Spraying mechanism and CMP equipment

Abstract

The utility model relates to a spraying mechanism and CMP equipment. The spraying mechanism comprises a spraying body, a limiting structure and a sensing assembly. The spraying body comprises a rotary shaft capable of rotating, and the falling point position of the spraying body can be adjusted when the rotary shaft rotates. The limiting structure is movably arranged relative to the rotating shaft, and the limiting structure can move to a limiting position for preventing the rotating shaft from rotating so as to limit the spraying main body to a target working position corresponding to the target falling point position. The sensing assembly is used for monitoring the position deflection condition of the rotating shaft of the spraying body located at the target working position. According to the technical scheme, the probability that the falling point position of the spraying mechanism is changed due to the fact that the working position of the spraying mechanism is changed due to external reasons can be reduced, even if the working position is changed, a worker can conveniently find and adjust the working position of the spraying body in time, then the falling point position of the spraying body is adjusted, and the polishing effect of the CMP equipment is improved.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor equipment, and particularly to a spraying mechanism and a CMP equipment. Background Art

[0002] A CMP (Chemical Mechanical Polishing) equipment is usually used in the manufacture of high-density integrated circuits to planarize or polish a material layer deposited on a substrate. The CMP equipment transfers a wafer to a polishing area for polishing. During the polishing process, a spraying mechanism is usually required to spray a polishing liquid.

[0003] The landing position of the spraying mechanism refers to the position where the polishing liquid lands on the polishing area, and the landing position is related to the removal rate of the wafer and the utilization rate of the polishing liquid. In actual production, according to different wafer types, polishing processes or product requirements, it is necessary to adjust the landing position of the spraying mechanism. Although most conventional spraying mechanisms support the rotation of the spraying arm of the spraying mechanism to switch between a working position and a non-working position, due to factors such as changes in the external environment and machine vibration, the spraying arm is likely to deviate from the working position during the polishing operation at the working position, thereby changing the landing position of the spraying mechanism. Summary of the Utility Model

[0004] Based on this, it is necessary to provide a spraying mechanism and a CMP equipment for solving the problem that the spraying mechanism of the CMP equipment is likely to deviate from the working position during the polishing operation at the working position, resulting in the deviation of its landing position.

[0005] In a first aspect, an embodiment of the present application provides a spraying mechanism, including:

[0006] A spraying main body, including a rotatable rotating shaft, and the landing position of the spraying main body can be adjusted when the rotating shaft rotates;

[0007] A limiting structure, movably arranged relative to the rotating shaft, and the limiting structure can move to a limiting position that hinders the rotation of the rotating shaft to limit the spraying main body at a target working position corresponding to a target landing position; and

[0008] A sensing component, used for monitoring the position deflection of the rotating shaft of the spraying main body located at the target working position.

[0009] In some embodiments, the rotating shaft includes a first fitting portion, and when the spraying main body is located at the target working position, the limiting structure is located at a limiting position connected to the first fitting portion.

[0010] In some embodiments, the limiting structure is configured to be elastically abutted against the rotating shaft; when the rotating shaft rotates, the limiting structure connected to the first engaging portion can elastically deform and disengage from the first engaging portion.

[0011] In some embodiments, a first limiting groove is provided on the circumferential wall of the rotating shaft, and the first limiting groove serves as the first engaging portion;

[0012] A second limiting groove is further provided on the circumferential wall of the rotating shaft, and the second limiting groove and the first limiting groove are located at the same axial height of the rotating shaft; the spraying main body can also rotate to a non-working position, and when the spraying main body is in the non-working position, the limiting structure is in limiting connection with the second limiting groove.

[0013] In some embodiments, the sensing assembly includes a matching measuring block and a sensor, one of the measuring block and the sensor is fixedly arranged relative to the rotating shaft, and the other of the measuring block and the sensor is movably arranged relative to the rotating shaft.

[0014] In some embodiments, the spraying mechanism includes an adjusting member that does not rotate with the rotating shaft and can move around the outer circumference of the rotating shaft, and the other of the measuring block and the sensor and the limiting structure are both arranged on the adjusting member and move synchronously with the adjusting member;

[0015] The spraying mechanism further includes a fixing member and a locking member, the fixing member is fixedly arranged, the adjusting member is arranged on the fixing member, and the locking member can lock and unlock the adjusting member and the fixing member.

[0016] In some embodiments, both the adjusting member and the fixing member are annular, the adjusting member is arranged around the rotating shaft, and the fixing member is arranged around the adjusting member;

[0017] An avoidance groove is formed on the fixing member, and the other of the measuring block and the sensor and the limiting structure both pass through the avoidance groove.

[0018] In some embodiments, the rotating shaft has a free end, the fixing member is arranged at the free end of the rotating shaft; a anti-disengagement member is provided at the free end, and the anti-disengagement member abuts against the adjusting member to limit the rotating shaft from disengaging from the adjusting member.

[0019] In some embodiments, the anti - detachment member has a connected arc - shaped circumferential surface and a protruding circumferential surface. The central axis of the arc - shaped circumferential surface is coaxial with the rotation axis of the rotating shaft, and the protruding circumferential surface protrudes relative to the arc - shaped circumferential surface. A limiting post is provided on the adjusting member. During the rotation of the rotating shaft, the limiting post and the arc - shaped circumferential surface move relative to each other, and the limiting post is arranged on the moving path of the protruding circumferential surface.

