Mask assembly

Abstract

A mask assembly includes: a frame including a frame opening; a first lever disposed on the frame, the first lever overlapping the frame opening in a plan view and extending in a first direction; and a mask disposed on the first rod. The mask includes active areas and inactive areas, each of the active areas including: a first active area including a hole; a second active area including a first groove; and a third active area including a second groove, the third active area overlapping the second active area in a second direction intersecting the first direction, and the first rod overlapping the third active area in a plan view.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to and the benefit of Korean Patent Application No. 10-2023-0082316 filed in the Korean Intellectual Property Office on June 27, 2023, the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present disclosure relates to a mask assembly and a method for manufacturing a display panel. For example, the present disclosure relates to a mask assembly including a mask in which a bending phenomenon of the mask occurring while being tensioned is improved, and a method for manufacturing a display panel. Background Art

[0004] Display devices can be manufactured using various processes. As an example, a deposition process can be used to manufacture a display device. A fine metal mask (FMM) tightly attached to a substrate for depositing organic materials can be used in the deposition process for a display device. A unit cell mask can be used in the deposition process for a display device.

[0005] It should be understood that this background technology section is intended, in part, to provide useful context for understanding the technology. However, this background technology section may also include ideas, concepts, or understandings that were not known or understood by those skilled in the relevant art before the corresponding effective filing date of the subject matter disclosed herein. Utility Model Content

[0006] The present disclosure provides a mask assembly including a mask in which a bending phenomenon occurring when tensioned is improved.

[0007] The present disclosure provides a method of manufacturing a display panel using a mask assembly.

[0008] Embodiments provide a mask assembly that may include: a frame including a frame opening; a first rod disposed on the frame, overlapping the frame opening in a plan view, and extending in a first direction; and a mask disposed on the first rod. The mask may include multiple active areas and inactive areas, each of the multiple active areas may include: a first active area including a plurality of holes; a second active area including a plurality of first slots; and a third active area including a plurality of second slots, the third active area overlapping the second active area in a second direction intersecting the first direction, and the first rod overlapping the third active area in a plan view.

[0009] A width of each of the plurality of holes in a third direction intersecting the first direction and the second direction may be greater than a width of each of the plurality of first grooves and the plurality of second grooves in the third direction.

[0010] A width of each of the plurality of first grooves and the plurality of second grooves in the third direction may be equal to or greater than about 40% and equal to or less than about 60% of a width of each of the plurality of holes in the third direction.

[0011] Each of the plurality of active areas may have a substantially rectangular shape, and the plurality of active areas may be arranged in the first direction.

[0012] Each of the plurality of active areas may include a first side parallel to the first direction and a second side parallel to the second direction, and the first side may have a length smaller than a length of the second side.

[0013] Each of the plurality of active areas may include a first side parallel to the first direction and a second side parallel to the second direction, and the first side may have a length greater than a length of the second side.

[0014] Each of the multiple effective areas may include: a first side, parallel to the first direction; a third side, parallel to the first direction and opposite to the first side; a second side, parallel to the second direction; and a fourth side, parallel to the second direction and opposite to the second side. The second effective area can be set adjacent to the first side, and the third effective area can be set adjacent to the third side.

[0015] The first active region may include a first-first active region including the first side and a first-second active region including the third side, and the first rod may overlap the first-second active region in a plan view.

[0016] The first rod may not overlap with the second effective area in a plan view.

[0017] The mask assembly may further include: a second rod disposed between the frame and the mask and extending in the second direction.

[0018] Each of the masks may include multiple masks, the first rod may include multiple first rods, and the second rod may include multiple second rods, the multiple second rods may be arranged in the first direction, the multiple first rods may be arranged in the second direction, and the multiple masks may be arranged in the second direction.

[0019] A width of the second rod in the first direction may be smaller than a width between two adjacent active areas among the plurality of active areas.

[0020] A width of the first rod in the second direction may be greater than a width of the third active area in the second direction.

[0021] The mask may include a magnetic material, and the first rod and the second rod may include a non-magnetic material.

[0022] The mask may include Invar, and the first and second rods may include aluminum.

[0023] Embodiments provide a method for manufacturing a display panel. The method may include: providing a substrate; placing a mask assembly on the substrate; and depositing an organic material on a mask of the mask assembly to form a pattern. The mask assembly may include: a frame including a frame opening; a first rod disposed on the frame, overlapping the frame opening in a plan view, and extending in a first direction; and a mask disposed on the first rod. The mask may include multiple active areas and inactive areas, each of the multiple active areas may include: a first active area including a plurality of holes; a second active area including a plurality of first grooves; and a third active area including a plurality of second grooves. The third active area may overlap with the second active area in a second direction intersecting the first direction, and the first rod may overlap with the third active area in a plan view.

[0024] The organic material may include a light emitting material, and the pattern may include a light emitting layer.

[0025] A width of each of the plurality of holes in a third direction intersecting the first direction and the second direction may be greater than a width of each of the plurality of first grooves and the plurality of second grooves in the third direction.

[0026] A width of the mask in the first direction may be greater than a width of the frame opening in the first direction.

[0027] The mask may include a welding portion that may not overlap with the frame opening in a plan view, and the welding portion may be welded to the frame.

[0028] According to the above, the mask assembly may include the second active area and the third active area which may overlap each other in the second direction, and thus, the mask may be prevented from being bent or twisted when being tensioned.

[0029] According to the above, in the case of manufacturing a display panel, a mask assembly that may include a second active area and a third active area overlapping with the second active area in a second direction is used to prevent the mask from being bent or twisted, and thus, improve the durability of the deposition device while providing stable productivity. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] The above and other advantages of the present disclosure will become readily apparent by reference to the following detailed description when considered in conjunction with the accompanying drawings, in which:

[0031] Figure 1 is a schematic perspective view of a mask assembly according to an embodiment;

[0032] Figure 2 yes Figure 1An exploded perspective view of the mask assembly shown in ;

[0033] Figure 3 yes Figure 2 An enlarged view of the area AA' shown in FIG;

[0034] Figure 4 It is along Figure 3 A schematic cross-sectional view taken along line II' shown in FIG.

