Industrial park automatic dosing system and waste gas treatment system

Abstract

The utility model provides an industrial park automatic dosing system and a waste gas treatment system. The automatic dosing system for the industrial park comprises a central dosing box, a transfer dosing box, a central dosing pump, a dosing electromagnetic valve, a limiting magnetic turning plate liquid level meter and a PLC (programmable logic controller), a dosing outlet of the central dosing box is connected with the central dosing pump through a first connecting pipeline, and the central dosing pump is connected with a dosing inlet of the transfer dosing box through a second connecting pipeline. The chemical adding electromagnetic valve is arranged on the first connecting pipeline, the limiting magnetic flap liquid level meter is arranged on the transfer chemical adding box, and the limiting magnetic flap liquid level meter, the central chemical adding pump and the chemical adding electromagnetic valve are all electrically connected with the PLC. According to the automatic chemical adding system for the industrial park, the chemical adding electromagnetic valve is linked with the limiting magnetic turning plate liquid level meter, and the limiting magnetic turning plate liquid level meter is linked with the central chemical adding pump, so that real-time monitoring on the chemical liquid condition of the transfer chemical adding box is realized, and sufficient chemical liquid of the transfer chemical adding box is ensured.

Description

Technical Field

[0001] The present disclosure relates to the technical field of waste gas treatment, and particularly to an automatic dosing system for industrial parks and a waste gas treatment system. Background Art

[0002] In the waste gas treatment of industrial parks, there are many defects in the method of manual medicine preparation. Manual operation is not only inefficient, but also difficult to guarantee accuracy. During the daily medicine preparation process, due to human negligence or difficulty in real-time monitoring, it often occurs that the liquid medicine is used up without being noticed, resulting in the interruption of the waste gas treatment process, affecting the overall treatment effect and having an adverse impact on the environment.

[0003] Therefore, as disclosed in Chinese Patent No. CN 216825605 U, a stable automatic dosing system for a waste gas treatment device is provided, which includes a medicine preparation tank, a medicine preparation lift pump, a dosing tank, a dosing lift pump and a circulating liquid tank. The outlet of the medicine preparation tank is connected to the inlet of the dosing tank through the medicine preparation lift pump. The outlet of the dosing tank is connected to the dosing port of the circulating liquid tank through the dosing lift pump. The circulating liquid tank is arranged at the lower part of the waste gas purification tower and is connected to the bottom of the waste gas purification tower. At the same time, a spray pump is arranged on the circulating liquid tank, and the liquid medicine in the circulating liquid tank is transported to the spray system of the waste gas purification tower through the spray pump.

[0004] However, the above stable automatic dosing system for the waste gas treatment device only acts jointly through the UQK type float level controller, the return pipe at the outlet of the dosing lift pump and the full-automatic water level control valve to avoid the influence of incorrect or unstable liquid level output of the circulating liquid tank on the dosing device, but it cannot monitor the liquid medicine situation in the dosing tank in real time and cannot ensure that the dosing tank is full of liquid medicine. Summary of the Utility Model

[0005] The purpose of the present disclosure is to overcome the deficiencies in the prior art and provide an automatic dosing system for industrial parks and a waste gas treatment system that can monitor in real time and ensure that the intermediate dosing tank is full of liquid medicine.

[0006] The purpose of the present disclosure is achieved by the following technical solutions:

[0007] An automatic dosing system for industrial parks includes a central dosing tank, an intermediate dosing tank and a central dosing pump. The medicine outlet of the central dosing tank is connected to the central dosing pump through a first connecting pipe. The central dosing pump is connected to the medicine inlet of the intermediate dosing tank through a second connecting pipe.

[0008] The automatic chemical dosing system for the industrial park further includes a chemical dosing solenoid valve, a limit magnetic flap level gauge, and a PLC controller; the chemical dosing solenoid valve is arranged on the second connecting pipe, the limit magnetic flap level gauge is arranged on the intermediate chemical dosing tank, and the limit magnetic flap level gauge, the central chemical dosing pump, and the chemical dosing solenoid valve are all electrically connected to the PLC controller.

