Adsorption type graphite boat

Abstract

The adsorption type graphite boat comprises a plurality of graphite boat sheets which are connected together, each graphite boat sheet is provided with an adsorption groove, a clamping point structure and an airflow channel, and the adsorption grooves are communicated with the airflow channels; the clamping point structure comprises a shell, a movable limiting block and an elastic piece connected with the limiting block, a negative pressure cavity is formed in the shell and communicates with the airflow channel, and one end of the limiting block is arranged in the negative pressure cavity; the elastic piece drives the limiting block to limit the silicon wafer on the graphite boat sheet; and the negative pressure cavity drives the limiting block to release the silicon wafer. Compared with the prior art, the adsorption type graphite boat not only can limit and fix the silicon wafer on the graphite boat, but also cannot shield and contact the silicon wafer, so that the film coating effect of the silicon wafer is prevented from being influenced.

Description

Technical Field

[0001] The utility model belongs to the technical field of graphite boats, and particularly relates to an adsorption type graphite boat. Background Art

[0002] During the coating process, clamping points need to be set on the graphite boat slices to fix the silicon wafers and prevent the silicon wafers from falling off during the coating process. During the deposition process, the silicon wafers will inevitably come into contact with the clamping points and be blocked by the clamping points, which will cause the film thickness to be thin and color difference to appear at the positions of the silicon wafers opposite to the clamping points, resulting in the situation of clamping point marks. In severe cases, fragments, scratches, burnt color difference, and EL black spots will be formed, affecting the battery efficiency.

[0003] In the graphite boat slice provided by the authorized announcement number CN209418475U, the silicon wafers are jointly fixed by positioning columns and grooves with vacuum adsorption functions. Compared with the traditional clamping points, although this fixing structure can reduce the shielding area of the silicon wafers, since there are no structures such as grooves on the positioning columns to limit the silicon wafers, the silicon wafers cannot be stably attached to the graphite boat slice, and it is difficult to adsorb and fix the silicon wafers when adsorbing the silicon wafers. In addition, during the coating process, the positioning columns will still come into contact with the silicon wafers, which will affect the film thickness, refractive index, etc. in the vicinity of the contact area, thus affecting the battery efficiency. Summary of the Utility Model

[0004] The purpose of the utility model is to overcome the deficiencies in the prior art and provide an adsorption type graphite boat.

[0005] To achieve the above purpose, the utility model discloses an adsorption type graphite boat, which includes a plurality of connected graphite boat slices. The graphite boat slice is provided with an adsorption groove, a clamping point structure, and an air flow channel, and the adsorption groove is communicated with the air flow channel;

[0006] The clamping point structure includes a shell, a movable limiting block, and an elastic member connected to the limiting block. A negative pressure cavity is arranged in the shell, the negative pressure cavity is communicated with the air flow channel, and one end of the limiting block is arranged in the negative pressure cavity;

[0007] The elastic member drives the limiting block to limit the silicon wafer on the graphite boat slice;

[0008] The negative pressure cavity drives the limiting block to release the silicon wafer.

[0009] Preferably, the air flow channel includes a main air duct and a first branch duct and a second branch duct communicated with the main air duct. The first branch duct and the second branch duct are respectively communicated with the adsorption groove and the negative pressure cavity.

[0010] Preferably, there are a plurality of adsorption grooves, and the plurality of adsorption grooves are evenly distributed.

[0011] Preferably, the air flow channel is arranged inside or outside the graphite boat slice.

[0012] Preferably, the limiting block is in sliding or rotational fit with the housing.

[0013] Preferably, an installation cavity is provided in the housing, and the installation cavity has an opening; the limiting block is slidably arranged in the installation cavity, and the limiting block is in sealing fit with the inner wall of the installation cavity to form the negative pressure cavity.

[0014] Preferably, a first limiting portion is provided in the installation cavity, and the limiting block is provided with a second limiting portion that is in limiting fit with the first limiting portion.

[0015] Preferably, the limiting block is rotatably connected to the housing or the graphite boat sheet, and one end of the limiting block is in sealing fit with the housing to form the negative pressure cavity.

[0016] Preferably, the limiting block is provided with a plug that cooperates with the air flow channel.

[0017] Preferably, an avoidance groove is provided at the end of the limiting block, and the depth of the avoidance groove is not less than the thickness of the silicon wafer.

