Debugging appliance, debugging system, mask bearing device and particulate matter detection equipment

Abstract

The utility model discloses a debugging appliance, a debugging system, a mask plate bearing device and particulate matter detection equipment, the debugging appliance is used for debugging a reflective photoelectric sensor on a mask plate bearing table, the mask plate bearing table is used for bearing a mask plate, and the mask plate bearing table is used for bearing the mask plate. The reflective photoelectric sensor is used for identifying the mask on the mask bearing table, and the debugging appliance comprises a transparent substrate for debugging and a handle; the transparent substrate and the mask plate are made of the same material, and the transparent substrate is used for being placed on the mask plate bearing table or taken down from the mask plate bearing table when the reflective photoelectric sensor is debugged; the handle is connected with the first surface of the transparent substrate; the transparent substrate is further provided with a second surface opposite to the first surface in position, and the second surface of the transparent substrate is used for abutting against the mask bearing table.

Description

Technical Field

[0001] This application relates to the field of lithography, and more particularly to a debugging device, a debugging system, a mask carrier device, and a particle detection device. Background Art

[0002] In the process of semiconductor manufacturing, the lithography process is used in a large number of steps to lithograph wafers. A mask is used in the lithography process to replicate the pattern on the mask onto the wafer. During application, before and after lithography, it is necessary to detect particles on the upper and lower surfaces of the mask to confirm whether there are particles on the surface of the mask.

[0003] The device used for particle detection is a particle detection device. The particle detection device includes a mask carrier stage, a particle detection device, and a sensor disposed on the mask carrier stage. The sensor is used to identify whether a mask is placed on the mask carrier stage. After the sensor identifies that a mask is placed on the mask carrier stage, the particle detection device can detect the particles on the surface of the mask on the mask carrier stage. The sensor on the mask carrier stage usually uses a reflective photoelectric sensor. Before the particle detection device works, a debugging device is required to debug the sensor so that the sensor can identify the mask.

[0004] After debugging the sensor using the debugging device in the related art, the recognition effect of the mask with an opaque outer region is good, but the recognition effect of the mask with a transparent outer region is unstable and unreliable. There may be a situation where the mask with a transparent outer region cannot be recognized, resulting in the downtime of the particle detection device. Summary of the Invention

[0005] This application is proposed to solve the above problems. According to one aspect of this application, a debugging device is provided. The debugging device is used to debug a reflective photoelectric sensor on a mask carrier stage. Wherein, the mask carrier stage is used to carry a mask, and the reflective photoelectric sensor is used to identify the mask on the mask carrier stage. The debugging device includes: a transparent substrate for debugging, and a handle, which is made of the same material as the mask; the transparent substrate is used to be placed on or removed from the mask carrier stage when debugging the reflective photoelectric sensor; the handle is connected to the first surface of the transparent substrate; wherein, the transparent substrate further has a second surface opposite to the position of the first surface, and the second surface of the transparent substrate is used to abut against the mask carrier stage.

[0006] In an embodiment of this application, the transparent substrate has a light transmittance of more than 90% for light with a wavelength below 200 nm.

[0007] In one embodiment of the present application, the thermal expansion coefficient of the transparent substrate is 0.4-0.6 ppm / °C, and the hardness of the transparent substrate is 515-715.

[0008] In one embodiment of the present application, the transparent substrate is a transparent quartz glass plate.

[0009] In one embodiment of the present application, the handle includes: a gripping portion, a first connecting portion, and a second connecting portion; wherein the gripping portion has a first end and a second end opposite to each other in a length direction; the first connecting portion is arranged at the first end of the gripping portion, and the first connecting portion is used to connect to the first surface of the transparent substrate; the second connecting portion is arranged at the second end of the gripping portion, and the second connecting portion is used to connect to the first surface of the transparent substrate.

[0010] In one embodiment of the present application, the first connecting portion is connected to the first surface of the transparent substrate by glue, and the second connecting portion is connected to the first surface of the transparent substrate by glue.