[0035] Figure 5 is a flowchart illustrating a method of manufacturing a display panel according to an embodiment;

[0036] Figure 6 is a schematic cross-sectional view illustrating a process of a method for manufacturing a display panel according to an embodiment;

[0037] Figure 7 is a schematic plan view of a pattern formed by a method for manufacturing a display panel according to an embodiment;

[0038] Figure 8 is a schematic perspective view of an electronic device including a display panel according to an embodiment;

[0039] Figure 9 is an exploded perspective view of an electronic device including a display panel according to an embodiment;

[0040] Figure 10 is a schematic cross-sectional view of a display panel according to an embodiment;

[0041] Figure 11 is a schematic plan view illustrating a change in the shape of a mask according to a comparative example; and

[0042] Figure 12 Schematic plan views showing changes in the shape of a mask according to an embodiment. DETAILED DESCRIPTION

[0043] The present disclosure will now be described more fully hereinafter with reference to the accompanying drawings, in which embodiments are shown. However, the present disclosure may be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete and will fully convey the scope of the disclosure to those skilled in the art.

[0044] In this disclosure, it will be understood that when an element (or region, layer or portion) is referred to as being "on," "connected to" or "coupled to" another element or layer, it can be directly on, directly connected to or directly coupled to the other element or layer, or intervening elements or layers may be present.

[0045] It will be understood that the term "connected to" or "coupled to" may include a physical or electrical connection or both.

[0046] The same reference numerals represent the same elements throughout. In the accompanying drawings, the thickness, proportions, and sizes of components are exaggerated for effective description of technical contents.

[0047] In the specification and claims, for purposes of its meaning and interpretation, the term "and / or" is intended to include any combination of the terms "and" and "or." For example, "A and / or B" may be understood to mean "A, B, or A and B." The terms "and" and "or" may be used in a conjunctive or disjunctive sense and may be understood to be equivalent to "and / or."

[0048] In the specification and claims, for the purposes of its meaning and interpretation, the phrase "at least one of" is intended to include the meaning of "at least one selected from the group of." For example, "at least one of A and B" can be understood to mean "A, B, or A and B."

[0049] It will be understood that although the terms first, second, etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another element. Therefore, without departing from the teachings of the present disclosure, the first element discussed below may be referred to as the second element.

[0050] As used herein, the singular forms "a," "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.

[0051] For ease of description, spatially relative terms such as “below,” “beneath,” “lower,” “above,” “upper,” etc. may be used herein to describe the relationship of one element or feature to another element or feature as shown in the drawings.

[0052] The term "overlap" or "overlapped" means that a first object can be above or below a second object, or to one side of the second object, and vice versa. Additionally, the term "overlap" may include layering, stacking, facing, extending over, covering, or partially covering, or any other suitable term as would be appreciated and understood by one of ordinary skill in the art.

[0053] When elements are described as “not overlapping” or “to not overlap” another element, this may include the elements being spaced apart, offset, or separated from each other, or any other suitable terminology as would be appreciated and understood by one of ordinary skill in the art.

[0054] The terms "facing" and "facing" mean that the first element can be directly opposite to the second element or indirectly opposite to each other. In the case where a third element is between the first and second elements, the first and second elements can be understood as being indirectly opposite to each other, but still facing each other.

[0055] As used herein, "about" or "approximately" is inclusive of the stated value and means within an acceptable range of deviation for the particular value as determined by one of ordinary skill in the art, in view of the measurements in question and the errors associated with the measurement of the particular quantity (i.e., the limitations of the measurement system). For example, "about" can mean within one or more standard deviations, or within ±30%, ±20%, ±10%, ±5% of the stated value.

[0056] Unless otherwise defined or implied herein, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the present disclosure belongs. It will also be understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly defined as such herein.

[0057] It will also be understood that when used in this specification, the terms “comprises,” “comprising,” “includes,” and / or “including,” “has,” “have,” and / or “having,” or variations thereof, specify the presence of stated features, integers, steps, operations, elements, components, and / or groups thereof, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0058] In the present disclosure, a direction intersecting the first direction DR1 is referred to as a second direction DR2, and a direction substantially perpendicular to a plane defined by the first direction DR1 and the second direction DR2 is referred to as a third direction DR3.

[0059] In the present disclosure, the expression "when viewed in a plane" or "in a plan view" means a state viewed in the third direction DR3. In the present disclosure, the expression "spraying an organic material" or "transferring an organic material" means that the organic material is sprayed or transferred in a direction from the mask MK to the frame FR.

[0060] Hereinafter, embodiments will be described with reference to the accompanying drawings.

[0061] Figure 1 is a schematic perspective view of a mask assembly MS according to an embodiment. Figure 2 yes Figure 1 An exploded perspective view of the mask assembly MS is shown in FIG. Figure 3 yes Figure 2 An enlarged view of the area AA' is shown in FIG. Figure 4 It is along Figure 3 Schematic cross-sectional view taken along line II' shown in FIG.

[0062] refer to Figure 1 and Figure 2 , the mask assembly MS may include a frame FR through which a frame opening FOP is defined, a first rod ST1 provided on the frame FR, overlapping with the frame opening FOP when viewed in a plane and extending in a first direction DR1, and a mask MK provided on the first rod ST1. The frame opening FOP may be formed to completely penetrate the frame FR. The frame opening FOP may have a quadrilateral shape. The frame FR may include a plurality of first rod grooves HST1 coupling the first rods ST1. The frame FR and the first rods ST1 may be coupled or connected to each other by a welding method. The frame opening FOP may be used as an organic material to be transferred therethrough to form a pattern PT (reference Figure 7 ) path.

