Roll-to-roll normal pressure deposition equipment and roll-to-roll normal pressure deposition system

Abstract

The utility model discloses roll-to-roll normal-pressure deposition equipment and a roll-to-roll normal-pressure deposition system, and relates to the technical field of thin film deposition. The reel-to-reel normal pressure deposition equipment comprises an unwinding mechanism, a reaction device and a winding mechanism, the reaction device is provided with a material belt channel and a plurality of function chambers connected in sequence, and the material belt channel sequentially penetrates through the function chambers; the multiple functional chambers comprise an ALD deposition chamber, two positive pressure isolation chambers, two negative pressure backflow chambers and two positive pressure drying chambers, the two positive pressure isolation chambers are located at the two ends of the material belt channel respectively, the two negative pressure backflow chambers are connected with the two positive pressure isolation chambers respectively, the two positive pressure drying chambers are connected with the two negative pressure backflow chambers respectively, and the two negative pressure drying chambers are connected with the two negative pressure backflow chambers respectively. The ALD deposition chamber is located between the two positive pressure drying chambers. The roll-to-roll normal-pressure deposition equipment provided by the utility model can be used for carrying out ALD deposition on the flexible substrate in a normal-pressure environment, so that the film layer growth efficiency and growth quality of the flexible substrate are remarkably improved.

Description

Technical Field

[0001] The utility model relates to the technical field of thin film deposition, and in particular, to a roll-to-roll atmospheric pressure deposition device and a roll-to-roll atmospheric pressure deposition system. Background Art

[0002] Depositing a film layer on a substrate by using the ALD deposition process has the characteristic of high production efficiency. Due to the high requirements for the deposition environment, all the current ALD devices on the market need to perform deposition in a vacuum environment.

[0003] However, some flexible substrates including perovskite batteries need to be coated under atmospheric pressure, and the existing ALD devices are not applicable. The film forming processes for such flexible substrates mainly include coating, annealing, printing, etc. under atmospheric pressure, which have problems of low process efficiency and poor film layer compactness. Summary of the Utility Model

[0004] The purpose of the utility model is to provide a roll-to-roll atmospheric pressure deposition device, which can perform ALD deposition on a flexible substrate under an atmospheric pressure environment, thereby significantly improving the film layer growth efficiency and compactness of the flexible substrate and growing a film layer with better quality.

[0005] Another purpose of the utility model is to provide a roll-to-roll atmospheric pressure deposition system, which can perform ALD deposition on a flexible substrate under an atmospheric pressure environment, thereby significantly improving the film layer growth efficiency and compactness of the flexible substrate and growing a film layer with better quality.

[0006] An embodiment of the utility model provides a technical solution:

[0007] A roll-to-roll atmospheric pressure deposition device includes an unwinding mechanism, a reaction device and a winding mechanism. The reaction device has a tape passage and a plurality of functional chambers arranged in sequence along the tape passage. The plurality of functional chambers communicate with the tape passage. The unwinding mechanism is used for unwinding a flexible substrate, and the winding mechanism is used for winding the flexible substrate after unwinding and passing through the tape passage.

[0008] The plurality of functional chambers include an ALD deposition chamber, two positive pressure isolation chambers, two negative pressure reflux chambers and two positive pressure drying chambers. Along the extending direction of the tape passage, at one end of the tape passage, a positive pressure isolation chamber, a negative pressure reflux chamber and a positive pressure drying chamber are arranged in sequence. At the other end of the tape passage, a positive pressure drying chamber, a negative pressure reflux chamber and a positive pressure isolation chamber are arranged in sequence. The ALD deposition chamber is between the two positive pressure drying chambers. The positive pressure isolation chamber is used for continuously introducing an isolation gas, the positive pressure drying chamber is used for continuously introducing a drying gas, and the negative pressure reflux chamber is used for sucking the isolation gas and the drying gas and discharging them to the outside.