[0011] In one embodiment of the present application, the handle is a plastic handle.

[0012] According to the second aspect of the present application, a debugging system for a mask carrier is also provided, wherein the mask carrier includes a mask carrier platform and a reflective photoelectric sensor arranged on the mask carrier platform; the debugging system includes: any one of the debugging tools described above.

[0013] According to the third aspect of the present application, a mask plate carrier device with a debugging device is also provided, and the mask plate carrier device includes: a mask plate carrier platform, a reflective photoelectric sensor, and any one of the above-mentioned debugging devices; wherein the mask plate carrier platform is used to carry at least one mask plate; the mask plate has a pattern area and a peripheral area; at least part of the peripheral area of at least one of the mask plates is transparent; the reflective photoelectric sensor is arranged on the mask plate carrier platform, and is used to identify the mask plate on the mask plate carrier platform.

[0014] According to the fourth aspect of the present application, a particle detection device is also provided, which includes: a particle detection device, and any one of the above-mentioned mask plate carrier devices with debugging equipment; wherein the particle detection device is used to detect particles on the surface of the mask plate on the mask plate carrier platform.

[0015] According to the debugging device, debugging system, mask carrier device and particulate matter detection device provided by the embodiments of the present application, a transparent substrate for debugging is provided. The transparent substrate is used to be placed on or removed from the mask carrier table when debugging a reflective optoelectronic sensor. After debugging the reflective optoelectronic sensor using the debugging device shown in the present application, not only is the recognition effect of the mask with an opaque peripheral area good, but also the recognition effect of the mask with a transparent peripheral area is stable and reliable, avoiding the situation where the particulate matter detection device crashes due to the inability to recognize the mask with a transparent peripheral area. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following will briefly introduce the drawings required for the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0017] Figure 1 Schematic perspective view of a debugging device shown in an embodiment of the present application;

[0018] Figure 2 For Figure 1 Left view of the debugging device shown;

[0019] Figure 3 For Figure 1 Front view of the debugging device shown;

[0020] Figure 4 For Figure 1 Top view of the debugging device shown;

[0021] Figure 5 Top view schematic of a mask shown in an embodiment of the present application;

[0022] Figure 6 Schematic diagram of the working principle of a reflective optoelectronic sensor shown in an embodiment of the present application;

[0023] Figure 7 Schematic diagram of the light transmission of diffuse reflection.

[0024] Reference numerals:

[0025] 10 - transparent substrate, 11 - first surface, 12 - second surface

[0026] 20 - holding part, 21 - first connecting part, 22 - second connecting part

[0027] 30 - mask, 31 - pattern area, 32 - peripheral area DETAILED DESCRIPTION

[0028] To make the objectives, technical solutions, and advantages of the present application more apparent, exemplary embodiments according to the present application will be described in detail below with reference to the accompanying drawings. It is obvious that the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments of the present application. It should be understood that the present application is not limited by the exemplary embodiments described herein. Based on the embodiments of the present application described herein, all other embodiments obtained by those skilled in the art without creative efforts should fall within the protection scope of the present application.

[0029] In the following description, numerous specific details are given to provide a more thorough understanding of the present application. However, it is obvious to those skilled in the art that the present application can be implemented without one or more of these details. In other examples, to avoid confusion with the present application, some technical features well known in the art are not described.

[0030] It should be understood that the present application can be implemented in different forms and should not be construed as limited to the embodiments presented herein. On the contrary, providing these embodiments will make the disclosure thorough and complete, and will fully convey the scope of the present application to those skilled in the art.

[0031] The purpose of the terms used herein is only to describe specific embodiments and is not a limitation of the present application. When used herein, the singular forms "a", "an", and "the" are also intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the terms "comprising" and / or "including", when used in this specification, affirm the presence of the described features, integers, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups. When used herein, the term "and / or" includes any and all combinations of the related listed items.

