Gas verification device and semiconductor processing equipment

Abstract

The utility model discloses a gas verification device and semiconductor processing equipment. The gas verification device comprises a tank body, the tank body is wrapped by a shell to form a cavity so as to form a gas volume, the tank body is provided with a gas inlet and a gas outlet, the gas inlet and the gas outlet are respectively communicated with the cavity, and the gas outlet is connected with a valve in series; a temperature sensor and a pressure sensor are arranged on one side face of the cavity, and the temperature sensor and the pressure sensor are embedded into the shell and communicated with the cavity. According to the gas verification device, the temperature sensor and the pressure sensor are embedded into the shell, the integration level of the gas verification device can be improved, occupied space is reduced, meanwhile, the temperature sensor and the pressure sensor are protected in a sealed mode through the shell, external interference of the temperature sensor and the pressure sensor is avoided, and more accurate measurement information is obtained. Moreover, the mounting positions of the temperature sensor and the pressure sensor and the positions of the temperature sampling port and the pressure sampling port are optimized, so that the gas verification accuracy is further improved.

Description

Technical Field

[0001] The present application relates to the field of semiconductor processing technology, and in particular to a gas verification device and semiconductor processing equipment. Background Art

[0002] The gas verification device in the gas delivery system of ICP and CCP etchers is used to measure and calibrate the actual flow rate of process gas. In plasma etching equipment, the flow accuracy of process gas directly affects the etching speed and etching uniformity.

[0003] Currently, there are two methods for calibrating gas flow: one uses a chamber as the fixed volume, and the other uses a gas cylinder as the fixed volume. Because the chamber is larger than the gas cylinder, this method results in higher accuracy. However, chamber conditions vary with process and time, leading to significant variability in calibration results. While using a gas cylinder for process gas flow calibration offers greater repeatability, it lacks accuracy.

[0004] A gas verification device consists of a valve, a tank, and a verification tool. Its temperature and pressure sensors are located far from the tank, resulting in errors in temperature and pressure measurement, which in turn affects the accuracy of flow measurement and calibration. Furthermore, the system has low integration, occupies a large space in the gas box, and is inconvenient to install and maintain. Utility Model Content

[0005] The utility model aims to solve one of the technical problems existing in the prior art and proposes a gas verification device and semiconductor processing equipment.

[0006] In order to solve one of the above problems, the utility model provides a gas verification device, including a tank body, wherein the tank body is wrapped by a shell to form a cavity to form a gas volume, and an air inlet and an air outlet are provided on the tank body, and the air inlet and the air outlet are respectively connected to the cavity, and the air outlet is connected in series with a valve; a temperature sensor and a pressure sensor are provided on one side surface of the cavity, and the temperature sensor and the pressure sensor are respectively embedded in the shell and connected to the cavity.

[0007] Optionally, the pressure sensor is located closer to the air outlet than the temperature sensor.

[0008] Optionally, the air inlet and the air outlet are both provided in the shell, and the air inlet and the air outlet are respectively located on both sides of the cavity in a first direction and at both ends in a second direction, and the first direction is not parallel to the second direction.

[0009] Optionally, the air inlet and the air outlet are respectively located at two ends of the cavity that are farthest apart.

[0010] Optionally, the air inlet direction of the air inlet and the air outlet direction of the air outlet do not intersect.

[0011] Optionally, the temperature sensor and the pressure sensor have a temperature sampling port and a pressure sampling port respectively.

[0012] Optionally, the temperature sampling port and the pressure sampling port are respectively located on the inner wall of the cavity.

[0013] Optionally, the temperature sampling port and the pressure sampling port extend into the cavity by a certain distance respectively.

[0014] Optionally, the distance that the temperature sampling port and / or the pressure sampling port extends into the cavity can be adjusted.

[0015] Optionally, the temperature sensor and the pressure sensor are respectively provided with a driving device to change the distance that the temperature sampling port and the pressure sampling port extend into the cavity.

[0016] The utility model also provides a semiconductor processing device, comprising a gas delivery device, wherein the gas delivery device is provided with the aforementioned gas verification device.

