Plasma cleaning machine with anti-shake and cushioning functions
Through the design of the support frame and buffer components, the jitter problem during the operation of the plasma cleaning machine is solved, and more stable operation and better anti-shake and shock-proof effects are achieved, improving the overall performance of the equipment.
Patent Information
- Application Number
- CN202422068229.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-26
- Publication Date
- 2025-07-22
- Estimated Expiration
- 2034-08-26
AI Technical Summary
Existing plasma cleaning machines have high-frequency vibrations during operation, resulting in unstable operation and poor anti-shake and shock-proof effects.
The supporting frame, anti-shake assembly and reverse cushioning assembly are adopted to connect and support the plasma cleaning machine with the No. 1 adapter plate, No. 2 adapter plate, damping shock absorber and buffer spring, and jitter is alleviated by the elastic cushioning effect of the damping shock absorber and buffer spring. At the same time, the reverse cushioning assembly is set to reverse cushion the jitter through the rubber buffer pad.
The operation stability and anti-shake and shock-proof effect of the plasma cleaning machine are improved. Through the cooperation of the support frame and buffer components, effective relief and reverse cushioning are achieved, and the operation stability and anti-shake performance of the equipment are improved.
Smart Images
Figure CN223128810U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of plasma cleaning machine equipment, in particular to a plasma cleaning machine with an anti-shake and shock-absorbing function. Background Technique
[0002] A plasma cleaning machine is a cleaning device used to clean tiny particle impurities on the surface of an object. The plasma cleaning machine can generate plasma with strong oxidation characteristics. The plasma in this state has super strong dirt cleaning ability. The plasma cleaning machine can remove impurities and pollutants that are usually difficult to remove. Therefore, the plasma cleaning machine is widely used in industrial and household fields.
[0003] The following problems often exist in the prior art during use:
[0004] During the operation of the plasma cleaning machine, relatively high-frequency vibrations will be generated, making the operation of the plasma cleaning machine unstable. The anti-shake and shock-absorbing of the plasma cleaning machine usually adopts one-way shock-absorbing protection, resulting in poor anti-shake and shock-absorbing effects of the plasma cleaning machine. Content of the Utility Model
[0005] Aiming at the deficiencies in the prior art, the utility model provides a plasma cleaning machine with an anti-shake and shock-absorbing function.
[0006] An embodiment of the utility model provides a plasma cleaning machine with an anti-shake and shock-absorbing function, including:
[0007] A support frame and a plasma cleaning machine;
[0008] An anti-shake component, the anti-shake component includes a first adapter plate fixedly connected to the side wall of the plasma cleaning machine, two second adapter plates are fixedly connected to the inner side of the support frame, and two damping shock absorbers are fixedly connected between the first adapter plate and the two second adapter plates. Buffer springs are sleeved on the outer walls of the two damping shock absorbers;
[0009] A reverse shock-absorbing component, the reverse shock-absorbing component includes a plurality of limit sliding cylinders fixedly connected to the inner side of the support frame through fixed brackets, a plurality of limit brackets are fixedly connected to the side wall of the plasma cleaning machine, sliding holes are opened on the limit brackets, the limit sliding cylinders are matched with the sliding holes, and a contact shock-absorbing component is arranged at the end of the limit sliding cylinder.
[0010] Further, the contact shock-absorbing component includes a lifting rod slidably connected in the limit sliding cylinder. The end of the lifting rod outside the limit sliding cylinder is rotatably connected with a transmission plate. The end of the transmission plate is rotatably connected with a buffer plate. A connecting rod is fixedly connected to the limit bracket. The end of the lifting rod located inside the limit sliding cylinder is fixedly connected to the end of the connecting rod.
[0011] Further, the support frame is arranged in a concave structure, and a buffer bottom pad is fixedly connected to the inner bottom surface of the support frame.
[0012] Further, a rubber buffer pad is fixedly connected to one side of the buffer plate facing the plasma cleaner.
[0013] Further, the connecting rod is arranged in an L-shaped structure, a strip-shaped through hole is formed in the circumferential outer wall of the limiting sliding cylinder, and the end of the connecting rod matches the strip-shaped through hole.
[0014] Further, a stable base is fixedly connected to the bottom of the support frame.
[0015] Compared with the prior art, the utility model has the following beneficial effects:
[0016] In the utility model, an anti-shake component is arranged, and the plasma cleaner is connected and supported by the first adapter plate, the second adapter plate and the damping shock absorber. At the same time, the lifting jitter of the plasma cleaner is alleviated through the elastic buffering effect of the damping shock absorber and the buffer spring, so as to improve the operation stability of the plasma cleaner equipment.