[0009] In the roll-to-roll atmospheric pressure deposition equipment provided by the embodiment of the present utility model, since a positive pressure isolation chamber, a negative pressure reflux chamber and a positive pressure drying chamber are respectively arranged at both ends of the tape channel, the positive pressure isolation chamber continuously introduces an isolation gas to form an isolation gas atmosphere field, preventing external air from entering the ALD deposition chamber at both ends of the tape channel; the positive pressure drying chamber continuously introduces a drying gas to form a drying gas atmosphere field, preventing water molecules from entering the ALD deposition chamber at both ends of the tape channel; the negative pressure reflux chamber evacuates the excess isolation gas and drying gas to maintain the stable positive pressure state of the isolation gas atmosphere field and the drying gas atmosphere field. It can be seen that the combination of the positive pressure isolation chamber, the negative pressure reflux chamber and the positive pressure drying chamber at both ends of the tape channel ensures that no polluted gas or water molecules enter the ALD deposition chamber, ensuring that the deposition environment of the ALD deposition chamber meets the standards, enabling ALD deposition on a flexible substrate in an atmospheric pressure environment, significantly improving the film growth efficiency and density of the flexible substrate, and obtaining a film with higher quality.

[0010] The embodiment of the present utility model further provides a roll-to-roll atmospheric pressure deposition system, including the aforementioned roll-to-roll atmospheric pressure deposition equipment. The roll-to-roll atmospheric pressure deposition equipment includes an unwinding mechanism, a reaction device and a winding mechanism. The reaction device has a tape channel and a plurality of functional chambers arranged in sequence along the tape channel. The plurality of functional chambers communicate with the tape channel. The unwinding mechanism is used for unwinding a flexible substrate, and the winding mechanism is used for winding the flexible substrate after unwinding and passing through the tape channel.

[0011] Among the plurality of functional chambers, there are an ALD deposition chamber, two positive pressure isolation chambers, two negative pressure reflux chambers and two positive pressure drying chambers. Along the extension direction of the tape channel, at one end of the tape channel, a positive pressure isolation chamber, a negative pressure reflux chamber and a positive pressure drying chamber are arranged in sequence, and at the other end of the tape channel, a positive pressure drying chamber, a negative pressure reflux chamber and a positive pressure isolation chamber are arranged in sequence. The ALD deposition chamber is located between the two positive pressure drying chambers. The positive pressure isolation chamber is used for continuously introducing an isolation gas, the positive pressure drying chamber is used for continuously introducing a drying gas, and the negative pressure reflux chamber is used for sucking the isolation gas and the drying gas and discharging them to the outside.

[0012] Benefiting from the beneficial effects of the roll-to-roll atmospheric pressure deposition equipment, the roll-to-roll atmospheric pressure deposition system provided by the embodiment of the present utility model also has the characteristics of being able to significantly improve the film growth efficiency and growth quality of the flexible substrate. Description of the Drawings

[0013] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and should not be regarded as limiting the scope. For those of ordinary skill in the art, without creative efforts, other related drawings can also be obtained based on these drawings.

[0014] Figure 1 Schematic structural diagram of the roll-to-roll atmospheric pressure deposition equipment provided for the embodiments of the present invention;

[0015] Figure 2 For Figure 1 Schematic structural diagram of the ALD deposition chamber in

[0016] Icons: 100 - roll-to-roll atmospheric pressure deposition equipment; 110 - unwind mechanism; 120 - reaction device; 121 - tape channel; 122 - ALD deposition chamber; 123 - positive pressure isolation chamber; 124 - negative pressure reflux chamber; 125 - positive pressure drying chamber; 126 - preheating chamber; 1261 - preheating module; 127 - feed slit module; 128 - discharge slit module; 129 - transition slit module; 130 - winding mechanism; 200 - ALD system; 210 - spraying module; 211 - first spraying member; 212 - second spraying member; 213 - third spraying member; 214 - air extraction member; 220 - heating module. Detailed implementation manners

[0017] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some, but not all, of the embodiments of the present invention. Generally, the components of the embodiments of the present invention described and shown in the accompanying drawings here can be arranged and designed in various different configurations.

[0018] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the present invention claimed, but merely represents the selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of protection of the present invention.

[0019] It should be noted that: similar reference numerals and letters denote similar items in the following drawings. Therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings.

[0020] In the description of the present utility model, it should be understood that the orientation or positional relationships indicated by the terms "upper", "lower", "inner", "outer", "left", "right", etc. are based on the orientation or positional relationships shown in the drawings, or the orientation or positional relationships in which the products of the present utility model are customarily placed during use, or the orientation or positional relationships commonly understood by those skilled in the art. These are only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the indicated devices or elements must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as a limitation to the present utility model.

[0021] In addition, the terms "first", "second", etc. are only used for distinguishing descriptions and should not be construed as indicating or implying relative importance.