[0020] In a second aspect, an embodiment of the present application provides a CMP device, including a polishing disk and the spraying mechanism as described in any of the above - mentioned embodiments. The spraying main body of the spraying mechanism located at the target working position can spray polishing liquid onto the target landing position on the polishing disk.

[0021] In actual application of the above - mentioned spraying mechanism and CMP device, first rotate the rotating shaft of the spraying main body so that the spraying main body rotates to the target working position corresponding to the target landing position. Then, move the limiting structure to limit the rotating shaft, preventing the rotating shaft from rotating and thus preventing the spraying main body from deviating from the target working position and changing its landing position. In this way, the probability that the spraying mechanism changes its landing position due to external reasons can be reduced.

[0022] Moreover, by monitoring the position change of the rotating shaft through the sensing component, according to the feedback data of the sensing component, it can be judged whether the working position of the spraying main body has changed. Even if the working position of the spraying main body has changed and its landing position has changed, it is convenient for the staff to timely discover the working position of the spraying main body and then adjust its landing position, improving the polishing effect of the CMP device. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] By reading the detailed description of the preferred embodiments below, various other advantages and benefits will become clear to those of ordinary skill in the art. The drawings are only for the purpose of showing the preferred embodiments and are not considered as a limitation to the present application. Moreover, in all the drawings, the same reference numerals are used to represent the same components. In the drawings:

[0024] Figure 1 It is a schematic diagram of a partial structure of a CMP device for some embodiments.

[0025] Figure 2 It is an external shape schematic diagram of a spraying mechanism for some embodiments.

[0026] Figure 3 is Figure 2 a partial schematic diagram of the spraying mechanism of the illustrated embodiment.

[0027] Figure 4 is Figure 2 another azimuth view of the spraying mechanism of the illustrated embodiment.

[0028] Figure 5 It is a schematic diagram of the assembly of the rotating shaft and the anti-slip component in some embodiments.

[0029] Figure 6 It is a partial schematic diagram of the spraying mechanism of some other embodiments.

[0030] Figure 7 A schematic flow chart of a method for adjusting the monitoring of a landing point in some embodiments.

[0031] The reference numerals in the specific implementation manner are as follows:

[0032] 1000, CMP equipment; 100, spraying mechanism; 200, polishing disc; 10, spraying body; 11, rotating shaft; 11c, anti-slip part; m1, arc circumference; m2, protruding circumference; 11a, first matching part; a1, first limiting groove; a2, second limiting groove; 12, spraying arm; J1, first feed channel; J2, second feed channel; 20, limiting structure; 21, limiting part; 22, elastic part; 30, sensor assembly; 31, measuring block; 32, sensor; 40, adjusting part; 50, fixing part; 51, avoidance groove; 52, locking hole; 53, arc mounting hole; 60, fixing seat. DETAILED DESCRIPTION

[0033] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0034] In the description of the present application, it should be understood that terms such as “center”, “longitudinal”, “lateral”, “length”, “width”, “thickness”, “up”, “down”, “front”, “back”, “left”, “right”, “vertical”, “horizontal”, “top”, “bottom”, “inside”, “outside”, “clockwise”, “counterclockwise”, “axial”, “radial”, “circumferential”, etc., indicating orientations or positional relationships, if any, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0035] In addition, if present, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include at least one such feature. In the description of this application, the meaning of "a plurality" is at least two, such as two, three, etc., unless otherwise specifically defined.

[0036] In this application, unless otherwise clearly specified and limited, if present, terms such as "installed", "connected", "joined", "fixed", etc. shall be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two components or the interaction relationship between two components, unless otherwise clearly limited. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0037] In this application, if present, unless otherwise clearly specified and limited, the first feature being "on" or "under" the second feature may be that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "over" and "on top of" the second feature may be that the first feature is directly above or obliquely above the second feature, or merely indicates that the first feature has a higher horizontal height than the second feature. The first feature being "under", "beneath" and "underneath" the second feature may be that the first feature is directly below or obliquely below the second feature, or merely indicates that the first feature has a lower horizontal height than the second feature.

[0038] It should be noted that, if present, when an element is referred to as "fixed to" or "disposed on" another element, it may be directly on the other element or there may also be an intermediate element. When an element is considered to be "connected" to another element, it may be directly connected to the other element or there may be an intermediate element at the same time. The terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used herein are for illustrative purposes only and do not represent the only implementation.

[0039] The embodiments of this application address the problem that the landing position of the spraying mechanism of a CMP device is prone to deviation during the polishing process, and propose a spraying mechanism, a method for adjusting and monitoring the landing position of the spraying mechanism, and a CMP device.