[0018] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0019] The traditional fixed clamping point is set as a movable limiting block, and an elastic member is connected to the limiting block. The elastic member drives the limiting block to limit the silicon wafer on the graphite boat sheet. In this way, the silicon wafer can still be fixed during the processes of loading, feeding, and unloading, avoiding damage to the silicon wafer due to vibration. After the silicon wafer is limited by the limiting block, it can ensure the distance between the silicon wafer and the graphite boat sheet, enabling the adsorption groove to adsorb the silicon wafer during vacuum adsorption, avoiding too large a distance between the silicon wafer and the graphite boat sheet, resulting in the adsorption groove being unable to adsorb and fix the graphite boat sheet, and causing the silicon wafer to fall and be damaged when the limiting block releases the silicon wafer.

[0020] During film coating, a negative pressure is formed in the adsorption groove and the negative pressure cavity through the air flow channel. At this time, the negative pressure cavity drives the limiting block to release the silicon wafer. During the process of the limiting block releasing the silicon wafer, the suction force of the adsorption groove can adsorb and fix the silicon wafer, avoiding the silicon wafer from falling. Therefore, during the film coating process, the limiting block neither blocks the silicon wafer nor contacts the silicon wafer, solving the influence of the existing clamping point on the film coating of the silicon wafer. Description of the Drawings

[0021] Figure 1 Is the front view of the adsorption type graphite boat in Embodiment 1;

[0022] Figure 2 Is Figure 1 The side view of the adsorption type graphite boat in;

[0023] Figure 3 Is Figure 1 The partial structural schematic diagram of the adsorption type graphite boat in;

[0024] Figure 4Schematic diagram of an adsorption graphite boat with a limiting block adopting a sliding structure and in a limiting state;

[0025] Figure 5 is Figure 4 Schematic diagram of an adsorption graphite boat with the limiting block in a released state in

[0026] Figure 6 is Figure 4 Schematic diagram of the clamping point structure in

[0027] Figure 7 is Figure 6 Cross-sectional view of the clamping point structure in a limiting state in

[0028] Figure 8 is Figure 6 Cross-sectional view of the clamping point structure in a released state in

[0029] Figure 9 Schematic diagram of an adsorption graphite boat with a limiting block adopting a rotating structure and in a limiting state;

[0030] Figure 10 is Figure 9 Schematic diagram of an adsorption graphite boat with the limiting block in a released state in

[0031] Graphite boat sheet 1; adsorption groove 11; air flow channel 12; main air duct 121; first branch duct 122; second branch duct 123; process groove 13; boat leg 14; first air hole 141;

[0032] Ceramic rod 2;

[0033] Clamping point structure 3; housing 31; installation cavity 311; negative pressure cavity 312; opening 313; second air hole 314; first limiting part 315; limiting block 32; plug 321; avoidance groove 322; second limiting part 323; elastic part 33;

[0034] Silicon wafer 4. Specific embodiments

[0035] To make the above objects, features, and advantages of the present utility model more obvious and understandable, the present utility model will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0036] An adsorption graphite boat, see Figures 1 - 2 , including a plurality of graphite boat sheets 1 connected together. The plurality of graphite boat sheets 1 are connected by existing connection structures, such as ceramic rods 2 and ceramic rings, and their connection will not be elaborated here.

[0037] See Figure 3, the graphite boat piece 1 is provided with an adsorption groove 11, a plurality of clamping point structures 3 and an air flow channel 12. One end of the air flow channel 12 is communicated with the adsorption groove 11, and the other end is communicated with a vacuum pump. When the vacuum pump is started, a negative pressure can be generated in the adsorption groove 11, so that the silicon wafer 4 can be adsorbed and fixed.

[0038] Among them, in this embodiment, a process groove 13 is provided at the middle position of the graphite boat piece 1. The process groove 13 can reduce the weight and material consumption of the graphite boat piece 1 and lower the cost. An arc-shaped adsorption groove 11 is provided on the outer side of each of the four corners of the process groove 13. When the vacuum pump is started, the negative pressure in the four arc-shaped grooves can adsorb and fix the silicon wafer. It can be understood that the number and position of the adsorption grooves 11 can be set as required, as long as the silicon wafer can be adsorbed and fixed, and it is not limited to the above settings.