[0017] In the utility model, a reverse shock absorption component is arranged. When the plasma cleaner jitters up and down, that is, during the process of alleviating the jitter of the plasma cleaner by using the damping shock absorber and the buffer spring, the buffer plate and the rubber buffer pad can be synchronously driven to move closer to the plasma cleaner, so that the rubber buffer pad can perform reverse shock absorption on the up and down jitter of the plasma cleaner, thereby further performing shock absorption protection on the plasma cleaner and improving the anti-shake and anti-vibration effect of the plasma cleaner. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 It is a three-dimensional structural schematic diagram of a plasma cleaner with anti-shake and shock absorption functions in the embodiment of the utility model.
[0019] Figure 2 It is a schematic diagram of a partial structure of the anti-shake component in a plasma cleaner with anti-shake and shock absorption functions in the embodiment of the utility model.
[0020] Figure 3 It is a schematic diagram of a partial structure of the reverse shock absorption component in a plasma cleaner with anti-shake and shock absorption functions in the embodiment of the utility model.
[0021] In the above-mentioned drawings: 1 support frame, 2 plasma cleaner, 3 first adapter plate, 4 second adapter plate, 5 damping shock absorber, 6 buffer spring, 7 limiting sliding cylinder, 8 limiting bracket, 9 lifting rod, 10 transmission plate, 11 buffer plate, 12 connecting rod, 13 rubber buffer pad, 14 stable base. DETAILED DESCRIPTION OF THE EMBODIMENTS
[0022] The technical solutions in the present utility model will be further described below in conjunction with the accompanying drawings and embodiments.
[0023] As Figures 1 - 3 shown, an embodiment of the present utility model provides a plasma cleaner with anti-shake and shock-absorbing functions, including a support frame 1, a plasma cleaner 2, an anti-shake component, and a reverse shock-absorbing component: The support frame 1 is arranged in a concave structure, and a buffer bottom pad is fixedly connected to the inner bottom surface of the support frame 1. The buffer bottom pad is located directly below the plasma cleaner 2 and is thin-shaped, providing a shock-absorbing effect for the plasma cleaner 2 in the case of a large vibration amplitude. A stable base 14 is fixedly connected to the bottom of the support frame 1; The anti-shake component includes a first adapter plate 3 fixedly connected to the side wall of the plasma cleaner 2. Two second adapter plates 4 are fixedly connected to the inside of the support frame 1. Two damping shock absorbers 5 are fixedly connected between the first adapter plate 3 and the two second adapter plates 4. Buffer springs 6 are sleeved on the outer walls of the two damping shock absorbers 5;
[0024] Through the first adapter plate 3, the second adapter plate 4, and the damping shock absorber 5, the plasma cleaner 2 can be connected and supported inside the support frame 1, and the shaking limit of the plasma cleaner 2 is converted into lifting shaking. Then, through the elastic buffering effect of the damping shock absorber 5 and the buffer spring 6, the lifting shaking of the plasma cleaner 2 is alleviated to improve the operation stability of the plasma cleaner equipment.
[0025] As Figure 1 and Figure 3 shown, the reverse shock-absorbing component includes a plurality of limit sliding cylinders 7 fixedly connected to the inside of the support frame 1 through fixed brackets. A plurality of limit brackets 8 are fixedly connected to the side wall of the plasma cleaner 2. Slide holes are opened on the limit brackets 8. The limit sliding cylinders 7 are matched with the slide holes. An abutting shock-absorbing component is arranged at the end of the limit sliding cylinder 7. The abutting shock-absorbing component includes a lifting rod 9 slidably connected inside the limit sliding cylinder 7. The end of the lifting rod 9 outside the limit sliding cylinder 7 is rotatably connected to a transmission plate 10. The end of the transmission plate 10 is rotatably connected to a buffer plate 11. A rubber buffer pad 13 is fixedly connected to the side of the buffer plate 11 facing the plasma cleaner 2. A connecting rod 12 is fixedly connected to the limit bracket 8. The end of the lifting rod 9 inside the limit sliding cylinder 7 is fixedly connected to the end of the connecting rod 12. The connecting rod 12 is arranged in an L-shaped structure. A strip-shaped through hole is opened on the outer circumferential wall of the limit sliding cylinder 7. The end of the connecting rod 12 is matched with the strip-shaped through hole;
[0026] When the plasma cleaner 2 lifts and jitters, the limit bracket 8 moves up and down relative to the limit sliding cylinder 7, and drives the lifting rod 9 in the limit sliding cylinder 7 to move up and down synchronously. If the plasma cleaner 2 jitters upward at this time, the lifting rod 9 slides upward relative to the limit sliding cylinder 7, and then drives the buffer plate 11 to move downward through the transmission plate 10, so that the buffer plate 11 and the rubber buffer pad 13 move closer to the plasma cleaner 2, so as to reversely buffer the upward jitter of the plasma cleaner 2 through the rubber buffer pad 13, thereby further buffering and protecting the plasma cleaner 2 and improving the anti-jitter and anti-vibration effect of the plasma cleaner 2.