[0022] In the description of the present utility model, it should also be noted that unless otherwise clearly specified and defined, terms such as "arrangement" and "connection" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the communication inside two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0023] The following will describe in detail the specific embodiments of the present utility model with reference to the drawings.

[0024] Embodiment

[0025] Please refer to Figure 1 , Figure 1 which shows a schematic structural diagram of the roll-to-roll atmospheric pressure deposition device 100 provided in this embodiment.

[0026] The roll-to-roll atmospheric pressure deposition device 100 provided in this embodiment includes an unwinding mechanism 110, a reaction device 120, and a winding mechanism 130. The unwinding mechanism 110 is used for unwinding a flexible substrate, and the winding mechanism 130 is used for winding the flexible substrate. The reaction device 120 is arranged between the unwinding mechanism 110 and the winding mechanism 130 and is used for allowing the flexible substrate to pass through and performing ALD deposition on the flexible substrate during the passing process, so as to grow a film layer on the surface of the flexible substrate.

[0027] The reaction device 120 has a tape channel 121 and a plurality of functional chambers. The plurality of functional chambers are connected in sequence, and the tape channel 121 passes through the plurality of functional chambers in sequence. In practical applications, the flexible substrate unwound by the unwinding mechanism 110 passes through the tape channel 121 and is then wound by the winding mechanism 130. During the process of passing through the tape channel 121, the flexible substrate passes through the plurality of functional chambers in sequence, and the plurality of functional chambers have different processing functions.

[0028] Specifically, among the multiple functional chambers, there is an ALD deposition chamber 122. An ALD system 200 is provided in the ALD deposition chamber 122. During the process of the flexible substrate passing through the ALD deposition chamber 122, the ALD system 200 performs thin film deposition processing on the flexible substrate.

[0029] In order to ensure that the deposition environment in the ALD deposition chamber 122 meets the standards and prevent air and water molecules from entering and affecting the deposition reaction, in this embodiment, the multiple functional chambers further include two positive pressure isolation chambers 123, two negative pressure reflux chambers 124, and two positive pressure drying chambers 125. The two positive pressure isolation chambers 123 are respectively located at both ends of the tape channel 121. The two negative pressure reflux chambers 124 are respectively connected to the two positive pressure isolation chambers 123. The two positive pressure drying chambers 125 are respectively connected to the two negative pressure reflux chambers 124. The ALD deposition chamber 122 is located between the two positive pressure drying chambers 125.

[0030] The two positive pressure isolation chambers 123 are respectively located at both ends of the tape channel 121, which can be understood as the openings at both ends of the tape channel 121 are respectively opened on the opposite sides of the two positive pressure isolation chambers 123. The two negative pressure reflux chambers 124 are respectively connected to the two positive pressure isolation chambers 123. In other words, the two negative pressure reflux chambers 124 are respectively located on the two sides close to each other of the two positive pressure isolations. Similarly, the two positive pressure drying chambers 125 are respectively located on the two sides close to each other of the two negative pressure reflux chambers 124.

[0031] Specifically, the positive pressure isolation chamber 123 is used to continuously introduce isolation gas, so as to form an isolation gas atmosphere field in the positive pressure isolation chamber 123; the positive pressure drying chamber 125 is used to continuously introduce drying gas, so as to form a drying gas atmosphere field in the positive pressure drying chamber 125; the negative pressure reflux chamber 124 is used to suck the excess isolation gas in the adjacent positive pressure isolation chamber 123 and the excess drying gas in the adjacent positive pressure drying chamber 125, and discharge them to the outside.

[0032] It can be understood that at any end of the tape channel 121, the continuous introduction of isolation gas in the positive pressure isolation chamber 123 can continuously discharge outward from the opening of the tape channel 121, thereby isolating the environmental air from entering the tape channel 121. The excess part of the isolation gas introduced into the positive pressure isolation chamber 123 is sucked into the negative pressure reflux chamber 124 by the tape channel 121. The positive pressure isolation chamber 123 continuously introduces, and the negative pressure reflux chamber 124 continuously discharges outward, so as to maintain the isolation gas atmosphere field in the positive pressure isolation chamber 123 in a stable state.

[0033] Similarly, the positive-pressure drying chamber 125 continuously introduces drying gas, which can be understood as the isolated gas after drying treatment, to prevent water molecules from flowing along the tape channel 121 into the ALD deposition chamber 122. The drying gas is continuously introduced into the positive-pressure drying chamber 125, and the excess drying gas is then sucked into the negative-pressure reflux chamber 124 through the tape channel 121 and then discharged to the outside, so that the drying gas atmosphere field in the positive-pressure drying chamber 125 maintains a stable state.

