Substrate cleaning device

Abstract

The utility model belongs to the technical field of display screen manufacturing, and discloses a substrate cleaning device which comprises a conveying line used for conveying a substrate, a cleaning mechanism comprises a fixing seat, a blowing part, an ultrasonic generator and an air extracting part, the blowing part is used for blowing air to the substrate, the ultrasonic generator sends out ultrasonic waves and acts on the substrate, and the air extracting part is used for extracting air from the substrate. The air extracting part is used for extracting the impurities separated from the substrate, so that the impurities on the surface of the substrate are separated from the substrate; the X-ray generator is used for emitting X-rays to the substrate so as to remove static electricity on the substrate. According to the substrate cleaning device, the blowing part is matched with the ultrasonic generator, so that ultrasonic waves generated by the ultrasonic generator act on the surface of the substrate along with gas blown by the blowing part, and impurities such as dust adhered to the surface of the substrate are separated from the substrate and are blown in the air along with the gas; and the air exhaust part is used for extracting the impurities floating in the air and partially remaining on the substrate, so that the removal effect of the impurities on the surface of the substrate is effectively ensured, and the production quality of the substrate is ensured.

Description

Technical Field

[0001] The utility model relates to the technical field of display screen manufacturing, in particular to a substrate cleaning device. Background Art

[0002] A liquid crystal display screen is a device for displaying various information such as text, images, videos, and video signals. The liquid crystal display screen includes a liquid crystal display panel and a backlight module. The working principle of the liquid crystal display panel is to place liquid crystal molecules between two parallel glass substrates, and by energizing the circuit of the glass substrate, the liquid crystal molecules are controlled to change their directions, and the light of the backlight module is refracted to generate an image.

[0003] During the production process of the liquid crystal display panel, dust and other impurities often remain on the glass substrate, resulting in defects such as bright spots or bright lines on the liquid crystal display panel, affecting the display effect. Refer to Figure 1 As shown, in an existing glass panel cleaning device, an air knife 3' is arranged on a conveyor line 2' for transporting a glass substrate 1'. The air knife 3' is connected to an external negative pressure device, so that a negative pressure can be generated at the connection port of the air knife 3' facing the glass substrate 1' to adsorb the surface impurities of the glass substrate 1'. The existing technology has the following deficiencies: impurities with a large mass on the glass substrate 1' have a large adhesion force, and it is difficult to remove them simply by adsorption with the air knife 3', resulting in incomplete impurity cleaning and affecting the production quality of the glass substrate 1'. Summary of the Utility Model

[0004] The purpose of the utility model is to provide a substrate cleaning device, which has a simple structure and good impurity separation effect, ensuring the cleaning effect of the substrate.

[0005] To achieve this purpose, the utility model adopts the following technical solutions:

[0006] Provide a substrate cleaning device, including a conveyor line, a cleaning mechanism, and an X-ray generator. The conveyor line is used to convey the substrate in a first direction; the cleaning mechanism is used to clean the impurities adhered to the surface of the substrate. The cleaning mechanism includes a fixed seat and a blowing member, an ultrasonic generator, and a pumping member arranged on the fixed seat. The fixed seat is arranged above the conveyor line. The blowing member is used to blow gas onto the substrate. The ultrasonic generator emits ultrasonic waves and acts on the substrate along with the gas, so that the impurities on the surface of the substrate are separated from the substrate. The pumping member is used to extract the separated impurities on the substrate; the X-ray generator is arranged on the fixed seat, and the X-ray generator is used to emit X-rays to the substrate to remove the static electricity on the substrate.

[0007] As a preferred solution of the substrate cleaning device, an air outlet and two air extraction ports are provided on one side of the fixed seat facing the conveying line. The lengths of the air outlet and the air extraction ports extend along the second direction. The two air extraction ports are spaced along the first direction. The air outlet is spaced between the two air extraction ports. The blowing member includes a first fan, and the air extraction member includes a second fan. The first fan is used to provide blowing gas to the air outlet, and the second fan is used to generate negative pressure at the air extraction ports to extract the impurities. Wherein, the first direction and the second direction are arranged at an angle.

