Optical imaging film of light insulation substrate
By introducing a light-insulating substrate into the imaging film, light below 380 nm is prevented from passing through, the problem of large-scale and high-precision alignment in the prior art is solved, and efficient and accurate imaging film preparation is achieved.
Patent Information
- Application Number
- CN202421876658.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-05
- Publication Date
- 2025-06-27
- Estimated Expiration
- 2034-08-05
AI Technical Summary
The existing imaging film preparation technology is difficult to meet the requirements of large-scale and high-precision alignment, resulting in low production efficiency and poor imaging results.
An optical imaging film using a light-insulating substrate prevents light below 380nm from passing through the light-insulating substrate, allowing exposure to both sides of the optical interval to be simultaneously reduced, and the alignment accuracy and production efficiency are improved.
It realizes high-precision exposure at the same time on both sides of the optical interval, reduces alignment errors, improves production efficiency, and is suitable for large-scale production and roll-to-roll production processes.
Smart Images
Figure CN223038202U_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of imaging film, and particularly to an optical imaging film with a light-blocking substrate. Background Art
[0002] In recent years, micro-optical elements based on the Moiré magnification principle can magnify micron-scale images hundreds of times to form millimeter-scale recognizable images. At the same time, the presented images can have a dynamic effect as the viewing angle changes, and have attracted attention in various fields, especially in the fields of decoration and anti-counterfeiting.
[0003] However, in the field of optical material preparation technology, especially in the preparation process of imaging films, it is usually necessary to use a PET (polyethylene terephthalate) substrate as the base material. However, the PET substrate is coated with UV glue and then embossed by an embossing method to form a focusing unit and a graphic structure respectively. This method requires a high alignment progress during the preparation process. However, whether it is embossing on both sides simultaneously or separately, due to the alignment error of the embossing itself, it is difficult to meet the fine imaging requirements. Another preparation method in the prior art uses an exposure and development method to prepare a focusing structure and a graphic structure, and can only expose the two structures separately. Because the substrate and the material layer are both transparent, it is necessary to coat the glue on the substrate separately and expose them separately. Although the accuracy can meet the fine imaging requirements in this way, the production efficiency is low and it is not conducive to large-scale production.
[0004] In summary, according to the existing preparation methods, it is impossible to prepare imaging films in a large-scale and high-precision alignment manner. Therefore, there is an urgent need to provide a new structure and a new preparation method to solve the technical problems of the prior art. Utility Model Content
[0005] Based on this, it is necessary to provide an optical imaging film with a light-blocking substrate to solve the above technical problems.
[0006] One technical solution of the present application is:
[0007] An optical imaging film with a light-blocking substrate, characterized in that it comprises:
[0008] A light-blocking substrate, the light-blocking substrate comprising a first surface and a second surface disposed opposite thereto;
[0009] A focusing layer, the focusing layer being located on one side of the first surface of the light-blocking substrate, the focusing layer comprising a plurality of focusing units;
[0010] A graphic layer, the graphic layer being located on one side of the second surface of the light-blocking substrate, the graphic layer comprising a plurality of micro-graphic units;
[0011] Among them, the light-blocking substrate can prevent light with a wavelength below 380 nm from passing through; the focusing unit is arranged to match the micro-graphic unit, so as to form a magnified image.
[0012] In one embodiment, an optical layer is provided on the second surface of the light-blocking substrate, and grooves are formed on the surface of the optical layer. The grooves constitute the micro-graphic unit, so as to form the graphic layer.
[0013] In one embodiment, a colored material and / or a material having a refractive index difference from the graphic layer is filled in the grooves to form a micro-graphic unit.
[0014] In one embodiment, the focusing unit is a microlens or a cylindrical lens.
[0015] In one embodiment, the focusing unit and the micro-graphic unit are formed on the light-blocking substrate by means of exposure and development.
[0016] In one embodiment, the light-blocking substrate can prevent light with a wavelength in the range of 380 nm to 345 nm from passing through; or, it can prevent light with a wavelength in the range of 370 nm to 355 nm from passing through.
[0017] In one embodiment, the focusing units are arranged in a periodic pattern on one side of the first surface of the light-blocking substrate, or are arranged randomly on one side of the first surface of the light-blocking substrate.