[0040] The CMP device provided in the embodiments of this application, in some embodiments, with reference to Figure 1, the CMP device includes a polishing platen and a spraying mechanism. When the polishing platen rotates, it polishes the surface of the wafer. The spraying mechanism is used to spray the polishing liquid onto the polishing platen. The polishing liquid usually consists of sub-micron or nano abrasive grains and a chemical solution. In some examples, a polishing pad can be provided on the polishing platen to polish the wafer through the polishing pad to meet the polishing accuracy requirements of different wafers. In some examples, the CMP device may further include a dresser, which is used to dress and activate the surface topography of the polishing pad and remove the impurity particles remaining on the surface of the polishing pad. In some examples, the CMP device may further include a polishing head, which can adsorb the wafer and press the wafer onto the polishing pad. Generally, the sizes of the polishing pad and the polishing platen are larger than the size of the wafer. Regarding the specific structure of the CMP device, those skilled in the art can make conventional settings.

[0041] The spraying mechanism in the embodiments of the present application will be introduced in detail below.

[0042] According to some embodiments of the present application, please refer to Figure 2 and Figure 3 , the spraying mechanism 100 provided in the embodiments of the present application includes a spraying main body 10, a limiting structure 20, and a sensing component 30. The spraying main body 10 includes a rotatable rotating shaft 11. When the rotating shaft 11 rotates, the landing position of the spraying main body 10 can be adjusted. The limiting structure 20 is movably arranged relative to the rotating shaft 11. The limiting structure 20 can move to a limiting position that hinders the rotation of the rotating shaft 11 to limit the spraying main body 10 to a target working position corresponding to the target landing position. The sensing component 30 is used to monitor the position deflection of the rotating shaft 11 of the spraying main body 10 located at the target working position.

[0043] The spraying main body 10 is the main body structure for performing the spraying operation. In addition to the rotating shaft 11, the spraying main body 10 usually further includes a spraying arm 12. The spraying arm 12 can be but is not limited to being fixedly arranged on the rotating shaft 11. For example, it can also be detached from the rotating shaft 11. Generally, the spraying arm 12 intersects with the rotating shaft 11. A plurality of nozzles or spray holes are provided on the spraying arm 12. The nozzles or spray holes are respectively arranged below and at the end of the spraying arm 12 and can spray the polishing liquid or cleaning liquid towards the polishing platen 200 of the CMP device 1000.

[0044] The rotating shaft 11 is rotatable to drive the spraying arm 12 to rotate, thereby changing the working position of the spraying main body 10 and further changing the landing position of the spraying main body 10. It should be explained that the landing position of the spraying main body 10 is the position where its ejecta lands on the polishing area in the spraying state. And the working position of the spraying main body 10 can be understood as the rotation position of the rotating shaft 11 of the spraying main body 10 when it is in the working position. When the working position of the spraying main body 10 changes, its landing position changes accordingly.

[0045] In one example, the spraying mechanism 100 includes a fixed seat 60. The rotating shaft 11 is rotatably installed on the fixed seat 60, and then the fixed seat 60 is installed on the machine table of the CMP device 1000. Of course, the rotating shaft 11 can be directly rotatably installed on the machine table of the CMP device 1000.

[0046] The limiting structure 20 can move relative to the rotating shaft 11, and the movement trajectory can be a circular trajectory, an arc trajectory, a linear trajectory, a curved trajectory, etc. The limiting structure 20 can limit the rotating shaft 11, and the limiting methods can include but are not limited to clamping limit, friction limit, snap fit limit, negative pressure adsorption limit, magnetic adsorption limit, etc.

[0047] The sensing component 30 can be a combination of a metal block and a proximity switch, or can also be an image sensor 32, an angle encoder, etc., as long as it can sense and monitor the angular change of the rotating shaft 11. The position deflection of the rotating shaft 11 includes whether the rotating shaft 11 deflects, and further can include the magnitude of the deflection angle of the rotating shaft 11, etc., which is specifically set according to the type of the sensing component 30 and actual requirements. Relevant personnel can judge whether it is necessary to readjust the landing position of the spraying main body 10 according to the position deflection situation monitored by the sensing component 30.

[0048] In actual application, first rotate the rotating shaft 11 of the spraying main body 10 so that the spraying main body 10 rotates to the target working position corresponding to the target landing position. Then, move the limiting structure 20 to the position where the limiting structure 20 limits the rotating shaft 11, hindering the rotation of the rotating shaft 11 and thus preventing the spraying main body 10 from deviating from the target working position and changing its landing position. In this way, the probability that the spraying mechanism 100 changes the landing position due to external reasons can be reduced.

[0049] Moreover, by monitoring the position change of the rotating shaft 11 through the sensing component 30, it can be judged whether the working position of the spraying main body 10 changes according to the feedback data of the sensing component 30. Even if the working position of the spraying main body 10 changes and its landing position changes, it is convenient for the staff to discover and adjust the working position of the spraying main body 10 in time, and then adjust its landing position, improving the polishing effect of the CMP device 1000.

[0050] Understandably, a feed channel is formed inside the spraying main body 10. The feed channel is communicated with the spray nozzles or spray holes on the spray arm 12, and the external polishing liquid can reach the spray nozzles or spray holes through the feed channel. The feed channel can be formed inside the spraying main body 10, or can be formed by a pipe inserted into the spraying main body 10. In some examples, there are at least two feed channels inside the spraying main body 10, and some feed channels are used for circulating the polishing liquid, and some feed channels are used for circulating clean water. In this way, the spraying mechanism 100 can not only spray the polishing liquid, but also spray clean water. Figure 3As shown, a first feed channel J1 and a second feed channel J2 are provided on the spraying main body 10. Portions of the first feed channel J1 and the second feed channel J2 are both provided at the rotating shaft 11. Among them, the second feed channel J2 is used to connect to the polishing liquid pipe, and the first feed channel J1 is used to connect to the clear water pipe.

