CVD film deposition apparatus

Abstract

The utility model belongs to the technical field of thin film manufacturing, and discloses a CVD (chemical vapor deposition) film deposition device which comprises a shielding frame, the shielding frame is of a rectangular frame structure and comprises at least four shielding rods, the two ends of each shielding rod are inclined planes, every two adjacent shielding rods are arranged in an L shape, and the end portions of the shielding rods abut against each other. The four shielding rods are located in the same horizontal plane and shield the upper portion of the base plate, the four shielding rods at least have a first position and a second position, when the four shielding rods are located at the first position, the ends of the adjacent shielding rods abut against each other, and when the four shielding rods are located at the second position, gaps exist between the ends of the adjacent shielding rods. According to the CVD film deposition device, the shielding plate of the rectangular frame structure is divided from the four corners of the shielding plate to form the four shielding rods, the four shielding rods can also define the rectangular frame to shield the non-film-forming area, the shielding rods are not prone to deformation compared with the shielding frame, non-film-forming data can be ensured, and the film forming quality is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of film manufacturing, in particular to a CVD film deposition device. Background Art

[0002] At present, the coating methods mainly include two categories: chemical vapor deposition (CVD) and physical vapor deposition (PCD). The precursor of the CVD deposition method is an all-gas phase substance input into the reaction zone of the reaction device. After being heated or excited by other physical fields, a chemical reaction occurs and is deposited on the surface of the substrate.

[0003] As Figure 1 and Figure 2 shown, the substrate 2' usually has a film-forming area 100' and a non-film-forming area 200'. The film-forming area 100' is located in the middle of the substrate 2', and the non-film-forming area 200' is located at the four edges of the substrate 2'. By using a shielding frame 1' with a rectangular frame structure to shield above the substrate 2', the non-film-forming area 200' can be shielded to prevent the plasma from falling into the non-film-forming area 200'.

[0004] However, the shielding frame is prone to deformation after long-term use, and the plasma leaks from the deformed part of the shielding frame into the non-film-forming area, resulting in low film-forming quality. Therefore, it is urgent to design a new CVD film deposition device to improve the above problems. Summary of the Utility Model

[0005] The purpose of the utility model is to provide a CVD film deposition device to solve the technical problems that the shielding frame is prone to deformation, and the plasma leaks from the deformed edge of the shielding frame, resulting in low film-forming quality of the finished product.

[0006] To achieve this purpose, the utility model adopts the following technical solutions:

[0007] A CVD film deposition device includes a shielding frame. The shielding frame is a rectangular frame structure. The shielding frame includes shielding rods. At least four shielding rods are provided. The two ends of each shielding rod are inclined planes. Adjacent two shielding rods are arranged in an L shape and their ends are in contact with each other. The four shielding rods are all in the same horizontal plane and shield above the substrate.

[0008] Among them, the four shielding rods have at least a first position and a second position;

[0009] When each shielding rod is in the first position, the ends of adjacent shielding rods are in contact with each other to enclose the film-forming area of the substrate;

[0010] When each shielding rod is in the second position, there is a gap between the ends of adjacent shielding rods to enclose the placement area of the substrate.

[0011] As a preferred embodiment of the CVD film deposition device, the shielding rod includes a shielding portion and an adjusting portion. When the shielding rod is in the first position, the shielding portion is located above the substrate, the shielding portion shields the non-film-forming area of the substrate, the adjusting portion is connected to the shielding portion, and the adjusting portion is in contact with the substrate so that the substrate is at the center of the placement area.

[0012] As a preferred embodiment of the CVD film deposition device, the upper end surface of the shielding portion is a guiding surface, and the guiding surface gradually slopes downward from the side away from the placement area towards the side of the placement area.

[0013] As a preferred embodiment of the CVD film deposition device, the CVD film deposition device further includes a chamber, a vertically movable base is provided in the chamber, a support is provided in the base and penetrates through the inner bottom wall of the chamber, the top end of the support is located above the upper end surface of the base, and the substrate is placed on the top end of the support.

