Photoresist conveying device
By designing the photoresist storage tank and monitoring mechanism photoresist conveying device, the problems of photoresist solidification and quality monitoring are solved, timely detection of photoresist quality and bubble elimination are achieved, and the reliability and yield of semiconductor processing are improved.
Patent Information
- Application Number
- CN202422558083.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-23
- Publication Date
- 2025-08-05
- Estimated Expiration
- 2034-10-23
AI Technical Summary
During the transportation process, photoresist is prone to solidification due to temperature and other factors, and the quality cannot be monitored in time, which affects the quality and yield of semiconductor processing.
A photoresist conveying device is designed, including a photoresist storage tank, a monitoring mechanism and a conveying mechanism. The monitoring mechanism is composed of a connecting pipe, a sampling pipe and a discharge valve. The quality of the photoresist is directly observed through the sampling pipe, and bubbles are eliminated through the defoaming net to ensure the quality of the photoresist.
Timely monitoring of photoresist quality and bubble elimination are achieved, and solidification affects semiconductor processing is avoided, and the reliability and yield of semiconductor processing is improved.
Smart Images

Figure CN223188073U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of semiconductor processing, in particular to a photoresist conveying device. Background Art
[0002] In the semiconductor manufacturing process, uniform and precise delivery of photoresist is crucial to ensuring the quality and yield of chips. With the miniaturization of semiconductor devices, the control requirements for the spray volume and impurities of the photolithography process coater have become higher. In the process of semiconductor production and processing, a delivery device is required to transport the photoresist.
[0003] The photoresist can be transported by a conveying device. However, when the conveying device is transporting the photoresist, the photoresist is easily solidified due to temperature and other factors, thereby affecting its transportation. Moreover, when the device is used to transport the photoresist for a long time, the quality of the photoresist cannot be monitored in time. If the photoresist deteriorates or solidifies, it will affect the subsequent transportation and processing of the semiconductor. Personnel will not be able to know in time, which will affect their use. Utility Model Content
[0004] The purpose of the present utility model is to provide a photoresist conveying device to solve the problem proposed in the above background technology that the photoresist can be conveyed by the conveying device, but when the conveying device is conveying the photoresist, the photoresist is easily solidified due to other factors such as temperature, thereby affecting its conveyance, and when the device is used to convey the photoresist for a long time, the quality of the photoresist cannot be monitored in time. If the photoresist deteriorates or solidifies, it will affect the subsequent conveying for semiconductor processing, and personnel will not be able to know it in time, which will affect personnel's use.
[0005] The utility model provides the following technical solutions: a photoresist conveying device, comprising a photoresist storage tank and a conveying mechanism; a monitoring mechanism is installed at the bottom end of the photoresist storage tank, and a conveying mechanism is installed at the bottom end of the monitoring mechanism;
[0006] The monitoring mechanism includes a connecting pipe, a sampling pipe and a discharge valve. The bottom end of the photoresist storage tank is equipped with a connecting pipe, one end of the connecting pipe is equipped with a sampling pipe, and the bottom end of the sampling pipe is equipped with a discharge valve.
[0007] Preferably, a motor is installed on the top of the photoresist storage tank, and a stirring rod is rotatably installed inside the photoresist storage tank at the output end of the motor.
[0008] Preferably, the outer wall of the photoresist storage tank is installed with an insulation layer.
[0009] Preferably, the delivery mechanism includes a delivery pump and a delivery pipe. The delivery pump is installed at the bottom end of the monitoring mechanism, the delivery pipe is installed at the output end of the delivery pump, and the input end of the delivery pump is connected to the photoresist storage tank.
[0010] Preferably, a flow meter is installed on the outside of the conveying mechanism.
[0011] Preferably, a cleaning tank is installed at the other end of the conveying mechanism, a power pump is installed at the bottom end of the cleaning tank, and the output end of the power pump is connected to a conveying pipe.
[0012] Preferably, valves are installed on the outer side of the bottom of the photoresist storage tank and the outer side of one end of the delivery pipe.
[0013] Preferably, a defoaming net is installed inside the delivery pipe.
[0014] Compared with the prior art, the beneficial effects of the present invention are:
[0015] 1. The utility model is used in conjunction with a connecting tube, a sampling tube and a discharge valve. By closing the conveying mechanism, the photoresist in the photoresist storage tank will be conveyed to the interior of the sampling tube through the connecting tube. The sampling tube allows workers to directly observe the quality of the photoresist. When the discharge valve is opened, the worker can directly sample and test the photoresist, thereby facilitating personnel to know the quality of the photoresist conveyance in a timely manner without affecting personnel's use.
