Composite coating equipment adopting multiple physical vapor deposition technology

Through the composite coating equipment through multiple physical vapor deposition technology and combined with multiple coating preparation devices, the problem of single coating preparation devices in the prior art is solved, and the preparation of multi-layer composite structure and alloy coating is realized, and the coating performance and uniformity are improved.

CN223061073UActive Publication Date: 2025-07-04SUZHOU PROWEIDI NANO TECH CO LTD
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Patent Information

Application Number
CN202422160662.7
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-09-04
Publication Date
2025-07-04
Estimated Expiration
2034-09-04

AI Technical Summary

Technical Problem

In the prior art, there is only one coating preparation device, which cannot meet the optimal coating preparation needs of different materials, and cannot prepare composite coatings.

Method used

A composite coating equipment with multiple physical vapor deposition technology is designed, including a square cabin, a magnetic filter arc ion source device, a pulse ion source device and a magnetron sputtering device. Combined with vacuum and argon injection device, the preparation of the composite coating is achieved through the combination of multiple coating preparation devices.

Benefits of technology

The preparation of multi-layer composite structural coatings and alloy coatings is realized, which improves the coating performance, meets the coating needs of different materials, and improves the uniformity and versatility of the coating.

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Abstract

The utility model discloses composite coating equipment adopting a multiple physical vapor deposition technology. The composite coating equipment comprises an equipment shell; a square cabin, a magnetic filtering arc ion source device and a pulse ion source device are mounted on the equipment shell; a magnetron sputtering device is mounted on the square cabin; a vacuum cavity is formed in the equipment shell; the square cabin, the magnetic filtering arc ion source device and the pulse ion source device are all communicated with the vacuum cavity; a vacuumizing device and an argon injection device are fixedly mounted on the equipment shell; the vacuumizing device and the argon injection device are both communicated with the vacuum cavity; the square cabin, the magnetic filtering arc ion source device and the pulse ion source device are arranged on the equipment shell, so that the composite coating can be prepared by using a multiple physical vapor deposition technology, and different preparation devices can be selected according to materials and processes.
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Description

Technical Field

[0001] The utility model relates to the technical field of coating preparation, in particular to a composite coating equipment with multiple physical vapor deposition technologies. Background Art

[0002] In modern industry, coating technologies are widely used in fields such as tools, mechanical parts, electronic components, and aerospace to improve the hardness, wear resistance, corrosion resistance, and other properties of materials. Among them, the demand for coatings with high strength and high toughness is increasing day by day, especially composite coatings, which can maintain good toughness while providing high hardness, thus performing excellently under various extreme working conditions.

[0003] The prior art CN219260167U discloses a high-energy pulsed ion plating machine, which includes a plating machine main body, a vacuum pumping device, a gas supply device, and a power supply cabinet. A reaction chamber is arranged inside the plating machine main body. The gas supply part and the vacuum pumping device are both connected to the reaction chamber. The power supply cabinet is used to provide a pulsed electric field to the reaction chamber. Inside the power supply cabinet, a power supply chamber, a refrigeration chamber, and a heat dissipation chamber are arranged in a vertical distribution. An installation hole communicating with each other is arranged between the refrigeration chamber and the heat dissipation chamber. A semiconductor refrigeration chip is installed in the installation hole. The refrigerating surface of the semiconductor refrigeration chip faces the refrigeration chamber. The refrigeration chamber is connected to the power supply chamber through a cold air pipe. A blowing fan is arranged inside the refrigeration chamber; a water cooling component for cooling the semiconductor refrigeration chip is installed inside the heat dissipation chamber. Although this solution can complete the coating preparation of the substrate, there are still certain deficiencies. First, this solution only has one coating preparation device, and different coating preparation devices need to be selected based on the different materials of the substrate and the target to achieve the optimal coating preparation effect. Second, this solution cannot perform the preparation of composite coatings and cannot meet the coating preparation requirements of some special workpieces.

[0004] Therefore, it is necessary to design a composite coating equipment with multiple physical vapor deposition technologies to solve the above problems. Summary of the Utility Model

[0005] The utility model overcomes the deficiencies of the prior art and provides a composite coating equipment with multiple physical vapor deposition technologies.

