Vacuum end structure for low-temperature vacuum pump
By designing the multi-stage cold screen structure and barrier adsorption array of low-temperature vacuum pumps, the problem of unstable vacuum environment is solved, and a high and clean and stable vacuum state is achieved, providing a reliable vacuum environment for semiconductor processing.
Patent Information
- Application Number
- CN202421643367.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-11
- Publication Date
- 2025-07-04
- Estimated Expiration
- 2034-07-11
AI Technical Summary
During the use of existing low-temperature vacuum pumps, the vacuum environment effect is not ideal, and external factors can easily cause temperature or vacuum fluctuations, the vacuum state is unstable, and the semiconductor processing accuracy is affected.
The vacuum end structure design includes a shell, a barrier, a first cold screen, a second cold screen, a first adsorption array and a second adsorption array is adopted. The multi-stage cold screen structure reduces the influence of heat radiation, and sets up the barrier for initial adsorption and condensation, increases the gas contact area, and extends the service life of the adsorption array.
It quickly establishes and maintains a high and clean vacuum environment, ensures the stability of the vacuum state, and improves the accuracy and efficiency of semiconductor processing.
Smart Images
Figure CN223062600U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of vacuum equipment, and particularly relates to a vacuum end structure for a cryogenic vacuum pump. Background Art
[0002] Due to its advantages such as high vacuum degree, high cleanliness, large gas capacity, and fast pumping speed, cryogenic vacuum pumps are gradually widely used in the research and production of semiconductors and integrated circuits. Especially in the semiconductor processing process, the requirements for vacuum degree and dust-free environment are relatively high. However, at present, during the use of cryogenic vacuum pumps, the generated vacuum environment effect is not ideal, and the temperature or vacuum degree is prone to fluctuate due to the influence of external factors, and the vacuum state is unstable, thus affecting the processing accuracy. Therefore, this application provides a vacuum end structure for a cryogenic vacuum pump. Summary of the Utility Model
[0003] The purpose of the utility model is to provide a vacuum end structure for a cryogenic vacuum pump to solve the existing technical problems in the above background art.
[0004] To solve the above technical problems, the technical solution provided by the utility model is as follows: A vacuum end structure for a cryogenic vacuum pump is provided, including a housing, a baffle plate, a first cold shield, a second cold shield, a first adsorption array, and a second adsorption array. The baffle plate is arranged at the inner top end of the housing. The first cold shield is fixedly arranged on the inner side wall of the housing and is located below the baffle plate. The second cold shield is arranged inside the first cold shield. The first adsorption array is arranged between the first cold shield and the second cold shield. The second adsorption array is arranged inside the second cold shield. Adsorption materials are arranged on the surfaces of the baffle plate, the first adsorption array, and the second adsorption array for the condensation or adsorption of gas molecules at low temperatures.
[0005] Based on the above technical solution, a gap is arranged between the outer side wall of the first cold shield and the inner side wall of the housing, and ventilation holes are arranged at the bottom end of the first cold shield.
[0006] Based on the above technical solution, the shape of the first cold shield is adapted to the inner side wall of the housing. The second cold shield includes a plurality of annular baffles, and the annular baffles are uniformly arranged along the axial direction of the first cold shield from top to bottom.
[0007] Based on the above technical solution, the annular baffle includes an end plate and an annular side plate. The annular side plate is fixedly arranged on the side wall of the end plate, and the annular side plate is inclined with the end plate and the included angle is set as an obtuse angle.
[0008] Based on the above technical solution, adsorption materials are also arranged on the surface of the annular baffle.
[0009] On the basis of the above technical solution, the baffle includes multiple groups of symmetrically arranged baffle blades, and the baffle blades are all inclined.
[0010] On the basis of the above technical solution, the first adsorption array includes multiple adsorption sheets, and the adsorption sheets are all inclined inward and are evenly arranged circumferentially along the first cold shield.
[0011] On the basis of the above technical solution, the second adsorption array includes an outer shell plate and a support frame. The support frame is fixedly arranged inside the second cold shield. The outer shell plate surrounds the outside of the support frame and is evenly provided with long strip holes on the outer shell plate.
[0012] On the basis of the above technical solution, the adsorption sheet and the annular baffle are arranged in a perpendicular relationship.