[0032] To thoroughly understand the present application, detailed structures will be presented in the following description to illustrate the technical solutions proposed by the present application. The optional embodiments of the present application are described in detail as follows. However, in addition to these detailed descriptions, the present application can also have other implementation manners.

[0033] The particulate matter detection device includes a mask carrier table (not shown in the figure) for carrying a mask. A sensor is provided on the mask carrier table, and the sensor is used to identify the mask on the mask carrier table. It should be noted that the mask is used to carry a lithography pattern. Specifically, the mask is a quartz glass plate for carrying a pattern used by a lithography device to expose a wafer. After exposure by the lithography device, the pattern on the mask can be replicated on the wafer. Exemplarily, reference Figure 5, a pattern area 31 is provided in the central area of the photomask 30, and the peripheral area 32 of the photomask 30 is around the pattern area 31.

[0034] During the application process, before and after lithography, it is necessary to detect particulate matter on the upper and lower surfaces of the photomask 30 to confirm whether there is particulate matter on the surface of the photomask 30. When the sensor recognizes the photomask 30 on the photomask carrier, the sensor will be in a triggered state, so as to trigger the particulate matter detection device to detect the particulate matter on the surface of the photomask 30 on the photomask carrier; when the sensor does not recognize the photomask 30 on the photomask carrier, the sensor will be in an untriggered state.

[0035] The sensor provided on the photomask carrier is usually a reflective photoelectric sensor, also called a diffuse reflective sensor (Diffuse Reflective Sensor). The reflective photoelectric sensor is a commonly used photoelectric sensor based on the photoelectric effect.

[0036] Reference Figure 6 , the reflective photoelectric sensor is a sensor that integrates a transmitter (light projecting part) and a receiver (light receiving part). Its basic principle is: a beam of light is emitted through the light projecting part. When this beam of light encounters the detected object, part of the light passes through the detected object to become transmitted light, and part of the light is reflected back by the detected object. Among them, part of the reflected light will enter the light receiving part, and the position, shape, color and other characteristics of the detected object of the target are detected by measuring the reflected light by the light receiving part. The reflective photoelectric sensor used on the photomask carrier is a sensor used to detect the target position, so as to identify whether there is a photomask 30 on the photomask carrier. When the light emitted by the reflective photoelectric sensor is reflected by the detected object to the light receiving part, the sensor will be in a triggered state, recognize the photomask 30 on the photomask carrier, and generate a switching signal.

[0037] It should be noted that when the light emitted by the reflective photoelectric sensor is reflected back from the detected object, its reflection mode is diffuse reflection. Reference Figure 7 , diffuse reflection refers to the phenomenon that parallel light projected on an irregular and uneven surface is reflected in all directions. When the parallel light emitted by the light projecting part is incident on the surface of a rough object, the light will be reflected in all directions irregularly. Therefore, compared with specular reflection, this reflected light can be seen at all angles, so as to ensure that part of the reflected light is received by the light receiving part of the reflective photoelectric sensor.

[0038] Before the particulate matter detection device works, it is necessary to debug the sensor on the mask carrier to enable the sensor to recognize the mask 30. The debugging tool used in the related art has an opaque debugging substrate as its base plate. When debugging the sensor, the opaque debugging substrate is placed on the mask carrier, and the sensor is debugged to configure the sensor to the triggered state, indicating that the sensor has recognized the debugging tool on the mask carrier. Correspondingly, during application, when the debugging tool is replaced with the mask 30 and placed on the mask carrier, the sensor will also be in the triggered state, thereby recognizing the mask 30. After that, after removing the debugging tool from the mask carrier, it is necessary to debug the sensor to configure the sensor to the untriggered state, indicating that the sensor can no longer recognize the debugging tool on the mask carrier at this time. Correspondingly, during application, when the debugging tool is replaced with the mask 30 and removed from the mask carrier, the sensor will also switch from the triggered state to the untriggered state, thereby recognizing that there is no mask 30 on the mask carrier.