[0051] In addition, when the spraying mechanism 100 is in the working position, the spraying mechanism 100 can perform the spraying work. Generally, referring to Figure 1 , Figure 1 the position indicated by W1 in [reference] is the working position of the spraying mechanism 100. For the spraying mechanism 100 located in the working position, its spraying arm 12 is located above the polishing disc 200 of the CMP device 1000.

[0052] In some embodiments, referring to Figure 3 , the rotating shaft 11 includes a first mating portion 11a. When the spraying main body 10 is in the target working position, the limiting structure 20 is located at the limiting position connected to the first mating portion 11a.

[0053] The type of the first mating portion 11a is flexibly set according to the specific structure of the limiting structure 20. For example, if the limiting structure 20 is a magnetic attracting member, the first mating portion 11a can be a metal portion that can be magnetically attracted to the magnetic attracting member. Another example is that if the limiting structure 20 is a limiting block, the first mating portion 11a can be a limiting groove, a limiting hole, etc. that can be engaged with the limiting block.

[0054] Among them, the first mating portion 11a can be provided on the outer periphery of the rotating shaft 11 or on the end face of the rotating shaft 11.

[0055] By providing the first mating portion 11a on the rotating shaft 11, when the spraying main body 10 is in the target working position, the limiting structure 20 can be connected to the first mating portion 11a, strengthening the limitation of the rotating shaft 11 by the limiting structure 20 and reducing the probability of displacement deviation of the rotating shaft 11.

[0056] In some embodiments, the limiting structure 20 is configured to be elastically abutted against the rotating shaft 11. When the rotating shaft 11 rotates, the limiting structure 20 connected to the first mating portion 11a can elastically deform and disengage from the first mating portion 11a.

[0057] Exemplarily, the limiting structure 20 includes an elastic member and a limiting member connected to each other. Under the elastic action of the elastic member, the limiting member can be elastically abutted against the rotating shaft 11. The elastic member can be a spring, a torsion spring, a snap spring, etc.

[0058] In actual application, since the limiting structure 20 is elastically abutted against the rotating shaft 11, when the limiting structure 20 moves to cooperate with the first mating portion 11a, the limiting structure 20 is tightly connected to the first mating portion 11a, improving the connection reliability between the limiting structure 20 and the first mating portion 11a.

[0059] Moreover, since the limiting structure 20 has elastic force, when the rotating shaft 11 is rotated to switch the spray body 10 between the working position and the non-working position, the limiting structure 20 can be elastically deformed and disengaged from the first matching part 11a, without manually moving the limiting structure 20 to avoid it, and the operation is more convenient.

[0060] In some embodiments, reference Figure 3 A first limiting groove a1 is provided on the circumferential wall of the rotating shaft 11, and the first limiting groove a1 serves as the first matching portion 11a.

[0061] In actual application, after the spraying arm 12 of the spraying mechanism 100 is rotated to the target working position, the limiting structure 20 moves to a position matching with the first limiting groove a1.

[0062] The first limiting groove a1 can be a triangular groove, a semicircular groove, a square groove, etc. Generally, the depth of the first limiting groove a1 is relatively shallow, so that the limiting structure 20 can smoothly escape from the first limiting groove a1 when elastically deformed. Furthermore, the limiting portion 21 of the limiting structure 20 in contact with the rotating shaft 11 can be a hemispherical body, a spherical body, etc., which makes it easier for the limiting structure 20 to escape from the first limiting groove a1. In practical applications, a ball plunger can be used as the limiting structure 20.

[0063] At this time, the first limiting groove a1 is used as the first matching portion 11a, which is easy to process and realize.

[0064] Further in the embodiment, a second limiting groove a2 is further provided on the circumferential wall of the rotating shaft 11, and the second limiting groove a2 and the first limiting groove a1 are arranged at the same axial height of the rotating shaft 11. The spraying body 10 can also rotate to a non-working position, and when the spraying body 10 is in the non-working position, the limiting structure 20 is limitedly connected to the second limiting groove a2.

[0065] The circumferential wall of the rotating shaft 11 is an outer circumferential wall arranged around the rotation axis thereof.

[0066] When the spraying body 10 is in the non-working position, the spraying body 10 can be staggered with the polishing disc to facilitate replacement of the polishing pad on the polishing disc or maintenance of the spraying body 10 .

[0067] The second limiting groove a2 is connected to the limiting structure 20 to limit the spray body 10, so as to prevent the spray body 10 from being displaced by external force when the spray body 10 is in the non-working position.

[0068] The second limiting groove a2 and the first limiting groove a1 are arranged at the same axial height of the rotating shaft 11, which can enable the limiting structure 20 to move relative to the rotating shaft 11 along the same circumferential surface when the rotating shaft 11 rotates. The limiting structure 20 can switch between the second limiting groove a2 and the first limiting groove a1, and the position of the limiting structure 20 in the axial direction of the rotating shaft 11 can remain unchanged, simplifying the movement of the limiting structure 20.