[0063] The frame FR may include a first rod groove HST1 and a second rod groove HST2. The first rod groove HST1 may be a space in which the first rod ST1 is fixed to the frame FR. The second rod groove HST2 may be a space in which the second rod ST2 is fixed to the frame FR. The width of the first rod groove HST1 in the third direction DR3 may be greater than the width of the first rod ST1 in the third direction DR3. The width of the second rod groove HST2 in the third direction DR3 may be greater than the width of the second rod ST2 in the third direction DR3. The width of the first rod groove HST1 in the second direction DR2 may be substantially the same as the width of the first rod ST1 in the second direction DR2. The width of the second rod groove HST2 in the first direction DR1 may be substantially the same as the width of the second rod ST2 in the first direction DR1. The first rod groove HST1 and the second rod groove HST2 may be defined adjacent to the frame opening FOP. A plurality of each of the first rod groove HST1 and the second rod groove HST2 of the frame FR may be provided.

[0064] The first rod ST1 may have a quadrilateral shape having long and short sides. The long sides of the first rod ST1 may be substantially parallel to the first direction DR1. The first rod ST1 may be coupled or connected to the first rod groove HST1. The first rod ST1 may be coupled or connected to the first rod groove HST1 by welding.

[0065] The mask MK may be directly disposed on the first rod ST1. When viewed in a planar manner, the region where the first rod ST1 overlaps the mask MK may be a region where no organic material is transferred. The mask MK may be a fine metal mask. The mask MK may include a magnetic material. As an example, the mask MK may include invar, however, this is merely an example.

[0066] The mask MK may include a plurality of active areas AR and inactive areas NAR.

[0067] The non-active area NAR may correspond to a remaining area of the frame FR except for the active area AR. The non-active area NAR may surround the active area AR.

[0068] The mask assembly MS may further include a second rod ST2.

[0069] The second rod ST2 may have a quadrilateral shape having a long side and a short side. The long side of the second rod ST2 may be substantially parallel to the second direction DR2. The second rod ST2 may be coupled or connected to the second rod groove HST2. The second rod ST2 may be coupled or connected to the second rod groove HST2 by welding.

[0070] The first rod ST1 may be disposed between the second rod ST2 and the mask MK. The first rod ST1 may be disposed directly on the second rod ST2. The second rod ST2 may serve as a support to prevent the mask MK from falling and separating. However, the arrangement relationship between the first rod ST1 and the second rod ST2 should not be limited thereto or thereby, and according to an embodiment, the second rod ST2 may be disposed between the first rod ST1 and the second rod ST2.

[0071] The first rod ST1 and the second rod ST2 may include a non-magnetic material. As an example, the first rod ST1 and the second rod ST2 may include aluminum, however, this is an example.

[0072] According to embodiments, each of the mask MK, the first rods ST1, and the second rods ST2 may be provided in plurality. The second rods ST2 may be provided spaced apart from each other in the first direction DR1. The first rods ST1 may be provided spaced apart from each other in the second direction DR2. The mask MK may be provided in the second direction DR2. The width of the second rods ST2 in the first direction DR1 may be smaller than the width between any two adjacent active regions AR.

[0073] refer to Figure 1 、 Figure 3 and Figure 4 Each of the active areas AR may include a first active area AR1 in which a plurality of holes HL are defined, a second active area AR2 in which a plurality of first grooves HM1 are defined, and a third active area AR3 in which a plurality of second grooves HM2 are defined. The third active area AR3 may overlap with the second active area AR2 in the second direction DR2. The first stem ST1 may overlap with the third active area AR3 when viewed in a plane.

[0074] Each of the active areas AR may have a rectangular shape. Each of the active areas AR may include a first side ARS1 parallel to the first direction DR1, a third side ARS3 parallel to the first direction DR1 and opposite to the first side ARS1, a second side ARS2 parallel to the second direction DR2, and a fourth side ARS4 parallel to the second direction DR2 and opposite to the second side ARS2. Each of the first side ARS1, the second side ARS2, the third side ARS3, and the fourth side ARS4 may correspond to one side or a side of the rectangular shape. The first side ARS1 may be substantially perpendicular to the second side ARS2, and the third side ARS3 may be substantially perpendicular to the fourth side ARS4. The length of the first side ARS1 may be substantially the same as the length of the third side ARS3, and the length of the second side ARS2 may be substantially the same as the length of the fourth side ARS4. The length of the first side ARS1 may be less than the length of the second side ARS2. According to an embodiment, the first side ARS1 has a length greater than the length of the second side ARS2.

[0075] The third active area AR3 may overlap with the second active area AR2 in the second direction DR2. The second active area AR2 may be adjacent to the first side ARS1, and the third active area AR3 may be adjacent to the third side ARS3. Each of the second active area AR2 and the third active area AR3 may have a circular shape. The second active area AR2 and the third active area AR3 may have substantially the same size. In the case where each of the second active area AR2 and the third active area AR3 has a circular shape, the width between the center point of the second active area AR2 and the first side ARS1 in the second direction DR2 may be substantially the same as the width between the center point of the third active area AR3 and the third side ARS3 in the second direction DR2. The third active area AR3 may be symmetrical with the second active area AR2, and may improve the bending phenomenon of the mask MK when the mask MK is tensioned.

[0076] When viewed in a plane, the first stem ST1 may overlap the third active area AR3. A width of the first stem ST1 in the second direction DR2 may be greater than a width of the third active area AR3 in the second direction DR2.

[0077] The first active area AR1 may include a first-first active area AR1-1 including the first side ARS1 and a first-second active area AR1-2 including the third side ARS3. The first-first active area AR1-1 may surround the second active area AR2. The first-second active area AR1-2 may surround the third active area AR3. The width of the first-first active area AR1-1 in the first direction DR1 may be substantially the same as the length of the first side ARS1. The width of the first-second active area AR1-2 in the first direction DR1 may be substantially the same as the length of the third side ARS3.