[0018] In one embodiment, at least one micro-graphic unit is correspondingly arranged for each focusing unit.
[0019] In one embodiment, the magnified image is a suspended magnified image or a sunken magnified image.
[0020] In one embodiment, the focusing unit forms a focusing surface on the second surface of the light-blocking substrate, and the micro-graphic unit is located on the focusing surface; or the micro-graphic unit is located within 20 micrometers from the focusing surface.
[0021] Advantages of the present application: The light-blocking substrate of the present application is set to prevent light with a wavelength below 380 nm from passing through, so that exposure can be carried out simultaneously on both sides of the optical gap, and the light on one side will not affect the optical layer on the other side. In this way, only the alignment of the mask plates on the two layers of the optical gap layer needs to be carried out, so that the alignment error during the production process is extremely small, and the alignment error will not increase with the production time. Moreover, this preparation method can also be applied to the roll-to-roll production process, which greatly improves the production efficiency while ensuring the imaging effect. Description of the Drawings
[0022] Figure 1Schematic diagram of the optical imaging film with a light-blocking substrate in this application;
[0023] Figure 2 Another schematic diagram of the optical imaging film with a light-blocking substrate in this application;
[0024] Figure 3 Schematic diagram of the imaging effect of the optical imaging film with a light-blocking substrate in this application;
[0025] Figure 4 Schematic diagram of a structure in the middle process of the preparation method of the optical imaging film with a light-blocking substrate in this application;
[0026] Figure 5 Schematic diagram of a structure in the middle process of the preparation method of the optical imaging film with a light-blocking substrate in this application;
[0027] Figure 6 Schematic diagram of a structure in the middle process of the preparation method of the optical imaging film with a light-blocking substrate in this application. Detailed implementation mode
[0028] To facilitate the understanding of this application, the following will describe this application more comprehensively with reference to the relevant drawings. The preferred embodiments of this application are shown in the drawings. However, this application can be implemented in many different forms and is not limited to the embodiments described below. On the contrary, the purpose of providing these embodiments is to make the disclosure of this application understood more thoroughly and comprehensively.
[0029] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those of ordinary skill in the technical field to which this application belongs. The terms used in the specification of this application herein are only for the purpose of describing specific embodiments and are not intended to limit this application. The term "and / or" used herein includes any and all combinations of one or more of the related listed items.
[0030] As Figure 1 shown, an optical imaging film with a light-blocking substrate, the optical imaging film can be used on products such as decoration, packaging, securities, anti-counterfeiting labels, etc., and the optical imaging film includes:
[0031] A light-blocking substrate 10, the light-blocking substrate 10 includes a first surface and a second surface disposed opposite to each other; the light-blocking substrate 10 can prevent light with a wavelength below 380 nm from passing through. When preparing a focusing layer and a graphic layer simultaneously through the process of exposure and development, the light with a wavelength near the I-line on both sides will be blocked by the light-blocking substrate 10 and cannot pass through, so that the preparation of the focusing layer and the graphic layer will not be affected. Of course, the light-blocking substrate 10 can still allow light in other wavelength bands to pass through and also has good transmittance, such as light in the visible light band;
[0032] A focusing layer, the focusing layer is located on one side of the first surface of the light-blocking substrate 10, the focusing layer includes a plurality of focusing units 22, and the focusing units 22 are microlenses or cylindrical lenses; a graphic layer, the graphic layer is located on one side of the second surface of the light-blocking substrate 10, and the graphic layer includes a plurality of micro-graphic units 31; the focusing units and the micro-graphic units are formed by exposure and development.
[0033] Among them, as Figure 3 shown, the focusing unit 22 and the micro-graphic unit 31 are arranged in a matching manner to form a magnified image. The graphic layer is composed of a plurality of micro-graphic units 31, the micro-graphic unit 31 is the letter "A", and the micro-graphic unit 31 forms a suspended image "A" through the focusing unit 22 in the focusing layer, and the suspended image "A" has a certain distance from the imaging film; the focusing units 22 can be arranged periodically on one side of the light-blocking substrate, or can also be randomly arranged on one side of the light-blocking substrate, and the micro-graphic units 31 are adapted to the focusing units 22.