[0014] As a preferred embodiment of the CVD film deposition device, an elastic connecting member is provided between the base and the shielding rod, and the elastic connecting member pulls the shielding rods to gather or separate from each other along the center of the placement area through the lifting of the base, and guiding members for guiding the shielding rods to move horizontally are provided on the inner wall of the chamber in one-to-one correspondence.

[0015] As a preferred embodiment of the CVD film deposition device, the elastic connecting member includes a frame body and an elastic member, the frame body is provided on the upper end surface of the base, one end of the elastic member is connected to the frame body, and the other end of the elastic member is connected to the outside of the shielding rod.

[0016] As a preferred embodiment of the CVD film deposition device, the guiding member includes a guide rail, the guide rail includes a sliding rail and a slider, the sliding rail is provided on one of the inner wall of the chamber and the shielding rod, the slider is provided on the other, the sliding rail extends along a direction perpendicular to the length direction of the shielding rod, and the slider is slidably embedded in the sliding rail.

[0017] As a preferred embodiment of the CVD film deposition device, the elastic member is located between two sets of the guide rails.

[0018] As a preferred embodiment of the CVD film deposition device, two of the guide rails are provided on each shielding rod, and the two guide rails are spaced apart along the length direction of the corresponding shielding rod.

[0019] As a preferred embodiment of the CVD film deposition device, balls are rollably embedded in the slider, and the balls are in rolling contact with the inner wall of the sliding rail.

[0020] Advantages of the present utility model:

[0021] By dividing the shielding plate with a rectangular frame structure at the four corners of the shielding plate to form four shielding rods, after the four shielding rods are connected end to end in sequence, a rectangular frame can also be enclosed to shield the non-film-forming area, and the shielding rods are not prone to deformation compared with the shielding frame, which can ensure non-film-forming data and improve the film-forming quality.

[0022] In addition, during the process of adjusting the four shielding rods from the second position to the first position, the position of the substrate in the placement area can be corrected, further improving the film-forming quality. Description of the Drawings

[0023] Figure 1 is a top view of the shielding plate and the substrate provided in the background art of the present utility model;

[0024] Figure 2 is a cross-sectional view of the shielding plate and the substrate provided in the background art of the present utility model;

[0025] Figure 3 is a schematic structural diagram of the CVD film deposition device provided in the embodiment of the present utility model;

[0026] Figure 4 is a schematic structural diagram of the shielding plate in the first position provided in the embodiment of the present utility model;

[0027] Figure 5 is a schematic structural diagram of the shielding plate in the second position provided in the embodiment of the present utility model;

[0028] Figure 6 is a cross-sectional view of the slide rail provided in the embodiment of the present utility model.

[0029] Figures 1-2 In which:

[0030] 100', film-forming area; 200', non-film-forming area;

[0031] 1', shielding frame; 2', substrate.

[0032] Figures 3-6 In which:

[0033] 100, substrate; 200, film-forming area; 300, placement area;

[0034] 1, shielding frame; 11, shielding rod; 111, shielding part; 1111, guiding surface; 112, adjusting part;

[0035] 2, chamber; 21, base; 211, lifting driving part; 212, frame body; 213, elastic part; 22, support; 23, guide rail; 231, slide rail; 232, slider; 233, ball. Detailed implementation mode

[0036] The present utility model will be further described in detail below in conjunction with the accompanying drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the present utility model, rather than limiting the present utility model. In addition, it should be noted that for the sake of description, only parts related to the present utility model rather than all structures are shown in the accompanying drawings.

[0037] In the description of the present utility model, unless otherwise clearly defined and limited, the terms "connected", "connected", and "fixed" shall be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two elements or the interaction relationship between two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific situations.