[0034] It can be seen that in the roll-to-roll atmospheric-pressure deposition equipment 100 provided in this embodiment, on the reaction device 120, a protection combination is formed by a positive-pressure isolation chamber 123, a negative-pressure reflux chamber 124, and a positive-pressure drying chamber 125. The two protection combinations are respectively arranged at both ends of the tape channel 121. The ALD deposition chamber 122 is located between the two protection combinations. The two protection combinations play a role in blocking the outside air and water molecules from entering the ALD deposition chamber 122 from both ends of the tape channel 121, ensuring a clean and dry reaction environment in the ALD deposition chamber 122, and realizing the ALD deposition conditions under atmospheric pressure.

[0035] In practical applications, after the flexible substrate is unrolled by the unrolling mechanism 110, when it enters the reaction device 120 from one end of the tape channel 121 and passes through the protection combination formed by the corresponding positive-pressure isolation chamber 123, negative-pressure reflux chamber 124, and positive-pressure drying chamber 125, on the one hand, this protection combination avoids the entry of environmental air, water molecules, and other impurities into the tape channel 121, and on the other hand, it also realizes the purging of the surface of the flexible substrate. The impurities that may affect the deposition reaction on the surface of the flexible substrate can also be cleaned up during this process, further ensuring the stability and reliability of the subsequent deposition process.

[0036] The plurality of functional chambers further include a preheating chamber 126. The preheating chamber 126 is connected to one side of the ALD deposition chamber 122, and a preheating module 1261 for heating the flexible substrate is provided in the preheating chamber 126. In practical applications, the flexible substrate enters the tape channel 121 from the end where the preheating module 1261 is located, ensuring that the flexible substrate can pass through the preheating chamber 126 before entering the ALD deposition chamber 122. After the flexible substrate is heated by the preheating module 1261 in the preheating chamber 126 to the temperature meeting the deposition requirements, it then enters the ALD deposition for thin-film deposition, ensuring the deposition quality.

[0037] In this embodiment, the heating module 220 includes two heating units arranged at intervals, and the tape channel 121 is located between the two heating units. When the flexible substrate passes through the heating module 220, the two heating units simultaneously heat the two side surfaces of the flexible substrate, ensuring the uniformity of heat reception in different regions of the flexible substrate, improving the preheating efficiency, and further enhancing the deposition effect. The preheating module 1261 can be an electric heater. By controlling the input power of the preset module, the heating effect can be adjusted, thereby adjusting the preheating temperature of the flexible substrate.

[0038] In this embodiment, one of the two positive-pressure drying chambers 125 is connected to the ALD deposition chamber 122 through the preheating chamber 126. In other words, after the flexible substrate enters the tape channel 121, it sequentially passes through a positive-pressure isolation chamber 123, a negative-pressure reflux chamber 124, and a positive-pressure drying chamber 125 and then directly enters the preheating chamber 126, and enters the ALD deposition chamber 122 after passing through the preheating chamber 126. In other embodiments, according to actual application conditions, one or more functional chambers can also be arranged between the preheating chamber 126 and the positive-pressure drying chamber 125.

[0039] Moreover, in this embodiment, the side of the ALD deposition chamber 122 facing away from the preheating chamber 126 is directly connected to the positive-pressure drying chamber 125 at the other end of the tape channel 121. In other words, after passing through the ALD deposition chamber 122, the flexible substrate sequentially passes through a positive-pressure drying chamber 125, a negative-pressure reflux chamber 124, and a positive-pressure isolation chamber 123 and then leaves the tape channel 121, that is, leaves the reaction device 120 and further moves towards the winding mechanism 130. In other embodiments, one or more functional chambers can also be arranged on the side of the ALD deposition chamber 122 facing away from the preheating chamber 126, upstream of the corresponding positive-pressure drying chamber 125, to achieve more functions.

[0040] For example, in another embodiment, at least one functional chamber with a different deposition principle can be arranged downstream of the ALD deposition chamber 122. In this embodiment, after the flexible substrate undergoes ALD deposition in the ALD deposition chamber 122, thin film deposition under other principles is performed, so as to form different film layer structures on the flexible substrate.