[0039] After debugging the sensor using the debugging tool in the related art, the particulate matter detection device can start working. After placing the mask 30 on the mask carrier through the transmission component, the sensor on the mask carrier will recognize that the mask 30 is placed on the mask carrier. After that, the particulate matter detection device can detect the particulate matter on the surface of the mask 30 on the mask carrier.

[0040] Since the base plate of the debugging tool in the related art is an opaque debugging substrate, after debugging the sensor using the debugging tool in the related art, the recognition effect of the mask 30 with an opaque outer region 32 is better. However, due to the different light transmittance of the opaque debugging substrate and the mask 30 with a transparent outer region 32, after placing the mask 30 with an opaque outer region 32 on the mask carrier, the amount of light reflected back by the light emitted by the reflective optoelectronic sensor will be very small. If the reflected light cannot reach the triggering threshold for triggering the light receiving part of the reflective optoelectronic sensor, the reflective optoelectronic sensor will still be in the untriggered state, resulting in the problem of unstable and unreliable recognition effect of the mask 30 with a transparent outer region 32. There may be a situation where the mask 30 with a transparent outer region 32 cannot be recognized, leading to the particulate matter detection device crashing. After the particulate matter detection device crashes, it is necessary to manually remove the mask 30, thus there is a risk of the mask 30 being contaminated and damaged.

[0041] It can be seen from this that after debugging a reflective optoelectronic sensor using the debugging device shown in the related art, it can only recognize whether a reticle 30 with an opaque outer region 32 is placed on the reticle carrier stage, and it cannot recognize whether a reticle 30 with a transparent outer region 32 is placed on the reticle carrier stage, so it cannot be applied to the scenario of a reticle 30 with a transparent outer region 32.

[0042] To solve at least some of the technical problems in the above related art, the following embodiments are proposed in this application.

[0043] The following will describe in detail some embodiments of this application with reference to the accompanying drawings. Without conflict, the embodiments described below and the features in the embodiments can be combined with each other.

[0044] First, the application scenario of the debugging device shown in the examples of this application is introduced. The debugging device is applied in the process of debugging a reflective optoelectronic sensor on a reticle carrier stage. The reticle carrier stage is used to carry the reticle 30, the reflective optoelectronic sensor is used to recognize the reticle 30 on the reticle carrier stage, and the debugging device is used to debug the reflective optoelectronic sensor on the reticle carrier stage.

[0045] Refer to Figure 1 , an embodiment of this application provides a debugging device, which includes: a transparent substrate 10 for debugging and a handle. The transparent substrate 10 is made of the same material as the reticle. The transparent substrate 10 is used to be placed on or removed from the reticle carrier stage when debugging the reflective optoelectronic sensor; the handle is connected to the first surface 11 of the transparent substrate 10; wherein, the transparent substrate 10 further has a second surface 12 opposite to the position of the first surface 11, and the second surface 12 of the transparent substrate 10 is used to abut against the reticle carrier stage.

[0046] In the above solution, a transparent substrate 10 for debugging is provided. The transparent substrate 10 is used to be placed on or removed from the reticle carrier stage when debugging the reflective optoelectronic sensor; wherein, when the transparent substrate 10 is placed on the reticle carrier stage, the reflective optoelectronic sensor is configured to be in a triggered state; and when the reticle carrier stage is removed from the transparent substrate 10, the reflective optoelectronic sensor is configured to be in an untriggered state. When the transparent substrate 10 is used to debug the reflective optoelectronic sensor, the transparent substrate 10 is used to be placed on or removed from the reticle carrier stage to simulate the situation where the reticle 30 is placed on or removed from the reticle carrier stage. Specifically, the transparent substrate 10 can be first placed on the reticle carrier stage, and when the transparent substrate 10 is placed on the reticle carrier stage, the reflective optoelectronic sensor is configured to be in a triggered state.

[0047] Exemplarily, by adjusting the trigger threshold of the light-receiving part of the reflective photoelectric sensor, when the lens substrate is placed on the mask carrier, the reflective photoelectric sensor can be adjusted to a triggered state, so that the reflective photoelectric sensor sends a signal indicating that a mask 30 is placed on the mask carrier to the particulate matter detection device, which can trigger the particulate matter detection device in the particulate matter detection device to detect the mask 30 on the mask carrier.