[0078] When viewed in a planar manner, the first-second active areas AR1-2 may overlap with the first rod ST1. The width of the first-second active areas AR1-2 in the second direction DR2 may be smaller than the width of the first rod ST1 in the second direction DR2. Because the first-second active areas AR1-2 and the third active areas AR3 overlap with the first rod ST1 when viewed in a planar manner, the organic material sprayed onto the first-second active areas AR1-2 and the third active areas AR3 may not pass through the mask MK during the process of depositing the organic material using the mask assembly MS. For example, similar to the inactive area NAR, the first-second active areas AR1-2 and the third active areas AR3 may be regions through which no organic material is transferred during the deposition process.

[0079] refer to Figure 1 and Figure 4 , the organic material may pass through the active area AR. The active area AR may include a first active area AR1. The first active area AR1 may include holes HL. The holes HL may be uniformly distributed in the first active area AR1. The holes HL may be formed to completely penetrate the mask MK. The organic material may pass through the holes HL to form a pattern PT (refer to Figure 7 ). Each of the holes HL may be formed with the display panel DP (refer to Figure 9 ) of each light-emitting layer EML (reference Figure 10 The width of the hole HL in the third direction DR3 may be substantially the same as the width of the mask MK in the third direction DR3.

[0080] Each of the pores HL may have a diameter larger than that of the organic material. The pores HL may have diameters different from each other. As an example, the diameter of the pores HL may be equal to or greater than about 0.01 μm and equal to or less than about 5 μm, however, this is an example.

[0081] The active area AR may include a second active area AR2 including the first groove HM1 and a third active area AR3 including the second groove HM2 .

[0082] The first groove HM1 and the second groove HM2 may be uniformly distributed in the second effective area AR2 and the third effective area AR3, respectively. The first groove HM1 and the second groove HM2 may be grooves defined by removing a portion of the mask MK. The statement "the first groove HM1 and the second groove HM2 are defined by removing a portion of the mask MK." may mean that a recessed portion is formed in the upper surface of the mask MK. Unlike the hole HL, the organic material may not pass through the first groove HM1 and the second groove HM2. The organic material may not pass through the second effective area AR2 including the first groove HM1 and the third effective area AR3 including the second groove HM2. The third effective area AR3 and the second effective area AR2 may be symmetrical to each other, and in the case where the mask MK is tensioned to prevent the mask MK from bending, tension may be allowed to be symmetrically applied to the mask MK. Since the effective area AR is formed symmetrically on both sides to prevent the bending of the mask MK, the occurrence of bending of the mask MK may be improved in the case where the mask MK may include the first-second effective area AR1-2 surrounding the third effective area AR3. By depositing on the mother substrate MP (reference Figure 7 ) formed by the organic material pattern PT (reference Figure 7 ) may be formed to correspond to the first-first effective area AR1-1, the first-second effective area AR1-2 may be defined to overlap with the first rod ST1, and therefore, the pattern PT (reference Figure 7 ) may not be formed in the first-second active area AR1-2. For example, when the organic material is sprayed in a state where the first-second active area AR1-2 is provided on the first rod ST1, the organic material may pass through the hole HL included in the first-second active area AR1-2, but may not pass through the first rod ST1.

[0083] The width of the hole HL in the third direction DR3 may be greater than the widths of the first and second grooves HM1 and HM2 in the third direction DR3. As an example, the widths of the first and second grooves HM1 and HM2 in the third direction DR3 may be equal to or greater than about 40% of the width of the hole HL in the third direction DR3 and equal to or less than about 60% of the width of the hole HL in the third direction DR3. However, this is an example.

[0084] The non-active area NAR may not include the hole HL or the grooves HM1 and HM2. The non-active area NAR may not transfer the organic material.

[0085] Figure 5 is a flowchart illustrating a method of manufacturing a display panel according to an embodiment.

[0086] Figure 6 2 is a schematic cross-sectional view illustrating processes of a method for manufacturing a display panel according to an embodiment.

[0087] Figure 7 is a schematic plan view of a pattern formed by a method for manufacturing a display panel according to an embodiment.

[0088] refer to Figure 5 、 Figure 6 and Figure 7 , display panel DP (reference Figure 9 ) may include providing a mother substrate MP (S100); placing a mask assembly MS (refer to Figure 1 )(S110); and depositing an organic material on the mask MK to form a pattern PT (S120).

[0089] Display panel DP (reference Figure 9 The manufacturing method of the present invention may include providing a mother substrate MP (S100). The mother substrate MP may be a substrate on which a material is deposited. The frame FR may be directly provided on the mother substrate MP.

[0090] The method of manufacturing the display panel DP may include placing a mask assembly MS on a mother substrate MP (S110). Figure 6 and Figure 1 , the mask assembly MS may include a first rod ST1. The mask assembly MS may include a frame FR by which a frame opening FOP is defined, a first rod ST1 provided on the frame FR, overlapping with the frame opening FOP when viewed in a plane and extending in a first direction DR1, and a mask MK provided on the first rod ST1. The mask MK may include an active area AR and an inactive area NAR, and each of the active areas AR may include a first active area AR1 including a hole HL, a second active area AR2 including a first groove HM1, and a third active area AR3 including a second groove HM2 (refer to FIG. Figure 4 ). The third active area AR3 may overlap the second active area AR2 when viewed in the second direction DR2 intersecting the first direction DR1, and the first stem ST1 may overlap the third active area AR3 when viewed in a plane.

[0091] Display panel DP (reference Figure 9 ) may include depositing an organic material on the mask MK to form a pattern PT (S120).

