic disk with wafers, the prior art has the following defects:

[0005] 1. The water spraying port is placed inside the middle of the circular brush head, and it is impossible to form an effective flushing angle on the surface of the ceramic disk, which easily causes some impurities to remain on the surface of the ceramic disk, resulting in poor cleaning effect;

[0006] 2. During cleaning, there are cleaning dead corners at the position where the bottom surface of the ceramic disk is adsorbed on the fixed table, and the lower layer brush cannot brush this position, so it is impossible to achieve a comprehensive cleaning of the surface of the ceramic disk. Summary of the Utility Model

[0007] The technical problem to be solved by the utility model is to overcome the deficiencies of the prior art and provide an improved ceramic disk with wafer cleaning device.

[0008] To solve the above technical problems, the present utility model adopts the following technical solutions:

[0009] A porcelain plate tape cleaning device, which includes a feeding rack, a receiving rack, a cleaning mechanism, and a transfer manipulator. The transfer manipulator is used to transfer the porcelain plate between the feeding rack, the cleaning mechanism, and the receiving rack. The cleaning mechanism includes a positioning unit, a brushing unit, and a flushing unit. The positioning unit includes a supporting component that supports the bottom surface of the porcelain plate and a clamping component that can clamp or loosen the porcelain plate in the radial direction of the porcelain plate. The supporting component and the clamping component respectively form rolling contacts with the bottom surface and the side of the porcelain plate. The brushing unit includes an upper brush body, a lower brush body, and a side brush body respectively arranged above, below, and on the side of the porcelain plate. The flushing unit includes an upper spray head and a lower spray head respectively arranged above and below the porcelain plate. The upper spray head and the lower spray head respectively form flushing fluids that are inclined up and down. During the rotation of the porcelain plate, the brushing surfaces formed by the upper brush body, the lower brush body, and the side brush body, and the flushing surfaces formed by the upper spray head and the lower spray head cover the surface of the porcelain plate.

[0010] According to a specific implementation and preferred aspect of the present utility model, the supporting component includes a plurality of supporting rollers that rollingly support the lower surface of the porcelain plate, and the plurality of supporting rollers are annularly spaced around the center line of the porcelain plate. Here, the supporting stability of the porcelain plate is improved, and the structure is simple, which is convenient for installation and implementation.

[0011] According to another specific implementation and preferred aspect of the present utility model, the clamping component includes a plurality of clamping wheels that are annularly spaced around the circumference of the porcelain plate and a driving wheel that abuts against the edge of the porcelain plate and is used to drive the porcelain plate to rotate around its own center line, and each clamping wheel can be movably arranged along the radial direction of the porcelain plate.

[0012] According to another specific implementation and preferred aspect of the present utility model, both the upper and lower flushing fluids are two-fluid. Using two-fluid, that is, a mixture of liquid and gas, effectively improves the flushing effect.

[0013] According to another specific implementation and preferred aspect of the present utility model, in the orthographic projection on the horizontal plane, the upper and lower flushing fluids flow away from the center of the porcelain plate. Here, it is beneficial for the impurities flushed out to break away from the porcelain plate and reduce residues.

[0014] Preferably, in the orthographic projection on the horizontal plane, the upper spray head can move towards or away from the center of the porcelain plate.

[0015] Preferably, there are a plurality of lower spray heads, and they are arranged side by side at intervals along the radial direction of the porcelain plate from the center of the bottom of the porcelain plate to the outside. Considering that the fluid sprays from bottom to top and is likely to fall back under its own weight, therefore, a plurality of radially distributed lower spray heads are adopted to ensure that the flushing fluids sprayed by the plurality of lower spray heads can comprehensively cover the lower surface of the porcelain plate.