[0034] Furthermore, Figure 1 in, the light-blocking substrate 10 can prevent light with a wavelength in the range of 380 nm to 345 nm from passing through; or, it can prevent light with a wavelength in the range of 370 nm to 355 nm from passing through; in particular, it can prevent light with a wavelength near the I-line from passing through, and the light with a wavelength near the I-line is mainly used for the exposure and development band.
[0035] In this application, the reason for using the light-blocking substrate 10 is that the light-blocking substrate 10 can prevent the exposure light rays during the preparation of the focusing layer and the graphic layer from interfering with each other. When the focusing layer and the graphic layer are prepared on both sides of the light-blocking substrate 10 at the same time, the light rays with a wavelength near the I-line for exposure will not affect the preparation of the other layer, which is more conducive to production and the alignment accuracy is more guaranteed.
[0036] As Figure 1 shown, an optical layer is provided on the second surface of the light-blocking substrate 10, and grooves are formed on the surface of the optical layer. The grooves constitute the micro-graphic units 31 to form the graphic layer. The grooves are formed by exposure and development. Since the grooves are filled with air, there is a refractive index difference between the grooves and the light-blocking substrate 10 (and the optical layer), so the grooves can show the micro-graphics.
[0037] In one embodiment, as Figure 2As shown, a material that is colored and / or has a refractive index difference from the graphic layer is filled in the groove to form a micro-graphic unit 32. The colored material can be colored ink, dye, etc., and the material with a refractive index difference can be a polymer, a colored polymer, etc., as long as it can have a refractive index difference from the graphic layer, and preferably a material with a large refractive index difference is used.
[0038] As Figures 4 to 6 shown, it is a schematic diagram of the main process for preparing an optical imaging film with a light-blocking substrate. Prepare a light-blocking substrate 10, which includes a first surface and a second surface opposite to each other. The light-blocking substrate 10 can be a transparent material that can block light with a wavelength below 380 nm, or in other words, can block the transmission of light in the band near the I-line. The light-blocking substrate 10 can prevent light with a wavelength below 380 nm from passing through. On one side of the first surface of the light-blocking substrate 10, there is a first optical layer 20, and on the second surface of the light-blocking substrate 10, there is a second optical layer 30. Since the light-blocking substrate 10 has the function of blocking light, especially can block the light in the band near the I-line, when using light with a wavelength near the I-line (365 nm) to irradiate the first optical layer 20 and the second optical layer 30 through a film or a mask plate, the light on both sides will not affect the optical layer on the other side. After the first optical layer 20 and the second optical layer 30 are exposed and developed, a focusing layer intermediate 21 is formed on the first optical layer, and a graphic layer is formed on the second optical layer 30. After the focusing layer intermediate 21 is baked, a focusing layer is formed. Since the light-blocking substrate 10 only blocks the light with a wavelength below 380 nm (or the light with a wavelength near the I-line), light in other bands can still pass through the light-blocking substrate 10. The focusing layer includes a number of focusing units 22, and the graphic layer includes a number of micro-graphic units 31 formed by grooves. The micro-graphic units 31 are formed by grooves, so the inside of the grooves is equivalent to air with a refractive index of 1, and the refractive index of the second optical layer (or the graphic layer) is greater than 1, so there is a refractive index difference, and the graphic layer can see the image of the micro-graphic. Of course, the micro-graphic unit can also be composed of a convex structure. The focusing unit 22 is a microlens or a cylindrical lens, and the focusing unit 22 is arranged in a matching manner with the micro-graphic unit 31, so as to form a magnified image. At this time, the magnified image is formed on one side of the focusing unit. Of course, a reflective layer can also be provided on the surface of the focusing unit, so that the magnified image will be formed on one side of the micro-graphic unit.
[0039] As Figure 3 shown, another graphic layer structure. On the basis of Figure 6 this, Figure 6The grooves of the graphic layer therein are filled with a colored material and / or a material having a refractive index difference from the second optical layer (or graphic layer), forming the micro-graphic unit 32 of another structure and forming a new graphic layer. This structure is only an extension of the above-mentioned embodiment. If the grooves are not filled, it can also be a graphic layer. Filling the grooves with materials can still form a different graphic layer. Of course, the micro-graphic unit can also be composed of raised structures.