[0016] 2. The utility model installs a defoaming net inside the conveying pipe. When the photoresist passes through the defoaming net, the tension of the defoaming net itself can cause the bubbles to burst, thereby eliminating the bubbles in the photoresist and will not affect the subsequent use of the photoresist. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 This is a schematic diagram of the front three-dimensional structure of the utility model;
[0018] Figure 2 This is a partial structural diagram of the monitoring mechanism of the utility model;
[0019] Figure 3 This is a schematic diagram of the internal structure of the photoresist storage tank of the present invention;
[0020] Figure 4 This is a schematic diagram of the internal structure of the delivery pipe of the present invention.
[0021] In the figure: 1. Photoresist storage tank; 101. Insulation layer; 102. Motor; 103. Stirring rod; 104. Valve; 2. Conveying mechanism; 201. Conveying pump; 202. Conveying pipe; 3. Monitoring mechanism; 301. Connecting pipe; 302. Sampling pipe; 303. Discharge valve; 4. Flow meter; 5. Cleaning tank; 501. Power pump; 6. Defoaming net. DETAILED DESCRIPTION
[0022] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.
[0023] In the description of this utility model, it should be noted that the terms "upper," "lower," "inner," "outer," "front end," "rear end," "both ends," "one end," "the other end," and the like, indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings and are intended solely to facilitate the description of this utility model and simplify the description. They are not intended to indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.
[0024] In the description of this utility model, it should be noted that, unless otherwise expressly specified or limited, the terms "installed," "provided with," "connected," etc. should be understood in a broad sense. For example, "connected" can mean a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be internal communication between two components. Those skilled in the art will be able to understand the specific meanings of the above terms in this utility model based on the specific circumstances.
[0025] The following is a further detailed description of the technical solution of the present invention in conjunction with the accompanying drawings and specific embodiments;
[0026] Example 1:
[0027] The present application provides a photoresist conveying device, comprising a photoresist storage tank 1 and a conveying mechanism 2; a monitoring mechanism 3 is installed at the bottom end of the photoresist storage tank 1, and a conveying mechanism 2 is installed at the bottom end of the monitoring mechanism 3;
[0028] The monitoring mechanism 3 includes a connecting pipe 301, a sampling pipe 302 and a discharge valve 303. The bottom end of the photoresist storage tank 1 is equipped with the connecting pipe 301, one end of the connecting pipe 301 is equipped with the sampling pipe 302, and the bottom end of the sampling pipe 302 is equipped with the discharge valve 303.
[0029] Specifically, such as Figure 1 、 Figure 2 、 Figure 3 and Figure 4 As shown, the photoresist inside the photoresist storage tank 1 can be transported through the transport mechanism 2, and the monitoring mechanism 3 is used to sample and monitor the photoresist. The sampling tube 302 is made of glass. When the photoresist is transported through the connecting tube 301, part of the photoresist will be transported to the inside of the sampling tube 302. The sampling tube 302 can facilitate workers to observe the quality of the photoresist. When the worker opens the discharge valve 303, the photoresist can be sampled and tested.
[0030] Furthermore, a motor 102 is installed on the top of the photoresist storage tank 1, and a stirring rod 103 is rotatably installed inside the photoresist storage tank 1 at the output end of the motor 102;
[0031] Furthermore, the outer wall of the photoresist storage tank 1 is provided with an insulation layer 101;
[0032] Specifically, such as Figure 1 and Figure 3 As shown, in order to avoid the precipitation and stratification of the photoresist inside the photoresist storage tank 1, which affects its later use, the motor 102 is driven to rotate the stirring rod 103. The rotation of the stirring rod 103 can stir the photoresist inside the photoresist storage tank 1, thereby mixing it and avoiding stratification. The insulation layer 101 is composed of insulation material, which can prevent the external temperature from affecting the photoresist inside the photoresist storage tank 1.
[0033] Furthermore, the delivery mechanism 2 includes a delivery pump 201 and a delivery pipe 202. The delivery pump 201 is installed at the bottom end of the monitoring mechanism 3. The delivery pipe 202 is installed at the output end of the delivery pump 201. The input end of the delivery pump 201 is connected to the photoresist storage tank 1.
