Chemical reaction tank for etching

By designing an alternately moving workpiece etching basket in the chemical reaction tank, the problem of product adhesion during the etching process is solved, and the integrity of etching and liquid recovery are achieved.

CN223003032UActive Publication Date: 2025-06-20SICHUAN SIYING INNOVATION TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202421739533.7
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-07-23
Publication Date
2025-06-20
Estimated Expiration
2034-07-23

AI Technical Summary

Technical Problem

During the etching process, when the etching liquid comes into contact with the workpiece, the generated product may be attached to the etching position, resulting in incomplete etching.

Method used

A chemical reaction cell is designed, including a reaction cell body, an etching liquid tank and a vertical moving assembly. Through the alternating meshing relationship between the second driving motor driving the sector gear and the sliding frame, the workpiece etching basket alternates between left and right in the etching liquid tank, disturbing the etching liquid, so that the product enters the liquid without adhering.

Benefits of technology

It effectively prevents the product from adhering to the etching position, ensures the integrity and quality of the etching, and maximizes the recycling of etching liquid.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a chemical reaction tank for etching, relates to the related technical field of etching, and aims to solve the problems that in the prior art, etching liquid needs to be in contact with the position, needing to be etched, of a workpiece during etching, and when etching continues, products can be attached to the etching position, so that etching of the etching position is incomplete. A vertical moving assembly is arranged at the upper end of the rear end of the reaction tank main body; the vertical moving assembly comprises a transverse supporting plate, a second driving motor is installed at the lower end of the transverse supporting plate, a sector gear is installed at the upper end of the transverse supporting plate along the output shaft end of the second driving motor, and a sliding frame is arranged at the upper end of the transverse supporting plate along the outer portion of the sector gear. The front end and the rear end of the interior of the sliding frame are each provided with an inner fixed tooth part, and the two inner fixed tooth parts are alternately meshed with a sector gear. The workpiece etching basket comprises an etching basket body, and an etching groove is formed in the etching basket body.
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Description

Technical Field

[0001] The utility model relates to the technical field of etching, and specifically relates to a chemical reaction tank for etching. Background Art

[0002] Etching is a technology that removes materials through chemical reactions or physical impacts. In the aviation, machinery, and chemical industries, etching technology is widely used in the processing of weight-reducing instrument panels, nameplates, and thin workpieces that are difficult to process by traditional processing methods.

[0003] Etching technology can be divided into wet etching and dry etching. In wet etching, a chemical solution is used to achieve the purpose of etching through a chemical reaction. Dry etching is usually a plasma etching. The etching effect in plasma etching may be the physical effect of ions in the plasma hitting the chip surface, or it may be the chemical reaction between active free radicals in the plasma and atoms on the chip surface, or even a combined effect of the two.

[0004] When wet etching is carried out, the reactants in the solution first diffuse through the stagnant boundary layer to reach the surface of the chip, and then a chemical reaction occurs and various products are generated. The products of the etching chemical reaction are liquid-phase or gas-phase products, and these products diffuse through the boundary layer and dissolve into the main solution. In terms of the wet etching effect, for a specific material to be etched, an etchant that can etch quickly and effectively and does not etch other materials can usually be found. Therefore, wet etching usually has a relatively high selectivity for different materials.

[0005] For example, the Chinese authorized patent with the publication number CN117355043A (a PCB circuit board etching processing device) includes a printing etching tank, a circuit board conveying table, and a printed circuit board. The top of the printing etching tank is provided with a lifting and closing mechanism, and the top of the printing etching tank is provided with an etching control mechanism. The lifting and closing mechanism includes an electric lifting rod arranged at the top of the printing etching tank. The bottom of the electric lifting rod is provided with a lifting and closing cover that is slidably connected to the inner wall of the printing etching tank. The bottom of the lifting and closing cover is provided with a circuit board placing table. When etching the printed circuit board in the present invention, the complete etching time is obtained by the time when the detection copper-clad sheet with the same copper-clad thickness as the circuit boards in the same batch is completely etched, and an etching completion signal is sent to the electric lifting rod based on this, and the printed circuit board is lifted upward to not contact the etching solution, ending the etching process, thereby accurately controlling the etching time and improving the qualification rate of the PCB circuit board after etching.