[0006] To achieve the above object, the technical solution adopted by the utility model is: a composite coating equipment with multiple physical vapor deposition technologies, including: an equipment shell and a control device; a cabin, a magnetron filtered arc ion source device, and a pulsed ion source device are installed on the equipment shell; a magnetron sputtering device is installed on the cabin;

[0007] A vacuum cavity is arranged inside the equipment shell; the cabin, the magnetron filtered arc ion source device, and the pulsed ion source device are all connected to the vacuum cavity;

[0008] A vacuum pumping device and an argon injection device are fixedly installed on the equipment housing; both the vacuum pumping device and the argon injection device are connected to the vacuum chamber;

[0009] The control device is used to control the operation of the entire multi - physical vapor deposition technology composite coating equipment except itself.

[0010] In a preferred embodiment of the present utility model, a substrate fixing device is installed on the equipment housing; the substrate fixing device is located at the central position inside the vacuum chamber.

[0011] In a preferred embodiment of the present utility model, the substrate fixing device includes: a placement plate, clamping plates, and a cylinder; the placement plate is rotatably installed on the equipment housing and is driven by a motor fixedly installed on the equipment housing; the placement plate is located at the central position inside the vacuum chamber; a placement groove is provided on the placement plate; two clamping plates are symmetrically and vertically slidably installed on the placement groove and are driven by a cylinder fixedly installed on the placement plate.

[0012] In a preferred embodiment of the present utility model, the clamping plates have various shapes and can be replaced.

[0013] In a preferred embodiment of the present utility model, a feeding port is provided on the equipment housing, and the substrate is placed through the feeding port; a handle is provided on the feeding port to facilitate the opening and closing of the feeding port.

[0014] In a preferred embodiment of the present utility model, a transparent glass is installed at the middle position of the feeding port to facilitate the observation of the coating preparation situation inside the equipment housing.

[0015] In a preferred embodiment of the present utility model, a filter plate is installed inside the shelter; the filter plate is located between the magnetron sputtering device and the vacuum chamber.

[0016] In a preferred embodiment of the present utility model, a heating wire is fixedly installed on the equipment housing; the heating wire is located inside the vacuum chamber and close to the side of the shelter.

[0017] In a preferred embodiment of the present utility model, there are multiple magnetically filtered arc ion source devices, pulsed ion source devices, and magnetron sputtering devices.

[0018] In a preferred embodiment of the present utility model, the shelter can be replaced with a straight - tube chamber; the straight - tube chamber is fixedly installed on the equipment housing and is connected to the vacuum chamber.

[0019] The present utility model solves the defects existing in the background technology, and the present utility model has the following beneficial effects:

[0020] (1) The utility model can complete the preparation of composite coatings by using multiple physical vapor deposition techniques through installing a cabin, a magnetic filtration arc ion source device and a pulsed ion source device on the equipment shell, and select different preparation devices according to materials and processes; when preparing coatings by combining the three techniques, the complementary and improvement of coating properties can be realized, and not only multi-layer composite structure coatings can be prepared, but also alloy coatings or multi-layer composite coatings with a certain periodicity can be prepared to realize the preparation of multi-functional coatings.

[0021] (2) The equipment of the utility model installs multiple different coating preparation devices in multiple horizontal directions, and drives the substrate to rotate through a substrate fixing device so as to cooperate with the coating preparation devices in each horizontal direction to complete the preparation of composite coatings; there is no need to manually replace the position of the substrate and the coating preparation device during the preparation process, which is convenient and fast.

[0022] (3) The utility model can effectively filter the target ions by installing filter plates in the cabin and the straight cylinder cabin, and improve the uniformity of the coating film layer. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solutions in the embodiments of the present utility model or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments recorded in the present utility model. For those of ordinary skill in the art, other drawings can be obtained according to these drawings without creative efforts.

[0024] Figure 1 It is a schematic diagram of the overall assembly structure of the present utility model;

[0025] Figure 2 It is a schematic diagram of the partial assembly structure of the present utility model;

[0026] Figure 3 It is a schematic diagram of the assembly structure of the substrate fixing device of the present utility model;

[0027] Figure 4 It is a schematic diagram of the overall assembly structure of the present utility model equipped with a straight cylinder cabin.

[0028] In the figure: 1, equipment shell; 2, cabin; 3, magnetic filtration arc ion source device; 4, pulsed ion source device; 5, motor; 6, substrate fixing device (601, placement plate; 602, clamping plate; 603, cylinder); 7, heating wire; 8, feed inlet; 9, straight cylinder cabin. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0029] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0030] In the following description, many specific details are set forth in order to provide a thorough understanding of the present invention. However, the present invention may be implemented in other ways different from those described herein. Therefore, the protection scope of the present invention is not limited by the specific embodiments disclosed below.