[0092] The organic material may be sprayed from above the mask MK in a direction opposite to the third direction DR3. The sprayed organic material may be deposited on the mother substrate MP after passing through the hole HL. The organic material deposited on the mother substrate MP may include a light emitting material. The pattern PT formed by depositing the organic material may include a light emitting layer EML (refer to FIG. Figure 10 The camera hole HO may correspond to the second active area AR2 of the mask MK. The camera hole HO may be an area where organic material is not deposited. The pattern PT may correspond to an area where organic material is deposited. The pattern PT may be formed by an organic material that is sprayed, passes through the hole HL included in the first-first active area AR1-1, and is deposited on the mother substrate MP. The camera hole HO may be an area where organic material is not deposited on the mother substrate MP during the process of spraying the organic material because the organic material does not pass through the first groove HM1 of the second active area AR2. The first-second dummy area DAR1-2 may correspond to the first-second active area AR1-2, and the third dummy area DAR3 may correspond to the third active area AR3. The first-second dummy area DAR1-2 may be an area where organic material is blocked by the first rod ST1 disposed below (or under) the mask MK and is not deposited on the mother substrate MP. The third dummy area DAR3 may be an area where organic material sprayed toward the third active area AR3 is blocked by the second groove HM2 of the third active area AR3 and is not deposited on the mother substrate MP.

[0093] On the display panel DP (reference Figure 9 ), the width of the mask MK in the first direction DR1 may be greater than the width of the frame opening FOP in the first direction DR1. The mask MK may include a welding portion WD that does not overlap the frame opening FOP when viewed in a planar manner. The welding portion WD may allow the frame FR and the mask MK to be welded together. The welding portion WD may prevent the mask MK from deviating from the frame FR. The welding portion WD may not overlap the frame opening FOP when viewed in a planar manner, but may overlap the frame FR.

[0094] Figure 8 is a schematic perspective view of an electronic device ED including a display panel according to an embodiment. Figure 9 is an exploded perspective view of an electronic device ED including a display panel according to an embodiment. Figure 10 is a schematic cross-sectional view of a display panel DP according to an embodiment.

[0095] refer to Figure 8 and Figure 9 The electronic device ED may be a device activated in response to an electrical signal. The electronic device ED may be applied to a mobile phone, a tablet computer, a car navigation unit, a gaming unit, or a wearable device, however, it should not be limited thereto or thereby. Figure 8 A mobile phone is shown as a representative example of the electronic device ED including the display panel DP.

[0096] The electronic device ED may display an image IM through the active area AA-ED. The active area AA-ED may include a plane defined by the first direction DR1 and the second direction DR2. The active area AA-ED may also include a curved surface that is curved from at least one side or a side of the plane defined by the first direction DR1 and the second direction DR2. Figure 8 The electronic device ED shown in FIG may include two curved surfaces that are bent from two opposite sides of a plane defined by a first direction DR1 and a second direction DR2. However, the shape of the active area AA-ED should not be limited thereto or thereby. For example, the active area AA-ED may include only a plane, or the active area AA-ED may include curved surfaces that are respectively bent from at least two sides. For example, the active area AA-ED may include four curved surfaces that are respectively bent from four sides of the plane.

[0097] The electronic device ED may include a sensing area SA-ED defined therein. Figure 8 One sensing area SA-ED is shown, however, the number of sensing areas SA-ED should not be limited thereto or thereby, and two or more sensing areas SA-ED may be defined. The sensing area SA-ED may be defined in the active area AA-ED and may be part of the active area AA-ED.

[0098] The electronic device ED may include an active area AA-ED and a peripheral area NAA-ED adjacent to the active area AA-ED. The active area AA-ED may correspond to the display area AA of the display panel DP, and the peripheral area NAA-ED may correspond to the non-display area NAA of the display panel DP.

[0099] The peripheral area NAA-ED may be an area that blocks optical signals and may be disposed outside the active area AA-ED to surround the active area AA-ED. According to an embodiment, the peripheral area NAA-ED may be defined in a side surface of the electronic device ED rather than in a front surface of the electronic device ED. The electronic device ED may include at least one curved side surface or side surface, and the peripheral area NAA-ED may be defined in the curved side surface.

[0100] The electronic device ED may include a display device DD, a housing HU, and an electro-optical module EOM. The display device DD may include a window WM, an upper member UM, a display panel DP, and a lower member SP.

[0101] The display device DD may include a window WM disposed on the display panel DP. The window WM may provide an appearance of the electronic device ED. The window WM may cover the front surface of the display panel DP and protect the display panel DP from external impacts and scratches. The window WM may be attached to the upper member UM via an adhesive layer.

[0102] The window WM may include an optically transparent insulating material. As an example, the window WM may include cover glass or a synthetic resin film as its covering member. The window WM may have a single-layer or multi-layer structure. For example, the window WM may have a single-layer structure of cover glass, may have a structure in which multiple plastic films are coupled to each other by an adhesive, or may have a structure in which cover glass and a plastic film are coupled to each other by an adhesive. The window WM may also include functional layers such as an anti-fingerprint layer, a phase control layer, a hard coating layer, etc., provided on a transparent substrate.

[0103] In the display device DD, the upper member UM may be disposed below (or under) the window WM and on the display panel DP. The upper member UM may include an anti-reflection layer and an input sensing sensor. The anti-reflection layer may reduce the reflectivity of the display device DD relative to external light. The input sensing sensor may sense external input generated by a user. The upper member UM may also include an adhesive layer to attach the anti-reflection layer to the input sensing sensor.

[0104] In the display device DD, the display panel DP may be disposed under (or below) the upper member UM. The lower member SP may be disposed under (or below) the display panel DP.

[0105] The display panel DP may include a display area AA through which an image IM is displayed and a non-display area NAA adjacent to the display area AA. For example, the front surface of the display panel DP may include the display area AA and the non-display area NAA. The display area AA may be activated in response to an electrical signal and may be a region in which an image IM displayed by the active area AA-ED of the electronic device ED is generated.

[0106] The non-display area NAA may be defined adjacent to the display area AA. The non-display area NAA may surround the display area AA. A driving circuit or driving line for driving the display area AA, various signal lines or pads for providing electrical signals to the display area AA, or electronic components may be disposed in the non-display area NAA.

[0107] The electronic device ED may be provided with a through hole HH defined to penetrate at least one of the components included in the electronic device ED. The through hole HH may be defined to penetrate each of, for example, the display panel DP, the upper member UM, and the lower member SP.