[0006] Although the above-mentioned prior art has the function of controlling the etching time, when etching, the etching solution needs to contact the position on the workpiece that needs to be etched. When etching continues to occur, the products may adhere to the etching position, resulting in incomplete etching of the etching position. Summary of the Utility Model

[0007] The purpose of the present utility model is to provide a chemical reaction tank for etching, so as to solve the problem that in the above-mentioned background technology, when etching, the etching solution needs to be in contact with the position of the workpiece to be etched. When etching continues to occur, the reaction products may adhere to the etching position, resulting in incomplete etching of the etching position.

[0008] To achieve the above purpose, the present utility model provides the following technical solution: A chemical reaction tank for etching, including a reaction tank main body, the inside of the reaction tank main body is set as an etching solution tank, and a vertical movement component is arranged at the upper end of the rear end of the reaction tank main body;

[0009] The vertical movement component includes a horizontal support plate, a second driving motor is installed at the lower end of the horizontal support plate, a sector gear is installed at the upper end of the horizontal support plate along the output shaft end of the second driving motor, a sliding frame is arranged at the upper end of the horizontal support plate along the outside of the sector gear, internal fixed tooth parts are arranged at the front and rear ends inside the sliding frame, and the two internal fixed tooth parts alternately mesh with the sector gear;

[0010] A workpiece etching basket is connected to the vertical movement component, the workpiece etching basket includes an etching basket main body, the etching basket main body is located in the etching solution tank, and an etching tank is arranged inside the etching basket main body.

[0011] Preferably, a horizontal fixing plate is fixed at the lower end of the middle of the rear end of the reaction tank main body, a first driving motor is installed at the lower end of the horizontal fixing plate, a vertical threaded rod is installed at the upper end of the horizontal fixing plate along the output shaft end of the first driving motor, and vertical limiting rods are fixed at both sides of the upper end of the horizontal fixing plate along the rear end of the reaction tank main body.

[0012] Preferably, a fitting vertical plate is arranged at the front end of the lower end of the horizontal support plate, vertical fixing rods are arranged at both sides of the fitting vertical plate, a limiting sliding groove is opened on the front end face of the vertical fixing rod, the vertical fixing rod corresponds to the vertical limiting rod and slides along the vertical limiting rod through the limiting sliding groove, and an outer sleeve is fixed at the lower end of the horizontal support plate, and the outer sleeve is located outside the upper end of the vertical threaded rod and is threadedly connected with the vertical threaded rod.

[0013] Preferably, horizontal limiting rods are fixed at the front and rear ends of the upper end of the horizontal support plate, and limiting end blocks are fixed at both sides of the horizontal limiting rod.

[0014] Preferably, horizontal sliding grooves are opened at the front and rear ends of the lower end face of the sliding frame, and the sliding frame slides along the horizontal limiting rod through the horizontal sliding groove.

[0015] Preferably, both sides of the upper end of the sliding frame are connected with fixed C-shaped plates. In the middle of the upper ends of the two fixed C-shaped plates, a connecting cross plate is welded and fixed. The upper end of the connecting cross plate is fixed with an L-shaped connecting plate, and the other end of the L-shaped connecting plate extends into the etching solution tank and is connected with the etching basket main body.

[0016] Preferably, a liquid inlet pipe is installed at the upper end of one side of the reaction tank main body, and a liquid discharge pipe is installed at the lower end of one side of the reaction tank main body. The inner ends of the liquid inlet pipe and the liquid discharge pipe are both communicated with the etching solution tank.

[0017] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0018] 1. In this utility model, during etching, the second driving motor drives the sector gear to rotate. Due to the alternating meshing relationship between the sector gear and the two inner fixed tooth parts in the sliding frame, the sliding frame is driven to slide left and right alternately. The workpiece etching basket moves left and right alternately in the etching solution tank, disturbing the internal etching solution so that the products generated during etching enter the etching solution and will not adhere to the etching position. This solves the problem that during etching, the etching solution needs to contact the position of the workpiece to be etched, and when etching continues to occur, the products may adhere to the etching position, resulting in incomplete etching of the etching position.