[0008] As a preferred solution of the substrate cleaning device, a first air chamber and two second air chambers are arranged in the fixed seat. The two second air chambers are spaced along the first direction. The first air chamber is spaced between the two second air chambers. Each second air chamber is correspondingly communicated with one of the air extraction ports. The air outlet is communicated with the first air chamber. The second air chamber is communicated with the first air chamber through a connecting pipe. The ultrasonic generator is arranged in the first air chamber.

[0009] As a preferred solution of the substrate cleaning device, the substrate cleaning device further includes a filtering member, and the filtering member is detachably arranged in the second air chamber.

[0010] As a preferred solution of the substrate cleaning device, the first fan and the second fan share a negative pressure fan, and the negative pressure fan is arranged on the connecting pipe.

[0011] As a preferred solution of the substrate cleaning device, the substrate cleaning device further includes a detection mechanism and a controller. The detection mechanism is spaced along the first direction on one side of the fixed seat adjacent to the initial end of the conveying line. The detection mechanism is used to detect the impurity density on the surface of the substrate, and the detection mechanism is signal-connected to the negative pressure fan through the controller.

[0012] As a preferred solution of the cleaning device, the cleaning mechanism further includes an adjusting assembly. The adjusting assembly includes a driving member and a shielding plate. The driving member is arranged on the fixed seat. The driving member is in transmission connection with the shielding plate to drive the shielding plate to move along the second direction and simultaneously shield part of the air outlet and the air extraction ports, so as to adjust the sizes of the air outlet and the air extraction ports along the second direction.

[0013] As a preferred embodiment of the substrate cleaning device, the adjusting assembly further includes two support plates. The two support plates are arranged at intervals along the first direction on the side of the fixed seat adjacent to the conveying line. Each support plate includes a connecting portion and a supporting portion connected to each other. The connecting portion is connected to the fixed seat. The supporting portions are arranged on the sides of the two connecting portions close to each other. An installation groove is formed at an interval between the supporting portion and the side of the fixed seat adjacent to the conveying line. At least a part of the shielding plate is inserted into the installation groove.

[0014] As a preferred embodiment of the substrate cleaning device, the frequency of the ultrasonic generator is 30 - 80KHZ.

[0015] As a preferred embodiment of the substrate cleaning device, the X-ray generator is arranged on one side of the fixed seat along the first direction adjacent to the initial end of the conveying line.

[0016] Advantages of the present utility model: Through the cooperation of the blowing member and the ultrasonic generator, the ultrasonic waves generated by the ultrasonic generator act on the surface of the substrate along with the gas blown by the blowing member, so that dust and other impurities adhered to the surface of the substrate are separated from the substrate and are blown into the air with the gas, improving the separation effect of the impurities from the substrate. Then, the air extraction member is used to extract the impurities floating in the air and part of the impurities still remaining on the substrate, reducing the situation that the substrate is re-contaminated or the production environment is contaminated due to the splashing of impurities, effectively ensuring the removal effect of the impurities on the surface of the substrate and ensuring the production quality of the substrate. The X-ray generator emits X-rays to the substrate to eliminate the static electricity on the surface of the substrate, reducing the increase in the bending degree of the substrate caused by static electricity, which may lead to the substrate being easily broken during the transfer process, and improving the production yield of the substrate. Description of the Drawings

[0017] The following further describes the present utility model in detail according to the drawings and embodiments.

[0018] Figure 1 is a schematic structural view of an existing substrate cleaning device;

[0019] Figure 2 is a schematic structural view of the substrate cleaning device according to the embodiment of the present utility model;

[0020] Figure 3 is a schematic structural view of the cleaning mechanism according to the embodiment of the present utility model;

[0021] Figure 4 is a cross-sectional view of the cleaning mechanism according to the embodiment of the present utility model.