[0038] In the present utility model, unless otherwise clearly defined and limited, the first feature being "above" or "below" the second feature may include the direct contact between the first and second features, or may include the situation where the first and second features are not in direct contact but in contact through other features between them. Moreover, the first feature being "above", "over" and "on" the second feature includes that the first feature is directly above and obliquely above the second feature, or merely indicates that the horizontal height of the first feature is higher than that of the second feature. The first feature being "under", "below" and "beneath" the second feature includes that the first feature is directly below and obliquely below the second feature, or merely indicates that the horizontal height of the first feature is lower than that of the second feature.

[0039] In the description of this embodiment, the orientation or positional relationships such as "above", "below", "right", etc. are based on the orientation or positional relationships shown in the accompanying drawings. It is only for the convenience of description and simplifying the operation, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it cannot be understood as a limitation to the present utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meanings.

[0040] Combine Figures 3-6As shown in the figure, this embodiment provides a CVD film deposition device. The CVD film deposition device includes a chamber 2. Inside the chamber 2, there is a base 21. At the bottom end of the base 21, there is a lifting driving member 211. The lifting driving member 211 drives the base 21 to move up and down in the chamber 2. A support 22 passes through the base 21. The overall shape of the support 22 is in a "T" shape. One end of the support 22 is supported on the inner bottom wall of the chamber 2, and the T-shaped end of the support 22 is located on the upper end surface of the base 21. The lifting driving member 211 is preferably a hydraulic cylinder, and it can also be a telescopic air cylinder, etc. When the lifting driving member 211 drives the base 21 to continuously rise, the base 21 can drive the support 22 to rise synchronously with the base 21 by propping up the T-shaped end of the support 22. When the lifting driving member 211 drives the base 21 to continuously descend, the support 22 is supported on the inner bottom wall of the base 21, enabling the support 22 to be used as a support component. A height difference is formed in the vertical direction between the T-shaped end of the support 22 and the upper end surface of the base 21. The space formed by the height difference can facilitate the correction of the position of the substrate 100 on the support 22.

[0041] Further, as Figure 3 , Figure 4 and Figure 5 shown, a manipulator places the substrate 100 on the T-shaped end of the support 22. In order to form a film-forming area 200 and a non-film-forming area on the upper end surface of the substrate 100, a shielding frame 1 is provided above the substrate 100. The shielding frame 1 has a rectangular frame structure. When the plasma drops onto the upper end surface of the substrate 100, the area shielded by the shielding frame 1 is the non-film-forming area, and the middle area not shielded by the shielding frame 1 is the film-forming area 200.

[0042] As Figure 4 shown, the shielding frame 1 of this embodiment includes shielding rods 11. There are at least four shielding rods 11. Both ends of each shielding rod 11 are inclined surfaces. The inclined surfaces incline from one side of the shielding rod 11 towards the relatively opposite side. Preferably, the inclination angle of each inclined surface is 45 degrees. Adjacent two shielding rods 11 are arranged in an L shape and their ends are in contact with each other. When the ends of the four shielding rods 11 are in contact with each other, they form a "square" shape. The four shielding rods 11 are all in the same horizontal plane and shield above the substrate 100.

[0043] Of course, in other embodiments, the inclination angle of the inclined surface can also be other angles, as long as two shielding rods 11 can be arranged in an L shape and their ends can be in contact with each other, for example, 30 degrees, 35 degrees, 40 degrees, 50 degrees, 55 degrees, 60 degrees, etc.

[0044] It can be understood that by dividing the shielding plate of the rectangular frame structure from the four corners of the shielding plate to form four shielding rods 11, and arranging the four shielding rods 11 according to the rectangular frame structure, it is also possible to enclose a rectangle to shield the non-film-forming area. Moreover, the shielding rods 11 are less likely to deform compared to the shielding frame 1, which can ensure non-film-forming data and improve the film-forming quality.

[0045] As Figure 4 and Figure 5 shown, the four shielding rods 11 of this embodiment have at least a first position and a second position. When each shielding rod 11 is in the first position, referring to Figure 4 , the ends of adjacent shielding rods 11 are in contact with each other to enclose the film-forming area 200 of the substrate 100; when each shielding rod 11 is in the second position, referring to Figure 5 , there is a gap between the ends of adjacent shielding rods 11 to enclose the placement area 300 of the substrate 100.