[0009] In one embodiment, the automatic chemical dosing system for the industrial park further includes a back pressure valve and a pressure relief and reflux pipe. The central chemical dosing tank is provided with a reflux port. Two ends of the pressure relief and reflux pipe are respectively communicated with the reflux port and the connection port of the second connecting pipe. The back pressure valve is arranged on the pressure relief and reflux pipe and is used for monitoring the pressure value of the second connecting pipe.

[0010] In one embodiment, the automatic chemical dosing system for the industrial park further includes a diaphragm pressure gauge. The diaphragm pressure gauge is arranged on the second connecting pipe between the central chemical dosing pump and the connection port and is used for adjusting the pressure setting value of the back pressure valve.

[0011] In one embodiment, the automatic chemical dosing system for the industrial park further includes a spray tower water tank and a chemical supply pump. The chemical outlet of the intermediate chemical dosing tank is communicated with the spray tower water tank through the chemical supply pump.

[0012] In one embodiment, the automatic chemical dosing system for the industrial park further includes a chemical supply solenoid valve and a monitoring unit. The chemical supply solenoid valve is arranged on the connecting pipe between the chemical supply pump and the spray tower water tank. The monitoring unit is arranged on the spray tower water tank, and both the monitoring unit and the chemical supply solenoid valve are electrically connected to the PLC controller.

[0013] In one embodiment, the monitoring unit includes an ORP monitoring instrument and a PH monitoring instrument. Both the ORP monitoring instrument and the PH monitoring instrument are arranged inside the spray tower water tank.

[0014] In one embodiment, the automatic chemical dosing system for the industrial park further includes a standby central chemical dosing pump. Two ends of the standby central chemical dosing pump are respectively communicated with the central chemical dosing tank and the intermediate chemical dosing tank.

[0015] In one embodiment, a chemical dissolution tank is formed inside the central chemical dosing tank. The chemical dissolution tank is provided with a liquid level detection unit, and the chemical dissolution tank is communicated with the first connecting pipe.

[0016] In one embodiment, the liquid level detection unit includes a liquid level sensor and an alarm.

[0017] An exhaust gas treatment system includes the automatic chemical dosing system for the industrial park according to any one of the above embodiments.

[0018] Compared with the prior art, the present disclosure has at least the following advantages:

[0019] 1) In the automatic chemical dosing system for industrial parks of the present disclosure, a limit magnetic flap level gauge is provided on the transfer chemical dosing tank, so that a limited liquid level can be set for the transfer chemical dosing tank, realizing the monitoring of the upper and lower limits of the liquid level of the transfer chemical dosing tank, and thus realizing the real-time monitoring of the liquid volume of the liquid medicine in the transfer chemical dosing tank; since the central chemical dosing pump is connected to the medicine inlet of the transfer chemical dosing tank through the second connecting pipe, and the chemical dosing solenoid valve is arranged on the second connecting pipe, the chemical dosing solenoid valve is located between the central chemical dosing pump and the transfer chemical dosing tank, and the connection between the central chemical dosing pump and the transfer chemical dosing tank can be controlled through the chemical dosing solenoid valve, so that the central chemical dosing pump can provide the liquid medicine in the central chemical dosing tank to the transfer chemical dosing tank in real time to ensure the sufficiency of the liquid medicine in the transfer chemical dosing tank.