[0022] Figure 1 In the figures:

[0023] 1′, glass substrate; 2′, conveying line; 3′, air knife.

[0024] Figures 2 to 4 In:

[0025] 100. Substrate

[0026] 1. Conveyor line; 2. Cleaning mechanism; 21. Fixed seat; 211. Air outlet; 212. Air extraction port; 213. First air chamber; 214. Second air chamber; 22. Ultrasonic generator; 23. Adjustment assembly; 231. Driving member; 232. Baffle; 233. Support plate; 2331. Connection part; 2332. Support part; 3. X-ray generator; 4. Connecting pipe; 5. Filter element; 6. Negative pressure fan; 7. Detection mechanism Detailed implementation manners

[0027] Referring to the embodiments described in detail below in conjunction with the accompanying drawings, the advantages and features of the present utility model and the methods for realizing them will become apparent. However, the present utility model is not limited to the embodiments disclosed below, but can be implemented in various different forms. The provision of the present embodiments is only for the purpose of completing the disclosure of the present utility model and enabling those skilled in the art to fully understand the scope of the present utility model, and the present utility model is only defined by the scope of the claims. The same reference numerals represent the same components throughout the specification

[0028] Hereinafter, the present utility model will be described in detail with reference to the drawings

[0029] As Figures 2 to 4 shown, the substrate cleaning device according to the embodiment of the present utility model includes a conveyor line 1, a cleaning mechanism 2 and an X-ray generator 3. The conveyor line 1 is used to convey the substrate 100 in the first direction (the first direction is the X direction shown in the figure, that is, the conveying direction of the conveyor line). The cleaning mechanism 2 is used to clean the impurities adhered to the surface of the substrate 100. The cleaning mechanism 2 includes a fixed seat 21 and a blowing member, an ultrasonic generator 22 and an air extraction member provided on the fixed seat 21. The fixed seat 21 is arranged above the conveyor line 1 through a frame, that is, the fixed seat 21 is located above the conveyor line 1 in the vertical direction (the vertical direction is the Z direction shown in the figure). The blowing member is used to blow gas onto the substrate 100. The ultrasonic generator 22 emits ultrasonic waves and acts on the substrate 100 along with the gas, so that the impurities on the surface of the substrate 100 are separated from the substrate 100. The air extraction member is used to extract the separated impurities on the substrate 100. The X-ray generator 3 is arranged on the fixed seat 21, and the X-ray generator 3 is used to emit X-rays onto the substrate 100 to remove the static electricity on the substrate 100

[0030] It can be understood that through the cooperation of the blowing member and the ultrasonic generator 22, the ultrasonic waves generated by the ultrasonic generator 22 act on the surface of the substrate 100 along with the gas blown by the blowing member, so that impurities such as dust adhering to the surface of the substrate 100 are separated from the substrate 100 and are blown into the air with the gas, improving the separation effect of the impurities from the substrate 100. Then, the pumping member is used to extract the impurities floating in the air and some still remaining on the substrate 100, reducing the situation that the substrate 100 is re-contaminated or the production environment is contaminated due to the splashing of impurities, effectively ensuring the removal effect of the impurities on the surface of the substrate 100 and ensuring the production quality of the substrate 100; the X-ray generator 3 emits X-rays to the substrate 100 to eliminate the static electricity on the surface of the substrate 100, reducing the increase in the bending degree of the substrate 100 caused by static electricity and further reducing the situation that the substrate 100 is prone to breakage during the transfer process, improving the production yield of the substrate 100.