[0019] 2. In this utility model, after etching is completed, the second driving motor drives the sector gear to rotate. Due to the alternating meshing relationship between the sector gear and the two inner fixed tooth parts in the sliding frame, the sliding frame is driven to slide left and right alternately. The etching solution on the surface of the workpiece in the workpiece etching basket drips under the disturbing action and re-dissolves into the etching solution, reducing the adhesion of the etching solution on the workpiece surface, improving the quality of the workpiece, and being able to recover the etching solution to the greatest extent.

[0020] 3. In this utility model, after etching is completed, the first driving motor drives the vertical threaded rod to rotate. Due to the threaded connection relationship between the vertical threaded rod and the outer sleeve, the vertical moving assembly moves upward along the vertical limiting rod, and the etching basket main body on the workpiece etching basket gradually moves away from the liquid level position of the etching solution tank, facilitating the removal of the workpiece and assisting in draining the etching solution on the workpiece surface. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the overall structure of the main perspective of a chemical reaction tank for etching of the present utility model;

[0022] Figure 2 It is a schematic diagram of the overall structure of the rear perspective of a chemical reaction tank for etching of the present utility model;

[0023] Figure 3 It is a rear view of a chemical reaction tank for etching of the present utility model;

[0024] Figure 4Side view of a chemical reaction tank for etching of the present utility model;

[0025] Figure 5 Schematic structural diagram of the reaction tank body of a chemical reaction tank for etching of the present utility model;

[0026] Figure 6 Schematic structural diagram of the vertical moving assembly of a chemical reaction tank for etching of the present utility model after removing the workpiece etching basket;

[0027] Figure 7 Schematic structural diagram of the workpiece etching basket of a chemical reaction tank for etching of the present utility model.

[0028] In the figure: 1, reaction tank body; 2, etching solution tank; 3, inlet pipe; 4, drain pipe; 5, horizontal fixing plate; 6, first driving motor; 7, vertical threaded rod; 8, vertical limiting rod; 9, vertical moving assembly; 10, fitting vertical plate; 11, vertical fixing rod; 12, limiting chute; 13, outer sleeve; 14, horizontal support plate; 15, horizontal limiting rod; 16, limiting end block; 17, second driving motor; 18, sector gear; 19, sliding frame; 20, horizontal chute; 21, inner fixed tooth part; 22, workpiece etching basket; 23, fixed C-shaped plate; 24, connecting cross plate; 25, L-shaped connecting plate; 26, etching basket body; 27, etching tank. Detailed implementation manners

[0029] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments.

[0030] Please refer to Figure 1-7 , an embodiment provided by the present utility model: A chemical reaction tank for etching, including a reaction tank body 1, the inside of the reaction tank body 1 is set as an etching solution tank 2, an inlet pipe 3 is installed at the upper end of one side of the reaction tank body 1, a drain pipe 4 is installed at the lower end of one side of the reaction tank body 1, and the inner ends of the inlet pipe 3 and the drain pipe 4 are both communicated with the etching solution tank 2.

[0031] A vertical movement component 9 is provided at the upper end of the rear end of the reaction tank main body 1; the vertical movement component 9 includes a horizontal support plate 14, horizontal limit rods 15 are fixed at the front and rear ends of the upper end of the horizontal support plate 14, and limit end blocks 16 are fixed on both sides of the horizontal limit rods 15; a second drive motor 17 is installed at the lower end of the horizontal support plate 14, a sector gear 18 is installed along the output shaft end of the second drive motor 17 at the upper end of the horizontal support plate 14, a sliding frame 19 is arranged along the outside of the sector gear 18 at the upper end of the horizontal support plate 14, horizontal chutes 20 are opened at the front and rear ends of the lower end surface of the sliding frame 19, and the sliding frame 19 slides along the horizontal limit rods 15 through the horizontal chutes 20. Inner fixed tooth parts 21 are arranged at the front and rear ends inside the sliding frame 19, and the two inner fixed tooth parts 21 alternately engage with the sector gear 18. The second drive motor 17 drives the sector gear 18 to rotate, and drives the sliding frame 19 to slide left and right alternately through the alternating engagement relationship between the sector gear 18 and the two inner fixed tooth parts 21 in the sliding frame 19; the limit end blocks 16 play a role in limiting the left and right sliding. However, due to the meshing relationship between the inner fixed tooth part 21 on the sliding frame 19 and the sector gear 18, the moving distance of the sliding frame 19 is determined by the number of teeth of the inner fixed tooth part 21, and the limit end blocks 16 are basically not required for final limiting. The limit end blocks 16 play an insurance role.