[0020] 2) In the automatic chemical dosing system for industrial parks of the present disclosure, since the limit magnetic flap level gauge, the central chemical dosing pump and the chemical dosing solenoid valve are all electrically connected to the PLC controller, during automatic operation, the chemical dosing solenoid valve is interlocked with the limit magnetic flap level gauge, and the limit magnetic flap level gauge is interlocked with the central chemical dosing pump, that is, when the liquid level of the transfer chemical dosing tank is lower than the set liquid level, the chemical dosing solenoid valve opens, and at the same time the central chemical dosing pump adds medicine to the transfer chemical dosing tank to ensure the sufficiency of the liquid medicine in the transfer chemical dosing tank. When the liquid level of the transfer chemical dosing tank is higher than the set liquid level, the central chemical dosing pump is closed to avoid the overflow of the liquid medicine in the chemical dosing tank, thus realizing the real-time monitoring of the liquid medicine situation in the transfer chemical dosing tank and ensuring the sufficiency of the liquid medicine in the transfer chemical dosing tank. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present disclosure, and therefore should not be regarded as limiting the scope. For those of ordinary skill in the art, other related drawings can be obtained based on these drawings without creative efforts.

[0022] Figure 1 It is a schematic structural diagram of the automatic chemical dosing system for industrial parks according to an embodiment of the present disclosure;

[0023] Figure 2 It is a schematic structural diagram of the waste gas treatment system of the present disclosure.

[0024] Reference numerals: 10, automatic chemical dosing system for industrial park; 100, central chemical dosing tank; 110, first connecting pipe; 200, transfer chemical dosing tank; 210, second connecting pipe; 300, central chemical dosing pump; 310, chemical supply pump; 320, standby central chemical dosing pump; 400, chemical dosing solenoid valve; 410, chemical supply solenoid valve; 500, limit magnetic flap level gauge; 600, back pressure valve; 610, pressure relief and reflux pipe; 700, diaphragm pressure gauge; 800, spray tower water tank; 900, liquid level detection unit; 1, waste gas treatment system. Detailed implementation manners

[0025] To facilitate the understanding of the present disclosure, the present disclosure will be described more comprehensively below with reference to the relevant drawings. The preferred embodiments of the present disclosure are shown in the drawings. However, the present disclosure can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, these embodiments are provided so that the understanding of the disclosure content of the present disclosure is more thorough and comprehensive.

[0026] It should be noted that when an element is referred to as being "fixed to" another element, it can be directly on the other element or there can also be a middle element. When an element is considered to be "connected" to another element, it can be directly connected to the other element or there may be a middle element at the same time. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are only for the purpose of illustration and do not represent the only embodiments.

[0027] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the technical field to which the present disclosure belongs. The terms used in the specification of the present disclosure herein are only for the purpose of describing specific embodiments and are not intended to limit the present disclosure. The term "and / or" used herein includes any and all combinations of one or more of the related listed items.

[0028] To better understand the technical solutions and beneficial effects of the present disclosure, the following further describes the present disclosure in detail with specific embodiments:

[0029] Such as Figures 1 to 2As shown in the figure, the automatic chemical dosing system 10 of an industrial park in an embodiment includes a central chemical dosing tank 100, a transfer chemical dosing tank 200, a central chemical dosing pump 300, a chemical dosing solenoid valve 400, a limit magnetic flap level gauge 500, and a PLC controller (not shown in the figure). The chemical outlet of the central chemical dosing tank 100 is connected to the central chemical dosing pump 300 through a first connecting pipe 110. The central chemical dosing pump 300 is connected to the chemical inlet of the transfer chemical dosing tank 200 through a second connecting pipe 210. The chemical dosing solenoid valve 400 is arranged on the second connecting pipe 210. The limit magnetic flap level gauge 500 is arranged on the transfer chemical dosing tank 200. The limit magnetic flap level gauge 500, the central chemical dosing pump 300, and the chemical dosing solenoid valve 400 are all electrically connected to the PLC controller.