[0016] According to yet another specific implementation and preferred aspect of the present utility model, the cleaning mechanism further includes a cleaning tank body, wherein the positioning unit, the brushing unit, and the rinsing unit are all arranged inside the cleaning tank body, and a window that can be opened or closed is formed on one side of the cleaning tank body. When the window is opened, the transfer manipulator takes and places the porcelain plate into and out of the cleaning tank body through the window. Here, by using the cleaning tank body and the openable and closable window, during cleaning, the window can be closed to prevent the rinsing fluid from splashing and causing secondary contamination to the porcelain plates that have been cleaned externally.

[0017] According to yet another specific implementation and preferred aspect of the present utility model, the upper brushing body includes a rotating arm arranged on one side of the porcelain plate and capable of rotating in the vertical direction, and an upper brush plate arranged on the rotating arm. The upper spray head is fixed on the rotating arm, and as the rotating arm rotates, the upper brush plate and the upper spray head move synchronously towards or away from the center of the porcelain plate; and / or, the lower brushing body includes a lower brush plate fixed below the porcelain plate and on one side of the lower spray head.

[0018] According to yet another specific implementation and preferred aspect of the present utility model, the transfer manipulator includes a rotating seat rotating around the vertical direction, a linear guide rail arranged on the rotating seat, and a pick-and-place arm slidably arranged on the linear guide rail and used for taking and placing the porcelain plate. Here, the structure is simple and compact, facilitating installation and implementation.

[0019] Preferably, the linear guide rail includes a first guide rail and a second guide rail arranged side by side at intervals; the pick-and-place arm includes a first arm body and a second arm body slidably arranged corresponding to the first guide rail and the second guide rail respectively, wherein the pick-and-place end formed by the first arm body and the second arm body is arranged vertically aligned; and / or, the transfer manipulator further includes a lifting drive component for driving the rotating seat to move up and down. Here, when one pick-and-place end grabs the strip porcelain plate to be cleaned and moves it to the cleaning mechanism, the other can take out the strip porcelain plate that has been cleaned, thereby effectively improving the efficiency of loading and unloading.

[0020] Due to the implementation of the above technical solutions, the present utility model has the following advantages compared with the prior art:

[0021] In the prior art, the water spray nozzles are built into the middle of the circular brush head and cannot form an effective flushing angle for the surface of the porcelain plate, which easily causes some impurities to remain on the surface of the porcelain plate and results in poor cleaning effect. Moreover, during cleaning, there are cleaning dead corners at the position where the bottom surface of the ceramic plate is adsorbed on the fixed table, and the lower brush cannot brush this position, so it is impossible to achieve a comprehensive cleaning of the surface of the ceramic plate. However, in this application, the structure of the cleaning equipment for the porcelain plate with strip is designed as a whole, which ingeniously solves the deficiencies and defects of the prior art. After adopting this cleaning equipment, first, the loading manipulator takes the material from the feeding rack and loads it into the cleaning mechanism, so that the porcelain plate is supported from the bottom surface on the supporting component and is clamped radially by the clamping component. The supporting component and the clamping component form a rolling contact with the bottom surface and the side edge of the porcelain plate. Then, during cleaning, the upper brush body, the lower brush body and the side brush body comprehensively brush the upper surface, the lower surface and the side edge of the porcelain plate, and at the same time, the upper spray head and the lower spray head spray the flushing fluid obliquely up and down, and the flushing surfaces formed by the upper and lower flushing fluids cover the surface of the porcelain plate. Therefore, compared with the prior art, on the one hand, through the cooperation of the upper and lower brush bodies and the upper and lower spray heads, the surface of the porcelain plate is brushed and flushed with the inclined fluid, greatly improving the removal rate of impurities on the surface of the porcelain plate and effectively improving the cleaning effect. On the other hand, the porcelain plate has rolling contacts with both the bottom support and the radial clamping, and the cleaning dead corners can be effectively eliminated during the rotation of the porcelain plate, ensuring a comprehensive cleaning of the surface of the porcelain plate. Description of the Drawings