[0069] It should be noted that in other embodiments, the limiting structure 20 can move between a limiting position and an avoidance position. When the limiting structure 20 is located at the avoidance position, it allows the rotating shaft 11 to rotate. When the limiting structure 20 is located at the limiting position, it does not allow the avoidance position to rotate. When it is necessary to rotate the rotating shaft 11 of the spraying main body 10, the limiting structure 20 is first moved to its avoidance position. When it is necessary to limit the rotation of the rotating shaft 11, the limiting structure 20 is moved from its avoidance position to the limiting position.

[0070] In some embodiments, the sensing assembly 30 includes a matching measuring block 31 and a sensor 32. One of the measuring block 31 and the sensor 32 is fixedly arranged relative to the rotating shaft 11, and the other of the measuring block 31 and the sensor 32 is movably arranged around the outer circumference of the rotating shaft 11.

[0071] The measuring block 31 can be a metal block or a magnetic block. The sensor 32 can be, but is not limited to, a proximity sensor 32. When the measuring block 31 falls within the sensing range of the sensor 32, it can be sensed by the sensor 32 and can be judged that the rotating shaft 11 has not deflected or the deflection is within the allowable range.

[0072] In some examples, the measuring block 31 can be directly arranged on the rotating shaft 11 or on other objects that rotate synchronously with the rotating shaft 11. When rotating the rotating shaft 11 to adjust the working position of the spraying main body 10, the rotating shaft 11 drives the measuring block 31 to rotate, and the measuring block 31 moves out of the sensing range of the sensor 32. After the rotating shaft 11 rotates in place, the sensor 32 moves around the outer circumference of the rotating shaft 11 so that the measuring block 31 is again within the sensing range of the sensor 32.

[0073] During use, if the rotating shaft 11 deflects and causes the measuring block 31 to move out of the sensing range of the sensor 32, the sensor 32 can feedback the position deflection condition of the rotating shaft 11 to relevant personnel. At this time, the position deflection condition feedback by the sensor 32 can indicate that the rotating shaft 11 has deflected, and further monitor whether the spraying main body 10 deviates from the working position, and further monitor whether the landing position of the spraying main body 10 has changed.

[0074] At this time, the cost of the sensing assembly 30 is relatively low, and the monitoring cost of the spraying mechanism 100 is small, which helps to reduce its manufacturing cost.

[0075] In some embodiments, the spraying mechanism 100 includes an adjusting member 40, which does not rotate with the rotating shaft 11 and is movably disposed around the outer periphery of the rotating shaft 11. The other one of the measuring block 31 and the sensor 32 and the limiting structure 20 are both disposed on the adjusting member 40 and move synchronously with the adjusting member 40.

[0076] The adjusting member 40 can be an adjusting ring, an adjusting rod, an adjusting block, etc. It is separately disposed from the rotating shaft 11 and does not rotate with the rotating shaft 11. The adjusting member 40 can also move around the rotating shaft 11. Specifically, for example, both the adjusting member 40 and the rotating shaft 11 are installed on the machine table, and the adjusting member 40 moves relative to the machine table around the outer periphery of the rotating shaft 11. Among them, the adjusting member 40 can be in contact with the rotating shaft 11 or not in contact with the rotating shaft 11. If the rotating shaft 11 is in contact with the adjusting member 40, the contact between them should be rotatable contact.

[0077] Taking the sensor 32 being disposed on the adjusting member 40 as an example, since both the sensor 32 and the limiting structure 20 are disposed on the adjusting member 40, in actual application, only by operating the adjusting member 40 can the synchronous movement of the sensor 32 and the limiting structure 20 be realized. Furthermore, when the measuring block 31 on the rotating shaft 11 is located within the sensing range of the sensor 32, the limiting structure 20 can synchronously limit the rotating shaft 11 to the target working position, thus simplifying the operation.

[0078] In some embodiments, the spraying mechanism 100 further includes a fixing member 50 and a locking member. The fixing member 50 is fixedly disposed, the adjusting member 40 is disposed on the fixing member 50, and the locking member can lock and unlock the adjusting member 40 and the fixing member 50.

[0079] When it is necessary to adjust the positions of the limiting structure 20 and the sensor 32, the locking member unlocks the locking between the adjusting member 40 and the fixing member 50. After the landing position of the spraying mechanism 100 is adjusted in place, the locking member locks the adjusting member 40 and the fixing member 50, which can reduce the situation that the monitoring result is not in place and the rotating shaft 11 is not limited in place due to the displacement of the limiting structure 20 and the sensor 32 itself.

[0080] Among them, the locking member can be a buckle, a bolt, etc., as long as it can lock and unlock the adjusting member 40 and the fixing member 50.

[0081] It should be noted that in other embodiments, refer to Figure 6, the adjusting member 40 and the fixing member 50 can be fixedly connected (for example, integrally connected or assembled and connected). An arc-shaped mounting hole 53 is provided on the fixing member 50. When installing the spraying mechanism 100 on the CMP device 1000, the fixing member 50 is fixedly installed on the relevant load-bearing structure of the CMP device 1000 by a fastener passing through the arc-shaped mounting hole 53. The installation position of the fixing member 50 on the load-bearing structure can be adjusted by adjusting the position of the fastener in the arc-shaped mounting hole 53. Then, when installing the spraying mechanism 100, the landing position of the rotating shaft 11 at the working position can be set in advance. When the fixing member 50 is located at different installation positions, the set landing position of the rotating shaft 11 at the working position is different. That is to say, when installing the fixing member 50, the rotating shaft 11 can be kept at its working position, and by adjusting the installation position of the fixing member 50, the landing position of the rotating shaft 11 at the working position can be adjusted.