[0030] It can be understood that a limit magnetic flap level gauge 500 is arranged on the transfer chemical dosing tank 200, so that a limited liquid level can be set for the transfer chemical dosing tank 200, realizing the monitoring of the upper and lower limits of the liquid level of the transfer chemical dosing tank 200, and thus realizing the real-time monitoring of the liquid volume in the transfer chemical dosing tank 200. Since the central chemical dosing pump 300 is connected to the chemical inlet of the transfer chemical dosing tank 200 through the second connecting pipe 210, and the chemical dosing solenoid valve 400 is arranged on the second connecting pipe 210, the chemical dosing solenoid valve 400 is located between the central chemical dosing pump 300 and the transfer chemical dosing tank 200. The connection between the central chemical dosing pump 300 and the transfer chemical dosing tank 200 can be controlled by the chemical dosing solenoid valve 400, so that the central chemical dosing pump 300 can supply the chemical liquid in the central chemical dosing tank 100 to the transfer chemical dosing tank 200 in real time to ensure the sufficiency of the chemical liquid in the transfer chemical dosing tank 200.

[0031] Furthermore, since the limit magnetic flap level gauge 500, the central chemical dosing pump 300, and the chemical dosing solenoid valve 400 are all electrically connected to the PLC controller, during automatic operation, the chemical dosing solenoid valve 400 is interlocked with the limit magnetic flap level gauge 500, and the limit magnetic flap level gauge 500 is interlocked with the central chemical dosing pump 300. That is, when the liquid level in the transfer chemical dosing tank 200 is lower than the set liquid level, the chemical dosing solenoid valve 400 opens, and at the same time, the central chemical dosing pump 300 is started to add chemical liquid to the transfer chemical dosing tank 200 to ensure the sufficiency of the chemical liquid in the transfer chemical dosing tank 200. When the liquid level in the transfer chemical dosing tank 200 is higher than the set liquid level, the central chemical dosing pump 300 is closed to prevent the chemical liquid in the dosing tank from overflowing, thus realizing the real-time monitoring of the chemical liquid situation in the transfer chemical dosing tank 200 and ensuring the sufficiency of the chemical liquid in the transfer chemical dosing tank 200.

[0032] It should be noted that the method by which the PLC controller controls the actions of the central chemical dosing pump 300 and the chemical dosing solenoid valve 400 respectively according to the limit magnetic flap level gauge 500 belongs to the prior art. This application only protects the connection relationship and positional relationship of the above-mentioned various components.

[0033] Such as Figure 1As shown, in one embodiment, the automatic chemical dosing system 10 for the industrial park further includes a back pressure valve 600 and a pressure relief and reflux pipeline 610. The central chemical dosing tank 100 is provided with a reflux port. Both ends of the pressure relief and reflux pipeline 610 are respectively connected to the reflux port and the connection port of the second connection pipeline 210. The back pressure valve 600 is arranged on the pressure relief and reflux pipeline 610 and is used to monitor the pressure value of the second connection pipeline 210. In this embodiment, the back pressure valve 600 is set with a pressure set value. Since the chemical liquid in the central chemical dosing tank 100 will flow through the second connection pipeline 210 by the central chemical dosing pump 300 during the automatic operation of the chemical dosing system, the added back pressure valve 600 can monitor the pressure value of the second connection pipeline 210. When the pressure value of the second connection pipeline 210 is greater than the pressure set value of the back pressure valve 600, the back pressure valve 600 will automatically open, allowing part of the chemical liquid to flow back to the central chemical dosing tank 100 through the pressure relief and reflux pipeline 610, so as to ensure that the pressure value of the second connection pipeline 210 is reduced, thereby playing a role in protecting the second connection pipeline 210 and further ensuring the normal operation of the chemical dosing system.