[0048] After the transparent substrate 10 is removed from the mask carrier, and when the mask carrier is removed from the transparent substrate 10, the reflective photoelectric sensor is configured to an untriggered state, ensuring that after the debugging tool is removed from the mask carrier, the reflective photoelectric sensor is in an untriggered state, so that the reflective photoelectric sensor sends a signal indicating that no mask 30 is placed on the mask carrier to the particulate matter detection device, which can trigger the particulate matter detection device to perform corresponding operations.

[0049] Since the substrate of the debugging tool shown in the embodiment of the present application is the transparent substrate 10, its light transmittance is not much different from the light transmittance of the mask 30 with a transparent peripheral area 32. After debugging the sensor using the debugging tool shown in the present application, the trigger threshold at which the light-receiving part of the reflective photoelectric sensor is triggered is less than the trigger threshold at which the light-receiving part is triggered after debugging the sensor using the debugging tool shown in the related art.

[0050] Not only can the sensor debugged using the debugging tool shown in the present application accurately identify the mask 30 on the mask carrier after the mask 30 with an opaque peripheral area 32 is placed on the mask carrier; after the mask 30 with an opaque peripheral area 32 is removed from the mask carrier, the sensor debugged using the debugging tool shown in the present application can accurately identify that the mask 30 has been removed from the mask carrier, and the recognition effect on the mask 30 with an opaque peripheral area 32 is good.

[0051] Moreover, after the mask 30 with a transparent peripheral area 32 is placed on the mask carrier, the sensor debugged using the debugging tool shown in the present application can accurately identify the mask 30 on the mask carrier; after the mask 30 with a transparent peripheral area 32 is removed from the mask carrier, the sensor debugged using the debugging tool shown in the present application can also accurately identify that the mask 30 has been removed from the mask carrier.

[0052] Therefore, the recognition effect on the mask 30 with a transparent peripheral area 32 is stable and reliable, avoiding the situation that the particulate matter detection device crashes due to the inability to recognize the mask 30 with a transparent peripheral area 32. Therefore, the risk of contamination and damage to the mask 30 caused by manually removing the mask 30 due to the crash of the particulate matter detection device is also avoided.

[0053] Moreover, 70% of the photomasks 30 carried by the current photomask carrier are photomasks 30 with a transparent peripheral area 32. Therefore, after debugging the reflective photoelectric sensor on the photomask carrier using the debugging tool shown in the embodiment of the present application, almost all the photomasks 30 with a transparent peripheral area 32 can be used normally.

[0054] In summary, after debugging the reflective photoelectric sensor on the photomask carrier using the debugging tool shown in the embodiment of the present application, it can be used to identify whether a photomask 30 with an opaque peripheral area 32 is placed on the photomask carrier, and can also be used to identify whether a photomask 30 with a transparent peripheral area 32 is placed on the photomask carrier. Thus, it can avoid the situation that the particulate matter detection equipment crashes due to failure to recognize the photomask 30 with a transparent peripheral area 32 on the photomask carrier, and enable the particulate matter detection equipment to operate normally.

[0055] Reference Figures 1 to 4 , when setting the transparent substrate 10, the transparent substrate 10 is adapted to the photomask carrier. Specifically, the size of the transparent substrate 10 is adapted to the size of the photomask carrier, so that the transparent substrate 10 can be placed on the photomask carrier.

[0056] In application, the size of the target photomask 30 that the photomask carrier is used to carry is fixed and known. The length and width dimensions of the transparent substrate 10 can be the same as those of the photomask 30. Thus, when the photomask 30 can be placed on the carrier, the transparent substrate 10 can also be placed on the carrier.