[0041] To ensure the relative independence inside the reaction device 120 as much as possible, in this embodiment, a feed slit module 127 is provided on the side of one of the two positive-pressure isolation chambers 123 facing away from the ALD deposition chamber 122, and the feed slit module 127 is communicated with one end of the tape channel 121. An outlet slit module 128 is provided on the side of the remaining positive-pressure isolation chamber 123 facing away from the ALD deposition chamber 122, and the outlet slit module 128 is communicated with the other end of the tape channel 121.

[0042] It can be understood that the feed slit module 127 is disposed at the input port of the tape channel 121, that is, on the side of the preheating chamber 126 away from the ALD deposition chamber 122. The discharge slit module 128 is disposed at the output port of the tape channel 121, that is, on the side of the ALD deposition chamber 122 away from the preheating chamber 126. In practical applications, the flexible substrate after being unwound by the unwinding mechanism 110 first enters the input port of the tape channel 121 through the feed slit module 127, and then passes through a plurality of functional chambers in sequence, and then leaves the output port of the tape channel 121 through the discharge slit module 128.

[0043] The feed slit module 127 and the discharge slit module 128 are respectively disposed on two opposite sides of the two positive pressure isolation chambers 123. In practical applications, during the continuous introduction of the isolation gas into the two positive pressure isolation chambers 123, the isolation gas in one of the positive pressure isolation chambers 123 continuously flows out to the outside through the feed slit module 127, and the isolation gas in the remaining positive pressure isolation chamber 123 continuously flows out to the outside through the discharge slit module 128, thereby preventing the outside air from entering both ends of the tape channel 121.

[0044] In order to achieve the maximum independence of adjacent functional chambers, in this embodiment, a transition slit module 129 is provided between any two adjacent functional chambers, and the tape channel 121 passes through a plurality of transition slit modules 129 in sequence. In this embodiment, the positive pressure isolation chamber 123 and the negative pressure reflux chamber 124, the negative pressure reflux chamber 124 and the positive pressure drying chamber 125, the positive pressure drying chamber 125 and the ALD deposition chamber 122, and the ALD deposition chamber 122 and the positive pressure drying chamber 125 on the other side are all connected through the transition slit module 129.

[0045] It can be seen that in this embodiment, a plurality of functional chambers are connected in sequence, and a slit module is provided between adjacent functional chambers to make way for the tape channel 121. On the one hand, the compactness of the overall structure is ensured, and on the other hand, the relative independence between different functional chambers is ensured, avoiding excessive mixing of the gases in adjacent functional chambers.

[0046] In practical applications, during the continuous introduction of the isolation gas into any positive pressure isolation chamber 123, in addition to part of the isolation gas flowing out to the outside through the feed slit module 127, part of the isolation gas also continuously flows into the negative pressure reflux chamber 124 through the transition slit module 129 between the positive pressure isolation chamber 123 and the negative pressure reflux chamber 124, and is thus discharged to the outside by the negative pressure reflux chamber 124.

[0047] Similarly, for the positive-pressure drying chamber 125 between the negative-pressure reflux chamber 124 and the preheating chamber 126, during the continuous introduction of the drying gas, a part of the drying gas flows into the negative-pressure reflux chamber 124 through the transition slit module 129 between the positive-pressure drying chamber 125 and the negative-pressure reflux chamber 124, and is thus discharged to the outside by the negative-pressure reflux chamber 124. Another part of the drying gas flows into the preheating chamber 126 through the transition slit module 129 between the positive-pressure drying chamber 125 and the preheating chamber 126.

[0048] For the positive-pressure drying chamber 125 between the ALD deposition chamber 122 and the negative-pressure reflux chamber 124, during the continuous introduction of the drying gas, a part of the drying gas flows into the negative-pressure reflux chamber 124 through the transition slit module 129 between the positive-pressure drying chamber 125 and the negative-pressure reflux chamber 124, and is thus discharged to the outside by the negative-pressure reflux chamber 124. Another part of the drying gas flows into the ALD deposition chamber 122 through the transition slit module 129 between the positive-pressure drying chamber 125 and the ALD deposition chamber 122.

[0049] Preferably, in this embodiment, the isolation gas is nitrogen, and the drying gas is nitrogen that has been treated for water removal. In other embodiments, the isolation gas and the drying gas can also be adjusted according to actual application conditions.

[0050] Please refer to Figure 2 , Figure 2 which shows a schematic structural diagram inside the ALD deposition chamber 122.