[0027] The detailed working process of the present utility model is as follows:
[0028] 1. During use, the plasma cleaner 2 runs and generates jitters. The first adapter plate 3, the second adapter plate 4 and the damping shock absorber 5 can connect and support the plasma cleaner 2 inside the support frame 1, and convert the jitter limit of the plasma cleaner 2 into lifting jitters. Then, through the elastic buffering effect of the damping shock absorber 5 and the buffer spring 6, the lifting jitters of the plasma cleaner 2 are alleviated to improve the running stability of the plasma cleaner 2;
[0029] 2. When the damping shock absorber 5 and the buffer spring 6 cooperate to alleviate the lifting jitters of the plasma cleaner 2, the limit bracket 8 on the plasma cleaner 2 begins to move up and down relative to the limit sliding cylinder 7, and drives the lifting rod 9 in the limit sliding cylinder 7 to move up and down synchronously. If the plasma cleaner 2 jitters upward at this time, the lifting rod 9 slides upward relative to the limit sliding cylinder 7, and then drives the buffer plate 11 to move downward through the transmission plate 10, so that the buffer plate 11 and the rubber buffer pad 13 move closer to the plasma cleaner 2, so as to reversely buffer the upward jitter of the plasma cleaner 2 through the rubber buffer pad 13, thereby further buffering and protecting the plasma cleaner 2 and improving the anti-jitter and anti-vibration effect of the plasma cleaner 2.
[0030] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present utility model and are not intended to limit. Although the present utility model has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the present utility model can be modified or equivalently replaced without departing from the spirit and scope of the technical solutions of the present utility model, and they should all be covered within the scope of the claims of the present utility model.
Claims
1. A plasma cleaning machine with anti-shake and shock-absorbing functions, characterized in that, Including: A support frame (1) and a plasma cleaner (2); An anti-shake component, the anti-shake component includes a first adapter plate (3) fixedly connected to the side wall of the plasma cleaner (2), two second adapter plates (4) are fixedly connected to the inner side of the support frame (1), and two damping shock absorbers (5) are fixedly connected between the first adapter plate (3) and the two second adapter plates (4). Buffer springs (6) are sleeved on the outer walls of the two damping shock absorbers (5); A reverse shock absorption component, the reverse shock absorption component includes a plurality of limit sliding cylinders (7) fixedly connected to the inner side of the support frame (1) through fixed brackets, a plurality of limit brackets (8) are fixedly connected to the side wall of the plasma cleaner (2), sliding holes are formed in the limit brackets (8), the limit sliding cylinders (7) are matched with the sliding holes, and an abutting shock absorption component is arranged at the end of the limit sliding cylinder (7).
2. The plasma cleaner with an anti-shake and shock-absorbing function according to claim 1, characterized in that, Wherein: The abutting shock absorption component includes a lifting rod (9) slidably connected in the limit sliding cylinder (7), a transmission plate (10) is rotatably connected to the end of the lifting rod (9) outside the limit sliding cylinder (7), a buffer plate (11) is rotatably connected to the end of the transmission plate (10), a connecting rod (12) is fixedly connected to the limit bracket (8), and the end of the lifting rod (9) inside the limit sliding cylinder (7) is fixedly connected to the end of the connecting rod (12).
3. A plasma cleaning machine with anti-shake and shock-absorbing functions according to claim 1, characterized in that, Wherein: The support frame (1) is arranged in a concave structure, and a buffer bottom pad is fixedly connected to the inner bottom surface of the support frame (1).
4. A plasma cleaner with anti-shake and shock-absorbing functions according to claim 2, characterized in that, Wherein: A rubber buffer pad (13) is fixedly connected to the side of the buffer plate (11) facing the plasma cleaner (2).
5. A plasma cleaner with anti-shake and shock-absorbing functions according to claim 2, characterized in that, Wherein: The connecting rod (12) is arranged in an L-shaped structure, a strip-shaped through hole is formed in the circumferential outer wall of the limit sliding cylinder (7), and the end of the connecting rod (12) is matched with the strip-shaped through hole.
6. A plasma cleaning machine with an anti-shake and shock-absorbing function according to claim 1, characterized in that, Wherein: A stable base (14) is fixedly connected to the bottom of the support frame (1).