Cleaning device for diamond semiconductor device

Abstract

The utility model belongs to the field of cleaning equipment, and particularly relates to a cleaning device for a diamond semiconductor device, which comprises a supporting box, a workbench is fixedly mounted at the top of the supporting box, a placing groove is formed in the top of the workbench, a rubber seat is mounted on the inner wall of the bottom of the placing groove, and the diamond semiconductor device is placed in the placing groove. Two supporting plates are installed at the top of the workbench, the same transverse plate is fixedly installed at the tops of the two supporting plates, a first hydraulic cylinder is fixedly installed at the top of the transverse plate, a driving plate is fixedly installed on an output shaft of the first hydraulic cylinder, two moving plates are slidably installed at the bottom of the driving plate, and a cleaning plate is fixedly installed at the bottoms of the moving plates. And cleaning rag is mounted at the bottom of the cleaning plate through a detachable structure. The diamond semiconductor device cleaning device is reasonable in design, and when the rotating motor drives the cleaning rag to move left and right in a reciprocating mode, the cleaning rag can achieve the purpose of cleaning the surface of a diamond semiconductor device to remove stains.

Description

Technical Field

[0001] The utility model relates to the technical field of cleaning equipment, in particular to a cleaning device for diamond semiconductor devices. Background Technique

[0002] In high-power, high-frequency and extreme environments, diamond is a more suitable material than silicon, which is determined by the thermal characteristics, dielectric characteristics and carrier migration characteristics of diamond. Devices made of diamond make it possible to significantly reduce complexity by reducing the number of discrete devices required to perform an application.

[0003] At present, a semiconductor device cleaning device announced in a Chinese patent with the publication number CN110112084A. The semiconductor device cleaning device includes: a cleaning tank having a support table for carrying semiconductor devices; a first pipeline for transmitting a cleaning liquid into the cleaning tank; a second pipeline communicating with the first pipeline for transmitting a first gas into the first pipeline, and the first gas dissolved in the cleaning liquid can generate active particles, and the active particles are used to act on the particulate matters in the semiconductor device to remove the particulate matters.

[0004] In actual production, it is found that the particulate matters in the semiconductor device can be cleaned by the cleaning liquid, but the stains, soldering fluxes and other pollutants on the diamond semiconductor device are difficult to clean by spraying. Therefore, we propose a cleaning device for diamond semiconductor devices to solve the above problems. Content of the Utility Model

[0005] The purpose of the utility model is to solve the deficiencies existing in the prior art, and to propose a cleaning device for diamond semiconductor devices.

[0006] In order to achieve the above purpose, the utility model adopts the following technical scheme:

[0007] A cleaning device for diamond semiconductor devices includes a support box, a workbench is fixedly installed on the top of the support box, a placement groove is opened on the top of the workbench, a rubber seat is installed on the bottom inner wall of the placement groove, and a diamond semiconductor device is placed in the placement groove;

[0008] Two support plates are installed on the top of the workbench, the same cross plate is fixedly installed on the tops of the two support plates, a hydraulic cylinder I is fixedly installed on the top of the cross plate, and a driving plate is fixedly installed on the output shaft of the hydraulic cylinder I;

[0009] Two moving plates are slidably installed on the bottom of the driving plate, a cleaning plate is fixedly installed on the bottom of the moving plate, and a cleaning rag is installed on the bottom of the cleaning plate through a detachable structure.

[0010] Preferably, a cleaning liquid tank is installed on the top of the cleaning plate. A liquid supply pipe is installed on the cleaning liquid tank. The liquid supply pipe penetrates through the cleaning plate, and a valve body is provided on the liquid supply pipe.

[0011] Preferably, a moving groove is formed in the bottom of the driving plate, and the moving plate is slidably connected to the corresponding moving groove.

[0012] Preferably, a plurality of guide rods are fixedly installed on the inner walls of both sides of the moving groove, and the moving plate is slidably sleeved on the corresponding guide rods. A plurality of reset springs are fixedly installed on one side of the moving plate, and one end of the reset spring is fixedly installed on the inner wall of the moving groove.