[0013] The beneficial effects produced by the technical solution provided by the present invention are as follows:
[0014] The present invention provides a vacuum end structure for a cryogenic vacuum pump, which can quickly achieve the required vacuum environment for the cryogenic pump and ensure the stability of the vacuum state, providing a highly clean vacuum environment for semiconductor processing; by providing a first cold shield 3 and a second cold shield 4, that is, a multi-stage cold shield structure, the influence of environmental thermal radiation on the condensation and adsorption of gas by the adsorption array structure can be reduced, ensuring the stability of the vacuum state; by providing a baffle 2 inside the cold shield, the adsorbed gas can be preliminarily adsorbed and condensed, and at the same time, the direct impact of the gas on the second adsorption array 5 and the first adsorption array 6 inside the baffle can be reduced, extending the service life of the first adsorption array 5 and the second adsorption array 6; by providing two-stage adsorption of the second adsorption array and the first adsorption array, the effective contact area of the gas can be increased, that is, the gas condensation or adsorption area can be increased, reducing the influence of the direct radiation heat of the vacuum chamber on the vacuum state and quickly achieving the required vacuum state. Description of the Drawings
[0015] Figure 1 is the overall structural schematic diagram of the present invention;
[0016] Figure 2 is the internal structural schematic diagram of the cold shield and the adsorption array structure in the present invention;
[0017] Figure 3 is the structural schematic diagram of the baffle in the present invention;
[0018] Figure 4 is the three-dimensional structural schematic diagram of the first adsorption array and the second cold shield in the present invention;
[0019] Figure 5 is the structural schematic diagram of the second cold shield and the second adsorption array in the present invention;
[0020] Figure 6It is a schematic structural diagram of the second adsorption array in the utility model; Specific embodiments
[0021] The following further describes the present utility model in conjunction with the accompanying drawings and embodiments:
[0022] In the present utility model, unless otherwise clearly defined and limited, terms such as "installation", "connection", "connection", "fixation", etc. shall be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can be directly connected, or indirectly connected through an intermediate medium, and can be the communication inside two components or the interaction relationship between two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.
[0023] In the description of the present utility model, it should be understood that the orientation or positional relationship indicated by terms such as "left", "right", "front", "rear", "top", "bottom", etc. is based on the orientation or positional relationship shown in the accompanying drawings, and is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present utility model.
[0024] As Figures 1 to 6 shown, a vacuum end structure for a cryogenic vacuum pump includes a housing 1, a baffle 2, a first cold shield 3, a second cold shield 4, a first adsorption array 5, and a second adsorption array 6. The baffle 2 is arranged at the inner top of the housing 1. The first cold shield 3 is fixedly arranged on the inner side wall of the housing 1 and is located below the baffle 2. The second cold shield 4 is arranged inside the first cold shield 3. The first adsorption array 5 is arranged between the first cold shield 3 and the second cold shield 4. The second adsorption array 6 is arranged inside the second cold shield 4. Adsorption materials are arranged on the surfaces of the baffle 2, the first adsorption array 5, and the second adsorption array 6 for the condensation or adsorption of gas molecules at low temperatures.
[0025] The present utility model provides a vacuum end structure for a cryogenic vacuum pump, which can quickly achieve the required vacuum environment for the cryogenic pump and ensure the stability of the vacuum state, providing a highly clean vacuum environment for semiconductor processing; by providing a first cold screen 3 and a second cold screen 4, namely a multi-stage cold screen structure, the influence of environmental thermal radiation on the condensation and adsorption of gases by the adsorption array structure can be reduced, ensuring the stability of the vacuum state; by providing a baffle 2 inside the cold screen, the adsorbed gases can be preliminarily adsorbed and condensed, and at the same time, the direct impact of the gases on the second adsorption array 5 and the first adsorption array 6 inside the baffle can be reduced, prolonging the service life of the first adsorption array 5 and the second adsorption array 6; by providing two-stage adsorption of the second adsorption array and the first adsorption array, the effective contact area of the gases can be increased, that is, the gas condensation or adsorption area can be increased, reducing the influence of the direct radiant heat of the vacuum chamber on the vacuum state and quickly achieving the required vacuum state; at the same time, it is also convenient for assembly and reduces the processing accuracy.
[0026] It should be noted that the inner and outer sides, upper and lower sides mentioned above are described according to the directions in the accompanying drawings of the specification, which are only for the convenience of describing and understanding the technical solution and do not constitute a limitation to this application.
[0027] Based on the above technical solution, a gap is provided between the outer side wall of the first cold screen 3 and the inner side wall of the housing 1, and ventilation holes are provided at the bottom end of the first cold screen 3.
[0028] In a preferred embodiment, a gap is provided between the housing 1 and the first cold screen 3 to form an auxiliary gas passage. In this way, during the gas flow, the gas can directly enter the adsorption array structure after passing through the baffle, and at the same time, part of the gas can also enter the adsorption array through the auxiliary gas passage and the ventilation holes, so that the gas molecules can be quickly and effectively adsorbed to reach the required vacuum state.