[0040] An optical imaging film having a light-shielding substrate. Since the light-shielding substrate 10 has the function of shielding light, as Figures 4 to 6 an extension of the preparation method, it can also be prepared by a roll-to-roll method. The light-shielding substrate 10 is supported by two rollers, and thus the roll-to-roll operation is carried out through the rollers. Mask plates are respectively arranged on both sides of the light-shielding substrate 10. In this way, the I light irradiates the optical layers on both sides of the light-shielding substrate 10 through the mask plates. Since the light-shielding substrate 10 has the function of blocking the light with a wavelength below 380 nm, the light on both sides will not affect the optical layers on the other side. As long as the alignment on both sides is achieved, although it is a roll-to-roll production, the alignment error will not be affected by the time of roll-to-roll production because the mask plates on both sides do not move at all, so the alignment error will not change, which is more conducive to large-scale production.
[0041] To make the above objects, features, and advantages of the present application more obvious and understandable, the specific embodiments of the present application are described in detail above with reference to the accompanying drawings. Many specific details are set forth in the above description to fully understand the present application. However, the present application can be implemented in many other ways different from those described above. Those skilled in the art can make similar improvements without departing from the connotation of the present application. Therefore, the present application is not limited by the specific embodiments disclosed above. Moreover, the technical features of the above-mentioned embodiments can be combined arbitrarily. For the sake of brevity of description, not all possible combinations of the technical features in the above-mentioned embodiments are described. However, as long as the combinations of these technical features do not conflict, they should be considered as the scope described in this specification.
[0042] The above-mentioned embodiments only represent several implementation manners of the present application. The description is relatively specific and detailed, but it cannot be understood as a limitation on the patent scope of the present application. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present application, several modifications and improvements can still be made, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application should be subject to the appended claims.
Claims
1. An optical imaging film of a light-isolating substrate, characterized in that: include: A light-isolating substrate, the light-isolating substrate comprising a first surface and an oppositely disposed second surface; A focusing layer, the focusing layer is located on one side of the first surface of the light-isolating substrate, and the focusing layer includes a plurality of focusing units; A graphic layer, the graphic layer is located on one side of the second surface of the light-isolating substrate, and the graphic layer includes a plurality of micro graphic units; Wherein, the light-isolating substrate can prevent light with a wavelength below 380nm from passing through; the focusing unit is matched with the micro-image unit to form an amplified image.
2. The optical imaging film of the light-shielding substrate according to claim 1, characterized in that: An optical layer is disposed on the second surface of the light-isolating substrate, grooves are formed on the surface of the optical layer, and the grooves constitute micro-image and text units, thereby forming the image and text layer.
3. The optical imaging film of the light-shielding substrate according to claim 2, characterized in that: The grooves are filled with colored materials and / or materials having a refractive index difference with the graphic layer to form micro graphic units.
4. The optical imaging film of the light-isolating substrate according to claim 1, characterized in that: The focusing unit is a microlens or a cylindrical mirror.
5. The optical imaging film of the light-shielding substrate according to claim 1, characterized in that: The focusing unit and the micro-image unit are formed on the light-isolating substrate by exposure and development.
6. The optical imaging film of the light-shielding substrate according to claim 1, characterized in that: The light-isolating substrate can prevent light with a wavelength of 380nm to 345nm from passing through; or, can prevent light with a wavelength of 370nm to 355nm from passing through.
7. The optical imaging film of the light-shielding substrate according to claim 1, characterized in that: The focusing units are periodically arranged on one side of the first surface of the light-isolating substrate, or randomly arranged on one side of the first surface of the light-isolating substrate.
8. The optical imaging film of the light-shielding substrate according to claim 1, characterized in that: Each of the focusing units is provided with at least one corresponding micro-image and text unit.
9. The optical imaging film of the light-shielding substrate according to claim 1, characterized in that: The magnified image is a suspended magnified image, or a sunken magnified image.
10. The optical imaging film of the light-shielding substrate according to claim 1, characterized in that: The focusing unit forms a focusing plane on the second surface of the light-isolating substrate, and the micro-image unit is located on the focusing plane; or the micro-image unit is located within 20 micrometers from the focusing plane.