[0051] An ALD system 200 is provided inside the ALD deposition chamber 122. The ALD system 200 can perform atomic layer deposition on the flexible substrate passing through the ALD deposition chamber 122. The ALD system 200 includes a spray module 210 and a heating module 220 that are arranged at intervals, and the tape channel 121 passes between the spray module 210 and the heating module 220.

[0052] It can be understood that the spray module 210 is used to spray the reaction gas in regions along the tape channel 121 during the process of the flexible substrate passing between the spray module 210 and the heating module 220, so that the flexible substrate sequentially passes through different reaction gas atmosphere fields, and thus film deposition is completed on its surface.

[0053] During the process of the flexible substrate passing between the spray module 210 and the heating module 220, the heating module 220 continuously heats the flexible substrate to maintain the process temperature. For the convenience of precise control of the heating temperature, the heating module 220 can also be an electric heater.

[0054] In this embodiment, the spraying module 210 includes a first spraying member 211, a second spraying member 212, a third spraying member 213 and an air extraction member 214. A plurality of first spraying members 211 and second spraying members 212 are arranged alternately along the strip channel 121 in sequence, and a third spraying member 213 and an air extraction member 214 are arranged between any adjacent first spraying member 211 and second spraying member 212.

[0055] It should be noted that the first spraying member 211 and the second spraying member 212 are respectively used to spray different reaction gases participating in the deposition reaction, so as to alternately form a plurality of reaction gas atmosphere fields on the strip channel 121. The third spraying member 213 is used to spray the isolation gas, so as to form an isolation gas atmosphere field between any adjacent two reaction gas atmosphere fields, realizing the effective isolation of different reaction gas atmosphere fields.

[0056] The air extraction member 214 is used to extract the excess reaction gas and isolation gas from the strip channel 121 between two reaction gas atmosphere fields, realizing the reflux of the reaction gas and the isolation gas, avoiding gas residue, further preventing the cross-contamination of different reaction gases, and ensuring the purity and uniformity of the deposited thin film.

[0057] Preferably, in the arrangement queue composed of a plurality of first spraying members 211 and a plurality of second spraying members 212, both the head and the end of the arrangement queue are first spraying members 211. In fact, the first spraying member 211 in this embodiment is used to spray the oxygen source gas to form an oxygen source gas atmosphere field. The second spraying member 212 is used to spray the metal source gas to form a metal source gas atmosphere field. By arranging the first spraying members 211 at both the head and the end of the arrangement queue, two oxygen source gas atmosphere fields are formed at both ends of the arrangement queue, limiting the metal source gas sprayed out by all the second spraying members 212 inside the arrangement queue, and avoiding the escape of the metal source gas to the non-deposition area to generate dust.

[0058] In this embodiment, a third spraying member 213 and an air extraction member 214 are arranged at both ends of the arrangement queue composed of a plurality of first spraying members 211 and a plurality of second spraying members 212, that is, in addition to the first spraying members 211 arranged at the head and the end of the arrangement queue, a third spraying member 213 and an air extraction member 214 are also arranged. The purpose is to isolate the two end regions of the ALD deposition chamber 122 from the region where the deposition reaction occurs in the middle, and avoid other gases in the ALD deposition chamber 122 from entering the deposition reaction region along the strip channel 121, thereby affecting the quality of the deposited thin film.

[0059] Moreover, in this embodiment, whether at both ends of the arrangement queue or between any adjacent first spraying members 211 and second spraying members 212, a third spraying member 213 and two air extraction members 214 are arranged. And in the extending direction of the strip channel 121, the third spraying member 213 is located between the two air extraction members 214. In practical applications, in the area between adjacent first spraying members 211 and second spraying members 212, one of the two air extraction members 214 can extract the reaction gas sprayed by the adjacent first spraying member 211 and the isolation gas sprayed by the adjacent third spraying member 213; the remaining one of the two air extraction members 214 can extract the reaction gas sprayed by the adjacent second spraying member 212 and the isolation gas sprayed by the adjacent third spraying member 213. Thereby, it avoids the isolation gas from entering the reaction gas atmosphere field and also avoids the mixing of two adjacent reaction gases.

[0060] In this embodiment, multiple first spraying members 211 are in the same first pipeline system, and the first pipeline system has a first main pipeline that extends out of the ALD deposition chamber 122. The first main pipeline is used to externally connect a reaction gas supply source, so that after the corresponding reaction gas is input into the first pipeline system, it is branched to multiple first spraying members 211, so that the multiple first spraying members 211 spray at different positions on the strip channel 121 to form multiple reaction gas atmosphere fields with the same composition. In this embodiment, the reaction gas sprayed by the first spraying member 211 is an oxygen source gas, forming an oxygen source gas atmosphere field.