[0039] See Figures 4 - 10 , the clamping point structure 3 includes a housing 31, a movable limiting block 32 and an elastic member 33 connected to the limiting block 32. The housing 31 is connected to the graphite boat piece 1, and a negative pressure chamber 312 is provided inside it. The negative pressure chamber 312 is also communicated with the air flow channel 12, and one end of the limiting block 32 is arranged in the negative pressure chamber 312. The elastic member 33 is preferably a spring. During the processes of loading, feeding, and unloading, the elastic member 33 drives the limiting block 32 to limit the silicon wafer on the graphite boat piece 1. In this way, the silicon wafer can still be fixed during the processes of loading, feeding, and unloading, avoiding damage to the silicon wafer due to vibration. After the silicon wafer is limited by the limiting block 32, this can ensure the distance between the silicon wafer and the graphite boat piece 1, so that the adsorption groove 11 can adsorb the silicon wafer during vacuum adsorption, avoiding too large a distance between the silicon wafer and the graphite boat piece 1, resulting in the adsorption groove 11 being unable to adsorb and fix the graphite boat piece 1, and causing the silicon wafer to fall and be damaged when the limiting block 32 releases the silicon wafer. During film coating, a negative pressure is formed in the adsorption groove 11 and the negative pressure chamber 312 through the air flow channel 12. At this time, the negative pressure chamber 312 drives the limiting block 32 to release the silicon wafer. During the process of the limiting block 32 releasing the silicon wafer, the suction force of the adsorption groove 11 can adsorb and fix the silicon wafer, avoiding the silicon wafer from falling. Thus, during the film coating process, the limiting block 32 neither blocks the silicon wafer nor contacts the silicon wafer, solving the influence of the existing clamping points on the film coating of the silicon wafer.

[0040] In this embodiment, see Figure 3, the air flow channel 12 includes a main air duct 121, a first branch duct 122, and a second branch duct 123. One end of the main air duct 121 communicates with the first branch duct 122 and the second branch duct 123, and the other end communicates with a vacuum pump. The first branch duct 122 and the second branch duct 123 communicate with the adsorption tank 11 and the negative pressure chamber 312 respectively. By setting the main air duct 121 to communicate with the vacuum pump, and the first branch duct 122 and the second branch duct 123 to communicate with the adsorption tank 11 and the negative pressure chamber 312 respectively, negative pressure can be generated in the adsorption tank 11 and the negative pressure chamber 312 simultaneously, enabling the adsorption and fixation action of the adsorption tank 11 and the release action of the limit block 32 to be carried out simultaneously. This avoids the situation where the adsorption tank 11 fails to adsorb and fix the silicon wafer during the coating process, resulting in the silicon wafer falling and being damaged, and also avoids the limit block 32 failing to release the silicon wafer, causing the limit block 32 to block the silicon wafer and affecting the coating effect.

[0041] In this embodiment, referring to Figure 1 , Figure 3 , the air flow channel 12 is provided inside the graphite boat sheet 1. The air flow channels 12 of multiple graphite boat sheets 1 are connected through boat legs 14, etc. The boat legs 14 are provided with multiple first air holes 141. After the graphite boat is placed in the process tube, the first air holes 141 are connected to a specially made vacuum pipeline inside the process tube. In other embodiments, the air flow channel 12 can also be provided outside the graphite boat sheet 1.

[0042] In this embodiment, the limit block 32 is in sliding fit or rotational fit with the housing 31.

[0043] Referring to Figures 4 - 8 , an installation cavity 311 is provided inside the housing 31. The installation cavity 311 has an opening 313. The limit block 32 is slidably arranged inside the installation cavity 311. The limit block 32 is in sealing fit with the inner wall of the installation cavity 311, thereby separating the above-mentioned negative pressure chamber 312 inside the installation cavity 311. An elastic member 33 is arranged inside the negative pressure chamber 312. One end of it is connected to the inner wall of the installation cavity 311, and the other end is connected to the limit block 32. In the normal state, the elastic member 33 can push the limit block 32 to extend out of the installation cavity 311 to limit the silicon wafer (as shown in Figure 4 , Figures 6 - 7 ). The housing 31 is provided with a second air hole 314 that communicates the negative pressure chamber 312 and the air flow channel 12. When the vacuum pump works, the vacuum pump generates negative pressure inside the installation cavity 311 through the air flow channel 12 and the second air hole 314. The negative pressure drives the limit block 32 to retract into the installation cavity 311, thereby releasing the silicon wafer and avoiding blocking or contacting the silicon wafer (as shown in Figure 5 , Figure 8 ).

