Ion sputtering instrument for electron microscope sample preparation

Abstract

The utility model relates to the technical field of ion sputter coating, and discloses an ion sputter for electron microscope sample preparation, which comprises an ion sputter host, the top of the ion sputter host is rotatably provided with a rotating rack, the top of the rotating rack is provided with a gold spraying table inclined to a horizontal line, the gold spraying table is rotatably connected with the rotating rack, and the rotating rack is rotatably connected with the gold spraying table. Sample tables for bearing and fixing samples to be subjected to metal spraying are uniformly distributed at the top of the gold spraying table, and are rotationally connected with the gold spraying table. The gold spraying table inclined relative to the horizontal line is arranged at the top of the rotary table frame, the gold spraying table can rotate along the inclined surface of the gold spraying table, and the rotary table frame is also rotationally arranged, so that the ion beam can be uniformly irradiated to the surface of a sample, and the coating quality is improved; ion beams are prevented from intensively irradiating the same area on the surface of the sample for a long time, so that damage to the area is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of ion sputtering coating, in particular to an ion sputtering instrument for preparing electron microscope specimens. Background Technique

[0002] When preparing electron microscope specimens, in order to improve the conductivity and signal amplification effect of non-conductive samples, thereby improving the observation and analysis quality of the electron microscope, a very thin metal film needs to be sprayed on the surface of the sample, which requires the use of an ion sputtering instrument. The ion sputtering instrument uses high-energy ions to bombard the metal target, so that the sputtered atoms are deposited on the surface of the sample and form a uniform film.

[0003] When spraying gold through an ion sputtering instrument, if the gold spraying is uneven, it will cause uneven coating thickness, which will in turn affect the conductivity and observation effect of the sample. Moreover, gold spraying is not limited to the top surface of the specimen, and the side surface also needs to be evenly sprayed with gold to ensure the same conductivity on the entire surface of the specimen. Most ion sputtering instruments do not have the ability to spray gold on the front and side surfaces of the specimen simultaneously. To solve the above problems, we propose an ion sputtering instrument for preparing electron microscope specimens. Content of the Utility Model

[0004] The purpose of the utility model is to provide an ion sputtering instrument for preparing electron microscope specimens that can spray gold comprehensively and evenly, so as to solve the problems raised in the above background technique.

[0005] To achieve the above purpose, the utility model provides the following technical solution: an ion sputtering instrument for preparing electron microscope specimens, including an ion sputtering instrument host. A rotating table frame is rotatably arranged on the top of the ion sputtering instrument host. A gold spraying table inclined to the horizontal line is arranged on the top of the rotating table frame. The gold spraying table is rotatably connected to the rotating table frame. Sample tables for carrying and fixing samples to be sprayed with gold are evenly distributed on the top of the gold spraying table. The sample tables are all rotatably connected to the gold spraying table.

[0006] According to the above technical solution, a shaft rod rotatably connected to the rotating table frame is fixedly connected to the bottom of the gold spraying table. A first gear is fixedly connected to the outer wall of the shaft rod. A rotating optical axis is arranged on the rotating table frame. An inclined gear is fixedly connected to the upper end of the optical axis. The inclined gear meshes with the first gear.

[0007] According to the above technical solution, a first toothed ring coaxial with the rotating table frame is fixedly connected to the inner wall of the upper end of the ion sputtering instrument host. The optical axis is arranged away from the rotation axis of the rotating table frame. A second gear meshing with the first toothed ring is fixedly sleeved on the outer wall of the optical axis.

[0008] According to the above technical solution, an avoidance hole is arranged on the top of the ion sputtering instrument host. The diameter of the avoidance hole is larger than the diameter of the revolution trajectory of the optical axis.

[0009] According to the above technical solution, the rotary table frame includes a rotating disk rotatably connected to the top of the ion sputtering instrument main body. A fixed cylinder is fixedly connected to the top of the rotating disk. The top of the fixed cylinder is inclined. The gold spraying table is rotatably arranged on the inclined surface at the top of the fixed cylinder, and the gold spraying table is parallel to the inclined surface.

[0010] According to the above technical solution, a second gear ring fixedly connected to the rotary table frame is provided on the lower side of the gold spraying table. A rotating shaft is fixedly connected to the bottom of the sample stage. The rotating shaft passes through the gold spraying table and is fixedly connected with a third gear, and the third gear meshes with the second gear ring.