[0022] Figure 1 It is a three-dimensional structure schematic diagram of a cleaning equipment for a porcelain plate with strip in this embodiment;

[0023] Figure 2 is Figure 1 a three-dimensional structure schematic diagram (partially omitted) of the cleaning mechanism in;

[0024] Figure 3 is Figure 1 a top view schematic diagram of the cleaning mechanism in;

[0025] Figure 4 is Figure 1 a top view schematic diagram (omitting the porcelain plate) of the cleaning mechanism in;

[0026] Figure 5 is Figure 1 a three-dimensional structure schematic diagram of the loading manipulator in;

[0027] Among them: 1. Feeding rack;

[0028] 2. Unloading rack;

[0029] 3. Cleaning mechanism; 30. Positioning unit; 300. Support component; a. Support roller; 301. Clamping component; b0. Clamping wheel; b1. Driving wheel; 31. Brushing unit; 310. Upper brush body; c0. Rotating arm; c1. Upper brush disc; 311. Lower brush body; d. Lower brush disc; 312. Side brush body; 32. Flushing unit; 320. Upper spray head; 321. Lower spray head; 33. Cleaning tank body; 330. Window; e. Movable door;

[0030] 4. Transfer manipulator; 40. Rotating seat; 41. Linear guide rail; 411. First guide rail; 412. Second guide rail; 42. Pick-and-place arm; 421. First arm body; 422. Second arm body; 43. Lifting drive component; 430. Slide rail; 431. Slide block; 432. Driving part;

[0031] P. Porcelain plate. Detailed implementation manners

[0032] To make the above objects, features, and advantages of the present application more obvious and understandable, the following will describe the detailed implementation manners of the present application with reference to the accompanying drawings. Many specific details are set forth in the following description to fully understand the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present application. Therefore, the present application is not limited by the specific embodiments disclosed below.

[0033] In the description of the present application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present application.

[0034] In addition, the terms "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include at least one of such features. In the description of the present application, the meaning of "plural" is at least two, such as two, three, etc., unless otherwise specifically defined.

[0035] In this application, unless otherwise clearly specified or limited, terms such as "installed", "connected", "linked", "fixed", etc. shall be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the communication inside two components or the interaction relationship between two components, unless otherwise clearly limited. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0036] In this application, unless otherwise clearly specified or limited, the first feature being "on" or "under" the second feature can be that the first and second features are in direct contact, or the first and second features are indirectly in contact through an intermediate medium. Moreover, the first feature being "above", "over" and "on top of" the second feature can be that the first feature is directly above or obliquely above the second feature, or merely indicates that the first feature has a higher horizontal height than the second feature. The first feature being "under", "beneath" and "underneath" the second feature can be that the first feature is directly below or obliquely below the second feature, or merely indicates that the first feature has a lower horizontal height than the second feature. It should be noted that when an element is referred to as "fixed to" or "disposed on" another element, it can be directly on the other element or there can also be an intermediate element. When an element is considered to be "connected" to another element, it can be directly connected to the other element or there may be an intermediate element at the same time. The terms "vertical", "horizontal", "up", "down", "left", "right" and similar expressions used herein are only for the purpose of illustration and do not represent the only implementation.

[0037] As Figures 1 to 5 shown, a cleaning device for a porcelain plate with a strip in this embodiment includes a feeding rack 1, a receiving rack 2, a cleaning mechanism 3 and a transfer manipulator 4.

[0038] Specifically, the feeding rack 1 and the receiving rack 2 can be porcelain plate feeding racks and porcelain plate receiving racks with any conventional structure, and the strip porcelain plates P to be cleaned and the porcelain plates P that have been cleaned are stacked on the feeding rack 1 and the receiving rack 2 respectively.