[0031] Further, as Figure 3 and Figure 4 shown, the fixing base 21 is provided with an air outlet 211 and two air extraction ports 212 on the side facing the conveying line 1. The lengths of the air outlet 211 and the air extraction ports 212 extend along the second direction (the second direction is the Y direction shown in the figure). The two air extraction ports 212 are arranged at intervals along the first direction. The air outlet 211 is arranged at intervals between the two air extraction ports 212. The blowing member includes a first fan, and the pumping member includes a second fan. The first fan is used to provide the blowing gas to the air outlet 211, and the second fan is used to generate negative pressure at the air extraction ports 212 to extract impurities. Among them, the first direction, the second direction, and the vertical direction are perpendicular to each other in pairs. The structure of the fixing base 21 is stable. By arranging the air outlet 211 and the air extraction ports 212 on the fixing base 21, the structural stability of the air outlet 211 and the air extraction ports 212 can be ensured, and the arrangement of other pipelines can be reduced, thereby reducing the disorder of pipeline layout and improving the overall neatness of the structure. And by arranging the air outlet 211 between the two air extraction ports 212, after the first fan blows the impurities on the substrate 100 through the air blowing port, the air extraction ports 212 on both sides along the first direction can adsorb the impurities for cleaning, reducing the splashing of impurities and ensuring the cleaning effect of the impurities. Of course, in other embodiments, the air extraction ports 212 can be arranged around the circumference of the air extraction ports 212, so that the impurities blown on the substrate 100 can be surrounded by the air extraction ports 212, and the cleaning effect is good.

[0032] Even further, as Figure 3 and Figure 4As shown in the figure, a first air chamber 213 and two second air chambers 214 are provided in the fixed seat 21. The two second air chambers 214 are arranged at intervals in the first direction, and the first air chamber 213 is arranged at intervals between the two second air chambers 214. Each second air chamber 214 is correspondingly communicated with an air extraction port 212. The air outlet 211 is communicated with the first air chamber 213. The second air chamber 214 is communicated with the first air chamber 213 through a connecting pipe 4. The ultrasonic generator 22 is arranged in the first air chamber 213. By arranging the ultrasonic generator 22 in the first air chamber 213, the protection of the ultrasonic generator 22 and the fusion with the gas ejected from the air outlet 211 are effectively guaranteed. By connecting the second air chamber 214 and the first air chamber 213 through the connecting pipe 4, the connectivity and reflux of the gas at the air outlet 211 and the air extraction port 212 are effectively guaranteed, reducing the situation that other pumping or discharging in the working environment forms an air flow to drive more impurities to splash.

[0033] Furthermore, as Figure 4 shown, the substrate cleaning device further includes a filter element 5, and the filter element 5 is detachably arranged in the second air chamber 214. Through the setting of the filter element 5, on the one hand, it is convenient to collect impurities uniformly for cleaning, and on the other hand, it can prevent impurities from entering the fan and affecting the use of the fan, ensuring the service life of the fan. For example, the filter element 5 is a fixed frame and a filter net arranged on the fixed frame. A connection port communicated with the second air chamber 214 is arranged on the fixed seat 21. The filter net can be installed by inserting the fixed frame into the connection port, which is convenient for disassembly and assembly and has high maintenance convenience.

[0034] In the embodiment, the first fan and the second fan share a negative pressure fan 6. The negative pressure fan 6 is arranged on the connecting pipe 4. In other words, the negative pressure fan 6 can be used to generate negative pressure at the air extraction port 212 for extraction, and the gas pumped by the negative pressure fan 6 from the air extraction port 212 can generate positive pressure to blow the gas into the first air chamber 213 after being filtered by the filter element 5 through the connecting pipe 4. This structural setting can reduce the investment in fans, lower the equipment cost and the occupied space of the structure.

[0035] Further, as Figure 2 shown, the substrate cleaning device further includes a detection mechanism 7 and a controller. The detection mechanism 7 is arranged at intervals in the first direction on one side of the fixed seat 21 adjacent to the initial end of the conveying line 1. The detection mechanism 7 is used to detect the impurity density on the surface of the substrate 100, and the detection mechanism 7 is signal-connected to the negative pressure fan 6 through the controller. The detection mechanism 7 can directly use a camera. Different power adjustment grades of the negative pressure fan 6 and the threshold values of the impurity density at the corresponding grades are set in the controller. The actual working power of the negative pressure fan 6 is regulated by comparing the camera scanning result with the threshold value in the controller, reducing the long-term high-power consumption output of the negative pressure fan 6 and lowering the production cost.