[0034] As Figure 1 shown, in one embodiment, the automatic chemical dosing system 10 for the industrial park further includes a diaphragm pressure gauge 700. The diaphragm pressure gauge 700 is arranged on the second connection pipeline 210 between the central chemical dosing pump 300 and the connection port and is used to adjust the pressure set value of the back pressure valve 600. In this embodiment, by arranging the diaphragm pressure gauge 700 on the second connection pipeline 210 between the central chemical dosing pump 300 and the connection port, the staff can monitor the pressure condition of the second connection pipeline 210 in real time. At the same time, the pressure set value of the back pressure valve 600 can be adjusted in time according to the different pressure values of the second connection pipeline 210 to ensure the safety of the pipeline when the chemical dosing system transports the chemical liquid.

[0035] As Figure 1 and Figure 2 shown, in one embodiment, the automatic chemical dosing system 10 for the industrial park further includes a spray tower water tank 800 and a chemical supply pump 310. The chemical outlet of the intermediate chemical dosing tank 200 is connected to the spray tower water tank 800 through the chemical supply pump 310. In this embodiment, the chemical liquid can be automatically transported by the chemical supply pump 310, which can quickly and stably transport the chemical liquid in the intermediate chemical dosing tank 200 into the spray tower water tank 800, ensuring the continuity of chemical dosing and avoiding the situation that the chemical liquid in the spray tower water tank 800 is insufficient due to untimely manual chemical dosing, thereby affecting the effect of waste gas treatment.

[0036] In one embodiment, the automatic chemical dosing system 10 for the industrial park further includes a chemical supply solenoid valve 410 and a monitoring unit (not shown in the figure). The chemical supply solenoid valve 410 is provided on the connecting pipe between the chemical supply pump 310 and the spray tower water tank 800. The monitoring unit is provided in the spray tower water tank 800, and both the monitoring unit and the chemical supply solenoid valve 410 are electrically connected to the PLC controller. In this embodiment, by setting the chemical supply solenoid valve 410, the transportation of the chemical liquid from the chemical supply pump 310 to the spray tower water tank 800 can be accurately controlled, and the automatic chemical dosing operation can be realized in combination with the PLC controller. The added monitoring unit can monitor the relevant parameters of the spray tower water tank 800 in real time, and the chemical supply solenoid valve 410 can be timely controlled to open and close through the PLC controller. At the same time, the electrical connection between the monitoring unit and the PLC controller can realize the real-time monitoring and adjustment of the entire chemical dosing process, thereby ensuring the stable operation of the entire chemical dosing system.

[0037] In one embodiment, the monitoring unit includes an ORP monitoring instrument and a PH monitoring instrument, and both the ORP monitoring instrument and the PH monitoring instrument are provided inside the spray tower water tank 800. In this embodiment, after the ORP monitoring instrument and the PH monitoring instrument in the spray tower water tank 800 detect that the chemical liquid index is insufficient, the chemical supply solenoid valve 410 will automatically open, and the chemical liquid will flow from the intermediate chemical dosing tank 200 into the spray tower water tank 800 until the ORP monitoring instrument and the PH monitoring instrument detect that the chemical liquid index is normal, and the chemical supply solenoid valve 410 will be automatically closed. The added ORP monitoring instrument and PH monitoring instrument ensure the accuracy of the chemical liquid index required by the spray tower water tank 800, avoid the untimely and uneven chemical dosing amount of manual direct chemical dosing, and thus realize the real-time monitoring of the chemical dosing system.

[0038] As Figure 1 shown, in one embodiment, the automatic chemical dosing system 10 for the industrial park further includes a standby central chemical dosing pump 320. Both ends of the standby central chemical dosing pump 320 are respectively communicated with the central chemical dosing tank 100 and the intermediate chemical dosing tank 200. In this embodiment, the addition of the standby central chemical dosing pump 320 ensures that it can be started in time when the central chemical dosing pump 300 fails during operation, ensuring the timeliness of waste gas treatment and avoiding affecting the normal operation of the entire chemical dosing system due to the damage of the central chemical dosing pump 300.