[0029] Based on the above technical solution, the outer side wall of the first cold screen 3 is adapted to the inner side wall of the housing 1, and the second cold screen 4 includes a plurality of annular baffles 41, and the annular baffles 41 are uniformly arranged along the axis of the first cold screen 3 from top to bottom.
[0030] Based on the above technical solution, the annular baffle 41 includes an end plate 411 and an annular side plate 412, the annular side plate 412 is fixedly arranged on the side wall of the end plate 411, and the annular side plate 412 is inclined with the end plate 411 and the included angle is set as an obtuse angle.
[0031] Preferably, the inclined annular side plate 412 can reflect a part of the thermal radiation, reducing the adverse influence of the heat on the temperature and the vacuum degree and reducing the fluctuation of the vacuum degree.
[0032] Based on the above technical solution, the surface of the annular baffle 41 is also provided with an adsorption material.
[0033] By providing the first cold screen 3 and the second cold screen 4, the influence of ambient thermal radiation on the condensation of the adsorption array structure and the adsorbed gas can be reduced, ensuring the stability of the vacuum state; especially by providing the structure of the second cold screen 4, wherein the second cold screen 4 is provided with a plurality of annular baffles 41, and a plurality of them are uniformly arranged axially from top to bottom along the cold screen. With such an arrangement, the plurality of vertical adsorption sheets 51 of the first adsorption array 5 and the plurality of horizontal annular baffles 41 in the second cold screen 4 form a cross state, which can effectively increase the gas adsorption area and quickly achieve a high-vacuum state; at the same time, reduce the thermal radiation of the adsorption array, lower the radiation heat load on its surface, and ensure the stability of the vacuum environment. More preferably, without affecting the gas flow, the larger the inclination angle of the annular baffle and the smaller the distance between the annular baffles, the better its thermal shielding performance, the smaller the radiation degree on the surface of the adsorption array, the lower the radiation heat load on its surface, achieving a better thermal shielding effect, and at the same time not affecting the normal gas passage flow, and the vacuum stability is better.
[0034] More preferably, the outer surface of the annular baffle 41 is also provided with an adsorption material; it can adsorb gas molecules, provide assistance for quickly achieving a high-vacuum state, and also ensure the stability of the vacuum environment.
[0035] More preferably, in this application, the adsorption material uses activated carbon such as porous coconut shell activated carbon, which has a large specific surface area and can efficiently adsorb gas to quickly achieve a low-temperature vacuum state. The adsorption material can be obtained from the prior art, and this utility model does not involve the improvement of the material of the adsorption material.
[0036] On the basis of the above technical solution, the baffle 2 includes a plurality of groups of symmetrically arranged baffle blades 21, and the baffle blades 21 are all inclined.
[0037] On the basis of the above technical solution, the first adsorption array 5 includes a plurality of adsorption sheets 51, and the adsorption sheets 51 are all inclined inward and are uniformly arranged circumferentially around the first cold screen 4.
[0038] On the basis of the above technical solution, the second adsorption array 6 includes a housing plate 61 and a support frame 62. The support frame 62 is fixedly arranged inside the second cold screen 4, the housing plate 61 surrounds the outside of the support frame 62, and long strip holes 63 are uniformly arranged on the housing plate 61.
[0039] Preferably, the baffle 2 is provided with a plurality of inclined baffle blades 21, which are arranged at the top relative to the first adsorption array 5. A first adsorption structure can be formed when gas enters, enabling gas adsorption and reducing the impact of the gas on the internal structure, thereby extending the service life. The first adsorption array 5 is provided with a plurality of adsorption sheets 51. More preferably, the adsorption sheets 51 are inclined and a plurality of them are uniformly arranged along the circumference of the cold shield, that is, a plurality of adsorption sheets 51 are arranged vertically, which can effectively adsorb gas and the inclined adsorption sheets 51 can increase the gas contact area, quickly achieving a high-vacuum state. The second adsorption array 6 is provided with a support frame 62 and an outer shell plate 61. Preferably, the outer shell plate 61 is rectangular in shape, which can improve the effective contact area, is easy to process and assemble at the same time. After the gas enters, it can flow through the long holes 63 on the outer shell plate 61. Combining the adsorption materials provided on the surfaces of the outer shell plate 61 and the support frame 62, the gas analysis can be quickly adsorbed, achieving a high-vacuum state quickly and forming a stable vacuum state during operation.