[0011] According to the above technical solution, it further includes a sputtering target head arranged on the top of the ion sputtering instrument. A target material mounting rack facing the gold spraying table is provided at the bottom of the sputtering target head. A plurality of target seats for mounting target materials are provided at the bottom of the target material mounting rack.

[0012] According to the above technical solution, the target material mounting rack includes an inclined target seat mounting disk. The target seat mounting disk rotates along the diameter of the inclined surface, and the target seat is inclined and arranged at the bottom of the target seat mounting disk.

[0013] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0014] In the present utility model, a gold spraying table inclined to the horizontal line is arranged on the top of the rotary table frame. The gold spraying table can rotate along the inclined surface of the gold spraying table, and the rotary table frame is also rotatably arranged, which can ensure that the ion beam can uniformly irradiate the surface of the specimen, improve the coating quality, avoid the ion beam from concentrating on the same area of the specimen surface for a long time, and thus reduce the damage to this area.

[0015] In the present utility model, a plurality of self-rotating sample stages are provided on the top of the gold spraying table. While the gold spraying table drives the plurality of sample stages to revolve along the inclined surface of the gold spraying table, the plurality of sample stages all rotate self, so that the ion beam can uniformly irradiate the front and side surfaces of the specimen, which can avoid the charge accumulation caused by poor conductivity on the side surface during the observation process, thereby affecting the clarity and resolution of the image, and preventing the phenomenon that some areas on the front or side surface are too bright or too dark. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 is an overall structural schematic diagram of the ion sputtering instrument main body of the present utility model;

[0017] Figure 2 is a connection diagram of the rotary table frame, the sample stage and the gold spraying table of the present utility model;

[0018] Figure 3 is a cross-sectional view of the rotary table frame, the sample stage and the gold spraying table of the present utility model;

[0019] Figure 4 It is a connection diagram of the second gear and the first toothed ring of the present utility model;

[0020] Figure 5 It is a schematic diagram of the target mounting rack and the target seat of the present utility model.

[0021] In the figure:

[0022] 1. Main body of ion sputtering instrument; 2. Rotary table frame; 21. Rotating disk; 22. Fixed cylinder; 3. Gold spraying table; 4. Sample table; 5. Shaft rod; 6. First gear; 7. Optical axis; 8. Helical gear; 9. Target mounting rack; 91. Target seat mounting disk; 11. First toothed ring; 12. Second toothed ring; 13. Rotating shaft; 14. Third gear; 15. Sputtering target head; 16. Second gear; 17. Target seat. Specific embodiments

[0023] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0024] Please refer to Figures 1-5 , the present utility model provides a technical solution for an ion sputtering instrument for preparing electron microscope specimens: including a main body 1 of the ion sputtering instrument, a rotary table frame 2 is rotatably provided on the top of the main body 1 of the ion sputtering instrument. The rotating rotary table frame can ensure that the ion beam can irradiate the specimen surface evenly, improve the coating quality, and avoid the ion beam from concentrating on the same area of the specimen surface for a long time, thereby reducing the damage to this area.

[0025] A gold spraying table 3 inclined to the horizontal line is provided on the top of the rotary table frame 2. Among them, the gold spraying table 3 is rotatably connected to the rotary table frame 2, so that the gold spraying table 3 can rotate along the inclined surface of the gold spraying table 3. The top of the gold spraying table 3 is evenly provided with sample tables 4 for carrying and fixing the samples to be gold-sprayed. The sample tables 4 are all rotatably connected to the gold spraying table 3, so that the gold spraying table 3 drives a plurality of sample tables 4 to revolve along the inclined surface of the gold spraying table 3. While a plurality of sample tables 4 are revolving, a plurality of sample tables 4 all rotate. In this way, the ion beam can irradiate the front and side surfaces of the specimen evenly, which can avoid charge accumulation caused by poor conductivity on the side surface during the observation process, thereby affecting the clarity and resolution of the image, and preventing the phenomenon that some areas on the front or side are too bright or too dark.

[0026] Specifically, a shaft rod 5 fixedly connected to the bottom of the gold spraying platform 3 is rotationally connected to the rotary table frame 2. A first gear 6 is fixedly connected to the outer wall of the shaft rod 5, and the first gear 6 is fixedly sleeved on the outer wall of the shaft rod 5. A rotating optical axis 7 is provided on the rotary table frame 2. An upper end of the optical axis 7 is fixedly connected to a helical gear 8. The optical axis 7 can drive the helical gear 8 to rotate. The helical gear 8 meshes with the first gear 16. When the helical gear 8 rotates, it can drive the first gear 16 to rotate, and then drive the gold spraying platform 3 to rotate along the inclined surface of the gold spraying platform 3 through the shaft rod 5, realizing the revolution of multiple sample stages 4.