[0046] Specifically, the shielding rod 11 includes a shielding portion 111 and an adjusting portion 112. When the shielding rod 11 is in the first position, the shielding portion 111 is located above the substrate 100, and the adjusting portion 112 is connected to the shielding portion 111 and is located on one side of the substrate 100. The shielding portion 111 shields the non-film-forming area of the substrate 100, and the adjusting portion 112 is in contact with the substrate 100 to make the substrate 100 at the center of the placement area 300. During the process of adjusting the four shielding rods 11 from the second position to the first position, the shielding rods 11 can correct the substrate 100 to ensure that the position of the substrate 100 on the bracket 22 has no deviation.

[0047] Among them, the upper end surface of the shielding portion 111 is a guiding surface 1111, and the guiding surface 1111 gradually slopes downward from the side away from the placement area 300 towards the side of the placement area 300. The plasma falling onto the guiding surface 1111 can enter the film-forming area 200 along the inclined surface, playing a role in guiding the flow.

[0048] More specifically, elastic connectors are provided between the base 21 and each shielding rod 11. The elastic connectors pull the shielding rods 11 to gather or move away from each other along the center of the placement area 300 through the lifting of the base 21. Guide members for guiding the shielding rods 11 to move horizontally are provided on the inner wall of the chamber 2 in one-to-one correspondence. The elastic connector includes a frame body 212 and an elastic member 213. The frame body 212 is provided on the upper end surface of the base 21, one end of the elastic member 213 is connected to the top of the frame body 212, and the other end of the elastic member 213 is connected to the outside of the shielding rod 11.

[0049] First, the lifting driving member 211 contracts to drive the base 21 to descend, and the frame 212 provided on the base 21 synchronously moves downward. A height difference gradually occurs between the base 21 and the bracket 22, and the elastic member 213 connected to the frame 212 is stretched, that is, the elastic potential energy increases. The four shielding rods 11 are synchronously pulled open to the second position along the guiding direction of the guiding member under the elastic tension, so as to form a placement area 300 for the substrate 100. At this time, the manipulator places the substrate 100 in the placement area 300 and places it on the bracket 22.

[0050] Then, the lifting driving member 211 extends to drive the base 21 to rise, and the frame 212 provided on the base 21 synchronously moves upward. When the base 21 rises to the deposition position, the elastic potential energy of the elastic member 213 decreases. Under the elastic force of the elastic member 213, the four shielding rods 11 are reset. During the reset process, the adjusting portions 112 of the four shielding rods 11 clamp the substrate 100 for correction to ensure that the substrate 100 has no offset. The ends of the four shielding rods 11 abut against each other and will no longer be troubled by deformation, improving the utilization rate of raw materials, ensuring non-film-forming data, and improving the film-forming quality.

[0051] Exemplarily, the elastic member 213 in this embodiment is a spring. In other embodiments, the elastic member 213 can also be a tension spring, a telescopic hose, a rubber band, etc.

[0052] Preferably, the guiding member includes a guide rail 23. Specifically, the guide rail 23 includes a sliding rail 231 and a slider 232. The sliding rail 231 is provided on one of the inner wall of the chamber 2 and the shielding rod 11, and the slider 232 is provided on the other. The slider 232 is slidably embedded in the sliding rail 231, and the slider 232 is T-shaped. The cross-section of the sliding rail 231 is provided with a T-shaped groove matching the shape of the slider 232. It should be noted that the slider 232 is always slidably embedded in the sliding rail 231 and will not come out of the sliding rail 231 during the sliding process.

[0053] Wherein, two guide rails 23 are provided on each shielding rod 11, and the two guide rails 23 are spaced along the length direction of the shielding rod 11. Of course, the number of guide rails 23 can also be one, three, four or even more. This embodiment does not make specific limitations in this regard. The guide rail 23 extends along the direction perpendicular to the length of the shielding rod 11, and the elastic member 213 is preferably arranged at the middle of the connection line of the two groups of guide rails 23.