[0108] The first panel hole H1 may be defined in the display area AA of the display panel DP. The first panel hole H1 may be defined to overlap with the sensing area SA-ED of the electronic device ED which may include the display panel DP. The first panel hole H1 may be defined to penetrate a portion of the display panel DP that overlaps with the sensing area SA-ED of the electronic device ED. For example, the first panel hole H1 may be formed to have a shape that penetrates the display panel DP from the upper surface to the lower surface of the display panel DP, however, the present disclosure should not be limited thereto or thereby. According to an embodiment, at least one component of the display panel DP may not be penetrated in the portion defining the first panel hole H1. As an example, the base layer BL of the display panel DP (reference Figure 10 ) may not be penetrated in the portion defining the first panel hole H1. The electro-optical module EOM may be provided to correspond to the portion defining the first panel hole H1. The first panel hole H1 may be formed by the deposition material being included in the second active area AR2 (reference Figure 3 ) in a plurality of first slots HM1 (reference Figure 4 ) is blocked. The first panel hole H1 can be formed with Figure 7 The camera hole HO shown in FIG.

[0109] The second panel hole H2 may be defined through the upper member UM to correspond to the first panel hole H1 of the display panel DP. The second panel hole H2 may be defined to overlap the sensing area SA-ED of the electronic device ED. Figure 9 A structure in which the second panel hole H2 has substantially the same shape and size as the first panel hole H1 is shown as a representative example, however, the present disclosure should not be limited thereto or thereby. Depending on the embodiment, the shape and size of the second panel hole H2 may be different from the shape and size of the first panel hole H1.

[0110] The lower member SP may be disposed under (or below) the display panel DP. The lower member SP may support the display panel DP, may absorb impact applied to the display panel DP, and may dissipate heat generated from components disposed under (or below) the display panel DP (e.g., an electronic module EM and a power supply module PSM described later).

[0111] The third panel hole H3 may have a shape penetrating the lower member SP from the upper surface to the lower surface of the lower member SP. Figure 9 A structure is shown in which the third panel hole H3 has a shape and size substantially the same as those of the first panel hole H1 and the second panel hole H2, however, the present disclosure should not be limited thereto or thereby. Depending on the embodiment, the shape and size of the third panel hole H3 may be different from those of the first panel hole H1 and the second panel hole H2.

[0112] The housing HU may house the electro-optical module EOM, the power supply module PSM, the electronic module EM, and the display panel DP. A window WM may be coupled or connected to the housing HU to form an exterior appearance of the electronic device ED.

[0113] The electro-optical module EOM may overlap with the sensing area SA-ED. The electro-optical module EOM may receive external input through the sensing area SA-ED, or may output a signal through the sensing area SA-ED. The electro-optical module EOM may include a camera module or a sensor module.

[0114] The electronic module EM may include a control module, a wireless communication module, an image input module, an audio input module, an audio output module, a memory, and an external interface module. The electronic module EM may include a main circuit board, and the modules may be mounted on the main circuit board or may be electrically connected to the main circuit board via a flexible circuit board. The electronic module EM may be electrically connected to the power supply module PSM.

[0115] The power supply module PSM may provide the power required for the overall operation of the electronic device ED. The power supply module PSM may comprise a conventional battery device.

[0116] Figure 10 It is along the display panel DP Figure 9 Schematic cross-sectional view of a portion taken along line II-II'.

[0117] refer to Figure 10 , the display panel DP may be a light-emitting display panel. Figure 10 A cross section corresponding to one of the pixels, for example, a cross section corresponding to two transistors T1 and T2 and a light emitting element OLED is shown.

[0118] The display panel DP may include a base layer BL, a circuit element layer ML disposed on the base layer BL, a display element layer EL disposed on the circuit element layer ML, and an encapsulation layer TFE disposed on the display element layer EL.

[0119] The base layer BL may include a synthetic resin layer. The base layer BL may be formed by forming a synthetic resin layer on a support substrate used in manufacturing the display panel DP, forming a conductive layer and an insulating layer on the synthetic resin layer, and then removing the support substrate.

[0120] The circuit element layer ML may include at least one insulating layer and circuit elements. The circuit elements may include signal lines and pixel driving circuits. The insulating layer, semiconductor layer, and conductive layer may be formed by coating or deposition processes. The insulating layer, semiconductor layer, and conductive layer may then be patterned by photolithography to form the circuit element layer ML.

[0121] In this embodiment, the circuit element layer ML may include a buffer layer BFL, a barrier layer BRL, and a first insulating layer 10, a second insulating layer 20, a third insulating layer 30, a fourth insulating layer 40, a fifth insulating layer 50, a sixth insulating layer 60, and a seventh insulating layer 70. The buffer layer BFL, the barrier layer BRL, and the first insulating layer 10, the second insulating layer 20, the third insulating layer 30, the fourth insulating layer 40, the fifth insulating layer 50, the sixth insulating layer 60, and the seventh insulating layer 70 may include one of an inorganic layer and an organic layer. The buffer layer BFL and the barrier layer BRL may include an inorganic layer. At least one of the fifth insulating layer 50, the sixth insulating layer 60, and the seventh insulating layer 70 may include an organic layer.

[0122] Figure 10 The arrangement relationship of the first active portion A1, the second active portion A2, the first gate G1, the second gate G2, the first source S1, the second source S2, the first drain D1, and the second drain D2 forming the first transistor T1 and the second transistor T2 is shown as a representative example. In this embodiment, the first active portion A1 and the second active portion A2 may include different materials. The first active portion A1 may include a polycrystalline silicon semiconductor material, and the second active portion A2 may include a metal oxide semiconductor material. The first source S1 and the first drain D1 may have a higher doping concentration than the first active portion A1 and may function as electrodes. The second source S2 and the second drain D2 may correspond to regions where the metal oxide semiconductor material is reduced and may function as electrodes.

[0123] According to an embodiment, the first active portion A1 and the second active portion A2 may include substantially the same semiconductor material as each other, and in this case, the stack structure of the circuit element layer ML may be simplified.