[0034] Furthermore, a flow meter 4 is installed on the outside of the conveying mechanism 2;
[0035] Specifically, such as Figure 1 As shown, in order to transport the photoresist, the transport pump 201 can operate to transport the photoresist inside the photoresist storage tank 1 through the transport pipe 202, and the amount of the transported photoresist inside the transport pipe 202 can be monitored by two sets of flow meters 4.
[0036] Furthermore, a cleaning tank 5 is installed at the other end of the conveying mechanism 2, a power pump 501 is installed at the bottom end of the cleaning tank 5, and the output end of the power pump 501 is connected to the conveying pipe 202;
[0037] Furthermore, valves 104 are installed on the outer side of the bottom of the photoresist storage tank 1 and the outer side of one end of the delivery pipe 202;
[0038] Specifically, such as Figure 1 As shown, in order to clean the inside of the delivery pipe 202, cleaning liquid is stored in the cleaning tank 5. By closing the valve 104 and using the power pump 501 to transport the cleaning liquid in the cleaning tank 5 to the inside of the delivery pipe 202, the inside of the delivery pipe 202 can be flushed, thereby achieving the purpose of regular cleaning, so that the delivery pipe 202 can better transport the photoresist in the later stage.
[0039] Furthermore, a defoaming net 6 is installed inside the delivery pipe 202;
[0040] Specifically, such as Figure 4 As shown, in order to reduce the generation of bubbles in the photoresist inside the delivery tube 202, when the photoresist passes through the inside of the defoaming net 6, the tension of the defoaming net 6 itself can cause the bubbles to burst, thereby eliminating the bubbles in the photoresist.
[0041] Working principle: The motor 102 drives the stirring rod 103 to rotate. The rotation of the stirring rod 103 can prevent the photoresist inside the photoresist storage tank 1 from settling and stratifying. Then, the delivery pump 201 works to deliver the photoresist inside the photoresist storage tank 1 through the delivery pipe 202. When the photoresist passes through the defoaming net 6 inside the delivery pipe 202, the tension of the defoaming net 6 itself can cause the bubbles to burst, thereby eliminating the bubbles in the photoresist.
[0042] Finally, it should be noted that the above specific implementation methods are only used to illustrate the technical solution of the utility model and are not limiting. Although the utility model is described in detail with reference to the embodiments, ordinary technicians in this field should understand that the technical solution of the utility model can be modified and replaced by equivalents without departing from the spirit and scope of the technical solution of the utility model, which should be included in the scope of the claims of the utility model.
Claims
1. A photoresist conveying device, comprising a photoresist storage tank (1) and a conveying mechanism (2); characterized in that: A monitoring mechanism (3) is installed at the bottom end of the photoresist storage tank (1), and a conveying mechanism (2) is installed at the bottom end of the monitoring mechanism (3); The monitoring mechanism (3) comprises a connecting pipe (301), a sampling pipe (302) and a discharge valve (303); the bottom end of the photoresist storage tank (1) is provided with the connecting pipe (301); one end of the connecting pipe (301) is provided with the sampling pipe (302); and the bottom end of the sampling pipe (302) is provided with the discharge valve (303).
2. A photoresist delivery device according to claim 1, characterized in that: A motor (102) is installed on the top of the photoresist storage tank (1), and a stirring rod (103) is rotatably installed inside the photoresist storage tank (1) at the output end of the motor (102).
3. The photoresist delivery device according to claim 1, wherein: The outer wall of the photoresist storage tank (1) is provided with a heat-insulating layer (101).
4. The photoresist delivery device according to claim 1, wherein: The delivery mechanism (2) comprises a delivery pump (201) and a delivery pipe (202); the bottom end of the monitoring mechanism (3) is equipped with the delivery pump (201); the output end of the delivery pump (201) is equipped with the delivery pipe (202); and the input end of the delivery pump (201) is connected to the photoresist storage tank (1).
5. The photoresist delivery device according to claim 1, wherein: A flow meter (4) is installed on the outside of the conveying mechanism (2).
6. The photoresist delivery device according to claim 4, characterized in that: A cleaning tank (5) is installed at the other end of the conveying mechanism (2), a power pump (501) is installed at the bottom end of the cleaning tank (5), and the output end of the power pump (501) is connected to a conveying pipe (202).
7. The photoresist delivery device according to claim 1, characterized in that: Valves (104) are installed on the outer side of the bottom of the photoresist storage tank (1) and the outer side of one end of the delivery pipe (202).
8. The photoresist delivery device according to claim 4, characterized in that: A defoaming net (6) is installed inside the delivery pipe (202).