[0082] It can be understood that the center of the arc of the arc-shaped mounting hole 53 is located on the rotation axis of the rotating shaft 11. The number of arc-shaped mounting holes 53 can be configured in multiple, and the multiple arc-shaped mounting holes 53 are arranged at equal intervals around the rotation axis of the rotating shaft 11.

[0083] In some embodiments, both the adjusting member 40 and the fixing member 50 are annular. The adjusting member 40 is arranged around the rotating shaft 11, and the fixing member 50 is arranged around the adjusting member 40. A relief groove 51 is formed on the fixing member 50, and the other of the measuring block 31 and the sensor 32 and the limiting structure 20 both pass through the relief groove 51.

[0084] Both the adjusting member 40 and the fixing member 50 are annular. The movement of the adjusting member 40 can be regularized through the rotating shaft 11, which is also convenient for the installation of the fixing member 50 and the adjusting member 40. In actual application, the fixing member 50 can be fixedly arranged on the machine table of the CMP device 1000. It can be understood that the adjusting member 40 is rotatable around the rotating shaft 11, that is, the movement track of the adjusting member 40 is a circular or arc-shaped track.

[0085] The other of the measuring block 31 and the sensor 32 and the limiting structure 20 are both installed on the adjusting member 40 after passing through the relief groove 51 on the fixing member 50. The setting of the relief groove 51 facilitates the installation layout of the other of the measuring block 31 and the sensor 32 and the limiting structure 20. Moreover, the setting of the relief groove 51 can also limit the rotation range of the adjusting member 40 to save the adjustment time of the adjusting member 40.

[0086] Specifically, referring to Figure 3 , a locking hole 52 is provided on the fixing member 50. The circumferential wall of the adjusting member 40 passes through the locking hole 52, and a locking member can be inserted into the locking hole 52 to limit the circumferential wall of the adjusting member 40 to prevent it from rotating relative to the fixing member 50.

[0087] In some embodiments, referring toFigure 3 and Figure 5 The rotating shaft 11 has a free end, and the adjusting member 40 is provided at the free end of the rotating shaft 11. An anti-disengagement member 11c is provided at the free end, and the anti-disengagement member 11c abuts against the adjusting member 40 to limit the rotating shaft 11 from disengaging from the adjusting member 40.

[0088] The anti-disengagement member 11c can be provided on the end face of the free end and partially protrudes from the free end to abut against the adjusting member 40. The anti-disengagement member 11c can be in the shape of a sheet, a block, etc. The anti-disengagement member 11c and the rotating shaft 11 are usually separately provided.

[0089] At this time, the anti-disengagement member 11c can improve the installation reliability of the rotating shaft 11 and prevent the rotating shaft 11 from disengaging from the adjusting member 40.

[0090] At this time, the spraying arm 12 can be provided at the other end of the rotating shaft 11 opposite to the free end where the adjusting member 40 is located.

[0091] Specifically in the embodiment, in combination with Figure 4 and Figure 5 , the anti-disengagement member 11c has a connected arc circumferential surface m1 and a protruding circumferential surface m2. The central axis of the arc circumferential surface m1 is coaxial with the rotation axis of the rotating shaft 11, and the protruding circumferential surface m2 protrudes relative to the arc circumferential surface m1. A limiting post (not shown) is provided on the adjusting member 40. During the rotation of the rotating shaft 11, the limiting post and the arc circumferential surface m1 move relative to each other, and the limiting post is provided on the moving path of the protruding circumferential surface m2.

[0092] The arc circumferential surface m1 is a surface arranged around the rotation axis of the rotating shaft 11. The protruding circumferential surface m2 is adjacently connected to the arc circumferential surface m1 in the direction of surrounding the rotation axis of the rotating shaft 11. The protruding circumferential surface m2 intersects with the arc circumferential surface m1, and the protruding circumferential surface m2 protrudes relative to the arc circumferential surface m1 in the direction away from the rotation axis of the rotating shaft 11.

[0093] When the rotating shaft 11 rotates, the limiting post on the adjusting member 40 does not move and abuts against the arc circumferential surface m1. The arc circumferential surface m1 following the rotation of the rotating shaft 11 moves relative to the limiting post, so that the limiting post and the arc circumferential surface m1 move relative to each other. At this time, the limiting post does not hinder the rotation of the rotating shaft 11.

[0094] When the rotating shaft 11 rotates to a certain position, the limiting post can abut against the protruding circumferential surface m2. At this time, under the limitation of the limiting post, the rotating shaft 11 cannot continue to move, and the over-range rotation of the rotating shaft 11 can be prevented.