[0017] Optionally, there are multiple gas verification devices, and among the multiple gas verification devices, there are at least two gas verification devices whose temperature sampling ports and / or pressure sampling ports extend into the cavity at different distances.

[0018] Optionally, among the multiple gas verification devices, the distance that the temperature sampling port and / or pressure sampling port of the gas verification device used to verify the use of the first gas extends into the cavity is a first distance; the distance that the temperature sampling port and / or pressure sampling port of the gas verification device used to verify the use of the second gas extends into the cavity is a second distance, and the first distance is not equal to the second distance.

[0019] Optionally, when the molecular weight of the first gas is smaller than the molecular weight of the second gas, the first distance is greater than the second distance.

[0020] By embedding the temperature and pressure sensors within the housing, this new device improves the integration of the gas verification device and reduces space usage. Furthermore, the housing provides airtight protection for the temperature and pressure sensors, shielding them from external interference and enabling more accurate measurement information. Furthermore, the optimized mounting locations of the temperature and pressure sensors and the location of the temperature and pressure sampling ports further enhance gas verification accuracy. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] To more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for the embodiments or the description of the prior art. Obviously, the drawings described below are merely illustrative, and those skilled in the art can, without inventive effort, derive other implementation drawings based on the provided drawings.

[0022] The structures, proportions, sizes, etc. illustrated in this specification are intended solely to complement the contents disclosed herein and to facilitate understanding and reading by persons familiar with the art. They are not intended to limit the conditions under which the present invention may be implemented and therefore have no substantive technical significance. Any structural modifications, changes in proportions, or adjustments in size, without affecting the efficacy and objectives of the present invention, shall remain within the scope of the technical contents disclosed herein.

[0023] Figures 1 to 4 Schematic diagrams of different embodiments of the gas verification device of the present invention;

[0024] Figures 5 and 6 Schematic diagram of the pressure and temperature distribution in the cavity for different gases. DETAILED DESCRIPTION

[0025] The following describes the implementation of the present invention through specific embodiments. Those skilled in the art can readily understand the other advantages and benefits of the present invention from the contents disclosed in this specification. Obviously, the embodiments described are only a portion of the embodiments of the present invention, not all of them. All other embodiments derived by persons of ordinary skill in the art based on the embodiments of the present invention without inventive effort are also within the scope of protection of the present invention.

[0026] In order to solve the problems in the background technology, a current solution is to integrate temperature and pressure sensors on the tank body to reduce space occupation and improve calibration accuracy.

[0027] However, we found that in order to improve the calibration accuracy, the measured values need to reflect the average pressure and temperature conditions inside the tank. Simply installing the temperature and pressure sensors on the tank is far from enough.

[0028] In order to further improve the calibration accuracy, the utility model proposes a gas verification device, such as Figure 1As shown, the tank body comprises a housing 130 enclosing a cavity 140 to form a gas volume. The tank body is provided with an air inlet 210 and an air outlet 220, each of which is in communication with the cavity 140. The air outlet 220 is connected in series with a valve 300. A temperature sensor 110 and a pressure sensor 120 are provided on one side of the cavity 140. The temperature sensor 110 and the pressure sensor 120 are each embedded in the housing 130 and in communication with the cavity 140.

[0029] By embedding the temperature sensor 110 and the pressure sensor 120 into the shell 130, the integration of the gas verification device can be improved and the space occupied can be reduced. At the same time, the shell 130 provides sealed protection for the temperature sensor 110 and the pressure sensor 120, so that the temperature sensor 110 and the pressure sensor 120 are exempted from external interference and more accurate measurement information is obtained.

[0030] In one embodiment, the pressure sensor 120 is positioned closer to the gas outlet 220 than the temperature sensor 110. Because a pressure diffusion zone exists when gas enters the cavity 140, the pressure distribution gradient at the entrance is large, while the temperature distribution is relatively uniform. Positioning the pressure sensor 120 closer to the gas outlet 220 relative to the temperature sensor 110 improves the detection accuracy of the pressure sensor 120, allowing its measured values to better reflect the average state of the gas within the cavity 140, thereby improving calibration accuracy.