[0027] Specifically, a first toothed ring 11 coaxial with the rotary table frame 2 is fixedly connected to the inner wall of the upper end of the ion sputtering instrument main body 1. The optical axis 7 is arranged away from the rotation axis of the rotary table frame 2. When the rotary table frame 2 rotates, it can drive the optical axis 7 to make a circular motion around the rotation axis of the rotary table frame 2. A second gear 11 meshing with the first toothed ring 16 is fixedly sleeved on the outer wall of the optical axis 7. When the optical axis 7 makes a circular motion, the second gear 11 on the optical axis 7 makes a meshing motion with the first toothed ring 16, causing the second gear 11 to rotate self - sufficiently, and then driving the optical axis 7 to rotate self - sufficiently, achieving the transmission effect.

[0028] Specifically, an avoidance hole is provided at the top of the ion sputtering instrument main body 1, and the diameter of the avoidance hole is larger than the diameter of the revolution trajectory of the optical axis 7, ensuring that the optical axis 7 will not interfere with the device during revolution.

[0029] Specifically, the rotary table frame 2 includes a rotating disk 21 rotationally connected to the top of the ion sputtering instrument main body 1. A driving motor is provided inside the ion sputtering instrument main body 1, and the driving motor can drive the rotating disk 21 to rotate. A fixed cylinder 22 is fixedly connected to the top of the rotating disk 21, and the fixed cylinder 22 is coaxial with the rotating disk 21. The rotation of the rotating disk 21 can drive the fixed cylinder 22 to rotate. The top of the fixed cylinder 22 is inclined. The gold spraying platform 3 is rotationally arranged on the inclined surface of the top of the fixed cylinder 22, and the gold spraying platform 3 is parallel to the inclined surface, so that while the fixed cylinder 22 drives the gold spraying platform 3 to revolve, the gold spraying platform 3 can also rotate self - sufficiently along the inclined surface of the gold spraying platform 3.

[0030] Specifically, a second toothed ring 12 fixedly connected to the rotary table frame 2 is provided on the lower side of the gold spraying platform 3. A support frame is fixedly connected to the side wall of the rotary table frame 2. The second toothed ring 12 is fixed through the provided support frame and is parallel to the gold spraying platform 3. Shafts 13 are fixedly connected to the bottoms of the sample stages 4, and the shafts 13 are rotationally connected to the gold spraying platform 3. The shafts 13 pass through the gold spraying platform 3 and are fixedly connected to third gears 14, so that the third gears 14 rotate synchronously with the sample stages 4. The third gears 14 mesh with the second toothed ring 12. When the gold spraying platform 3 drives multiple sample stages 4 to revolve along the inclined surface of the gold spraying platform 3, the third gears 14 make a meshing motion with the second toothed ring 12, causing the third gears 14 to rotate and driving multiple sample stages 4 to rotate self - sufficiently, enabling the ion beam to irradiate the front and side surfaces of the specimen evenly.

[0031] Specifically, it further includes a sputtering target head 15 arranged on the top of the ion sputtering instrument. A target material mounting rack 9 facing the gold spraying table 3 is provided at the bottom of the sputtering target head 15. A plurality of target seats 17 for mounting target materials are provided at the bottom of the target material mounting rack 9. When thin films with requirements for multiple target material materials need to be plated, target materials of multiple materials (such as gold Au, platinum Pt, carbon C, etc.) can be installed, reducing the number of plating times and the number of times of breaking vacuum, thereby increasing the coating probability of thin films of multiple materials.

[0032] Specifically, the target material mounting rack 9 includes a target seat mounting disc 91 arranged obliquely. The target seat mounting disc 91 is rotatably arranged (self-rotates) along the diameter of the inclined surface. The target seat 17 is arranged obliquely at the bottom of the target seat mounting disc 91 (the surface on the side close to the sample stage), so that the lowermost target seat 17 always faces directly downward. By rotating the target seat mounting disc 91, any target seat 17 can be switched to the bottommost part of the target seat mounting disc 91, and the lowermost target seat 17 always faces directly downward, improving the gold spraying effect.