[0095] Such as Figure 5As shown, in some embodiments, for the convenience of machining the first limiting groove a1 and the second limiting groove a2, the arc-shaped circumferential surface m1 of the anti-disengagement member 11c extends along the axial direction of the rotating shaft 11 and serves as a part of the circumferential wall of the rotating shaft 11. The first limiting groove a1 and the second limiting groove a2 are both formed on the arc-shaped circumferential surface m1 and penetrate through both ends of the anti-disengagement member 11c along the axial direction of the rotating shaft 11. At this time, the radius dimension of the arc-shaped circumferential surface m1 from the rotation axis of the rotating shaft 11 is equal to the radius dimension of other circumferential walls of the rotating shaft 11. Specifically, a part of the rotating shaft 11 can be dug out and then the anti-disengagement member 11c can be embedded so that the arc-shaped circumferential surface m1 of the anti-disengagement member 11c serves as a part of the circumferential wall of the rotating shaft 11.

[0096] In an embodiment of the present application, the spraying mechanism 100 includes a spraying main body 10, a limiting structure 20, a sensor 32, a measuring block 31, an adjusting member 40, a fixing member 50, a locking member, and an anti-disengagement member 11c. The circumferential wall of the rotating shaft 11 of the spraying main body 10 is provided with a first limiting groove a1 and a second limiting groove, and the first limiting groove a1 and the second limiting groove are arranged at the same axial height on the circumferential wall of the rotating shaft 11. Both the limiting structure 20 and the sensor 32 are arranged on the annular adjusting member 40, and the measuring block 31 is arranged on the anti-disengagement member 11c. The adjusting member 40 can be locked on the annular fixing member 50 through the locking member, and the locking member can also release the locking between the fixing member 50 and the adjusting member 40.

[0097] In addition, the embodiment of the present application also provides a method for adjusting and monitoring the landing position of the spraying mechanism 100 in any of the above embodiments, including:

[0098] S10. Rotate the spraying main body 10 to a target working position corresponding to the target landing position;

[0099] Optionally, the staff manually operates the spraying main body 10 to rotate its rotating shaft 11 until the landing position of the spraying main body 10 is the target landing position. At this time, the spraying main body 10 is located at the target working position. Of course, a rotation driving mechanism (such as a motor) can also be installed on the rotating shaft 11, and the spraying main body 10 is controlled to rotate through the driving mechanism.

[0100] S20. Move the limiting structure 20 to a limiting position to prevent the rotating shaft 11 of the spraying main body 10 located at the target working position from rotating;

[0101] Specifically, the limiting structure 20 can be manually moved to the limiting position, or the limiting structure 20 can be connected to a driving mechanism to control its movement through the driving mechanism. In some examples, the limiting structure 20 is installed on an annular adjusting member 40, and the limiting structure 20 can be moved to the limiting position by rotating the adjusting member 40. That is, S20 can specifically include: rotating the adjusting member 40 until the limiting structure 20 reaches the limiting position. Specifically in some examples, S20 can further include: moving the limiting structure 20 to the limiting position where it is connected to the first mating portion 11a. Specifically in some examples, the adjusting member 40 is fixed to the fixing member 50 through a locking member. S20 can specifically include: S21, releasing the locking of the fixing member 50 and the adjusting member 40 by the locking member (for example, if the locking member is a bolt, unscrew or remove the bolt from the fixing member 50 so that the adjusting member 40 is not locked with the fixing member 50); S22, moving the adjusting member 40 until the limiting structure 20 reaches its limiting position; S23, locking the fixing member 50 and the adjusting member 40 with the locking member.

[0102] S30. Obtain the position deflection of the rotating shaft 11 of the spraying main body 10 at the target working position monitored by the sensing assembly 30, and identify whether the landing position of the spraying main body 10 has changed according to the position deflection.

[0103] The position deflection monitored by the sensing assembly 30 depends on the specific type of the sensing assembly 30. For example, if the sensing assembly 30 includes an angle encoder, the monitored position deflection can be the angle information collected by the angle encoder, and whether the angle of the rotating shaft 11 has deflected can be identified according to this angle information. Another example is that the sensing assembly 30 includes a measuring block 31 and a proximity switch, and the monitored position deflection by the sensing assembly 30 can be the level signal fed back by the proximity switch. For example, when the measuring block 31 is within the sensing range of the proximity switch, the proximity switch monitors a high-level signal indicating that the rotating shaft 11 has not deflected. When the measuring block 31 is outside the sensing range of the proximity switch and the proximity switch detects the measuring block 31, it can send a low-level signal indicating that the rotating shaft 11 has deflected.

[0104] The sensing assembly 30 can be externally connected to a processing device. The processing device can inform the position deflection of the rotating shaft 11 in ways such as display / email notification, text message notification, beeping, voice broadcast, and alarm light flashing according to the information fed back by the sensing assembly 30. Then, the staff can adjust the position of the rotating shaft 11 according to the position deflection. Or, the processing device directly controls the relevant driving mechanism to drive the rotating shaft 11 to rotate and adjust the position of the rotating shaft 11. Among them, the position deflection informed by the processing device can include but is not limited to deflected, not deflected, forward deflection angle, reverse deflection angle, etc.

[0105] In this way, not only is the adjustment of the working position of the spraying mechanism 100 achieved, but also the probability of the landing position of the spraying main body 10 changing when in the working position can be reduced through the limiting structure 20, and further, the position of the rotating shaft 11 is monitored by the sensing component 30, so that even if the working position changes, it can be detected in time to facilitate timely correction of its landing position.