[0039] In this example, the cleaning mechanism 3 includes a positioning unit 30, a brushing unit 31, and a flushing unit 32. The positioning unit 30 includes a supporting member 300 that supports the bottom surface of the porcelain plate P and a clamping member 301 that can clamp or loosen the porcelain plate in the radial direction of the porcelain plate P. The supporting member 300 and the clamping member 301 respectively form rolling contacts with the bottom surface and the side of the porcelain plate P; the brushing unit 31 includes an upper brush body 310, a lower brush body 311, and a side brush body 312 that are respectively arranged above, below, and on the side of the porcelain plate P; the flushing unit 32 includes an upper spray head 320 and a lower spray head 321 that are respectively arranged above and below the porcelain plate P. The upper spray head 320 and the lower spray head 321 respectively form flushing fluids that are inclined up and down. During the rotation of the porcelain plate P, the brushing surfaces formed by the upper brush body 310, the lower brush body 311, and the side brush body 312, and the flushing surfaces formed by the upper spray head 320 and the lower spray head 321 cover the surface of the porcelain plate.

[0040] In some specific embodiments, the supporting member 300 includes three supporting rollers a that rollingly support the lower surface of the porcelain plate P, and the three supporting rollers a are evenly spaced in a ring around the center line of the porcelain plate P; the clamping member 301 includes three clamping wheels b0 that are evenly spaced in a ring around the circumference of the porcelain plate P and a driving wheel b1 that abuts against the edge of the porcelain plate P and is used to drive the porcelain plate P to rotate around its own center line. Each clamping wheel b0 can be movably arranged along the radial direction of the porcelain plate P under the drive of a conventional air cylinder; the driving wheel b1 is driven by a motor to rotate around the vertical direction, and the friction between the driving wheel b1 and the edge of the porcelain plate P is used to drive the porcelain plate P to rotate around its own center line.

[0041] The upper brush body 310 includes a rotating arm c0 that is arranged on one side of the porcelain plate P and can rotate in the vertical direction and an upper brush disc c1 that is arranged on the rotating arm c0. As the rotating arm c0 rotates, the upper brush disc c1 and the upper spray head 320 move synchronously in the direction of approaching or departing from the center of the porcelain plate; the lower brush body 311 includes a lower brush disc d that is fixed below the porcelain plate P and on one side of the lower spray head 321, and multiple bristles extending vertically are laid flat on the upper surface of the lower brush disc d; the side brush body 312 is in a column shape, and multiple bristles extending horizontally are distributed on the circumference of the column. The upper brush disc c1, the lower brush disc d, and the side brush body 312 are made of PVA material brushes, and the rotating direction is opposite to the rotating direction of the porcelain plate P.

[0042] Both the upper spray head 320 and the lower spray head 321 are fan-shaped spray heads, and the flushing fluid sprayed by the upper spray head 320 and the lower spray head 321 is a two-fluid, that is, a mixed fluid of liquid and gas; in the orthographic projection on the horizontal plane, the upper and lower flushing fluids flow away from the center of the porcelain plate P; the upper spray head 320 is fixed on the rotating arm c0, and in the orthographic projection on the horizontal plane, the upper brush plate c1 and the upper spray head 320 move synchronously towards or away from the center of the porcelain plate P to adjust the position of the flushing area formed by the upper spray head 320; there are multiple lower spray heads 321, and they are arranged side by side at intervals along the radial direction of the bottom of the porcelain plate P from the center outwards. Considering that the fluid sprays from bottom to top and is likely to fall back under its own weight, therefore, multiple radially distributed lower spray heads are used to ensure that the flushing fluids sprayed by the multiple lower spray heads can fully cover the lower surface of the porcelain plate.

[0043] To further facilitate implementation, the cleaning mechanism 3 further includes a cleaning tank body 33 that is open at the top, wherein the positioning unit 30, the brushing unit 31, and the flushing unit 32 are all arranged in the cleaning tank body, and a window 330 that can be opened or closed is formed on one side of the cleaning tank body 33. When the window 330 is opened, the transfer manipulator 4 takes and places the porcelain plate into or out of the cleaning tank body 33 through the window 330; during normal cleaning, the window 330 is kept closed. In some specific embodiments, a movable door e that is movably arranged up and down is provided at the window 330 to open or close the window 330.