[0032] A workpiece etching basket 22 is connected to the vertical movement component 9. The workpiece etching basket 22 includes an etching basket main body 26. A number of holes are provided on the etching basket main body 26 to allow the etching solution to enter. And different forms of workpiece fixing structures can be arranged in the etching basket main body 26 according to the type of workpiece, so that the workpiece remains stable during movement during the etching process. The etching basket main body 26 is located in the etching solution tank 2, and an etching tank 27 is arranged inside the etching basket main body 26. Fixed C-shaped plates 23 are connected to both sides of the upper end of the sliding frame 19 to increase the connection height of the whole structure and avoid affecting the rotation of other structures; a connecting cross plate 24 is welded and fixed in the middle of the upper ends of the two fixed C-shaped plates 23, a connecting L-shaped plate 25 is fixed at the upper end of the connecting cross plate 24, and the other end of the L-shaped connecting plate 25 extends into the etching solution tank 2 and is connected to the etching basket main body 26.

[0033] Furthermore, a horizontal fixing plate 5 is fixedly installed at the lower end of the middle part of the rear end of the reaction tank main body 1. A first driving motor 6 is installed at the lower end of the horizontal fixing plate 5. A vertical threaded rod 7 is installed at the upper end of the horizontal fixing plate 5 along the output shaft end of the first driving motor 6. Vertical limiting rods 8 are fixedly installed on both sides of the upper end of the horizontal fixing plate 5 at the rear end of the reaction tank main body 1. At the front end of the lower end of the horizontal support plate 14, a fitting vertical plate 10 is provided. Vertical fixing rods 11 are provided at both sides of the fitting vertical plate 10. A limiting chute 12 is opened on the front end face of the vertical fixing rod 11. The vertical fixing rod 11 corresponds to the vertical limiting rod 8 and slides along the vertical limiting rod 8 through the limiting chute 12. An outer sleeve 13 is fixedly installed at the lower end of the horizontal support plate 14. The outer sleeve 13 is located at the upper part outside the vertical threaded rod 7 and is threadedly connected to the vertical threaded rod 7. The first driving motor 6 drives the vertical threaded rod 7 to rotate. Due to the threaded connection relationship between the vertical threaded rod 7 and the outer sleeve 13, the vertical moving assembly 9 moves upward along the vertical limiting rod 8, playing a role in vertical driving movement.

[0034] Working principle: Inject the etching solution into the etching solution tank 2 through the liquid inlet pipe 3. Then, place the workpiece to be etched in the etching tank 27 of the etching basket main body 26. The etching solution contacts the etching position of the workpiece for etching.

[0035] During etching, the second driving motor 17 drives the sector gear 18 to rotate. Due to the alternating meshing relationship between the sector gear 18 and the two internal fixed tooth parts 21 in the sliding frame 19, the sliding frame 19 slides left and right alternately. Due to the connection relationship between the sliding frame 19 and the etching basket main body 26 through the fixed C-shaped plate 23, the connecting cross plate 24, and the L-shaped connecting plate 25, the workpiece etching basket 22 moves left and right alternately in the etching solution tank 2, disturbing the internal etching solution so that the products generated during etching enter the etching solution and do not adhere to the etching position.

[0036] After etching is completed, the first driving motor 6 drives the vertical threaded rod 7 to rotate. Due to the threaded connection relationship between the vertical threaded rod 7 and the outer sleeve 13, the vertical moving assembly 9 moves upward along the vertical limiting rod 8, and the etching basket main body 26 on the workpiece etching basket 22 gradually moves away from the liquid level position of the etching solution tank 2. The second driving motor 17 drives the sector gear 18 to rotate. Due to the alternating meshing relationship between the sector gear 18 and the two internal fixed tooth parts 21 in the sliding frame 19, the sliding frame 19 slides left and right alternately, and the etching solution on the surface of the workpiece in the workpiece etching basket 22 drips and redissolves into the etching solution under the disturbance effect.