[0036] In some embodiments, the X-ray generator 3 is disposed on one side of the fixed seat 21 adjacent to the initial end of the conveyor line 1 along the first direction, so as to remove the static electricity on the substrate 100 before the impurities on the substrate 100 are vibrationally separated by ultrasonic waves, thereby reducing the adhesion force between the surface of the substrate 100 and the impurities, and making the separation effect of the impurities and the substrate 100 better when the subsequent ultrasonic waves and the blowing gas act on the impurities on the surface of the substrate 100.

[0037] Preferably, the frequency of the ultrasonic generator 22 is 30-80 KHZ. For example, the frequency of the ultrasonic generator 22 is 30 KHZ, 40 KHZ, 50 KHZ, 60 KHZ, 70 KHZ or 80 KHZ, etc., but not limited thereto. The ultrasonic vibration effect at this frequency is good, which can not only ensure the separation effect of the impurities and the substrate 100, but also prevent the substrate 100 from vibrating itself and colliding with the conveyor line 1.

[0038] In other embodiments, as Figure 3 and Figure 4 shown, the conveyor line 1 is compatible with the production of substrates 100 of different sizes. When producing substrates 100 with different sizes in the second direction, the compatibility adjustment of the conveyor line 1 is achieved by adjusting the baffle on the conveyor line 1. Therefore, the cleaning mechanism 2 further includes an adjustment component 23, and the adjustment component 23 includes a driving member 231 and a shielding baffle 232. The driving member 231 is disposed on the fixed seat 21, and the driving member 231 is in transmission connection with the shielding baffle 232 to drive the shielding baffle 232 to move along the second direction and simultaneously cover part of the air outlet 211 and the air suction port 212, so as to adjust the sizes of the air outlet 211 and the air suction port 212 along the second direction. Through the setting of the adjustment component 23, the sizes of the air outlet 211 and the air suction port 212 are adjusted to adapt to the production of substrates 100 of different sizes, avoiding the gas being blown to other positions of the equipment other than the substrate 100 or sucking the gas from other positions of the equipment, resulting in more impurity splashing, and improving the versatility of the cleaning mechanism 2. Of course, in order to adapt to the changes in the sizes of the air outlet 211 and the air suction port 212, the driving member 231 can be synchronously combined with the control of the negative pressure fan 6 by the controller, that is, when the air outlet 211 and the air suction port 212 are reduced, the power of the negative pressure fan 6 can be controlled to decrease synchronously to ensure the smooth flow of the air flow at the air outlet 211 and the air suction port 212.

[0039] Further, the adjusting assembly 23 further includes two support plates 233. The two support plates 233 are arranged at intervals in the first direction on one side of the fixed seat 21 adjacent to the conveying line 1. The support plate 233 includes a connecting portion 2331 and a supporting portion 2332 which are connected to each other. The connecting portion 2331 is connected to the fixed seat 21. The supporting portions 2332 are arranged on the sides of the two connecting portions 2331 adjacent to each other. An installation groove is formed at an interval between the supporting portion 2332 and one side of the fixed seat 21 adjacent to the conveying line 1. At least a part of the shielding plate 232 is inserted into the installation groove. By inserting the shielding plate 232 into the installation groove, on the one hand, the installation groove can be used to limit the shielding plate 232, strengthening the movement guiding property and stability of the shielding plate 232. On the other hand, through the support of the supporting portion 2332 for the shielding plate 232, the bearing capacity of the shielding plate 232 on the driving member 231 is reduced, the connection strength between the shielding plate 232 and the driving member 231 is improved, and the service life of the driving member 231 is ensured. Preferably, balls are arranged on the groove wall of the installation groove to reduce the friction between the shielding plate 232 and the groove wall of the installation groove.