[0039] In one embodiment, a chemical dissolution tank (not shown in the figure) is formed in the central chemical dosing tank 100. The chemical dissolution tank is provided with a liquid level detection unit 900 and is communicated with the first connecting pipeline 110. In this embodiment, the prepared liquid medicine is stored in the chemical dissolution tank, and the chemical dissolution tank is communicated with the first connecting pipeline 110 to ensure that the liquid medicine in the chemical dissolution tank can be transported to the central chemical dosing pump 300 through the first connecting pipeline 110, ensuring the timeliness of liquid medicine transportation; since the chemical dissolution tank is provided with the liquid level detection unit 900, when the liquid level of the liquid medicine in the chemical dissolution tank changes, the liquid level detection unit 900 will give feedback in time to ensure the sufficiency of the liquid medicine in the chemical dissolution tank.

[0040] In one embodiment, the liquid level detection unit 900 includes a liquid level sensor and an alarm. When the liquid level of the liquid medicine in the chemical dissolution tank is lower than the preset liquid level, the liquid level sensor reminds of medicine preparation, and when the liquid level of the liquid medicine in the chemical dissolution tank is higher than the preset liquid level, the alarm gives an early warning.

[0041] The present disclosure also provides an exhaust gas treatment system, including the industrial park automatic chemical dosing system 10 described in any of the above embodiments. The exhaust gas treatment system further includes a terminal control system. The parameters of the ORP monitoring instrument and the PH monitoring instrument, the dynamic parameters such as the central chemical dosing pump 300, the chemical dosing solenoid valve 400 and the medicine supply solenoid valve 410 are controlled through the software of the terminal control system. Through the interconnected network-cloud platform, WeChat mini-program and web page, the operation status of the chemical dosing system can be remotely and real-time monitored and controlled.

[0042] Compared with the prior art, the present disclosure has at least the following advantages:

[0043] 1) In the industrial park automatic chemical dosing system 10 of the present disclosure, a limit magnetic flap liquid level gauge 500 is provided on the transfer chemical dosing tank 200, so that the transfer chemical dosing tank 200 can be set with a limited liquid level, realizing the monitoring of the upper and lower limits of the liquid level of the transfer chemical dosing tank 200, and thus realizing the real-time monitoring of the liquid medicine volume in the transfer chemical dosing tank 200; since the central chemical dosing pump 300 is connected to the medicine inlet of the transfer chemical dosing tank 200 through the second connecting pipeline 210, and the chemical dosing solenoid valve 400 is arranged on the second connecting pipeline 210, the chemical dosing solenoid valve 400 is located between the central chemical dosing pump 300 and the transfer chemical dosing tank 200, and the connection between the central chemical dosing pump 300 and the transfer chemical dosing tank 200 can be controlled through the chemical dosing solenoid valve 400, so that the central chemical dosing pump 300 can provide the liquid medicine in the central chemical dosing tank 100 to the transfer chemical dosing tank 200 in real time to ensure the sufficiency of the liquid medicine in the transfer chemical dosing tank 200.

[0044] 2) The automatic chemical dosing system 10 of the industrial park disclosed in the present disclosure, since the limit magnetic flap level gauge 500, the central chemical dosing pump 300, and the chemical dosing solenoid valve 400 are all electrically connected to the PLC controller, during automatic operation, the chemical dosing solenoid valve 400 is interlocked with the limit magnetic flap level gauge 500, and the limit magnetic flap level gauge 500 is interlocked with the central chemical dosing pump 300. That is, when the liquid level in the intermediate chemical dosing tank 200 is lower than the set liquid level, the chemical dosing solenoid valve 400 opens, and at the same time, the central chemical dosing pump 300 is started to add chemicals to the intermediate chemical dosing tank 200 to ensure that the intermediate chemical dosing tank 200 has sufficient chemical solution. When the liquid level in the intermediate chemical dosing tank 200 is higher than the set liquid level, the central chemical dosing pump 300 is turned off to prevent the chemical solution in the dosing tank from overflowing, thereby realizing real-time monitoring of the chemical solution condition in the intermediate chemical dosing tank 200 and ensuring that the intermediate chemical dosing tank 200 has sufficient chemical solution.