[0033] In the description of the present invention, it should be understood that the orientation or positional relationship indicated by terms such as "coaxial", "bottom", "one end", "top", "middle", "the other end", "upper", "one side", "top", "inner", "front part", "center", "both ends", etc. is the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, so it cannot be understood as a limitation to the present invention.

[0034] In addition, terms such as "first", "second", "third", "fourth" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first", "second", "third", "fourth" may explicitly or implicitly include at least one of such features.

[0035] In the present invention, unless otherwise clearly specified and defined, terms such as "installation", "setting", "connection", "fixation", "swivel connection", etc. should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium. It can be the internal communication of two elements or the interaction relationship between two elements. Unless otherwise clearly defined, for those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific situations.

[0036] Although embodiments of the present utility model have been shown and described, those of ordinary skill in the art can understand that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principle and spirit of the present utility model. The scope of the present utility model is defined by the appended claims and their equivalents.

Claims

1. An ion sputtering apparatus for preparing electron microscope samples, comprising an ion sputtering apparatus host (1), characterized in that: A rotating stand (2) is rotatably provided on the top of the ion sputtering apparatus mainframe (1); a gold spraying platform (3) inclined to the horizontal line is provided on the top of the rotating stand (2); the gold spraying platform (3) is rotatably connected to the rotating stand (2); sample platforms (4) for carrying and fixing samples to be sprayed with gold are evenly distributed on the top of the gold spraying platform (3); and the sample platforms (4) are all rotatably connected to the gold spraying platform (3).

2. The ion sputtering apparatus for preparing electron microscope samples according to claim 1, characterized in that: The bottom of the gold spraying platform (3) is fixedly connected to a shaft rod (5) rotatably connected to the rotating platform (2); the outer wall of the shaft rod (5) is fixedly connected to a first gear (6); a rotating optical axis (7) is provided on the rotating platform (2); the upper end of the optical axis (7) is fixedly connected to a bevel gear (8); and the bevel gear (8) is meshed with the first gear (6).

3. The ion sputtering apparatus for preparing electron microscope samples according to claim 2, characterized in that: The inner wall of the upper end of the ion sputtering apparatus mainframe (1) is fixedly connected to a first gear ring (11) coaxial with the rotating platform (2); the optical axis (7) is arranged away from the rotation axis of the rotating platform (2); and the outer wall of the optical axis (7) is fixedly sleeved with a second gear (16) meshing with the first gear ring (11).

4. The ion sputtering apparatus for preparing electron microscope samples according to claim 3, characterized in that: The top of the ion sputtering apparatus mainframe (1) is provided with an avoidance hole, and the diameter of the avoidance hole is larger than the diameter of the orbital trajectory of the optical axis (7).

5. The ion sputtering apparatus for preparing electron microscope samples according to claim 1, characterized in that: The rotating stage (2) comprises a rotating disk (21) rotatably connected to the top of the ion sputtering apparatus main unit (1); a fixed cylinder (22) is fixedly connected to the top of the rotating disk (21); the top of the fixed cylinder (22) is inclined; the gold spraying platform (3) is rotatably arranged on the inclined surface of the top of the fixed cylinder (22); and the gold spraying platform (3) is parallel to the inclined surface.

6. The ion sputtering apparatus for preparing electron microscope samples according to claim 1, characterized in that: A second gear ring (12) fixedly connected to the rotating platform (2) is provided on the lower side of the gold-spraying platform (3), and a rotating shaft (13) is fixedly connected to the bottom of the sample platform (4). The rotating shaft (13) passes through the gold-spraying platform (3) and is fixedly connected to a third gear (14), and the third gear (14) is meshed with the second gear ring (12).

7. The ion sputtering apparatus for preparing electron microscope samples according to claim 1, characterized in that: It also comprises a sputtering target head (15) arranged on the top of the ion sputtering apparatus, wherein the bottom of the sputtering target head (15) is provided with a target material mounting frame (9) facing the gold spraying platform (3), and the bottom of the target material mounting frame (9) is provided with a plurality of target seats (17) for mounting target materials.

8. The ion sputtering apparatus for preparing electron microscope samples according to claim 7, characterized in that: The target material mounting frame (9) comprises a target seat mounting plate (91) which is arranged obliquely, the target seat mounting plate (91) rotates along the diameter of the inclined surface, and the target seat (17) is arranged obliquely at the bottom of the target seat mounting plate (91).

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