[0040] Based on the above technical solution, the adsorption sheet 51 and the annular baffle 41 are arranged in a perpendicular relationship.
[0041] In a preferred embodiment, the second cold shield 4 is provided with a plurality of annular baffles 41, and a plurality of them are uniformly arranged along the axis of the cold shield from top to bottom. In this way, the plurality of vertical adsorption sheets 51 of the first adsorption array 5 and the plurality of horizontal annular baffles 41 in the second cold shield 4 form an intersecting state, which can effectively increase the gas adsorption area and quickly achieve a high-vacuum state; at the same time, it reduces the thermal radiation of the adsorption array and the radiation heat load on its surface, ensuring the stability of the vacuum environment. It should be noted that the vertical relationship between the adsorption sheet 51 and the annular baffle 41 in this embodiment means that the adsorption sheet 51 is arranged vertically as a whole and the annular baffle 41 is arranged horizontally as a whole, that is, they are arranged in a perpendicular relationship. However, in a more preferred embodiment, both the adsorption sheet and the annular side plate of the annular baffle are inclined to increase the effective gas adsorption area, and they are still arranged in a perpendicular relationship in terms of the overall structure.
[0042] The above shows and describes the basic principles and main features of the present invention. For those skilled in the art, it is obvious that the present invention is not limited to the details of the above exemplary embodiments. Therefore, the embodiments should be regarded as exemplary and non-limiting. The scope of the present invention is defined by the appended claims rather than the above description. Therefore, it is intended to include all changes falling within the meaning and scope of the equivalent elements of the claims in the present invention.
[0043] In addition, it should be understood that although this specification is described in terms of embodiments, not every embodiment contains only one independent technical solution. This narrative style of the specification is only for clarity. Those skilled in the art should regard the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.
Claims
1. A vacuum end structure for a cryogenic vacuum pump, characterized in that, It includes a housing (1), a baffle (2), a first cold shield (3), a second cold shield (4), a first adsorption array (5) and a second adsorption array (6). The baffle (2) is arranged at the inner top end of the housing (1). The first cold shield (3) is fixedly arranged on the inner side wall of the housing (1) and is located below the baffle (2). The second cold shield (4) is arranged inside the first cold shield (3). The first adsorption array (5) is arranged between the first cold shield (3) and the second cold shield (4). The second adsorption array (6) is arranged inside the second cold shield (4). Adsorption materials are arranged on the surfaces of the baffle (2), the first adsorption array (5) and the second adsorption array (6) for the condensation or adsorption of gas molecules at low temperatures.
2. The vacuum end structure for a cryogenic vacuum pump according to claim 1, characterized in that, A gap is arranged between the outer side wall of the first cold shield (3) and the inner side wall of the housing (1), and ventilation holes are arranged at the bottom end of the first cold shield (3).
3. The vacuum end structure for a cryogenic vacuum pump according to claim 1, characterized in that, The shape of the first cold shield (3) is adapted to the inner side wall of the housing (1). The second cold shield (4) includes a plurality of annular baffles (41), and the annular baffles (41) are uniformly arranged along the axis of the first cold shield (3) from top to bottom.
4. The vacuum end structure for a cryogenic vacuum pump according to claim 3, characterized in that, The annular baffle (41) includes an end plate (411) and an annular side plate (412). The annular side plate (412) is fixedly arranged on the side wall of the end plate (411), and the annular side plate (412) is inclined with the end plate (411) and the included angle is set as an obtuse angle.
5. The vacuum end structure for a cryogenic vacuum pump according to claim 1, characterized in that, The surface of the annular baffle (41) is also provided with an adsorption material.
6. The vacuum end structure for a cryogenic vacuum pump according to claim 1, characterized in that, The baffle (2) includes multiple groups of symmetrically arranged baffle blades (21), and the baffle blades (21) are all inclined.
7. The vacuum end structure for a cryogenic vacuum pump according to claim 3, characterized in that, The first adsorption array (5) includes a plurality of adsorption sheets (51), and the adsorption sheets (51) are all inclined inwards and are uniformly arranged along the circumference of the first cold shield (4).
8. A vacuum end structure for a cryogenic vacuum pump according to claim 1, characterized in that, The second adsorption array (6) includes an outer shell plate (61) and a support frame (62). The support frame (62) is fixedly arranged inside the second cold shield (4). The outer shell plate (61) surrounds the outside of the support frame (62) and long strip holes (63) are uniformly arranged on the outer shell plate (61).
9. The vacuum end structure for a cryogenic vacuum pump according to claim 7, characterized in that, The adsorption sheet (51) and the annular baffle (41) are arranged in a perpendicular relationship.