[0031] As Figures 1-3 shown, a multi-physical vapor deposition technology composite coating equipment includes: an equipment housing 1 and a control device; a cabin 2, a magnetron sputtering device 3 and a pulsed ion source device 4 are installed on the equipment housing 1; a magnetron sputtering device is installed on the cabin 2.

[0032] As a specific implementation manner of this embodiment, as Figure 1 shown, 3 magnetron sputtering devices are vertically installed on the cabin 2; 2 pulsed ion source devices 4 are installed on the equipment housing 1; the magnetron filter arc ion source devices 3 are installed on the equipment housing 1 in two horizontal directions, and three magnetron filter arc ion source devices 3 are installed in the vertical direction for each horizontal direction; the cabin 2, the two pulsed ion source devices 4 and the magnetron filter arc ion source devices 3 in the two horizontal directions are circumferentially and evenly installed on the equipment housing 1; by setting a variety of coating equipment for coating preparation, appropriate coating preparation methods can be selected according to specific requirements such as the target material and substrate material, working conditions, etc., so as to improve the coating preparation effect. Moreover, when combining three technologies to prepare a coating, the complementarity and improvement of the coating performance can be achieved. It is not only possible to prepare a multi-layer composite structure coating but also an alloy coating or a multi-layer composite coating with a certain periodicity, realizing the preparation of a multi-functional coating.

[0033] A vacuum chamber is provided inside the equipment housing 1; the cabin 2, the magnetron filter arc ion source device 3 and the pulsed ion source device 4 are all communicated with the vacuum chamber.

[0034] A vacuum pumping device and an argon injection device are fixedly installed on the equipment housing 1; the vacuum pumping device and the argon injection device are both communicated with the vacuum chamber.

[0035] The control device is used to control the operation of the entire multi-physical vapor deposition technology composite coating equipment except itself.

[0036] Furthermore, as Figures 2-3As shown in the figure, a substrate fixing device 6 is installed on the device housing 1; as a specific implementation manner of this embodiment, the substrate fixing device 6 includes: a placement plate 601, a clamping plate 602, and a cylinder 603; the placement plate 601 is rotatably installed on the device housing 1 and is driven by a motor 5 fixedly installed on the device housing 1; the placement plate 601 is located at the center position inside the vacuum chamber; a placement groove is provided on the placement plate 601; two clamping plates 602 are symmetrically and vertically slidably installed on the placement groove and are driven by a cylinder 603 fixedly installed on the placement plate 601;

[0037] Furthermore, the clamping plates 602 have various shapes and can be replaced, so as to adapt to substrates of various shapes and be able to fix substrates of different shapes. The motor 5 drives the placement plate 601 to rotate and then drives the substrate to rotate; when preparing a coating on the substrate, different preparation devices are selected according to the materials of the substrate and the target, and the motor 5 drives the substrate to rotate so that the substrate is aligned with the corresponding preparation device to complete the coating preparation of the substrate.

[0038] Furthermore, a feed inlet 8 is provided on the device housing 1, and the substrate is placed through the feed inlet 8; a handle (not shown in the figure) is provided on the feed inlet 8 to facilitate the opening and closing of the feed inlet 8;

[0039] As a specific implementation manner of this embodiment, a transparent glass (not shown in the figure) is installed at the middle position of the feed inlet 8 to facilitate the observation of the coating preparation situation inside the device housing 1.

[0040] Furthermore, a filter plate is installed inside the shelter 2; the filter plate is located at the position between the magnetron sputtering device and the vacuum chamber; as a specific implementation manner of this embodiment, the shelter 2 is used to prepare ta-C, alumina, and various delicate coatings, oxide coatings, etc.; installing a filter plate inside the shelter 2 can isolate the target particles generated in the magnetron sputtering device inside the shelter 2 to avoid the deposition of target particles on the substrate and thus cause uneven coating; at the same time, a heating wire 7 is fixedly installed on the device housing 1; the heating wire 7 is located inside the vacuum chamber and on the side close to the shelter 2; it is convenient for the target ions to undergo an oxidation reaction to prepare an oxide coating. The magnetic filter arc ion source device 3 is used to prepare a toughness layer, a GLC layer, and doped elements, etc.; the pulsed ion source device 4 can prepare conventional AlCrN, AlTiN coatings, and their multi-element coatings or multi-layer coatings to provide a base layer for the overall film layer.