[0054] Preferably, a ball 233 is rollably embedded on the slider 232, and the ball 233 is in rolling contact with the inner wall of the sliding rail 231 to convert the sliding friction between the slider 232 and the sliding rail 231 into rolling friction, so as to improve the flexibility of the movement of the shielding rod 11.

[0055] Obviously, the above embodiments of the present utility model are merely examples for clearly illustrating the present utility model, rather than limitations on the implementation manners of the present utility model. For those of ordinary skill in the art, various obvious changes, re-adjustments and substitutions can be made without departing from the protection scope of the present utility model. It is not necessary and impossible to enumerate all the implementation manners here. Any modifications, equivalent substitutions and improvements made within the spirit and principle of the present utility model shall be included in the protection scope of the claims of the present utility model.

Claims

1. A CVD film deposition apparatus, including a shielding frame, the shielding frame is a rectangular frame structure, characterized in that, The shielding frame includes shielding rods, and at least four shielding rods are provided. Both ends of each shielding rod are inclined planes. Two adjacent shielding rods are arranged in an L shape and their ends are in contact with each other. The four shielding rods are all in the same horizontal plane and shield above the substrate. Among them, the four shielding rods have at least a first position and a second position. When each shielding rod is in the first position, the ends of adjacent shielding rods are in contact with each other to enclose the film-forming area of the substrate. When each shielding rod is in the second position, there is a gap between the ends of adjacent shielding rods to enclose the placement area of the substrate.

2. The CVD film deposition apparatus according to claim 1, wherein The shielding rod includes a shielding part and an adjusting part. When the shielding rod is in the first position, the shielding part is located above the substrate, and the shielding part shields the non-film-forming area of the substrate. The adjusting part is connected to the shielding part, and the adjusting part is attached to the substrate so that the substrate is at the center of the placement area.

3. The CVD film deposition apparatus according to claim 2, characterized in that, The upper end surface of the shielding part is a guiding surface, and the guiding surface gradually slopes downward from the side away from the placement area towards the side of the placement area.

4. The CVD film deposition apparatus according to any one of claims 1 to 3, characterized in that, The CVD film deposition device further includes a chamber. A vertically movable base is provided in the chamber. A support is provided in the base and penetrates through the inner bottom wall of the chamber. The top of the support is located above the upper end surface of the base. The substrate is placed on the top of the support.

5. The CVD film deposition apparatus according to claim 4, wherein An elastic connecting member is provided between the base and the shielding rod. The elastic connecting member pulls the shielding rods to gather or move away from each other along the center of the placement area through the lifting of the base. Guide members for guiding the horizontal movement of the shielding rods are correspondingly provided on the inner wall of the chamber.

6. The CVD film deposition apparatus according to claim 5, characterized in that, The elastic connecting member includes a frame body and an elastic member. The frame body is provided on the upper end surface of the base. One end of the elastic member is connected to the frame body, and the other end of the elastic member is connected to the outside of the shielding rod.

7. The CVD film deposition apparatus according to claim 6, characterized in that, The guide member includes a guide rail. The guide rail includes a slide rail and a slider. The slide rail is provided on one of the inner wall of the chamber and the shielding rod, and the slider is provided on the other. The slide rail extends along the direction perpendicular to the length of the shielding rod, and the slider is slidably embedded in the slide rail.

8. The CVD film deposition apparatus according to claim 7, wherein The elastic member is located between two sets of the guide rails.

9. The CVD film deposition apparatus according to claim 7, wherein Two guide rails are provided on each shielding rod, and the two guide rails are spaced along the length direction of the corresponding shielding rod.

10. The CVD film deposition apparatus according to claim 9, characterized in that, The slider is rollably embedded with balls, and the balls are in rolling contact with the inner wall of the slide rail.

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