[0124] The display element layer EL may include a pixel defining layer (PDL) and a light-emitting element (OLED). The light-emitting element (OLED) may be an organic light-emitting diode (OLED) or a quantum dot light-emitting diode (QD). The anode (AE) may be disposed on the seventh insulating layer 70. At least a portion of the anode (AE) may be exposed through a pixel opening (PDL-OP) of the pixel defining layer (PDL). The pixel opening (PDL-OP) of the pixel defining layer (PDL) may define a light-emitting area (PXA). A non-light-emitting area (NPXA) may surround the light-emitting area (PXA).

[0125] The hole control layer HCL and the electron control layer ECL may be commonly disposed in the light emitting area PXA and the non-light emitting area NPXA. The light emitting layer EML may include a light emitting material and may be formed into a pattern shape corresponding to the pixel opening PDL-OP. The light emitting layer EML may be deposited in a manner different from the hole control layer HCL and the electron control layer ECL each having a film shape. As an example, the hole control layer HCL and the electron control layer ECL may be commonly formed in a pixel using an open mask. The light emitting layer EML may be formed into a pattern shape corresponding to the pixel opening PDL-OP using a mask assembly according to the present disclosure. In detail, the deposition pattern may be formed to correspond to Figure 4 Each of the holes HL included in the first active area AR1 shown in FIG corresponds to the hole HL, and the deposition pattern may be the light-emitting layer EML of the display panel DP, however, the present disclosure should not be limited thereto or thereby. According to an embodiment, similar to the light-emitting layer EML, the hole control layer HCL and the electron control layer ECL may also be formed into a pattern shape corresponding to the pixel opening PDL-OP using the mask assembly according to the present disclosure.

[0126] The cathode CE may be disposed on the electron control layer ECL. An encapsulation layer TFE may be disposed on the cathode CE. The encapsulation layer TFE may be a thin film encapsulation layer that encapsulates the display element layer EL. The encapsulation layer TFE may include multiple thin layers. The thin layers may include inorganic layers and organic layers. The encapsulation layer TFE may include an insulating layer for encapsulating the display element layer EL and multiple insulating layers for improving luminous efficiency.

[0127] Hereinafter, embodiments will be described with reference to detailed characteristic data of mask assemblies of implementation examples and mask assemblies of comparative examples. The embodiments described below are examples to help understand the present disclosure, and the scope of the present disclosure should not be limited thereto.

[0128] Figure 11 : is a schematic plan view showing a change in the shape of a mask according to a comparative example. Figure 11 , the mask of the comparative example before the shape of the mask is changed is referred to as a preliminary comparative mask PMK-C, and the mask of the comparative example after the shape of the mask is changed is referred to as a comparative mask MK-C. The shape of the comparative mask MK-C is briefly shown to clearly indicate the change in shape.

[0129] Figure 12 : is a schematic plan view showing a change in the shape of a mask according to an embodiment. Figure 12 , the mask before the shape of the mask is changed is referred to as a preliminary mask PMK, and the mask after the shape of the mask is changed is referred to as a mask MK. The shape of the mask MK is briefly shown in order to clearly express the change in shape. Figure 12 The mask MK shown in Figure 1 The mask MK shown in . Figure 1 The mask MK shown in FIG is shown to have a rectangular shape and may have a Figure 12 The comparison mask MK-C may be the same shape as the mask MK shown in FIG. , except that the comparison mask MK-C does not include the first-second effective area AR1-2 and the third effective area AR3. Figure 1 The mask MK shown in FIG is substantially the same. The comparative mask MK-C may include Figure 1 The second effective area AR2 of the mask MK is substantially the same as the second comparative effective area AR2-C. Figure 1 Details of the same elements described will not be repeated.

[0130] Comparative mask MK-C and mask MK are made of Invar alloy and have substantially the same thickness of approximately 20 μm. Experiments were conducted to determine whether comparative mask MK-C and mask MK bend when each is pulled and stretched in the first direction DR1 and in a direction opposite to the first direction DR1, allowing its width in the first direction DR1 to increase by approximately 0.02%. Stretching the mask reduces the width of the mask region in the second direction DR2. Mask bending means that the width of the mask in the second direction DR2 is asymmetrically reduced, and the mask is bilaterally asymmetrical. As an example, when one long side of preliminary comparative mask PMK-C, adjacent to the second comparative effective area AR2-C, is concavely deformed in the second direction DR2, and the other long side opposite the one long side is more concavely deformed in the direction opposite to the second direction DR2 than the one long side adjacent to the second comparative effective area AR2-C, preliminary comparative mask PMK-C as a whole bends in the second direction DR2. The symmetrical reduction in the width of the preliminary mask PMK means that the degree of deformation of one long side of the preliminary mask PMK adjacent to the second active area AR2 in the second direction DR2 and the degree of deformation of the other long side opposite the one long side in a direction opposite to the second direction DR2 can be the same or substantially the same. Deformation of one long side in the second direction DR2 means that a portion of the one long side is deformed concavely in the second direction DR2. Deformation of the other long side in a direction opposite to the second direction DR2 means that a portion of the other long side is deformed concavely in the direction opposite to the second direction DR2. If either one long side is deformed in the second direction DR2 or the other long side is deformed in a direction opposite to the second direction DR2, the width of the preliminary mask PMK in the second direction DR2 decreases.

[0131] refer to Figure 11When tension is applied to the preliminary comparison mask PMK-C in both the first direction DR1 and the direction opposite to the first direction DR1, the deformation of one long side adjacent to the second comparison effective area AR2-C and concavely deformed in the second direction DR2 is greater than the deformation of the other long side opposite the one long side and concavely deformed in the direction opposite to the second direction DR2. Because the comparison mask MK-C does not include the area corresponding to the third effective area AR3 of the mask MK, the comparison mask MK-C has an asymmetrical shape and the tension is unevenly applied. As a result, the comparison mask MK-C has an overall shape that curves in the second direction DR2.