[0013] Preferably, a driving motor is fixedly installed on the bottom of the driving plate. An eccentric wheel is fixedly installed on the output shaft of the driving motor, and the eccentric wheel is in contact with the corresponding moving plate.

[0014] Preferably, a storage groove is formed in the bottom inner wall of the placement groove, and a pushing mechanism is provided on the workbench.

[0015] Preferably, the pushing mechanism includes a second hydraulic cylinder, a pushing plate and a rubber pad. The second hydraulic cylinder is fixedly installed on the bottom of the workbench. The output shaft of the second hydraulic cylinder extends into the storage groove and is provided with the pushing plate, and a rubber pad is installed on the top of the pushing plate.

[0016] Preferably, a limiting groove is formed on one side of the support plate. Limiting seats are fixedly installed on both sides of the driving plate, and the limiting seats are slidably connected to the corresponding limiting grooves.

[0017] The beneficial effects of the utility model:

[0018] 1. When cleaning the contamination on the surface of the diamond semiconductor device, place the diamond semiconductor device into the placement groove. Through the cooperation of the first hydraulic cylinder, the driving plate and the moving plate, the moving plate drives the cleaning plate and the cleaning cloth to move downward, so that the cleaning cloth is in contact with the surface of the diamond semiconductor device;

[0019] 2. The cleaning liquid can be supplied to the cleaning cloth through the liquid supply pipe. Through the cooperation of the driving motor, the eccentric wheel, the reset spring and the moving plate, the moving plate can move left and right reciprocally, and the moving plate can drive the cleaning cloth to clean the surface of the diamond semiconductor device to remove the contamination;

[0020] 3. When the diamond semiconductor device is cleaned, by starting the second hydraulic cylinder, the second hydraulic cylinder can drive the pushing plate and the rubber pad to move upward through the output shaft, and the rubber pad can push out the diamond semiconductor device in the placement groove. Description of the drawings

[0021] Figure 1Schematic three-dimensional structure diagram of a cleaning device for diamond semiconductor devices proposed by the present utility model;

[0022] Figure 2 Schematic cross-sectional three-dimensional structure diagram of a cleaning device for diamond semiconductor devices proposed by the present utility model;

[0023] Figure 3 Schematic structure diagram of part A of a cleaning device for diamond semiconductor devices proposed by the present utility model;

[0024] Figure 4 Schematic structure diagram of part B of a cleaning device for diamond semiconductor devices proposed by the present utility model.

[0025] In the figure: 1, support box; 2, workbench; 3, support plate; 4, cross plate; 5, hydraulic cylinder 1; 6, drive plate; 7, moving plate; 8, cleaning plate; 9, cleaning cloth; 10, cleaning liquid tank; 11, liquid supply pipe; 12, placement groove; 13, diamond semiconductor device; 14, rubber seat; 15, moving groove; 16, guide rod; 17, return spring; 18, drive motor; 19, eccentric wheel; 20, storage groove; 21, hydraulic cylinder 2; 22, push plate; 23, rubber pad. Specific embodiments

[0026] The technical solutions of the present utility model will be clearly and completely described below in conjunction with specific embodiments. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts shall fall within the protection scope of the present utility model.

[0027] Refer to Figures 1-4 , a cleaning device for diamond semiconductor devices, including a support box 1, a workbench 2 is fixedly installed on the top of the support box 1, a placement groove 12 is opened on the top of the workbench 2, a rubber seat 14 is installed on the bottom inner wall of the placement groove 12, a diamond semiconductor device 13 is placed in the placement groove 12, two support plates 3 are installed on the top of the workbench 2, the same cross plate 4 is fixedly installed on the top of the two support plates 3, a hydraulic cylinder 1 5 is fixedly installed on the top of the cross plate 4, a drive plate 6 is fixedly installed on the output shaft of the hydraulic cylinder 1 5, two moving plates 7 are slidably installed on the bottom of the drive plate 6, a cleaning plate is fixedly installed on the bottom of the moving plate 7, and a cleaning cloth 9 is installed on the bottom of the cleaning plate through a detachable structure. By the reciprocating movement of the cleaning cloth 9, the diamond semiconductor device can be repeatedly scrubbed, so that the contamination, flux and other pollutants on the surface of the diamond semiconductor device can be fully cleaned.