[0037] For those skilled in the art, it is obvious that the present utility model is not limited to the details of the above-described exemplary embodiments, and the present utility model can be implemented in other specific forms without departing from the spirit or basic characteristics of the present utility model. Therefore, from any point of view, the embodiments should be regarded as exemplary and non-limiting. The scope of the present utility model is defined by the appended claims rather than the above description. Therefore, all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be embraced within the present utility model. Any reference signs in the claims should not be construed as limiting the claims involved.

Claims

1. A chemical reaction pool for etching, comprising a reaction pool body (1), wherein the reaction pool body (1) is provided with an etching liquid tank (2), characterized in that: A vertical moving component (9) is provided at the upper end of the rear end of the reaction tank body (1); The vertical moving assembly (9) comprises a transverse support plate (14), a second drive motor (17) is installed at the lower end of the transverse support plate (14), a sector gear (18) is installed at the upper end of the transverse support plate (14) along the output shaft end of the second drive motor (17), a sliding frame (19) is arranged at the upper end of the transverse support plate (14) along the outside of the sector gear (18), and the front and rear ends of the sliding frame (19) are both provided with internal fixed teeth (21), and the two internal fixed teeth (21) are alternately meshed with the sector gear (18); The vertical moving assembly (9) is connected to a workpiece etching basket (22), wherein the workpiece etching basket (22) comprises an etching basket body (26), the etching basket body (26) is located in the etching liquid tank (2), and an etching tank (27) is arranged in the etching basket body (26).

2. A chemical reaction pool for etching according to claim 1, characterized in that: A transverse fixing plate (5) is fixed to the lower end in the middle of the rear end of the reaction pool body (1), a first drive motor (6) is installed at the lower end of the transverse fixing plate (5), a vertical threaded rod (7) is installed at the upper end of the transverse fixing plate (5) along the output shaft end of the first drive motor (6), and vertical limit rods (8) are fixed to both sides of the upper end of the transverse fixing plate (5) at the rear end of the reaction pool body (1).

3. A chemical reaction pool for etching according to claim 2, characterized in that: The front end of the lower end of the horizontal support plate (14) is provided with a fitting vertical plate (10), and vertical fixing rods (11) are provided at both sides of the fitting vertical plate (10). The front end surface of the vertical fixing rod (11) is provided with a limiting slide groove (12). The vertical fixing rod (11) corresponds to the position of the vertical limiting rod (8) and slides along the vertical limiting rod (8) through the limiting slide groove (12). The lower end of the horizontal support plate (14) is fixed with an outer sleeve (13), which is located at the upper end of the outer part of the vertical threaded rod (7) and is connected to the vertical threaded rod (7) through threads.

4. A chemical reaction pool for etching according to claim 1, characterized in that: Transverse limiting rods (15) are fixed to the front and rear ends of the upper end of the transverse supporting plate (14), and limiting end blocks (16) are fixed to both sides of the transverse limiting rod (15).

5. A chemical reaction pool for etching according to claim 4, characterized in that: The front and rear ends of the lower end surface of the sliding frame (19) are provided with transverse sliding grooves (20), and the sliding frame (19) slides along the transverse limiting rod (15) through the transverse sliding grooves (20).

6. A chemical reaction pool for etching according to claim 1, characterized in that: Fixed C-shaped plates (23) are connected to both sides of the upper end of the sliding frame (19); a connecting transverse plate (24) is welded and fixed in the middle of the upper ends of the two fixed C-shaped plates (23); an L-shaped connecting plate (25) is fixed to the upper end of the connecting transverse plate (24); and the other end of the L-shaped connecting plate (25) extends into the interior of the etching liquid tank (2) and is connected to the etching basket body (26).

7. A chemical reaction pool for etching according to claim 1, characterized in that: A liquid inlet pipe (3) is installed at the upper end of one side of the reaction pool body (1), and a liquid discharge pipe (4) is installed at the lower end of one side of the reaction pool body (1); the inner ends of the liquid inlet pipe (3) and the liquid discharge pipe (4) are both connected to the etching liquid tank (2).

Citation Information

Patent Citations

  • PCB (Printed Circuit Board) etching processing device

    CN117355043A