[0057] Exemplarily, referring to Figure 4 , the length and width of the transparent substrate 10 can both be dimensions such as 152 mm. Exemplarily, the thickness of the transparent substrate 10 can also be substantially the same as or not much different from the thickness of the photomask 30. For example, the thickness of the transparent substrate 10 can be a dimension such as 6.35 mm.

[0058] Exemplarily, referring to Figure 2 and Figure 3 , the transparent substrate 10 has a first surface 11 and a second surface 12 that are opposite to each other. Among them, when the transparent substrate 10 is placed on the photomask carrier, the second surface 12 of the transparent substrate 10 abuts against the photomask carrier.

[0059] And the transparent substrate 10 is made of the same material as the photomask 30. Exemplarily, the transparent substrate 10 can be a transparent quartz glass plate. Referring to Figure 5 , the photomask 30 can have a mask substrate, and a pattern area 31 is provided in the central area of the mask substrate. The periphery of the pattern area 31 is the peripheral area 32 of the photomask 30.

[0060] Exemplarily, the material of the mask substrate is also quartz glass, so that the material of the transparent substrate 10 is the same as that of the mask substrate. This can ensure that the transmittance of the peripheral area 32 of the mask substrate is also basically the same as the transmittance of the transparent substrate 10 of the debugging device shown in the embodiment of the present application, so that after the reflective photoelectric sensor on the mask plate carrier is debugged using the debugging device shown in the embodiment of the present application, the reflective photoelectric sensor can identify the mask plate 30 with most of the peripheral area 32 transparent.

[0061] Exemplarily, the transparent substrate 10 has a light transmittance of more than 90% for light with a wavelength below 200 nm, so that the transparent substrate 10 has good light transmittance. Correspondingly, after the reflective photoelectric sensor on the mask carrier is debugged using the debugging device shown in the embodiment of the present application, the reflective photoelectric sensor can identify the mask 30 with most of the peripheral area 32 transparent.

[0062] Exemplarily, the thermal expansion coefficient of the transparent substrate 10 is 0.4-0.6ppm / °C. Specifically, the thermal expansion coefficient of the transparent substrate 10 can be any value between 0.4-0.6ppm / °C, such as 0.4ppm / °C, 0.45ppm / °C, 0.5ppm / °C, 0.55ppm / °C, 0.6ppm / °C, etc., so as to minimize the influence of thermal expansion and contraction of the transparent substrate 10.

[0063] Exemplarily, the hardness of the transparent substrate 10 is 515-715. Specifically, the hardness of the transparent substrate 10 can be any value between 515-715, such as 515, 565, 615, 665, 715, etc., so as to minimize the deformation degree of the transparent substrate 10.

[0064] Exemplary, reference Figures 1 to 4 When the handle is provided, the handle is connected to the first surface 11 of the transparent substrate 10; wherein the transparent substrate 10 also has a second surface 12 opposite to the first surface 11, and the second surface 12 of the transparent substrate 10 is used to abut against the mask carrier. By providing a handle connected to the transparent substrate 10, it is convenient for the debugging personnel to take the transparent substrate 10. When providing the handle, a variety of methods can be adopted. Several methods are introduced as examples below.

[0065] Exemplary, reference Figure 1 , Figure 2 , Figure 3 and Figure 4, the handle may include: a gripping portion 20, a first connecting portion 21, and a second connecting portion 22; wherein the gripping portion 20 has opposite first and second ends in the length direction; the first connecting portion 21 is disposed at the first end of the gripping portion 20, and the first connecting portion 21 connects to the first surface 11 of the transparent substrate 10; the second connecting portion 22 is disposed at the second end of the gripping portion 20, and the second connecting portion 22 connects to the first surface 11 of the transparent substrate 10.

[0066] By providing the gripping portion 20, it is convenient for the debugging personnel to hold. And the gripping portion 20 and the first surface 11 of the transparent substrate 10 are connected by the first connecting portion 21 and the second connecting portion 22, so that there is a spacing between the gripping portion 20 and the first surface 11 of the transparent substrate 10, facilitating the fingers of the debugging personnel to hold on the surface of the gripping portion 20 without the transparent substrate 10 interfering with the fingers of the debugging personnel to grasp the gripping portion 20.