[0061] Similarly, multiple second spraying members 212 are in the same second pipeline system, and the second pipeline system has a second main pipeline that extends out of the ALD deposition chamber 122. The second main pipeline is used to externally connect another reaction gas supply source, so that after the corresponding reaction gas is input into the second pipeline system, it is branched to multiple second spraying members 212, and the multiple second spraying members 212 respectively spray to form multiple reaction gas atmosphere fields with another composition. In this embodiment, the reaction gas sprayed by the second spraying member 212 is a metal source gas, forming a metal source gas atmosphere field.

[0062] Multiple third spraying members 213 are in the same third pipeline system, and the third pipeline system has a third main pipeline that extends out of the ALD deposition chamber 122. The third main pipeline is used to externally connect an isolation gas supply source, so that after the corresponding isolation gas is input into the third pipeline system, it is branched to multiple third spraying members 213. In this embodiment, the isolation gas is nitrogen gas that has undergone water treatment. In other embodiments, other gases other than nitrogen can also be selected as the isolation gas according to actual application conditions.

[0063] Multiple air extraction components 214 are in the same air extraction system, and the air extraction system has an air extraction main pipeline that extends out of the ALD deposition chamber 122. The air extraction main pipeline is used to externally connect an air extraction device and can achieve synchronous air extraction of multiple air extraction components 214.

[0064] It can be understood that during the process of the flexible substrate passing through the ALD deposition chamber 122, the flexible substrate will sequentially and alternately pass through different reaction gas atmosphere fields, and multiple deposition reactions will occur on the surface of the flexible substrate, thereby forming multiple film layers. Limited by the sizes of the ALD deposition chamber 122 and the spraying module 210, if the required thickness of the flexible substrate film layer is relatively large, the synchronous forward and reverse rotation of the unwinding mechanism 110 and the winding mechanism 130 can be controlled to enable the same area on the flexible substrate to move back and forth in the ALD deposition chamber 122 multiple times, thereby achieving multiple film layer depositions. Finally, a film layer with the required thickness is obtained before leaving the ALD deposition chamber 122.

[0065] In the roll-to-roll atmospheric pressure deposition apparatus 100 provided in this embodiment, a protection combination composed of a positive pressure isolation chamber 123, a negative pressure return chamber 124, and a positive pressure drying chamber 125 is arranged at both ends of the tape channel 121. In any protection combination, the positive pressure isolation chamber 123 continuously introduces an isolation gas to form an isolation gas atmosphere field to prevent external air from entering the ALD deposition chamber 122; the positive pressure drying chamber 125 continuously introduces a drying gas to form a drying gas atmosphere field to prevent water molecules from entering the ALD deposition chamber 122; the negative pressure return chamber 124 extracts the excess isolation gas and drying gas to maintain the stable positive pressure state of the isolation gas atmosphere field and the drying gas atmosphere field.

[0066] It can be seen that the roll-to-roll atmospheric pressure deposition apparatus 100 provided in this embodiment can ensure that no polluted gas or water molecules enter the ALD deposition chamber 122, ensure that the deposition environment of the ALD deposition chamber 122 meets the standards, can achieve ALD deposition on the flexible substrate under an atmospheric pressure environment, significantly improve the film layer growth efficiency and denseness of the flexible substrate, and thus obtain a film layer with higher quality.

[0067] In addition, this embodiment also provides a roll-to-roll atmospheric pressure deposition system, including the aforementioned roll-to-roll atmospheric pressure deposition apparatus 100. The roll-to-roll atmospheric pressure deposition system further includes an isolation gas supply source, a drying gas supply source, an air extraction device, an oxygen source gas supply source, a metal source gas supply source, etc. The isolation gas supply source is connected to the two positive pressure isolation chambers 123 and multiple third spraying components 213 through pipelines; the drying gas supply source is connected to the two positive pressure drying chambers 125 through pipelines; the air extraction device is connected to the two negative pressure return chambers 124 and multiple air extraction components 214; the oxygen source gas supply source is connected to multiple first spraying components 211 through pipelines; the metal source gas supply source is connected to multiple second spraying components 212 through pipelines.