[0132] refer to Figure 12 When tension is applied to the preliminary mask PMK in the first direction DR1 and in a direction opposite to the first direction DR1, the degree of deformation of one long side adjacent to the second active area AR2 and concavely deformed in the second direction DR2 is substantially the same as the degree of deformation of the other long side opposite the one long side and concavely deformed in a direction opposite to the second direction DR2. Unlike the comparative mask MK-C, the mask MK includes both the second active area AR2 and the third active area AR3 and has a bilaterally symmetrical shape. Therefore, tension is applied uniformly, and as a result, the mask MK does not bend in the second direction DR2 or in a direction opposite to the second direction DR2.

[0133] Hereinafter, embodiments will be described with reference to detailed characteristic data of mask assemblies of implementation examples and mask assemblies of comparative examples. The embodiments described below are examples to help understand the present disclosure, and the scope of the present disclosure should not be limited thereto.

[0134] In the following description, the deformation of one long side adjacent to the second effective area or the second comparative effective area in the second direction is represented by a positive (+) value, and the deformation of the other long side opposite to the one long side in the direction opposite to the second direction is represented by a negative (-) value. The degree of deformation of the long side is represented by a maximum change value, which is defined as the maximum distance from the long side before tension is applied to the long side after tension is applied.

[0135] The degree of curvature is defined as the absolute value difference between the maximum change value of one long side and the maximum change value of the other long side. When the width of the mask in the second direction is symmetrically reduced when the mask is stretched, it can be understood that the curvature phenomenon of the mask is improved.

[0136] The variation of one long side of the comparative mask adjacent to the second comparative effective region was equal to or greater than approximately +0.7766 μm and equal to or less than approximately +6.800 μm, the variation of the other long side of the comparative mask opposite the one long side was equal to or greater than approximately -0.4280 μm and equal to or less than approximately -7.656 μm, and the degree of curvature was approximately 0.856 μm. On the other hand, the variation of one long side of the mask of the embodiment was equal to or greater than approximately +1.164 μm and equal to or less than approximately +6.985 μm, the variation of the other long side was equal to or greater than approximately -1.164 μm and equal to or less than approximately -6.985 μm, and the degree of curvature was approximately 0 μm. The degree of deformation of one long side of the comparative mask adjacent to the second comparative effective area is approximately 6.0234 μm, and the degree of deformation of the other long side of the comparative mask opposite to the one long side is approximately 7.228 μm. The degree of deformation of one long side of the mask of the embodiment example adjacent to the second effective area is approximately 5.821 μm, and the degree of deformation of the other long side of the mask of the embodiment example opposite to the one long side is approximately 5.821 μm. The reason why the degree of deformation of the long side of the mask of the embodiment example has a lower value than the degree of deformation of the long side of the mask of the comparative example is that the mask of the embodiment example can include a third effective area symmetrical to the second effective area, and the mask deforms symmetrically and the degree of deformation is small. The degree of curvature of the mask of the comparative example is approximately 0.856 μm, and the degree of curvature of the mask of the embodiment example is approximately 0 μm. This means that the mask of the embodiment example is symmetrically deformed compared to the mask of the comparative example. When compared with the mask of the comparative example, it was observed that the bending phenomenon of the mask of the embodiment example, which occurs when tension is applied to the mask, was improved.

[0137] Although embodiments have been described, it should be understood that the present disclosure should not be limited to these embodiments, but rather that various changes and modifications can be made by those skilled in the art within the spirit and scope of the present disclosure and as claimed in the appended claims. Therefore, the disclosed subject matter should not be limited to any single embodiment described herein, and the scope of the present disclosure should be determined based on the appended claims.

Claims

1. A mask assembly, characterized in that: include: Frames, including frame openings; a first rod disposed on the frame, the first rod overlapping the frame opening in a plan view and extending in a first direction; as well as a mask, disposed on the first rod, The mask includes a plurality of valid areas and invalid areas, and each of the plurality of valid areas includes: a first effective area comprising a plurality of holes; a second effective area including a plurality of first grooves; and The third effective area includes a plurality of second grooves, The third active area overlaps the second active area in a second direction intersecting the first direction, and The first rod overlaps with the third effective area in the plan view.

2. The mask assembly according to claim 1, wherein: A width of each of the plurality of holes in a third direction intersecting the first direction and the second direction is greater than a width of each of the plurality of first grooves and the plurality of second grooves in the third direction.

3. The mask assembly according to claim 2, wherein: A width of each of the plurality of first grooves and the plurality of second grooves in the third direction is equal to or greater than 40% of the width of each of the plurality of holes in the third direction and equal to or less than 60% of the width of each of the plurality of holes in the third direction.

4. The mask assembly according to claim 1, wherein: Each of the plurality of active areas has a rectangular shape, and The effective area is arranged in the first direction.

5. The mask assembly according to claim 4, wherein: Each of the plurality of active areas includes: a first side, parallel to the first direction; and a second side, parallel to the second direction, and The first side has a length that is smaller than a length of the second side.

6. The mask assembly according to claim 4, wherein: Each of the plurality of active areas includes: a first side, parallel to the first direction; and a second side, parallel to the second direction, and The first side has a length greater than a length of the second side.

7. The mask assembly according to claim 4, wherein: Each of the plurality of active areas includes: a first side, parallel to the first direction; a third side, parallel to the first direction and opposite to the first side; a second side, parallel to the second direction; and a fourth side, parallel to the second direction and opposite to the second side, The second effective area is disposed adjacent to the first side, and The third effective area is arranged adjacent to the third side.

8. The mask assembly according to claim 7, wherein: The first effective area includes a first-first effective area including the first side and a first-second effective area including the third side, and The first rod overlaps the first-second effective area in the plan view.

9. The mask assembly according to claim 8, wherein: The first rod does not overlap with the second effective area in the plan view.

10. The mask assembly according to claim 1, wherein: Also includes: A second rod is provided between the frame and the mask, and the second rod extends in the second direction.

Images