[0067] When providing the gripping portion 20, various methods can be adopted. Exemplarily, the gripping portion 20 can be any type of elongated structure such as but not limited to a prism or a cylinder to facilitate the debugging personnel to hold. The length direction of the gripping portion 20 refers to the extending direction of the gripping portion 20. There are opposite two ends in the length direction of the gripping portion 20, which are respectively the first end and the second end of the gripping portion 20.

[0068] Exemplarily, the first connecting portion 21 is connected to the first surface 11 of the transparent substrate 10 by glue, and the second connecting portion 22 is connected to the first surface 11 of the transparent substrate 10 by glue. Exemplarily, the glue can be a high-strength glue. By bonding the connecting portion and the transparent substrate 10 with glue, the connection method between the connecting portion and the transparent substrate 10 can not affect the horizontal flatness of the transparent substrate 10. Of course, in other embodiments, holes can also be drilled in the transparent substrate 10, and then the connecting portion and the transparent substrate 10 can be connected by means such as screws and snap connections, but this method.

[0069] Exemplarily, the handle can be a plastic handle. Exemplarily, the first connecting portion 21, the second connecting portion 22, and the gripping portion 20 can be prepared by an integral molding process, so that there is no need to separately install the connecting portion on the gripping portion 20, simplifying the connection and installation method. Exemplarily, the above integral molding process can be an integral injection molding process such as but not limited to, so as to prepare a plastic handle with a connecting portion and a gripping portion 20.

[0070] Of course, in other embodiments, the connecting portion and the gripping portion 20 can also be separate components, and then fixed and connected together by means such as bonding, snap connection, and screw fastening.

[0071] It should be understood that the handle can be made of other materials in addition to plastic materials. Exemplarily, the material of the handle can also be the same as that of the mask plate 30, so that they can be integrally prepared.

[0072] Exemplarily, when the length and width of the transparent substrate 10 are both 152 mm, the distance between the first end and the second end of the holding portion 20 can be equal to 152 mm, and the width of the holding portion 20 can be 30 mm. The thickness of the holding portion 20 can be 10 mm, and the holding portion 20 can be located on a symmetry axis of the transparent substrate 10.

[0073] Exemplarily, the height of the first connecting portion 21 and the second connecting portion 22 can be 20 mm, and both the first connecting portion 21 and the second connecting portion 22 are perpendicular to the holding portion 20.

[0074] Exemplarily, the widths of the first connecting portion 21 and the second connecting portion 22 can be equal to the width of the holding portion 20, both being 10 mm.

[0075] Exemplarily, the transparent substrate 10 can be a quartz glass plate, and the connecting portion and the quartz glass plate can be connected by high-strength glue to avoid affecting the horizontal flatness of the quartz glass plate by means such as drilling for installing the handle.

[0076] In addition, the embodiment of the present application further provides a debugging system for a mask plate carrying device. The mask plate carrying device includes a mask plate carrying table and a reflective photoelectric sensor disposed on the mask plate carrying table. The debugging system includes any one of the above-mentioned debugging tools. The setting methods of the debugging tools and the reflective photoelectric sensor can refer to the description in the foregoing part, and will not be elaborated here.

[0077] In some embodiments, the debugging system can further include other devices. For example, the debugging system can further include a configuration device for configuring the reflective photoelectric sensor.

[0078] Furthermore, the embodiment of the present application further provides a mask plate carrying device with a debugging tool. The mask plate carrying device includes: a mask plate carrying table, a reflective photoelectric sensor, and any one of the above-mentioned debugging tools; wherein, the mask plate carrying table is used to carry at least one mask plate 30; the mask plate 30 has a pattern area 31 and a peripheral area 32; at least part of the peripheral area 32 of at least one mask plate 30 among the at least one mask plate 30 is transparent; the reflective photoelectric sensor is disposed on the mask plate carrying table for identifying the mask plate 30 on the mask plate carrying table. Exemplarily, the mask plate carrying table is used to carry multiple mask plates 30, wherein the peripheral area 32 of some mask plates 30 is transparent, and the peripheral area 32 of some mask plates 20 is opaque.