[0068] Benefiting from the beneficial effects of the roll-to-roll atmospheric deposition apparatus 100, the roll-to-roll atmospheric deposition system provided in this embodiment also has the characteristics of being able to significantly improve the film growth efficiency and growth quality of flexible substrates.

[0069] The above are only the preferred embodiments of the present invention and are not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and changes. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A roll-to-roll atmospheric pressure deposition device, characterized in that, The invention comprises an unwinding mechanism (110), a reaction device (120) and a rewinding mechanism (130), wherein the reaction device (120) has a material belt channel (121) and a plurality of functional chambers, wherein the plurality of functional chambers are connected in sequence, and the material belt channel (121) passes through the plurality of functional chambers in sequence; the unwinding mechanism (110) is used for unwinding a flexible substrate, and the rewinding mechanism (130) is used for rewinding the flexible substrate after unwinding and passing through the material belt channel (121); The multiple functional chambers include an ALD deposition chamber (122), two positive pressure isolation chambers (123), two negative pressure reflow chambers (124) and two positive pressure drying chambers (125). The two positive pressure isolation chambers (123) are respectively located at the two ends of the material belt channel (121), the two negative pressure reflow chambers (124) are respectively connected to the two positive pressure isolation chambers (123), the two positive pressure drying chambers (125) are respectively connected to the two negative pressure reflow chambers (124), and the ALD deposition chamber (122) is located between the two positive pressure drying chambers (125). The positive pressure isolation chamber (123) is used to continuously introduce isolation gas, the positive pressure drying chamber (125) is used to continuously introduce drying gas, and the negative pressure reflow chamber (124) is used to extract the isolation gas and the drying gas and discharge them to the outside.

2. The roll-to-roll atmospheric pressure deposition equipment according to claim 1, wherein, The plurality of functional chambers also include a preheating chamber (126), wherein the preheating chamber (126) is connected to a side of the ALD deposition chamber (122) close to the unwinding mechanism (110), and a preheating module (1261) for heating the flexible substrate is disposed in the preheating chamber (126).

3. The roll-to-roll atmospheric pressure deposition apparatus according to claim 2, wherein The positive pressure drying chamber (125) located between the unwinding mechanism (110) and the ALD deposition chamber (122) is connected to a side of the preheating chamber (126) facing away from the ALD deposition chamber (122).

4. The roll-to-roll atmospheric deposition equipment according to claim 3, wherein The side of the ALD deposition chamber (122) facing away from the preheating chamber (126) is connected to the remaining positive pressure drying chamber (125).

5. The roll-to-roll atmospheric pressure deposition equipment according to claim 1, characterized in that, An ALD system (200) is arranged in the ALD deposition chamber (122), wherein the ALD system (200) comprises a spray module (210) and a heating module (220) which are arranged at intervals, and the material belt channel (121) passes through between the spray module (210) and the heating module (220).

6. The roll-to-roll atmospheric deposition apparatus according to claim 5, characterized in that, The spray module (210) comprises a first spray component (211), a second spray component (212), a third spray component (213) and an exhaust component (214); a plurality of first spray components (211) and second spray components (212) are alternately arranged in sequence along the material belt channel (121); and the third spray component (213) and the exhaust component (214) are arranged between any adjacent first spray components (211) and second spray components (212).

7. The roll-to-roll atmospheric pressure deposition equipment according to claim 6, wherein, In the arrangement queue composed of a plurality of the first spraying members (211) and a plurality of the second spraying members (212), the first spraying members (211) are provided at both the head end and the tail end of the arrangement queue, and the third spraying members (213) and the air extraction members (214) are arranged at both ends of the arrangement queue.

8. The roll-to-roll atmospheric pressure deposition equipment according to claim 1, characterized in that, One of the two positive pressure isolation chambers (123) is provided with a feed slit module (127) on a side facing away from the ALD deposition chamber (122), and the feed slit module (127) communicates with one end of the tape channel (121); The remaining one of the positive pressure isolation chambers (123) is provided with a discharge slit module (128) on a side facing away from the ALD deposition chamber (122), and the discharge slit module (128) communicates with the other end of the tape channel (121).

9. The roll-to-roll atmospheric pressure deposition equipment according to claim 1, characterized in that A transition slit module (129) is provided between any two adjacent functional chambers, and the tape channel (121) sequentially passes through a plurality of the transition slit modules (129).

10. A roll-to-roll atmospheric pressure deposition system, characterized in that, Comprising a roll-to-roll atmospheric pressure deposition apparatus (100) according to any one of claims 1-9.

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