[0040] Although the embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments, but can be manufactured in various forms, and those skilled in the art will understand that the present invention can be implemented in other specific forms without changing the technical spirit or basic features of the present invention. Therefore, it should be understood that the above embodiments are exemplary in all aspects and not restrictive.

Claims

1. A substrate cleaning device, characterized in that, include: a conveying line, the conveying line being used to convey the substrate along a first direction; a cleaning mechanism for cleaning impurities adhering to the surface of the substrate, the cleaning mechanism comprising a fixed seat and a blowing member, an ultrasonic generator, and an exhaust member disposed on the fixed seat, the fixed seat being disposed above the conveyor line, the blowing member being used to blow gas toward the substrate, the ultrasonic generator emitting ultrasonic waves that act on the substrate along with the gas to separate impurities on the surface of the substrate from the substrate, and the exhaust member being used to extract the impurities separated from the substrate; An X-ray generator is disposed on the fixing seat and is used for emitting X-rays toward the substrate to remove static electricity on the substrate.

2. The substrate cleaning device according to claim 1, wherein The fixed seat is provided with an air outlet and two air suction ports on the side facing the conveying line, the lengths of the air outlet and the air suction ports extend along the second direction, the two air suction ports are spaced apart along the first direction, and the air outlet is spaced between the two air suction ports, the blowing part includes a first fan, and the air suction part includes a second fan, the first fan is used to provide blowing gas to the air outlet, and the second fan is used to generate negative pressure at the air suction port to extract the impurities, wherein the first direction and the second direction are set at an angle.

3. The substrate cleaning device according to claim 2, characterized in that, A first air chamber and two second air chambers are provided in the fixing seat, the two second air chambers are spaced apart along the first direction, the first air chamber is spaced apart between the two second air chambers, each of the second air chambers is connected to a corresponding air extraction port, the air outlet is connected to the first air chamber, the second air chamber is connected to the first air chamber through a connecting pipe, and the ultrasonic generator is provided in the first air chamber.

4. The substrate cleaning device according to claim 3, wherein, It also includes a filter element, which is detachably installed in the second air chamber.

5. The substrate cleaning device according to claim 3, wherein, The first fan and the second fan share a negative pressure fan, and the negative pressure fan is arranged on the connecting pipe.

6. The substrate cleaning device according to claim 5, wherein, It also includes a detection mechanism and a controller. The detection mechanism is arranged at intervals along the first direction on one side of the fixed seat adjacent to the initial end of the conveying line. The detection mechanism is used to detect the impurity density on the surface of the substrate, and the detection mechanism is connected to the negative pressure fan signal through the controller.

7. The substrate cleaning device according to claim 2, characterized in that, The cleaning mechanism also includes an adjustment component, which includes a driving member and a baffle. The driving member is arranged on the fixed seat, and the driving member is transmission-connected to the baffle to drive the baffle to move along the second direction and simultaneously cover part of the air outlet and the air exhaust port, thereby adjusting the size of the air outlet and the air exhaust port along the second direction.

8. The substrate cleaning device according to claim 7, wherein The adjustment assembly also includes two support plates, which are spaced apart along the first direction on the side of the fixed seat adjacent to the conveyor line. The support plates include a connecting portion and a supporting portion that are connected to each other. The connecting portion is connected to the fixed seat, and the supporting portion is provided on a side adjacent to each other of the two connecting portions. The supporting portion and the side of the fixed seat adjacent to the conveyor line are spaced apart to form an installation groove, and the shielding plate is at least partially inserted into the installation groove.

9. The substrate cleaning device according to any one of claims 1-8, characterized in that, The frequency of the ultrasonic generator is 30 to 80 KHZ.

10. The substrate cleaning device according to any one of claims 1-8, characterized in that, The X-ray generator is arranged on one side of the fixed seat adjacent to the initial end of the conveyor line along the first direction.

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