[0079] In addition, an embodiment of the present application further provides a particulate matter detection device, which includes a particulate matter detection device and any one of the above-mentioned mask carrier devices with debugging tools; wherein, the particulate matter detection device is used to detect particulate matter on the surface of the mask 30 on the mask carrier table, so as to confirm whether particulate matter has fallen on the upper surface or the lower surface of the mask 30.

[0080] When setting the particulate matter detection device, various methods can be adopted. Exemplarily, a laser particle counter can be used as the particulate matter detection device. The laser particle counter scans the upper surface and the lower surface of the mask 30 by emitting laser light, so as to detect whether particulate matter has fallen on the upper surface or the lower surface of the mask 30. Of course, regarding the setting method of the particulate matter detection device, in other embodiments, other devices capable of detecting whether there is particulate matter on the surface of the mask 30 can also be adopted.

[0081] The present application has been described through the above embodiments, but it should be understood that the above embodiments are only for illustrative and explanatory purposes, and are not intended to limit the present application to the scope of the described embodiments. In addition, those skilled in the art can understand that the present application is not limited to the above embodiments, and more variations and modifications can be made according to the teachings of the present application, and these variations and modifications all fall within the scope claimed by the present application. The protection scope of the present application is defined by the appended claims and their equivalent scope.

Claims

1. A debugging instrument, characterized in that, The debugging tool is used to debug the reflective photoelectric sensor on the mask carrier, wherein the mask carrier is used to carry the mask, and the reflective photoelectric sensor is used to identify the mask on the mask carrier. The debugging tool includes: A transparent substrate for debugging, which is made of the same material as the mask, and is used to be placed on or removed from the mask carrier when debugging the reflective photoelectric sensor; A handle is connected to the first surface of the transparent substrate; wherein the transparent substrate also has a second surface opposite to the first surface, and the second surface of the transparent substrate is used to abut against the mask supporting platform.

2. The debugging apparatus according to claim 1, characterized in that The transparent substrate has a light transmittance of 90% or more for light with a wavelength of 200 nm or less.

3. The debugging instrument according to claim 1, characterized in that The thermal expansion coefficient of the transparent substrate is 0.4-0.6 ppm / °C, and the hardness of the transparent substrate is 515-715.

4. The debugging device according to claim 1, wherein The transparent substrate is a quartz glass plate.

5. The debugging device according to claim 1, wherein, The handle comprises: A grip portion, the grip portion having a first end and a second end opposite to each other in a length direction; A first connecting portion, disposed at a first end of the holding portion, and used to connect to the first surface of the transparent substrate; The second connecting portion is disposed at the second end of the holding portion and is used to connect to the first surface of the transparent substrate.

6. The debugging instrument according to claim 5, characterized in that The first connection portion is connected to the first surface of the transparent substrate by glue, and the second connection portion is connected to the first surface of the transparent substrate by glue.

7. The debugging device according to claim 1, characterized in that, The handle is a plastic handle.

8. A debugging system for a mask carrier device, characterized in that The mask carrying device comprises a mask carrying platform and a reflective photoelectric sensor arranged on the mask carrying platform; The debugging system comprises: a debugging device according to any one of claims 1 to 7.

9. A mask carrier device with a debugging tool, characterized in that, include: A mask carrier, used for carrying at least one mask; wherein the mask has a pattern area and a peripheral area; at least a portion of the peripheral area of at least one mask is transparent; a reflective photoelectric sensor, disposed on the mask carrier, for identifying the mask on the mask carrier; and The debugging tool according to any one of claims 1 to 7.

10. A particulate matter detection device, characterized in that, include: The mask carrier device with a debugging device as claimed in claim 9; The particle detection device is used to detect particles on the surface of the mask on the mask supporting platform.

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