[0041] The magnetron sputtering device, the magnetic filter arc ion source device 3, the pulsed ion source device 4, the motor 5, the cylinder 603, and the heating wire 7 are electrically connected to a control device.

[0042] Embodiment Two:

[0043] The cabin 2 can be replaced by a straight cylinder cabin 9; the straight cylinder cabin 9 is fixedly installed on the equipment housing 1 and is communicated with the vacuum chamber; as a specific implementation manner of this embodiment, three straight cylinder cabins 9 are fixedly installed on the equipment housing 1; a magnetron sputtering device is installed on each straight cylinder cabin 9, and a filter plate is installed in each straight cylinder cabin 9, and the filter plate is located between the magnetron sputtering device and the vacuum chamber. Compared with the first embodiment, the second embodiment is the same except that the cabin 2 is replaced by the straight cylinder cabin 9.

[0044] Based on the ideal embodiments of the present invention as the inspiration, through the above description, relevant personnel can completely make various changes and modifications without departing from the technical idea of this invention. The technical scope of this invention is not limited to the content in the specification, and the technical scope must be determined according to the scope of the claims.

Claims

1. A multi-physical vapor deposition technology composite coating equipment, characterized in that, Comprising: A device housing (1) and a control device; a cabin (2), a magnetically filtered arc ion source device (3), and a pulsed ion source device (4) are installed on the device housing (1); a magnetron sputtering device is installed on the cabin (2); A vacuum chamber is provided inside the device housing (1); the cabin (2), the magnetically filtered arc ion source device (3), and the pulsed ion source device (4) are all connected to the vacuum chamber; A vacuum pumping device and an argon injection device are fixedly installed on the device housing (1); the vacuum pumping device and the argon injection device are both connected to the vacuum chamber; The control device is used to control the operation of the entire multi-physical vapor deposition technology composite coating equipment except itself.

2. The multi-physical vapor deposition technology composite coating equipment according to claim 1, characterized in that: A substrate fixing device (6) is installed on the device housing (1); the substrate fixing device (6) is located at the center position inside the vacuum chamber.

3. A multi-physical vapor deposition technology composite coating equipment according to claim 2, characterized in that: The substrate fixing device (6) includes: a placement plate (601), clamping plates (602), and a cylinder (603); the placement plate (601) is rotatably installed on the device housing (1) and is driven by a motor (5) fixedly installed on the device housing (1); the placement plate (601) is located at the center position inside the vacuum chamber; a placement groove is provided on the placement plate (601); two clamping plates (602) are symmetrically and vertically slidably installed on the placement groove and are driven by a cylinder (603) fixedly installed on the placement plate (601).

4. A multi-physical vapor deposition technology composite coating equipment according to claim 3, characterized in that: The clamping plates (602) have various shapes and can be replaced.

5. A multi-physical vapor deposition technology composite coating equipment according to claim 1, characterized in that: A feed inlet (8) is provided on the device housing (1), and a substrate is placed through the feed inlet (8); a handle is provided on the feed inlet (8) to facilitate the opening and closing of the feed inlet (8).

6. A multi-physical vapor deposition technology composite coating equipment according to claim 5, characterized in that: A transparent glass is installed at the middle position of the feed inlet (8) to facilitate the observation of the coating preparation situation inside the device housing (1).

7. A multi-physical vapor deposition technology composite coating equipment according to claim 1, characterized in that: A filter plate is installed inside the cabin (2); the filter plate is located at the position between the magnetron sputtering device and the vacuum chamber.

8. A multi-physical vapor deposition technology composite coating equipment according to claim 1, characterized in that: A heating wire (7) is fixedly installed on the device housing (1); the heating wire (7) is located inside the vacuum chamber and on the side close to the cabin (2).

9. A multi-physical vapor deposition technology composite coating equipment according to claim 1, characterized in that: Multiple magnetically filtered arc ion source devices (3), pulsed ion source devices (4), and magnetron sputtering devices are provided.

10. A multiple physical vapor deposition technology composite coating equipment according to claim 1, characterized in that: The cabin (2) can be replaced with a straight cylinder cabin (9); the straight cylinder cabin (9) is fixedly installed on the device housing (1) and is connected to the vacuum chamber.

Citation Information

Patent Citations

  • High-energy pulse ion plating machine

    CN219260167U