[0031] In one embodiment, the air inlet 210 and the air outlet 220 are both provided in the housing 130, and the air inlet 210 and the air outlet 220 are respectively located on both sides of the cavity 140 in the first direction and at both ends in the second direction, and the first direction is not parallel to the second direction. Figure 1 For example, the air inlet 210 and the air outlet 220 are located on the left and right sides of the cavity 140 in the X-axis direction, and at the upper and lower ends in the Z-axis direction. Preferably, the air inlet 210 and the air outlet 220 are located at the two ends of the cavity 140 that are farthest apart. By maximizing the path from the air inlet 210 to the air outlet 220 within the cavity 140, it is beneficial to achieve uniformity of gas pressure and temperature within the cavity 140, thereby improving measurement accuracy.

[0032] Furthermore, the air inlet direction of the air inlet 210 and the air outlet direction of the air outlet 220 do not intersect, so as to improve the filling uniformity of the gas in the cavity 140 .

[0033] The temperature sensor 110 and the pressure sensor 120 can be simultaneously disposed on any side of the cavity 140. Figure 1 For example, the temperature sensor 110 and the pressure sensor 120 are arranged on the upper end surface of the cavity 140. Figure 2, the temperature sensor 110 and the pressure sensor 120 are arranged on the left side of the cavity 140 .

[0034] The temperature sensor 110 and the pressure sensor 120 have a temperature sampling port 111 and a pressure sampling port 121 , respectively.

[0035] In one embodiment, the temperature sampling port 111 and the pressure sampling port 121 are respectively located on the inner wall of the cavity 140 for easy installation.

[0036] In one embodiment, Figure 3 、 4 As shown, the temperature sampling port 111 and the pressure sampling port 121 extend into the cavity 140 by a certain distance respectively to improve detection accuracy.

[0037] Here we need to introduce the concepts of pressure diffusion zone and temperature boundary layer, taking helium and nitrogen as examples, such as Figure 5 、 6 As shown, Figure 5 The pressure (left a) and temperature (right b) distribution of the helium (He) gas introduced. Figure 6 The pressure (left a) and temperature (right b) distributions of nitrogen (N2) are shown.

[0038] It can be seen that after helium enters cavity 140 through inlet 210, a conical pressure diffusion zone exists. However, at the same temperature, pressure, and flow rate, nitrogen has a less obvious pressure diffusion zone, resulting in a relatively uniform pressure distribution. Therefore, the pressure sensor 120 is positioned closer to outlet 220 than the temperature sensor 110, allowing for better pressure measurement within the conical pressure diffusion zone, improving measurement accuracy.

[0039] As for the temperature distribution, helium has a thicker temperature boundary layer than nitrogen. Within the temperature boundary layer, the temperature distribution has an obvious gradient transition from the cavity wall to the edge, while the middle area of the cavity outside the temperature boundary layer is relatively uniform.

[0040] In one embodiment, there are multiple gas verification devices, and among the multiple gas verification devices, there are at least two gas verification devices whose temperature sampling ports and / or pressure sampling ports extend into the cavity at different distances to adapt to gas verification of at least two gases.

[0041] Preferably, taking into account the influence of gas molecular weight, the distance that the temperature sampling port 111 and / or the pressure sampling port 121 of the gas verification device used to verify the use of the first gas extends into the cavity 140 is a first distance; the distance that the temperature sampling port 111 and / or the pressure sampling port 121 of the gas verification device used to verify the use of the second gas extends into the cavity 140 is a second distance. The first distance and the second distance are not equal to cope with accurate verification of different gases.

[0042] In particular, when the molecular weight of the first gas is smaller than that of the second gas, the first distance is greater than the second distance. This improves verification accuracy for different verification gases. It is understood that multiple, different gas verification devices can be connected to different gas sources for precise verification.

[0043] In one embodiment, the distance that the temperature sampling port 111 and / or the pressure sampling port 121 extends into the cavity 140 can be adjusted, so that a single gas verification device can be used for verification of different gases.