[0106] In addition, an embodiment of the present application also provides a CMP device 1000. Referring to Figure 1 , the CMP device 1000 includes a polishing disc 200 and the spraying mechanism 100 in any of the above embodiments. The spraying main body 10 of the spraying mechanism 100 located at the target working position can spray polishing liquid onto the target landing position on the polishing disc 200. The specific structure of the CMP device 1000 can be referred to the above description and will not be elaborated here. It can be understood that the CMP device 1000 has all the beneficial effects in the above embodiments.

[0107] The technical features of the above embodiments can be combined arbitrarily. For the sake of brevity of description, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, it should be considered as the scope recorded in this specification.

[0108] The above embodiments only represent several implementation manners of the present application, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the patent scope of the present application. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present application, several modifications and improvements can still be made, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the appended claims.

Claims

1. A spraying mechanism, characterized in that, Comprising: A spraying main body (10), including a rotatable rotating shaft (11), and when the rotating shaft (11) rotates, the landing position of the spraying main body (10) can be adjusted; A limiting structure (20), movably arranged relative to the rotating shaft (11), and the limiting structure (20) can move to a limiting position that hinders the rotation of the rotating shaft (11) to limit the spraying main body (10) at a target working position corresponding to the target landing position; and A sensing assembly (30), used for monitoring the position deflection of the rotating shaft (11) of the spraying main body (10) located at the target working position.

2. The spraying mechanism according to claim 1, characterized in that, The rotating shaft (11) includes a first fitting portion (11a), and when the spraying main body (10) is at the target working position, the limiting structure (20) is at a limiting position connected to the first fitting portion (11a).

3. The spraying mechanism according to claim 2, wherein, The limiting structure (20) is configured to elastically abut against the rotating shaft (11); when the rotating shaft (11) rotates, the limiting structure (20) connected to the first fitting portion (11a) can elastically deform and disengage from the first fitting portion (11a).

4. The spraying mechanism according to claim 3, characterized in that, A first limiting groove (a1) is provided on the circumferential wall of the rotating shaft (11), and the first limiting groove (a1) serves as the first fitting portion (11a); A second limiting groove (a2) is further provided on the circumferential wall of the rotating shaft (11), and the second limiting groove (a2) and the first limiting groove (a1) are arranged at the same axial height of the rotating shaft (11); the spraying main body (10) can also rotate to a non-working position, and when the spraying main body (10) is at the non-working position, the limiting structure (20) is in limiting connection with the second limiting groove (a2).

5. The spraying mechanism according to any one of claims 1 to 4, characterized in that, The sensing assembly (30) includes a matching measuring block (31) and a sensor (32), and one of the measuring block (31) and the sensor (32) is fixedly arranged relative to the rotating shaft (11), and the other of the measuring block (31) and the sensor (32) is movably arranged relative to the rotating shaft (11).

6. The spraying mechanism according to claim 5, characterized in that, The spraying mechanism includes an adjusting member (40), the adjusting member (40) does not rotate with the rotating shaft (11), and can move around the outer periphery of the rotating shaft (11), and the other of the measuring block (31) and the sensor (32) and the limiting structure (20) are both arranged on the adjusting member (40) and move synchronously with the adjusting member (40); The spraying mechanism further includes a fixing member (50) and a locking member, the fixing member (50) is fixedly arranged, the adjusting member (40) is arranged on the fixing member (50), and the locking member can lock and unlock the adjusting member (40) and the fixing member (50).

7. The spraying mechanism according to claim 6, characterized in that Both the adjusting member (40) and the fixing member (50) are annular, the adjusting member (40) is arranged around the rotating shaft (11), and the fixing member (50) is arranged around the adjusting member (40); An avoidance groove (51) is formed on the fixing member (50), and the other one of the measuring block (31) and the sensor (32) and the limiting structure (20) both pass through the avoidance groove (51).

8. The spraying mechanism according to claim 6, characterized in that, The rotating shaft (11) has a free end, and the fixing member (50) is arranged at the free end of the rotating shaft (11); a anti-disengagement member (11c) is arranged at the free end, and the anti-disengagement member (11c) abuts against the adjusting member (40) to limit the rotating shaft (11) from disengaging from the adjusting member (40).

9. The spraying mechanism according to claim 8, characterized in that, The anti-disengagement member (11c) has a connected arc-shaped circumferential surface (m1) and a protruding circumferential surface (m2), the central axis of the arc-shaped circumferential surface (m1) is coaxial with the rotation axis of the rotating shaft (11), and the protruding circumferential surface (m2) protrudes relative to the arc-shaped circumferential surface (m1); a limiting post is arranged on the adjusting member (40); during the rotation of the rotating shaft (11), the limiting post and the arc-shaped circumferential surface (m1) move relative to each other, and the limiting post is arranged on the moving path of the protruding circumferential surface (m2).

10. A CMP device, characterized in that, It includes a polishing disc (200) and the spraying mechanism according to any one of claims 1 to 8, and the spraying main body (10) of the spraying mechanism located at the target working position can spray polishing liquid to the target landing position on the polishing disc (200).

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