[0044] Among them, referring to Figures 7 - 8, a first limiting portion 315 is provided at the opening 313 position of the installation cavity 311. The limiting block 32 is provided with a second limiting portion 323 that is in limiting cooperation with the first limiting portion 315. In the normal state, the second limiting portion 323 can be in limiting cooperation with the first limiting portion 315 to prevent the limiting block 32 from being pushed out of the installation cavity 311 by the elastic member 33.

[0045] See Figures 9 - 10 , the limiting block 32 is rotatably connected to the graphite boat sheet 1. Of course, it can also be rotatably connected to the housing 31. One end of the limiting block 32 is in sealing cooperation with the housing 31 to form a negative pressure cavity 312. In the normal state, the elastic member 33 can push the limiting block 32 to rotate until it abuts against the graphite boat sheet 1, so as to limit the silicon wafer (such as Figure 9 shown). When the vacuum pump is started, the vacuum pump generates a negative pressure in the negative pressure cavity 312 through the air flow channel 12. The negative pressure drives the limiting block 32 to rotate until the rotating block disengages from the silicon wafer and does not block the silicon wafer, thereby releasing the silicon wafer and avoiding blocking and contacting the silicon wafer (such as Figure 10 shown).

[0046] See Figures 9 - 10 , the limiting block 32 is provided with a plug 321 for blocking the air flow channel 12. When a negative pressure is generated in the negative pressure cavity 312 to adsorb the limiting block 32, the limiting block 32 can rotate to block the air flow channel 12, which can improve the sealing performance between the air flow channel 12 and the negative pressure cavity 312 and the adsorption and fixing effect of the limiting block 32.

[0047] In this embodiment, see Figure 4 or Figure 9 , the end of the limiting block 32 is provided with an avoidance groove 322, and the depth of the avoidance groove 322 is not less than the thickness of the silicon wafer. When limiting the silicon wafer, the limiting block 32 limits the silicon wafer through its avoidance groove 322.

[0048] Obviously, the above-mentioned embodiments of the present invention are merely examples for clearly explaining the present invention, rather than limiting the implementation manners of the present invention. For those of ordinary skill in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to enumerate all the implementation manners here. Any modifications, equivalent replacements, and improvements made within the spirit and principle of the present invention shall be included in the protection scope of the claims of the present invention.

Claims

1. An adsorption graphite boat, characterized in that: It includes a plurality of connected graphite boat sheets, and adsorption grooves, clamping point structures and air flow channels are provided on the graphite boat sheets, and the adsorption grooves are communicated with the air flow channels; The clamping point structure includes a housing, a movable limiting block and an elastic member connected to the limiting block. A negative pressure chamber is provided in the housing, the negative pressure chamber is communicated with the air flow channel, and one end of the limiting block is arranged in the negative pressure chamber; The elastic member drives the limiting block to limit the silicon wafer on the graphite boat sheet; The negative pressure chamber drives the limiting block to release the silicon wafer.

2. The adsorption graphite boat according to claim 1, wherein: The air flow channel includes a main air duct and a first branch duct and a second branch duct communicated with the main air duct. The first branch duct and the second branch duct are respectively communicated with the adsorption groove and the negative pressure chamber.

3. The adsorption graphite boat according to claim 1, wherein: There are a plurality of the adsorption grooves, and the plurality of adsorption grooves are evenly distributed.

4. The adsorption graphite boat according to claim 1, characterized in that: The air flow channel is arranged inside or outside the graphite boat sheet.

5. The adsorption graphite boat according to claim 1, characterized in that: The limiting block is in sliding fit or rotational fit with the housing.

6. The adsorption graphite boat according to claim 1, wherein: An installation cavity is provided in the housing, and the installation cavity has an opening; the limiting block is slidably arranged in the installation cavity, and the limiting block is in sealing fit with the inner wall of the installation cavity to form the negative pressure chamber.

7. The adsorption graphite boat according to claim 6, characterized in that: A first limiting portion is provided in the installation cavity, and a second limiting portion for limiting cooperation with the first limiting portion is provided on the limiting block.

8. The adsorption graphite boat according to claim 1, characterized in that: The limiting block is rotatably connected to the housing or the graphite boat sheet, and one end of the limiting block is in sealing fit with the housing to form the negative pressure chamber.

9. The adsorption graphite boat according to any one of claims 1-8, characterized in that: The limiting block is provided with a plug for cooperating with the air flow channel.

10. The adsorption graphite boat according to any one of claims 1-8, characterized in that: A relief groove is provided at the end of the limiting block, and the depth of the relief groove is not less than the thickness of the silicon wafer.

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