[0044] Furthermore, the temperature sensor 110 and the pressure sensor 120 are each provided with a drive device to change the distance that the temperature sampling port 111 and the pressure sampling port 121 extend into the cavity 140. This avoids the need for multiple gas verification devices for different gases, and allows the use of a single gas verification device to verify multiple gases. By adjusting the distance that the temperature sampling port 111 and the pressure sampling port 121 extend into the cavity 140, different gases can be accurately verified, streamlining the structure. The drive device can be any existing structure, such as a telescopic rod, a threaded rod, etc., that can adjust the distance that the temperature sampling port 111 and the pressure sampling port 121 extend into the cavity 140.

[0045] The gas verification device provided by the present invention can be installed in the gas delivery device of semiconductor processing equipment to improve its gas verification accuracy. The specific calibration method can be the existing technology and will not be described in detail here.

[0046] In the present invention, the terms "center," "height," "thickness," "up," "down," "vertical," "horizontal," "top," "bottom," "inside," "outside," "axial," "radial," "circumferential," "left," "right," and the like, indicating positions or location relationships, are based on the positions or location relationships shown in the accompanying drawings and are intended only to facilitate description and simplify the present invention. They do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limiting the present invention. In the description of the present invention, unless otherwise specified, "plurality" means two or more.

[0047] Although the present invention has been described in detail above using general descriptions and specific embodiments, it will be apparent to those skilled in the art that modifications or improvements may be made to the present invention. Therefore, such modifications or improvements, without departing from the spirit of the present invention, are within the scope of protection claimed herein.

Claims

1. A gas verification device, characterized in that: include The tank body is enclosed by the shell to form a cavity to form a gas volume, The tank body is provided with an air inlet and an air outlet, the air inlet and the air outlet are respectively communicated with the cavity, and the air outlet is connected in series with a valve; A temperature sensor and a pressure sensor are provided on one side surface of the cavity. The temperature sensor and the pressure sensor are respectively embedded in the shell and communicated with the cavity.

2. The gas verification device according to claim 1, characterized in that The pressure sensor is located closer to the air outlet than the temperature sensor.

3. The gas verification device according to claim 1, wherein: The air inlet and the air outlet are both provided in the shell, and are respectively located at two sides of the cavity in a first direction and at two ends in a second direction, and the first direction is not parallel to the second direction.

4. The gas verification device according to claim 1, wherein: The air inlet and the air outlet are respectively located at two ends of the cavity that are farthest apart from each other.

5. The gas verification device according to claim 1, wherein: The air inlet direction of the air inlet and the air outlet direction of the air outlet do not intersect.

6. The gas verification device according to claim 1, wherein: The temperature sensor and the pressure sensor have a temperature sampling port and a pressure sampling port respectively.

7. The gas verification device according to claim 6, characterized in that: The temperature sampling port and the pressure sampling port are respectively located on the inner wall of the cavity.

8. The gas verification device according to claim 6, characterized in that: The temperature sampling port and the pressure sampling port extend into the cavity by a certain distance respectively.

9. The gas verification device according to claim 8, characterized in that: The distance that the temperature sampling port and / or the pressure sampling port extends into the cavity can be adjusted.

10. The gas verification device according to claim 9, characterized in that: The temperature sensor and the pressure sensor are respectively provided with driving devices to change the distances by which the temperature sampling port and the pressure sampling port extend into the cavity.

11. A semiconductor processing device, characterized in that: include A gas delivery device, wherein the gas delivery device is provided with the gas verification device according to any one of claims 1 to 10.

12. The semiconductor processing equipment according to claim 11, wherein There are multiple gas verification devices, and among the multiple gas verification devices, there are at least two gas verification devices with temperature sampling ports and / or pressure sampling ports extending into the cavity at different distances.

13. The semiconductor processing equipment according to claim 12, wherein Among the multiple gas verification devices, the distance that the temperature sampling port and / or pressure sampling port of the gas verification device used to verify the use of the first gas extends into the cavity is a first distance; the distance that the temperature sampling port and / or pressure sampling port of the gas verification device used to verify the use of the second gas extends into the cavity is a second distance, and the first distance is not equal to the second distance.

14. The semiconductor processing equipment according to claim 13, wherein When the molecular weight of the first gas is smaller than the molecular weight of the second gas, the first distance is greater than the second distance.

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