[0028] In this embodiment, a cleaning liquid tank 10 is installed at the top of the cleaning plate 8. A liquid supply pipe 11 is installed on the cleaning liquid tank 10. The liquid supply pipe 11 penetrates through the cleaning plate 8. A valve body is provided on the liquid supply pipe 11. By opening the valve body, the cleaning liquid can be supplied to the cleaning cloth 9 through the liquid supply pipe 11.

[0029] In this embodiment, a moving groove 15 is formed at the bottom of the driving plate 6, and the moving plate 7 is slidably connected to the corresponding moving groove 15. By providing the moving groove 15, the moving plate 7 can be guided, and the purpose of stable movement of the moving plate 7 can be achieved. A plurality of guide rods 16 are fixedly installed on the inner walls of both sides of the moving groove 15, and the moving plate 7 is slidably sleeved on the corresponding guide rods 16. A plurality of reset springs 17 are fixedly installed on one side of the moving plate 7, and one end of the reset spring 17 is fixedly installed on the inner wall of the moving groove 15. By providing the reset spring 17, when the eccentric wheel 19 does not squeeze the moving plate 7, the reset spring 17 can push the moving plate 7 to reset.

[0030] In this embodiment, a driving motor 18 is fixedly installed at the bottom of the driving plate 6. An eccentric wheel 19 is fixedly installed on the output shaft of the driving motor 18, and the eccentric wheel 19 is in contact with the corresponding moving plate 7. By providing the eccentric wheel 19, the rotation of the eccentric wheel 19 can squeeze the moving plate 7, so that the moving plate 7 can move and compress the reset spring 17.

[0031] In this embodiment, a storage groove 20 is formed on the bottom inner wall of the placement groove 12. A material pushing mechanism is provided on the workbench 2. The material pushing mechanism includes a second hydraulic cylinder 21, a push plate 22 and a rubber pad 23. The second hydraulic cylinder 21 is fixedly installed on the bottom of the workbench 2. The output shaft of the second hydraulic cylinder 21 extends into the storage groove 20 and is installed with the push plate 22. A rubber pad 23 is installed on the top of the push plate 22. A limiting groove is formed on one side of the support plate 3. Limiting seats are fixedly installed on both sides of the driving plate 6, and the limiting seats are slidably connected to the corresponding limiting grooves. By starting the second hydraulic cylinder 21, the second hydraulic cylinder 21 can drive the push plate 22 and the rubber pad 23 to move upward through the output shaft, and the rubber pad 23 can push out the diamond semiconductor device 13 in the placement groove 12.

[0032] In the present utility model, when cleaning the contamination on the surface of the diamond semiconductor device 13, the diamond semiconductor device 13 is placed in the placement groove 12. By starting the first hydraulic cylinder 5, the first hydraulic cylinder 5 can drive the drive plate 6 to move downward. The drive plate 6 drives the cleaning plate 8 and the cleaning rag 9 to move downward through the moving plate 7, so that the cleaning rag 9 contacts the surface of the diamond semiconductor device 13. The cleaning liquid can be supplied to the cleaning rag 9 through the liquid supply pipe 11. By starting the drive motor 18, the drive motor 18 can drive the eccentric wheel 19 to rotate. Through the cooperation of the eccentric wheel 19, the return spring 17 and the moving plate 7, the moving plate 7 can move left and right reciprocally. The moving plate 7 can drive the cleaning rag 9 to clean the surface of the diamond semiconductor device 13 to remove the contamination. When the cleaning of the diamond semiconductor device 13 is completed, by starting the second hydraulic cylinder 21, the second hydraulic cylinder 21 can drive the push plate 22 and the rubber pad 23 to move upward through the output shaft, and the rubber pad 23 can push out the diamond semiconductor device 13 in the placement groove 12.