[0045] The above-described embodiments merely represent several implementation manners of the present disclosure. The description thereof is relatively specific and detailed, but it should not be construed as a limitation to the scope of the utility model patent. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present disclosure, several modifications and improvements can still be made, and these all fall within the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure patent shall be subject to the appended claims.

Claims

1. An automatic chemical dosing system for an industrial park, comprising a central chemical dosing tank, a transfer chemical dosing tank and a central chemical dosing pump. The chemical outlet of the central chemical dosing tank is connected to the central chemical dosing pump through a first connecting pipe, and the central chemical dosing pump is connected to the chemical inlet of the transfer chemical dosing tank through a second connecting pipe. It is characterized in that the automatic chemical dosing system for the industrial park further comprises a chemical dosing solenoid valve, a limit magnetic flap level gauge and a PLC controller; the chemical dosing solenoid valve is arranged on the second connecting pipe, the limit magnetic flap level gauge is arranged on the transfer chemical dosing tank, and the limit magnetic flap level gauge, the central chemical dosing pump and the chemical dosing solenoid valve are all electrically connected to the PLC controller.

2. The automatic chemical dosing system for industrial parks according to claim 1, wherein the automatic chemical dosing system for the industrial park further comprises a back pressure valve and a pressure relief and reflux pipe. The central chemical dosing tank is provided with a reflux port. The two ends of the pressure relief and reflux pipe are respectively communicated with the reflux port and the connection port of the second connecting pipe. The back pressure valve is arranged on the pressure relief and reflux pipe for monitoring the pressure value of the second connecting pipe.

3. The automatic chemical dosing system for industrial parks according to claim 2, characterized in that, the automatic chemical dosing system for the industrial park further comprises a diaphragm pressure gauge, which is arranged on the second connecting pipe between the central chemical dosing pump and the connection port for adjusting the pressure setting value of the back pressure valve.

4. The automatic chemical dosing system for industrial parks according to claim 1, wherein the automatic chemical dosing system for the industrial park further comprises a spray tower water tank and a chemical supply pump. The chemical outlet of the transfer chemical dosing tank is communicated with the spray tower water tank through the chemical supply pump.

5. The automatic chemical dosing system for industrial parks according to claim 4, characterized in that the automatic chemical dosing system for the industrial park further comprises a chemical supply solenoid valve and a monitoring unit. The chemical supply solenoid valve is arranged on the connecting pipe between the chemical supply pump and the spray tower water tank. The monitoring unit is arranged on the spray tower water tank, and both the monitoring unit and the chemical supply solenoid valve are electrically connected to the PLC controller.

6. The automatic chemical dosing system for industrial parks according to claim 5, wherein the monitoring unit comprises an ORP monitoring instrument and a PH monitoring instrument, and both the ORP monitoring instrument and the PH monitoring instrument are arranged inside the spray tower water tank.

7. The automatic chemical dosing system for industrial parks according to claim 1, wherein the automatic chemical dosing system for the industrial park further comprises a standby central chemical dosing pump, and the two ends of the standby central chemical dosing pump are respectively communicated with the central chemical dosing tank and the transfer chemical dosing tank.

8. The automatic chemical dosing system for industrial parks according to claim 1, wherein a dissolving tank is formed inside the central chemical dosing tank. The dissolving tank is provided with a liquid level detection unit, and the dissolving tank is communicated with the first connecting pipe.

9. The automatic chemical dosing system for industrial parks according to claim 8, wherein the liquid level detection unit comprises a liquid level sensor and an alarm.

10. An exhaust gas treatment system, characterized in that, An exhaust gas treatment system includes the automatic chemical dosing system for the industrial park according to any one of claims 1 to 9, and the exhaust gas treatment system further comprises a terminal control system.

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