[0044] In this example, the transfer manipulator 4 is used to transfer the porcelain plate P between the feeding rack 1, the cleaning mechanism 3, and the receiving rack 2.

[0045] In some specific embodiments, the transfer manipulator 4 includes a rotating seat 40 that rotates around the vertical direction, a linear guide rail 41 arranged on the rotating seat 40, a picking and placing arm 42 that is slidably arranged on the linear guide rail 41 and is used to pick and place the porcelain plate P, and a lifting drive component 43 that is used to drive the rotating seat 40 to move up and down. The linear guide rail 41 includes a first guide rail 411 and a second guide rail 412 that are arranged side by side at intervals; the picking and placing arm 42 includes a first arm body 421 and a second arm body 422 that are slidably arranged corresponding to the first guide rail 411 and the second guide rail 412 respectively, wherein the picking and placing ends formed by the first arm body 421 and the second arm body 422 are arranged vertically aligned, and suction cups are respectively arranged on the two picking and placing ends; the lifting drive component 43 includes a vertically extending slide rail 430, a slide seat 431 slidably connected to the slide rail 430, and a driving member 432 that is used to drive the slide seat 431 to move up and down along the slide rail 430, wherein the rotating seat 40 is fixedly connected to the slide seat 431. Here, when one picking and placing end grabs the to-be-cleaned wafer porcelain plate and moves it to the cleaning mechanism, the other can take out the wafer porcelain plate that has completed cleaning, thereby effectively improving the efficiency of loading and unloading.

[0046] In summary, after adopting this cleaning device, first, the transfer manipulator picks up the material from the feeding rack and transfers it into the cleaning mechanism, so that the porcelain plate is supported on the supporting component from the bottom surface, and is clamped radially by the clamping component. The supporting component and the clamping component form rolling contacts with the bottom surface and the side of the porcelain plate. Then, during cleaning, the upper brush body, the lower brush body and the side brush body comprehensively brush the upper surface, the lower surface and the side of the porcelain plate, and at the same time, the upper spray head and the lower spray head spray the flushing fluid that is inclined up and down, and the flushing surfaces formed by the upper and lower flushing fluids cover the surface of the porcelain plate. Therefore, compared with the prior art, on the one hand, through the cooperation of the upper and lower brush bodies and the upper and lower spray heads, the surface of the porcelain plate is brushed and flushed with the inclined fluid, greatly improving the removal rate of impurities on the surface of the porcelain plate and effectively improving the cleaning effect; on the other hand, the rolling contacts are adopted for both the bottom support and the radial clamping of the porcelain plate, and the cleaning dead corners can be effectively eliminated during the rotation of the porcelain plate, ensuring that the surface of the porcelain plate is comprehensively cleaned; on the third hand, the cleaning tank body is adopted, and the window that can be opened and closed is used. During cleaning, the window can be closed to prevent the flushing fluid from splashing and causing secondary pollution to the porcelain plates that have been cleaned externally; on the fourth hand, when a pick-and-place end grabs the strip porcelain plate to be cleaned and moves it to the cleaning mechanism, the other end can take out the strip porcelain plate that has been cleaned, thus effectively improving the efficiency of loading and unloading.

[0047] The above has made a detailed description of the present invention, aiming to enable those skilled in this field to understand the content of the present invention and implement it. However, the protection scope of the present invention cannot be limited thereby. Any equivalent changes or modifications made according to the spirit and essence of the present invention should be covered within the protection scope of the present invention.