[0033] The above has introduced in detail a cleaning device for a diamond semiconductor device provided by the present utility model. Specific embodiments are used in this article to elaborate on the principle and implementation manner of the present utility model. The description of the above embodiments is only used to help understand the method and its core idea of the present utility model. It should be noted that for those of ordinary skill in the art in this technical field, without departing from the principle of the present utility model, several improvements and modifications can still be made to the present utility model, and these improvements and modifications also fall within the protection scope of the claims of the present utility model.

Claims

1. A cleaning device for a diamond semiconductor device, characterized in that: It comprises a support box (1), a workbench (2) is fixedly mounted on the top of the support box (1), a placement groove (12) is provided on the top of the workbench (2), a rubber seat (14) is mounted on the bottom inner wall of the placement groove (12), and a diamond semiconductor device (13) is placed in the placement groove (12); Two support plates (3) are installed on the top of the workbench (2); a same horizontal plate (4) is fixedly installed on the top of the two support plates (3); a hydraulic cylinder 1 (5) is fixedly installed on the top of the horizontal plate (4); a drive plate (6) is fixedly installed on the output shaft of the hydraulic cylinder 1 (5); Two movable plates (7) are slidably mounted on the bottom of the driving plate (6), a cleaning plate (8) is fixedly mounted on the bottom of the movable plate (7), and a cleaning rag (9) is mounted on the bottom of the cleaning plate (8) via a detachable structure.

2. A cleaning device for a diamond semiconductor device according to claim 1, characterized in that: A cleaning liquid tank (10) is installed on the top of the cleaning plate (8), a liquid supply pipe (11) is installed on the cleaning liquid tank (10), the liquid supply pipe (11) passes through the cleaning plate (8), and a valve body is provided on the liquid supply pipe (11).

3. A cleaning device for a diamond semiconductor device according to claim 1, characterized in that: A moving groove (15) is provided at the bottom of the driving plate (6), and the moving plate (7) is slidably connected to the corresponding moving groove (15).

4. A cleaning device for a diamond semiconductor device according to claim 3, characterized in that: A plurality of guide rods (16) are fixedly mounted on the inner walls of both sides of the movable groove (15), and the movable plate (7) is slidably sleeved on the corresponding guide rods (16). A plurality of return springs (17) are fixedly mounted on one side of the movable plate (7), and one end of the return spring (17) is fixedly mounted on the inner wall of the movable groove (15).

5. A cleaning device for a diamond semiconductor device according to claim 1, characterized in that: A driving motor (18) is fixedly mounted on the bottom of the driving plate (6), an eccentric wheel (19) is fixedly mounted on the output shaft of the driving motor (18), and the eccentric wheel (19) is in contact with the corresponding moving plate (7).

6. A cleaning device for a diamond semiconductor device according to claim 1, characterized in that: A storage groove (20) is provided on the inner wall of the bottom of the placement groove (12), and a material pushing mechanism is provided on the workbench (2).

7. A cleaning device for a diamond semiconductor device according to claim 6, characterized in that: The pushing mechanism comprises a second hydraulic cylinder (21), a pushing plate (22) and a rubber pad (23); the second hydraulic cylinder (21) is fixedly mounted on the bottom of the workbench (2); the output shaft of the second hydraulic cylinder (21) extends into the storage groove (20) and is mounted with a pushing plate (22); and the top of the pushing plate (22) is mounted with a rubber pad (23).

8. A cleaning device for a diamond semiconductor device according to claim 1, characterized in that: A limiting groove is provided on one side of the support plate (3), and limiting seats are fixedly mounted on both sides of the drive plate (6), and the limiting seats are slidably connected to the corresponding limiting grooves.

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