Claims

1. A porcelain plate strip cleaning device, characterized in that: It includes a feeding rack, a receiving rack, a cleaning mechanism and a transfer robot, wherein the transfer robot is used to transfer the porcelain plate between the feeding rack, the cleaning mechanism and the receiving rack; the cleaning mechanism includes a positioning unit, a brushing unit and a flushing unit, the positioning unit includes a supporting component supported on the bottom surface of the porcelain plate, and a clamping component capable of clamping or loosening the porcelain plate in the radial direction of the porcelain plate, wherein the supporting component and the clamping component respectively form rolling contact with the bottom surface and the side edge of the porcelain plate; the brushing unit includes an upper brush body, a lower brush body and a side brush body respectively arranged above, below and on the side of the porcelain plate; the flushing unit includes an upper nozzle and a lower nozzle respectively arranged above and below the porcelain plate, wherein the upper nozzle and the lower nozzle respectively form a flushing fluid arranged obliquely up and down, and during the rotation of the porcelain plate, the brushing surface formed by the upper brush body, the lower brush body and the side brush body and the flushing surface formed by the upper nozzle and the lower nozzle cover the surface of the porcelain plate.

2. The ceramic plate strip cleaning device according to claim 1, characterized in that: The supporting component includes a plurality of supporting rollers which are rollingly supported on the lower surface of the porcelain plate, wherein the plurality of supporting rollers are distributed in an annular manner around the center line of the porcelain plate.

3. The ceramic plate strip cleaning device according to claim 1, characterized in that: The clamping component includes a plurality of clamping wheels distributed in an annular manner around the circumference of the porcelain plate, and a driving wheel that contacts the edge of the porcelain plate and is used to drive the porcelain plate to rotate around its own center line, wherein each of the clamping wheels can be moved radially along the porcelain plate.

4. The ceramic plate strip cleaning device according to claim 1, characterized in that: The flushing fluids described above and below are both two-fluids.

5. The ceramic plate strip cleaning device according to claim 1, characterized in that: In the orthographic projection on the horizontal plane, the flushing fluid flows upward and downward away from the center of the porcelain disk.

6. The porcelain plate strip cleaning device according to claim 1 or 5, characterized in that: In the orthographic projection on the horizontal plane, the upper nozzle can move toward or away from the center of the porcelain plate; and / or, there are multiple lower nozzles, which are spaced side by side from the center of the bottom of the porcelain plate along the radial direction of the porcelain plate.

7. The ceramic plate strip cleaning device according to claim 1, characterized in that: The cleaning mechanism also includes a cleaning tank body, wherein the positioning unit, the scrubbing unit and the flushing unit are all arranged in the cleaning tank body, and a window that can be opened or closed is formed on one side of the cleaning tank body. When the window is opened, the transfer robot takes and places the porcelain plate into the cleaning tank body through the window.

8. The ceramic plate strip cleaning device according to claim 1, characterized in that: The upper brush body includes a rotating arm which is arranged on one side of the porcelain plate and can rotate in a vertical direction, and an upper brush plate which is arranged on the rotating arm. The upper nozzle is fixed on the rotating arm, and as the rotating arm rotates, the upper brush plate and the upper nozzle move synchronously toward or away from the center direction of the porcelain plate; and / or, the lower brush body includes a lower brush plate which is fixed under the porcelain plate and located on one side of the lower nozzle.

9. The ceramic plate strip cleaning device according to claim 1, characterized in that: The transfer robot comprises a rotating seat rotating around a vertical direction, a linear guide rail arranged on the rotating seat, and a pick-and-place arm slidably arranged on the linear guide rail and used for picking up and placing the porcelain plate.

10. The ceramic plate strip cleaning device according to claim 9, characterized in that: The linear guide includes a first guide rail and a second guide rail arranged side by side and spaced apart; the pick-and-place arm includes a first arm body and a second arm body correspondingly slidably arranged on the first guide rail and the second guide rail, wherein the pick-and-place end portions formed by the first arm body and the second arm body are aligned up and down; and / or the transfer robot also includes a lifting drive component for driving the rotating seat to move up and down.

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